AR216911A1 - Composicion para un electrodeposito y procedimiento para prepararlo - Google Patents

Composicion para un electrodeposito y procedimiento para prepararlo

Info

Publication number
AR216911A1
AR216911A1 AR266901A AR26690177A AR216911A1 AR 216911 A1 AR216911 A1 AR 216911A1 AR 266901 A AR266901 A AR 266901A AR 26690177 A AR26690177 A AR 26690177A AR 216911 A1 AR216911 A1 AR 216911A1
Authority
AR
Argentina
Prior art keywords
preparing
procedure
composition
electrical deposit
deposit
Prior art date
Application number
AR266901A
Other languages
English (en)
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Application granted granted Critical
Publication of AR216911A1 publication Critical patent/AR216911A1/es

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Chemically Coating (AREA)
  • Coating With Molten Metal (AREA)
AR266901A 1976-06-18 1977-03-18 Composicion para un electrodeposito y procedimiento para prepararlo AR216911A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69749076A 1976-06-18 1976-06-18

Publications (1)

Publication Number Publication Date
AR216911A1 true AR216911A1 (es) 1980-02-15

Family

ID=24801331

Family Applications (1)

Application Number Title Priority Date Filing Date
AR266901A AR216911A1 (es) 1976-06-18 1977-03-18 Composicion para un electrodeposito y procedimiento para prepararlo

Country Status (20)

Country Link
US (1) US4069112A (es)
JP (1) JPS52156138A (es)
AR (1) AR216911A1 (es)
AU (1) AU509447B2 (es)
BE (1) BE855425A (es)
BR (1) BR7702667A (es)
CA (1) CA1081650A (es)
DE (1) DE2718284A1 (es)
DK (1) DK271177A (es)
ES (1) ES457484A1 (es)
FR (1) FR2355096A1 (es)
GB (1) GB1521238A (es)
IT (1) IT1080255B (es)
MX (1) MX4434E (es)
NL (1) NL7706722A (es)
NO (1) NO772116L (es)
NZ (1) NZ183529A (es)
PL (1) PL198944A1 (es)
SE (1) SE7703113L (es)
ZA (1) ZA77896B (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2157319A (en) * 1984-04-13 1985-10-23 Toyo Kohan Co Ltd Tin free steel and its production
DE3416993A1 (de) * 1984-05-09 1985-11-21 Gerhard Collardin GmbH, 5000 Köln Waessrige, saure, nickel- und cobalt-ionen enthaltende elektrolyte zur galvanischen abscheidung von harten, anlaufbestaendigen, weiss glaenzenden legierungsueberzuegen
KR20180022700A (ko) * 2015-06-30 2018-03-06 맥더미드 엔쏜 인코포레이티드 마이크로일렉트로닉스 내의 상호연결들의 코발트 충진
EP3485069B1 (en) * 2016-07-18 2021-04-28 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
US11035048B2 (en) * 2017-07-05 2021-06-15 Macdermid Enthone Inc. Cobalt filling of interconnects
US12021191B2 (en) 2017-10-31 2024-06-25 Sumitomo Seika Chemicals Co., Ltd. Additive for nonaqueous electrolyte solutions, nonaqueous electrolyte solution and electricity storage device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1266377A (fr) * 1960-09-01 1961-07-07 Metal & Thermit Corp Dépôt électrolytique de nickel brillant
US3376207A (en) * 1965-05-17 1968-04-02 Patent Serm Ag Electrodeposition of nickel and electrolytes therefor
US3697392A (en) * 1970-07-02 1972-10-10 Allied Res Prod Inc Electrodeposition of nickel

Also Published As

Publication number Publication date
NO772116L (no) 1977-12-20
CA1081650A (en) 1980-07-15
PL198944A1 (pl) 1978-03-13
NL7706722A (nl) 1977-12-20
US4069112A (en) 1978-01-17
NZ183529A (en) 1979-01-11
DE2718284A1 (de) 1977-12-29
SE7703113L (sv) 1977-12-19
FR2355096A1 (fr) 1978-01-13
BE855425A (fr) 1977-10-03
ZA77896B (en) 1977-12-28
AU509447B2 (en) 1980-05-15
IT1080255B (it) 1985-05-16
JPS52156138A (en) 1977-12-26
AU2288577A (en) 1978-09-07
GB1521238A (en) 1978-08-16
ES457484A1 (es) 1978-03-16
DK271177A (da) 1977-12-19
MX4434E (es) 1982-05-04
BR7702667A (pt) 1978-03-28

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