AU2001268577A1 - Etch stop layer system - Google Patents
Etch stop layer systemInfo
- Publication number
- AU2001268577A1 AU2001268577A1 AU2001268577A AU6857701A AU2001268577A1 AU 2001268577 A1 AU2001268577 A1 AU 2001268577A1 AU 2001268577 A AU2001268577 A AU 2001268577A AU 6857701 A AU6857701 A AU 6857701A AU 2001268577 A1 AU2001268577 A1 AU 2001268577A1
- Authority
- AU
- Australia
- Prior art keywords
- stop layer
- etch stop
- layer system
- etch
- stop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76256—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques using silicon etch back techniques, e.g. BESOI, ELTRAN
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/599,260 US6689211B1 (en) | 1999-04-09 | 2000-06-22 | Etch stop layer system |
US09599260 | 2000-06-22 | ||
PCT/US2001/019613 WO2001099169A2 (en) | 2000-06-22 | 2001-06-20 | Etch stop layer system for sige devices |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001268577A1 true AU2001268577A1 (en) | 2002-01-02 |
Family
ID=24398918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001268577A Abandoned AU2001268577A1 (en) | 2000-06-22 | 2001-06-20 | Etch stop layer system |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1295319A2 (en) |
JP (1) | JP2003536273A (en) |
AU (1) | AU2001268577A1 (en) |
WO (1) | WO2001099169A2 (en) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6602613B1 (en) | 2000-01-20 | 2003-08-05 | Amberwave Systems Corporation | Heterointegration of materials using deposition and bonding |
US6750130B1 (en) | 2000-01-20 | 2004-06-15 | Amberwave Systems Corporation | Heterointegration of materials using deposition and bonding |
US6555839B2 (en) | 2000-05-26 | 2003-04-29 | Amberwave Systems Corporation | Buried channel strained silicon FET using a supply layer created through ion implantation |
US6573126B2 (en) | 2000-08-16 | 2003-06-03 | Massachusetts Institute Of Technology | Process for producing semiconductor article using graded epitaxial growth |
US6724008B2 (en) | 2001-03-02 | 2004-04-20 | Amberwave Systems Corporation | Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits |
US6593641B1 (en) | 2001-03-02 | 2003-07-15 | Amberwave Systems Corporation | Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits |
EP1364411A1 (en) * | 2001-03-02 | 2003-11-26 | Amberwave Systems Corporation | Relaxed silicon germanium platform for high speed cmos electronics and high speed analog circuits |
US6830976B2 (en) | 2001-03-02 | 2004-12-14 | Amberwave Systems Corproation | Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits |
US6900103B2 (en) | 2001-03-02 | 2005-05-31 | Amberwave Systems Corporation | Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits |
WO2002082514A1 (en) * | 2001-04-04 | 2002-10-17 | Massachusetts Institute Of Technology | A method for semiconductor device fabrication |
US6855649B2 (en) * | 2001-06-12 | 2005-02-15 | International Business Machines Corporation | Relaxed SiGe layers on Si or silicon-on-insulator substrates by ion implantation and thermal annealing |
US6900094B2 (en) | 2001-06-14 | 2005-05-31 | Amberwave Systems Corporation | Method of selective removal of SiGe alloys |
JP2004531901A (en) | 2001-06-21 | 2004-10-14 | マサチューセッツ インスティテュート オブ テクノロジー | MOSFET with strained semiconductor layer |
US6730551B2 (en) | 2001-08-06 | 2004-05-04 | Massachusetts Institute Of Technology | Formation of planar strained layers |
US6974735B2 (en) | 2001-08-09 | 2005-12-13 | Amberwave Systems Corporation | Dual layer Semiconductor Devices |
US7138649B2 (en) | 2001-08-09 | 2006-11-21 | Amberwave Systems Corporation | Dual-channel CMOS transistors with differentially strained channels |
WO2003028106A2 (en) | 2001-09-24 | 2003-04-03 | Amberwave Systems Corporation | Rf circuits including transistors having strained material layers |
US6649492B2 (en) * | 2002-02-11 | 2003-11-18 | International Business Machines Corporation | Strained Si based layer made by UHV-CVD, and devices therein |
WO2003079415A2 (en) * | 2002-03-14 | 2003-09-25 | Amberwave Systems Corporation | Methods for fabricating strained layers on semiconductor substrates |
AU2003238963A1 (en) | 2002-06-07 | 2003-12-22 | Amberwave Systems Corporation | Semiconductor devices having strained dual channel layers |
US20030227057A1 (en) | 2002-06-07 | 2003-12-11 | Lochtefeld Anthony J. | Strained-semiconductor-on-insulator device structures |
US6982474B2 (en) | 2002-06-25 | 2006-01-03 | Amberwave Systems Corporation | Reacted conductive gate electrodes |
FR2842350B1 (en) * | 2002-07-09 | 2005-05-13 | METHOD FOR TRANSFERRING A LAYER OF CONCEALED SEMICONDUCTOR MATERIAL | |
FR2842349B1 (en) | 2002-07-09 | 2005-02-18 | TRANSFERRING A THIN LAYER FROM A PLATE COMPRISING A BUFFER LAYER | |
US7018910B2 (en) | 2002-07-09 | 2006-03-28 | S.O.I.Tec Silicon On Insulator Technologies S.A. | Transfer of a thin layer from a wafer comprising a buffer layer |
US6953736B2 (en) | 2002-07-09 | 2005-10-11 | S.O.I.Tec Silicon On Insulator Technologies S.A. | Process for transferring a layer of strained semiconductor material |
US7781850B2 (en) * | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
DE10260860B4 (en) * | 2002-12-23 | 2008-07-10 | Robert Bosch Gmbh | Layer of Si1-xGex, process for their preparation and micromechanical device with it |
US6808953B2 (en) * | 2002-12-31 | 2004-10-26 | Robert Bosch Gmbh | Gap tuning for surface micromachined structures in an epitaxial reactor |
US7176041B2 (en) * | 2003-07-01 | 2007-02-13 | Samsung Electronics Co., Ltd. | PAA-based etchant, methods of using same, and resultant structures |
US7495266B2 (en) | 2004-06-16 | 2009-02-24 | Massachusetts Institute Of Technology | Strained silicon-on-silicon by wafer bonding and layer transfer |
TWI283442B (en) | 2004-09-09 | 2007-07-01 | Sez Ag | Method for selective etching |
FR2892733B1 (en) * | 2005-10-28 | 2008-02-01 | Soitec Silicon On Insulator | RELAXATION OF LAYERS |
KR101316947B1 (en) | 2005-11-01 | 2013-10-15 | 메사추세츠 인스티튜트 오브 테크놀로지 | Monolithically integrated semiconductor materials and devices |
US8063397B2 (en) | 2006-06-28 | 2011-11-22 | Massachusetts Institute Of Technology | Semiconductor light-emitting structure and graded-composition substrate providing yellow-green light emission |
DE102010042570B4 (en) | 2010-10-18 | 2012-07-26 | Jörg Funke | Folding and partially dismountable bicycle |
US9093478B1 (en) | 2014-04-11 | 2015-07-28 | International Business Machines Corporation | Integrated circuit structure with bulk silicon FinFET and methods of forming |
US9842913B1 (en) | 2016-05-18 | 2017-12-12 | Globalfoundries Inc. | Integrated circuit fabrication with boron etch-stop layer |
FR3064398B1 (en) * | 2017-03-21 | 2019-06-07 | Soitec | SEMICONDUCTOR TYPE STRUCTURE ON INSULATION, ESPECIALLY FOR A FRONT-SIDE TYPE IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUCH STRUCTURE |
FR3125631A1 (en) * | 2021-07-23 | 2023-01-27 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE ON INSULATOR OF THE SOI OR SIGEOI TYPE BY REQUIREMENTS AND STRUCTURE FOR MANUFACTURING SUCH A SUBSTRATE |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5013681A (en) * | 1989-09-29 | 1991-05-07 | The United States Of America As Represented By The Secretary Of The Navy | Method of producing a thin silicon-on-insulator layer |
TW335558B (en) * | 1996-09-03 | 1998-07-01 | Ibm | High temperature superconductivity in strained SiSiGe |
US5906951A (en) * | 1997-04-30 | 1999-05-25 | International Business Machines Corporation | Strained Si/SiGe layers on insulator |
WO1999053539A1 (en) * | 1998-04-10 | 1999-10-21 | Massachusetts Institute Of Technology | Silicon-germanium etch stop layer system |
-
2001
- 2001-06-20 EP EP01946546A patent/EP1295319A2/en not_active Withdrawn
- 2001-06-20 AU AU2001268577A patent/AU2001268577A1/en not_active Abandoned
- 2001-06-20 WO PCT/US2001/019613 patent/WO2001099169A2/en active Application Filing
- 2001-06-20 JP JP2002503924A patent/JP2003536273A/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
WO2001099169A2 (en) | 2001-12-27 |
EP1295319A2 (en) | 2003-03-26 |
JP2003536273A (en) | 2003-12-02 |
WO2001099169A3 (en) | 2002-04-25 |
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