ATA135576A - Schichtfoermig aufgebautes material fuer die photomechanische herstellung von weichen und flexiblen druckformen - Google Patents
Schichtfoermig aufgebautes material fuer die photomechanische herstellung von weichen und flexiblen druckformenInfo
- Publication number
- ATA135576A ATA135576A AT135576A AT135576A ATA135576A AT A135576 A ATA135576 A AT A135576A AT 135576 A AT135576 A AT 135576A AT 135576 A AT135576 A AT 135576A AT A135576 A ATA135576 A AT A135576A
- Authority
- AT
- Austria
- Prior art keywords
- soft
- layered material
- flexible printing
- printing forms
- photomechanical production
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55225175A | 1975-02-24 | 1975-02-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
ATA135576A true ATA135576A (de) | 1979-08-15 |
AT355596B AT355596B (de) | 1980-03-10 |
Family
ID=24204545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT135576A AT355596B (de) | 1975-02-24 | 1976-02-24 | Schichtfoermig aufgebautes material fuer die photomechanische herstellung von weichen und flexiblen druckformen |
Country Status (12)
Country | Link |
---|---|
JP (1) | JPS51108901A (de) |
AT (1) | AT355596B (de) |
AU (1) | AU505016B2 (de) |
BR (1) | BR7601170A (de) |
CA (1) | CA1062948A (de) |
DE (1) | DE2607257B2 (de) |
ES (1) | ES445475A1 (de) |
FR (1) | FR2301843A1 (de) |
GB (1) | GB1539789A (de) |
IT (1) | IT1055985B (de) |
MX (1) | MX142887A (de) |
NL (1) | NL7601885A (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3131766A1 (de) * | 1981-08-11 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3652273A (en) * | 1967-09-11 | 1972-03-28 | Ibm | Process using polyvinyl butral topcoat on photoresist layer |
GB1188921A (en) * | 1968-01-31 | 1970-04-22 | Du Pont | Photopolymerizable Elements |
-
1976
- 1976-02-23 DE DE19762607257 patent/DE2607257B2/de not_active Withdrawn
- 1976-02-23 CA CA246,338A patent/CA1062948A/en not_active Expired
- 1976-02-23 IT IT2048476A patent/IT1055985B/it active
- 1976-02-24 JP JP1933676A patent/JPS51108901A/ja active Pending
- 1976-02-24 AU AU11389/76A patent/AU505016B2/en not_active Expired
- 1976-02-24 FR FR7605126A patent/FR2301843A1/fr active Granted
- 1976-02-24 BR BR7601170A patent/BR7601170A/pt unknown
- 1976-02-24 NL NL7601885A patent/NL7601885A/xx not_active Application Discontinuation
- 1976-02-24 ES ES445475A patent/ES445475A1/es not_active Expired
- 1976-02-24 MX MX16364376A patent/MX142887A/es unknown
- 1976-02-24 AT AT135576A patent/AT355596B/de not_active IP Right Cessation
- 1976-02-24 GB GB717676A patent/GB1539789A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
BR7601170A (pt) | 1976-09-14 |
AT355596B (de) | 1980-03-10 |
IT1055985B (it) | 1982-01-11 |
FR2301843B1 (de) | 1980-05-30 |
ES445475A1 (es) | 1977-06-01 |
FR2301843A1 (fr) | 1976-09-17 |
DE2607257B2 (de) | 1979-10-25 |
DE2607257A1 (de) | 1976-09-09 |
AU505016B2 (en) | 1979-11-08 |
AU1138976A (en) | 1977-09-22 |
MX142887A (es) | 1981-01-14 |
NL7601885A (nl) | 1976-08-26 |
JPS51108901A (ja) | 1976-09-27 |
CA1062948A (en) | 1979-09-25 |
GB1539789A (en) | 1979-02-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ELJ | Ceased due to non-payment of the annual fee | ||
UEP | Publication of translation of european patent specification |