WO2018207701A1

WO2018207701A1 - Composition for optical members, optical member and image display device

Info

Publication number: WO2018207701A1
Application number: PCT/JP2018/017528
Authority: WO
Inventors: 普史形見; 昌邦藤田; 崇弘野中; 丈治喜多川
Original assignee: 日東電工株式会社
Priority date: 2017-05-09
Filing date: 2018-05-02
Publication date: 2018-11-15

Abstract

This composition for optical members contains a base polymer and a novel compound that is represented by general formula (1). This composition for optical members enables the formation of an optical member which is capable of suppressing deterioration of a display element in cases where the optical member is used in an image display device, while exhibiting high transparency, and which has excellent durability under harsh environmental conditions.

Description

Composition for optical member, optical member and image display device

The present invention relates to an optical member composition and an optical member formed from the optical member composition. Moreover, this invention relates to the image display apparatus using the said composition for optical members.

The optical member to which the present invention is applied is a member that is applied to various optical uses. For example, the optical film itself, the pressure-sensitive adhesive layer or adhesive layer for the optical film, the surface treatment layer provided on the optical film, and the optical film The functional layer etc. which are provided in are mentioned. Examples of the optical film include a polarizing film, a polarizer, a transparent protective film for a polarizer, a retardation film, a light diffusion film, a brightness enhancement film, a lenticular film, a cover window film (front plate), a scattering prevention film, and a decoration. A printing film etc. can be illustrated. The optical member can be used as an optical laminate including a polarizer and a retardation film. Examples of the surface treatment layer include a hard coat layer, an antiglare layer, an antireflection layer, and a refractive index adjustment layer. Examples of the functional layer include an easy adhesion layer, an antistatic layer, an antiblocking layer, an oligomer prevention layer, and a barrier layer. Moreover, the said optical member can be used as an intermediate | middle layer provided between the said transparent base film or the said transparent base film in the transparent conductive film which has a transparent base film and a transparent conductive layer. Examples of the intermediate layer include a refractive index adjustment layer, an easy-adhesive layer, a hard coat layer, and a crack prevention layer. These optical members can form an image display device such as a liquid crystal display device (LCD) or an organic EL (electroluminescence) display device (OLED).

In recent years, optical members have been used in various fields, for example, image display devices are widely used as constituent members. Image display devices are widely used in various applications such as mobile phones, car navigation devices, personal computer monitors, and televisions. As an optical member used when the image display device is an organic EL display device, a surface on the viewing side of the organic EL panel is used to prevent external light from being reflected by a metal electrode (cathode) and viewed like a mirror surface. A circularly polarizing film (a laminated body of a polarizing film and a quarter-wave plate or the like) is disposed on the surface. Moreover, a decorative panel etc. may be further laminated | stacked as an optical member on the circularly-polarizing film laminated | stacked on the visual recognition side surface of the organic electroluminescent panel. The transparent conductive film is used as a transparent electrode film to form a touch panel or the like. The constituent members of the organic EL display device such as the circularly polarizing film and the decorative panel, the transparent electrode film and the like are usually laminated as an optical member via a bonding material such as an adhesive layer and an adhesive layer.

In an image display device such as an organic EL display device, a component or the like in the image display device may be deteriorated by incident ultraviolet light, and a layer containing an ultraviolet absorber in order to suppress deterioration due to the ultraviolet light. It is known to provide Specifically, for example, it has at least one ultraviolet absorbing layer, the light transmittance at a wavelength of 380 nm is 30% or less, and the visible light transmittance at a wavelength longer than the wavelength of 430 nm is 80% or more. Transparent double-sided pressure-sensitive adhesive sheets for image display devices (for example, see Patent Document 1) and pressure-sensitive adhesive sheets having a pressure-sensitive adhesive layer containing an acrylic polymer and a triazine-based ultraviolet absorber are known (for example, see Patent Document 2). .

JP 2012-211305 A JP 2013-75978 A

The pressure-sensitive adhesive sheets described in

Patent Documents

1 and 2 can control the transmittance of light having a wavelength of 380 nm. When the pressure-sensitive adhesive sheet is used in an organic EL display device, the organic EL element can be used over a long period of time. May deteriorate and was not sufficient. This is because the pressure-sensitive adhesive sheets described in

Patent Documents

1 and 2 can absorb light having a wavelength of 380 nm, but the wavelength region on the shorter wavelength side (380 nm) than the light emitting region of the organic EL element (longer wavelength side than 430 nm). (˜430 nm) light is not sufficiently absorbed, and it is considered that deterioration is caused by the transmitted light.

Therefore, in order to suppress deterioration of the organic EL element, transmission of light having a wavelength shorter than the light emitting region (longer wavelength side than 430 nm) (380 nm to 430 nm) is suppressed, and the organic EL element Therefore, it is necessary to use a layer having a high transparency that can sufficiently ensure the transmittance of visible light in the light emitting region of the organic EL display device. Further, since the image display device is used in a high temperature and high humidity environment, the image display device is also required to have durability under severe environmental conditions.

When applied to an image display apparatus, the present invention forms an optical member that can suppress deterioration of a display element, has high transparency, and is excellent in durability under severe environmental conditions. An object of the present invention is to provide a composition for an optical member.

Another object of the present invention is to provide an optical member formed from the composition, and further to provide an image display device using the optical member.

As a result of intensive studies to solve the above problems, the present inventors have found the following composition for an optical member and have completed the present invention.

That is, this invention relates to the composition for optical members characterized by including the compound represented by a base polymer and following General formula (1).

(In the general formula (1), m represents an integer of 1 to 6,
Q ¹ represents a hydrogen atom when m is 1, and a divalent to hexavalent linking group when m is 2 to 6,
D ¹ represents a group in which one hydrogen atom is removed from the compound represented by the following general formula (2). When m is 2 to 6, a plurality of D ¹ may be the same or different. It may be.

(In General Formula (2), R ¹ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R ² represents a hydrogen atom or a cyano group. , A nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ⁷ or —SO ₂ —R ^8. R ⁷ represents a hydroxy group or —OR ⁷¹ , and R ⁸ represents a halogen atom. Represents an atom, a hydroxy group, —OR ⁸¹ , —NR ⁸² R ⁸³ or —R ⁸⁴ , wherein R ⁷¹ and R ⁸¹ to R ⁸⁴ are the same or different and each represents a hydrogen atom or an alkyl group which may have a substituent; Or the aryl group which may have a substituent is represented.
R ³ represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
R ⁴⁰² and R ⁴⁰³ are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, —NR ⁴⁰⁶ R ⁴⁰⁷ , —OR ⁴⁰⁸ , a cyano group, —C (O) R ⁴⁰⁹ , —O—C (O) R ⁴¹⁰ or —C (O) OR ⁴¹¹ ,
R ⁴⁰⁴ to R ⁴¹¹ are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R ⁴⁰⁴ , R ^405, and the nitrogen atom to which R ⁴⁰⁴ and R ⁴⁰⁵ are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))

In the present invention, m in the general formula (1) is preferably 1 or 2.

The compound represented by the general formula (1) is preferably a compound represented by the following general formula (3).

(In General Formula (3), R ^1a is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. R ^2a represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7a or —SO ₂ —R ^8a , where R ^7a represents a hydroxy group Or -OR ^71a , R ^8a represents a halogen atom, a hydroxy group, -OR ^81a , -NR ^82a R ^83a, or -R ^84a, and R ^71a and R ^81a to R ^84a are the same or different, Represents an alkyl group having 1 to 20 carbon atoms which may have a substituent or an aryl group having 6 to 20 carbon atoms which may have a substituent.
R ^3a represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R ^402a represents a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, an ^optionally substituted aryl group having 6 to 20 carbon atoms, —NR ^406a R ^407a , —OR ^408a , a cyano group, —C (O) R ^409a , —O—C (O) R ^410a or —C (O) OR ^411a , and R ^404a to R ^411a are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404a , R ^405a, and the nitrogen atom to which R ^404a and R ^405a are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
R ⁴¹³ represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or the following general formula The group represented by Formula (4) is represented.

(In the general formula (4), Q ² represents an optionally substituted divalent hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site with the general formula (3).
R ^1b represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms, and R ^2b represents a hydrogen atom. An atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7b or —SO ₂ —R ^8b is represented. R ^7b represents a hydroxy group or —OR ^71b , and R ^8b represents a halogen atom, a hydroxy group, —OR ^81b , —NR ^82b R ^83b or —R ^84b . R ^71b and R ^81b to R ^84b are the same or different and are a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 6 to 20 carbon atoms which may have a substituent. Represents an aryl group.
R ^3b represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R ^402b is a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, an ^optionally substituted aryl group having 6 to 20 carbon atoms, —NR ^406b R ^407b , —OR ^408b , a cyano group, —C (O) R ^409b , —O—C (O) R ^410b or —C (O) OR ^411b , and R ^404b to R ^411b are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404b , R ^405b, and the nitrogen atom to which R ^404b and R ^405b are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))

In one embodiment of the present invention, R ⁴¹³ is preferably a group represented by General Formula (4).

It is also preferred that the compound represented by the general formula (1) is a compound represented by the following general formula (5).

(In the general formula (5), R ^2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7c or —SO ₂ —R ^8c ). ^7c represents a hydroxy group or —OR ^71c , and R ^8c represents a halogen atom, a hydroxy group, —OR ^81c , —NR ^82c R ^83c or —R ^84c, and R ^71c and R ^81c to R ^84c are the same or Differently, it represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.
R ^3c represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R ^402c and R ^403c are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon atom having 6 to 20 carbon atoms. ^Represents an aryl group, —NR ^406c R ^407c , —OR ^408c , a cyano group, —C (O) R ^409c , —O—C (O) R ^410c or —C (O) OR ^411c , and R ^404c to R ^411c Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404c , R ^405c, and the nitrogen atom to which R ^404c and R ^405c are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
R ⁵⁰¹ is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or the following general formula (6 ) Represents a group represented by

(In the general formula (6), Q ³ represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding site with the general formula (5).
R ^2d represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7d or —SO ₂ —R ^8d . R ^7d represents a hydroxy group or —OR ^71d , and R ^8d represents a halogen atom, a hydroxy group, —OR ^81d , —NR ^82d R ^83d or —R ^84d . R ^71d and R ^81d to R ^84d are the same or different and are a hydrogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon group having 6 to 20 carbon atoms. Represents an aryl group.
R ^3d represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R ^402d and R ^403d are the same or different and are a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon atom having 6 to 20 carbon atoms. An aryl group of —NR ^406d R ^407d , —OR ^408d , a cyano group, —C (O) R ^409d , —O—C (O) R ^410d or —C (O) OR ^411d , and R ^404d to R ^411d Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404d , R ^405d, and the nitrogen atom to which R ^404d and R ^405d are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))

In one embodiment of the present invention, R ⁵⁰¹ is preferably a group represented by General Formula (6).

In the optical member composition, the compound represented by the general formula (1) is preferably a dye compound having an absorption maximum wavelength of an absorption spectrum in a wavelength region of 380 to 430 nm.

It is preferable that the composition for optical members further contains an ultraviolet absorber. The absorption maximum wavelength of the absorption spectrum of the ultraviolet absorber is preferably in the wavelength region of 300 to 400 nm.

The present invention also relates to an optical member formed from the composition for optical members.

The optical member can be used as an optical film, for example.

The optical member can be used as, for example, an optical film pressure-sensitive adhesive layer or an adhesive layer. The base polymer contained in the composition for forming the optical film pressure-sensitive adhesive layer is preferably a (meth) acrylic polymer.

The optical member can be used, for example, as a surface treatment layer provided on an optical film.

Examples of the optical film relating to the optical member include a polarizing film, a polarizer, a transparent protective film for a polarizer, and a retardation film.

Further, the present invention is an optical laminate including a polarizer and a retardation film,
The optical layered body is an optical layered body (1) containing the optical member.

The present invention also relates to an image display device comprising the image display unit and the optical member or the optical laminate (1). The image display device of the present invention is suitable when the optical member or the optical laminated body (1) is provided on the viewing side with respect to the image display unit.

Examples of the image display device include, from the viewing side, an organic EL display device including at least an optical laminate including a polarizer and a retardation film in this order, and an organic EL panel as the image display unit. What an optical laminated body contains the said optical member or an optical laminated body (1) can be used suitably.

In the transparent conductive film having a transparent base film and a transparent conductive layer, the optical member can be used as the transparent base film or an intermediate layer provided between the transparent base film and the transparent conductive layer. .

Examples of the intermediate layer include at least one selected from a refractive index adjustment layer, an easy-adhesive layer, a hard coat layer, and a crack prevention layer.

Moreover, this invention is a transparent conductive film which has a transparent base film and a transparent conductive layer, Comprising: The said optical member is contained as an intermediate | middle layer provided between the said transparent base film or the said transparent base film. It is related with the transparent conductive film characterized by doing.

The present invention also relates to an image display device comprising the image display unit and the transparent conductive film. The image display device of the present invention is suitable when the transparent conductive film is provided closer to the viewer than the image display unit.

Examples of the image display device include an organic EL display device including an organic EL panel as the image display unit.

The composition for an optical member of the present invention contains the compound represented by the above general formula (1) in addition to the base polymer to be formed having the optical member. Since the compound has an absorption maximum wavelength in the absorption spectrum near 400 nm, the compound is suitably used as a dye. By using the compound (dye compound) and an ultraviolet absorber in combination, the compound can be used in a display element such as an organic EL panel. Light in a region that is not affected can be sufficiently absorbed, and a longer wavelength side than the region can be sufficiently transmitted. Furthermore, the compound represented by the general formula (1) is also excellent in durability under severe environmental conditions under a high temperature and high humidity environment. As a result, the optical member formed from the composition for optical members of the present invention can suppress deterioration due to external light of the display element, and has excellent weather resistance deterioration, and can extend the life. it can.

It is sectional drawing which shows typically one Embodiment of the optical laminated body which can apply the optical member of this invention. It is sectional drawing which shows typically one Embodiment of the organic electroluminescence display which can apply the optical member of this invention. It is sectional drawing which shows typically one Embodiment of the transparent conductive film which can apply the optical member of this invention.

<Composition for optical member>
Hereinafter, each component which the composition for optical members of this invention contains is demonstrated. The composition for optical members of this invention contains the compound represented by the said General formula (1) other than the base polymer which has an optical member. In addition, the composition for optical members of this invention can contain various additives other than the compound represented by the said General formula (1) according to various uses.

<Base polymer>
The base polymer is appropriately selected according to the application to which the optical member is applied. The resin used for the base polymer is not particularly limited, and examples thereof include a thermoplastic resin, a photocurable resin, and a thermosetting resin. For example, acrylic resin, polycarbonate resin, polystyrene resin, low density polyethylene resin, polypropylene resin, polyurethane resin, polyamide resin, polyacetal resin, polyphenylene sulfide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polycycloolefin resin, polysulfone resin, poly Examples of the resin include ether sulfone resin, fluorine resin, silicone resin, polyester resin, epoxy resin, phenol resin, and melamine resin. These may be used alone or in combination of two or more.

In addition, about the specific base polymer according to an optical use, what is used in the said optical use can be used. The base polymer is a main component that forms each optical member, and will be described later together with a description of optical applications. Materials related to the base polymer are also shown as well-known marks in various applications. For example, in the use of an adhesive, if it is an acrylic adhesive, a (meth) acrylic polymer can be recognized as a base polymer.

<Compound represented by the general formula (1)>
In the present specification, the compound represented by the general formula (1) is also referred to as a compound (1). The same applies to the compounds of other formula numbers. For example, the compound represented by the general formula (2) is also referred to as the compound (2).

In the case where geometric isomerism exists in the compound (1) of the present invention, the present invention includes any of the geometric isomers. In addition, when one or more asymmetric carbon atoms are present in the compound (1) of the present invention, the present invention relates to a compound in which each asymmetric carbon atom is in the R configuration, a compound in the S configuration, and a compound in any combination thereof. Any of these are included. Any of those racemates, racemic mixtures, single enantiomers, and diastereomeric mixtures are also included in the present invention.

