ATE396287T1 - Vorrichtung zur chargenweisen vakuumbeschichtung von gegenständen - Google Patents

Vorrichtung zur chargenweisen vakuumbeschichtung von gegenständen

Info

Publication number
ATE396287T1
ATE396287T1 AT02425446T AT02425446T ATE396287T1 AT E396287 T1 ATE396287 T1 AT E396287T1 AT 02425446 T AT02425446 T AT 02425446T AT 02425446 T AT02425446 T AT 02425446T AT E396287 T1 ATE396287 T1 AT E396287T1
Authority
AT
Austria
Prior art keywords
batches
diffuser
plant
vacuum coating
vacuum chamber
Prior art date
Application number
AT02425446T
Other languages
English (en)
Inventor
Stefano Fanfani
Original Assignee
Galileo Vacuum Systems S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Galileo Vacuum Systems S R L filed Critical Galileo Vacuum Systems S R L
Application granted granted Critical
Publication of ATE396287T1 publication Critical patent/ATE396287T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Fertilizers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT02425446T 2002-07-08 2002-07-08 Vorrichtung zur chargenweisen vakuumbeschichtung von gegenständen ATE396287T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02425446A EP1382712B1 (de) 2002-07-08 2002-07-08 Vorrichtung zur chargenweisen Vakuumbeschichtung von Gegenständen

Publications (1)

Publication Number Publication Date
ATE396287T1 true ATE396287T1 (de) 2008-06-15

Family

ID=29762762

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02425446T ATE396287T1 (de) 2002-07-08 2002-07-08 Vorrichtung zur chargenweisen vakuumbeschichtung von gegenständen

Country Status (6)

Country Link
US (1) US20050229852A1 (de)
EP (1) EP1382712B1 (de)
AT (1) ATE396287T1 (de)
AU (1) AU2003281301A1 (de)
DE (1) DE60226718D1 (de)
WO (1) WO2004005576A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4199062B2 (ja) * 2003-07-07 2008-12-17 株式会社神戸製鋼所 真空蒸着装置
EP1947211A1 (de) * 2006-12-05 2008-07-23 Galileo Vacuum Systems S.p.A. Vorrichtung zur Metallisierung unter Vakuum
JP2014125651A (ja) * 2012-12-26 2014-07-07 Kobe Steel Ltd インライン式プラズマｃｖｄ装置
US11646182B2 (en) * 2019-12-18 2023-05-09 Jiangsu Favored Nanotechnology Co., Ltd. Coating apparatus and coating method

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4282597A (en) * 1977-11-28 1981-08-04 Texas Instruments Incorporated Metal-coated plastic housing for electronic components and the method of making same
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
DE3731686A1 (de) * 1987-09-21 1989-04-06 Leybold Ag Verfahren und vorrichtung zur herstellung einer korrosionsfesten schicht auf der oberflaeche von mit lack ueberzogenen werkstuecken
DE4026367A1 (de) * 1990-06-25 1992-03-12 Leybold Ag Vorrichtung zum beschichten von substraten
JPH0673538A (ja) * 1992-05-26 1994-03-15 Kobe Steel Ltd アークイオンプレーティング装置
US5895531A (en) * 1996-12-13 1999-04-20 Compuvac Systems, Inc. Apparatus and polymerization gun for coating objects by vacuum deposit
ES2256948T3 (es) * 1997-06-16 2006-07-16 Robert Bosch Gmbh Procedimiento y dispositivo para el recubrimiento en fase de vacio de un sustrato.
US5970908A (en) * 1997-12-13 1999-10-26 Compuvac Systems, Inc. Apparatus and improved polymerization gun for coating objects by vacuum deposit
US6021738A (en) * 1998-03-04 2000-02-08 Compuvac Systems, Inc. Carriage electrode contact system used in coating objects by vacuum deposit
US20030111342A1 (en) * 2001-12-18 2003-06-19 Compuvac Systems, Inc. Sputter coating apparatus
US6708645B1 (en) * 2002-04-12 2004-03-23 Compuvac Systems, Inc. Arc resistant high voltage feedthru fitting for a vacuum deposition chamber

Also Published As

Publication number Publication date
DE60226718D1 (de) 2008-07-03
US20050229852A1 (en) 2005-10-20
AU2003281301A1 (en) 2004-01-23
WO2004005576A1 (en) 2004-01-15
EP1382712B1 (de) 2008-05-21
EP1382712A1 (de) 2004-01-21

Similar Documents

Publication Publication Date Title
Puač et al. Activity of catalase enzyme in Paulownia tomentosa seeds during the process of germination after treatments with low pressure plasma and plasma activated water
WO2000038740A3 (en) Method and apparatus for sterilizing small objects
DE60135137D1 (de) Individuelle vorrichtung zur probenaufnahme von umgebungsluft
EP1601003A3 (de) UV-Strahl-Generator, UV-Bestrahlungs-Vorrichtung und Vorrichtung zur Herstellung von Halbleitern
GB2402037B (en) Plant treatment method and means therefor
DE50012011D1 (de) Analysenwaage zur Wägung von elektrostatisch aufgeladenem Wägegut
ATE162803T1 (de) Dünnschichtbehandlungsapparat
ATE156782T1 (de) Vorrichtung zur fluidaufbereitung
DE69025831D1 (de) Elektronemittierende Vorrichtung; Herstellungsverfahren Elektronemittierende Vorrichtung, Herstellungsverfahren derselben und Anzeigegerät und Elektronstrahl- Schreibvorrichtung, welche diese Vorrichtung verwendet.
DE59806105D1 (de) Vorrichtung, Auswurfgehäuse und Mähgerät
BR0309224A (pt) Sistema e processo de um dispositivo de injeção e dispositivo apropriado para modificação
DE60226718D1 (de) Vorrichtung zur chargenweisen Vakuumbeschichtung von Gegenständen
ATE407354T1 (de) Vorrichtung zur behandlung von gewebe mit integriertem ventil
DE60327777D1 (de) Vorrichtung zurbehandlung von scheibenförmigen objekten mit flüssigkeiten
WO2003069013A3 (en) Plasma processing apparatus
DE59209253D1 (de) Vorrichtung zum Mischen und/oder Kneten von Materialien
MX171138B (es) Criba centrifuga
ATE507982T1 (de) Vorrichtung zum rotativen bearbeiten von materialien
TW200504785A (en) Impurity doping method, impurity doping device, and the semiconductor device formed with the same
DE50203326D1 (de) Vorrichtung zur vereinzelten Abgabe von Saatkörnern
DE69925368D1 (de) Methode und Vorrichtung zur Korrektur der Flugbahn eines rotationsstabilisierten Geschosses
DE60010860D1 (de) Zentrifugenrotor
US20060073079A1 (en) Apparatus for the polymerization of biological specimens in the context of cryosubstitution
RU97118076A (ru) Установка для предпосевной обработки семян
KR970013018A (ko) 불순물의 도입방법

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties