AU2000240799A1 - Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension - Google Patents
Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspensionInfo
- Publication number
- AU2000240799A1 AU2000240799A1 AU2000240799A AU2000240799A AU2000240799A1 AU 2000240799 A1 AU2000240799 A1 AU 2000240799A1 AU 2000240799 A AU2000240799 A AU 2000240799A AU 2000240799 A AU2000240799 A AU 2000240799A AU 2000240799 A1 AU2000240799 A1 AU 2000240799A1
- Authority
- AU
- Australia
- Prior art keywords
- article
- composition
- colloidal suspension
- particle aggregation
- mask deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2000/009365 WO2004010229A1 (en) | 2000-04-06 | 2000-04-06 | Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2000240799A1 true AU2000240799A1 (en) | 2004-03-04 |
Family
ID=30769009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2000240799A Abandoned AU2000240799A1 (en) | 2000-04-06 | 2000-04-06 | Method, article and composition for limiting particle aggregation in a mask deposited by a colloidal suspension |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2000240799A1 (en) |
WO (1) | WO2004010229A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006025121A1 (en) * | 2006-05-30 | 2007-12-06 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Representation of micro- and nanopore mass arrangements by self-assembly of nanoparticles and sublimation technique |
US9136794B2 (en) | 2011-06-22 | 2015-09-15 | Research Triangle Institute, International | Bipolar microelectronic device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4407695A (en) * | 1981-12-31 | 1983-10-04 | Exxon Research And Engineering Co. | Natural lithographic fabrication of microstructures over large areas |
US5536193A (en) * | 1991-11-07 | 1996-07-16 | Microelectronics And Computer Technology Corporation | Method of making wide band gap field emitter |
US5702281A (en) * | 1995-04-20 | 1997-12-30 | Industrial Technology Research Institute | Fabrication of two-part emitter for gated field emission device |
FR2737928B1 (en) * | 1995-08-17 | 1997-09-12 | Commissariat Energie Atomique | DEVICE FOR INSOLATING MICROMETRIC AND / OR SUBMICROMETRIC ZONES IN A PHOTOSENSITIVE LAYER AND METHOD FOR PRODUCING PATTERNS IN SUCH A LAYER |
US5727977A (en) * | 1996-03-04 | 1998-03-17 | Motorola, Inc. | Process for manufacturing a field-emission device |
US6037104A (en) * | 1998-09-01 | 2000-03-14 | Micron Display Technology, Inc. | Methods of forming semiconductor devices and methods of forming field emission displays |
-
2000
- 2000-04-06 AU AU2000240799A patent/AU2000240799A1/en not_active Abandoned
- 2000-04-06 WO PCT/US2000/009365 patent/WO2004010229A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2004010229A1 (en) | 2004-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase | ||
TH | Corrigenda |
Free format text: IN VOL 18, NO 9, PAGE(S) 2544 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAMES WELLS, DAVID, H. ; HOFFMAN, JAMES, J. AND MICRON TECHNOLOGY, INC., APPLICATION NO. 2000240799, UNDER INID (43) CORRECT THE DATE TO READ 09.02.2004 |