ATE174636T1 - Maskierungsmittel und reinigungstechniken fuer oberflaechen von substraten - Google Patents

Maskierungsmittel und reinigungstechniken fuer oberflaechen von substraten

Info

Publication number
ATE174636T1
ATE174636T1 AT94923799T AT94923799T ATE174636T1 AT E174636 T1 ATE174636 T1 AT E174636T1 AT 94923799 T AT94923799 T AT 94923799T AT 94923799 T AT94923799 T AT 94923799T AT E174636 T1 ATE174636 T1 AT E174636T1
Authority
AT
Austria
Prior art keywords
substrates
coating
masking agents
cleaning techniques
pvd
Prior art date
Application number
AT94923799T
Other languages
English (en)
Inventor
John Michael Walls
Alaric Graham Spencer
Norman Henry A White
Alan Robert Waugh
Original Assignee
Applied Vision Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Vision Ltd filed Critical Applied Vision Ltd
Application granted granted Critical
Publication of ATE174636T1 publication Critical patent/ATE174636T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
  • Yarns And Mechanical Finishing Of Yarns Or Ropes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
AT94923799T 1993-08-18 1994-08-16 Maskierungsmittel und reinigungstechniken fuer oberflaechen von substraten ATE174636T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB939317170A GB9317170D0 (en) 1993-08-18 1993-08-18 Improvements in physical vapour deposition apparatus

Publications (1)

Publication Number Publication Date
ATE174636T1 true ATE174636T1 (de) 1999-01-15

Family

ID=10740672

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94923799T ATE174636T1 (de) 1993-08-18 1994-08-16 Maskierungsmittel und reinigungstechniken fuer oberflaechen von substraten

Country Status (7)

Country Link
US (1) US6143143A (de)
EP (2) EP0714454B1 (de)
AT (1) ATE174636T1 (de)
AU (1) AU7389294A (de)
DE (1) DE69415324T2 (de)
GB (1) GB9317170D0 (de)
WO (1) WO1995005494A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013984A (en) * 1998-06-10 2000-01-11 Lam Research Corporation Ion energy attenuation method by determining the required number of ion collisions
EP1275751A1 (de) * 2001-07-13 2003-01-15 Satis Vacuum Industries Vertriebs - AG Verfahren und Vorrichtung zur Herstellung eines optisch wirksamen Schichtsystems
DE10146542B4 (de) 2001-09-21 2005-03-03 Dieter Henrich Handhabung von Gegenständen, wie Linsen
FR2834712B1 (fr) * 2002-01-14 2004-12-17 Essilor Int Procede de traitement d'un verre ophtalmique
KR100838065B1 (ko) * 2002-05-31 2008-06-16 삼성에스디아이 주식회사 박막증착기용 고정장치와 이를 이용한 고정방법
FR2856056B1 (fr) * 2003-06-13 2009-07-03 Essilor Int Procede de traitement d'un verre apte au debordage.
SE526567C2 (sv) * 2003-07-16 2005-10-11 Sandvik Intellectual Property Stödlist för långhålsborr med slityta i avvikande färg
FR2860306B1 (fr) * 2003-09-26 2006-09-01 Essilor Int Lentille ophtalmique recouverte d'un film electrostatique et procede de debordage d'une telle lentille
WO2005118502A1 (ja) * 2004-06-01 2005-12-15 Asahi Glass Company, Limited 光学素子製造法
US20070141358A1 (en) 2005-12-19 2007-06-21 Essilor International Compagnie Generale D'optique Method for improving the edging of an optical article by providing a temporary layer of an organic material
EP1950323A1 (de) * 2007-01-25 2008-07-30 Essilor International (Compagnie Generale D'optique) Optische Linsenhalterung
JP2010153467A (ja) * 2008-12-24 2010-07-08 Hitachi Kokusai Electric Inc 基板処理装置および半導体装置の製造方法
US10014163B2 (en) 2011-06-07 2018-07-03 Vision Ease, Lp Application of coating materials
DE102013219468B4 (de) 2013-09-26 2015-04-23 Siltronic Ag Verfahren zum gleichzeitigen Trennen einer Vielzahl von Scheiben von einem Werkstück
DE102020003578A1 (de) 2020-05-20 2021-11-25 Schneider Gmbh & Co. Kg Beschichtungsanlage, Spannring und Magazin für Brillengläser und Verfahren zum Beschichten von Brillengläsern

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2271239A (en) * 1940-09-28 1942-01-27 Eastman Kodak Co Nonreflecting coating for galss
US4455964A (en) * 1982-02-01 1984-06-26 Techsight Corporation Mount for handling and masking optical materials
US4458746A (en) * 1982-05-25 1984-07-10 Varian Associates, Inc. Optimum surface contour for conductive heat transfer with a thin flexible workpiece
US4522697A (en) * 1983-12-22 1985-06-11 Sputtered Films, Inc. Wafer processing machine
US4512841A (en) * 1984-04-02 1985-04-23 International Business Machines Corporation RF Coupling techniques
DE3514094A1 (de) * 1985-04-16 1986-10-23 Schering AG, Berlin und Bergkamen, 1000 Berlin Herstellung metallischer strukturen auf anorganischen nichtleitern
CH665428A5 (de) * 1985-07-26 1988-05-13 Balzers Hochvakuum Verfahren zur beschichtung von mikrovertiefungen.
US4636543A (en) * 1985-10-18 1987-01-13 Helton Bob G Protective coating composition
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
JPH01151866U (de) * 1988-03-25 1989-10-19
US4988424A (en) * 1989-06-07 1991-01-29 Ppg Industries, Inc. Mask and method for making gradient sputtered coatings
GB8921666D0 (en) * 1989-09-26 1989-11-08 Peatgrange Ivd Limited Ion vapour deposition apparatus and method
US5320735A (en) * 1990-08-22 1994-06-14 Toa Electronics Ltd. Electrode for measuring pH
GB9101106D0 (en) * 1991-01-18 1991-02-27 Cray Microcoat Ltd Ion vapour deposition apparatus and method
DE59207306D1 (de) * 1991-04-12 1996-11-14 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung mindestens eines Gegenstandes
US5656138A (en) * 1991-06-18 1997-08-12 The Optical Corporation Of America Very high vacuum magnetron sputtering method and apparatus for precision optical coatings
DE4136987A1 (de) * 1991-11-11 1993-05-13 Leybold Ag Verfahren zur oberflaechenpassivierung von sensoren
DE59205106D1 (de) * 1991-12-27 1996-02-29 Balzers Hochvakuum Vakuumbehandlungsanlage und deren Verwendungen

Also Published As

Publication number Publication date
US6143143A (en) 2000-11-07
GB9317170D0 (en) 1993-10-06
EP0714454A1 (de) 1996-06-05
DE69415324T2 (de) 1999-07-15
WO1995005494A1 (en) 1995-02-23
EP0789091A1 (de) 1997-08-13
EP0714454B1 (de) 1998-12-16
DE69415324D1 (de) 1999-01-28
AU7389294A (en) 1995-03-14

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