AU2001270701A1 - High spatial resolution infrared ellipsometer - Google Patents
High spatial resolution infrared ellipsometerInfo
- Publication number
- AU2001270701A1 AU2001270701A1 AU2001270701A AU7070101A AU2001270701A1 AU 2001270701 A1 AU2001270701 A1 AU 2001270701A1 AU 2001270701 A AU2001270701 A AU 2001270701A AU 7070101 A AU7070101 A AU 7070101A AU 2001270701 A1 AU2001270701 A1 AU 2001270701A1
- Authority
- AU
- Australia
- Prior art keywords
- spatial resolution
- high spatial
- resolution infrared
- infrared ellipsometer
- ellipsometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/04—Polarimeters using electric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Spectrometry And Color Measurement (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0009318 | 2000-07-17 | ||
FR0009318A FR2811761B1 (en) | 2000-07-17 | 2000-07-17 | HIGH SPACE RESOLUTION ELLIPSOMETER OPERATING IN THE INFRARED |
PCT/FR2001/002072 WO2002006780A1 (en) | 2000-07-17 | 2001-06-28 | High spatial resolution infrared ellipsometer |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001270701A1 true AU2001270701A1 (en) | 2002-01-30 |
Family
ID=8852567
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001270701A Abandoned AU2001270701A1 (en) | 2000-07-17 | 2001-06-28 | High spatial resolution infrared ellipsometer |
AU2001276456A Abandoned AU2001276456A1 (en) | 2000-07-17 | 2001-07-16 | Compact spectroscopic ellipsometer |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001276456A Abandoned AU2001276456A1 (en) | 2000-07-17 | 2001-07-16 | Compact spectroscopic ellipsometer |
Country Status (7)
Country | Link |
---|---|
US (2) | US6819423B2 (en) |
EP (2) | EP1301764A1 (en) |
JP (2) | JP2004504591A (en) |
KR (2) | KR100846474B1 (en) |
AU (2) | AU2001270701A1 (en) |
FR (1) | FR2811761B1 (en) |
WO (2) | WO2002006780A1 (en) |
Families Citing this family (34)
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---|---|---|---|---|
DE102004012134B4 (en) * | 2004-03-12 | 2006-06-29 | Nanofilm Technologie Gmbh | Ellipsometer with aperture arrangement |
JP2009500851A (en) | 2005-07-05 | 2009-01-08 | マットソン テクノロジー インコーポレイテッド | Method and system for determining optical properties of a semiconductor wafer |
DE102005062180B3 (en) * | 2005-12-23 | 2007-01-04 | Gesellschaft zur Förderung der Analytischen Wissenschaften e.V. | Infrared ellipsometer has interferometer and sample holder with preceding polariser serving as interferometer beam splitter |
US7928390B1 (en) | 2007-09-06 | 2011-04-19 | Kla-Tencor Corporation | Infrared metrology |
JP2009210421A (en) * | 2008-03-04 | 2009-09-17 | Sony Corp | Terahertz spectrometer |
US8339603B1 (en) | 2008-10-03 | 2012-12-25 | J.A. Woollam Co., Inc. | Mapping ellipsometers and polarimeters comprising polarization state compensating beam directing means, and method of use |
US8467057B1 (en) | 2008-09-15 | 2013-06-18 | J.A. Woollam Co., Inc. | Ellipsometers and polarimeters comprising polarization state compensating beam directing sample wobble compensating system, and method of use |
US8169611B2 (en) | 2009-02-27 | 2012-05-01 | University Of Nebraska Board Of Regents | Terahertz-infrared ellipsometer system, and method of use |
US8416408B1 (en) | 2009-02-27 | 2013-04-09 | J.A. Woollam Co., Inc. | Terahertz-infrared ellipsometer system, and method of use |
US8934096B2 (en) | 2009-02-27 | 2015-01-13 | University Of Nebraska Board Of Regents | Terahertz-infrared ellipsometer system, and method of use |
US8736838B2 (en) | 2009-02-27 | 2014-05-27 | J.A. Woollam Co., Inc. | Terahertz ellipsometer system, and method of use |
US8488119B2 (en) | 2009-02-27 | 2013-07-16 | J.A. Woollam Co., Inc. | Terahertz-infrared ellipsometer system, and method of use |
JP5650733B2 (en) * | 2009-06-23 | 2015-01-07 | ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッドJ.A.Woollam Co.,Inc. | Terahertz infrared ellipsometer system and method of use thereof |
JP5534315B2 (en) * | 2010-03-01 | 2014-06-25 | 独立行政法人理化学研究所 | Physical property measuring apparatus, physical property measuring method and program |
DE102011078418A1 (en) * | 2011-06-30 | 2013-01-03 | Friedrich-Alexander-Universität Erlangen-Nürnberg | Device for examining permittivity of e.g. metallic, anisotropic two-layer dielectric sheet in non-destructive testing area, has processing unit for spatially-resolving image of object by changing focusing point from reflected signals |
CN104412079B (en) | 2012-05-09 | 2018-03-27 | 希捷科技有限公司 | Surface characteristics maps |
US9212900B2 (en) | 2012-08-11 | 2015-12-15 | Seagate Technology Llc | Surface features characterization |
US9297759B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Classification of surface features using fluorescence |
US9297751B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Chemical characterization of surface features |
US9377394B2 (en) | 2012-10-16 | 2016-06-28 | Seagate Technology Llc | Distinguishing foreign surface features from native surface features |
US9217714B2 (en) * | 2012-12-06 | 2015-12-22 | Seagate Technology Llc | Reflective surfaces for surface features of an article |
US9513215B2 (en) | 2013-05-30 | 2016-12-06 | Seagate Technology Llc | Surface features by azimuthal angle |
US9217715B2 (en) | 2013-05-30 | 2015-12-22 | Seagate Technology Llc | Apparatuses and methods for magnetic features of articles |
US9274064B2 (en) | 2013-05-30 | 2016-03-01 | Seagate Technology Llc | Surface feature manager |
US9201019B2 (en) | 2013-05-30 | 2015-12-01 | Seagate Technology Llc | Article edge inspection |
US10018815B1 (en) | 2014-06-06 | 2018-07-10 | J.A. Woolam Co., Inc. | Beam focusing and reflective optics |
US10338362B1 (en) | 2014-06-06 | 2019-07-02 | J.A. Woollam Co., Inc. | Beam focusing and reflecting optics with enhanced detector system |
US9921395B1 (en) | 2015-06-09 | 2018-03-20 | J.A. Woollam Co., Inc. | Beam focusing and beam collecting optics with wavelength dependent filter element adjustment of beam area |
US9442016B2 (en) | 2014-06-06 | 2016-09-13 | J.A. Woollam Co., Inc | Reflective focusing optics |
KR102313345B1 (en) | 2014-10-02 | 2021-10-15 | 삼성전자주식회사 | Broadband light source and optical inspector having the same |
KR102016452B1 (en) * | 2017-12-27 | 2019-08-30 | 한양대학교 에리카산학협력단 | Ellipsometer |
KR102029824B1 (en) * | 2018-04-11 | 2019-10-08 | 조선대학교산학협력단 | Multi channel optical profiler based on ellipsometry |
RU2688961C1 (en) * | 2018-07-06 | 2019-05-23 | Федеральное государственное унитарное предприятие "Центральный аэрогидродинамический институт имени профессора Н.Е. Жуковского" (ФГУП "ЦАГИ") | Device for measuring bidirectional infrared radiation brightness coefficient of materials |
US11035790B2 (en) * | 2018-12-31 | 2021-06-15 | Industrial Cooperation Foundation Chonbuk National University | Inspection apparatus and inspection method |
Family Cites Families (43)
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US3799679A (en) | 1972-06-27 | 1974-03-26 | Ppg Industries Inc | Glass distortion scanning system |
US3857637A (en) * | 1973-01-10 | 1974-12-31 | Ppg Industries Inc | Surface distortion analyzer |
JPS5414953B2 (en) | 1973-04-13 | 1979-06-11 | ||
