ATE427282T1 - Mikromechanische komponente mit aktiven elementen und verfahren zur herstellung einer komponente dieser art - Google Patents
Mikromechanische komponente mit aktiven elementen und verfahren zur herstellung einer komponente dieser artInfo
- Publication number
- ATE427282T1 ATE427282T1 AT06709056T AT06709056T ATE427282T1 AT E427282 T1 ATE427282 T1 AT E427282T1 AT 06709056 T AT06709056 T AT 06709056T AT 06709056 T AT06709056 T AT 06709056T AT E427282 T1 ATE427282 T1 AT E427282T1
- Authority
- AT
- Austria
- Prior art keywords
- component
- producing
- type
- active elements
- area
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0054—For holding or placing an element in a given position
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0292—Sensors not provided for in B81B2201/0207 - B81B2201/0285
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/058—Rotation out of a plane parallel to the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0128—Processes for removing material
- B81C2201/013—Etching
- B81C2201/0132—Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/032—Gluing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Measuring Magnetic Variables (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Hall/Mr Elements (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0500274A FR2880731B1 (fr) | 2005-01-11 | 2005-01-11 | Composant, notamment avec des elements actifs, et procede de realisation d'un tel composant |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE427282T1 true ATE427282T1 (de) | 2009-04-15 |
Family
ID=34953653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06709056T ATE427282T1 (de) | 2005-01-11 | 2006-01-10 | Mikromechanische komponente mit aktiven elementen und verfahren zur herstellung einer komponente dieser art |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080050561A1 (de) |
EP (1) | EP1890958B1 (de) |
AT (1) | ATE427282T1 (de) |
DE (1) | DE602006006054D1 (de) |
FR (1) | FR2880731B1 (de) |
WO (1) | WO2006075081A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2903812B1 (fr) * | 2006-07-13 | 2008-10-31 | Commissariat Energie Atomique | Circuit integre reparti sur au moins deux plans non paralleles et son procede de realisation |
DE102008013116B4 (de) * | 2007-04-02 | 2013-04-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung einer mikromechanischen Struktur |
DE102008012826B4 (de) * | 2007-04-02 | 2012-11-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung einer dreidimensionalen mikromechanischen Struktur aus zweidimensionalen Elementen und mikromechanisches Bauelement |
DE102008001038B4 (de) * | 2008-04-08 | 2016-08-11 | Robert Bosch Gmbh | Mikromechanisches Bauelement mit Schrägstruktur und entsprechendes Herstellungsverfahren |
US8053265B2 (en) * | 2009-02-06 | 2011-11-08 | Honeywell International Inc. | Mitigation of high stress areas in vertically offset structures |
JP5663900B2 (ja) | 2010-03-05 | 2015-02-04 | セイコーエプソン株式会社 | 分光センサー装置及び電子機器 |
JP5589515B2 (ja) | 2010-04-05 | 2014-09-17 | セイコーエプソン株式会社 | 傾斜構造体の製造方法 |
FR2959350B1 (fr) * | 2010-04-26 | 2012-08-31 | Commissariat Energie Atomique | Procede de fabrication d?un dispositif microelectronique et dispositif microelectronique ainsi fabrique |
JP5910679B2 (ja) * | 2014-07-29 | 2016-04-27 | セイコーエプソン株式会社 | 分光フィルター及び分光センサー |
DE102022211730A1 (de) | 2022-11-07 | 2024-05-08 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines Magnetsensors |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5446307A (en) * | 1994-11-04 | 1995-08-29 | The United States Of America As Represented By The Secretary Of The Army | Microelectronic 3D bipolar magnetotransistor magnetometer |
US5629918A (en) * | 1995-01-20 | 1997-05-13 | The Regents Of The University Of California | Electromagnetically actuated micromachined flap |
FR2763745B1 (fr) * | 1997-05-23 | 1999-08-27 | Sextant Avionique | Procede de fabrication d'un micro-capteur en silicium usine |
JP4308417B2 (ja) * | 2000-10-30 | 2009-08-05 | 日本発條株式会社 | ディスクドライブ用サスペンション |
US20030082917A1 (en) * | 2001-10-26 | 2003-05-01 | Hopkins Dean A. | Method of fabricating vertical actuation comb drives |
EP1424583A3 (de) * | 2002-11-26 | 2004-06-09 | LG Electronics Inc. | Optischer Empfänger und optischer Sender mit variablem optischem Dämpfungsglied, Herstellungsverfahren für ein variables optisches Dämpfungsglied |
-
2005
- 2005-01-11 FR FR0500274A patent/FR2880731B1/fr not_active Expired - Fee Related
-
2006
- 2006-01-10 US US11/813,626 patent/US20080050561A1/en not_active Abandoned
- 2006-01-10 DE DE602006006054T patent/DE602006006054D1/de active Active
- 2006-01-10 WO PCT/FR2006/000045 patent/WO2006075081A1/fr active Application Filing
- 2006-01-10 EP EP06709056A patent/EP1890958B1/de not_active Not-in-force
- 2006-01-10 AT AT06709056T patent/ATE427282T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20080050561A1 (en) | 2008-02-28 |
FR2880731B1 (fr) | 2007-04-27 |
EP1890958B1 (de) | 2009-04-01 |
DE602006006054D1 (de) | 2009-05-14 |
FR2880731A1 (fr) | 2006-07-14 |
WO2006075081A1 (fr) | 2006-07-20 |
EP1890958A1 (de) | 2008-02-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |