ATE487166T1 - Prozess zur herstellung einer polymerischen relief struktur - Google Patents

Prozess zur herstellung einer polymerischen relief struktur

Info

Publication number
ATE487166T1
ATE487166T1 AT08759973T AT08759973T ATE487166T1 AT E487166 T1 ATE487166 T1 AT E487166T1 AT 08759973 T AT08759973 T AT 08759973T AT 08759973 T AT08759973 T AT 08759973T AT E487166 T1 ATE487166 T1 AT E487166T1
Authority
AT
Austria
Prior art keywords
relief structure
making
radiation
polymeric relief
coating composition
Prior art date
Application number
AT08759973T
Other languages
English (en)
Inventor
Jolke Perelaer
Ko Hermans
Cornelis Wilhelmus Maria Bastiaansen
Ulrich Sigmar Schubert
Original Assignee
Stichting Dutch Polymer Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stichting Dutch Polymer Inst filed Critical Stichting Dutch Polymer Inst
Application granted granted Critical
Publication of ATE487166T1 publication Critical patent/ATE487166T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
AT08759973T 2007-06-11 2008-05-23 Prozess zur herstellung einer polymerischen relief struktur ATE487166T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07109998A EP2019336A1 (de) 2007-06-11 2007-06-11 Verfahren zur Herstellung einer Polymerreliefstruktur
PCT/EP2008/056373 WO2008151915A1 (en) 2007-06-11 2008-05-23 Process for preparing a polymeric relief structure

Publications (1)

Publication Number Publication Date
ATE487166T1 true ATE487166T1 (de) 2010-11-15

Family

ID=38626528

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08759973T ATE487166T1 (de) 2007-06-11 2008-05-23 Prozess zur herstellung einer polymerischen relief struktur

Country Status (6)

Country Link
US (1) US20100279074A1 (de)
EP (2) EP2019336A1 (de)
JP (1) JP2010532394A (de)
AT (1) ATE487166T1 (de)
DE (1) DE602008003333D1 (de)
WO (1) WO2008151915A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2109005A1 (de) * 2008-04-07 2009-10-14 Stichting Dutch Polymer Institute Verfahren zur Herstellung einer Polymerreliefstruktur
WO2012025316A1 (en) * 2010-08-26 2012-03-01 Asml Netherlands B.V. Imprint lithography method and imprintable medium
EP2592477A1 (de) * 2011-11-14 2013-05-15 Stichting Dutch Polymer Institute Durchgehendes Verfahren zur Herstellung eines Substrats mit Reliefsstruktur
JP5579217B2 (ja) * 2012-03-27 2014-08-27 富士フイルム株式会社 平版印刷版原版
EP3114189B1 (de) * 2014-03-04 2018-07-04 Nanoco Technologies Ltd Verfahren zur herstellung von quantenpunkt-polymerfolien

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10228108A (ja) * 1997-02-17 1998-08-25 Hitachi Chem Co Ltd 感光性組成物、感光材料、レリーフパターンの製造法及びポリイミドパターンの製造法
US20040101782A1 (en) * 2002-11-27 2004-05-27 General Electric Company Method for making optical device structures
EP1649319A1 (de) * 2003-07-17 2006-04-26 Koninklijke Philips Electronics N.V. Methode zur herstellung eines reflektors und flüssigkristallanzeige, die einen solchen reflektor beinhaltet
TWI275597B (en) * 2003-08-05 2007-03-11 Ind Tech Res Inst Resin with low polydispersity index, and preparation process, and use thereof
CA2556684A1 (en) * 2004-02-19 2005-09-01 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
CA2790003C (en) * 2004-10-04 2014-03-11 The University Of Sydney Surface polymerisation process and polymer product using raft agent
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
WO2006086841A1 (en) * 2005-02-15 2006-08-24 Rpo Pty Limited Photolithographic patterning of polymeric materials
US7677877B2 (en) * 2005-11-04 2010-03-16 Asml Netherlands B.V. Imprint lithography
DE602007011639D1 (de) * 2006-08-21 2011-02-10 Koninkl Philips Electronics Nv Methode zur Herstellung einer versiegelten Zellstruktur
EP2256788A4 (de) * 2008-03-07 2011-03-30 Showa Denko Kk Uv-nanoimprintverfahren, harzabdruckform und herstellungsverfahren dafür, magnetisches aufzeichnungsmedium und verfahren zu seiner herstellung sowie magnetisches aufzeichnungs-/wiedergabegerät

Also Published As

Publication number Publication date
EP2156247A1 (de) 2010-02-24
DE602008003333D1 (de) 2010-12-16
WO2008151915A1 (en) 2008-12-18
EP2019336A1 (de) 2009-01-28
US20100279074A1 (en) 2010-11-04
JP2010532394A (ja) 2010-10-07
EP2156247B1 (de) 2010-11-03

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