AR025295A1 - USE OF PERFLUORALQUILSULPHONIC ACID SALTS AS AN ANTI-STATIC ADDITIVE IN POLYCARBONATES; POLYCARBONATE COMPOSITIONS; PROCEDURE FOR THE PRODUCTION OF POLYCARBONATE COMPOSITIONS; USE OF SUCH COMPOSITIONS FOR THE PRODUCTION OF MOLDING BODIES; CUE PRODUCTION PROCEDURE - Google Patents
USE OF PERFLUORALQUILSULPHONIC ACID SALTS AS AN ANTI-STATIC ADDITIVE IN POLYCARBONATES; POLYCARBONATE COMPOSITIONS; PROCEDURE FOR THE PRODUCTION OF POLYCARBONATE COMPOSITIONS; USE OF SUCH COMPOSITIONS FOR THE PRODUCTION OF MOLDING BODIES; CUE PRODUCTION PROCEDUREInfo
- Publication number
- AR025295A1 AR025295A1 ARP000104237A ARP000104237A AR025295A1 AR 025295 A1 AR025295 A1 AR 025295A1 AR P000104237 A ARP000104237 A AR P000104237A AR P000104237 A ARP000104237 A AR P000104237A AR 025295 A1 AR025295 A1 AR 025295A1
- Authority
- AR
- Argentina
- Prior art keywords
- production
- compositions
- dust
- procedure
- ion
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/16—Anti-static materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
Abstract
Uso de sales de ácidos perfluoralquilsulfonicos de la formula: RA-SO3X, en la que R significa cadenas carbonadas perfluoradas C1-30 lineales o ramificadas,A significa un enlace directo o un nucleo aromático bivalente, X significa un ion amonio alquilado y/o arilado NRRRR, ion fosfonio PRRRR,ion sulfonio SRRR, y un ion imidazolinio, un ion piridinio o un ion tropilio sustituido o insustituido, en los que R, R, R, R,independientemente uno de otro, representan cadenas carbonadas halogenadas o no halogenadas C1-30 lineales o ramificadas, o restos aromáticos o restosalquilaromáticos C1-4 en la porcion alquilo, que se usan como un aditivo antiestático en policarbonatos; composiciones de policarbonato; procedimiento para laproduccion de composiciones de policarbonato; uso de dichas composiciones para la produccion de cuerpos de moldeo; procedimiento para la produccion de cuerposde moldeo; y cuerpos de moldeo de policarbonato. En los cuerpos de moldeo de plástico el deposito de polvo, con formacion de marcas de polvo, es un problemaampliamente extendido. Especialmente molestos y limitantes de su funcion son los depositos de polvo en cuerpos de moldeo transparentes. Dichos cuerpos demoldeo se utilizan, por ejemplo, en el ámbito de los almacenamientos de datos opticos, electrotecnia, ingeniería automotriz, en el sector de la construccion,para contenedores de líquidos o para otros usos opticos. Para todos estos usos el deposito de polvo es indeseable y puede afectar a su funcion. Unprocedimiento conocido para reducir el deposito de polvo en los artículos de plástico es el uso de antiestáticos. Estos antiestáticos mejoran laconductibilidad eléctrica de las composiciones de moldeo plástico y así eliminan las cargas superficiales quese forman durante su produccion y uso. Por lotanto las partículas de polvo son menos atraídas y consiguientemente se reduce el deposito de polvo. Se hace generalmente una distincion entre antiestáticosinternos y externos. Un antiestático externo se aplica sobre el cuerpo de moldeo plástico después del procesamiento, mientras que un antiestático interno seUse of perfluoralkylsulfonic acid salts of the formula: RA-SO3X, in which R means C1-30 linear or branched perfluorinated carbon chains, A means a direct bond or a bivalent aromatic nucleus, X means an alkylated and / or arylated ammonium ion NRRRR, PRRRR phosphonium ion, SRRR sulfonium ion, and an imidazolinium ion, a pyridinium ion or a substituted or unsubstituted tropyl ion, in which R, R, R, R, independently of one another, represent halogenated or non-halogenated C1 carbon chains -30 linear or branched, or aromatic moieties or C1-4 alkylaromatic moieties in the alkyl portion, which are used as an antistatic additive in polycarbonates; polycarbonate compositions; process for the production of polycarbonate compositions; use of said compositions for the production of molding bodies; procedure for the production of molding bodies; and polycarbonate molding bodies. In plastic molding bodies, the dust deposit, with the formation of dust marks, is a widespread problem. Especially annoying and limiting of its function are the dust deposits in transparent molding bodies. Such demolishing bodies are used, for example, in the field of optical data storage, electrical engineering, automotive engineering, in the construction sector, for liquid containers or for other optical uses. For all these uses the dust deposit is undesirable and may affect its function. A known procedure to reduce the deposit of dust in plastic articles is the use of antistatics. These antistatics improve the electrical conductivity of plastic molding compositions and thus eliminate the surface charges that form during their production and use. Therefore, the dust particles are less attracted and consequently the dust deposit is reduced. A distinction is usually made between internal and external antistatic. An external antistatic is applied on the plastic molding body after processing, while an internal antistatic is