In the general formula (1), m represents an integer of 1 to 6. m is preferably 2 to 6 because the heat resistance of the compound (1) is improved. In one embodiment of the present invention, m is preferably 1 or 2, and more preferably 2.

Q ¹ represents a hydrogen atom when m is 1 and a divalent to hexavalent linking group when m is 2 to 6.
Examples of the divalent to hexavalent linking group include an optionally substituted divalent to hexavalent hydrocarbon group having 1 to 20 carbon atoms, —SO ₂ — and the like.
Examples of the divalent to hexavalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent include straight chain, branched or cyclic 2 to 6 carbon atoms having 1 to 20 carbon atoms which may have a substituent. And a bivalent to hexavalent arylene group having 6 to 20 carbon atoms which may have a substituent. Q ¹ is preferably a hydrogen atom or a divalent linking group.

As the divalent linking group, an optionally substituted divalent hydrocarbon group having 1 to 20 carbon atoms, —SO ₂ — and the like are preferable, and an optionally substituted substituent having 1 to Twenty divalent hydrocarbon groups are more preferred. The divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent is preferably a linear, branched or cyclic divalent group having 1 to 20 carbon atoms which may have a substituent. Or a divalent arylene group having 6 to 20 carbon atoms which may have a substituent.
The linear, branched or cyclic divalent alkyl group having 1 to 20 carbon atoms is a divalent alkyl in which an arylene group which may have an oxygen atom, a sulfur atom or a substituent is inserted between carbon and carbon. A linear divalent alkyl group having 1 to 20 carbon atoms represented by — (CH ₂ ) _k1 — (k1 represents an integer of 1 to 20). Examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group, and a decylene group. A divalent alkyl group substituted with one or more halogen atoms is also preferable, and examples thereof include a bistrifluoromethylmethylene group. The carbon number of the linear divalent alkyl group is preferably 2 to 10 (k1 in the above formula is 2 to 10), more preferably 4 to 8 (k1 in the above formula is 4 to 8).

As the divalent arylene group having 6 to 20 carbon atoms which may have a substituent, for example, a group represented by the following general formula (20) is preferable.

In the general formula (20), X independently represents a halogen atom, a nitro group, a hydroxy group, a sulfo group, an alkyl group having 1 to 3 carbon atoms, or an alkoxy group having 1 to 3 carbon atoms, and s is 0 Represents an integer of ~ 4. The bonds at the two positions of the benzene ring may be any of o-, m-, and p- orientations. Moreover, it is preferable that the benzene ring does not have a substituent (s = 0).

In the general formula (1), D ¹ represents a group in which one hydrogen atom is removed from the compound (2). The group in which one hydrogen atom is removed from the compound (2) can also be referred to as a group in which one hydrogen atom has been removed from the compound (2). Compound (2) contains a nitrogen-containing aromatic ring and an electron-withdrawing group, and contains a methine structure that can be a dye. Since the compound (1) includes such a methine structure, it can be used as a dye compound. When m is 2 to 6, the plurality of D ¹ may be all the same or different. In one aspect, it is preferred that the plurality of D ¹ are all the same.
In the general formula (1), the compound (1) in which m is 1 is the compound (2). The compound (1) in which m is 1 is also referred to as a monomer compound. The compound (1) in which m is 2 to 6 is a compound having a 2 to 6-mer structure in which 2 to 6 groups in which a hydrogen atom is removed from the compound (2) are linked by a linking group (Q ¹ ). The compound (1) in which m is 2 to 6 can also be referred to as a dimer to hexamer compound.
D ¹ is preferably a group in which one hydrogen atom is removed from R ¹ , R ⁴⁰³ or R ⁴⁰⁴ of the compound (2) (or a group in which R ¹ is removed when R ¹ is a hydrogen atom), R ¹ or R ⁴⁰³ is more preferably a group in which one hydrogen atom is removed. In other words, in the general formula (1), Q ¹ is preferably bonded to the portion of R ¹ , R ⁴⁰³ or R ^{404 in} the general formula (2), and is bonded to the portion of R ¹ or R ^403. More preferably.

In General Formula (2), R ¹ represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. Examples of the alkyl group which may have a substituent include an alkyl group having 1 to 20 carbon atoms which may have a substituent. Examples of the aryl group which may have a substituent include an aryl group having 6 to 20 carbon atoms which may have a substituent. In the general formula (2), —C (O) —O—R ¹ is an electron withdrawing group. R ¹ is preferably an optionally substituted alkyl group having 1 to 20 carbon atoms or an optionally substituted aryl group having 6 to 20 carbon atoms, more preferably a substituent group. The alkyl group may have 1 to 20 carbon atoms.

R ² represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group (CF ₃ group), a heterocyclic ring-containing group, —C (O) —R ⁷ or —SO ₂ —R ⁸ . R ⁷ represents a hydroxy group or —OR ⁷¹ , and R ⁸ represents a halogen atom, a hydroxy group, —OR ⁸¹ , —NR ⁸² R ⁸³ or —R ⁸⁴ . R ⁷¹ and R ⁸¹ to R ⁸⁴ are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.

Heterocycle-containing groups in R ² include nitrogen-containing heterocycles such as pyrrole ring, pyridine ring, quinoline ring, pyrimidine ring, pyridazine ring, pyrazine ring, imidazole ring, benzimidazole ring, triazine ring, triazole ring, tetrazole ring; Oxygen-containing heterocycles such as rings and benzofuran rings; sulfur-containing heterocycles such as thiophene rings and benzothiophene rings; heterocycles containing oxygen and nitrogen atoms such as oxazole rings and benzoxazole rings; thiazole rings, benzothiazole rings, thiadiazoles And a sulfur-containing heterocycle such as a ring. These rings may further form a condensed ring with another carbocycle (for example, a benzene ring) or a heterocycle (for example, a pyridine ring), an oxazole ring, A benzoxazole ring is preferred.

In one embodiment of the present invention, the heterocyclic ring-containing group in R ² is a benzoxazole ring or a group in which a hydrogen atom is removed from the carbon (2-position) between nitrogen and oxygen in the oxazole ring (referred to as a group excluding a hydrogen atom) It is also preferably a group in which a hydrogen atom is removed from the carbon (position 2) between nitrogen and oxygen of the benzoxazole ring.
Further, for example, in the general formula (1), m is 2 to 6, R ² is a benzoxazole ring or a group in which a hydrogen atom is removed from the oxazole ring, and Q ¹ and D ¹ are compound (2) If the bound at the site of R ^2, R ² is preferably bound to Q ¹ a carbon atom other than carbon (2-position) between the nitrogen and oxygen of the benzoxazole ring or an oxazole ring.

^Examples of the alkyl group which may have a substituent in R ¹ , R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ include an alkyl group having 1 to 20 carbon atoms which may have a substituent. It is done. Examples of the alkyl group having 1 to 20 carbon atoms which may have a substituent include linear, branched or cyclic alkyl groups having 1 to 20 carbon atoms which may have a substituent described later. In one embodiment of the present invention, the optionally substituted alkyl group having 1 to 20 carbon atoms is preferably a linear, branched or cyclic alkyl group having 4 to 20 carbon atoms, and having 4 carbon atoms. The branched or cyclic sterically bulky alkyl groups described above are preferable, more preferably a cyclic alkyl group having 6 to 20 carbon atoms, and particularly preferably a linear or branched alkyl group having a substituent. It is also a good cyclic alkyl group. Examples of the alkyl group having 1 to 20 carbon atoms in R ¹ , R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ include, for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, and an n-butyl group. I-butyl group, t-butyl group, n-hexyl group, cyclohexyl group, n-octyl group, 2-ethylhexyl group, 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methyl Cyclohexyl and the like are preferable, t-butyl group, cyclohexyl group, 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methylcyclohexyl group and the like are more preferable, 4-t-butylcyclohexyl group, 2 , 6-di-t-butyl-4-methylcyclohexyl group is more preferable.
^Examples of the aryl group which may have a substituent in R ¹ , R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ include an aryl group having 6 to 20 carbon atoms which may have a substituent. It is done. Examples of the aryl group having 6 to 20 carbon atoms which may have a substituent include an aryl group having 6 to 20 carbon atoms which may have a substituent described later. For example, the aryl group may be substituted with an alkyl group. Preferable phenyl groups (for example, phenyl group, 3-methylphenyl group, 2,6-dimethylphenyl group) and the like are preferable.

R ¹ is preferably n-butyl, s-butyl, i-butyl, t-butyl, n-pentyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methylcyclohexyl group, etc., 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methylcyclohexyl group Etc. are more preferable.
R ² is preferably a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ⁷ or —SO ₂ —R ⁸ , more preferably a cyano group or a heterocyclic ring-containing group. Group, or —C (O) —R ⁷ , and more preferably a cyano group or —C (O) —OR ⁷¹ .

R ⁷¹ and R ⁸¹ are the same or different and are, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, s-butyl group, i-butyl group, t-butyl group, n-pentyl group, n-hexyl group, cyclohexyl group, n-octyl group, 2-ethylhexyl group, 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methylcyclohexyl group and the like are preferable. 4-t-butylcyclohexyl group, 2,6-di-t-butyl-4-methylcyclohexyl group and the like are more preferable. R ⁸² is preferably a hydrogen atom. R ⁸³ is preferably a hydrogen atom, a phenyl group, a 3-methylphenyl group or a 2,6-dimethylphenyl group. R ⁸⁴ is preferably a methyl group, an ethyl group, a t-butyl group, a cyclohexyl group, a phenyl group, a naphthyl group, or the like.

In General Formula (2), R ³ represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
R ⁴⁰² and R ⁴⁰³ are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, —NR ⁴⁰⁶ R ⁴⁰⁷ , —OR ⁴⁰⁸ , a cyano group, —C (O) R ⁴⁰⁹ , —O—C (O) R ⁴¹⁰ or —C (O) OR ⁴¹¹ ;
R ⁴⁰⁴ to R ⁴¹¹ are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R ⁴⁰⁴ , R ^405, and the nitrogen atom to which R ⁴⁰⁴ and R ⁴⁰⁵ are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.

Examples of the alkyl group for R ³ , R ^402, and R ⁴⁰³ include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms.
Specific examples of the straight-chain, branched or cyclic alkyl group having 1 to 20 carbon atoms include methyl group, ethyl group, n-propyl group, iso-propyl group, n-butyl group, iso-butyl group, sec- Butyl, t-butyl, n-pentyl, 2-methylbutyl, 1-methylbutyl, neo-pentyl, 1,2-dimethylpropyl, 1,1-dimethylpropyl, cyclopentyl, n-hexyl Group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1,3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,2-dimethylbutyl group, 1,1-dimethylbutyl group, 2-ethylbutyl group, 1-ethylbutyl group, 1,1,2-trimethylbutyl group 1-ethyl-2-methylpropyl group, cyclohexyl group, n-heptyl group, 2-methylhexyl group, 3-methylhexyl group, 4-methylhexyl group, 5-methylhexyl group, 2,4-dimethylpentyl group N-octyl group, 2-ethylhexyl group, 2,5-dimethylhexyl group, 2,4-dimethylhexyl group, 2,2,4-trimethylpentyl group, t-octyl group, n-nonyl group, 3,5 , 5-trimethylhexyl group, n-decyl group, 4-ethyloctyl group, 4-ethyl-4,5-dimethylhexyl group, 4-t-butylcyclohexyl group, n-undecyl group, n-dodecyl group, 1, 3,5,7-tetramethyloctyl group, 4-butyloctyl group, 6,6-diethyloctyl group, n-tridecyl group, 6-methyl-4-butyloctyl group, n- Tradecyl group, n-pentadecyl group, 3,5-dimethylheptadecyl group, 2,6-dimethylheptadecyl group, 2,4-dimethylheptadecyl group, 2,2,5,5-tetramethylhexyl group, 1- Examples include cyclopentyl-2,2-dimethylpropyl group, 1-cyclohexyl-2,2-dimethylpropyl group, 2,6-di-t-butyl-4-methylcyclohexyl group, n-octadecyl group and the like.

The substituent in the alkyl group which may have a substituent is not particularly limited, and is a monocyclic or polycyclic aromatic ring group (phenyl group, naphthyl group, etc.) having 6 to 10 carbon atoms, or having 1 to 8 carbon atoms. Linear, branched or cyclic alkoxy group, amino group, mono- or di-alkylamino group (alkyl has 1 to 8 carbon atoms), halogen atom, cyano group, hydroxy group, nitro group, carboxy group, carbon number 1 An alkoxycarbonyl group having 8 to 8 carbon atoms, an acyl group having 2 to 10 carbon atoms (for example, acetyl group, propionyl group, butyryl group, valeryl group, pivaloyl group, acryloyl group, methacryloyl group, benzoyl group, toluoyl group, cinnamoyl group, anisoyl group) , Naphthoyl group, etc.), and acyloxy groups having 2 to 10 carbon atoms.

^Examples of the aryl group for R ³ , R ⁴⁰² and R ⁴⁰³ include monocyclic or polycyclic aromatic ring groups having 6 to 20 carbon atoms.
As the monocyclic or polycyclic aromatic ring group having 6 to 20 carbon atoms, specifically, a monocyclic aromatic hydrocarbon group such as a phenyl group; a naphthyl group, an anthracenyl group, a naphthacenyl group, a pentacenyl group, a phenanthrenyl group, Examples include polycyclic aromatic hydrocarbon groups such as a pyrenyl group.
The substituent in the aryl group which may have a substituent is not particularly limited, and examples thereof include a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an amino group, Mono- or di-alkylamino group (alkyl has 1 to 8 carbon atoms), halogen atom, cyano group, hydroxy group, nitro group, halogenated hydrocarbon group having 1 to 8 carbon atoms, carboxy group, 1 to carbon atoms 8 alkoxycarbonyl groups and the like. Preferably, it is a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms. For example, as an example of a phenyl group and a naphthyl group having a substituent, nitrophenyl group, cyanophenyl group, hydroxyphenyl group, methylphenyl group, dimethylphenyl group, trimethylphenyl group, fluorophenyl group, chlorophenyl group, dichlorophenyl group , Bromophenyl group, methoxyphenyl group, ethoxyphenyl group, trifluoromethylphenyl group, N, N-dimethylaminophenyl group, nitronaphthyl group, cyanonaphthyl group, hydroxynaphthyl group, methylnaphthyl group, fluoronaphthyl group, chloronaphthyl Group, bromonaphthyl group, trifluoromethylnaphthyl group and the like.

In the general formula (2), the 4- to 8-membered nitrogen-containing heterocycle formed by R ⁴⁰⁴ , R ^405, and the nitrogen atom to which R ⁴⁰⁴ and R ⁴⁰⁵ are bonded is a nitrogen-containing oxygen atom. It may be a heterocyclic ring. Examples of the nitrogen-containing heterocycle include non-aromatic nitrogen-containing heterocycles. Examples of the 4- to 8-membered nitrogen-containing heterocycle include non-aromatic nitrogen-containing heterocycles such as pyrrolidine ring, piperidine ring, piperazine ring and morpholine ring.
The substituent in the 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent is not particularly limited, and examples thereof include a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms, and 1 to 8 carbon atoms. An alkoxy group, an amino group, a mono- or di-alkylamino group (the alkyl has 1 to 8 carbon atoms), a halogen atom, a cyano group, a hydroxy group, a nitro group, a halogenated hydrocarbon group having 1 to 8 carbon atoms, Examples thereof include a carboxy group and an alkoxycarbonyl group having 1 to 8 carbon atoms. Preferably, it is a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms.

In the case where a ring such as an alkyl group, an aryl group, a nitrogen-containing heterocycle or a heterocycle has a substituent, when there are two or more substituents, each substituent may be the same or different.

Preferred embodiments of each group in the general formula (2) will be further described.
R ³ is preferably a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a cyano group, more preferably a carbon atom having 1 carbon atom which may have a hydrogen atom or substituent. An alkyl group having 5 to 5, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and particularly preferably a hydrogen atom.

R ⁴⁰² is preferably a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group or alkoxy group having 6 to 20 carbon atoms, An alkyl group having 1 to 20 carbon atoms which may have a substituent is more preferable. More preferably, it is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms which may have a substituent, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and particularly preferably a methyl group. It is.

R ⁴⁰³ is preferably —OR ⁴⁰⁸ . R ⁴⁰⁸ is preferably a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms, more preferably , A hydrogen atom or an optionally substituted alkyl group having 1 to 5 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms, and particularly preferably an ethyl group.
In one embodiment of the present invention, at least one of R ⁴⁰² and R ⁴⁰³ is preferably a substituent other than a hydrogen atom, and R ⁴⁰² and R ⁴⁰³ are the same or different and are each a substituent other than a hydrogen atom. More preferably.

R ⁴⁰⁴ and R ⁴⁰⁵ are the same or different and are preferably an alkyl group having 1 to 20 carbon atoms which may have a substituent or an aryl group having 6 to 20 carbon atoms which may have a substituent. More preferably an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, still more preferably an alkyl group having 1 to 10 carbon atoms, particularly preferably a methyl group, an ethyl group, n- A propyl group and an n-butyl group.
R ⁴⁰⁶ , R ⁴⁰⁷ , R ⁴⁰⁸ , R ⁴⁰⁹ , R ⁴¹⁰ and R ⁴¹¹ are the same or different and preferably have an alkyl group having 1 to 20 carbon atoms which may have a substituent or a substituent. It may be an aryl group having 6 to 20 carbon atoms.

As a compound in which m is 1 or 2 in the general formula (1), a compound represented by the above general formula (3) (compound (3)), a compound represented by the general formula (5) (compound (5)) Etc. are preferred.

In one embodiment of the present invention, compound (3) is preferred as compound (1). The compound (3) is preferable because of excellent light resistance.
In general formula (3), R ^1a represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. R ^2a represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7a or —SO ₂ —R ^8a . R ^7a represents a hydroxy group or —OR ^71a , and R ^8a represents a halogen atom, a hydroxy group, —OR ^81a , —NR ^82a R ^83a or —R ^84a . R ^71a and R ^81a to R ^84a are the same or different and each is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an ^optionally substituted group having 6 to 20 carbon atoms. Represents an aryl group.

A preferred embodiment of R ^1a is the same as the preferred embodiment of R ¹ described above.
R ^2a is preferably a cyano group, a heterocyclic ring-containing group, or —C (O) —R ^7a, more preferably a cyano group or —C (O) —OR ^71a . Preferred embodiments of R ^71a , R ^81a , R ^82a , R ^83a and R ^84a are the same as the preferred embodiments of R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ described above.

In the general formula (3), R ^3a is a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon atom. Represents 20 to 20 aryl groups.
R ^402a represents a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, an ^optionally substituted aryl group having 6 to 20 carbon atoms, —NR ^406a R ^407a , —OR ^408a , a cyano group, —C (O) R ^409a , —O—C (O) R ^410a or —C (O) OR ^411a , and R ^404a to R ^411a are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404a , R ^405a, and the nitrogen atom to which R ^404a and R ^405a are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
The preferred embodiments of R ^3a , R ^402a , R ^404a , R ^405a , R ^406a , R ^407a , R ^408a , R ^409a , R ^410a, and R ^411a are R ³ , R ⁴⁰² , R ⁴⁰⁴ , R ⁴⁰⁵ , R ⁴⁰⁶ described above. , respectively and preferred embodiments of ^{^{^{R 407, R 408, R 409}}} , R 410 and ^{R 411} same.

In General Formula (3), R ⁴¹³ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. Or a group represented by the general formula (4). R ⁴¹³ is preferably an alkyl group having 1 to 5 carbon atoms which may have a substituent or a group represented by the general formula (4), more preferably an alkyl group having 1 to 3 carbon atoms or It is group represented by General formula (4), More preferably, it is group represented by an ethyl group or the said General formula (4). In one embodiment of the present invention, R ⁴¹³ is preferably a group represented by General Formula (4).

In the general formula (4), Q ² represents an optionally substituted divalent hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site with the general formula (3). In the general formula (4), Q ² is bonded to the general formula (3). The divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent in Q ² and preferred embodiments thereof are those having 1 to 20 carbon atoms which may have a substituent in Q ¹ described above. The same as the divalent hydrocarbon group and preferred embodiments thereof.

In General Formula (4), R ^1b represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. R ^2b represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7b or —SO ₂ —R ^8b . R ^7b represents a hydroxy group or —OR ^71b , and R ^8b represents a halogen atom, a hydroxy group, —OR ^81b , —NR ^82b R ^83b or —R ^84b . R ^71b and R ^81b to R ^84b are the same or different and are a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 6 to 20 carbon atoms which may have a substituent. Represents an aryl group.
A preferred embodiment of R ^1b is the same as the preferred embodiment of R ¹ described above.
R ^2b is preferably a cyano group, a heterocyclic ring-containing group, or —C (O) —R ^7b, more preferably a cyano group or —C (O) —OR ^71b . ^{^{^{R 71b, R 81b, R 82b}}} , preferred embodiments of ^{R 83 b} and ^{R 84b} are each a preferred embodiment of ^{^{R 71, R 81, R 82}} , R 83 and ^{R 84} as described ^above the same.

In the general formula (4), R ^3b is a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon atom. Represents 20 to 20 aryl groups.
R ^402b is a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, an ^optionally substituted aryl group having 6 to 20 carbon atoms, —NR ^406b R ^407b , —OR ^408b , a cyano group, —C (O) R ^409b , —O—C (O) R ^410b or —C (O) OR ^411b , and R ^404b to R ^411b are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404b , R ^405b, and the nitrogen atom to which R ^404b and R ^405b are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
The preferred embodiments of R ^3b , R ^402b , R ^404b , R ^405a , R ^406b , R ^407b , R ^408b , R ^409b , R ^410b, and R ^411b are R ³ , R ⁴⁰² , R ⁴⁰⁴ , R ⁴⁰⁵ , R ⁴⁰⁶ described above. , R ⁴⁰⁷ , R ⁴⁰⁸ , R ⁴⁰⁹ , R ⁴¹⁰ and R ⁴¹¹ are the same as the preferred embodiments.

As the compound (1), the compound (5) is also preferable.
In the general formula (5), R ^2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7c or —SO ₂ —R ^8c . R ^7c represents a hydroxy group or —OR ^71c , and R ^8c represents a halogen atom, a hydroxy group, —OR ^81c , —NR ^82c R ^83c or —R ^84c . R ^71c and R ^81c to R ^84c are the same or different and are a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon group having 6 to 20 carbon atoms. Represents an aryl group. R ^2c is preferably a cyano group, a heterocyclic group, or —C (O) —R ^7c, more preferably a cyano group or —C (O) —OR ^71c .
Preferred embodiments of R ^71c , R ^81c , R ^82c , R ^83c and R ^84c are the same as the preferred embodiments of R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ described above.

In general formula (5), R ^3c is a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon atom. Represents 20 to 20 aryl groups.
R ^402c and R ^403c are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon atom having 6 to 20 carbon atoms. ^Represents an aryl group, —NR ^406c R ^407c , —OR ^408c , a cyano group, —C (O) R ^409c , —O—C (O) R ^410c or —C (O) OR ^411c , and R ^404c to R ^411c Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404c , R ^405c, and the nitrogen atom to which R ^404c and R ^405c are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
Preferred embodiments of R ^3c , R ^402c , R ^403c , R ^404c , R ^405c , R ^406c , R ^407c , R ^408c , R ^409c , R ^410c, and R ^411c are the aforementioned R ³ , R ⁴⁰² , R ⁴⁰³ , and R ^404. , R ⁴⁰⁵ , R ⁴⁰⁶ , R ⁴⁰⁷ , R ⁴⁰⁸ , R ⁴⁰⁹ , R ⁴¹⁰ and R ⁴¹¹ are the same as the preferred embodiments.

In the general formula (5), R ⁵⁰¹ is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, Or represents the group represented by the said General formula (6). R ⁵⁰¹ is preferably an optionally substituted alkyl group having 1 to 20 carbon atoms (for example, methyl group, ethyl group, t-butyl group, cyclohexyl group, 4-t-butylcyclohexyl group, 2, 6-di-t-butyl-4-methylcyclohexyl group), an aryl group having 6 to 20 carbon atoms which may have a substituent (eg, phenyl group, methylphenyl group, dimethylphenyl group, trimethylphenyl group) Etc.) or a group represented by the general formula (6). In one embodiment of the present invention, R ⁵⁰¹ is preferably a group represented by General Formula (6).

In the general formula (6), Q ³ represents an optionally substituted divalent hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site with the general formula (5). In the general formula (6), Q ³ is bonded to the general formula (5). The divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent in Q ³ and preferred embodiments thereof are those having 1 to 20 carbon atoms which may have a substituent in Q ¹ described above. The same as the divalent hydrocarbon group and preferred embodiments thereof. In one embodiment, Q ³ is more preferably a divalent aryl group represented by the general formula (20) and s is 0.

In the general formula (6), R ^2d represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R ^7d or —SO ₂ —R ^8d . R ^7d represents a hydroxy group or —OR ^71d , and R ^8d represents a halogen atom, a hydroxy group, —OR ^81d , —NR ^82d R ^83d or —R ^84d . R ^71d and R ^81d to R ^84d are the same or different and are a hydrogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon group having 6 to 20 carbon atoms. Represents an aryl group.
R ^2d is preferably a cyano group, a heterocyclic ring-containing group, or —C (O) —R ^7d, more preferably a cyano group or —C (O) —OR ^71d . Preferred embodiments of R ^71d , R ^81d , R ^82d , R ^83d and R ^84d are the same as the preferred embodiments of R ⁷¹ , R ⁸¹ , R ⁸² , R ⁸³ and R ⁸⁴ described above.

R ^3d represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R ^402d and R ^403d are the same or different and are a hydrogen atom, a halogen atom, an ^optionally substituted alkyl group having 1 to 20 carbon atoms, or an ^optionally substituted carbon atom having 6 to 20 carbon atoms. An aryl group of —NR ^406d R ^407d , —OR ^408d , a cyano group, —C (O) R ^409d , —O—C (O) R ^410d or —C (O) OR ^411d , and R ^404d to R ^411d Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R ^404d , R ^405d, and the nitrogen atom to which R ^404d and R ^405d are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
Preferred embodiments of R ^3d , R ^402d , R ^403d , R ^404d , R ^405d , R ^406d , R ^407d , R ^408d , R ^409d , R ^410d, and R ^411d are R ³ , R ⁴⁰² , R ⁴⁰³ , R ⁴⁰⁴ described above. , R ⁴⁰⁵ , R ⁴⁰⁶ , R ⁴⁰⁷ , R ⁴⁰⁸ , R ⁴⁰⁹ , R ⁴¹⁰ and R ⁴¹¹ are the same as the preferred embodiments.

In the compound (3), when R ⁴¹³ is a group represented by the general formula (4), in the general formula (1), Q ¹ is Q ² (optionally having 1 to 20 carbon atoms). And a compound having a dimer structure in which the group represented by the general formula (3) and the group represented by the general formula (4) are linked to both sides by Q ^2. is there. The group represented by the general formula (3) and the group represented by the general formula (4) include a methine structure, and both are structures that become a dye. Since the molecular weight is increased due to the dimer structure of such a dye structure, the compound is difficult to sublimate, and the dye compound is excellent in heat resistance. The compound (3) in which R ⁴¹³ is a group represented by the general formula (4) is a compound represented by the following general formula (3-1).

In the above formula (3-1), R ^1a , R ^2a , R ^3a , R ^402a , R ^404a and R ^405a , and Q ² , R ^1b , R ^2b , R ^3b , R ^402b , R ^404b and R ^405b are Are as defined above.

In the compound (5), when R ⁵⁰¹ is a group represented by the general formula (6), in the general formula (1), Q ¹ is Q ³ (which may have a substituent having 1 to 20 carbon atoms). And a compound having a dimer structure in which the group represented by the general formula (5) and the group represented by the general formula (6) are linked to both sides according to Q ^3. is there. The group represented by the general formula (5) and the structure represented by the general formula (6) include a methine structure and serve as a dye. Since the molecular weight is increased due to the dimer structure of such a dye structure, the compound is difficult to sublimate, and the dye compound is excellent in heat resistance.
The compound (5) in which R ⁵⁰¹ is a group represented by the general formula (6) is a compound represented by the following general formula (5-1).

In the general formula (5-1), R ^2c , R ^3c , R ^402c , R ^403c , R ^404c and R ^405c , and Q ³ , R ^2d , R ^3d , R ^402d , R ^403d , R ^404d and R ^405d Is as defined above.

Examples of preferred embodiments of the compound (1) of the present invention include, for example, the compounds C1 to C5 produced in the examples. Of these, compounds C1, C2 and C5 are preferred because of high light resistance. From the viewpoint of high heat resistance, compounds C1 to C3 are preferred. From the viewpoint of high solubility in an organic solvent, compounds C1 to C5 are preferred. Compounds C1 to C5 are examples of compound (3).

The method for producing the compound (1) of the present invention is not particularly limited, and for example, it can be produced by the following method. The method for producing the compound of the present invention will be described below with an example of the synthesis method, but the method for producing the compound (1) of the present invention is not limited to the following method. Moreover, when performing the below-mentioned reaction, about functional groups other than the said site | part, you may protect beforehand with a suitable protective group as needed, and you may deprotect this in a suitable step.

As one embodiment of the present invention, when the compound represented by the general formula (1) is a compound represented by the following general formula (11) (compound (11)), for example, synthesis is performed by the following method. Can do. The compound (11) is an example of the compound (1) of the present invention, and is a compound (dimer compound) in which m is 2 in the general formula (1). The compound (11) can be said to be an example of a compound in which R ⁴¹³ is a group represented by the general formula (4) in the compound (3). In the following, compound (11) is obtained by subjecting compound (M4) to dehydration condensation reaction with compound (M21).

In the above reaction formula, Q ^f represents a divalent linking group. R ^1f , R ^2f and preferred embodiments thereof are the same as R ¹ , R ² and preferred embodiments described above, respectively. R ^402f , R ^404f and R ^405f and preferred embodiments thereof are the same as the above-described R ⁴⁰² , R ⁴⁰⁴ and R ⁴⁰⁵ and preferred embodiments thereof. The divalent linking group in Q ^f is the same as the divalent linking group in Q ¹ . Q ^f is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.

(The above-mentioned wavy line is the same as the wavy line in the chemical formula) is a single bond, and the configuration of the double bond to which it is bonded is independently an E configuration or a Z configuration. Or a mixture thereof. The same applies to the following.

The compound (M4) can be obtained, for example, by reacting a dihalogenated alkyl compound with the compound (M1) represented by the following general formula (M1) to alkoxylate the hydroxy group of the compound (M1). Compound (M1) can be obtained according to the method described in Journal of the Chemical Society, 1957, 4845.

In the general formula (M1), R ^402f , R ^404f and R ^405f have the same ^meanings as described above.
The compound (11) can also be obtained by dehydrating and condensing the compound (M1) and the compound (M21) and then dimerizing by alkoxylation.

When the compound represented by the general formula (1) is a compound represented by the following general formula (12) (compound (12)), for example, it can be synthesized by the following method. The compound (12) is an example of the compound (1) of the present invention and is a dimer compound. The compound (12) can be said to be an example of a compound in which R ⁵⁰¹ is a group represented by the general formula (6) in the compound (5). In the following, compound (12) is obtained by subjecting compound (M2-1) to dehydration condensation reaction of compound (M22).

In the above reaction formula, R ^2g and preferred embodiments thereof are the same as R ^2c described above and preferred embodiments thereof. W ^g represents —C (O) —O—Q ^g —O—C (O) —, and Q ^g represents a divalent linking group. Divalent linking group for Q ^g is the same as the divalent linking group for Q ^1. Q ^g is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. R ^402g , R ^403g , R ^404g and R ^405g and preferred embodiments thereof are the ^same as R ⁴⁰² , R ⁴⁰³ , R ⁴⁰⁴ and R ⁴⁰⁵ described above and preferred embodiments thereof, respectively.
The compound (M2-1) and the compound (M2-2) described later can be obtained, for example, by alkoxylating the hydroxy group of the compound (M1).
The compound (12) can also be obtained by dehydrating and condensing the compound (M21) and the compound (M2-1), and then linking with R ^1f to dimerize as W ^g .

