AU2000240799A1 - Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension - Google Patents

Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension

Info

Publication number
AU2000240799A1
AU2000240799A1 AU2000240799A AU2000240799A AU2000240799A1 AU 2000240799 A1 AU2000240799 A1 AU 2000240799A1 AU 2000240799 A AU2000240799 A AU 2000240799A AU 2000240799 A AU2000240799 A AU 2000240799A AU 2000240799 A1 AU2000240799 A1 AU 2000240799A1
Authority
AU
Australia
Prior art keywords
article
composition
colloidal suspension
particle aggregation
mask deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000240799A
Inventor
James J. Hoffman
David H. Wells
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micron Technology Inc
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of AU2000240799A1 publication Critical patent/AU2000240799A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cold Cathode And The Manufacture (AREA)
AU2000240799A 2000-04-06 2000-04-06 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension Abandoned AU2000240799A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/009365 WO2004010229A1 (en) 2000-04-06 2000-04-06 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension

Publications (1)

Publication Number Publication Date
AU2000240799A1 true AU2000240799A1 (en) 2004-03-04

Family

ID=30769009

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000240799A Abandoned AU2000240799A1 (en) 2000-04-06 2000-04-06 Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension

Country Status (2)

Country Link
AU (1) AU2000240799A1 (en)
WO (1) WO2004010229A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006025121A1 (en) * 2006-05-30 2007-12-06 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Representation of micro- and nanopore mass arrangements by self-assembly of nanoparticles and sublimation technique
US9136794B2 (en) 2011-06-22 2015-09-15 Research Triangle Institute, International Bipolar microelectronic device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407695A (en) * 1981-12-31 1983-10-04 Exxon Research And Engineering Co. Natural lithographic fabrication of microstructures over large areas
US5536193A (en) * 1991-11-07 1996-07-16 Microelectronics And Computer Technology Corporation Method of making wide band gap field emitter
US5702281A (en) * 1995-04-20 1997-12-30 Industrial Technology Research Institute Fabrication of two-part emitter for gated field emission device
FR2737928B1 (en) * 1995-08-17 1997-09-12 Commissariat Energie Atomique DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMICROMETRIC ZONES IN A PHOTOSENSITIVE LAYER AND METHOD FOR PRODUCING PATTERNS IN SUCH A LAYER
US5727977A (en) * 1996-03-04 1998-03-17 Motorola, Inc. Process for manufacturing a field-emission device
US6037104A (en) * 1998-09-01 2000-03-14 Micron Display Technology, Inc. Methods of forming semiconductor devices and methods of forming field emission displays

Also Published As

Publication number Publication date
WO2004010229A1 (en) 2004-01-29

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 9, PAGE(S) 2544 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAMES WELLS, DAVID, H. ; HOFFMAN, JAMES, J. AND MICRON TECHNOLOGY, INC., APPLICATION NO. 2000240799, UNDER INID (43) CORRECT THE DATE TO READ 09.02.2004