AU2001273139A1 - Network-based photomask data entry interface and instruction generator for manufacturing photomasks - Google Patents

Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Info

Publication number
AU2001273139A1
AU2001273139A1 AU2001273139A AU7313901A AU2001273139A1 AU 2001273139 A1 AU2001273139 A1 AU 2001273139A1 AU 2001273139 A AU2001273139 A AU 2001273139A AU 7313901 A AU7313901 A AU 7313901A AU 2001273139 A1 AU2001273139 A1 AU 2001273139A1
Authority
AU
Australia
Prior art keywords
network
data entry
entry interface
instruction generator
photomask data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273139A
Inventor
Thomas T. Cogdell
Jan E. Gentry
Jeffry S. Schepp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Photomasks Inc
Original Assignee
DuPont Photomasks Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DuPont Photomasks Inc filed Critical DuPont Photomasks Inc
Publication of AU2001273139A1 publication Critical patent/AU2001273139A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/02—Marketing; Price estimation or determination; Fundraising
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/04—Billing or invoicing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/06—Buying, selling or leasing transactions
    • G06Q30/0601—Electronic shopping [e-shopping]
    • G06Q30/0603—Catalogue ordering
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04—Manufacturing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30—Computing systems specially adapted for manufacturing

Landscapes

  • Business, Economics & Management (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Development Economics (AREA)
  • Accounting & Taxation (AREA)
  • Finance (AREA)
  • Strategic Management (AREA)
  • Marketing (AREA)
  • General Business, Economics & Management (AREA)
  • Economics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Game Theory and Decision Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Entrepreneurship & Innovation (AREA)
  • General Health & Medical Sciences (AREA)
  • Human Resources & Organizations (AREA)
  • Primary Health Care (AREA)
  • Tourism & Hospitality (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
AU2001273139A 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks Abandoned AU2001273139A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/610,917 US6622295B1 (en) 2000-07-05 2000-07-05 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
US09/610,917 2000-07-05
PCT/US2001/021020 WO2002003141A2 (en) 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Publications (1)

Publication Number Publication Date
AU2001273139A1 true AU2001273139A1 (en) 2002-01-14

Family

ID=24446917

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273139A Abandoned AU2001273139A1 (en) 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Country Status (8)

Country Link
US (3) US6622295B1 (en)
EP (1) EP1297455A2 (en)
JP (1) JP4873678B2 (en)
CN (1) CN1251119C (en)
AU (1) AU2001273139A1 (en)
HK (1) HK1058090A1 (en)
TW (1) TWI226555B (en)
WO (1) WO2002003141A2 (en)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020156639A1 (en) * 2001-02-27 2002-10-24 Akira Ishikawa Business method for a digital photolithography system
US8090617B1 (en) * 2001-08-27 2012-01-03 Renesas Electronics America Inc. Determining if a potential customer is a desirable customer
JP2003091645A (en) * 2001-09-18 2003-03-28 Mitsubishi Electric Corp Sales method and sales management server for mask design data of photo mask
JP2003099634A (en) * 2001-09-21 2003-04-04 Toshiba Corp System and method for trading mask
NL1019594C2 (en) * 2001-12-18 2003-06-19 Neopost Ind B V Method, system and computer program for generating messages.
JP2003216231A (en) * 2002-01-18 2003-07-31 Hitachi Ltd Field monitoring and operating device
US6760640B2 (en) * 2002-03-14 2004-07-06 Photronics, Inc. Automated manufacturing system and method for processing photomasks
US7640529B2 (en) * 2002-07-30 2009-12-29 Photronics, Inc. User-friendly rule-based system and method for automatically generating photomask orders
US7669167B2 (en) * 2002-07-30 2010-02-23 Photronics, Inc. Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system
US6842881B2 (en) * 2002-07-30 2005-01-11 Photronics, Inc. Rule based system and method for automatically generating photomask orders in a specified order format
US7356374B2 (en) * 2002-03-15 2008-04-08 Photronics, Inc. Comprehensive front end method and system for automatically generating and processing photomask orders
JP2003295415A (en) * 2002-04-01 2003-10-15 Mitsubishi Electric Corp System for supply photomask
CN1679040A (en) * 2002-06-28 2005-10-05 杜邦光掩公司 Method and system for electronic order entry and automatic processing of photomask orders
EA008878B1 (en) * 2002-07-30 2007-08-31 Фотроникс, Инк. Rule based system and method for automatically generating photomask orders
JP2004128227A (en) * 2002-10-02 2004-04-22 Sanyo Electric Co Ltd Circuit device providing system and server computer
US7363236B2 (en) * 2003-03-14 2008-04-22 Chartered Semiconductor Manufacturing Ltd. System, apparatus and method for reticle grade and pricing management
US7069533B2 (en) * 2003-03-14 2006-06-27 Chatered Semiconductor Manufacturing, Ltd System, apparatus and method for automated tapeout support
DE102004007678B3 (en) * 2004-02-16 2005-09-15 Infineon Technologies Ag Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask
US8135915B2 (en) * 2004-03-22 2012-03-13 International Business Machines Corporation Method and apparatus for hardware assistance for prefetching a pointer to a data structure identified by a prefetch indicator
JP2006011951A (en) * 2004-06-28 2006-01-12 Seiko Epson Corp Semiconductor device order management support system and server for use therewith
US20060026549A1 (en) * 2004-07-27 2006-02-02 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for conducting an online transaction of multi-project wafer service
US7419748B1 (en) 2004-08-24 2008-09-02 Integrated Device Technology, Inc. Photomask with reduced electrostatic discharge defects
US20060122724A1 (en) * 2004-12-07 2006-06-08 Photoronics, Inc. 15 Secor Road P.O. Box 5226 Brookfield, Connecticut 06804 System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a photomask order
CN100367484C (en) * 2004-12-22 2008-02-06 盟图科技股份有限公司 Method and system for measuring width of junction in graph of mask designed
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
JP2006301396A (en) * 2005-04-22 2006-11-02 Shinko Electric Ind Co Ltd Charging device for direct drawing device
US20060271443A1 (en) * 2005-05-27 2006-11-30 Cahalane Daniel J System and method for automatically generating and/or processing a photomask order using a script profiler
WO2007035166A2 (en) * 2005-09-26 2007-03-29 Micronic Laser Systems Ab Methods and systems for pattern generation based on multiple forms of design data
US8826207B2 (en) * 2007-09-17 2014-09-02 Taiwan Semiconductor Manufacturing Company, Ltd. Method of generating technology file for integrated circuit design tools
US8849440B2 (en) * 2012-05-31 2014-09-30 International Business Machines Corporation Manufacturing control based on a final design structure incorporating both layout and client-specific manufacturing information
KR101930450B1 (en) 2017-05-31 2018-12-18 포항공과대학교 산학협력단 Mask manufacturing apparatus and, manufacturing method of mask and, mask for lithography