When the compound represented by the general formula (1) is a compound represented by the following general formula (13) (compound (13)), for example, it can be synthesized by the following method. The compound (13) is an example of the compound (1) of the present invention, and is a monomer compound (m in the general formula (1) is 1). Compound (13) is compound (3), wherein R ⁴¹³ is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms or an optionally substituted carbon group having 6 to 20 carbon atoms. It is also an example of a compound representing the aryl group. In the following, compound (13) is obtained by subjecting compound (M2-2) to dehydration condensation reaction of compound (M23).

In the above formula, R ^402h , R ^403h , R ^404h and R ^405h and preferred embodiments thereof are the ^same as R ⁴⁰² , R ⁴⁰³ , R ⁴⁰⁴ and R ⁴⁰⁵ described above and preferred embodiments thereof, respectively. R ^1h , R ^2h and preferred embodiments thereof are the same as R ¹ , R ² and preferred embodiments described above, respectively.

Isolation and purification of each product in the above production method can be performed by appropriately combining methods used in ordinary organic synthesis, for example, filtration, extraction, washing, drying, concentration, crystallization, various chromatography and the like. . In addition, the intermediate can be subjected to the next reaction without any particular purification.

The compound (1) of the present invention usually has an absorption maximum wavelength at 360 to 430 nm. When the absorption maximum wavelength is in the range of 360 to 430 nm, ultraviolet light and blue light can be selectively absorbed. The compound (1) of the present invention preferably has an absorption maximum wavelength at 370 to 420 nm, and more preferably has an absorption maximum wavelength at 380 to 400 nm. The compound (1) of the present invention preferably has a gram extinction coefficient of 400 nm of 30 or more. The absorption maximum wavelength and the gram extinction coefficient can be measured by the methods described in Examples.
In addition, the compound (1) of the present invention usually has good solubility in an organic solvent.

The compound (1) of the present invention is preferably a compound that is soluble in the following organic solvents.
Examples of the organic solvent include aromatic hydrocarbons (eg, toluene, xylene, etc.), ketones (methyl ethyl ketone, acetone, cyclohexanone, 2-heptanone, 3-heptanone, etc.), ethers (eg, propylene glycol monomethyl ether acetate). , Methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, etc.), esters (eg, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl lactate, ethyl acetate, butyl acetate, methyl 3-methoxypropionate) Etc.) and a mixed solvent of two or more of these.
Compound (1) is preferably dissolved in an amount of 0.1% by mass or more, and preferably dissolved in an amount of 0.1% by mass or more and 50% by mass or less, based on at least one of the above organic solvents. It is more preferable to dissolve 40% by mass or less, and further preferable to dissolve 3% by mass to 30% by mass. More preferably, the solubility in an organic solvent at 20 ° C. is in such a range. When the solubility in an organic solvent is within such a range, the compound (1) of the present invention is preferable because, for example, when the compound (1) is used for the production of an optical member, the productivity is good.

The thermal decomposition temperature of the compound (1) of the present invention is preferably 200 ° C. or higher, more preferably 210 ° C. or higher, for example, preferably 250 to 400 ° C. The thermal decomposition temperature can be measured with a thermogravimetric measuring device.

The compound (1) of the present invention usually has an absorption maximum wavelength at 360 to 430 nm, and can effectively absorb light of this wavelength. The compound (1) of the present invention can effectively absorb light around 400 nm. As one embodiment, when the compound (1) of the present invention is a dimer to hexamer compound (m is 2 to 6 in the general formula (1)), the heat resistance can be improved. In a preferred embodiment of the present invention, the compound (1) of the present invention is excellent in solubility in an organic solvent. For this reason, the compound (1) of this invention is used suitably for an optical member etc., for example.

<Dye compound>
The compound (1) having the absorption maximum wavelength at 360 to 430 nm can be used as a dye compound. Among the compounds (1), a dye compound having an absorption maximum wavelength in the absorption spectrum in the wavelength region of 380 to 430 nm is preferably used. The absorption maximum wavelength of the absorption spectrum of the dye compound is more preferably in the wavelength region of 380 to 420 nm. In the present invention, by using a combination of such a dye compound and the ultraviolet absorber, for example, light in a region (wavelength of 380 nm to 430 nm) that does not affect the light emission of the organic EL element can be sufficiently absorbed, In addition, the light emitting region (longer wavelength side than 430 nm) of the organic EL element can be sufficiently transmitted, and as a result, deterioration of the organic EL element due to external light can be suppressed. The dye compound is not particularly limited as long as it has the above-mentioned wavelength characteristics, but a material that does not have fluorescence and phosphorescence performance (photoluminescence) so as not to hinder the display properties of the organic EL element is preferable.

Further, the full width at half maximum of the dye compound is not particularly limited, but is preferably 80 nm or less, more preferably 5 to 70 nm, and still more preferably 10 to 60 nm. When the half-value width of the dye compound is in the above range, it is possible to control to sufficiently transmit light having a wavelength longer than 430 nm while sufficiently absorbing light in a region that does not affect light emission of the organic EL element. Therefore, it is preferable. In addition, the measuring method of a half value width is based on the method as described below.
<Measurement method of half width>
The full width at half maximum of the dye compound was measured from a transmission absorption spectrum of the solution of the dye compound under the following conditions using an ultraviolet-visible spectrophotometer (U-4100, manufactured by Hitachi High-Tech Science Co., Ltd.). From the spectrum measured by adjusting the concentration so that the absorbance at the absorption maximum wavelength is 1.0, the interval between the two wavelengths at which the peak value is 50% (full width at half maximum) is defined as the half width of the dye compound. .
(Measurement condition)
Solvent: Toluene or chloroform Cell: Quartz cell Optical path length: 10 mm

The compound (1), particularly the dye compound, may be used alone or in combination of two or more, but the total content is determined based on the base polymer (or its polymer). The monomer component to be formed) is preferably about 0.01 to 10 parts by weight, more preferably about 0.02 to 5 parts by weight with respect to 100 parts by weight. By setting the addition amount of the compound (1), particularly the dye compound, within the above range, for example, light in a region that does not affect the light emission of the organic EL element can be sufficiently absorbed and formed from the pressure-sensitive adhesive composition. Since the deterioration of an organic EL element can be suppressed by using the adhesive layer to be used, it is preferable.

<Ultraviolet absorber>
The ultraviolet absorber is not particularly limited, and for example, a triazine ultraviolet absorber, a benzotriazole ultraviolet absorber, a benzophenone ultraviolet absorber, an oxybenzophenone ultraviolet absorber, a salicylic acid ester ultraviolet absorber, a cyanoacrylate An ultraviolet absorber etc. can be mentioned, These can be used individually by 1 type or in combination of 2 or more types. Among these, triazine-based UV absorbers and benzotriazole-based UV absorbers are preferable, triazine-based UV absorbers having 2 or less hydroxyl groups in one molecule, and benzones having one benzotriazole skeleton in one molecule. For example, when an acrylic pressure-sensitive adhesive composition is used as an optical member, it can be dissolved in a monomer used for the formation of at least one ultraviolet absorber selected from the group consisting of triazole-based ultraviolet absorbers. It is preferable because of its good properties and high ultraviolet absorption ability in the vicinity of a wavelength of 380 nm.

Specific examples of triazine ultraviolet absorbers having 2 or less hydroxyl groups in one molecule include 2,4-bis-[{4- (4-ethylhexyloxy) -4-hydroxy} -phenyl] -6. -(4-Methoxyphenyl) -1,3,5-triazine (Tinosorb S, manufactured by BASF), 2,4-bis [2-hydroxy-4-butoxyphenyl] -6- (2,4-dibutoxyphenyl) -1,3,5-triazine (TINUVIN 460, manufactured by BASF), 2- (4,6-bis (2,4-dimethylphenyl) -1,3,5-triazin-2-yl) -5-hydroxyphenyl And [(C10-C16 (mainly C12-C13) alkyloxy) methyl] oxirane reaction product (TINUVIN400, manufactured by BASF), 2- [4,6-bis (2 , 4-Dimethylphenyl) -1,3,5-triazin-2-yl] -5- [3- (dodecyloxy) -2-hydroxypropoxy] phenol), 2- (2,4-dihydroxyphenyl) -4 , 6-bis- (2,4-dimethylphenyl) -1,3,5-triazine and (2-ethylhexyl) -glycidic acid ester reaction product (TINUVIN405, manufactured by BASF), 2- (4,6-diphenyl) -1,3,5-triazin-2-yl) -5-[(hexyl) oxy] -phenol (TINUVIN 1577, manufactured by BASF), 2- (4,6-diphenyl-1,3,5-triazin-2-yl ) -5- [2- (2-Ethylhexanoyloxy) ethoxy] -phenol (ADK STAB LA46, manufactured by ADEKA), 2- (2-hydroxy-4) [1- octyloxycarbonylethoxy] phenyl) -4,6-bis (4-phenylphenyl) -1,3,5-triazine (TINUVIN 479, manufactured by BASF), and the like.

As a benzotriazole ultraviolet absorber having one benzotriazole skeleton in one molecule, 2- (2H-benzotriazol-2-yl) -6- (1-methyl-1-phenylethyl) -4- (1,1,3,3-tetramethylbutyl) phenol (TINUVIN 928, manufactured by BASF), 2- (2-hydroxy-5-tert-butylphenyl) -2H-benzotriazole (TINUVIN PS, manufactured by BASF), benzene Propanoic acid and ester compounds of 3- (2H-benzotriazol-2-yl) -5- (1,1-dimethylethyl) -4-hydroxy (C7-9 side chain and linear alkyl) (TINUVIN 384-2, BASF 2-, (2H-benzotriazol-2-yl) -4,6-bis (1-methyl-1-phenol) Ruethyl) phenol (TINUVIN900, manufactured by BASF), 2- (2H-benzotriazol-2-yl) -6- (1-methyl-1-phenylethyl) -4- (1,1,3,3-tetramethylbutyl) ) Phenol (TINUVIN 928, manufactured by BASF), methyl-3- (3- (2H-benzotriazol-2-yl) -5-tert-butyl-4-hydroxyphenyl) propionate / polyethylene glycol 300 reaction product (TINUVIN 1130, BASF), 2- (2H-benzotriazol-2-yl) -p-cresol (TINUVIN P, manufactured by BASF), 2 (2H-benzotriazol-2-yl) -4-6-bis (1-methyl- 1-phenylethyl) phenol (TINUVIN234, manufactured by BASF), 2- [5 Chloro (2H) -benzotriazol-2-yl] -4-methyl-6- (tert-butyl) phenol (TINUVIN 326, manufactured by BASF), 2- (2H-benzotriazol-2-yl) -4,6-di -Tert-pentylphenol (TINUVIN 328, manufactured by BASF), 2- (2H-benzotriazol-2-yl) -4- (1,1,3,3-tetramethylbutyl) phenol (TINUVIN 329, manufactured by BASF), methyl 3 -(3- (2H-benzotriazol-2-yl) -5-tert-butyl-4-hydroxyphenyl) propionate and polyethylene glycol 300 reaction product (TINUVIN 213, manufactured by BASF), 2- (2H-benzotriazole -2-yl) -6-dodecyl-4-methylphenol ( TINUVIN571 (manufactured by BASF), 2- [2-hydroxy-3- (3,4,5,6-tetrahydrophthalimido-methyl) -5-methylphenyl] benzotriazole (Sumsorb 250, manufactured by Sumitomo Chemical Co., Ltd.), 2 -(2-Hydroxy-3-tert-butyl-5-methylphenyl) -5-chlorobenzotriazole (SeeSorb 703, manufactured by Cypro Kasei Co., Ltd., or KEMISORB 73, manufactured by Cypro Kasei Co., Ltd.) Can do.

Examples of the benzophenone ultraviolet absorber (benzophenone compound) and oxybenzophenone ultraviolet absorber (oxybenzophenone compound) include 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, and 2-hydroxy. -4-methoxybenzophenone-5-sulfonic acid (anhydrous and trihydrate), 2-hydroxy-4-octyloxybenzophenone, 4-dodecyloxy-2-hydroxybenzophenone, 4-benzyloxy-2-hydroxybenzophenone, 2, 2 ′, 4,4′-tetrahydroxybenzophenone, 2,2′-dihydroxy-4,4-dimethoxybenzophenone, 2,2 ′, 4,4′-tetrahydroxybenzophenone (SeeSorb 106, manufactured by Cypro Kasei Co., Ltd.) , , 2'-dihydroxy-4-methoxybenzophenone (KEMISORB 111, manufactured by Chemipro Kasei Co.) and the like.

Examples of the salicylic acid ester ultraviolet absorber (salicylic acid ester compound) include, for example, phenyl-2-acryloyloxybenzoate, phenyl-2-acryloyloxy-3-methylbenzoate, and phenyl-2-acryloyloxy. -4-methylbenzoate, phenyl-2-acryloyloxy-5-methylbenzoate, phenyl-2-acryloyloxy-3-methoxybenzoate, phenyl-2-hydroxybenzoate, phenyl-2-hydroxy -3-methyl benzoate, phenyl-2-hydroxy-4 methyl benzoate, phenyl-2-hydroxy-5-methyl benzoate, phenyl 2-hydroxy-3-methoxy benzoate, 2,4-di-tert -Butylphenyl-3,5-di-tert- Chill-4-hydroxybenzoate (TINUVIN120, manufactured by BASF), and the like.

Examples of the cyanoacrylate ultraviolet absorber (cyanoacrylate compound) include alkyl-2-cyanoacrylate, cycloalkyl-2-cyanoacrylate, alkoxyalkyl-2-cyanoacrylate, alkenyl-2-cyanoacrylate, alkynyl- Examples include 2-cyanoacrylate.

The absorption maximum wavelength of the absorption spectrum of the ultraviolet absorber is preferably in the wavelength region of 300 to 400 nm, and more preferably in the wavelength region of 300 to 380 nm. Here, the absorption maximum wavelength means an absorption maximum wavelength exhibiting the maximum absorbance among the plurality of absorption maximums in the spectral absorption spectrum in the wavelength region of 300 to 460 nm. . The measuring method of the absorption maximum wavelength is the same as the measuring method of the dye-based compound.

The ultraviolet absorber may be used singly or in combination of two or more, but the total content thereof is 100% of the base polymer (or monomer component forming the polymer). The amount is preferably about 0.1 to 8 parts by weight, more preferably about 0.2 to 6 parts by weight with respect to parts by weight. By setting the addition amount of the ultraviolet absorber within the above range, the ultraviolet absorbing function of the optical member can be sufficiently exhibited. Further, when the base polymer of the optical member is, for example, an acrylic polymer, it is preferable to perform ultraviolet polymerization of the acrylic polymer because it does not hinder the polymerization.

<Other additives>
The composition for optical members of the present invention may contain an appropriate additive in addition to the above components depending on the application.

<Preparation of composition for optical member>
The composition for optical members of the present invention can be prepared by mixing at least a base polymer to be formed having an optical member, an ultraviolet absorber, and a compound represented by the above general formula (1). For example, the ultraviolet absorber and the above compound (1) can be kneaded into the base polymer, or dissolved and mixed in a solvent, and the ultraviolet absorber and the above-described monomer component for forming the base polymer can be mixed. The said composition can be prepared by mix | blending a compound (1) and polymerizing the compound and obtaining a polymer. In forming an optical member, the composition for an optical member can appropriately contain a solvent, and can contain various additives depending on the optical member. Although it does not restrict | limit especially as said solvent, The organic solvent mentioned above etc. are mentioned.

The optical member composition of the present invention can form various optical members by various methods according to the optical member. For example, as a forming method, a composition for an optical member is molded by an injection molding method, a compression molding method, an extrusion molding method, or the like, or the optical member composition of the present invention is applied and formed on a support described later. Various methods such as a method can be adopted. Examples of the coating method include a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a spin coating method, and an extrusion coating method. The method of forming a coating film is mentioned.

<Optical member>
Examples of the optical member include an optical film. Specifically, as an optical film applicable as the optical member of the present invention, a transparent protective film for a polarizer, a retardation film, a light diffusion film, a light collecting film, a brightness enhancement film, a lenticular film, a cover window film (front plate) ), An anti-scattering film, a decorative printing film, and the like.

Also, examples of the optical member include a pressure-sensitive adhesive layer or an adhesive layer applied to the optical film. These pressure-sensitive adhesive layers or adhesive layers are polarizing films, polarizers, transparent protective films for polarizers, retardation films, light diffusion films, light-condensing films, brightness enhancement films, lenticular films, cover window films (front plates), It can be applied by providing it on an optical film such as a scattering prevention film or a decorative printing film. The optical member can be used as an optical laminate including a polarizer and a retardation film.

Also, examples of the optical member include a surface treatment layer provided on the optical film. Examples of these surface treatment layers include hard coat layers, antireflection layers, antiglare treatment layers, antireflection layers, refractive index adjustment layers, and the like. Polarizing films, polarizers, transparent protective films for polarizers, retardation films, It can be applied by providing it on an optical film such as a light diffusion film, a light collecting film, a brightness enhancement film, a lenticular film, a cover window film (front plate), a scattering prevention film, or a decorative printing film.

Also, examples of the optical member include a functional layer provided on the optical film. Examples of these functional layers include an easy-adhesion layer, an antistatic layer, an antiblocking layer, an oligomer prevention layer, a barrier layer, and the like. Polarizing film, polarizer, transparent protective film for polarizer, retardation film, light diffusion film, It can be applied by providing it on an optical film such as a light collecting film, a brightness enhancement film, a lenticular film, a cover window film (front plate), a scattering prevention film, or a decorative printing film.

Further, the optical member can be used as an intermediate layer provided between the transparent substrate film or the transparent substrate film in a transparent conductive film having a transparent substrate film and a transparent conductive layer. Examples of the intermediate layer include a refractive index adjusting layer, an easy adhesive layer, a hard coat layer, and crack prevention.

<Image display device>
The image display device of the present invention includes an image display unit and the optical member. Typical examples of the image display device including the image display unit include a liquid crystal display device and an organic electroluminescence (EL) display device. The optical member is preferably provided on the viewing side with respect to the image display unit.

For example, in an organic EL display device, the optical laminate includes an organic EL panel as the image display unit, and the viewing side of the organic EL panel includes at least a polarizer and a retardation film in this order from the viewing side. including. The optical member of this invention can be used as a member which forms the said optical laminated body, for example.

Hereinafter, the case where the optical member containing the compound represented by the general formula (1) of the present invention is used in an optical laminate used in an organic EL display device will be described as a representative example. The optical laminate includes a polarizer and a retardation film.

As shown in FIG. 1, the optical laminate 1 has at least an adhesive layer 2 / transparent protective film 3 / polarizer 4 / retardation film 5 / adhesive layer 6 laminated in this order from the viewing side. Things can be illustrated. Adhesive layer 2 / (viewing side) transparent protective film 3 / polarizer 4 / organic EL panel side transparent protective film / interlayer adhesive layer (or adhesive layer) / retardation film 5 / (organic EL panel side) The pressure-sensitive adhesive layer 6 may be laminated in this order. In addition to these, for example, functional layers such as a hard coat layer, an antiglare treatment layer, and an antireflection layer, a sensor layer, and a pressure-sensitive adhesive layer and an adhesive layer for laminating them can be included. . The transparent protective film 4 / polarizer 5 may be referred to as a polarizing film. The optical member containing the compound represented by the general formula (1) of the present invention can be used as various members or layers forming the optical laminate. The optical layered body is preferably an optical layered body (1) containing an optical member containing the compound represented by the general formula (1) of the present invention.

(1-1) Adhesive layer 2
In the present invention, the “adhesive layer” refers to a pressure-sensitive adhesive layer or an adhesive layer.

(1-1-1) Adhesive Layer As the adhesive layer, a layer made of any appropriate adhesive can be adopted. Examples of such adhesives include natural rubber adhesives, α-olefin adhesives, urethane resin adhesives, ethylene-vinyl acetate resin emulsion adhesives, ethylene-vinyl acetate resin hot melt adhesives, and epoxy resins. Adhesives, vinyl chloride resin solvent adhesives, chloroprene rubber adhesives, cyanoacrylate adhesives, silicone adhesives, styrene-butadiene rubber solvent adhesives, nitrile rubber adhesives, nitrocellulose adhesives, Reactive hot melt adhesives, phenol resin adhesives, modified silicone adhesives, polyester hot melt adhesives, polyamide resin hot melt adhesives, polyimide adhesives, polyurethane resin hot melt adhesives, polyolefin resin hot melt adhesives Adhesive, polyvinyl acetate resin solvent-based adhesive, Styrene resin solvent adhesive, polyvinyl alcohol adhesive, polyvinyl pyrrolidone resin adhesive, polyvinyl butyral adhesive, polybenzimidazole adhesive, polymethacrylate resin solvent adhesive, melamine resin adhesive, urea resin adhesive Agents, resorcinol adhesives, and the like. Such an adhesive agent can be used individually by 1 type or in mixture of 2 or more types. A base polymer corresponding to the type of the adhesive is used.

Examples of adhesives include, for example, thermosetting adhesives and hot-melt adhesives when classified according to the adhesive form. Only one kind of such an adhesive may be used, or two or more kinds thereof may be used.

A thermosetting adhesive exhibits an adhesive force when cured by heating and solidified. Examples of the thermosetting adhesive include an epoxy thermosetting adhesive, a urethane thermosetting adhesive, and an acrylic thermosetting adhesive. The curing temperature of the thermosetting adhesive is, for example, 100 to 200 ° C.

The hot melt adhesive is melted or softened by heating, thermally fused to the adherend, and then solidified by cooling to adhere to the adherend. Examples of hot melt adhesives include rubber hot melt adhesives, polyester hot melt adhesives, polyolefin hot melt adhesives, ethylene-vinyl acetate resin hot melt adhesives, polyamide resin hot melt adhesives, and polyurethane resins. Examples thereof include hot melt adhesives. The softening temperature (ring ball method) of the hot melt adhesive is, for example, 100 to 200 ° C. The melt viscosity of the hot melt adhesive is 180 ° C., for example, 100 to 30000 mPa · s.

The thickness of the adhesive layer is not particularly limited, but is preferably about 0.01 to 10 μm, and more preferably about 0.05 to 8 μm.

(1-1-2) Pressure-sensitive adhesive layer The type of pressure-sensitive adhesive composition forming the pressure-sensitive adhesive layer is not particularly limited, and examples thereof include rubber-based pressure-sensitive adhesives, acrylic pressure-sensitive adhesives, silicone-based pressure-sensitive adhesives, Examples thereof include urethane adhesives, vinyl alkyl ether adhesives, polyvinyl alcohol adhesives, polyvinyl pyrrolidone adhesives, polyacrylamide adhesives, and cellulose adhesives. Among these pressure-sensitive adhesives, acrylic pressure-sensitive adhesives are preferably used because they are excellent in optical transparency, exhibit appropriate adhesiveness, cohesiveness, and adhesive pressure-sensitive adhesive properties, and are excellent in weather resistance, heat resistance, and the like. . A base polymer corresponding to the type of the pressure-sensitive adhesive is used. In the present invention, an acrylic pressure-sensitive adhesive composition containing a (meth) acrylic polymer as a base polymer is preferable.

The acrylic pressure-sensitive adhesive composition preferably includes, for example, a partial polymer of a monomer component containing an alkyl (meth) acrylate and / or a (meth) acrylic polymer obtained from the monomer component. A dye compound (and also an ultraviolet absorber) can be added to the agent composition.

(Partial polymer of monomer component and (meth) acrylic polymer)
The acrylic pressure-sensitive adhesive composition includes a partially polymerized monomer component containing an alkyl (meth) acrylate and / or a (meth) acrylic polymer obtained from the monomer component.

Examples of the alkyl (meth) acrylate include those having a linear or branched alkyl group having 1 to 24 carbon atoms at the ester end. Alkyl (meth) acrylate can be used individually by 1 type or in combination of 2 or more types. “Alkyl (meth) acrylate” refers to alkyl acrylate and / or alkyl methacrylate, and (meth) in the present invention has the same meaning.

Examples of the alkyl (meth) acrylate include the aforementioned linear or branched alkyl (meth) acrylates having 1 to 24 carbon atoms, and among these, alkyl (meth) having 1 to 9 carbon atoms. Acrylates are preferred, and alkyl (meth) acrylates having 4 to 9 carbon atoms are preferred. The alkyl (meth) acrylate is preferable in terms of easily balancing the adhesive properties. Specific examples of the alkyl (meth) acrylate having 4 to 9 carbon atoms include n-butyl (meth) acrylate, s-butyl (meth) acrylate, t-butyl (meth) acrylate, and isobutyl (meth). Acrylate, n-pentyl (meth) acrylate, isopentyl (meth) acrylate, isohexyl (meth) acrylate, isoheptyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, etc. These can be used alone or in combination of two or more.

In the present invention, the alkyl (meth) acrylate having an alkyl group having 1 to 24 carbon atoms at the ester terminal is 40% by weight or more based on the total amount of the monofunctional monomer component forming the (meth) acrylic polymer. It is preferably 50% by weight or more, more preferably 60% by weight or more.

The monomer component may contain a copolymerization monomer other than the alkyl (meth) acrylate as a monofunctional monomer component. A copolymerization monomer can be used as the remainder of the said alkyl (meth) acrylate in a monomer component.

As the copolymerization monomer, for example, a cyclic nitrogen-containing monomer can be included. As said cyclic nitrogen containing monomer, what has a polymerizable functional group which has unsaturated double bonds, such as a (meth) acryloyl group or a vinyl group, and has a cyclic nitrogen structure can be especially used without a restriction | limiting. The cyclic nitrogen structure preferably has a nitrogen atom in the cyclic structure. Examples of cyclic nitrogen-containing monomers include lactam vinyl monomers such as N-vinyl pyrrolidone, N-vinyl-ε-caprolactam, and methyl vinyl pyrrolidone; vinyl pyridine, vinyl piperidone, vinyl pyrimidine, vinyl piperazine, vinyl pyrazine, vinyl pyrrole, vinyl Examples thereof include vinyl monomers having a nitrogen-containing heterocyclic ring such as imidazole, vinyl oxazole and vinyl morpholine. Moreover, the (meth) acryl monomer containing heterocyclic rings, such as a morpholine ring, a piperidine ring, a pyrrolidine ring, a piperazine ring, is mentioned. Specific examples include N-acryloylmorpholine, N-acryloylpiperidine, N-methacryloylpiperidine, N-acryloylpyrrolidine and the like. Among the cyclic nitrogen-containing monomers, lactam vinyl monomers are preferable.

In the present invention, the cyclic nitrogen-containing monomer is preferably 0.5 to 50% by weight, and preferably 0.5 to 40% by weight, based on the total amount of the monofunctional monomer component forming the (meth) acrylic polymer. Is more preferable, and 0.5 to 30% by weight is even more preferable.

The monomer component used in the present invention can contain a hydroxyl group-containing monomer as a monofunctional monomer component. As the hydroxyl group-containing monomer, a monomer having a polymerizable functional group having an unsaturated double bond such as a (meth) acryloyl group or a vinyl group and having a hydroxyl group can be used without particular limitation. Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl ( Hydroxyalkyl (meth) acrylates such as (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 8-hydroxyoctyl (meth) acrylate, 10-hydroxydecyl (meth) acrylate, 12-hydroxylauryl (meth) acrylate; -Hydroxyalkylcycloalkane (meth) acrylates such as -hydroxymethylcyclohexyl) methyl (meth) acrylate. Other examples include hydroxyethyl (meth) acrylamide, allyl alcohol, 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol monovinyl ether, and the like. These can be used alone or in combination. Of these, hydroxyalkyl (meth) acrylate is preferred.

In the present invention, the hydroxyl group-containing monomer is preferably 1% by weight or more from the viewpoint of enhancing adhesive force and cohesive force with respect to the total amount of the monofunctional monomer component forming the (meth) acrylic polymer, It is more preferably 2% by weight or more, and further preferably 3% by weight or more. On the other hand, if the amount of the hydroxyl group-containing monomer is too large, the pressure-sensitive adhesive layer becomes hard and the adhesive strength may decrease, and the viscosity of the pressure-sensitive adhesive may become too high or gel. The hydroxyl group-containing monomer is preferably 30% by weight or less, more preferably 27% by weight or less, and more preferably 25% by weight or less based on the total amount of the monofunctional monomer component forming the (meth) acrylic polymer. Is more preferable.

In addition, the monomer component that forms the (meth) acrylic polymer can contain other functional group-containing monomers as monofunctional monomers, such as carboxyl group-containing monomers and monomers having a cyclic ether group. It is done.

As the carboxyl group-containing monomer, a monomer having a polymerizable functional group having an unsaturated double bond such as a (meth) acryloyl group or a vinyl group and having a carboxyl group can be used without particular limitation. Examples of the carboxyl group-containing monomer include (meth) acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, and isocrotonic acid. Can be used alone or in combination. These anhydrides can be used for itaconic acid and maleic acid. Among these, acrylic acid and methacrylic acid are preferable, and acrylic acid is particularly preferable. In addition, a carboxyl group-containing monomer can be arbitrarily used for the monomer component used for manufacture of the (meth) acrylic-type polymer of this invention, On the other hand, it is not necessary to use a carboxyl group-containing monomer.

As a monomer having a cyclic ether group, a monomer having a polymerizable functional group having an unsaturated double bond such as a (meth) acryloyl group or a vinyl group and a cyclic ether group such as an epoxy group or an oxetane group. It can be used without particular limitation. Examples of the epoxy group-containing monomer include glycidyl (meth) acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate glycidyl ether, and the like. Examples of the oxetane group-containing monomer include 3-oxetanylmethyl (meth) acrylate, 3-methyl-oxetanylmethyl (meth) acrylate, 3-ethyl-oxetanylmethyl (meth) acrylate, and 3-butyl-oxetanylmethyl (meth) acrylate. , 3-hexyl-oxetanylmethyl (meth) acrylate and the like. These can be used alone or in combination.

In the present invention, the carboxyl group-containing monomer and the monomer having a cyclic ether group are preferably 30% by weight or less based on the total amount of the monofunctional monomer component forming the (meth) acrylic polymer, and 27% by weight. % Or less is more preferable, and 25% by weight or less is more preferable.

The monomer component forming the (meth) acrylic polymer of the present invention includes, for example, CH ₂ ═C (R ¹ ) COOR ² (wherein R ¹ is hydrogen or a methyl group, and R ² is the number of carbon atoms). And an alkyl (meth) acrylate represented by 1 to 3 substituted alkyl groups and cyclic cycloalkyl groups.

Here, the substituent of the substituted alkyl group having 1 to 3 carbon atoms as R ² is preferably an aryl group having 3 to 8 carbon atoms or an aryloxy group having 3 to 8 carbon atoms. . The aryl group is not limited, but is preferably a phenyl group.

Examples of such a monomer represented by CH ₂ ═C (R ¹ ) COOR ² include phenoxyethyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, 3,3,5-trimethylcyclohexyl. (Meth) acrylate, isobornyl (meth) acrylate, etc. are mentioned. These can be used alone or in combination.

In the present invention, the (meth) acrylate represented by CH ₂ ═C (R ¹ ) COOR ² is 50% by weight or less based on the total amount of the monofunctional monomer component forming the (meth) acrylic polymer. 45% by weight or less is preferable, 40% by weight or less is more preferable, and 35% by weight or less is more preferable.

Other copolymerization monomers include vinyl acetate, vinyl propionate, styrene, α-methylstyrene; (meth) acrylic acid polyethylene glycol, (meth) acrylic acid polypropylene glycol, (meth) acrylic acid methoxyethylene glycol, (meth) Glycol acrylic ester monomers such as methoxypolypropylene glycol acrylate; Acrylic ester monomers such as tetrahydrofurfuryl (meth) acrylate, fluorine (meth) acrylate, silicone (meth) acrylate and 2-methoxyethyl acrylate; Monomers, amino group-containing monomers, imide group-containing monomers, N-acryloylmorpholine, vinyl ether monomers and the like can also be used. Moreover, as a copolymerization monomer, the monomer which has cyclic structures, such as terpene (meth) acrylate and dicyclopentanyl (meth) acrylate, can be used.