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19938735 | 1999-08-16 | ||
DE19943637A DE19943637A1 (en) | 1999-08-16 | 1999-09-13 | Antistatic |
Publications (1)
Publication Number | Publication Date |
---|---|
AR025295A1 true AR025295A1 (en) | 2002-11-20 |
Family
ID=7918512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ARP000104237A AR025295A1 (en) | 1999-08-16 | 2000-08-16 | USE OF PERFLUORALQUILSULPHONIC ACID SALTS AS AN ANTI-STATIC ADDITIVE IN POLYCARBONATES; POLYCARBONATE COMPOSITIONS; PROCEDURE FOR THE PRODUCTION OF POLYCARBONATE COMPOSITIONS; USE OF SUCH COMPOSITIONS FOR THE PRODUCTION OF MOLDING BODIES; CUE PRODUCTION PROCEDURE |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP4803932B2 (en) |
KR (1) | KR20020027545A (en) |
AR (1) | AR025295A1 (en) |
DE (2) | DE19943637A1 (en) |
HK (1) | HK1049677A1 (en) |
IL (1) | IL147680A (en) |
ZA (1) | ZA200200382B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2407968C (en) * | 2000-05-12 | 2010-03-30 | Bayer Aktiengesellschaft | Antistatic agent |
DE10119416A1 (en) * | 2001-04-20 | 2002-10-24 | Bayer Ag | Layer system comprising at least two layers of thermoplastics, useful for the production of molded articles and extrudate, has at least one layer that contains a sulfonate antistatic compound. |
DE10131764A1 (en) * | 2001-06-30 | 2003-01-09 | Cognis Deutschland Gmbh | Use of fluoroalkanesulfonic acids to stabilize halogen-containing organic plastics |
ATE349705T1 (en) * | 2002-08-27 | 2007-01-15 | Jsr Corp | ANISOTROPIC CONDUCTIVE FILM AND IMPEDANCE MEASUREMENT PROBE |
JP2006137106A (en) * | 2004-11-12 | 2006-06-01 | Nitto Denko Corp | Adhesive sheet for removing solvent containing matter |
US20070203271A1 (en) * | 2006-01-27 | 2007-08-30 | Alms Gregory R | Coating process for thermoplastics |
CN101374905B (en) | 2006-02-13 | 2013-07-03 | 东丽株式会社 | Antistatic thermoplastic resin composition and molded article composed thereof |
JP5275024B2 (en) * | 2006-03-31 | 2013-08-28 | 広栄化学工業株式会社 | Antistatic agent and antistatic resin composition containing the same |
EP2157133A1 (en) * | 2008-08-19 | 2010-02-24 | Bayer MaterialScience AG | Films with improved characteristics |
KR101367404B1 (en) * | 2010-04-28 | 2014-02-25 | 주식회사 엘지화학 | Thermoplastic composition for smart card |
JP6766709B2 (en) * | 2017-03-15 | 2020-10-14 | 三菱エンジニアリングプラスチックス株式会社 | Polycarbonate resin composition and its molded product |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4112206A (en) * | 1977-07-05 | 1978-09-05 | Continental Oil Company | Polyvinyl chloride having improved antistatic properties |
US4570197A (en) * | 1983-01-03 | 1986-02-11 | Minnesota Mining & Manufacturing Company | Static reduction in magnetic recording cassettes |
US4505990A (en) * | 1983-07-14 | 1985-03-19 | Hercules Incorporated | Coating compositions |
JPS61285232A (en) * | 1985-06-13 | 1986-12-16 | Daikin Ind Ltd | Antistatic agent composition |
JP2767772B2 (en) * | 1987-09-30 | 1998-06-18 | 竹本油脂株式会社 | Antistatic agent for synthetic polymer materials |
US4806571A (en) * | 1988-05-06 | 1989-02-21 | The Dow Chemical Company | Organic composition containing a fluoroalkyl sulfonic acid salt |
DE4015184A1 (en) * | 1990-05-11 | 1991-11-14 | Hoechst Ag | ANTISTATICALLY EQUIPPED PLASTIC MOLDING |
US5176943A (en) * | 1991-07-09 | 1993-01-05 | Minnesota Mining And Manufacturing Company | Optical recording medium with antistatic hard coating |
JPH10265673A (en) * | 1997-03-25 | 1998-10-06 | Mitsubishi Chem Corp | Polymer compound composite material and its production |
US6194497B1 (en) * | 1997-07-23 | 2001-02-27 | General Electric Company | Anti-static resin composition containing fluorinated phosphonium sulfonates |
-
1999
- 1999-09-13 DE DE19943637A patent/DE19943637A1/en not_active Withdrawn
-
2000
- 2000-08-03 JP JP2001517603A patent/JP4803932B2/en not_active Expired - Lifetime
- 2000-08-03 KR KR1020027001962A patent/KR20020027545A/en active Search and Examination
- 2000-08-03 DE DE50006899T patent/DE50006899D1/en not_active Expired - Lifetime
- 2000-08-16 AR ARP000104237A patent/AR025295A1/en not_active Application Discontinuation
-
2002
- 2002-01-16 ZA ZA200200382A patent/ZA200200382B/en unknown
- 2002-01-17 IL IL147680A patent/IL147680A/en not_active IP Right Cessation
-
2003
- 2003-03-07 HK HK03101683.7A patent/HK1049677A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
IL147680A (en) | 2010-12-30 |
HK1049677A1 (en) | 2003-05-23 |
JP4803932B2 (en) | 2011-10-26 |
DE19943637A1 (en) | 2001-02-22 |
DE50006899D1 (en) | 2004-07-29 |
KR20020027545A (en) | 2002-04-13 |
ZA200200382B (en) | 2003-03-26 |
JP2003507510A (en) | 2003-02-25 |
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