ATE238535T1 - Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögen - Google Patents
Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögenInfo
- Publication number
- ATE238535T1 ATE238535T1 AT00947095T AT00947095T ATE238535T1 AT E238535 T1 ATE238535 T1 AT E238535T1 AT 00947095 T AT00947095 T AT 00947095T AT 00947095 T AT00947095 T AT 00947095T AT E238535 T1 ATE238535 T1 AT E238535T1
- Authority
- AT
- Austria
- Prior art keywords
- irradiance
- controls
- phase
- mask
- shack
- Prior art date
Links
- 239000002184 metal Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 230000003287 optical effect Effects 0.000 abstract 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Optical Integrated Circuits (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14291899P | 1999-07-09 | 1999-07-09 | |
| PCT/US2000/018581 WO2001004590A1 (en) | 1999-07-09 | 2000-07-07 | Sub-lens spatial resolution shack-hartmann wavefront sensing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE238535T1 true ATE238535T1 (de) | 2003-05-15 |
Family
ID=22501809
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00947095T ATE238535T1 (de) | 1999-07-09 | 2000-07-07 | Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögen |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6656373B1 (de) |
| EP (1) | EP1194755B1 (de) |
| AT (1) | ATE238535T1 (de) |
| DE (1) | DE60002330D1 (de) |
| WO (2) | WO2001004591A1 (de) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1194755B1 (de) * | 1999-07-09 | 2003-04-23 | Wavefront Sciences Inc. | Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögen |
| DE19938203A1 (de) | 1999-08-11 | 2001-02-15 | Aesculap Meditec Gmbh | Verfahren und Vorrichtung zur Korrektur von Sehfehlern des menschlichen Auges |
| FR2827380B1 (fr) * | 2001-07-12 | 2003-11-07 | Imagine Optic | Dispositif d'analyse d'un front d'onde a resolution amelioree |
| US8911086B2 (en) | 2002-12-06 | 2014-12-16 | Amo Manufacturing Usa, Llc | Compound modulation transfer function for laser surgery and other optical applications |
| US8596787B2 (en) | 2003-06-20 | 2013-12-03 | Amo Manufacturing Usa, Llc | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
| WO2004112576A2 (en) | 2003-06-20 | 2004-12-29 | Visx, Incorporated | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
| CN100451577C (zh) * | 2003-10-15 | 2009-01-14 | 中国科学院光电技术研究所 | 基于微棱镜阵列的脉冲光光束质量检测哈特曼波前传感器 |
| DE102005042496A1 (de) * | 2005-09-05 | 2007-03-08 | Carl Zeiss Sms Gmbh | Verfahren zur Korrektur der Apodisierung in mikroskopischen Abbildungssystemen |
| US8158917B2 (en) | 2005-12-13 | 2012-04-17 | Agency For Science Technology And Research | Optical wavefront sensor and optical wavefront sensing method |
| US7681172B2 (en) * | 2007-01-29 | 2010-03-16 | Synopsys, Inc. | Method and apparatus for modeling an apodization effect in an optical lithography system |
| US9176069B2 (en) * | 2012-02-10 | 2015-11-03 | Kla-Tencor Corporation | System and method for apodization in a semiconductor device inspection system |
| CN102818640B (zh) * | 2012-09-20 | 2014-10-29 | 重庆大学 | 用包含4f系统误差的图像频谱确定哈特曼阵列数的方法 |
| JP6494205B2 (ja) * | 2013-07-31 | 2019-04-03 | キヤノン株式会社 | 波面計測方法、形状計測方法、光学素子の製造方法、光学機器の製造方法、プログラム、波面計測装置 |
| CN103887157B (zh) * | 2014-03-12 | 2021-08-27 | 京东方科技集团股份有限公司 | 光学掩膜板和激光剥离装置 |
| CN105842761B (zh) * | 2016-06-08 | 2018-02-27 | 重庆邮电大学 | 井字堆叠型太赫兹波光学聚焦透镜 |
| DE102016119880A1 (de) * | 2016-10-19 | 2018-04-19 | HELLA GmbH & Co. KGaA | Beleuchtungsvorrichtung für Fahrzeuge |
