AU2000267902A1 - Method and apparatus for chemical vapor deposition of polysilicon - Google Patents
Method and apparatus for chemical vapor deposition of polysiliconInfo
- Publication number
- AU2000267902A1 AU2000267902A1 AU2000267902A AU6790200A AU2000267902A1 AU 2000267902 A1 AU2000267902 A1 AU 2000267902A1 AU 2000267902 A AU2000267902 A AU 2000267902A AU 6790200 A AU6790200 A AU 6790200A AU 2000267902 A1 AU2000267902 A1 AU 2000267902A1
- Authority
- AU
- Australia
- Prior art keywords
- tube
- base plate
- reactor
- chamber
- chemical vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Silicon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The production of bulk polysilicon by a chemical vapor deposition process on a tube section. A quartz envelope (31) and a base plate (34) form a CVD reactor enclosure, with external radiant heaters (33) providing heat through the wall of the reactor, and with gas inlet (35) and outlet (36) ports located in base plate (34). A tube section (32), preferably an EFG silicon tube section, vertically emplaced on base plate (34) and capped (43) to close the top is used as the reaction chamber. Deposition occurs on the inside surface of the chamber tube (32), the inner diameter of the deposit layer becoming increasingly smaller as the yield accumulates. In a two tube reactor, vertical middle tube (46) is supported inside the chamber tube for full flow of process gas over and under the middle tube (46) so that deposition occurs on the three exposed tube surfaces.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/507,711 US6284312B1 (en) | 1999-02-19 | 2000-02-18 | Method and apparatus for chemical vapor deposition of polysilicon |
US09507711 | 2000-02-18 | ||
US18497000P | 2000-02-25 | 2000-02-25 | |
US60184970 | 2000-02-25 | ||
PCT/US2000/022842 WO2001061070A1 (en) | 2000-02-18 | 2000-08-17 | Method and apparatus for chemical vapor deposition of polysilicon |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2000267902A1 true AU2000267902A1 (en) | 2001-08-27 |
Family
ID=26880657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2000267902A Abandoned AU2000267902A1 (en) | 2000-02-18 | 2000-08-17 | Method and apparatus for chemical vapor deposition of polysilicon |
Country Status (11)
Country | Link |
---|---|
EP (1) | EP1257684B1 (en) |
JP (1) | JP2003522716A (en) |
CN (1) | CN1364203A (en) |
AT (1) | ATE350508T1 (en) |
AU (1) | AU2000267902A1 (en) |
CA (1) | CA2386382A1 (en) |
CZ (1) | CZ20021297A3 (en) |
DE (2) | DE1257684T1 (en) |
NO (1) | NO20016269L (en) |
SK (1) | SK5872002A3 (en) |
WO (1) | WO2001061070A1 (en) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6874713B2 (en) | 2002-08-22 | 2005-04-05 | Dow Corning Corporation | Method and apparatus for improving silicon processing efficiency |
CN100467665C (en) * | 2002-12-24 | 2009-03-11 | 西北工业大学 | Container internal surface chemical vapor depositon coating method |
AU2004265173B2 (en) * | 2003-08-13 | 2010-05-27 | Tokuyama Corporation | Tubular reaction vessel and process for producing silicon therewith |
US20050287806A1 (en) * | 2004-06-24 | 2005-12-29 | Hiroyuki Matsuura | Vertical CVD apparatus and CVD method using the same |
DE102004038717A1 (en) * | 2004-08-10 | 2006-02-23 | Joint Solar Silicon Gmbh & Co. Kg | Production process for reactor for the decomposition of gases |
US20080206970A1 (en) * | 2005-04-10 | 2008-08-28 | Franz Hugo | Production Of Polycrystalline Silicon |
TWI465600B (en) * | 2005-07-19 | 2014-12-21 | Rec Silicon Inc | Silicon spout-fluidized bed |
JP4905638B2 (en) * | 2005-10-11 | 2012-03-28 | 三菱マテリアル株式会社 | Electrode short-circuit prevention method and short-circuit prevention plate |
JP4692247B2 (en) * | 2005-11-29 | 2011-06-01 | チッソ株式会社 | Method for producing high-purity polycrystalline silicon |
CN100395373C (en) * | 2006-03-31 | 2008-06-18 | 南京大学 | Growth appts. of Chemical gaseous phase deposition |
FR2900226B1 (en) * | 2006-04-25 | 2017-09-29 | Messier Bugatti | PROCESSING OVEN OR THE LIKE |
US9683286B2 (en) * | 2006-04-28 | 2017-06-20 | Gtat Corporation | Increased polysilicon deposition in a CVD reactor |
DE102006040486A1 (en) * | 2006-08-30 | 2008-03-13 | Wacker Chemie Ag | Non-destructive testing of high purity polycrystalline silicon |
US20100276002A1 (en) * | 2007-09-20 | 2010-11-04 | Nuofu Chen | Process and apparatus for producing polysilicon sheets |
CN101224888B (en) * | 2007-10-23 | 2010-05-19 | 四川永祥多晶硅有限公司 | Silicon mandrel heating starting method for polysilicon hydrogen reduction furnace |
SE532505C2 (en) | 2007-12-12 | 2010-02-09 | Plasmatrix Materials Ab | Method for plasma activated chemical vapor deposition and plasma decomposition unit |
CN101559948B (en) * | 2008-03-10 | 2014-02-26 | 安奕极电源系统有限责任公司 | Device and method for producing a uniform temperature distribution in silicon rods during a precipitation process |
CN101241955B (en) * | 2008-03-13 | 2010-06-09 | 江苏林洋新能源有限公司 | Special device for multi-crystal silicon film solar battery |
JP5604803B2 (en) * | 2008-03-28 | 2014-10-15 | 三菱マテリアル株式会社 | Polymer deactivation method in polycrystalline silicon production equipment |
DE102008026811B4 (en) | 2008-06-05 | 2012-04-12 | Centrotherm Sitec Gmbh | Method and arrangement for melting silicon |
CN101760778B (en) * | 2008-12-31 | 2011-12-14 | 江苏中能硅业科技发展有限公司 | Method for manufacturing semiconductor material bar |
FI122940B (en) * | 2009-02-09 | 2012-09-14 | Beneq Oy | reaction chamber |
CN101555012B (en) * | 2009-05-08 | 2011-01-12 | 六九硅业有限公司 | Method for preparing polycrystalline silicon |
DE102009021825B3 (en) | 2009-05-18 | 2010-08-05 | Kgt Graphit Technologie Gmbh | Pick-up cone for silicon seed rods |
CN101759182B (en) * | 2009-09-28 | 2011-12-14 | 江苏中能硅业科技发展有限公司 | Method for manufacturing polysilicon |
CN101830467B (en) * | 2010-03-11 | 2012-05-23 | 化学工业第二设计院宁波工程有限公司 | Polycrystalline silicon decomposing furnace |
DE102010032103B4 (en) * | 2010-07-23 | 2012-07-26 | Centrotherm Sitec Gmbh | Method and apparatus for igniting silicon rods outside a CVD reactor |
TWI477646B (en) * | 2010-08-09 | 2015-03-21 | Hon Hai Prec Ind Co Ltd | Chemical vapor deposition device |
CN101966991B (en) * | 2010-10-20 | 2012-07-18 | 上海森松压力容器有限公司 | Polycrystalline silicon producing device |
TWI506163B (en) * | 2012-07-13 | 2015-11-01 | Epistar Corp | Reactive apparatus for vapor deposition and carrier thereof |
CN104233225B (en) * | 2013-06-17 | 2017-03-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and semiconductor treating equipment with same |
US11015244B2 (en) | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
KR101768279B1 (en) * | 2014-09-29 | 2017-08-30 | 주식회사 엘지화학 | Apparatus and method for producing polycrystalline silicon using horizontal reactor |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4123989A (en) * | 1977-09-12 | 1978-11-07 | Mobil Tyco Solar Energy Corp. | Manufacture of silicon on the inside of a tube |
US4681652A (en) * | 1980-06-05 | 1987-07-21 | Rogers Leo C | Manufacture of polycrystalline silicon |
US4653428A (en) * | 1985-05-10 | 1987-03-31 | General Electric Company | Selective chemical vapor deposition apparatus |
US4657616A (en) * | 1985-05-17 | 1987-04-14 | Benzing Technologies, Inc. | In-situ CVD chamber cleaner |
