AU2000277597A1 - Virtual gauging system and method for lithography - Google Patents
Virtual gauging system and method for lithographyInfo
- Publication number
- AU2000277597A1 AU2000277597A1 AU2000277597A AU7759700A AU2000277597A1 AU 2000277597 A1 AU2000277597 A1 AU 2000277597A1 AU 2000277597 A AU2000277597 A AU 2000277597A AU 7759700 A AU7759700 A AU 7759700A AU 2000277597 A1 AU2000277597 A1 AU 2000277597A1
- Authority
- AU
- Australia
- Prior art keywords
- lithography
- gauging system
- virtual
- virtual gauging
- gauging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2000/040635 WO2002014955A1 (en) | 2000-08-15 | 2000-08-15 | Virtual gauging system and method for lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2000277597A1 true AU2000277597A1 (en) | 2002-02-25 |
Family
ID=21742137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2000277597A Abandoned AU2000277597A1 (en) | 2000-08-15 | 2000-08-15 | Virtual gauging system and method for lithography |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2000277597A1 (en) |
WO (1) | WO2002014955A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1777728A1 (en) * | 2005-10-20 | 2007-04-25 | Carl Zeiss SMS GmbH | Lithography system |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
-
2000
- 2000-08-15 AU AU2000277597A patent/AU2000277597A1/en not_active Abandoned
- 2000-08-15 WO PCT/US2000/040635 patent/WO2002014955A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2002014955A1 (en) | 2002-02-21 |
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