AP1357A - Device for plasma incision of matter with a specifically tuned radiofrequency electro-magnetic field generator. - Google Patents
Device for plasma incision of matter with a specifically tuned radiofrequency electro-magnetic field generator. Download PDFInfo
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- AP1357A AP1357A APAP/P/2001/002064A AP2001002064A AP1357A AP 1357 A AP1357 A AP 1357A AP 2001002064 A AP2001002064 A AP 2001002064A AP 1357 A AP1357 A AP 1357A
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/042—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating using additional gas becoming plasma
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/12—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by passing a current through the tissue to be heated, e.g. high-frequency current
- A61B18/1206—Generators therefor
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B2018/00636—Sensing and controlling the application of energy
- A61B2018/0066—Sensing and controlling the application of energy without feedback, i.e. open loop control
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Abstract
The invention is a device to place in incision into matter (32) with a harmonious plasma cloud. A radio frequency generator system (10) produces electromagnetic waveform which is transmitted by an active transmitter incising electrode tip (28). This electromagnetic wave is utilized to initiate a plasma cloud with processes such as thermal ionization, and a photoelectric effect which then triggers an avalanche effect for charged atomic particles at the surface of the active transmitter incising electrode tip (28). This electromagnetic wave is impedance matched, frequency matched, power matched, tuned to the plasma in order to sustain, control a harmonious plasma cloud which demonstrates reduced atomic particle turbulence, and chaos while forming a coating over the surface of the active transmitter incising electrode tip (28). The magnetic bottle effect, the pinch effect, and the tunneling effect are employed to trap, contain, compress, contour, focus, and amplify the energy of the incising plasma cloud.
Description
DEVICE COR PLASMA INCISION OF MATTER WITH Λ SPECIFICALLYTONED RABIOFREQUENCY ELECTROMAGNETIC FIELD GENERATOR Ίhis invention reiates to a. eiasone generation device ompiGymd to piece on iemLk ro.v nNcasc" eTomd eymvoomm omsm-οο NTs svmom.: m lo-m-mmow cove,mo iremsordner mmsTm ;mebs of mm' imommcm,
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NanNped. pMMcN biodes, mi es s meml bMN. e sa.-obem bhco. or s -omerm· blade a-e Neo devices mmst Aoveeeth' employed -o reoao- on mmm:m Lve mo no. :--0-meisimoo me imsed on ΤΕαΝ :MyMm! interned·'no memo .. Mm nm maheMmd mem ceaTom a smldee od Tie mTsr to bo nemo Am prnm" ooymnvmbmbs M me imtdeoma mom mmmoting to cm Lmm> m-smer mmv-v memcr aineNiciem mm doemfem -menbemoe mndLcnm nmndm mvems emo m onmA mveembm dm inamm Tabm Mem os mb oom. Gonse mom: m; omvmm meoie. one on eeom.ee··even mod. Ter Mse mmoms., mimes heme eesmmod x. Meicm mom vs mem moodonmemmo meinm emmremomMmm rm memvosmyey: mmoanmo M;m meso memo o·: chaos (?f classic disharmonious plasma arcing as well as control she physic;.·characteristics of the plasma produced by our device. Our Invention minimizesdisharmonious plasma aming by reducing the atom·’-: panicle mrbuience in the r lasmicloud thereby greatly reducing the plasma cloud atomic particle chaos and therebycreating a harmonious plasma cloud. Harmonious plasma cuts in a more controllerefficient and safer manner because the atomic particle components in a harmoniousplasma cloud exist in a more stable, balanced, and controlled stats with a higher order oforganization and less atomic particle turbulence than dtshamnonious plasma. Ourharmonious plasma cloud is furthermore compressed, controlled, contoured and shaped by-utilizing the Pinch Effect of physics. Our compressed plasma cloud is then trapped andcontained by the Magnetic Bottle Phenomenon well known to physicists and employed wfields such as nuclear physics. As opposed to classic olecuocuttinu or shetrosurgiebunit'·, our device cuts with a harmonious controlled plasma cloud rather than classic or me.disibenrw. A.cco;'ding’y. severs! cifects arc advantages of the prescm mverhor; ur: A) to provide or. incisional device slot, irtt or 1000:005.,-0 0,, - cit.diofrscroncy sicutn goroodor. κιϊραρο.