AU2001271573A1 - A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers - Google Patents

A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers

Info

Publication number
AU2001271573A1
AU2001271573A1 AU2001271573A AU7157301A AU2001271573A1 AU 2001271573 A1 AU2001271573 A1 AU 2001271573A1 AU 2001271573 A AU2001271573 A AU 2001271573A AU 7157301 A AU7157301 A AU 7157301A AU 2001271573 A1 AU2001271573 A1 AU 2001271573A1
Authority
AU
Australia
Prior art keywords
mechanical polishing
chemical mechanical
polishing apparatus
semiconductor wafers
conditioning mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001271573A
Inventor
Erik Engdahl
Chris Frederickson
Jeff Gasparitsch
Gene Hemple
Michael Vogtmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of AU2001271573A1 publication Critical patent/AU2001271573A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/10—Devices or means for dressing or conditioning abrasive surfaces of travelling flexible backings coated with abrasives; Cleaning of abrasive belts
AU2001271573A 2000-06-30 2001-06-28 A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers Abandoned AU2001271573A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/607,743 US6645046B1 (en) 2000-06-30 2000-06-30 Conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers
US09607743 2000-06-30
PCT/US2001/020594 WO2002002277A2 (en) 2000-06-30 2001-06-28 A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers

Publications (1)

Publication Number Publication Date
AU2001271573A1 true AU2001271573A1 (en) 2002-01-14

Family

ID=24433538

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001271573A Abandoned AU2001271573A1 (en) 2000-06-30 2001-06-28 A conditioning mechanism in a chemical mechanical polishing apparatus for semiconductor wafers

Country Status (4)

Country Link
US (1) US6645046B1 (en)
AU (1) AU2001271573A1 (en)
TW (1) TW553800B (en)
WO (1) WO2002002277A2 (en)

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Publication number Priority date Publication date Assignee Title
US6306008B1 (en) * 1999-08-31 2001-10-23 Micron Technology, Inc. Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
US7544113B1 (en) * 2003-05-29 2009-06-09 Tbw Industries, Inc. Apparatus for controlling the forces applied to a vacuum-assisted pad conditioning system
SE526728C2 (en) * 2003-12-11 2005-11-01 Pergo Europ Ab A method of making panels with a decorative surface
CN101817162A (en) * 2004-01-26 2010-09-01 Tbw工业有限公司 Multi-step, in-situ pad conditioning system for chemical mechanical planarization
US6958005B1 (en) * 2004-03-30 2005-10-25 Lam Research Corporation Polishing pad conditioning system
US6969307B2 (en) * 2004-03-30 2005-11-29 Lam Research Corporation Polishing pad conditioning and polishing liquid dispersal system
US6935938B1 (en) 2004-03-31 2005-08-30 Lam Research Corporation Multiple-conditioning member device for chemical mechanical planarization conditioning
CA2614483A1 (en) 2005-07-09 2007-01-18 Tbw Industries Inc. Enhanced end effector arm arrangement for cmp pad conditioning
US20080236431A1 (en) 2007-03-28 2008-10-02 Pergo (Europe) Ab Process for Color Variability in Printing to Simulate Color Variation of Natural Product
EP2250033A2 (en) * 2008-01-09 2010-11-17 Flooring Industries Limited, SARL Panels and method for manufacturing
KR101126382B1 (en) * 2010-05-10 2012-03-28 주식회사 케이씨텍 Conditioner of chemical mechanical polishing system
CN108015674B (en) * 2016-11-04 2020-03-31 合肥京东方显示技术有限公司 Grinding device
GB2557952B (en) 2016-12-16 2022-06-15 Zeeko Innovations Ltd Methods and apparatus for shaping workpieces
KR102561647B1 (en) * 2018-05-28 2023-07-31 삼성전자주식회사 Conditioner and chemical mechanical polishing apparatus including the same
CN113798993B (en) * 2021-08-31 2022-09-02 杭州象限精密制造有限公司 Magnetic steel rotating clamping automatic feeding device
CN114290214B (en) * 2021-11-26 2022-11-22 杭州职业技术学院 Electrochemical mechanical precision polishing machine
CN114571327A (en) * 2022-05-05 2022-06-03 杭州荆鑫机械有限公司 Machining burnishing device