Further examples include silane monomers containing silicon atoms. Examples of the silane monomer include 3-acryloxypropyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, 4-vinylbutyltrimethoxysilane, 4-vinylbutyltriethoxysilane, and 8-vinyloctyltrimethoxysilane. , 8-vinyloctyltriethoxysilane, 10-methacryloyloxydecyltrimethoxysilane, 10-acryloyloxydecyltrimethoxysilane, 10-methacryloyloxydecyltriethoxysilane, 10-acryloyloxydecyltriethoxysilane, and the like.

The monomer component that forms the (meth) acrylic polymer of the present invention contains a polyfunctional monomer as necessary in order to adjust the cohesive strength of the pressure-sensitive adhesive, in addition to the monofunctional monomer exemplified above. be able to.

The polyfunctional monomer is a monomer having at least two polymerizable functional groups having an unsaturated double bond such as a (meth) acryloyl group or a vinyl group, such as (poly) ethylene glycol di (meth) acrylate, (Poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,2-ethylene Glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,12-dodecanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylol methanetri (meth) acrylate Ester compounds of polyhydric alcohols such as carbonate and (meth) acrylic acid; allyl (meth) acrylate, vinyl (meth) acrylate, divinylbenzene, epoxy acrylate, polyester acrylate, urethane acrylate, butyl di (meth) acrylate, hexyl di ( And (meth) acrylate. Among these, trimethylolpropane tri (meth) acrylate, hexanediol di (meth) acrylate, and dipentaerythritol hexa (meth) acrylate can be preferably used. A polyfunctional monomer can be used individually by 1 type or in combination of 2 or more types.

The amount of the polyfunctional monomer used varies depending on the molecular weight, the number of functional groups, etc., but it is preferably used at 3 parts by weight or less, more preferably 2 parts by weight or less, with respect to a total of 100 parts by weight of monofunctional monomers 1 part by weight or less is more preferable. Moreover, it does not specifically limit as a lower limit, However It is preferable that it is 0 weight part or more, and it is more preferable that it is 0.001 weight part or more. Adhesive force can be improved when the usage-amount of a polyfunctional monomer exists in the said range.

The production of the (meth) acrylic polymer can be appropriately selected from known production methods such as radiation polymerization such as solution polymerization and ultraviolet (UV) polymerization, various radical polymerizations such as bulk polymerization and emulsion polymerization. Further, the (meth) acrylic polymer obtained may be any of a random copolymer, a block copolymer, a graft copolymer, and the like.

In the present invention, a partial polymer of the monomer component can also be suitably used.

When the (meth) acrylic polymer is produced by radical polymerization, polymerization can be carried out by appropriately adding a polymerization initiator, a chain transfer agent, an emulsifier and the like used for radical polymerization to the monomer component. The polymerization initiator, chain transfer agent, emulsifier and the like used for the radical polymerization are not particularly limited and can be appropriately selected and used. In addition, the weight average molecular weight of a (meth) acrylic-type polymer can be controlled by the usage-amount of a polymerization initiator and a chain transfer agent, and reaction conditions, and the usage-amount is suitably adjusted according to these kinds.

For example, in solution polymerization or the like, for example, ethyl acetate, toluene or the like is used as a polymerization solvent. As a specific example of solution polymerization, the reaction is carried out in an inert gas stream such as nitrogen and a polymerization initiator is added, and the reaction is usually performed at about 50 to 70 ° C. under reaction conditions for about 5 to 30 hours.

Examples of thermal polymerization initiators used for solution polymerization include 2,2′-azobisisobutyronitrile, 2,2′-azobis-2-methylbutyronitrile, 2,2′-azobis (2 -Methylpropionic acid) dimethyl, 4,4'-azobis-4-cyanovaleric acid, azobisisovaleronitrile, 2,2'-azobis (2-amidinopropane) dihydrochloride, 2,2'-azobis [2- (5-Methyl-2-imidazolin-2-yl) propane] dihydrochloride, 2,2′-azobis (2-methylpropionamidine) disulfate, 2,2′-azobis (N, N′-dimethyleneisobutyl) Amidine), 2,2′-azobis [N- (2-carboxyethyl) -2-methylpropionamidine] hydrate (VA-057, Wako Pure Chemical Industries, Ltd.) Azo initiators such as potassium persulfate, ammonium persulfate, di (2-ethylhexyl) peroxydicarbonate, di (4-t-butylcyclohexyl) peroxydicarbonate, di- sec-butyl peroxydicarbonate, t-butylperoxyneodecanoate, t-hexylperoxypivalate, t-butylperoxypivalate, dilauroyl peroxide, di-n-octanoyl peroxide, 1, 1,3,3-tetramethylbutylperoxy-2-ethylhexanoate, di (4-methylbenzoyl) peroxide, dibenzoyl peroxide, t-butylperoxyisobutyrate, 1,1-di (t- Hexylperoxy) cyclohexane, t-butyl hydroperoxide, hydrogen peroxide, etc. Examples include oxide initiators, redox initiators that combine a peroxide and a reducing agent, such as a combination of persulfate and sodium bisulfite, and a combination of peroxide and sodium ascorbate. It is not limited to.

The polymerization initiator may be used alone or in combination of two or more, but is preferably about 1 part by weight or less with respect to 100 parts by weight of the total amount of monomer components. The amount is more preferably about 0.005 to 1 part by weight, and further preferably about 0.02 to 0.5 part by weight.

When 2,2′-azobisisobutyronitrile is used as the polymerization initiator, the amount of the polymerization initiator used is about 0.2 parts by weight or less with respect to 100 parts by weight of the total amount of monomer components. The amount is preferably about 0.06 to 0.2 parts by weight.

Examples of the chain transfer agent include lauryl mercaptan, glycidyl mercaptan, mercaptoacetic acid, 2-mercaptoethanol, thioglycolic acid, 2-ethylhexyl thioglycolate, and 2,3-dimercapto-1-propanol. The chain transfer agent may be used alone or in combination of two or more, but the total content is 0.3 parts by weight relative to 100 parts by weight of the total amount of monomer components. Less than or equal to

Examples of the emulsifier used in emulsion polymerization include anionic emulsifiers such as sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzenesulfonate, ammonium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, and polyoxy Nonionic emulsifiers such as ethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene fatty acid ester, polyoxyethylene-polyoxypropylene block polymer and the like can be mentioned. These emulsifiers may be used alone or in combination of two or more.

Further, as reactive emulsifiers, as emulsifiers into which radical polymerizable functional groups such as propenyl groups and allyl ether groups are introduced, specifically, for example, Aqualon HS-10, HS-20, KH-10, BC-05 BC-10, BC-20 (all of which are manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), Adeka Soap SE10N (manufactured by ADEKA), and the like. The amount of the emulsifier used is preferably 5 parts by weight or less with respect to 100 parts by weight of the total amount of the monomer components.

Further, when the (meth) acrylic polymer is produced by radiation polymerization, it can be produced by polymerizing the monomer component by irradiating the monomer component with radiation such as an electron beam or ultraviolet (UV). Among these, ultraviolet polymerization is preferable. Hereinafter, ultraviolet polymerization which is a preferable embodiment in radiation polymerization will be described.

When performing ultraviolet polymerization, it is preferable to contain a photopolymerization initiator in the monomer component from the advantage that the polymerization time can be shortened.

Examples of the photopolymerization initiator include a photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm. Moreover, it is preferable that a photoinitiator (B) does not have an absorption band in wavelength 400nm or more. The photopolymerization initiator (B) is not particularly limited as long as it generates radicals by ultraviolet rays and starts photopolymerization and has an absorption band at a wavelength of less than 400 nm. Any initiator can be suitably used. For example, benzoin ether photopolymerization initiator, acetophenone photopolymerization initiator, α-ketol photopolymerization initiator, photoactive oxime photopolymerization initiator, benzoin photopolymerization initiator, benzyl photopolymerization initiator, benzophenone A photopolymerization initiator, a ketal photopolymerization initiator, a thioxanthone photopolymerization initiator, an acylphosphine oxide photopolymerization initiator, or the like can be used.

Specifically, examples of the benzoin ether photopolymerization initiator include benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-dimethoxy-1,2-diphenylethane- Examples thereof include 1-one and anisole methyl ether.

Examples of the acetophenone photopolymerization initiator include 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1-hydroxycyclohexyl phenyl ketone, 4-phenoxydichloroacetophenone, and 4-t-butyldichloroacetophenone. Etc.

Examples of α-ketol photopolymerization initiators include 2-methyl-2-hydroxypropiophenone, 1- [4- (2-hydroxyethyl) phenyl] -2-hydroxy-2-methylpropan-1-one, and the like. Is mentioned.

Examples of the photoactive oxime photopolymerization initiator include 1-phenyl-1,2-propanedione-2- (O-ethoxycarbonyl) -oxime.

Examples of the benzoin photopolymerization initiator include benzoin.

Examples of the benzyl photopolymerization initiator include benzyl and the like.

Examples of the benzophenone photopolymerization initiator include benzophenone, benzoylbenzoic acid, 3,3′-dimethyl-4-methoxybenzophenone, polyvinylbenzophenone, α-hydroxycyclohexyl phenyl ketone, and the like.

Ketal photopolymerization initiators include benzyl dimethyl ketal and the like.

Examples of the thioxanthone photopolymerization initiator include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-dimethylthioxanthone, isopropylthioxanthone, 2,4-dichlorothioxanthone, 2,4-diethylthioxanthone, 2,4 -Diisopropylthioxanthone, dodecylthioxanthone and the like are included.

Examples of the acylphosphine oxide photopolymerization initiator include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, and the like.

The photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm can be used alone or in combination of two or more. The photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm can be added within a range that does not impair the effects of the present invention, and the addition amount is a monofunctional that forms a (meth) acrylic polymer. The amount is preferably about 0.005 to 0.5 part by weight, more preferably about 0.02 to 0.1 part by weight based on 100 parts by weight of the monomeric monomer component.

In the case where the pressure-sensitive adhesive layer contains a dye compound (further, an ultraviolet absorber) and ultraviolet polymerization is performed, for example, the monomer component containing the alkyl (meth) acrylate and / or the monomer component It is preferably formed by ultraviolet polymerization of a UV curable acrylic pressure-sensitive adhesive composition containing a partial polymer, a dye compound (and UV absorber), and a photopolymerization initiator. Since the pressure-sensitive adhesive layer formed by ultraviolet polymerization of the ultraviolet curable acrylic pressure-sensitive adhesive composition can be formed to have a thickness of 150 μm or more, and a pressure-sensitive adhesive layer having a wide thickness can be formed. preferable.

In this case, the photopolymerization initiator preferably contains a photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or longer. When the pressure-sensitive adhesive composition contains a dye compound (moreover, an ultraviolet absorber), when ultraviolet polymerization is performed, the dye compound (further, the ultraviolet absorber) absorbs ultraviolet rays, and there are cases where the polymerization cannot be sufficiently performed. However, the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is preferable because it can be sufficiently polymerized even if it contains a dye compound (and an ultraviolet absorber).

As a photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide (Irgacure 819, manufactured by BASF), 2,4,6-trimethylbenzoyl- And diphenyl-phosphine oxide (LUCIRIN TPO, manufactured by BASF).

The photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more may be used alone or in combination of two or more.

Further, the addition amount of the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is not particularly limited, but is preferably less than the addition amount of the dye compound (and also the ultraviolet absorber). The amount of the monofunctional monomer component forming the (meth) acrylic polymer is preferably about 0.005 to 1 part by weight and preferably about 0.02 to 0.8 part by weight. More preferred. It is preferable that the amount of the photopolymerization initiator (A) added is in the above range because ultraviolet polymerization can sufficiently proceed.

Further, in the case where the pressure-sensitive adhesive layer contains a dye compound (further, an ultraviolet absorber) and ultraviolet polymerization is performed, the photopolymerization initiator (B) having an absorption band at a wavelength of less than 400 nm is included in the monomer component. A photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more, a dye compound (further added to the partial polymerization product (prepolymer composition) of the monomer component previously added and partially polymerized by irradiation with ultraviolet rays Are preferably subjected to ultraviolet polymerization by adding an ultraviolet absorber. When the photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more is added to the partial polymerization product (prepolymer composition) of the monomer component partially polymerized by ultraviolet irradiation, the photopolymerization is started. It is preferable to add the agent after dissolving it in the monomer.

In addition to the acrylic polymer, a rubber polymer is public as a base polymer. Rubber polymers are conjugated diene polymers obtained by polymerizing one kind of conjugated diene compound, conjugated diene copolymers obtained by polymerizing two or more kinds of conjugated diene compounds, conjugated diene compounds and aromatics. A conjugated diene copolymer obtained by copolymerizing with an aromatic vinyl compound can be included. Moreover, these hydrogenated materials can also be used suitably. The diene copolymer may be a random copolymer or a block copolymer, and may be a copolymer of a compound other than a conjugated diene compound or an aromatic vinyl compound.

Specific examples of such conjugated diene (co) polymers include butadiene rubber (BR), isoprene rubber (IR), styrene-butadiene copolymer (SBR), and butadiene-isoprene-styrene random copolymer. , Isoprene-styrene random copolymer, styrene-isoprene block copolymer (SIS), butadiene-styrene copolymer, styrene-ethylene-butadiene block copolymer (SEBS), acrylonitrile-butadiene rubber (NBR), etc. These can be used alone or in combination of two or more. Of these, isoprene-styrene copolymers are preferred. Moreover, these hydrogenated materials can also be used suitably.

(Silane coupling agent)
Furthermore, the pressure-sensitive adhesive composition of the present invention can contain a silane coupling agent. The amount of the silane coupling agent is preferably 1 part by weight or less, more preferably 0.01 to 1 part by weight, based on 100 parts by weight of the base polymer (for example, the (meth) acrylic polymer). More preferred is 0.02 to 0.6 parts by weight.

Examples of the silane coupling agent include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2- (3,4 epoxy cyclohexyl). Epoxy group-containing silane coupling agents such as ethyltrimethoxysilane, 3-aminopropyltrimethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-triethoxysilyl-N- (1, (3-dimethylbutylidene) propylamine, amino group-containing silane coupling agents such as N-phenyl-γ-aminopropyltrimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane ( (Meth) acrylic group-containing sila Coupling agents, such as isocyanate group-containing silane coupling agents such as 3-isocyanate propyl triethoxysilane and the like.

(Crosslinking agent)
The pressure-sensitive adhesive composition of the present invention can contain a crosslinking agent. Examples of crosslinking agents include isocyanate crosslinking agents, epoxy crosslinking agents, silicone crosslinking agents, oxazoline crosslinking agents, aziridine crosslinking agents, silane crosslinking agents, alkyletherified melamine crosslinking agents, metal chelate crosslinking agents, Crosslinkers such as oxides are included. A crosslinking agent can be used alone or in combination of two or more. Among these, an isocyanate type crosslinking agent is preferably used.

The crosslinking agent may be used alone or in combination of two or more, but the total content is a monofunctional monomer that forms a (meth) acrylic polymer. The amount is preferably 5 parts by weight or less, more preferably 0.01 to 5 parts by weight, still more preferably 0.01 to 4 parts by weight, and 0.02 to 3 parts by weight with respect to 100 parts by weight of the component. Particularly preferred.

The isocyanate-based cross-linking agent refers to a compound having two or more isocyanate groups (including an isocyanate-regenerating functional group in which the isocyanate group is temporarily protected by a blocking agent or quantification) in one molecule. Examples of the isocyanate-based crosslinking agent include aromatic isocyanates such as tolylene diisocyanate and xylene diisocyanate, alicyclic isocyanates such as isophorone diisocyanate, and aliphatic isocyanates such as hexamethylene diisocyanate.