ρ. nopraooco rr.vroory oy rotted rc e. network, as well as a transmitter probe to generate, amplify, condition and transom rr.a 1 not ~oma g net ic wa < . (b) to employ a solid, non-hollow conductive radiozequcncy transmifter probe tocreate maintain and control plasma. Nonetheless, the transmitter probe may be tompirmyhollow or partially hollow in design. (c) to produce a plasma cutting blade horn an electronic electromagnetic heftgenerator system which requires lower system input energy- relative to other electrocuting;incisional methods presently in use. even as love as 2 watts of average tncut pow- .Likewise, this system requires lower system output energy relative to other ekctroccroupincisional methods presently in use, even as low as i watt of av-emge output pc wen (d) to create a cutting plasma cloud without this necessity of injecting an ’ordziddenas into the field of cutting an is seen in plasma generating devices such as plasma 10cvnand etching systems in plasma chambers. system acts to minimize she potential sice effects of electtcntagnefic radiation cxnosur;-..Furthermore, this electromagnetic radiation reflected back into the piasma cloud acts tofurther energize the harmonious plasma cloud thereby flinher reducing the ou'out energvrequired from the electromagnetic generator system to sustain the plasma cbrnd iffeffective cutting. (i) to use a harmonious plasma cloud condensed around the activated transmitterincising electrode tip to focus the kinetic energy of the cutting plasma into a thinnercutting path in order to produce a discrete, clean incision into matter with minimal impactor sice effects to matter outside of the intended path of incision. (m) to produce an alternative to purely physical energy cutting techniques such asknives and metal blades, while also providing a more efficient, more effective, moreprecise, and cleaner cutting device than other cutting modalities presently available. (ha) to produce a less excerffive cuffing device than other mg.·': wcbefficey outtirvdevices commercially available, such as laser.
Two drawings ere enclosed in this patent anpheetiomPin 1 shews a me. weehre .Twee vfrh < n e incising transmitter probe system and the matter :nte e ,ww en wee non w gemFig 2 shows a plasma cutting device with a reffiffive couphng tec wee·· me srensmh' er p-ffm svstem and the matter bee vhifffr an bicffi.cn is maced. •'Ϊ
Reference Numerals in Brewings 10 radio frequency signal eensraww 12 radiofrequency switch 14 on-off button Z c n-off s witch 16 burst inode duty cycle generator 1 fl continuous mode free running generator 20 signal gate 22 power amplifier 2ffi impedance matching and output conditioning nerwork26 incising transmitter handpiece -queue : *·’ ‘i .re , . ‘ ικ·ι c ftp Ο our device produces a harmonious, controlled plasma that focuses energy into the Intendedpath of incision as opposed to the caustic, disharmonious plasma arcing seen in classicelectrocutting or electrosurgical units. This cloud of harmonious plasma manifests loweratomic particle chaos and produces a more efficient incision in matter than class-'celectro cutting or electrosurgical systems.
Description - Figs. 1 to 2 A typical embodiment of the plasma incision device of the present invention isillustrated in Fig I ana Fig 2. An output signal of a radiofrcquency signal generator (10) isswitched on and off with a radio frequency switch (12) by several means such as an on-offbutton or on-off switch (14). The output signal of the radiofrequency signal generator isthen slaved through a signal gate (20) to either a burst mode duty cycle generator (16) or acontinuous mode free running generator (IS). The burst mode or continuous modsradio frequency cutout signal is then amplified through a power srapiniur (22). The outputsiawd of fro u'vn·· a-'ofrifrer is than eoifrfrofr ’-do. an rwfriw mr*>, w oo CGifridonmp .frww (24) auc’ is won crttwwiwi nn.c to.; wow. ceoweg .wwwohandpiece (22). When activated, so incising electrode tip (23) at fw mo rows end -wincising Pansuhtioi· nondpieca (,(6) is coated with a piosow clood width u otto to yfru- : --incision path into the matter into which an incision is placed (32). Nfritter into whicn t.incision, is placed (32) may be coupled to our plasma cutting system cither by a capacity tcoupling plate (30) or a resistive coupling frwwtode (3w 2-otiw uwismg wowrodt w(28) is preferably a solid, non-hollow conductor although a partial or completely no Cowincising electrode tip may be utilized. Incising electrode tip (28) is preferably linear orcurvilinear in design; however, the shape of incising electrode tip (22; o; not neccssard;·specific in design and may even have a loop or polygon design.
