ATE553227T1 - Targethalterung mit einer kühleinrichtung - Google Patents

Targethalterung mit einer kühleinrichtung

Info

Publication number
ATE553227T1
ATE553227T1 AT06119488T AT06119488T ATE553227T1 AT E553227 T1 ATE553227 T1 AT E553227T1 AT 06119488 T AT06119488 T AT 06119488T AT 06119488 T AT06119488 T AT 06119488T AT E553227 T1 ATE553227 T1 AT E553227T1
Authority
AT
Austria
Prior art keywords
target
cooling device
target holder
liquid
chamber
Prior art date
Application number
AT06119488T
Other languages
English (en)
Inventor
Wuu-Jyh Lin
Mao-Hsung Chang
Ping-Yen Huang
Jenn-Tzong Chen
Ting-Shien Duh
Dow-Che Chen
Kuo-Yuan Chu
Original Assignee
Atomic Energy Council
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomic Energy Council filed Critical Atomic Energy Council
Application granted granted Critical
Publication of ATE553227T1 publication Critical patent/ATE553227T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT06119488T 2006-08-24 2006-08-24 Targethalterung mit einer kühleinrichtung ATE553227T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06119488A EP1892314B1 (de) 2006-08-24 2006-08-24 Targethalterung mit einer Kühleinrichtung

Publications (1)

Publication Number Publication Date
ATE553227T1 true ATE553227T1 (de) 2012-04-15

Family

ID=37734973

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06119488T ATE553227T1 (de) 2006-08-24 2006-08-24 Targethalterung mit einer kühleinrichtung

Country Status (2)

Country Link
EP (1) EP1892314B1 (de)
AT (1) ATE553227T1 (de)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE13561T1 (de) * 1980-08-08 1985-06-15 Battelle Development Corp Zylindrische magnetron-zerstaeuberkathode.
US4434042A (en) * 1982-03-01 1984-02-28 The Board Of Trustees Of The Leland Stanford Junior University Planar magnetron sputtering apparatus
WO1998037568A1 (en) 1997-02-24 1998-08-27 Novellus Systems, Inc. Internally cooled target assembly for magnetron sputtering

Also Published As

Publication number Publication date
EP1892314B1 (de) 2012-04-11
EP1892314A1 (de) 2008-02-27

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