ATE189337T1 - Elektronenstrahlsaüle zur musterschreibung - Google Patents

Elektronenstrahlsaüle zur musterschreibung

Info

Publication number
ATE189337T1
ATE189337T1 AT96943082T AT96943082T ATE189337T1 AT E189337 T1 ATE189337 T1 AT E189337T1 AT 96943082 T AT96943082 T AT 96943082T AT 96943082 T AT96943082 T AT 96943082T AT E189337 T1 ATE189337 T1 AT E189337T1
Authority
AT
Austria
Prior art keywords
pct
electron beam
pattern
electrostatic
focussing
Prior art date
Application number
AT96943082T
Other languages
English (en)
Inventor
Thomas Chisholm
Original Assignee
Leica Microsys Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsys Lithography Ltd filed Critical Leica Microsys Lithography Ltd
Application granted granted Critical
Publication of ATE189337T1 publication Critical patent/ATE189337T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT96943082T 1996-01-05 1996-12-11 Elektronenstrahlsaüle zur musterschreibung ATE189337T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9600166A GB2308916B (en) 1996-01-05 1996-01-05 Electron beam pattern-writing column
PCT/EP1996/005528 WO1997025735A1 (en) 1996-01-05 1996-12-11 Electron beam pattern-writing column

Publications (1)

Publication Number Publication Date
ATE189337T1 true ATE189337T1 (de) 2000-02-15

Family

ID=10786632

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96943082T ATE189337T1 (de) 1996-01-05 1996-12-11 Elektronenstrahlsaüle zur musterschreibung

Country Status (9)

Country Link
US (1) US5998795A (de)
EP (1) EP0813745B1 (de)
JP (1) JPH11502057A (de)
KR (1) KR19980702620A (de)
AT (1) ATE189337T1 (de)
DE (1) DE69606391T2 (de)
GB (1) GB2308916B (de)
IL (1) IL121377A (de)
WO (1) WO1997025735A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6262429B1 (en) * 1999-01-06 2001-07-17 Etec Systems, Inc. Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
DE10034412A1 (de) * 2000-07-14 2002-01-24 Leo Elektronenmikroskopie Gmbh Verfahren zur Elektronenstrahl-Lithographie und elektronen-optisches Lithographiesystem
CN1235092C (zh) * 2002-07-03 2006-01-04 Pd服务株式会社 电子束曝光方法及其装置
GB2404782B (en) * 2003-08-01 2005-12-07 Leica Microsys Lithography Ltd Pattern-writing equipment
US8173978B2 (en) * 2004-07-05 2012-05-08 Cebt Co., Ltd Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
KR100973337B1 (ko) * 2005-06-03 2010-07-30 전자빔기술센터 주식회사 단순 구조의 초소형 전자칼럼
KR100926748B1 (ko) * 2004-08-11 2009-11-16 전자빔기술센터 주식회사 멀티 에스에프이디
CN101243531A (zh) * 2005-08-18 2008-08-13 电子线技术院株式会社 改变电子柱中的电子束的能量的方法
US11415060B2 (en) 2018-09-12 2022-08-16 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11454173B2 (en) 2018-09-12 2022-09-27 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11391212B2 (en) 2018-09-12 2022-07-19 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11255271B2 (en) 2018-09-12 2022-02-22 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11268486B2 (en) 2018-09-12 2022-03-08 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11391213B2 (en) 2018-09-12 2022-07-19 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11408351B2 (en) 2018-09-12 2022-08-09 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11401867B2 (en) 2018-09-12 2022-08-02 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11268447B2 (en) 2018-09-12 2022-03-08 Pratt & Whitney Canada Corp. Igniter for gas turbine engine
US11286861B2 (en) 2018-09-12 2022-03-29 Pratt & Whitney Canada Corp. Igniter for gas turbine engine

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2248557A (en) * 1937-07-24 1941-07-08 Loewe Radio Inc Cathode-ray tube system
US4675524A (en) * 1985-03-11 1987-06-23 Siemens Aktiengesellschaft Scanning particle microscope with diminished boersch effect
EP0462554B1 (de) * 1990-06-20 2000-10-11 Hitachi, Ltd. Ladungsträgerstrahlgerät
JP2851213B2 (ja) * 1992-09-28 1999-01-27 株式会社東芝 走査電子顕微鏡
EP0773576A1 (de) * 1995-11-13 1997-05-14 Motorola, Inc. Elektronenoptische Saüle für Mehrstrahl-Elektronen-lithographie-Vorrichtung

Also Published As

Publication number Publication date
DE69606391T2 (de) 2000-07-27
GB2308916B (en) 2000-11-22
KR19980702620A (ko) 1998-08-05
EP0813745B1 (de) 2000-01-26
EP0813745A1 (de) 1997-12-29
GB9600166D0 (en) 1996-03-06
IL121377A (en) 2001-01-28
WO1997025735A1 (en) 1997-07-17
US5998795A (en) 1999-12-07
DE69606391D1 (de) 2000-03-02
JPH11502057A (ja) 1999-02-16
GB2308916A (en) 1997-07-09
IL121377A0 (en) 1998-01-04

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Legal Events

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UEP Publication of translation of european patent specification