ATE89086T1 - Lagerstabile photopolymerisierbare zusammensetzung fuer die aufzeichnung von beugungsbildern. - Google Patents

Lagerstabile photopolymerisierbare zusammensetzung fuer die aufzeichnung von beugungsbildern.

Info

Publication number
ATE89086T1
ATE89086T1 AT89100496T AT89100496T ATE89086T1 AT E89086 T1 ATE89086 T1 AT E89086T1 AT 89100496 T AT89100496 T AT 89100496T AT 89100496 T AT89100496 T AT 89100496T AT E89086 T1 ATE89086 T1 AT E89086T1
Authority
AT
Austria
Prior art keywords
storage stable
photopolymerizable composition
diffraction images
recording diffraction
stable photopolymerizable
Prior art date
Application number
AT89100496T
Other languages
English (en)
Inventor
William Karl Smothers
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE89086T1 publication Critical patent/ATE89086T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
AT89100496T 1988-01-15 1989-01-12 Lagerstabile photopolymerisierbare zusammensetzung fuer die aufzeichnung von beugungsbildern. ATE89086T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14428188A 1988-01-15 1988-01-15
EP89100496A EP0324481B1 (de) 1988-01-15 1989-01-12 Lagerstabile photopolymerisierbare Zusammensetzung für die Aufzeichnung von Beugungsbildern

Publications (1)

Publication Number Publication Date
ATE89086T1 true ATE89086T1 (de) 1993-05-15

Family

ID=22507886

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89100496T ATE89086T1 (de) 1988-01-15 1989-01-12 Lagerstabile photopolymerisierbare zusammensetzung fuer die aufzeichnung von beugungsbildern.

Country Status (8)

Country Link
EP (1) EP0324481B1 (de)
KR (1) KR890012190A (de)
CN (1) CN1035004A (de)
AT (1) ATE89086T1 (de)
AU (1) AU603499B2 (de)
BR (1) BR8900155A (de)
DE (1) DE68906270T2 (de)
HK (1) HK84293A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213915A (en) * 1989-05-19 1993-05-25 Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry Holographic recording material and method for holographic recording
GB2264118B (en) * 1992-02-07 1996-01-10 Sericol Ltd Radiation-curable compositions
US6017681A (en) * 1992-11-09 2000-01-25 Fujitsu Limited Method of coupling optical parts and method of forming a mirror
KR0126247B1 (en) * 1992-11-09 1997-12-26 Fujitsu Ltd Method of coupling optical parts and refractive index imaging material
CN116444972B (zh) * 2023-04-18 2025-04-01 江苏万新光学有限公司 一种镜片用防蓝光聚碳酸酯基树脂组合物及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE755251A (fr) * 1969-08-25 1971-02-25 Du Pont Enregistrement holographique dans des couches photopoly- merisables
US3993485A (en) * 1975-05-27 1976-11-23 Bell Telephone Laboratories, Incorporated Photopolymerization process and related devices
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
US4604342A (en) * 1984-03-17 1986-08-05 E. I. Du Pont De Nemours And Company Photopolymerizable mixture and recording material produced from it

Also Published As

Publication number Publication date
KR890012190A (ko) 1989-08-25
DE68906270D1 (de) 1993-06-09
AU603499B2 (en) 1990-11-15
EP0324481A2 (de) 1989-07-19
BR8900155A (pt) 1989-09-12
EP0324481B1 (de) 1993-05-05
HK84293A (en) 1993-08-27
CN1035004A (zh) 1989-08-23
DE68906270T2 (de) 1993-11-18
EP0324481A3 (en) 1989-09-27
AU2848189A (en) 1989-07-20

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