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US562801A (en) * 1896-06-30 Feed-water heater and purifier
JP2801970B2 (en) * 1991-01-08 1998-09-21 富士通株式会社 Generating exposure data
US5416722A (en) * 1992-11-19 1995-05-16 Vlsi Technology, Inc. System and method for compacting integrated circuit layouts
JPH06332150A (en) * 1993-05-19 1994-12-02 Mitsubishi Electric Corp Automatic processing system for mask data
AU670879B2 (en) * 1993-05-20 1996-08-01 Moore North America, Inc. Computer integration network for channeling customer orders through a centralized computer to various suppliers
JPH0749776A (en) 1993-08-05 1995-02-21 Hitachi Ltd Software reuse method
JP3288818B2 (en) * 1993-08-20 2002-06-04 ホーヤ株式会社 Drawing device drive system
US5416772A (en) 1993-08-20 1995-05-16 At&T Corp. Apparatus for insertion of overhead protocol data into a switched data stream
US5539975A (en) 1993-09-08 1996-07-30 Allen-Bradley Company, Inc. Control system and equipment configuration for a modular product assembly platform
JPH07287385A (en) * 1994-04-18 1995-10-31 Toshiba Corp Device for supporting mask pattern design
US5969973A (en) 1994-11-09 1999-10-19 Amada Company, Ltd. Intelligent system for generating and executing a sheet metal bending plan
US5553273A (en) * 1995-04-17 1996-09-03 International Business Machines Corporation Vertex minimization in a smart optical proximity correction system
US5844810A (en) * 1995-05-30 1998-12-01 General Electric Company Scaled adaptive lithography
US5920846A (en) 1996-02-27 1999-07-06 Southwestern Bell Telephone Co. Method and system for processing a service request relating to installation, maintenance or repair of telecommunications services provided to a customer premises
US6023565A (en) * 1996-03-29 2000-02-08 Xilinx, Inc. Method for configuring circuits over a data communications link
US5870719A (en) 1996-07-03 1999-02-09 Sun Microsystems, Inc. Platform-independent, usage-independent, and access-independent distributed quote configuraton system
JP3889091B2 (en) 1996-09-03 2007-03-07 三菱電機株式会社 Semiconductor development information integration system
US5825651A (en) 1996-09-03 1998-10-20 Trilogy Development Group, Inc. Method and apparatus for maintaining and configuring systems
JPH10149378A (en) * 1996-11-19 1998-06-02 Sony Corp Data processing method, mask pattern data processing method, data processor, and mask pattern data processor
JPH10223526A (en) * 1996-12-06 1998-08-21 Mitsubishi Electric Corp Method and system for generating charged beam lithographic data and mechanically readable medium storing program for executing lithographic data generation through computer
US5950201A (en) 1996-12-06 1999-09-07 International Business Machines Corporation Computerized design automation method using a single logical PFVL paradigm
US5732218A (en) 1997-01-02 1998-03-24 Lucent Technologies Inc. Management-data-gathering system for gathering on clients and servers data regarding interactions between the servers, the clients, and users of the clients during real use of a network of clients and servers
US6023699A (en) 1997-03-25 2000-02-08 Mci Communications Corporation Method for organizing a relational database used for storing data related to the configuration and placement of equipment in field sites
JPH10319571A (en) * 1997-05-21 1998-12-04 Sony Corp Manufacture of mask for exposure and its device
US6076080A (en) * 1997-11-04 2000-06-13 The Standard Register Company Forms order entry system
US6009406A (en) 1997-12-05 1999-12-28 Square D Company Methodology and computer-based tools for re-engineering a custom-engineered product line
US6003012A (en) 1997-12-05 1999-12-14 Square D Company Methodology and computer-based tools for design, production and sales of customized switchboards
US6154738A (en) * 1998-03-27 2000-11-28 Call; Charles Gainor Methods and apparatus for disseminating product information via the internet using universal product codes
US5963953A (en) 1998-03-30 1999-10-05 Siebel Systems, Inc. Method, and system for product configuration
US6330708B1 (en) * 1998-09-17 2001-12-11 International Business Machines Corporation Method for preparing command files for photomask production
FR2786000B1 (en) 1998-11-17 2001-02-16 Ciat Sa METHOD OF TRANSFERRING DATA BETWEEN A DESIGN SYSTEM AND A COMPUTER-ASSISTED MANUFACTURING SYSTEM, APPLICATION OF SUCH A METHOD AND INTERFACE BETWEEN SUCH SYSTEMS
US6529621B1 (en) * 1998-12-17 2003-03-04 Kla-Tencor Mechanisms for making and inspecting reticles
US6760640B2 (en) * 2002-03-14 2004-07-06 Photronics, Inc. Automated manufacturing system and method for processing photomasks
US6842881B2 (en) * 2002-07-30 2005-01-11 Photronics, Inc. Rule based system and method for automatically generating photomask orders in a specified order format

