ATE532208T1 - Linearer gasphasen-diffusionsofen - Google Patents

Linearer gasphasen-diffusionsofen

Info

Publication number
ATE532208T1
ATE532208T1 AT09400026T AT09400026T ATE532208T1 AT E532208 T1 ATE532208 T1 AT E532208T1 AT 09400026 T AT09400026 T AT 09400026T AT 09400026 T AT09400026 T AT 09400026T AT E532208 T1 ATE532208 T1 AT E532208T1
Authority
AT
Austria
Prior art keywords
diffusion
substrates
hot zone
doping
dopant
Prior art date
Application number
AT09400026T
Other languages
English (en)
Inventor
Uwe Scheit
Original Assignee
Roth & Rau Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roth & Rau Ag filed Critical Roth & Rau Ag
Application granted granted Critical
Publication of ATE532208T1 publication Critical patent/ATE532208T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
AT09400026T 2009-05-29 2009-05-29 Linearer gasphasen-diffusionsofen ATE532208T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP09400026A EP2276057B1 (de) 2009-05-29 2009-05-29 Linearer Gasphasen-Diffusionsofen

Publications (1)

Publication Number Publication Date
ATE532208T1 true ATE532208T1 (de) 2011-11-15

Family

ID=41059720

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09400026T ATE532208T1 (de) 2009-05-29 2009-05-29 Linearer gasphasen-diffusionsofen

Country Status (4)

Country Link
EP (1) EP2276057B1 (de)
AT (1) ATE532208T1 (de)
TW (1) TW201117269A (de)
WO (1) WO2010136902A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012103710A1 (de) 2012-04-27 2013-10-31 Roth & Rau Ag Modulare Durchlauf-Plasmabearbeitungsanlage
CN105428226B (zh) * 2015-10-29 2017-12-15 晋能清洁能源科技有限公司 一种管式POCl3扩散方阻自动调整方法
DE102018004086A1 (de) 2018-05-18 2019-11-21 Singulus Technologies Ag Durchlaufanlage und Verfahren zum Beschichten von Substraten
CN112582498A (zh) * 2019-09-30 2021-03-30 中国电子科技集团公司第四十八研究所 一种连续式生产晶体硅太阳能电池的方法
CN112382589A (zh) * 2020-11-10 2021-02-19 泉芯集成电路制造(济南)有限公司 一种去除芯片表面氧化硅的装置及方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62166624U (de) * 1986-04-14 1987-10-22
US5324684A (en) 1992-02-25 1994-06-28 Ag Processing Technologies, Inc. Gas phase doping of semiconductor material in a cold-wall radiantly heated reactor under reduced pressure
US6117266A (en) 1997-12-19 2000-09-12 Interuniversifair Micro-Elektronica Cenirum (Imec Vzw) Furnace for continuous, high throughput diffusion processes from various diffusion sources
JP2004163020A (ja) 2002-11-14 2004-06-10 Koyo Thermo System Kk 加熱炉

Also Published As

Publication number Publication date
EP2276057A1 (de) 2011-01-19
EP2276057B1 (de) 2011-11-02
WO2010136902A1 (en) 2010-12-02
TW201117269A (en) 2011-05-16

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