AU2001277756A1 - Relay image optical system, and illuminating optical device and exposure system provided with the optical system - Google Patents

Relay image optical system, and illuminating optical device and exposure system provided with the optical system

Info

Publication number
AU2001277756A1
AU2001277756A1 AU2001277756A AU7775601A AU2001277756A1 AU 2001277756 A1 AU2001277756 A1 AU 2001277756A1 AU 2001277756 A AU2001277756 A AU 2001277756A AU 7775601 A AU7775601 A AU 7775601A AU 2001277756 A1 AU2001277756 A1 AU 2001277756A1
Authority
AU
Australia
Prior art keywords
optical system
optical
illuminating
relay image
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001277756A
Inventor
Yutaka Suenaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001277756A1 publication Critical patent/AU2001277756A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001277756A 2000-08-11 2001-08-10 Relay image optical system, and illuminating optical device and exposure system provided with the optical system Abandoned AU2001277756A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-243546 2000-08-11
JP2000243546A JP2002055277A (en) 2000-08-11 2000-08-11 Relay image-formation optical system, and illumination optical device and exposure device equipped with the optical system
PCT/JP2001/006913 WO2002014924A1 (en) 2000-08-11 2001-08-10 Relay image optical system, and illuminating optical device and exposure system provided with the optical system

Publications (1)

Publication Number Publication Date
AU2001277756A1 true AU2001277756A1 (en) 2002-02-25

Family

ID=18734380

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001277756A Abandoned AU2001277756A1 (en) 2000-08-11 2001-08-10 Relay image optical system, and illuminating optical device and exposure system provided with the optical system

Country Status (6)

Country Link
US (1) US6856377B2 (en)
EP (1) EP1316832A4 (en)
JP (1) JP2002055277A (en)
AU (1) AU2001277756A1 (en)
TW (1) TW508655B (en)
WO (1) WO2002014924A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US7289277B2 (en) 2002-07-09 2007-10-30 Asml Holding N.V. Relay lens used in an illumination system of a lithography system
US7551361B2 (en) 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
JP2005301054A (en) 2004-04-14 2005-10-27 Canon Inc Illumination optical system and exposure apparatus using the same
US20070285644A1 (en) * 2004-09-13 2007-12-13 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US8873151B2 (en) 2005-04-26 2014-10-28 Carl Zeiss Smt Gmbh Illumination system for a microlithgraphic exposure apparatus
CN101479637B (en) * 2006-05-05 2011-09-21 康宁股份有限公司 Distortion tuning of a quasi-telecentric imaging lens
GB0800677D0 (en) * 2008-01-16 2008-02-20 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
JP6837194B2 (en) * 2017-01-20 2021-03-03 パナソニックＩｐマネジメント株式会社 Single focus lens system and camera

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266513A (en) * 1986-05-14 1987-11-19 Canon Inc Projecting exposure optical system
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
KR960006686B1 (en) 1991-02-22 1996-05-22 캐논 가부시기가이샤 Exposure apparatus device manufacturing method
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
JP2890892B2 (en) 1991-04-30 1999-05-17 キヤノン株式会社 Exposure apparatus and element manufacturing method using the same
US5585115A (en) * 1995-01-09 1996-12-17 Edward H. Mendell Co., Inc. Pharmaceutical excipient having improved compressability
US5631721A (en) 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
JPH0982631A (en) * 1995-09-14 1997-03-28 Nikon Corp Projection exposure device
DE19548805A1 (en) 1995-12-27 1997-07-03 Zeiss Carl Fa REMA lens for microlithography projection exposure systems
DE19653983A1 (en) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA lens for microlithography projection exposure systems
DE19809395A1 (en) * 1998-03-05 1999-09-09 Zeiss Carl Fa Illumination system and REMA lens with lens shift and operating method therefor
JP3234808B2 (en) 1998-03-13 2001-12-04 インターナショナル・ビジネス・マシーンズ・コーポレーション A method for generating a child agent based on a mobile agent, an object held by the mobile agent, a mobile agent existing in a place on the network, and a method for identifying a type of another mobile agent in which the mobile agent exists in the same place
JP2000098226A (en) * 1998-09-18 2000-04-07 Olympus Optical Co Ltd Relay optical system

Also Published As

Publication number Publication date
US6856377B2 (en) 2005-02-15
US20040070742A1 (en) 2004-04-15
TW508655B (en) 2002-11-01
WO2002014924A1 (en) 2002-02-21
EP1316832A1 (en) 2003-06-04
EP1316832A4 (en) 2006-08-09
JP2002055277A (en) 2002-02-20

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