AU2001252527A1 - A nanotube-based electron emission device and systems using the same - Google Patents

A nanotube-based electron emission device and systems using the same

Info

Publication number
AU2001252527A1
AU2001252527A1 AU2001252527A AU5252701A AU2001252527A1 AU 2001252527 A1 AU2001252527 A1 AU 2001252527A1 AU 2001252527 A AU2001252527 A AU 2001252527A AU 5252701 A AU5252701 A AU 5252701A AU 2001252527 A1 AU2001252527 A1 AU 2001252527A1
Authority
AU
Australia
Prior art keywords
nanotube
systems
same
electron emission
emission device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001252527A
Inventor
Guy Eitan
David Rosenblatt
Ory Zik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
El Mul Technologies Ltd
Original Assignee
El Mul Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by El Mul Technologies Ltd filed Critical El Mul Technologies Ltd
Publication of AU2001252527A1 publication Critical patent/AU2001252527A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles

Abstract

A device that produces an electron beam with high optical quality for processing a sample, is presented. The optical quality is manifested by very high brightness and low energy spread. The device includes an electron source device comprising an electrode in the form of a shaped first layer, preferably in the form of a conducting crater carrying at least one nanotube, and an extracting electrode, which is formed with at least one aperture and is insulated from the firs layer. The source can be used in any column that requires such properties. The column according to the invention may be a full size or a miniature electron microscope, a lithography tool, a tool used for direct writing of wafers or a field emission display.
AU2001252527A 2000-05-01 2001-04-30 A nanotube-based electron emission device and systems using the same Abandoned AU2001252527A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09561958 2000-05-01
US09/561,958 US6512235B1 (en) 2000-05-01 2000-05-01 Nanotube-based electron emission device and systems using the same
PCT/IL2001/000385 WO2001084130A2 (en) 2000-05-01 2001-04-30 A nanotube-based electron emission device and systems using the same

Publications (1)

Publication Number Publication Date
AU2001252527A1 true AU2001252527A1 (en) 2001-11-12

Family

ID=24244206

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001252527A Abandoned AU2001252527A1 (en) 2000-05-01 2001-04-30 A nanotube-based electron emission device and systems using the same

Country Status (8)

Country Link
US (1) US6512235B1 (en)
EP (1) EP1279183B1 (en)
JP (1) JP2003532274A (en)
AT (1) ATE321355T1 (en)
AU (1) AU2001252527A1 (en)
DE (1) DE60118170T2 (en)
IL (1) IL152568A0 (en)
WO (1) WO2001084130A2 (en)

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US20030178583A1 (en) * 2000-09-18 2003-09-25 Kampherbeek Bert Jan Field emission photo-cathode array for lithography system and lithography system provided with such an array
KR100421218B1 (en) * 2001-06-04 2004-03-02 삼성전자주식회사 Apparatus of electron emission lithography by using selectively grown carbon nanotube and lithography method thereof
TW516061B (en) * 2001-09-12 2003-01-01 Ind Tech Res Inst Manufacturing method for triode-type electron emitting source
US6979947B2 (en) * 2002-07-09 2005-12-27 Si Diamond Technology, Inc. Nanotriode utilizing carbon nanotubes and fibers
US7023622B2 (en) 2002-08-06 2006-04-04 Dmetrix, Inc. Miniature microscope objective lens
US7012266B2 (en) * 2002-08-23 2006-03-14 Samsung Electronics Co., Ltd. MEMS-based two-dimensional e-beam nano lithography device and method for making the same
US6864162B2 (en) * 2002-08-23 2005-03-08 Samsung Electronics Co., Ltd. Article comprising gated field emission structures with centralized nanowires and method for making the same
WO2004045267A2 (en) 2002-08-23 2004-06-03 The Regents Of The University Of California Improved microscale vacuum tube device and method for making same
US7113651B2 (en) 2002-11-20 2006-09-26 Dmetrix, Inc. Multi-spectral miniature microscope array
KR20060133974A (en) * 2003-10-16 2006-12-27 더 유니버시티 오브 아크론 Carbon nanotubes on carbon nanofiber substrate
US20050140261A1 (en) * 2003-10-23 2005-06-30 Pinchas Gilad Well structure with axially aligned field emission fiber or carbon nanotube and method for making same
US7181958B2 (en) * 2003-12-15 2007-02-27 University Of South Florida High aspect ratio tip atomic force microscopy cantilevers and method of manufacture
JP4279689B2 (en) * 2004-01-08 2009-06-17 株式会社荏原製作所 Electron beam equipment
US7838839B2 (en) * 2003-12-30 2010-11-23 Commissariat A L'energie Atomique Hybrid multibeam electronic emission device with controlled divergence
KR100562701B1 (en) * 2004-01-07 2006-03-23 삼성전자주식회사 Electron source, apparatus and method for inspecting non-opening of a hole using the same
JP4658490B2 (en) * 2004-02-26 2011-03-23 大研化学工業株式会社 Electron source and manufacturing method thereof
CN101006422A (en) * 2004-04-19 2007-07-25 索雷克核研究中心 High-speed, true random-number generator
US20060001350A1 (en) * 2004-06-30 2006-01-05 Hitachi High-Technologies Corporation Field emission electron gun and electron beam apparatus using the same
KR20060012782A (en) * 2004-08-04 2006-02-09 삼성에스디아이 주식회사 Field emission device and display adopting the same
US20080012461A1 (en) * 2004-11-09 2008-01-17 Nano-Proprietary, Inc. Carbon nanotube cold cathode
TWI248859B (en) * 2004-11-24 2006-02-11 Ind Tech Res Inst Manufacture of mold core used in nanoimprint
RU2406689C2 (en) * 2005-04-25 2010-12-20 Смольтек Аб Nanostructure, precursor of nanostructure and method of forming nanostructure and precursor of nanostructure
US20080067421A1 (en) * 2006-08-16 2008-03-20 Kuei-Wen Cheng Electron Beam Etching Apparatus and Method for the same
US8507785B2 (en) * 2007-11-06 2013-08-13 Pacific Integrated Energy, Inc. Photo induced enhanced field electron emission collector
KR101420244B1 (en) * 2008-05-20 2014-07-21 재단법인서울대학교산학협력재단 Beam forming electrode and electron gun using the same
WO2010052712A1 (en) * 2008-11-05 2010-05-14 El-Mul Technologies Ltd Charged particle emitting assembly
US8766522B1 (en) 2010-06-02 2014-07-01 The United States Of America As Represented By The Secretary Of The Air Force Carbon nanotube fiber cathode
KR20130129886A (en) 2010-06-08 2013-11-29 퍼시픽 인테그레이티드 에너지, 인크. Optical antennas with enhanced fields and electron emission
US9219885B2 (en) * 2011-08-24 2015-12-22 Delta Design, Inc. Imaging system with defocused and aperture-cropped light sources for detecting surface characteristics
JP7092470B2 (en) * 2017-07-24 2022-06-28 Ｎｅｃネットワーク・センサ株式会社 Electron gun

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DE4405768A1 (en) 1994-02-23 1995-08-24 Till Keesmann Field emission cathode device and method for its manufacture
US5731228A (en) 1994-03-11 1998-03-24 Fujitsu Limited Method for making micro electron beam source
JPH08339773A (en) * 1995-06-09 1996-12-24 Hitachi Ltd Electron source and electron beam device
AU5777096A (en) 1995-06-12 1997-01-09 Ecole Polytechnique Federale De Lausanne Electron source and applications of the same
US5872422A (en) 1995-12-20 1999-02-16 Advanced Technology Materials, Inc. Carbon fiber-based field emission devices
JP2873930B2 (en) * 1996-02-13 1999-03-24 工業技術院長 Carbonaceous solid structure having carbon nanotubes, electron emitter for electron beam source element composed of carbonaceous solid structure, and method of manufacturing carbonaceous solid structure
JP3008852B2 (en) * 1996-06-21 2000-02-14 日本電気株式会社 Electron emitting device and method of manufacturing the same
JP2000516708A (en) 1996-08-08 2000-12-12 ウィリアム・マーシュ・ライス・ユニバーシティ Macroscopically operable nanoscale devices fabricated from nanotube assemblies
US6057637A (en) 1996-09-13 2000-05-02 The Regents Of The University Of California Field emission electron source
KR100365444B1 (en) * 1996-09-18 2004-01-24 가부시끼가이샤 도시바 Vacuum micro device and image display device using the same
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JPH11233060A (en) * 1998-02-17 1999-08-27 Fujitsu Ltd Secondary-electron detector and electron beam device using the same
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JP3902883B2 (en) 1998-03-27 2007-04-11 キヤノン株式会社 Nanostructure and manufacturing method thereof
JP2000067736A (en) * 1998-08-14 2000-03-03 Sony Corp Electron emission element, its manufacture, and display device using the same
JP3497740B2 (en) 1998-09-09 2004-02-16 株式会社東芝 Method for producing carbon nanotube and method for producing field emission cold cathode device
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US6232706B1 (en) * 1998-11-12 2001-05-15 The Board Of Trustees Of The Leland Stanford Junior University Self-oriented bundles of carbon nanotubes and method of making same

Also Published As

Publication number Publication date
EP1279183A2 (en) 2003-01-29
DE60118170D1 (en) 2006-05-11
JP2003532274A (en) 2003-10-28
ATE321355T1 (en) 2006-04-15
WO2001084130A2 (en) 2001-11-08
DE60118170T2 (en) 2006-12-28
EP1279183B1 (en) 2006-03-22
IL152568A0 (en) 2003-05-29
WO2001084130A3 (en) 2002-06-13
US6512235B1 (en) 2003-01-28

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