AT240947B - Verfahren zum Herstellen von Leitungsmustern für applizierte Schaltungen - Google Patents

Verfahren zum Herstellen von Leitungsmustern für applizierte Schaltungen

Info

Publication number
AT240947B
AT240947B AT431263A AT431263A AT240947B AT 240947 B AT240947 B AT 240947B AT 431263 A AT431263 A AT 431263A AT 431263 A AT431263 A AT 431263A AT 240947 B AT240947 B AT 240947B
Authority
AT
Austria
Prior art keywords
line patterns
producing line
applied circuits
circuits
producing
Prior art date
Application number
AT431263A
Other languages
English (en)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of AT240947B publication Critical patent/AT240947B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0957—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer with sensitive layers on both sides of the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT431263A 1962-05-31 1963-05-28 Verfahren zum Herstellen von Leitungsmustern für applizierte Schaltungen AT240947B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US199575A US3264105A (en) 1962-05-31 1962-05-31 Method of using a master art drawing to produce a two-sided printed circuit board

Publications (1)

Publication Number Publication Date
AT240947B true AT240947B (de) 1965-06-25

Family

ID=22738130

Family Applications (1)

Application Number Title Priority Date Filing Date
AT431263A AT240947B (de) 1962-05-31 1963-05-28 Verfahren zum Herstellen von Leitungsmustern für applizierte Schaltungen

Country Status (2)

Country Link
US (1) US3264105A (de)
AT (1) AT240947B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3341329A (en) * 1963-09-26 1967-09-12 American Can Co Photomechanical method for producing cutting dies
US3423205A (en) * 1964-10-30 1969-01-21 Bunker Ramo Method of making thin-film circuits
US3537854A (en) * 1968-05-15 1970-11-03 Ibm Holographic method for generating masking patterns
US3506442A (en) * 1968-09-27 1970-04-14 Bell Telephone Labor Inc Photomask modification and registration test methods
BE757067A (fr) * 1969-10-03 1971-03-16 Eastman Kodak Co Procede de fabrication d'objets par voie photographique
US3713741A (en) * 1972-01-03 1973-01-30 Western Electric Co Methods of and apparatus for locating solder faults
US4115003A (en) * 1976-07-06 1978-09-19 Fotel Inc. Graphic aid and method and system of making reproductions therefrom
JPS5312084A (en) * 1976-07-21 1978-02-03 Mitsubishi Electric Corp Method of producing printed circuit substrate original drawing
US4308339A (en) * 1980-02-07 1981-12-29 Westinghouse Electric Corp. Method for manufacturing tape including lead frames
US4557995A (en) * 1981-10-16 1985-12-10 International Business Machines Corporation Method of making submicron circuit structures
US4536470A (en) * 1982-09-07 1985-08-20 International Business Machines Corporation Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern
US4474465A (en) * 1982-09-07 1984-10-02 International Business Machines Corporation Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern
US4835078A (en) * 1987-07-06 1989-05-30 American Telephone And Telegraph Company Method for aligning photomasks
JP4411575B2 (ja) * 2002-04-25 2010-02-10 セイコーエプソン株式会社 電子装置の製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3156563A (en) * 1964-11-10 Light
US2971841A (en) * 1956-02-20 1961-02-14 Kenneth W Moore Process for the production of color separation negatives or positives for color reproduction
US2942973A (en) * 1957-09-11 1960-06-28 Russell M Patrick Method of making drawings
GB867559A (en) * 1959-12-24 1961-05-10 Standard Telephones Cables Ltd Improvements in or relating to the production of two or more stencils in mutual register

Also Published As

Publication number Publication date
US3264105A (en) 1966-08-02

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