| CN106324727B (zh) * | 2016-11-03 | 2017-12-12 | 山东师范大学 | 自聚焦微透镜阵列的制作系统及制作方法 |
| GB201712739D0 (en) * | 2017-08-09 | 2017-09-20 | Renishaw Plc | Laser processing |
| CN108415108A (zh) * | 2018-01-30 | 2018-08-17 | 北京理工大学 | 一种基于纳米孔和表面沟槽结构的平板超透镜 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3808035A (en) * | 1970-12-09 | 1974-04-30 | M Stelter | Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like |
| DE2449123C3 (de) * | 1974-10-16 | 1978-08-10 | Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen | Auskoppelspiegel für astabile Laserresonatoren |
| FR2665955B1 (fr) * | 1985-11-20 | 1993-04-23 | Onera (Off Nat Aerospatiale) | Analyseur opto electronique de surfaces d'onde a mosauique de micro-lentilles. |
| US5186975A (en) * | 1987-10-14 | 1993-02-16 | Enichem S.P.A. | Process and machinery for step-and-repeat vacuum-deposition of large-area thin-film-electronics matrix-circuits on monolithic glass panes through small perforated metal masks |
| US5367588A (en) * | 1992-10-29 | 1994-11-22 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications | Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same |
| US5460908A (en) * | 1991-08-02 | 1995-10-24 | Micron Technology, Inc. | Phase shifting retical fabrication method |
| US5233174A (en) * | 1992-03-11 | 1993-08-03 | Hughes Danbury Optical Systems, Inc. | Wavefront sensor having a lenslet array as a null corrector |
| US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
| US5534312A (en) * | 1994-11-14 | 1996-07-09 | Simon Fraser University | Method for directly depositing metal containing patterned films |
| US5509556A (en) * | 1994-11-17 | 1996-04-23 | International Business Machines Corporation | Process for forming apertures in a metallic sheet |
| US5814803A (en) * | 1994-12-23 | 1998-09-29 | Spectra-Physics Scanning Systems, Inc. | Image reader with multi-focus lens |
| US5605783A (en) * | 1995-01-06 | 1997-02-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
| US5864381A (en) * | 1996-07-10 | 1999-01-26 | Sandia Corporation | Automated pupil remapping with binary optics |
| JPH10260523A (ja) * | 1997-03-18 | 1998-09-29 | Nikon Corp | シリコンステンシルマスクの製造方法 |
| US5853960A (en) | 1998-03-18 | 1998-12-29 | Trw Inc. | Method for producing a micro optical semiconductor lens |
| EP1194755B1 (de) * | 1999-07-09 | 2003-04-23 | Wavefront Sciences Inc. | Shack-hartmann wellenfrontsensor mit einem höheren als durch die linsenanordnung vorgegebenen räumlichem auflösungsvermögen |
-
2000
- 2000-07-07 EP EP00947095A patent/EP1194755B1/de not_active Expired - Lifetime
- 2000-07-07 DE DE60002330T patent/DE60002330D1/de not_active Expired - Lifetime
- 2000-07-07 US US09/612,223 patent/US6656373B1/en not_active Expired - Lifetime
- 2000-07-07 WO PCT/US2000/018665 patent/WO2001004591A1/en not_active Ceased
- 2000-07-07 WO PCT/US2000/018581 patent/WO2001004590A1/en not_active Ceased
- 2000-07-07 AT AT00947095T patent/ATE238535T1/de not_active IP Right Cessation
-
2003
- 2003-09-30 US US10/673,569 patent/US6864043B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6656373B1 (en) | 2003-12-02 |
| WO2001004590A9 (en) | 2002-05-02 |
| EP1194755A1 (de) | 2002-04-10 |
| US6864043B2 (en) | 2005-03-08 |
| DE60002330D1 (de) | 2003-05-28 |
| WO2001004590A1 (en) | 2001-01-18 |
| US20040060903A1 (en) | 2004-04-01 |
| WO2001004591A1 (en) | 2001-01-18 |
| EP1194755B1 (de) | 2003-04-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |