ATE419559T1 - Verfahren zur reinigung der oberfläche einer photomaske - Google Patents

Verfahren zur reinigung der oberfläche einer photomaske

Info

Publication number
ATE419559T1
ATE419559T1 AT05109839T AT05109839T ATE419559T1 AT E419559 T1 ATE419559 T1 AT E419559T1 AT 05109839 T AT05109839 T AT 05109839T AT 05109839 T AT05109839 T AT 05109839T AT E419559 T1 ATE419559 T1 AT E419559T1
Authority
AT
Austria
Prior art keywords
cleaning
photomask
phot
surfac
contaminants
Prior art date
Application number
AT05109839T
Other languages
English (en)
Inventor
Christian Chovino
Matthew Lamantia
Original Assignee
Advanced Mask Technology Ct Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Mask Technology Ct Gmbh filed Critical Advanced Mask Technology Ct Gmbh
Application granted granted Critical
Publication of ATE419559T1 publication Critical patent/ATE419559T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AT05109839T 2005-10-21 2005-10-21 Verfahren zur reinigung der oberfläche einer photomaske ATE419559T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05109839A EP1777587B1 (de) 2005-10-21 2005-10-21 Verfahren zur Reinigung der Oberfläche einer Photomaske

Publications (1)

Publication Number Publication Date
ATE419559T1 true ATE419559T1 (de) 2009-01-15

Family

ID=35311832

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05109839T ATE419559T1 (de) 2005-10-21 2005-10-21 Verfahren zur reinigung der oberfläche einer photomaske

Country Status (4)

Country Link
US (1) US7789964B2 (de)
EP (1) EP1777587B1 (de)
AT (1) ATE419559T1 (de)
DE (1) DE602005012111D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE419559T1 (de) 2005-10-21 2009-01-15 Advanced Mask Technology Ct Gmbh Verfahren zur reinigung der oberfläche einer photomaske
JP5358572B2 (ja) 2007-08-09 2013-12-04 レイヴ リミテッド ライアビリティ カンパニー 光学材料特性を修正するための装置及び方法
US11311917B2 (en) 2007-08-09 2022-04-26 Bruker Nano, Inc. Apparatus and method for contamination identification
EP2077467B9 (de) 2008-01-04 2014-09-03 Adixen Vacuum Products Herstellungsverfahren von Fotomasken und Vorrichtung für dessen Umsetzung
JP5450494B2 (ja) * 2011-03-25 2014-03-26 株式会社東芝 半導体基板の超臨界乾燥方法
CN103691694B (zh) * 2014-01-26 2016-01-27 湖北兴龙包装材料有限责任公司 Uv拼版清理装置及操作方法
TWI782077B (zh) * 2017-09-11 2022-11-01 美商應用材料股份有限公司 光罩清潔製程
KR102378329B1 (ko) * 2019-10-07 2022-03-25 세메스 주식회사 기판 처리 장치 및 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475277B1 (en) * 1999-06-30 2002-11-05 Sumitomo Electric Industries, Ltd. Group III-V nitride semiconductor growth method and vapor phase growth apparatus
US6782900B2 (en) * 2001-09-13 2004-08-31 Micell Technologies, Inc. Methods and apparatus for cleaning and/or treating a substrate using CO2
US6764552B1 (en) * 2002-04-18 2004-07-20 Novellus Systems, Inc. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
US7267727B2 (en) * 2002-09-24 2007-09-11 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
AU2003295844A1 (en) * 2002-11-25 2004-06-18 Dupont Photomasks, Inc. Photomask and method for creating a protective layer on the same
TWI233248B (en) * 2004-06-30 2005-05-21 Ind Tech Res Inst Method of making micro crystal optical fiber laser and frequency multiplier crystal optical fiber
US20070020872A1 (en) * 2005-07-06 2007-01-25 Isamu Shindo Process and apparatus for producing single crystal
ATE419559T1 (de) 2005-10-21 2009-01-15 Advanced Mask Technology Ct Gmbh Verfahren zur reinigung der oberfläche einer photomaske

Also Published As

Publication number Publication date
EP1777587A1 (de) 2007-04-25
US7789964B2 (en) 2010-09-07
EP1777587B1 (de) 2008-12-31
US20070113866A1 (en) 2007-05-24
DE602005012111D1 (de) 2009-02-12

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties