AU2001237770A1 - Plasma polymerization system and method for plasma polymerization - Google Patents
Plasma polymerization system and method for plasma polymerizationInfo
- Publication number
- AU2001237770A1 AU2001237770A1 AU2001237770A AU3777001A AU2001237770A1 AU 2001237770 A1 AU2001237770 A1 AU 2001237770A1 AU 2001237770 A AU2001237770 A AU 2001237770A AU 3777001 A AU3777001 A AU 3777001A AU 2001237770 A1 AU2001237770 A1 AU 2001237770A1
- Authority
- AU
- Australia
- Prior art keywords
- plasma polymerization
- polymerization system
- plasma
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/145—After-treatment
- B05D3/148—After-treatment affecting the surface properties of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000012101A KR20010088089A (en) | 2000-03-10 | 2000-03-10 | Method of improving hydrophile in plasma polymerization system |
KR0012101 | 2000-03-10 | ||
PCT/KR2001/000322 WO2001066824A1 (en) | 2000-03-10 | 2001-03-02 | Plasma polymerization system and method for plasma polymerization |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001237770A1 true AU2001237770A1 (en) | 2001-09-17 |
Family
ID=19654057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001237770A Abandoned AU2001237770A1 (en) | 2000-03-10 | 2001-03-02 | Plasma polymerization system and method for plasma polymerization |
Country Status (8)
Country | Link |
---|---|
US (1) | US20030221950A1 (en) |
EP (1) | EP1264005A4 (en) |
JP (1) | JP2003525979A (en) |
KR (1) | KR20010088089A (en) |
CN (1) | CN1219912C (en) |
AU (1) | AU2001237770A1 (en) |
MX (1) | MXPA02008855A (en) |
WO (1) | WO2001066824A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1354640A1 (en) * | 2002-04-19 | 2003-10-22 | Dürr Systems GmbH | Process and apparatus for hardening a coating |
JP2015188895A (en) * | 2014-03-27 | 2015-11-02 | 三菱マテリアル株式会社 | Pressure roll |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3475307A (en) * | 1965-02-04 | 1969-10-28 | Continental Can Co | Condensation of monomer vapors to increase polymerization rates in a glow discharge |
US4588641A (en) * | 1983-11-22 | 1986-05-13 | Olin Corporation | Three-step plasma treatment of copper foils to enhance their laminate adhesion |
JPS63186862A (en) * | 1987-01-28 | 1988-08-02 | Nisshin Steel Co Ltd | Formation of organic thin film on metallic base material |
JP2811820B2 (en) * | 1989-10-30 | 1998-10-15 | 株式会社ブリヂストン | Continuous surface treatment method and apparatus for sheet material |
JP2952950B2 (en) * | 1990-04-06 | 1999-09-27 | エヌオーケー株式会社 | Surface treatment method for fluoropolymer molded article |
FR2692598B1 (en) * | 1992-06-17 | 1995-02-10 | Air Liquide | Method for depositing a film containing silicon on the surface of a metal substrate and anti-corrosion treatment method. |
FR2704558B1 (en) * | 1993-04-29 | 1995-06-23 | Air Liquide | METHOD AND DEVICE FOR CREATING A DEPOSIT OF SILICON OXIDE ON A SOLID TRAVELING SUBSTRATE. |
FR2711556B1 (en) * | 1993-10-29 | 1995-12-15 | Atohaas Holding Cv | A method of depositing a thin layer on the surface of a plastic substrate. |
ZA951048B (en) * | 1994-02-16 | 1995-10-12 | Coca Cola Co | Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
JPH0822960A (en) * | 1994-07-08 | 1996-01-23 | Hitachi Ltd | Plasma film forming equipment and forming method |
US5783641A (en) * | 1995-04-19 | 1998-07-21 | Korea Institute Of Science And Technology | Process for modifying surfaces of polymers, and polymers having surfaces modified by such process |
DE19709673C2 (en) * | 1997-03-11 | 2001-01-04 | Heraeus Kulzer Gmbh & Co Kg | Surface treatment processes |
FR2770425B1 (en) * | 1997-11-05 | 1999-12-17 | Air Liquide | METHOD AND DEVICE FOR THE SURFACE TREATMENT OF A SUBSTRATE BY ELECTRIC SHOCK BETWEEN TWO ELECTRODES IN A GAS MIXTURE |
KR19990047370A (en) * | 1997-12-04 | 1999-07-05 | 구자홍 | Refrigeration and air conditioning metal materials with improved hydrophilicity or hydrophobicity of the surface and methods for improving the same |
-
2000
- 2000-03-10 KR KR1020000012101A patent/KR20010088089A/en not_active Application Discontinuation
-
2001
- 2001-03-02 US US10/221,239 patent/US20030221950A1/en not_active Abandoned
- 2001-03-02 EP EP01910190A patent/EP1264005A4/en not_active Withdrawn
- 2001-03-02 AU AU2001237770A patent/AU2001237770A1/en not_active Abandoned
- 2001-03-02 WO PCT/KR2001/000322 patent/WO2001066824A1/en active Application Filing
- 2001-03-02 CN CNB018063802A patent/CN1219912C/en not_active Expired - Fee Related
- 2001-03-02 JP JP2001565425A patent/JP2003525979A/en active Pending
- 2001-03-02 MX MXPA02008855A patent/MXPA02008855A/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20010088089A (en) | 2001-09-26 |
EP1264005A4 (en) | 2005-04-13 |
MXPA02008855A (en) | 2003-02-10 |
CN1416477A (en) | 2003-05-07 |
WO2001066824A1 (en) | 2001-09-13 |
EP1264005A1 (en) | 2002-12-11 |
US20030221950A1 (en) | 2003-12-04 |
JP2003525979A (en) | 2003-09-02 |
CN1219912C (en) | 2005-09-21 |
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