Also Published As

Publication number Publication date
WO2002003141A3 (en) 2002-08-15
WO2002003141A8 (en) 2003-11-06
JP2004502972A (en) 2004-01-29
JP4873678B2 (en) 2012-02-08
CN1251119C (en) 2006-04-12
CN1452749A (en) 2003-10-29
WO2002003141A2 (en) 2002-01-10
US20060074510A1 (en) 2006-04-06
TWI226555B (en) 2005-01-11
US6968530B2 (en) 2005-11-22
HK1058090A1 (en) 2004-04-30
EP1297455A2 (en) 2003-04-02
US6622295B1 (en) 2003-09-16
US7398509B2 (en) 2008-07-08
US20040054982A1 (en) 2004-03-18

Similar Documents

Publication Publication Date Title
AU2001273139A1 (en) Network-based photomask data entry interface and instruction generator for manufacturing photomasks
DE69931221D1 (en) SOI substrate and manufacturing method therefor
DE69918378D1 (en) Toner composition, manufacturing process and developer
AU2002233991A1 (en) Layout generator system and method
AU2003256531A1 (en) Method and system for context-specific mask writing
AU2002223185A1 (en) Method for developing business components
NO20003375D0 (en) Software Upgrade Automation Procedure
DE60104765D1 (en) Photomask blank and photomask
AUPQ998100A0 (en) Application development
DE60020737D1 (en) SIC-EINKRISTALL AND MANUFACTURING METHOD THEREFOR
DE60038189D1 (en) TONER AND PICTURE GENERATION METHOD
AU2002224117A1 (en) Improved water-developable photosensitive resin for flexography
SG101494A1 (en) Exposure method
AU2002250306A1 (en) Binary and phase-shift photomasks
DE60143113D1 (en) TONER AND MANUFACTURING PROCESS
AU2001241132A1 (en) Exposure controlling photomask and production method therefor
AU4291099A (en) Photomask and exposure method
AU2001242793A1 (en) Semiconductor device and fabrication method therefor
DE60025502D1 (en) SIC-EINKRISTALL AND MANUFACTURING METHOD THEREFOR
DE60024667D1 (en) SIC-EINKRISTALL AND MANUFACTURING METHOD THEREFOR
EP1340123A4 (en) Systems and methods for exposing substrate periphery
AU2002229132A1 (en) Manufacturing integrated circuits using phase-shifting masks
AU1687999A (en) Exposure method and scanning-type aligner
GB2370005B (en) Light protecting sheet and method for manufacturing the same
AU6646300A (en) Keyboard layout and method for data entry