ATE181267T1 - Vorrichtung und verfahren zum herstellen von drahtelektroden zum funkenerosiven schneiden - Google Patents

Vorrichtung und verfahren zum herstellen von drahtelektroden zum funkenerosiven schneiden

Info

Publication number
ATE181267T1
ATE181267T1 AT96420093T AT96420093T ATE181267T1 AT E181267 T1 ATE181267 T1 AT E181267T1 AT 96420093 T AT96420093 T AT 96420093T AT 96420093 T AT96420093 T AT 96420093T AT E181267 T1 ATE181267 T1 AT E181267T1
Authority
AT
Austria
Prior art keywords
furnace
wire
airtight
erosis
spark
Prior art date
Application number
AT96420093T
Other languages
English (en)
Inventor
Louis Lacourcelle
Original Assignee
Thermocompact Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermocompact Sa filed Critical Thermocompact Sa
Application granted granted Critical
Publication of ATE181267T1 publication Critical patent/ATE181267T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H7/00—Processes or apparatus applicable to both electrical discharge machining and electrochemical machining
    • B23H7/02—Wire-cutting
    • B23H7/08—Wire electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5886—Mechanical treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5893—Mixing of deposited material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Electrochemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Coating With Molten Metal (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
AT96420093T 1995-03-27 1996-03-20 Vorrichtung und verfahren zum herstellen von drahtelektroden zum funkenerosiven schneiden ATE181267T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9503756A FR2732251B1 (fr) 1995-03-27 1995-03-27 Procede et dispositif pour la fabrication de fil electrode pour etincelage erosif, et fil ainsi obtenu

Publications (1)

Publication Number Publication Date
ATE181267T1 true ATE181267T1 (de) 1999-07-15

Family

ID=9477584

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96420093T ATE181267T1 (de) 1995-03-27 1996-03-20 Vorrichtung und verfahren zum herstellen von drahtelektroden zum funkenerosiven schneiden

Country Status (6)

Country Link
US (1) US5721414A (de)
EP (1) EP0734805B1 (de)
AT (1) ATE181267T1 (de)
DE (2) DE734805T1 (de)
ES (1) ES2135194T3 (de)
FR (1) FR2732251B1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH690440A5 (fr) * 1995-12-11 2000-09-15 Charmilles Technologies Procédé et dispositif de fabrication de fils ayant une surface en laiton, pour les besoins de l'électro-érosion à fil.
JP3248457B2 (ja) 1996-12-26 2002-01-21 住友電気工業株式会社 ワイヤ放電加工用電極線の製造方法
FR2778489B1 (fr) * 1998-05-07 2006-05-12 Thermocompact Sa Procede et dispositif pour la fabrication d'un fil electrode pour electroerosion
GB9911680D0 (en) * 1999-05-19 1999-07-21 Oxford Instr Uk Ltd Superconducting coils
FR2833875B1 (fr) * 2001-12-21 2004-07-02 Thermocompact Sa Fil pour electroerosion a grande vitesse d'usinage
ES2390167T3 (es) * 2008-10-01 2012-11-07 Berkenhoff Gmbh Electrodos de alambre para corte por descarga eléctrica
PL2193867T3 (pl) 2008-12-03 2012-11-30 Berkenhoff Gmbh Elektroda drutowa do cięcia elektroiskrowego i sposób wytwarzania takiej elektrody drutowej
CN104046963B (zh) * 2014-06-08 2016-08-24 电子科技大学 薄膜沉积制备装置和方法
TW201545828A (zh) * 2014-06-10 2015-12-16 Ya-Yang Yan 一種放電加工切割線及該放電加工切割線之製造方法
JP6905106B1 (ja) 2020-01-30 2021-07-21 株式会社ソディック 熱処理炉、加熱装置、ワイヤ電極の製造方法および熱拡散処理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3313269A (en) * 1964-08-11 1967-04-11 Ralph L Hough Vapor plating apparatus
IT1041482B (it) * 1975-08-04 1980-01-10 Smi Metallurg Procedimento per la ricottura di leghe di rame in particolare di ottone
GB2015909B (en) * 1978-03-03 1982-12-01 Charmilles Sa Ateliers Electrode for spark erosion machining
JPS54141490A (en) * 1978-04-27 1979-11-02 Mitsubishi Electric Corp Wire-cut electric discharge machining method and device
US4977303A (en) * 1984-08-28 1990-12-11 Charmilles Technologie S.A. Zinc or cadmium coated, surface oxidized electrode wire for EDM cutting of a workpiece; and method for forming such a wire
US4595600A (en) * 1984-11-13 1986-06-17 Fl Industries, Inc. Metal cladding of wire by atomization spraying
US4686153A (en) * 1984-12-08 1987-08-11 Fujikura Ltd. Electrode wire for use in electric discharge machining and process for preparing same
JPS6318072A (ja) * 1986-07-08 1988-01-25 Furukawa Electric Co Ltd:The ワイヤ放電加工用黄銅電極線の製造方法
DE3781278D1 (de) * 1987-10-23 1992-09-24 Berkenhoff Gmbh Erodierelektrode, insbesondere drahtelektrode fuer die funkenerosive bearbeitung.
EP0334971B1 (de) * 1988-03-26 1991-12-18 Berkenhoff GmbH Drahtelektrode zum funkenerosiven Schneiden
JPH0755407B2 (ja) * 1992-12-18 1995-06-14 株式会社フジクラ ワイヤ放電加工用電極線の製造方法
JPH07108488B2 (ja) * 1992-12-18 1995-11-22 株式会社フジクラ ワイヤ放電加工用電極線の製造方法

Also Published As

Publication number Publication date
US5721414A (en) 1998-02-24
DE69602867T2 (de) 2000-01-20
DE69602867D1 (de) 1999-07-22
FR2732251B1 (fr) 1997-05-30
ES2135194T3 (es) 1999-10-16
EP0734805B1 (de) 1999-06-16
DE734805T1 (de) 1997-04-30
EP0734805A1 (de) 1996-10-02
FR2732251A1 (fr) 1996-10-04

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