ATA546075A - Verfahren zur herstellung der emitterzone eines planartransistors - Google Patents

Verfahren zur herstellung der emitterzone eines planartransistors

Info

Publication number
ATA546075A
ATA546075A AT0546075A AT546075A ATA546075A AT A546075 A ATA546075 A AT A546075A AT 0546075 A AT0546075 A AT 0546075A AT 546075 A AT546075 A AT 546075A AT A546075 A ATA546075 A AT A546075A
Authority
AT
Austria
Prior art keywords
producing
planar transistor
emitter zone
emitter
zone
Prior art date
Application number
AT0546075A
Other languages
English (en)
Other versions
AT372805B (de
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of ATA546075A publication Critical patent/ATA546075A/de
Application granted granted Critical
Publication of AT372805B publication Critical patent/AT372805B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8222Bipolar technology
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • H01L21/28525Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising semiconducting material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
AT0546075A 1974-08-16 1975-07-15 Verfahren zur herstellung der emitterzone eines planartransistors AT372805B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2439408A DE2439408A1 (de) 1974-08-16 1974-08-16 Halbleiterbauelement

Publications (2)

Publication Number Publication Date
ATA546075A true ATA546075A (de) 1983-03-15
AT372805B AT372805B (de) 1983-11-25

Family

ID=5923395

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0546075A AT372805B (de) 1974-08-16 1975-07-15 Verfahren zur herstellung der emitterzone eines planartransistors

Country Status (9)

Country Link
JP (1) JPS5164370A (de)
AT (1) AT372805B (de)
BR (1) BR7505197A (de)
CA (1) CA1041673A (de)
DE (1) DE2439408A1 (de)
FR (1) FR2282166A1 (de)
GB (1) GB1494802A (de)
IT (1) IT1040480B (de)
ZA (1) ZA754328B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61224448A (ja) * 1985-03-29 1986-10-06 Toshiba Corp 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4855663A (de) * 1971-11-10 1973-08-04
JPS499186A (de) * 1972-05-11 1974-01-26

Also Published As

Publication number Publication date
FR2282166A1 (fr) 1976-03-12
FR2282166B1 (de) 1980-10-17
ZA754328B (en) 1976-06-30
AT372805B (de) 1983-11-25
DE2439408A1 (de) 1976-02-26
IT1040480B (it) 1979-12-20
JPS5164370A (de) 1976-06-03
BR7505197A (pt) 1976-08-03
GB1494802A (en) 1977-12-14
CA1041673A (en) 1978-10-31

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee