AU2001253174A1 - Stand alone plasma vacuum pump - Google Patents

Stand alone plasma vacuum pump

Info

Publication number
AU2001253174A1
AU2001253174A1 AU2001253174A AU5317401A AU2001253174A1 AU 2001253174 A1 AU2001253174 A1 AU 2001253174A1 AU 2001253174 A AU2001253174 A AU 2001253174A AU 5317401 A AU5317401 A AU 5317401A AU 2001253174 A1 AU2001253174 A1 AU 2001253174A1
Authority
AU
Australia
Prior art keywords
vacuum pump
stand alone
plasma vacuum
alone plasma
stand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001253174A
Inventor
Raphael A. Dandl
Bill H. Quon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001253174A1 publication Critical patent/AU2001253174A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
AU2001253174A 2000-04-13 2001-04-06 Stand alone plasma vacuum pump Abandoned AU2001253174A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19692000P 2000-04-13 2000-04-13
US60/196,920 2000-04-13
PCT/US2001/011111 WO2001080281A2 (en) 2000-04-13 2001-04-06 Stand alone plasma vacuum pump

Publications (1)

Publication Number Publication Date
AU2001253174A1 true AU2001253174A1 (en) 2001-10-30

Family

ID=22727288

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001253174A Abandoned AU2001253174A1 (en) 2000-04-13 2001-04-06 Stand alone plasma vacuum pump

Country Status (4)

Country Link
JP (1) JP2003531465A (en)
AU (1) AU2001253174A1 (en)
TW (1) TW514700B (en)
WO (1) WO2001080281A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0309932D0 (en) * 2003-04-30 2003-06-04 Boc Group Plc Apparatus and method for forming a plasma
GB0502495D0 (en) 2005-02-07 2005-03-16 Boc Group Plc Ejector pump
TWI393489B (en) * 2009-06-17 2013-04-11 High density microwave and ultra high frequency mixed type plasma coating device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4641060A (en) * 1985-02-11 1987-02-03 Applied Microwave Plasma Concepts, Inc. Method and apparatus using electron cyclotron heated plasma for vacuum pumping
US5165861A (en) * 1990-05-16 1992-11-24 Microwave Plasma Products Inc. Magnetohydrodynamic vacuum pump
US5453125A (en) * 1994-02-17 1995-09-26 Krogh; Ole D. ECR plasma source for gas abatement
US5975855A (en) * 1996-12-03 1999-11-02 Microwave Plasma Products, Inc. Method and apparatus for increasing channel plasma density in an MHD vacuum pump

Also Published As

Publication number Publication date
WO2001080281A2 (en) 2001-10-25
WO2001080281A3 (en) 2002-08-22
JP2003531465A (en) 2003-10-21
TW514700B (en) 2002-12-21

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