More specifically, for example, lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate, alicyclic isocyanates such as cyclopentylene diisocyanate, cyclohexylene diisocyanate and isophorone diisocyanate, 2,4-tolylene diisocyanate, Aromatic diisocyanates such as 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate, polymethylene polyphenyl isocyanate, trimethylolpropane / tolylene diisocyanate trimer adduct (trade name: Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.) ), Trimethylolpropane / hexamethylene diisocyanate trimer adduct (trade name: Coronate HL, manufactured by Nippon Polyurethane Industry Co., Ltd.), hexamethyle Isocyanurate of diisocyanate (trade name: Coronate HX, manufactured by Nippon Polyurethane Industry Co., Ltd.) and the like, trimethylolpropane adduct of xylylene diisocyanate (trade name: D110N, manufactured by Mitsui Chemicals, Inc.), hexa Trimethylolpropane adduct of methylene diisocyanate (trade name: D160N, manufactured by Mitsui Chemicals); polyether polyisocyanate, polyester polyisocyanate, and adducts of these with various polyols, isocyanurate bond, burette bond, Examples thereof include polyisocyanates polyfunctionalized with allophanate bonds.

(Other additives)
The pressure-sensitive adhesive composition of the present invention may contain appropriate additives in addition to the above components depending on the application. For example, tackifiers (for example, rosin derivative resins, polyterpene resins, petroleum resins, oil-soluble phenol resins, etc., solid, semi-solid, or liquid at room temperature); fillers such as hollow glass balloons; plasticizers; aging An antioxidant; an antioxidant; a light stabilizer (HALS) and the like.

In the present invention, it is preferable that the pressure-sensitive adhesive composition is adjusted to a viscosity suitable for work such as coating on a substrate. Adjustment of the viscosity of the pressure-sensitive adhesive composition is performed, for example, by adding various polymers such as thickening additives, polyfunctional monomers, or the like, or by partially polymerizing the monomer components in the pressure-sensitive adhesive composition. The partial polymerization may be performed before or after adding various polymers such as thickening additives, polyfunctional monomers, and the like. Since the viscosity of the pressure-sensitive adhesive composition varies depending on the amount of the additive and the like, the polymerization rate when the monomer component in the pressure-sensitive adhesive composition is partially polymerized cannot be uniquely determined, but as a guideline, it is about 20% or less. It is preferably about 3 to 20%, more preferably about 5 to 15%. If it exceeds 20%, the viscosity becomes too high, so that it is difficult to apply to the substrate.

(Method for forming pressure-sensitive adhesive layer)
The method for forming the pressure-sensitive adhesive layer is not particularly limited, and can be formed by a method usually used in this field. Specifically, the pressure-sensitive adhesive composition is applied to at least one surface of the substrate, and a coating film formed from the pressure-sensitive adhesive composition is formed by drying, or irradiated with active energy rays such as ultraviolet rays. Can be formed. The pressure-sensitive adhesive layer formed on the substrate can be transferred to a polarizing film or the like.

The substrate is not particularly limited, and for example, various substrates such as a release film and a transparent resin film substrate, and a polarizing film described later can also be suitably used as the substrate.

Examples of the constituent material of the release film include resin films such as polyethylene, polypropylene, polyethylene terephthalate, and polyester films, porous materials such as paper, cloth, and nonwoven fabric, nets, foam sheets, metal foils, and laminates thereof. Suitable thin leaf bodies and the like can be mentioned, but a resin film is suitably used from the viewpoint of excellent surface smoothness.

Examples of the resin film include polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, and ethylene. -Vinyl acetate copolymer film and the like.

The thickness of the release film is usually 5 to 200 μm, preferably about 5 to 100 μm. For the release film, if necessary, release agent and antifouling treatment with silicone-based, fluorine-based, long-chain alkyl-based or fatty acid amide-based release agent, silica powder, etc., coating type, kneading type, An antistatic treatment such as a vapor deposition type can also be performed. In particular, the release property from the pressure-sensitive adhesive layer can be further improved by appropriately performing a release treatment such as silicone treatment, long-chain alkyl treatment, or fluorine treatment on the surface of the release film.

The transparent resin film substrate is not particularly limited, and various resin films having transparency are used. The resin film is formed of a single layer film. For example, the materials include polyester resins such as polyethylene terephthalate and polyethylene naphthalate, acetate resins, polyethersulfone resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, (meth) acrylic resins. , Polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, polyvinyl alcohol resin, polyarylate resin, polyphenylene sulfide resin, and the like. Of these, polyester resins, polyimide resins and polyethersulfone resins are particularly preferable.

The thickness of the film substrate is preferably 15 to 200 μm, and more preferably 25 to 188 μm.

The pressure-sensitive adhesive composition is applied onto the substrate by roll coating, kiss roll coating, gravure coating, reverse coating, roll brushing, spray coating, dip roll coating, bar coating, knife coating, air knife coating, curtain. A known and appropriate method such as a coat, a lip coat, or a die coater can be used and is not particularly limited.

When the pressure-sensitive adhesive layer is formed by drying a coating film formed from the pressure-sensitive adhesive composition, the drying conditions (temperature, time) are not particularly limited, and the composition of the pressure-sensitive adhesive composition, The concentration can be appropriately set depending on the concentration or the like, and is, for example, about 60 to 170 ° C., preferably 60 to 150 ° C., for 1 to 60 minutes, preferably 2 to 30 minutes.

When the pressure-sensitive adhesive composition is an ultraviolet curable pressure-sensitive adhesive composition and is formed by irradiating a coating film formed from the ultraviolet-curable pressure-sensitive adhesive composition with ultraviolet rays, the illuminance of the irradiated ultraviolet rays is 5 mW / cm ² or more is preferable. When the illuminance of the ultraviolet light is less than 5 mW / cm ² , the polymerization reaction time becomes long and the productivity may be inferior. The illuminance of the ultraviolet light is preferably 200 mW / cm ² or less. When the illuminance of the ultraviolet rays exceeds 200 mW / cm ² , the photopolymerization initiator is consumed rapidly, so that the polymer has a low molecular weight, and the holding power particularly at high temperatures may be reduced. Further, the integrated quantity of ultraviolet light ^is preferably 100mJ / cm 2 ~ 5000mJ / cm 2.

The ultraviolet lamp used in the present invention is not particularly limited, but an LED lamp is preferable. Since the LED lamp has a lower emission heat than other ultraviolet lamps, the temperature during polymerization of the pressure-sensitive adhesive layer can be suppressed. Therefore, the molecular weight reduction of the polymer can be prevented, the cohesive strength of the pressure-sensitive adhesive layer can be prevented from being lowered, and the holding power at a high temperature when the pressure-sensitive adhesive sheet is used can be increased. It is also possible to combine a plurality of ultraviolet lamps. Further, it is possible to intermittently irradiate ultraviolet rays, and to provide a light period in which ultraviolet rays are irradiated and a dark period in which ultraviolet rays are not irradiated.

In the present invention, the final polymerization rate of the monomer component in the ultraviolet curable pressure-sensitive adhesive composition is preferably 90% or more, more preferably 95% or more, and still more preferably 98% or more.

In the present invention, the peak wavelength of ultraviolet rays irradiated to the ultraviolet curable pressure-sensitive adhesive composition is preferably in the range of 200 to 500 nm, and more preferably in the range of 300 to 450 nm. When the peak wavelength of ultraviolet rays exceeds 500 nm, the photopolymerization initiator may not be decomposed and the polymerization reaction may not start. On the other hand, if the peak wavelength of the ultraviolet light is less than 200 nm, the polymer chain may be cut and the adhesive properties may be deteriorated.

Since the reaction is inhibited by oxygen in the air, a release film or the like is formed on the coating film formed from the ultraviolet curable acrylic pressure-sensitive adhesive composition to block oxygen, or the photopolymerization reaction is performed by nitrogen. It is preferable to carry out in an atmosphere. The above-mentioned thing can be mentioned as a release film. In addition, when a release film is used, the said release film can be used as a separator of a polarizing film with an adhesive layer as it is.

Moreover, when the ultraviolet curable adhesive composition used by this invention contains a pigment | dye compound (further ultraviolet absorber), the monomer component containing alkyl (meth) acrylate and the said photoinitiator (B) ("Previous The composition containing the “addition polymerization initiator” may be irradiated with ultraviolet rays to form a partial polymer of the monomer component, and the partial polymer of the monomer component is converted into a dye compound (and an ultraviolet absorber). In addition, it is preferable to add a photopolymerization initiator (A) having an absorption band at a wavelength of 400 nm or more (sometimes referred to as “post-addition polymerization initiator”) to prepare an ultraviolet curable pressure-sensitive adhesive composition. The polymerization rate of the partially polymerized product is preferably about 20% or less, more preferably about 3 to 20%, and further preferably about 5 to 15%. The ultraviolet irradiation conditions are as described above.

As described above, when the pressure-sensitive adhesive layer is formed from the ultraviolet curable pressure-sensitive adhesive composition containing the dye compound (and also the ultraviolet absorber), the polymerization rate of the monomer component is increased by polymerizing in two steps as described above. In addition, the ultraviolet absorbing function of the finally produced pressure-sensitive adhesive layer can be improved.

The thickness of the pressure-sensitive adhesive layer is preferably 12 μm or more, more preferably 50 μm or more, further preferably 100 μm or more, and particularly preferably 150 μm or more. Although the upper limit of the thickness of an adhesive layer is not specifically limited, It is preferable that it is 1 mm or less. When the thickness of the pressure-sensitive adhesive layer exceeds 1 mm, it becomes difficult to transmit ultraviolet rays, and it takes time to polymerize the monomer component, and causes problems in workability, winding in the process, and transportability, resulting in poor productivity. This is not preferable.

The gel fraction of the pressure-sensitive adhesive layer of the present invention is not particularly limited, but is preferably 35% or more, more preferably 50% or more, and further preferably 75% or more, It is particularly preferably 85% or more. When the gel fraction of the pressure-sensitive adhesive layer is small, there may be a problem in workability and handling properties.

The pressure-sensitive adhesive layer preferably has a haze value measured at a thickness of 25 μm of 2% or less, more preferably from 0 to 1.5%, and even more preferably from 0 to 1.0%. It is preferable that the haze is in the above range because the pressure-sensitive adhesive layer has high transparency.

When the pressure-sensitive adhesive layer is exposed, the pressure-sensitive adhesive layer may be protected with a release film until practical use.

(1-2) Polarizing film Examples of the polarizing film include those having a transparent protective film on at least one surface of a polarizer.

(1-2-1) Polarizer 4
The polarizer is not particularly limited, and various types can be used. Examples of polarizers include dichroic iodine and dichroic dyes on hydrophilic polymer films such as polyvinyl alcohol films, partially formalized polyvinyl alcohol films, and ethylene / vinyl acetate copolymer partially saponified films. Examples thereof include polyene-based oriented films such as those obtained by adsorbing substances and uniaxially stretched, polyvinyl alcohol dehydrated products and polyvinyl chloride dehydrochlorinated products. Among these, a polarizer composed of a polyvinyl alcohol film and a dichroic substance such as iodine is preferable. The thickness of these polarizers is not particularly limited, but is generally about 5 to 80 μm.

A polarizer obtained by dyeing a polyvinyl alcohol film with iodine and uniaxially stretching it can be produced, for example, by dyeing polyvinyl alcohol in an aqueous iodine solution and stretching it 3 to 7 times the original length. If necessary, it can be immersed in an aqueous solution of potassium iodide or the like which may contain boric acid, zinc sulfate, zinc chloride or the like. Further, if necessary, the polyvinyl alcohol film may be immersed in water and washed before dyeing. In addition to washing the polyvinyl alcohol film surface with stains and antiblocking agents by washing the polyvinyl alcohol film with water, the polyvinyl alcohol film is also swollen to prevent unevenness such as uneven coloring. is there. Stretching may be performed after dyeing with iodine, may be performed while dyeing, or may be dyed with iodine after stretching. The film can be stretched even in an aqueous solution of boric acid or potassium iodide or in a water bath.

In the present invention, a thin polarizer having a thickness of 10 μm or less can also be used. From the viewpoint of thinning, the thickness is preferably 1 to 7 μm. Such a thin polarizer is preferable in that the thickness unevenness is small, the visibility is excellent, the dimensional change is small, the durability is excellent, and the thickness of the polarizing film can be reduced.

As the thin polarizer, typically, Japanese Patent Application Laid-Open No. 51-069644, Japanese Patent Application Laid-Open No. 2000-338329, International Publication No. 2010/100917, International Publication No. 2010/100917, or a patent. The thin polarizing film described in the specification of 4751481 and Unexamined-Japanese-Patent No. 2012-0753563 can be mentioned. These thin polarizing films can be obtained by a production method including a step of stretching and dyeing a polyvinyl alcohol-based resin (hereinafter also referred to as PVA-based resin) layer and a stretching resin substrate in the state of a laminate. With this production method, even if the PVA-based resin layer is thin, it can be stretched without problems such as breakage due to stretching by being supported by the stretching resin substrate.

As the thin polarizing film, International Publication No. 2010/100917 pamphlet in that it can be stretched at a high magnification and the polarization performance can be improved among the production methods including the step of stretching in the state of a laminate and the step of dyeing. In particular, those obtained by a production method including a step of stretching in an aqueous boric acid solution as described in International Publication No. 2010/100917 pamphlet or Japanese Patent No. 47514881 and Japanese Patent Application Laid-Open No. 2012-0753563 are preferable. Those obtained by a production method including a step of stretching in the air before stretching in a boric acid aqueous solution described in the specification of 4751481 and Japanese Patent Application Laid-Open No. 2012-0753563 are preferable.

(1-2-2) Transparent protective film 3
Although the transparent protective film 3 used by this invention is arrange | positioned at the visual recognition side of the polarizer 4, a transparent protective film can also be arrange | positioned also at the organic EL panel side of the polarizer 4. FIG.

As the transparent protective film, those conventionally used can be appropriately used. Specifically, a transparent protective film formed from a material (base polymer) excellent in transparency, mechanical strength, thermal stability, moisture barrier property, isotropy, etc. is preferable. For example, polyethylene terephthalate, polyethylene naphthalate, etc. Polyester polymers, cellulose polymers such as diacetyl cellulose and triacetyl cellulose, acrylic polymers such as polymethyl methacrylate, styrene polymers such as polystyrene and acrylonitrile / styrene copolymer (AS resin), polycarbonate polymers, etc. It is done. In addition, polyethylene, polypropylene, polyolefins having a cyclo or norbornene structure, polyolefin polymers such as ethylene / propylene copolymers, vinyl chloride polymers, amide polymers such as nylon and aromatic polyamide, imide polymers, sulfone polymers , Polyether sulfone polymer, polyether ether ketone polymer, polyphenylene sulfide polymer, vinyl alcohol polymer, vinylidene chloride polymer, vinyl butyral polymer, arylate polymer, polyoxymethylene polymer, epoxy polymer, or Examples of the polymer that forms the transparent protective film include polymer blends. The transparent protective film can also be formed as a cured layer of thermosetting or ultraviolet curable resin such as acrylic, urethane, acrylurethane, epoxy, and silicone.

The thickness of the transparent protective film can be appropriately determined, but is generally about 1 to 500 μm from the viewpoints of workability such as strength and handleability, and thin film properties.

(1-2-3) Adhesive Layer The polarizer and the transparent protective film are preferably in close contact with each other through an aqueous adhesive or the like. Examples of the water-based adhesive include an isocyanate-based adhesive, a polyvinyl alcohol-based adhesive, a gelatin-based adhesive, a vinyl-based latex, a water-based polyurethane, and a water-based polyester. In addition to the above, examples of the adhesive between the polarizer and the transparent protective film include an ultraviolet curable adhesive and an electron beam curable adhesive. The electron beam curable polarizing film adhesive exhibits suitable adhesiveness with respect to the various viewing-side transparent protective films. The adhesive used in the present invention can contain a metal compound filler.

(1-2-4) Surface treatment layer: functional layer A functional layer such as a hard coat layer, an antireflection layer, or an antisticking layer can be formed on the surface of the transparent protective film to which the polarizer is not adhered. It may be subjected to a treatment for diffusion or anti-glare.

As the hard coat layer, for example, a cured film made of a curable resin having a base polymer of melamine resin, urethane resin, alkyd resin, acrylic resin, silicone resin, or the like is preferably used. The curable resin can be used as an active energy ray-curable compound having a functional group having at least one polymerizable double bond in the molecule. The thickness of the hard coat layer is preferably 0.1 to 30 μm.

