AT500782B1 - METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS - Google Patents

METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS Download PDF

Info

Publication number
AT500782B1
AT500782B1 AT0801005A AT80102005A AT500782B1 AT 500782 B1 AT500782 B1 AT 500782B1 AT 0801005 A AT0801005 A AT 0801005A AT 80102005 A AT80102005 A AT 80102005A AT 500782 B1 AT500782 B1 AT 500782B1
Authority
AT
Austria
Prior art keywords
ionic liquids
separating layers
separating
layers
ionic
Prior art date
Application number
AT0801005A
Other languages
German (de)
Other versions
AT500782B8 (en
AT500782A4 (en
Inventor
Herwig Dr Schottenberger
Gino Bentivoglio
Martin Rauch
Georg Dr Winkler
Wolfgang Dr Porcham
Hans-Peter Dr Martinz
Gerhard Dr Nauer
Rafael Dr Krendelsberger
Original Assignee
Plansee Gmbh
Swarovski & Co
Echem Kompetenzzentrum Fuer An
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plansee Gmbh, Swarovski & Co, Echem Kompetenzzentrum Fuer An filed Critical Plansee Gmbh
Priority to AT0801005A priority Critical patent/AT500782B8/en
Priority to PCT/AT2005/000460 priority patent/WO2006053362A2/en
Application granted granted Critical
Publication of AT500782A4 publication Critical patent/AT500782A4/en
Publication of AT500782B1 publication Critical patent/AT500782B1/en
Publication of AT500782B8 publication Critical patent/AT500782B8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
AT0801005A 2004-11-19 2004-11-19 METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS AT500782B8 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AT0801005A AT500782B8 (en) 2004-11-19 2004-11-19 METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS
PCT/AT2005/000460 WO2006053362A2 (en) 2004-11-19 2005-11-16 Method for depositing layers from ionic liquids

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0801005A AT500782B8 (en) 2004-11-19 2004-11-19 METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS

Publications (3)

Publication Number Publication Date
AT500782A4 AT500782A4 (en) 2006-03-15
AT500782B1 true AT500782B1 (en) 2006-03-15
AT500782B8 AT500782B8 (en) 2007-02-15

Family

ID=36037233

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0801005A AT500782B8 (en) 2004-11-19 2004-11-19 METHOD FOR SEPARATING LAYERS FROM IONIC LIQUIDS

Country Status (2)

Country Link
AT (1) AT500782B8 (en)
WO (1) WO2006053362A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1983078A1 (en) * 2007-04-17 2008-10-22 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Electrodeposition
DE102008031003B4 (en) * 2008-06-30 2010-04-15 Siemens Aktiengesellschaft A method of producing a CNT-containing layer of an ionic liquid
DE102009055828A1 (en) 2008-12-19 2010-07-01 Merck Patent Gmbh Preparing metal coated particles, useful e.g. in lacquers, colors, inks, pigment mixtures, comprises electrochemical metal deposition of metals on the particle substrate, whose surface is electrically conductive or semi-conductive
GB2470590B (en) * 2009-05-29 2014-07-23 Astron Advanced Materials Ltd Electrodeposition of elemental zirconium
CN101949044B (en) * 2010-09-20 2011-12-28 大连海事大学 Niobium electro-osmosis method for steel surface in ionic liquid
DE102013202254A1 (en) * 2013-02-12 2014-08-14 Siemens Aktiengesellschaft Process for the production of high energy magnets
DE102014215873A1 (en) * 2014-08-11 2016-02-11 Siemens Aktiengesellschaft Electrochemical deposition of a heavy rare earth material to increase the coercivity of rare earth permanent magnets

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3422731A1 (en) * 1983-07-21 1985-01-31 Laboratoire Suisse de Recherches Horlogères, Neuchâtel METHOD FOR ELECTRICALLY DEPOSITING METALS
US5827602A (en) * 1995-06-30 1998-10-27 Covalent Associates Incorporated Hydrophobic ionic liquids
DE10108893A1 (en) * 2001-02-23 2002-10-24 Rolf Hempelmann Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3442172A1 (en) * 1983-11-30 1985-06-05 Allied Corp., Morristown, N.J. MELTED, NON-AQUEOUS ELECTROLYTE COMPOSITION
US6881321B2 (en) * 2000-10-20 2005-04-19 The University Of Alabama Production, refining and recycling of lightweight and reactive metals in ionic liquids

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3422731A1 (en) * 1983-07-21 1985-01-31 Laboratoire Suisse de Recherches Horlogères, Neuchâtel METHOD FOR ELECTRICALLY DEPOSITING METALS
US5827602A (en) * 1995-06-30 1998-10-27 Covalent Associates Incorporated Hydrophobic ionic liquids
DE10108893A1 (en) * 2001-02-23 2002-10-24 Rolf Hempelmann Production of metals and their alloys and compound semiconductors comprises galvanically depositing metals, alloys or compound semiconductors from an ionic liquid or suitable molten salt in an electrolysis device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
HORLOGERES) 31. JÄNNER 1985 (31.01.1985) *

Also Published As

Publication number Publication date
AT500782B8 (en) 2007-02-15
WO2006053362A3 (en) 2006-07-20
AT500782A4 (en) 2006-03-15
WO2006053362A2 (en) 2006-05-26

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