US5329357A (en) * | 1986-03-06 | 1994-07-12 | Sopra-Societe De Production Et De Recherches Appliquees | Spectroscopic ellipsometry apparatus including an optical fiber |
FR2595471B1 (en) | 1986-03-06 | 1988-06-10 | Production Rech Appliquees | SPECTROSCOPIC FIBER OPTIC ELLIPSOMETRY DEVICE |
DE4013211A1 (en) | 1990-04-25 | 1991-10-31 | Fraunhofer Ges Forschung | ELLIPSOMETER |
FR2685962B1 (en) * | 1992-01-07 | 1994-05-20 | Centre Nal Recherc Scientifique | INFRARED ELLIPSOMETER. |
US5706212A (en) | 1996-03-20 | 1998-01-06 | Board Of Regents Of University Of Nebraska | Infrared ellipsometer/polarimeter system, method of calibration, and use thereof |
US5805285A (en) | 1992-09-18 | 1998-09-08 | J.A. Woollam Co. Inc. | Multiple order dispersive optics system and method of use |
US6353477B1 (en) * | 1992-09-18 | 2002-03-05 | J. A. Woollam Co. Inc. | Regression calibrated spectroscopic rotating compensator ellipsometer system with pseudo-achromatic retarder system |
US5764365A (en) | 1993-11-09 | 1998-06-09 | Nova Measuring Instruments, Ltd. | Two-dimensional beam deflector |
JP3311497B2 (en) * | 1994-06-29 | 2002-08-05 | 日本電子株式会社 | Fourier transform spectral phase modulation ellipsometry |
US5546179A (en) * | 1994-10-07 | 1996-08-13 | Cheng; David | Method and apparatus for mapping the edge and other characteristics of a workpiece |
US6088104A (en) | 1994-12-02 | 2000-07-11 | Veridian Erim International, Inc. | Surface characterization apparatus |
US5608526A (en) | 1995-01-19 | 1997-03-04 | Tencor Instruments | Focused beam spectroscopic ellipsometry method and system |
FR2737779B1 (en) | 1995-08-11 | 1997-09-12 | Soc D Production Et De Rech Ap | HIGH SPATIAL ELLIPSOMETER DEVICE |
US5638178A (en) * | 1995-09-01 | 1997-06-10 | Phase Metrics | Imaging polarimeter detector for measurement of small spacings |
US5963327A (en) | 1998-03-03 | 1999-10-05 | J.A. Woollam Co. Inc. | Total internal reflection electromagnetic radiation beam entry to, and exit from, ellipsometer, polarimeter, reflectometer and the like systems |
US5969818A (en) | 1998-03-03 | 1999-10-19 | J. A. Woollam Co. Inc. | Beam folding optics system and method of use with application in ellipsometry and polarimetry |
DE19547787C1 (en) * | 1995-12-20 | 1997-04-17 | Siemens Ag | Calibrating twin-jet laboratory gas analysis cuvette |
US5646733A (en) * | 1996-01-29 | 1997-07-08 | Medar, Inc. | Scanning phase measuring method and system for an object at a vision station |
JP3677868B2 (en) * | 1996-05-28 | 2005-08-03 | 松下電工株式会社 | Optical displacement measuring device |
US5877859A (en) * | 1996-07-24 | 1999-03-02 | Therma-Wave, Inc. | Broadband spectroscopic rotating compensator ellipsometer |
US5822035A (en) | 1996-08-30 | 1998-10-13 | Heidelberg Engineering Optische Messysteme Gmbh | Ellipsometer |
JPH10125753A (en) * | 1996-09-02 | 1998-05-15 | Murata Mfg Co Ltd | Method of measuring semiconductor carrier concn., manufacturing semiconductor device and semiconductor wafer |
US6166808A (en) | 1996-12-24 | 2000-12-26 | U.S. Philips Corporation | Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device |
US5859424A (en) * | 1997-04-08 | 1999-01-12 | Kla-Tencor Corporation | Apodizing filter system useful for reducing spot size in optical measurements and other applications |
WO1999002970A1 (en) * | 1997-07-11 | 1999-01-21 | Therma-Wave, Inc. | An apparatus for analyzing multi-layer thin film stacks on semiconductors |
US6031615A (en) | 1997-09-22 | 2000-02-29 | Candela Instruments | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness |
US6392749B1 (en) | 1997-09-22 | 2002-05-21 | Candela Instruments | High speed optical profilometer for measuring surface height variation |
JP3866849B2 (en) * | 1998-01-27 | 2007-01-10 | 大塚電子株式会社 | Ellipsometer |
US5917594A (en) * | 1998-04-08 | 1999-06-29 | Kla-Tencor Corporation | Spectroscopic measurement system using an off-axis spherical mirror and refractive elements |
EP0950881A3 (en) * | 1998-04-17 | 2000-08-16 | NanoPhotonics AG | Method and device for automatically positioning samples relative to an ellipsometer |
US6031614A (en) | 1998-12-02 | 2000-02-29 | Siemens Aktiengesellschaft | Measurement system and method for measuring critical dimensions using ellipsometry |
US6184984B1 (en) | 1999-02-09 | 2001-02-06 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
US6804003B1 (en) * | 1999-02-09 | 2004-10-12 | Kla-Tencor Corporation | System for analyzing surface characteristics with self-calibrating capability |
US6268916B1 (en) * | 1999-05-11 | 2001-07-31 | Kla-Tencor Corporation | System for non-destructive measurement of samples |
US6097482A (en) | 1999-06-08 | 2000-08-01 | Philip Morris Incorporated | High speed flaw detecting system for reflective material |
US6088092A (en) | 1999-06-21 | 2000-07-11 | Phase Metrics, Inc. | Glass substrate inspection apparatus |
US6710881B1 (en) * | 1999-09-28 | 2004-03-23 | Nanyang Technological University | Heterodyne interferometry for small spacing measurement |
US6469788B2 (en) * | 2000-03-27 | 2002-10-22 | California Institute Of Technology | Coherent gradient sensing ellipsometer |
US6787745B2 (en) | 2001-01-09 | 2004-09-07 | Avanex Corporation | Fiber optic signal detector with two switchable input channels |
US6856384B1 (en) * | 2001-12-13 | 2005-02-15 | Nanometrics Incorporated | Optical metrology system with combined interferometer and ellipsometer |
-
2000
- 2000-07-17 FR FR0009318A patent/FR2811761B1/en not_active Expired - Fee Related
-
2001
- 2001-06-28 KR KR1020037000770A patent/KR100846474B1/en not_active IP Right Cessation
- 2001-06-28 AU AU2001270701A patent/AU2001270701A1/en not_active Abandoned
- 2001-06-28 WO PCT/FR2001/002072 patent/WO2002006780A1/en active Application Filing
- 2001-06-28 EP EP01949572A patent/EP1301764A1/en not_active Ceased
- 2001-06-28 US US10/333,416 patent/US6819423B2/en not_active Expired - Lifetime
- 2001-06-28 JP JP2002512641A patent/JP2004504591A/en active Pending
- 2001-07-16 WO PCT/FR2001/002305 patent/WO2002006779A2/en active Application Filing
- 2001-07-16 EP EP01954108A patent/EP1301763A2/en not_active Ceased
- 2001-07-16 US US10/333,415 patent/US7230701B2/en not_active Expired - Fee Related
- 2001-07-16 AU AU2001276456A patent/AU2001276456A1/en not_active Abandoned
- 2001-07-16 KR KR10-2003-7000771A patent/KR20030026322A/en not_active Application Discontinuation
- 2001-07-16 JP JP2002512640A patent/JP2004504590A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR100846474B1 (en) | 2008-07-17 |
EP1301763A2 (en) | 2003-04-16 |
FR2811761B1 (en) | 2002-10-11 |
EP1301764A1 (en) | 2003-04-16 |
KR20030022292A (en) | 2003-03-15 |
US20040070760A1 (en) | 2004-04-15 |
US20040027571A1 (en) | 2004-02-12 |
AU2001276456A1 (en) | 2002-01-30 |
WO2002006780A1 (en) | 2002-01-24 |
JP2004504590A (en) | 2004-02-12 |
US7230701B2 (en) | 2007-06-12 |
US6819423B2 (en) | 2004-11-16 |
KR20030026322A (en) | 2003-03-31 |
FR2811761A1 (en) | 2002-01-18 |
JP2004504591A (en) | 2004-02-12 |
WO2002006779A3 (en) | 2002-03-28 |
WO2002006779A2 (en) | 2002-01-24 |
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