ATE437253T1 - Vorrichtung für gasphasenabscheidung - Google Patents

Vorrichtung für gasphasenabscheidung

Info

Publication number
ATE437253T1
ATE437253T1 AT04026770T AT04026770T ATE437253T1 AT E437253 T1 ATE437253 T1 AT E437253T1 AT 04026770 T AT04026770 T AT 04026770T AT 04026770 T AT04026770 T AT 04026770T AT E437253 T1 ATE437253 T1 AT E437253T1
Authority
AT
Austria
Prior art keywords
coating material
deposition chamber
deposition
cleanroom
pyrolized
Prior art date
Application number
AT04026770T
Other languages
English (en)
Inventor
Dennis R Christensen
Original Assignee
Specialty Coating Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Specialty Coating Systems Inc filed Critical Specialty Coating Systems Inc
Application granted granted Critical
Publication of ATE437253T1 publication Critical patent/ATE437253T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Crystal (AREA)
AT04026770T 2003-11-12 2004-11-11 Vorrichtung für gasphasenabscheidung ATE437253T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/706,239 US7163586B2 (en) 2003-11-12 2003-11-12 Vapor deposition apparatus

Publications (1)

Publication Number Publication Date
ATE437253T1 true ATE437253T1 (de) 2009-08-15

Family

ID=34435626

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04026770T ATE437253T1 (de) 2003-11-12 2004-11-11 Vorrichtung für gasphasenabscheidung

Country Status (4)

Country Link
US (1) US7163586B2 (de)
EP (1) EP1531189B1 (de)
AT (1) ATE437253T1 (de)
DE (1) DE602004022122D1 (de)

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FI119478B (fi) * 2005-04-22 2008-11-28 Beneq Oy Reaktori
US20070209433A1 (en) * 2006-03-10 2007-09-13 Honeywell International Inc. Thermal mass gas flow sensor and method of forming same
US8920224B2 (en) * 2006-10-10 2014-12-30 Illinois Tool Works Inc Blower enclosure
DE102007015150A1 (de) * 2007-03-02 2008-09-04 Wurster, Gerd Lackieranlage
EP2037002B1 (de) * 2007-09-11 2011-03-30 Centrotherm Photovoltaics AG Vorrichtung zur Abscheidung von Chalkogenen
KR101136728B1 (ko) * 2010-10-18 2012-04-20 주성엔지니어링(주) 기판처리장치와 그의 분해 및 조립방법
US8986785B2 (en) * 2011-06-23 2015-03-24 Surface Activation Technologies Method and apparatus for continuous sulfonization of discrete article
US8826857B2 (en) * 2011-11-21 2014-09-09 Lam Research Corporation Plasma processing assemblies including hinge assemblies
JP5921168B2 (ja) * 2011-11-29 2016-05-24 株式会社日立国際電気 基板処理装置
AT512950B1 (de) * 2012-06-04 2016-06-15 Leica Microsysteme Gmbh Vorrichtung zum Präparieren, insbesondere Beschichten, von Proben
US10014261B2 (en) * 2012-10-15 2018-07-03 Palo Alto Research Center Incorporated Microchip charge patterning
NL2010471C2 (en) * 2013-03-18 2014-09-24 Levitech B V Substrate processing apparatus.
US20150209825A1 (en) * 2014-01-28 2015-07-30 Hzo, Inc. Material processing system with conduits configured to prevent heat transfer between a pyrolysis tube and adjacent elements
KR101589965B1 (ko) * 2014-02-26 2016-02-05 (주) 데크카본 밀도화 장비

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US4163828A (en) * 1978-01-20 1979-08-07 Union Carbide Corporation Parylene stabilization
US4276855A (en) * 1979-05-02 1981-07-07 Optical Coating Laboratory, Inc. Coating apparatus
US4817557A (en) * 1983-05-23 1989-04-04 Anicon, Inc. Process and apparatus for low pressure chemical vapor deposition of refractory metal
US4667579A (en) * 1985-10-03 1987-05-26 Daw, Incorporated Cleanroom structure
US4945856A (en) * 1988-06-23 1990-08-07 Jeffrey Stewart Parylene deposition chamber
US5266349A (en) * 1991-02-25 1993-11-30 Specialty Coating Systems Inc. Method of discrete conformal coating
US5268033A (en) 1991-07-01 1993-12-07 Jeffrey Stewart Table top parylene deposition chamber
US5272007A (en) * 1992-02-21 1993-12-21 Union Carbide Chemicals & Plastics Technology Corporation Solder powder coated with parylene
US5264039A (en) * 1992-02-24 1993-11-23 Union Carbide Chemicals & Plastics Technology Corporation Vapor deposition apparatus
US5364225A (en) * 1992-06-19 1994-11-15 Ibm Method of printed circuit panel manufacture
US5201956A (en) * 1992-06-26 1993-04-13 Specialty Coating Systems Inc. Cellular tumble coater
US5288033A (en) * 1992-10-29 1994-02-22 E. I. Du Pont De Nemours And Company Method and apparatus for contact winding
US5424097A (en) * 1993-09-30 1995-06-13 Specialty Coating Systems, Inc. Continuous vapor deposition apparatus
US5312489A (en) * 1993-09-30 1994-05-17 Union Carbide Chemicals & Plastics Technology Corporation Rotary fixture for vapor deposition coating apparatus
US5669971A (en) * 1994-04-06 1997-09-23 Specialty Coating Systems, Inc. Selective coating apparatus
JPH0936198A (ja) 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
US5641358A (en) * 1995-10-10 1997-06-24 Stewart; Jeffrey Modular parylene deposition apparatus having vapor deposition chamber extension
US5536321A (en) * 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter
US5534068A (en) * 1995-10-27 1996-07-09 Specialty Coating Systems, Inc. Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement
US5556473A (en) * 1995-10-27 1996-09-17 Specialty Coating Systems, Inc. Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
US5536317A (en) * 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including a quartz crystal thickness/rate controller
US5709753A (en) * 1995-10-27 1998-01-20 Specialty Coating Sysetms, Inc. Parylene deposition apparatus including a heated and cooled dimer crucible
US5536322A (en) * 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device
US5538758A (en) * 1995-10-27 1996-07-23 Specialty Coating Systems, Inc. Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers
US5536319A (en) 1995-10-27 1996-07-16 Specialty Coating Systems, Inc. Parylene deposition apparatus including an atmospheric shroud and inert gas source
US6086952A (en) * 1998-06-15 2000-07-11 Applied Materials, Inc. Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer
JP3476395B2 (ja) * 1999-09-24 2003-12-10 Ｎｅｃエレクトロニクス株式会社 クリーンルーム及びクリーンルームの空調方法
CA2327031C (en) * 1999-11-29 2007-07-03 Vladimir Gorokhovsky Composite vapour deposited coatings and process therefor
US6326056B1 (en) * 2000-02-16 2001-12-04 Specialty Coating Systems, Inc. Mobile cellular tumble coating method
US6991710B2 (en) * 2002-02-22 2006-01-31 Semitool, Inc. Apparatus for manually and automatically processing microelectronic workpieces

Also Published As

Publication number Publication date
DE602004022122D1 (de) 2009-09-03
EP1531189A1 (de) 2005-05-18
US20050098114A1 (en) 2005-05-12
EP1531189B1 (de) 2009-07-22
US7163586B2 (en) 2007-01-16

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