US5389152A (en) * | 1992-10-09 | 1995-02-14 | Avco Corporation | Apparatus for densification of porous billets |
US6284312B1 (en) * | 1999-02-19 | 2001-09-04 | Gt Equipment Technologies Inc | Method and apparatus for chemical vapor deposition of polysilicon |
-
2000
- 2000-08-17 CA CA002386382A patent/CA2386382A1/en not_active Abandoned
- 2000-08-17 AT AT00955754T patent/ATE350508T1/en not_active IP Right Cessation
- 2000-08-17 CZ CZ20021297A patent/CZ20021297A3/en unknown
- 2000-08-17 AU AU2000267902A patent/AU2000267902A1/en not_active Abandoned
- 2000-08-17 EP EP00955754A patent/EP1257684B1/en not_active Expired - Lifetime
- 2000-08-17 DE DE1257684T patent/DE1257684T1/en active Pending
- 2000-08-17 JP JP2001559903A patent/JP2003522716A/en active Pending
- 2000-08-17 CN CN00810694.0A patent/CN1364203A/en active Pending
- 2000-08-17 DE DE60032813T patent/DE60032813T2/en not_active Expired - Lifetime
- 2000-08-17 SK SK587-2002A patent/SK5872002A3/en unknown
- 2000-08-17 WO PCT/US2000/022842 patent/WO2001061070A1/en active IP Right Grant
-
2001
- 2001-12-20 NO NO20016269A patent/NO20016269L/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
CA2386382A1 (en) | 2001-08-23 |
NO20016269D0 (en) | 2001-12-20 |
ATE350508T1 (en) | 2007-01-15 |
DE60032813D1 (en) | 2007-02-15 |
EP1257684A4 (en) | 2005-06-08 |
EP1257684B1 (en) | 2007-01-03 |
CZ20021297A3 (en) | 2002-11-13 |
CN1364203A (en) | 2002-08-14 |
NO20016269L (en) | 2002-01-03 |
EP1257684A1 (en) | 2002-11-20 |
DE1257684T1 (en) | 2003-06-26 |
DE60032813T2 (en) | 2007-11-08 |
WO2001061070A1 (en) | 2001-08-23 |
JP2003522716A (en) | 2003-07-29 |
SK5872002A3 (en) | 2003-06-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2000267902A1 (en) | Method and apparatus for chemical vapor deposition of polysilicon | |
US6755151B2 (en) | Hot-filament chemical vapor deposition chamber and process with multiple gas inlets | |
JP4916119B2 (en) | Equipment for reducing white powder during silicon nitride deposition using remote plasma source cleaning technology | |
JP2679833B2 (en) | Improvement of reaction chamber and chemical vapor deposition | |
JP5727362B2 (en) | System and method for flowing gas through a chemical vapor deposition reactor | |
KR20030042614A (en) | Multi-sectored flat board type showerhead used in cvd apparatus | |
JPH0728963U (en) | Chemical vapor deposition equipment | |
IE811017L (en) | Chemical vapor deposition of films on silicon wafers | |
CN103569998A (en) | Device and method for preparing carbon nanotube | |
CN105239057B (en) | Microwave plasma CVD device | |
WO2010042237A3 (en) | Method and apparatus for simplified startup of chemical vapor deposition of polysilicon | |
US5888303A (en) | Gas inlet apparatus and method for chemical vapor deposition reactors | |
KR101842373B1 (en) | Process for operating a fluidized bed reactor | |
EP1081756A3 (en) | A method for producing silicon nitride series film | |
US4651673A (en) | CVD apparatus | |
US4518455A (en) | CVD Process | |
CN205152329U (en) | Sectional type graphite carbonization vapour deposition stove for silicone coating | |
JP6717632B2 (en) | Vapor deposition processing equipment | |
MY132166A (en) | Method for tuning barrel reactor purge system | |
CN104211066B (en) | A kind of Preparation equipment of silica flour | |
JP3611780B2 (en) | Semiconductor manufacturing equipment | |
JPS5976870A (en) | Formation of oxide film by chemical vapor deposition | |
KR20020011510A (en) | Single wafer type chemical vapor deposition equipment and method of forming a thin film using the same | |
JPS61289623A (en) | Vapor-phase reaction device | |
CN208562517U (en) | A kind of novel chemical vapor deposition stove |