AU2001256997A1 - Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas - Google Patents

Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas

Info

Publication number
AU2001256997A1
AU2001256997A1 AU2001256997A AU5699701A AU2001256997A1 AU 2001256997 A1 AU2001256997 A1 AU 2001256997A1 AU 2001256997 A AU2001256997 A AU 2001256997A AU 5699701 A AU5699701 A AU 5699701A AU 2001256997 A1 AU2001256997 A1 AU 2001256997A1
Authority
AU
Australia
Prior art keywords
effluentscontaining
abatement
semiconductor manufacturing
fluorine gas
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001256997A
Inventor
Jose I. Arno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Technology Materials Inc
Original Assignee
Advanced Technology Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Technology Materials Inc filed Critical Advanced Technology Materials Inc
Publication of AU2001256997A1 publication Critical patent/AU2001256997A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B01D2251/202—Hydrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B01D2251/208—Hydrocarbons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/202—Single element halogens
    • B01D2257/2027—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • ing And Chemical Polishing (AREA)
AU2001256997A 2000-04-18 2001-04-09 Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas Abandoned AU2001256997A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09551279 2000-04-18
US09/551,279 US6905663B1 (en) 2000-04-18 2000-04-18 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas
PCT/US2001/011477 WO2001078873A1 (en) 2000-04-18 2001-04-09 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas

Publications (1)

Publication Number Publication Date
AU2001256997A1 true AU2001256997A1 (en) 2001-10-30

Family

ID=24200595

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001256997A Abandoned AU2001256997A1 (en) 2000-04-18 2001-04-09 Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas

Country Status (6)

Country Link
US (3) US6905663B1 (en)
EP (1) EP1274499A4 (en)
JP (1) JP2003530987A (en)
KR (1) KR20030031883A (en)
AU (1) AU2001256997A1 (en)
WO (1) WO2001078873A1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6905663B1 (en) * 2000-04-18 2005-06-14 Jose I. Arno Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas
US6936086B2 (en) * 2002-09-11 2005-08-30 Planar Systems, Inc. High conductivity particle filter
JP4629031B2 (en) * 2003-04-01 2011-02-09 株式会社荏原製作所 Exhaust gas treatment method and apparatus
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
JP4937548B2 (en) * 2005-08-23 2012-05-23 カンケンテクノ株式会社 Perfluorocarbon gas removal method and removal device
JP5102217B2 (en) 2005-10-31 2012-12-19 アプライド マテリアルズ インコーポレイテッド Process reduction reactor
KR101341360B1 (en) * 2006-03-07 2013-12-13 도아고세이가부시키가이샤 Method of making HCD gas harmless and apparatus therefor
JP6030278B2 (en) 2006-03-16 2016-11-24 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Method and apparatus for improving the operation of an electronic device manufacturing system
WO2008114363A1 (en) * 2007-03-16 2008-09-25 Fujitsu Microelectronics Limited Apparatus for producing semiconductor device and process for producing semiconductor device
WO2008147524A1 (en) * 2007-05-25 2008-12-04 Applied Materials, Inc. Methods and apparatus for efficient operation of an abatement system
WO2008156687A1 (en) * 2007-06-15 2008-12-24 Applied Materials, Inc. Methods and systems for designing and validating operation of abatement systems
CN101835521A (en) * 2007-10-26 2010-09-15 应用材料公司 Utilize the method and apparatus that is used for smart abatement that improves fuel circuit
US7901475B2 (en) * 2008-01-18 2011-03-08 Gm Global Technology Operations, Inc. Diesel particulate filter with zoned resistive heater
US20100286463A1 (en) * 2009-05-07 2010-11-11 Ideal Fluids, Inc. Process and Apparatus for the Pyrolytic Conversion of Organic Halides to Hydrogen Halides
US20110023908A1 (en) * 2009-07-30 2011-02-03 Applied Materials, Inc. Methods and apparatus for process abatement with recovery and reuse of abatement effluent
US9867238B2 (en) 2012-04-26 2018-01-09 Applied Materials, Inc. Apparatus for treating an exhaust gas in a foreline
WO2015134197A1 (en) * 2014-03-06 2015-09-11 Applied Materials, Inc. Plasma abatement of compounds containing heavy atoms
WO2020141642A1 (en) 2019-01-03 2020-07-09 주식회사 글로벌스탠다드테크놀로지 Hazardous gas treatment system based on plasma and dielectric heating catalyst
KR102462706B1 (en) * 2022-03-24 2022-11-04 주식회사 비에이치피 METHOD FOR REMOVING HF AND NOx FROM HARMFUL GAS EMITTED FROM SEMICONDUCTOR PROCESS

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO131825C (en) 1972-03-22 1975-08-13 Elkem Spigerverket As
US3845191A (en) * 1972-06-02 1974-10-29 Du Pont Method of removing halocarbons from gases
JPH0649086B2 (en) 1989-08-05 1994-06-29 三井・デュポンフロロケミカル株式会社 Catalytic decomposition of chlorofluoroalkanes
JPH0663357A (en) 1990-10-26 1994-03-08 Tosoh Corp Device for treating waste gas containing organic halogen compounds
DE4319118A1 (en) 1993-06-09 1994-12-15 Breitbarth Friedrich Wilhelm D Process and apparatus for disposing of fluorocarbons and other fluorine-containing compounds
DE4321762A1 (en) 1993-06-30 1995-01-12 Bayer Ag Process for cleaving C1 compounds containing fluorine and another halogen in the gas phase
US5759237A (en) 1996-06-14 1998-06-02 L'air Liquide Societe Anonyme Pour L'etude Et, L'exploitation Des Procedes Georges Claude Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases
US20010001652A1 (en) * 1997-01-14 2001-05-24 Shuichi Kanno Process for treating flourine compound-containing gas
DE69841726D1 (en) 1997-06-20 2010-07-29 Hitachi Ltd Process, catalyst and apparatus for decomposing fluorinated compounds
US6602480B1 (en) * 1998-08-17 2003-08-05 Ebara Corporation Method for treating waste gas containing fluorochemical
US6905663B1 (en) * 2000-04-18 2005-06-14 Jose I. Arno Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas

Also Published As

Publication number Publication date
US6905663B1 (en) 2005-06-14
US20050249643A1 (en) 2005-11-10
JP2003530987A (en) 2003-10-21
US20070274875A1 (en) 2007-11-29
KR20030031883A (en) 2003-04-23
WO2001078873A1 (en) 2001-10-25
EP1274499A1 (en) 2003-01-15
EP1274499A4 (en) 2004-08-25

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