AT12292U3 - TUBE TARGET - Google Patents
TUBE TARGET Download PDFInfo
- Publication number
- AT12292U3 AT12292U3 ATGM562/2011U AT5622011U AT12292U3 AT 12292 U3 AT12292 U3 AT 12292U3 AT 5622011 U AT5622011 U AT 5622011U AT 12292 U3 AT12292 U3 AT 12292U3
- Authority
- AT
- Austria
- Prior art keywords
- pipe
- pipe section
- partially
- tube
- target
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/342—Hollow targets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3423—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3491—Manufacturing of targets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Die Erfindung beschreibt ein Rohrtarget aus Refraktärmetall oder einer Refraktärmetalllegierung, das zumindest einen Rohrabschnitt X mit einer relativen Dichte RDx und zumindest einen Rohrabschnitt Y mit einer relativen Dichte RDy umfasst, wobei zumindest ein Rohrabschnitt X zumindest bereichsweise einen größeren Außendurchmesser als zumindest bereichsweise ein Rohrabschnitt Y aufweist und das Dichteverhältnis die Beziehung (RDy-RDx)/RDy = 0,001 erfüllt. Weiters beschreibt die Erfindung ein Verfahren zur Herstellung eines Rohrtargets aus Refraktärmetall oder einer Refraktärmetall-Legierung durch Sintern und örtlich unterschiedlich hohes Verformen. Das Rohrtarget weist einen über die gesamte Oberfläche gleichmäßigeren Sputterabtrag auf im Vergleich zu Rohrtargets gemäß dem Stand der Technik. Die Rohrtargets neigen weder zum Arcen, noch zur Teilchengenerierung.The invention describes a pipe target made of refractory metal or a refractory metal alloy comprising at least one pipe section X with a relative density RDx and at least one pipe section Y with a relative density RDy, wherein at least one pipe section X at least partially has a larger outer diameter than at least partially a pipe section Y. and the density ratio satisfies the relation (RDy-RDx) / RDy = 0.001. Furthermore, the invention describes a method for producing a tube target made of refractory metal or a refractory metal alloy by sintering and locally different degrees of deformation. The tube target has more uniform sputter removal over the entire surface as compared to tube targets of the prior art. The tube targets are neither prone to arcen nor to particle generation.
Claims (25)
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATGM562/2011U AT12292U3 (en) | 2011-10-18 | 2011-10-18 | TUBE TARGET |
TW101134109A TWI550115B (en) | 2011-10-18 | 2012-09-18 | Tubular target |
ES12795724.9T ES2555876T3 (en) | 2011-10-18 | 2012-10-17 | Tubular white |
KR1020147009935A KR20140091677A (en) | 2011-10-18 | 2012-10-17 | Tubular target |
JP2014536061A JP2015501376A (en) | 2011-10-18 | 2012-10-17 | Tubular target |
PCT/AT2012/000262 WO2013056286A1 (en) | 2011-10-18 | 2012-10-17 | Tubular target |
PL12795724T PL2769002T3 (en) | 2011-10-18 | 2012-10-17 | Tubular target |
CN201280051077.0A CN104040019B (en) | 2011-10-18 | 2012-10-17 | Tubular target |
EP12795724.9A EP2769002B1 (en) | 2011-10-18 | 2012-10-17 | Tubular target |
US14/352,725 US20140238850A1 (en) | 2011-10-18 | 2012-10-17 | Tubular target and method of producing a tubular target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATGM562/2011U AT12292U3 (en) | 2011-10-18 | 2011-10-18 | TUBE TARGET |
Publications (2)
Publication Number | Publication Date |
---|---|
AT12292U2 AT12292U2 (en) | 2012-03-15 |
AT12292U3 true AT12292U3 (en) | 2013-03-15 |
Family
ID=45463107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ATGM562/2011U AT12292U3 (en) | 2011-10-18 | 2011-10-18 | TUBE TARGET |
Country Status (10)
Country | Link |
---|---|
US (1) | US20140238850A1 (en) |