Operation - Figs 1 to 2
Our invention for incising matter is different from all prior devices for tncismqmatter. An on-off button / on-o.ff switch (14) is used to activate or deactivate aradiofrequency switch (12). This therefore regulates the transmission of an output signal ofa radio frequency signal generator (10)· Output signal oi a radiofrequency signal generator(10) is further controlled such that its transmission is activated or deactivated by a burs* 9 produced by expensive and high energy consumption systems such as lasers or elaborateplasma etching chambers. The levels of atomic particle turbulence and chaos manifestedby classic electrocuttine or electrosurgical units are employed tv us as-a rTafive standardfor defining an increase or decrease in atomic particle turbulence cr chaos in nlasma.
Our system employs an inexpensive, electronic radio frequency generator/amplifiersystem to produce, condition and transmit a continuous or pulsed electromagnetic fieldfrom an incising electrode tip (28). The cycle time of the electromagnetic field pulsedmode is variable and each complete on-off cycle of the pulsed mode may be as short as0.000001 of a second. Specific parameters of this electromagnetic field generator systemare largely determined by the atomic particle composition along the interface of theincising electrode tip (28) and the matter into which an incision is placed (32). Our systemutilizes the atoms along the interlace of the incising electrode tip (28) and the matter intowhich an incision is ulaced (32) to generate a plasma cloud as opposed to systems whichrequire an ionizable gas to be injected into the field of incision and Thereupon have theinjected gas enspized and converted into plasms. Nonetheless, out plasma cutting system□tv cmoTy onyheraourtrY fofomfofo gas fod πιο the doh Tun u. Ting t... (fofoy m outer to augment the cutting process. Our invemion m,s am, he vaver. vestsubsmntiaTy cc'uTTased fonlgns fa the -.0-./01..200:- Tuny 0 00.0 0 · , ? u ooeot . plasma control devices such as a tekamak or eye'eracm
The electromagnetic wave created by our system n- a form of radmuelectromagnetic energy and is transmitted Tom the active tncfoiug eiem-OcT tip (28; of ν·ν·system. The radiant electromagnetic energy is specifically conditioned to interact wimatoms and molecules at the surface of tbs active incising eiectrode tip (28 s.Electromagnetic ffequencies secondarily produced front ztemte particle ir.ietacnon anadvnamics at the plasma incising electrode tip (28) play a substantial role m tre systemfunction and effectiveness. Harmonic frequencies 01 the lunaanieutai generatedelectromagnetic waveform often play a substantial role in system runcron, dynamics andeffectiveness. The radiant electromagnetic energy intcraetion won atoms and moleculesincludes thermal ionization and the photoelectric etiset vvmcn strip electrons trom trieatomic orbitals of atoms at ths interface of the matter into which mi incision is placed (32)and the incisins electrode tip (28). Such processes result in atomic transformation of atomsano molecules into ions and free electrons. The tree charged atomic parpens move
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11 that they possess less atomic particle chaos and a higher order of organization than seen inplasma arcs of classic electrocutting systems thereby allowing our device to generate aharmonious plasma cloud.
The levels of atomic particle turbulence and chaos manifested in classicelectrocutting or electrosurgical units are employed by us to create a relative standard orbaseline from which we may define and demonstrate an increase or decrease in themagnitude of atomic particle turbulence or chaos in plasma.
The effects of electromagnetic wave frequency and electromagnetic wave power orfield strength are interrelated and dynamic. Nuclear Magnetic Resonance teaches us thatprecessing atomic particles may absorb radiant electromagnetic energy when that atomicparticle precession frequency and the frequency of the radiant electromagnetic energy arcin resonance. In other words, Nuclear Magnetic Resonance demonstrates that efficientabsorption of electromagnetic energy occurs when the atomic particle is frequencymatched to the radiant electrcmagnetic wt ve frequenev, Our device demomutte;analogous relationship regarding the importance of frequency mmehing oir tr?nsnfi;wrelectromagnetic wave to the atomic particle properties composing tin plasma cloudsurrounding the incising ek-ctrodc tip (28).
Nuclear Magnetic Resonance also teaches us that the prequency or atom:. .r oOprecession may be directly related to the strength of the magnetic field in which the atomicparticle exists. Therefore, the stronger the applied magnetic field, the higher theelectromagnetic field frequency required to achieve the resonance needed for efficientenergy absorption. Likewise, the electron gyrofrequencies in the ”D" and “E” layers of theearth's ionosphere substantially increase as we move from the equator toward themagnetic poles of the earth, either north pole or south pole. Respecting similar scientificprinciples, our device addresses the Issue of field strength and electromagnetic frequencyand thereby power matches and frequency matches our transmitted electromagnetic waveto the atomic particles composing the plasma cloud coating the incising electrode tip (28).Nonetheless, individual parameters of our electromagnetic field generator system varysubstantially when placing an incision into different types of matter and are substantiallydependent upon the atomic particle composition along the interface of the incisingelectrode tip (28) and the matter into which an incision is placed (32). - , '·. . a . ” . 1 . ’ , y 1 , ι··..ιϊcii ·. , e!e:r e . L- .v .: 3 · ’ ·. iY3 · t , · · . * J •’i·,. ’ Λ.Ί -1· ·' ..I · . , . , . .·' r i V'' . jeci .3 3., 'Γ'^Λ-Ίί . ir\i 31’ .. i3 j ti.:rrey. . · r . . . ,-. > *'· ;.V " b"‘h /: · ."3; ·!'.·, \ S'Ci'.i; r, i .-/y . rhe ·:_ so ·. . Le ·. ".3;i· . *’nr, , . , · 1 l e . , > J' ; / ' , z -i ' ✓L, . ' C·-’ ; . ? ' , .n ,% ’ *<? - "j;- . “ i. ,"
As the electromagnetic field traverses the thin coating of harmonious plasmasurrounding the activated incising electrode tip (28\ the electromagnetic field is slowlydamped or decreased in amplitude. Finally, the electromagnetic field will pass completelythrough the plasma cloud and will encounter matter outside of the intended incision path,namely the matter which surrounds the cloud of incising plasma. According to thephysical chemistry principle of Tunnelling, the generated electromagnetic wave thenencounters a barrier to which it is not tuned nor impedance matched and thereby asubstantial percentage of the remaining energy of the electromagnetic wave is reflectedback into the harmonious plasma cloud. This reflected electromagnetic energy acts tofurther energize the molecular particles in the plasma cloud, thereby reducing the outputenergy which must be transmitted by the electromagnetic wave generator system. Thisprocess also serves to minimize the percentage of total electromagnetic radiation thatpenetrates into, that reacts with, and that presents potential radiation exposure damage tomatter outside of the intended incision path,
The ct x+rAAA fivco of cw goo-rated cm-redc fie’o is used " mmroi Ao :.o o.between the atomic particles in the harmonious plasma cicud anc. the curie e of theactivated incising electrode tip (28). The ionized particles travel in spiral paths in magneticfields while the bdotduA nu o pcoiAos nuy shoukan-v-sAy 1 wAup:, Axtp;spinning and/or precessing. Furthermore, the Pinch Effect vvhicn has burn usco tor ma-7years in fields such as plasma physics is employed in our system. lit tins way, we are ableto compress, contour, shape and control the harmonious plasma cloud whh a sc lid cohollow transmitter incising electrode tip (28). We also employ the Magnetic Bottle Effectused in fields such as nuclear physics to trap and contain the compressed plasma cloudwithout the need of solid matter containment vessels and thereby avoid the requirement toemploy hollow or cavity containing incising tip probes to trap and control the plasmacloud. Increasing the density of atomic particles in the harmonious plasma cloud allowsus to substantially increase the plasma cloud power density, thereby improving the cuttingefficiency and power of the plasma cloud.
Furthermore, comoressing the plasma cloud causes a substantial decrease in the cross sectional diameter of the plasma cloud thereby decreasing the width cf the intended incision path as well as minimizing side effects or potential adverse impact on matter outside of the intended path of incision. Once the electromagnetic wave generator system o cA' ; P"i-·
:,. ,. . : ,_n , be ; . -'tJ of the harmonious pia/i.... i 10 a point at which the atomic , ·., comprising the plasma c cues cm ,,· .... . the state: of matter known as t t c;·· . . . mhicaiicas. tn ' l.e;.c . · bi··:·.. Lir..· i;. , -ill see that employing a ·. . · : , .. - 1 . to i harmonious plasma which raap ve he snap e·.. , s . a._ cue pi . ., . ttaracteristics controlled m! '·'· > · t ο · Λ·!)οα. , , ·,! more cost efh* no a > ‘ m · • , . ',··. i lee . or electro sure? cal units ertploy,.io<'UCt . .-into matter. our radiofrequency . , ;uh, war- ,. · wer to create and sustain a that ci0 • a> ·.· op. he' . : ' e: a ’ p- . . . , ' a : .· .10·· . ; c , ·’ ' io ( · p ear m : .,· m·. ? v . 1 ο. . t.. s y h·. / · . / · .1 < · hoe c; a? aoeo aOeecieS eun/ooe doe ,· , · 1 aU'pes in that ( b 1 ' e lw r '·; pa snta; - . . a v . 'p.; 0.1 .
tiOfLbtc p 1 1 · oi'piasni'P it .a 0...,0.1 . at v- mdt a sy r · a ' : ' P, μ- or’' i · ii s to maximize . 1 - ‘ - . /. ·ι-.ΐ.zed or a, it · .a. ο. e,ae.,.a . · .winks to ••ikw ’< n 1 ‘ a·' • : η ·>ϊ,'> .-.ο,, , . two; inar.iic a >, ..ks >. . ’ • a ay. spa · d/er pn >’0;. jo·'.. p m ^.·ι e? v t λ.· ο . am.. „ „· , m.'e.ka·’ dwed with el? n pL.. 0 . •e.u '..-on a. /jus plasma; ΑΡ ο ο 1 3 5 7 15 • it produces an incision into matter with a thinner corridor of matter involved in thepath of incision; • it produces an incision into matter which utilizes the Tunnelling Effect of physicalchemistry to shield matter outside of the intended path of incision fromelectromagnetic radiation, thereby eliminating the need to employ shields constructedof various forms of matter; • it utilizes the Magnetic Bottle Effect to trap the created plasma around the incisingelectrode tip; • it utilizes the Pinch Effect to compress, contour and control both the shape and densityof the plasma cloud, thereby eliminating the need for bulky containment chambers toencase the generated plasma; • it eliminates the need for substantially complicated designs for transmitter incisingelectrode tips; • it eliminates the need for elaborate plasma control devices or chambers such as ateksmak or cyclotron; and • it produces an incision into matter which is inexpensive, clean, efficient, safe andcontrollable.
Although the description above contains many specifications, these should not beconstrued as limiting the scope of the invention but as merely providing illustrations ofsome of the presently preferred embodiments of this invention. Thus, the scope of theinvention should be determined by the appended claims and the legal equivalents, ratherthan the examples given.
Claims (14)
1 . ο. , λ)Π ' an ..ι... ' ; · · .· "ΐ. 'V . .hiding L .idi OltP. . ' Ο power , ·' . . . η η η .· . .on. h ng < .. . ’ <.<>/.. > . 1 ,μ. ·;, . · onr-g. : .. iiio' a 1.. , ;o ,,, , ·: .:d outward i - · , · : (Id1 . · !· " J acn·. . ,n , . . ,oo01;: "d. ·ί\ > , ο d,, ί ’ . . ,, : >" a1.’: ηg, >g . • ·. · : .........I Η,Ί, o? . . . ’ , , ·ό; , : ,. ; . ' ·> n ph. ed: and -> ' ' i ! plasma : d , - n · i . : ip * , R, a n,· 1 -- • i · · n: no i - i . , ' .iO ’ .....n . o< ο 1 ,.-. o no '··>·.,. 1 w ->J ;i'.. ' . io ; -: 1 Ό i . o. m , .-.l· ' d . • . Ϊ ,.. : . ..- a·· , . ', r. . - , J · ! ’ . ·η .. 01, -. ; 17
3. The dei'ice of claim 1 wherein said step of modulating said electromagneticwaveform involves linking a propagation of a radiofrequency waveform through a signal gate(20) to a burst mode duty cycle generator (16) or to a continuous mode free runninggenerator (18). as well as activating or deactivating said device conduction path with an on-off button or on-off switch (14) connected to said device controlling radiofrequency switch.
4. The device of claim 3 further comprising the step of producing saidelectromagnetic field including the step of producing a continuous electromagnetic waveformor a pulsed electromagnetic waveform.
5. The device of claim 1 wherein said step of amplifying said radiofrequencywaveform channeled through said signal gate (20) involves a power amplifier (22) with fixed _or variable gain. it
6. The 'waveform involves mice of claim 1 wherein saichanneling said amplified step of coud’tioning mid ;.eetromagnetic waveform m saic impedance matching and output conditioning network (24) whichtransmitted signal characteristics such as impedance in order to maxi; conditions and adjustslize signal transmission from said transmitter incising electrode tip (28) and therebinto said device. minimize signal reriectant back
7. The device of claim 1 wherein said step of said signal transmission of said electromagnetic waveform from said incising electrode tip (28) involve? directing an outputsignal of said impedance matching and output conditioning network (24) through a waveguide and into an incising transmitter handpiece (26) before reaching said incising electrodetip (28).
8. The device of claim 1 wherein said step of constructing said active transmitterincising electrode tip (28) includes construction with an electrically conductive or semi-conductive matter which is preferably a solid tip design but may also be hollow or semi-hollow.
9. The device of claim 8 further comprising die step of constructing said acti\e 18 transmitter .< u.p ., mroj; ο· consisting of a preferably linear ; a stibstanhavy curvilinear t oof design, but said mo to transmitter incising electrode tip 1. ,, non-specrnc m said shape design and a yen existing in a loop configuration 10. The device of claim < mm said step of producing, a pia mating on said surface of said incising electrode tip c 23 ) involves the step of impedance nratv . -m up matching, power matching and tunirn said radiant electromagnetic rami o saad plasma coating said active transmitter incising electrode tip (28). 1 I. The device of claim 10 anther comprising the step of prca.fi crag mid high efficiency, i •h . ·! pftd en.-rg\ s of said radiofrequency energy a » a ·, o - mum 1 . i* od. t'P.. to said atomic particles in said pbm ' .3 ' , ! surface of si , , · > ! owi, h* tip (21 i thereby reducing nma r ·. a. ; m i ~ a warp am see. him cam- of chum m further oornprising the step tt( m value tea vid , ' >1 Λ > ·· ' v hma . he oji. rates 0; i mom i; >_ -.νΐρνί tammy f I -3 vi i. ro and said caecteomagnmic vmmmm , · . order io sc!b ,... M I ' incising device to said atomic parta * surface of s co , tettmde tip ' i thereby tuning said plasma ima . ' V , . m . cutting tictts . c : w m u.h as atomic particle o ' die i tmmivm, am and preeiem . . . mo generate am sustain a harmonious plasma clone, 13. Tim dev.m of claim lu it. mcr comprising the step of reducing . . * u chaos of sad i atomic particles in · ·.· i .•ma cloud along said surface of c U . ' V incising ehv 1 -i. .· ί ..«a a 11 further comprising the step of if ,'· , ,1 o : i <r ; · · vf w o _ , ,> surface of said armf , m , la 3.Sc vhv .. : <.· c m. h of said plasma, cloud mardiesi sues;ο. . , · 3 . >’ ia > · m; ;o a aS;, 15. D ?·
19 The device of claim 10 further comprising the step of allowing a highpercentage of total energy of said electromagnetic waveform generated from said plasmaincising device to transmit and be transferred into said plasma cloud but subsequently havea high percentage of residual energy of said electromagnetic field be reflected back into saidplasma cloud when said electromagnetic waveform reaches said matter outside of intendedpath of said incision and beyond said plasma cloud coating said incising electrode tip (28),according to a Tunnelling Effect of physical chemistry.
16. The device of claim 15 further comprising the step of allowing reflectedenergy of said electromagnetic wave from said matter outside of said intended path of saidincision to further energize said plasma cloud, thereby further reducing total output powerrequired to be transmitted by said incising electrode tip (28) in order to generate and sustainsaid plasma cloud.
17. The device of claim 15 further comprising the step of shielding said mattersurrounding said path of said intended incision into said matter (32) from said radicfrequencyenergy of said electromagnetic field of said plasma incising device, thereby protecting saidmatter surrounding said path of said incision from electromagnetic radiation exposure.
18. The device of claim 1 wherein said step of controlling said plasma includesusing said electromagneric field transmitted from said incising electrode tip (28) to control J the distance between said atomic particles in said plasma cloud and said surface of said activetransmitter incising electrode tip (28).
19. The device of claim 18 further comprising the step of trapping and confiningsaid plasma cloud around said incising electrode tip (28) without a requirement for a solidmatter confinement or containment vessel by utilizing said electromagnetic field accordingto a Magnetic Bottle Effect of physics.
20. The device of claim 18 further comprising the step of trapping, compressing,contouring, and controlling both shape and density of said plasma cloud around said incising 20 electrode tip physics. ¢28) by utilizing said electromagnetic field according to a Pinch itfifoct of 21. hi'Tie device of claim 2 . rfiler comprising the step of desks s.n.i . .. at which produe vis .,· a- mg u ,y density of said plasma cloud coats 0 5 WC electrode tin 1 28) while- decreasing to ,.ross sectional diameter of . ,..0 mOi a width oh soi .1 ot>. w.c ; path ol o ,nto said matter (32) by · ttui pi : va cloud of said > - < . pi device. w '· folic device of claim 1 wherein said step of transmitting said 0 W> V · 1' field front said incising electrode tip - includes selectively varying saiti uwou no WJ\ tVfo,rW · .: , · st.co . - • ·. .lance, said waveftirnr frequency, mot saio system output power > ., .io o. nerits based on variations in ·.< 1 ' 1 . J .. ' . r ..· .2' a, cloud such as said atomic pauiffw : w--sesfonro said woo tic root? ci ,: i i w. : panicle spiro and safi atomuc tocoa 0 wefotm as well as saw , .0., u: efoft 0) a, . ..mu m. . \Otftlfoe cio'foc particle pnvw . ,, . ;m t ’ns t, * i on differing ο · ·,! no non; «. oi ratios of 1 a> a w widen rooy / i mi * S' s > 0 . .?· . tv . > dc”w. . swing; a radio ' ! woofo · fop; a coins: .. 1 · CO • , o the output of the rad a w . p . . - for producing " · ,, ! mda mo ' -p'-'foy; an elec -ο Ί np!- ,i ft •ditioning network (24), wherein t ,·. 1 . ' 1 U’ . ! .· . , Wg, 0 o said electrode (28; to generate as νϊ rntfontain an ·. ο --.22 J !2·;i saw electromagnetic ... u . ; i ,.i . -. ...i ,. ,. vme, ' > .: I . *e:> > ..ου·.; v-, , · . _· . 2-. 21
24. A method for producing an incision into matter (32), comprising the steps of:generating radiofrequency energy;conditioning said radiofrequency energy; and generating an electromagnetic field outward from a surface of an electrode (28)utilizing said conditioned radiofrequency energy, so as to create and sustain a plasma cloudthat surrounds the electrode (28), said plasma cloud being created and sustained by utilizingsaid conditioned radiofrequency energy to activate atomic particles along the interface of saidelectrode (28) and said matter (32) into which said incision is placed.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/957,786 US5958266A (en) | 1997-10-24 | 1997-10-24 | Method of plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator |
US09/112,471 US6479785B1 (en) | 1998-07-09 | 1998-07-09 | Device for plasma incision of mater with a specifically tuned radiofrequencty electromagnetic field generator |
PCT/US1998/021033 WO1999021496A1 (en) | 1997-10-24 | 1998-10-02 | Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator |
Publications (2)
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AP2001002064A0 AP2001002064A0 (en) | 2001-03-31 |
AP1357A true AP1357A (en) | 2004-12-03 |
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APAP/P/2000/001810A AP1248A (en) | 1997-10-24 | 1998-09-24 | Method of plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator. |
APAP/P/2001/002064A AP1357A (en) | 1997-10-24 | 1999-10-02 | Device for plasma incision of matter with a specifically tuned radiofrequency electro-magnetic field generator. |
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APAP/P/2000/001810A AP1248A (en) | 1997-10-24 | 1998-09-24 | Method of plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator. |
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EP (1) | EP1028662A4 (en) |
JP (1) | JP2001520939A (en) |
KR (1) | KR100543054B1 (en) |
CN (1) | CN1176636C (en) |
AP (2) | AP1248A (en) |
AU (1) | AU736239B2 (en) |
BR (1) | BR9813268A (en) |
CA (1) | CA2307213A1 (en) |
EA (1) | EA002935B1 (en) |
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NO (2) | NO20002073L (en) |
NZ (2) | NZ504364A (en) |
OA (1) | OA11614A (en) |
WO (2) | WO1999021495A1 (en) |
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US6479785B1 (en) * | 1998-07-09 | 2002-11-12 | Richard J. Fugo | Device for plasma incision of mater with a specifically tuned radiofrequencty electromagnetic field generator |
JP4834815B2 (en) * | 2005-03-23 | 2011-12-14 | 国立大学法人愛媛大学 | Medical treatment device |
CN106597519B (en) * | 2016-11-29 | 2018-10-09 | 华中科技大学 | A kind of J-TEXT tokamak devices foreign particle concentration measurement system |
Citations (2)
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US5108391A (en) * | 1988-05-09 | 1992-04-28 | Karl Storz Endoscopy-America, Inc. | High-frequency generator for tissue cutting and for coagulating in high-frequency surgery |
US5217457A (en) * | 1990-03-15 | 1993-06-08 | Valleylab Inc. | Enhanced electrosurgical apparatus |
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US4461688A (en) * | 1980-06-23 | 1984-07-24 | Vac-Tec Systems, Inc. | Magnetically enhanced sputtering device having a plurality of magnetic field sources including improved plasma trapping device and method |
DE3024338A1 (en) * | 1980-06-27 | 1982-01-21 | NPK za Kontrolno-Zavaračni Raboti, Sofija | METHOD AND DEVICE FOR CUTTING NON-METAL MATERIALS BY means of PLASMA BOW |
US4534347A (en) * | 1983-04-08 | 1985-08-13 | Research Corporation | Microwave coagulating scalpel |
US5047649A (en) * | 1990-10-09 | 1991-09-10 | International Business Machines Corporation | Method and apparatus for writing or etching narrow linewidth patterns on insulating materials |
US5591301A (en) * | 1994-12-22 | 1997-01-07 | Siemens Aktiengesellschaft | Plasma etching method |
US5518597A (en) * | 1995-03-28 | 1996-05-21 | Minnesota Mining And Manufacturing Company | Cathodic arc coating apparatus and method |
JP3069271B2 (en) * | 1995-07-12 | 2000-07-24 | 勇藏 森 | High-efficiency processing method and device using high-density radical reaction using rotating electrode |
US5669975A (en) * | 1996-03-27 | 1997-09-23 | Sony Corporation | Plasma producing method and apparatus including an inductively-coupled plasma source |
-
1998
- 1998-09-24 NZ NZ504364A patent/NZ504364A/en unknown
- 1998-09-24 AP APAP/P/2000/001810A patent/AP1248A/en active
- 1998-09-24 KR KR1020007004440A patent/KR100543054B1/en not_active IP Right Cessation
- 1998-09-24 EA EA200000458A patent/EA002935B1/en not_active IP Right Cessation
- 1998-09-24 IL IL13579198A patent/IL135791A0/en unknown
- 1998-09-24 WO PCT/US1998/019843 patent/WO1999021495A1/en active IP Right Grant
- 1998-09-24 CA CA002307213A patent/CA2307213A1/en not_active Abandoned
- 1998-09-24 CN CNB988105012A patent/CN1176636C/en not_active Expired - Fee Related
- 1998-09-24 JP JP2000517662A patent/JP2001520939A/en active Pending
- 1998-09-24 OA OA1200000113A patent/OA11614A/en unknown
- 1998-09-24 AU AU95026/98A patent/AU736239B2/en not_active Ceased
- 1998-09-24 BR BR9813268-7A patent/BR9813268A/en not_active Application Discontinuation
- 1998-09-24 EP EP98948457A patent/EP1028662A4/en not_active Ceased
- 1998-10-02 NZ NZ509421A patent/NZ509421A/en unknown
- 1998-10-02 WO PCT/US1998/021033 patent/WO1999021496A1/en active IP Right Grant
-
1999
- 1999-10-02 AP APAP/P/2001/002064A patent/AP1357A/en active
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2000
- 2000-04-19 NO NO20002073A patent/NO20002073L/en not_active Application Discontinuation
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2001
- 2001-01-08 NO NO20010130A patent/NO20010130D0/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US5108391A (en) * | 1988-05-09 | 1992-04-28 | Karl Storz Endoscopy-America, Inc. | High-frequency generator for tissue cutting and for coagulating in high-frequency surgery |
US5217457A (en) * | 1990-03-15 | 1993-06-08 | Valleylab Inc. | Enhanced electrosurgical apparatus |
Also Published As
Publication number | Publication date |
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KR100543054B1 (en) | 2006-01-20 |
CN1176636C (en) | 2004-11-24 |
EA002935B1 (en) | 2002-10-31 |
JP2001520939A (en) | 2001-11-06 |
IL135791A0 (en) | 2001-05-20 |
NZ509421A (en) | 2003-05-30 |
WO1999021496A1 (en) | 1999-05-06 |
AU736239B2 (en) | 2001-07-26 |
BR9813268A (en) | 2000-08-22 |
WO1999021495A1 (en) | 1999-05-06 |
NO20010130D0 (en) | 2001-01-08 |
EP1028662A1 (en) | 2000-08-23 |
NO20002073L (en) | 2000-06-19 |
CA2307213A1 (en) | 1999-05-06 |
AP2000001810A0 (en) | 2000-06-30 |
NZ504364A (en) | 2002-11-26 |
AU9502698A (en) | 1999-05-17 |
KR20010024563A (en) | 2001-03-26 |
CN1277546A (en) | 2000-12-20 |
EP1028662A4 (en) | 2006-11-08 |
NO20002073D0 (en) | 2000-04-19 |
OA11614A (en) | 2004-09-10 |
AP2001002064A0 (en) | 2001-03-31 |
EA200000458A1 (en) | 2001-04-23 |
AP1248A (en) | 2004-02-21 |
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