AT342719B - Verfahren zum herstellen dunner schichten aus wolfram oder molybdan - Google Patents

Verfahren zum herstellen dunner schichten aus wolfram oder molybdan

Info

Publication number
AT342719B
AT342719B AT665674A AT665674A AT342719B AT 342719 B AT342719 B AT 342719B AT 665674 A AT665674 A AT 665674A AT 665674 A AT665674 A AT 665674A AT 342719 B AT342719 B AT 342719B
Authority
AT
Austria
Prior art keywords
molybdane
tungsten
thin films
manufacturing thin
manufacturing
Prior art date
Application number
AT665674A
Other languages
English (en)
Other versions
ATA665674A (de
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732346394 external-priority patent/DE2346394C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of ATA665674A publication Critical patent/ATA665674A/de
Application granted granted Critical
Publication of AT342719B publication Critical patent/AT342719B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
AT665674A 1973-09-14 1974-08-14 Verfahren zum herstellen dunner schichten aus wolfram oder molybdan AT342719B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732346394 DE2346394C3 (de) 1973-09-14 Verfahren zum Herstellen dünner Schichten aus Wolfram oder Molybdän

Publications (2)

Publication Number Publication Date
ATA665674A ATA665674A (de) 1977-08-15
AT342719B true AT342719B (de) 1978-04-25

Family

ID=5892609

Family Applications (1)

Application Number Title Priority Date Filing Date
AT665674A AT342719B (de) 1973-09-14 1974-08-14 Verfahren zum herstellen dunner schichten aus wolfram oder molybdan

Country Status (6)

Country Link
US (1) US3963839A (de)
JP (1) JPS5329311B2 (de)
AT (1) AT342719B (de)
CH (1) CH606478A5 (de)
FR (1) FR2244013B1 (de)
GB (1) GB1442109A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722668C3 (de) * 1977-05-18 1980-04-10 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen dünner Schichten aus hochtemperaturfesten Metallen wie Wolfram, Molybdän, Rhenium oder Osmium
US5516595A (en) * 1986-09-16 1996-05-14 Lanxide Technology Company, Lp Production of ceramic and ceramic-metal composite articles with surface coatings
US5064788A (en) * 1986-09-16 1991-11-12 Lanxide Technology Company, Lp Production of ceramic and ceramic-metal composite articles with surface coatings

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462298A (en) * 1964-09-09 1969-08-19 Nippon Electric Co Oxide coating for semiconductor surfaces
US3294654A (en) * 1965-07-28 1966-12-27 Ethyl Corp Metal plating process
US3669724A (en) * 1970-09-28 1972-06-13 Motorola Inc Method of vapor depositing a tungsten-tungsten oxide coating

Also Published As

Publication number Publication date
JPS5056379A (de) 1975-05-17
FR2244013A1 (de) 1975-04-11
JPS5329311B2 (de) 1978-08-19
DE2346394B2 (de) 1976-01-29
CH606478A5 (de) 1978-10-31
ATA665674A (de) 1977-08-15
GB1442109A (en) 1976-07-07
DE2346394A1 (de) 1975-04-10
FR2244013B1 (de) 1979-01-05
US3963839A (en) 1976-06-15

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee