AU2001250703A1 - Device for x-ray lithography - Google Patents
Device for x-ray lithographyInfo
- Publication number
- AU2001250703A1 AU2001250703A1 AU2001250703A AU2001250703A AU2001250703A1 AU 2001250703 A1 AU2001250703 A1 AU 2001250703A1 AU 2001250703 A AU2001250703 A AU 2001250703A AU 2001250703 A AU2001250703 A AU 2001250703A AU 2001250703 A1 AU2001250703 A1 AU 2001250703A1
- Authority
- AU
- Australia
- Prior art keywords
- ray lithography
- lithography
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2000133040 | 2000-12-29 | ||
RU2000133040/06A RU2187160C1 (en) | 2000-12-29 | 2000-12-29 | X-ray lithographer |
PCT/RU2001/000134 WO2002054413A1 (en) | 2000-12-29 | 2001-04-03 | Device for x-ray lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2001250703A1 true AU2001250703A1 (en) | 2003-01-23 |
AU2001250703B2 AU2001250703B2 (en) | 2004-06-24 |
Family
ID=20244173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001250703A Ceased AU2001250703B2 (en) | 2000-12-29 | 2001-04-03 | Device for x-ray lithography |
Country Status (11)
Country | Link |
---|---|
US (1) | US6865251B2 (en) |
EP (1) | EP1347461A4 (en) |
JP (1) | JP3640657B2 (en) |
KR (1) | KR100466444B1 (en) |
CN (1) | CN1166987C (en) |
AU (1) | AU2001250703B2 (en) |
CA (1) | CA2399878C (en) |
HK (1) | HK1052577B (en) |
RU (1) | RU2187160C1 (en) |
UA (1) | UA73569C2 (en) |
WO (1) | WO2002054413A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7609362B2 (en) * | 2004-11-08 | 2009-10-27 | Asml Netherlands B.V. | Scanning lithographic apparatus and device manufacturing method |
US7742566B2 (en) * | 2007-12-07 | 2010-06-22 | General Electric Company | Multi-energy imaging system and method using optic devices |
US8587768B2 (en) | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
JP6397690B2 (en) * | 2014-08-11 | 2018-09-26 | 株式会社日立ハイテクノロジーズ | X-ray transmission inspection apparatus and foreign object detection method |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4969169A (en) * | 1986-04-15 | 1990-11-06 | Hampshire Instruments, Inc. | X-ray lithography system |
SU1639313A1 (en) | 1989-05-16 | 1998-04-20 | В.Е. Кованцев | Quasi-parallel x-ray beam shaping device |
DE9117302U1 (en) * | 1990-10-31 | 1999-10-21 | X Ray Optical Sys Inc | Device for controlling rays of particles, X-rays and gamma rays and applications thereof |
US5175755A (en) * | 1990-10-31 | 1992-12-29 | X-Ray Optical System, Inc. | Use of a kumakhov lens for x-ray lithography |
US5497008A (en) * | 1990-10-31 | 1996-03-05 | X-Ray Optical Systems, Inc. | Use of a Kumakhov lens in analytic instruments |
US6271534B1 (en) * | 1994-07-08 | 2001-08-07 | Muradin Abubekirovich Kumakhov | Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles |
US5570408A (en) * | 1995-02-28 | 1996-10-29 | X-Ray Optical Systems, Inc. | High intensity, small diameter x-ray beam, capillary optic system |
US5745547A (en) * | 1995-08-04 | 1998-04-28 | X-Ray Optical Systems, Inc. | Multiple channel optic |
US5682415A (en) * | 1995-10-13 | 1997-10-28 | O'hara; David B. | Collimator for x-ray spectroscopy |
CN1069136C (en) * | 1996-02-17 | 2001-08-01 | 北京师范大学 | Integral X-ray lens and manufacturing method thereof and equipment using the same |
RU2122757C1 (en) | 1996-03-06 | 1998-11-27 | Артюков Игорь Анатольевич | X-ray lens |
RU2109358C1 (en) * | 1996-05-17 | 1998-04-20 | Московский государственный институт электроники и математики | X-ray flux control device and its manufacturing process |
JP2003528333A (en) * | 1999-07-21 | 2003-09-24 | ジェイ エム エー アール テクノロジー、インク | Collimator and focus optics |
-
2000
- 2000-12-29 RU RU2000133040/06A patent/RU2187160C1/en not_active IP Right Cessation
-
2001
- 2001-03-04 UA UA2002119465A patent/UA73569C2/en unknown
- 2001-04-03 EP EP01924033A patent/EP1347461A4/en not_active Withdrawn
- 2001-04-03 WO PCT/RU2001/000134 patent/WO2002054413A1/en active IP Right Grant
- 2001-04-03 JP JP2002555424A patent/JP3640657B2/en not_active Expired - Fee Related
- 2001-04-03 CN CNB01805739XA patent/CN1166987C/en not_active Expired - Fee Related
- 2001-04-03 KR KR10-2002-7010442A patent/KR100466444B1/en not_active IP Right Cessation
- 2001-04-03 AU AU2001250703A patent/AU2001250703B2/en not_active Ceased
- 2001-04-03 US US10/203,020 patent/US6865251B2/en not_active Expired - Fee Related
- 2001-04-03 CA CA002399878A patent/CA2399878C/en not_active Expired - Fee Related
-
2003
- 2003-07-03 HK HK03104736.8A patent/HK1052577B/en not_active IP Right Cessation
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