EP (1) | EP2769002B1 (en) |
JP (1) | JP2015501376A (en) |
KR (1) | KR20140091677A (en) |
CN (1) | CN104040019B (en) |
AT (1) | AT12292U3 (en) |
ES (1) | ES2555876T3 (en) |
PL (1) | PL2769002T3 (en) |
TW (1) | TWI550115B (en) |
WO (1) | WO2013056286A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT14912U1 (en) * | 2015-05-06 | 2016-08-15 | Plansee Se | Connection piece for pipe target |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5725746A (en) * | 1990-08-10 | 1998-03-10 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
WO2006008197A1 (en) * | 2004-07-16 | 2006-01-26 | Bekaert Advanced Coatings | Cylindrical target obtained by hot isostatic pressing |
WO2007141173A1 (en) * | 2006-06-02 | 2007-12-13 | Bekaert Advanced Coatings | A rotatable sputter target |
US20090290685A1 (en) * | 2005-10-27 | 2009-11-26 | Kabushiki Kaisha Toshiba | Molybdenum alloy; and x-ray tube rotary anode target, x-ray tube and melting crucible using the same |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0342537B1 (en) * | 1988-05-16 | 1995-09-06 | Tosoh Corporation | Process for the manufacture of a sputtering target for producing electroconductive transparent films |
BE1007067A3 (en) * | 1992-07-15 | 1995-03-07 | Emiel Vanderstraeten Besloten | SPUTTER CATHOD AND METHOD FOR MANUFACTURING THIS CATHOD |
JPH06172991A (en) * | 1992-11-30 | 1994-06-21 | Mitsui Mining & Smelting Co Ltd | Ceramic target for magnetron sputtering |
JP3863204B2 (en) * | 1995-08-25 | 2006-12-27 | 株式会社アライドマテリアル | Sputtering target material and manufacturing method thereof |
JP2002302762A (en) * | 2001-04-04 | 2002-10-18 | Tosoh Corp | Ito sputtering target |
JP4014982B2 (en) * | 2002-09-19 | 2007-11-28 | 株式会社神戸製鋼所 | Rod target for arc evaporation source, manufacturing method thereof, and arc evaporation apparatus |
WO2005073418A1 (en) * | 2004-01-30 | 2005-08-11 | Nippon Tungsten Co., Ltd. | Tungsten based sintered compact and method for production thereof |
US20050279630A1 (en) * | 2004-06-16 | 2005-12-22 | Dynamic Machine Works, Inc. | Tubular sputtering targets and methods of flowforming the same |
AT8697U1 (en) * | 2005-10-14 | 2006-11-15 | Plansee Se | TUBE TARGET |
EP2024530A1 (en) * | 2006-06-02 | 2009-02-18 | Bekaert Advanced Coatings | A rotatable sputter target |
FR2944295B1 (en) * | 2009-04-10 | 2014-08-15 | Saint Gobain Coating Solutions | MOLYBDENE-BASED TARGET AND THERMAL PROJECTION DELIVERY METHOD OF A TARGET |
-
2011
- 2011-10-18 AT ATGM562/2011U patent/AT12292U3/en not_active IP Right Cessation
-
2012
- 2012-09-18 TW TW101134109A patent/TWI550115B/en active
- 2012-10-17 KR KR1020147009935A patent/KR20140091677A/en not_active Application Discontinuation
- 2012-10-17 WO PCT/AT2012/000262 patent/WO2013056286A1/en active Application Filing
- 2012-10-17 CN CN201280051077.0A patent/CN104040019B/en active Active
- 2012-10-17 EP EP12795724.9A patent/EP2769002B1/en active Active
- 2012-10-17 US US14/352,725 patent/US20140238850A1/en not_active Abandoned
- 2012-10-17 JP JP2014536061A patent/JP2015501376A/en active Pending
- 2012-10-17 PL PL12795724T patent/PL2769002T3/en unknown
- 2012-10-17 ES ES12795724.9T patent/ES2555876T3/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5725746A (en) * | 1990-08-10 | 1998-03-10 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
WO2006008197A1 (en) * | 2004-07-16 | 2006-01-26 | Bekaert Advanced Coatings | Cylindrical target obtained by hot isostatic pressing |
US20090290685A1 (en) * | 2005-10-27 | 2009-11-26 | Kabushiki Kaisha Toshiba | Molybdenum alloy; and x-ray tube rotary anode target, x-ray tube and melting crucible using the same |