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US3753269A (en) 1971-05-21 1973-08-21 R Budman Abrasive cloth cleaner
US4318250A (en) 1980-03-31 1982-03-09 St. Florian Company, Ltd. Wafer grinder
US4720939A (en) 1986-05-23 1988-01-26 Simpson Products, Inc. Wide belt sander cleaning device
US4934102A (en) 1988-10-04 1990-06-19 International Business Machines Corporation System for mechanical planarization
JPH079896B2 (en) 1988-10-06 1995-02-01 信越半導体株式会社 Polishing equipment
US5081051A (en) 1990-09-12 1992-01-14 Intel Corporation Method for conditioning the surface of a polishing pad
EP0517594B1 (en) 1991-06-06 1995-12-13 Commissariat A L'energie Atomique Polishing machine with a tensioned finishing belt and an improved work supporting head
EP0609226A1 (en) 1991-07-22 1994-08-10 SMITH, Robert Keith Belt cleaner
US5456627A (en) 1993-12-20 1995-10-10 Westech Systems, Inc. Conditioner for a polishing pad and method therefor
US5547417A (en) 1994-03-21 1996-08-20 Intel Corporation Method and apparatus for conditioning a semiconductor polishing pad
US5622526A (en) 1994-03-28 1997-04-22 J. D. Phillips Corporation Apparatus for trueing CBN abrasive belts and grinding wheels
US5536202A (en) 1994-07-27 1996-07-16 Texas Instruments Incorporated Semiconductor substrate conditioning head having a plurality of geometries formed in a surface thereof for pad conditioning during chemical-mechanical polish
ATE186001T1 (en) 1994-08-09 1999-11-15 Ontrak Systems Inc LINEAR POLISHER AND WAFER PLANARISATION PROCESS
US5593344A (en) 1994-10-11 1997-01-14 Ontrak Systems, Inc. Wafer polishing machine with fluid bearings and drive systems
US5575707A (en) 1994-10-11 1996-11-19 Ontrak Systems, Inc. Polishing pad cluster for polishing a semiconductor wafer
US5643044A (en) 1994-11-01 1997-07-01 Lund; Douglas E. Automatic chemical and mechanical polishing system for semiconductor wafers
US5611943A (en) 1995-09-29 1997-03-18 Intel Corporation Method and apparatus for conditioning of chemical-mechanical polishing pads
US5655951A (en) 1995-09-29 1997-08-12 Micron Technology, Inc. Method for selectively reconditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
DE29606925U1 (en) 1996-04-17 1996-07-04 Friedr Aug Arnz Flott Gmbh & C Belt grinder with integrated belt cleaning device
US6312319B1 (en) 1997-04-04 2001-11-06 Timothy J. Donohue Polishing media magazine for improved polishing
US5885137A (en) * 1997-06-27 1999-03-23 Siemens Aktiengesellschaft Chemical mechanical polishing pad conditioner
US6036583A (en) * 1997-07-11 2000-03-14 Applied Materials, Inc. Conditioner head in a substrate polisher and method
US5941762A (en) 1998-01-07 1999-08-24 Ravkin; Michael A. Method and apparatus for improved conditioning of polishing pads
US6123607A (en) 1998-01-07 2000-09-26 Ravkin; Michael A. Method and apparatus for improved conditioning of polishing pads
US6042457A (en) * 1998-07-10 2000-03-28 Aplex, Inc. Conditioner assembly for a chemical mechanical polishing apparatus
US6086460A (en) 1998-11-09 2000-07-11 Lam Research Corporation Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization
US6283836B1 (en) * 1999-03-08 2001-09-04 Speedfam-Ipec Corporation Non-abrasive conditioning for polishing pads
US6306008B1 (en) * 1999-08-31 2001-10-23 Micron Technology, Inc. Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization
WO2001058644A1 (en) 2000-02-10 2001-08-16 Applied Materials, Inc. Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus

Also Published As

Publication number Publication date
TW553800B (en) 2003-09-21
WO2002002277A2 (en) 2002-01-10
US6645046B1 (en) 2003-11-11
WO2002002277A3 (en) 2002-05-16

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