AU2001243289A1 - Method and apparatus for mixed-mode optical proximity correction - Google Patents

Method and apparatus for mixed-mode optical proximity correction

Info

Publication number
AU2001243289A1
AU2001243289A1 AU2001243289A AU4328901A AU2001243289A1 AU 2001243289 A1 AU2001243289 A1 AU 2001243289A1 AU 2001243289 A AU2001243289 A AU 2001243289A AU 4328901 A AU4328901 A AU 4328901A AU 2001243289 A1 AU2001243289 A1 AU 2001243289A1
Authority
AU
Australia
Prior art keywords
mixed
mode optical
optical proximity
proximity correction
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001243289A
Inventor
Fang-Cheng Chang
Ho Yong Park
Christophe Pierrat
Yao-Ting Wang
You-Ping Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Numerical Technologies Inc
Original Assignee
Numerical Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Numerical Technologies Inc filed Critical Numerical Technologies Inc
Publication of AU2001243289A1 publication Critical patent/AU2001243289A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Evolutionary Computation (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Lasers (AREA)
AU2001243289A 2000-02-28 2001-02-26 Method and apparatus for mixed-mode optical proximity correction Abandoned AU2001243289A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09514551 2000-02-28
US09/514,551 US6584609B1 (en) 2000-02-28 2000-02-28 Method and apparatus for mixed-mode optical proximity correction
PCT/US2001/006144 WO2001065315A2 (en) 2000-02-28 2001-02-26 Method and apparatus for mixed-mode optical proximity correction

Publications (1)

Publication Number Publication Date
AU2001243289A1 true AU2001243289A1 (en) 2001-09-12

Family

ID=24047688

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001243289A Abandoned AU2001243289A1 (en) 2000-02-28 2001-02-26 Method and apparatus for mixed-mode optical proximity correction

Country Status (5)

Country Link
US (2) US6584609B1 (en)
EP (1) EP1264213B1 (en)
JP (1) JP4947533B2 (en)
AU (1) AU2001243289A1 (en)
WO (1) WO2001065315A2 (en)

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Also Published As

Publication number Publication date
US6584609B1 (en) 2003-06-24
US20030097647A1 (en) 2003-05-22
JP4947533B2 (en) 2012-06-06
EP1264213B1 (en) 2015-09-23
EP1264213A2 (en) 2002-12-11
WO2001065315A3 (en) 2002-04-04
US6988259B2 (en) 2006-01-17
JP2003525470A (en) 2003-08-26
WO2001065315A2 (en) 2001-09-07

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