WO2007141173A1 (en) * | 2006-06-02 | 2007-12-13 | Bekaert Advanced Coatings | A rotatable sputter target |
Also Published As
Publication number | Publication date |
---|---|
TW201329265A (en) | 2013-07-16 |
EP2769002A1 (en) | 2014-08-27 |
TWI550115B (en) | 2016-09-21 |
JP2015501376A (en) | 2015-01-15 |
ES2555876T3 (en) | 2016-01-11 |
WO2013056286A1 (en) | 2013-04-25 |
EP2769002B1 (en) | 2015-09-30 |
KR20140091677A (en) | 2014-07-22 |
CN104040019A (en) | 2014-09-10 |
CN104040019B (en) | 2016-06-29 |
PL2769002T3 (en) | 2016-03-31 |
US20140238850A1 (en) | 2014-08-28 |
AT12292U2 (en) | 2012-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102010062089A1 (en) | Surface-structured metallic glasses and methods of manufacture | |
DE102009042603A1 (en) | Method for producing a composite component | |
DE102010014303A1 (en) | Composite component for rolling steel, comprises a carrier made of powder metal, and a wear-resistant body made of hard metal that is embedded in sections in the carrier, where the hard-metal body is metallized in sections | |
DE112007003740T5 (en) | carbide rotary tool | |
DE102005025929A1 (en) | Steam oxidation of powder metal parts | |
DE69221690T2 (en) | ROTOR FOR OIL PUMP FROM AN ALUMINUM ALLOY AND ITS PRODUCTION METHOD | |
DE102006016147A1 (en) | Method for producing a honeycomb seal | |
DE112018001615T5 (en) | Valve seat made of sintered iron alloy with excellent thermal conductivity for use in internal combustion engines | |
DE112014001875T5 (en) | Bearing part and its manufacturing process | |
AT12292U3 (en) | TUBE TARGET | |
DE102016216486A1 (en) | From a cam acted upon lever for actuating gas exchange valves of an internal combustion engine | |
AT505698B1 (en) | METHOD FOR PRODUCING A SINTER-CURABLE SINTER MOLDING PART | |
DE112007003622T5 (en) | Powder metal gear with varying case hardness and method therefor | |
AT517383B1 (en) | plain bearing element | |
DE102011053740A1 (en) | Preparing a hard material tool component e.g. a full hard metal tool, comprises transforming and/or pressing or extruding a hard material, a sintering agent such as carbon monoxide, and/or binding agent to slug, and then sintering | |
DE102012013778B4 (en) | Forming tool made of a steel material with different material properties in some areas for the massive forming of a metal material and method for producing such a forming tool | |
DE102014205164B4 (en) | Bearing element for a rolling bearing | |
DE112014001906T5 (en) | Bearing item and method for producing a bearing part | |
DE102014224791A1 (en) | Metal matrix composite and process for its production | |
AT15262U1 (en) | Glass melting component | |
DE102018120574A1 (en) | Wälzgleitkörper and method for producing the same and rolling bearing, which has the Wälzleitkörper | |
DE102012006952B4 (en) | Method and device for influencing the grain size of a workpiece and workpiece | |
DE102007028823A1 (en) | Process for producing a sheet in a rolling mill | |
DE10320014B4 (en) | Apparatus for extruding pipes and profiles of steel, metal and metal alloys | |
DE102004060023B4 (en) | Method for producing a honeycomb seal segment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
HA | Change or addition of new inventor |
Inventor name: WILL TOBIAS, AT Effective date: 20121017 Inventor name: WOLF HARTMUT, AT Effective date: 20121017 Inventor name: KOECK WOLFGANG, AT Effective date: 20121017 Inventor name: LINKE CHRISTIAN, AT Effective date: 20121017 Inventor name: ABENTHUNG PETER, AT Effective date: 20121017 Inventor name: DRONHOFER ANDRE, AT Effective date: 20121017 |
|
MM01 | Lapse because of not paying annual fees |
Effective date: 20151031 |