It is also possible to add a light stabilizer (HALS), an antioxidant or the like to the functional layer.

(1-3) Retardation film 5
When the refractive index in the slow axis direction is nx, the in-plane fast axis direction refractive index is ny, and the thickness direction refractive index is nz, nx = ny> nz, nx> ny. > Nz, nx> ny = nz, nx>nz> ny, nz = nx> ny, nz>nx> ny, nz> nx = ny, satisfying the relationship of various types are selected and used. It is done. Note that nx = ny includes not only the case where nx and ny are completely the same, but also the case where nx and ny are substantially the same. Moreover, ny = nz includes not only the case where ny and nz are completely the same, but also the case where ny and nz are substantially the same.

In the present invention, for use in an organic EL display device, the retardation film is preferably a ¼ wavelength plate with a front retardation of ¼ wavelength (about 100 to 170 nm). Lamination of the polarizing film and the quarter wave plate is preferable because it functions as a circularly polarizing film for preventing reflection of an organic EL display device.

That is, only the linearly polarized light component of the external light incident on the organic EL display device is transmitted through the polarizing film. This linearly polarized light is generally elliptically polarized light by the retardation film, but becomes circularly polarized light particularly when the retardation film is a quarter wavelength plate and the angle formed by the polarization direction with the retardation film is π / 4.

This circularly polarized light is transmitted through the transparent substrate, transparent electrode and organic thin film in the organic EL panel, reflected by the metal electrode, again transmitted through the organic thin film, transparent electrode and transparent substrate, and again linearly polarized by the retardation film. It becomes. And since this linearly polarized light is orthogonal to the polarization direction of a polarizing film, it cannot permeate | transmit a polarizing plate. As a result, the mirror surface of the metal electrode can be completely shielded.

Examples of the retardation film include a birefringent film obtained by uniaxially or biaxially stretching a polymer material, a liquid crystal polymer alignment film, and a liquid crystal polymer alignment layer supported by the film.

Examples of the polymer material (base polymer) include polyvinyl alcohol, polyvinyl butyral, polymethyl vinyl ether, polyhydroxyethyl acrylate, hydroxyethyl cellulose, hydroxypropyl cellulose, methyl cellulose, polycarbonate, polyarylate, polysulfone, polyethylene terephthalate, polyethylene naphthalate, Polyethersulfone, polyphenylene sulfide, polyphenylene oxide, polyallylsulfone, polyamide, polyimide, polyolefin, polyvinyl chloride, cellulose polymer, cycloolefin resin, or a binary or ternary copolymer thereof, Examples include graft copolymers and blends. These polymer materials become an oriented product (stretched film) by stretching or the like.

Examples of the liquid crystal polymer (base polymer) include various main chain types and side chain types in which a conjugated linear atomic group (mesogen) imparting liquid crystal alignment is introduced into the main chain or side chain of the polymer. Etc. Specific examples of the main chain type liquid crystal polymer include a nematic alignment polyester liquid crystal polymer, a discotic polymer, and a cholesteric polymer having a structure in which a mesogenic group is bonded to a spacer portion that imparts flexibility. Specific examples of the side chain type liquid crystal polymer include polysiloxane, polyacrylate, polymethacrylate, or polymalonate as a main chain skeleton, and a nematic alignment-providing para-substitution through a spacer portion composed of a conjugated atomic group as a side chain. Examples thereof include those having a mesogenic part composed of a cyclic compound unit. These liquid crystal polymers are prepared by, for example, applying a solution of a liquid crystalline polymer on an alignment treatment surface such as a surface of a thin film such as polyimide or polyvinyl alcohol formed on a glass plate or an oblique deposition of silicon oxide. This is done by developing and heat treatment.

(1-4) Adhesive layer 6, interlayer adhesive layer (or adhesive layer)
Examples of the pressure-sensitive adhesive layer 6 (pressure-sensitive adhesive layer on the organic EL panel side) used in the present invention include an interlayer pressure-sensitive adhesive layer (or adhesive layer) and the same pressure-sensitive adhesive layer as the pressure-sensitive adhesive layer. Among them, an acrylic pressure-sensitive adhesive layer formed from a (meth) acrylic pressure-sensitive adhesive composition having a (meth) acrylic polymer as a base polymer is preferable. A rubber pressure-sensitive adhesive layer formed from a rubber-based pressure-sensitive adhesive composition having a rubber-based polymer as a base polymer can be preferably applied. Moreover, the manufacturing method of a pressure-sensitive adhesive layer, a preferable aspect, and the like can be exemplified.

The thickness of the pressure-sensitive adhesive layer is not particularly limited, but is preferably about 10 to 75 μm, and more preferably about 12 to 50 μm.

(1-5) Other layers Examples of the (organic EL panel side) transparent protective film include those similar to the transparent protective film 3, and the organic EL panel side first pressure-sensitive adhesive layer (or adhesive) As the layer), any pressure-sensitive adhesive layer and adhesive layer in the present specification can be suitably used.

≪Transmissivity of optical member≫
The transmittance at a wavelength of 380 nm of the optical member (each layer) formed from the composition of the present invention is preferably 15% or less, more preferably 10% or less, and further preferably 7% or less. 3% or less is particularly preferable. Since the transmittance at a wavelength of 380 nm is in the above range, incident ultraviolet rays can be blocked to a higher degree, and thus the deterioration of the organic EL element can be remarkably suppressed.

The transmittance at a wavelength of 400 nm of the optical member (each layer) formed from the composition of the present invention is preferably 15% or less, more preferably 10% or less, and further preferably 7% or less. Preferably, it is particularly preferably 3% or less. Since the transmittance at a wavelength of 400 nm is in the above range, incident ultraviolet rays can be blocked to a higher degree, and thus the deterioration of the organic EL element can be remarkably suppressed.

On the other hand, the transmittance at a wavelength of 440 nm of the optical member (each layer) formed from the composition of the present invention is preferably 60% or more, more preferably 75% or more, and more preferably 85% or more. preferable. When the transmittance at a wavelength of 440 nm is within the above range, it is preferable because the light emission of the organic EL element can be sufficiently transmitted and sufficient display performance can be secured in the organic EL display device.

≪Transmissivity of optical layered body≫
The transmittance at a wavelength of 380 nm of the optical layered body is preferably 9% or less, more preferably 7% or less, further preferably 5% or less, and particularly preferably 3% or less. . Since the transmittance at a wavelength of 380 nm is within the above range, it is preferable because incident ultraviolet rays can be blocked to a higher degree and deterioration of the organic EL element can be remarkably suppressed.

The transmittance of the optical layered body at a wavelength of 400 nm is preferably 20% or less, preferably 15% or less, and more preferably 10% or less. When the transmittance at a wavelength of 400 nm is in the above range, it is preferable because incident ultraviolet rays can be blocked to a higher degree and deterioration of the organic EL element can be remarkably suppressed.

The transmittance of the optical laminate at a wavelength of 440 nm is preferably 25% or more, preferably 30% or more, and more preferably 33% or more. When the transmittance at a wavelength of 440 nm is within the above range, it is preferable because the light emission of the organic EL element can be sufficiently transmitted and sufficient display performance can be secured in the organic EL display device.

≪Organic EL display device≫
The organic EL display device of the present invention includes the optical laminate 1 and an organic EL panel, and can also include other layers. Specifically, as shown in FIG. 2, from the viewing side, cover member 7 / adhesive layer 2 / protective film 3 / polarizer 4 / retardation film 5 / adhesive layer 6 / organic EL panel 8 The organic EL display device 10 laminated in this order is preferable, and cover member 7 / adhesive layer 2 / (viewing side) protective film 3 / polarizer 4 / organic EL panel side protective film / organic EL panel side first adhesive. An organic EL display device in which an agent layer (or adhesive layer) / retardation film 5 / (organic EL panel side second) pressure-sensitive adhesive layer 6 / organic EL panel 8 are laminated in this order can also be exemplified. In addition to these, functional layers such as a hard coat layer, an antiglare treatment layer, an antireflection layer, a sensor layer, a pressure-sensitive adhesive layer or an adhesive layer for laminating them, and the like can be mentioned. it can.

The cover member is not particularly limited, and those normally used in this field can be suitably used, and examples thereof include cover glass and cover plastic. In addition, the organic EL panel is not particularly limited, and those normally used in this field can be suitably used. For example, a plurality of base materials and a plurality of side by side provided on the base material can be used. The panel which has the organic EL element of this, the protective layer provided on the said organic EL element, and the sealing film provided on the said protective layer can be mentioned.

Below, the case where the optical member containing the compound represented by General formula (1) of this invention is used for a transparent conductive film is demonstrated. The transparent conductive film includes a transparent base film and a transparent conductive layer.

As shown in FIG. 3, as the transparent conductive film 20, for example, a transparent conductive layer 22 / intermediate layer 23 / transparent substrate film 21 laminated in this order can be exemplified. The intermediate layer 23 can be arbitrarily provided. Examples of the intermediate layer include a refractive index adjusting layer, an easy-adhesive layer, a hard coat layer, a cracking prevention layer, and the like, and at least one selected from these can be used. The optical member containing the compound represented by the general formula (1) of the present invention can be used as a transparent substrate film or an intermediate layer forming the transparent conductive film. Moreover, the anti-blocking layer 24 can be provided in the transparent conductive film 20 in the transparent base film 21 in the side in which the transparent conductive layer 22 is not provided. The anti-blocking layer can be used as an optical member containing the compound represented by the general formula (1) of the present invention.

In the case where the transparent conductive film 20 has the intermediate layer 23 and the anti-blocking layer 24, for example, the following embodiments can be exemplified.
Aspect 1: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer) / transparent substrate film 21 / anti-blocking layer 24.
Aspect 2: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer / hard coat layer) / transparent substrate film 21 / anti-blocking layer 24
Aspect 3: Transparent conductive layer 22 / intermediate layer 23 (crack prevention layer) / transparent substrate film 21 / anti-blocking layer 24
Aspect 4: Transparent conductive layer 22 / intermediate layer 23 (crack prevention layer / adhesive layer) / transparent substrate film 21 / anti-blocking layer 24
Aspect 5: Transparent conductive layer 22 / intermediate layer 23 (refractive index adjusting layer / hard coat layer / adhesive layer) / transparent substrate film 21 / anti-blocking layer 24.

In the transparent conductive film, the optical member containing the compound represented by the general formula (1) of the present invention is preferably used as a transparent base film or an intermediate layer forming the transparent conductive film. When the optical member containing the compound represented by the general formula (1) of the present invention is applied to the anti-blocking layer, scratch resistance is caused by a problem with the adhesion of the anti-blocking particles in the anti-blocking layer. It may be difficult to secure.

(2-1) Transparent base film 21
Although it does not restrict | limit especially as a material (base polymer) of a transparent base film, Various plastic materials which have transparency are mention | raise | lifted. For example, as the material (base polymer), polyester resins such as polyethylene terephthalate and polyethylene naphthalate, acetate resins, polyethersulfone resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, polynorbornene Polycycloolefin resins such as resin, (meth) acrylic resin, polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, polyvinyl alcohol resin, polyarylate resin, polyphenylene sulfide resin, etc. It is done. Among these, polycycloolefin resins, polyester resins, polycarbonate resins, and polyolefin resins are particularly preferable.

The thickness of the transparent base film is usually preferably 30 to 250 μm, more preferably 45 to 200 μm.

(2-2) Transparent conductive layer 22
The constituent material of the transparent conductive layer is not particularly limited and is at least selected from the group consisting of indium, tin, zinc, gallium, antimony, titanium, silicon, zirconium, magnesium, aluminum, gold, silver, copper, palladium, tungsten. One metal metal oxide is used. The metal oxide may further contain a metal atom shown in the above group, if necessary. For example, indium oxide (ITO) containing tin oxide and tin oxide (ATO) containing antimony are preferably used.

The thickness of the transparent conductive layer is not particularly limited, but is preferably 10 nm or more in order to obtain a continuous film having a good electrical resistance of 1 × 10 ³ Ω / □ or less. The film thickness is preferably 15 to 35 nm, more preferably in the range of 20 to 30 nm, since transparency is lowered when the film thickness becomes too thick.

The method for forming the transparent conductive layer is not particularly limited, and a conventionally known method can be employed. Specifically, for example, a vacuum deposition method, a sputtering method, and an ion plating method can be exemplified. In addition, an appropriate method can be adopted depending on the required film thickness. In addition, after forming the transparent conductive layer, it can be crystallized by performing an annealing treatment within a range of 100 to 150 ° C., if necessary.

(2-3-1) Intermediate Layer 23: Refractive Index Adjusting Layer The refractive index adjusting layer can be formed of an inorganic material, an organic material, or a mixture of an inorganic material and an organic material. For example, NaF (1.3), Na ₃ AlF ₆ (1.35), LiF (1.36), MgF ₂ (1.38), CaF ₂ (1.4), BaF ₂ (1. 3), inorganic materials such as SiO ₂ (1.46), LaF ₃ (1.55), CeF ₃ (1.63), Al ₂ O ₃ (1.63) [the numerical values in parentheses for the above materials are It is the refractive index of light]. Examples of organic substances include acrylic resins, urethane resins, melamine resins, alkyd resins, siloxane polymers, and organic silane condensates, and these organic substances can be used as a base polymer. At least one of these base polymers is used.

The refractive index adjusting layer may have nanoparticles having an average particle diameter of 1 nm to 500 nm, preferably 5 nm to 300 nm. The content of the nanoparticles in the refractive index adjusting layer is preferably 0.1% to 90% by weight, more preferably 10% to 80% by weight, and still more preferably 20% to 70% by weight. By containing nanoparticles in the refractive index adjusting layer, the refractive index of the refractive index adjusting layer itself can be easily adjusted.

Examples of the inorganic oxide forming the nano fine particles include fine particles such as silicon oxide (silica), hollow nano silica, titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide. Among these, fine particles of silicon oxide (silica), titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide are preferable. These may be used alone or in combination of two or more.

The thickness of the refractive index adjusting layer is not particularly limited, but it is usually preferably 10 nm to 200 nm, preferably 20 nm to 200 nm, from the viewpoint of optical design and the effect of preventing oligomer generation from the transparent substrate film. It is more preferably 150 nm, and further preferably 20 nm to 130 nm.

(2-3-2) Intermediate layer 23: hard coat layer The hard coat layer is formed of a coating liquid containing an organic component (base polymer) or the like, and the hard coat layer is a coating containing an organic component (base polymer) or the like. By forming a hard coat layer, it is formed with a working solution, and excessive unevenness is locally filled. This can improve the surface uniformity of the transparent conductive layer and increase the bending resistance of the transparent conductive film. be able to.

Although the thickness of the hard coat layer is not particularly limited, it is preferably 0.5 μm or more and 3 μm or less, and more preferably 0.8 μm or more and 2 μm or less.

The organic component is not particularly limited, and an ultraviolet curable resin, a thermosetting resin, a thermoplastic resin, or the like is used. From the viewpoint of suppressing the processing speed and thermal damage to the transparent substrate film, it is particularly preferable to use an ultraviolet curable resin. As such an ultraviolet curable resin, for example, a curable compound having at least one of an acrylate group and a methacrylate group that is cured by light (ultraviolet rays) can be used. Examples of the curable compound include acrylates and methacrylates of polyfunctional compounds such as silicone resins, polyester resins, polyether resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, and polyhydric alcohols. Oligomers or prepolymers. These may be used alone or in combination of two or more.

The hard coat layer can contain an inorganic component. Examples of the inorganic component include fine particles or fine powders of inorganic oxides such as silicon oxide (silica), titanium oxide, aluminum oxide, zinc oxide, tin oxide, and zirconium oxide. The inorganic component is preferably a nanoparticle having a mode particle diameter of 1 nm to 100 nm, more preferably a nanoparticle in the range of 5 nm to 80 nm, from the viewpoint of coloring prevention and transparency of the hard coat layer. More preferred are nanoparticles in the range of 10 nm to 60 nm. Thus, if the mode particle size of the nanoparticles is small, it is difficult for visible light to scatter, and even if the refractive index of the organic component and the nanoparticles is different, the haze of the hard coat layer is greatly increased. Is suppressed.

The hard coat layer may contain coarse particles having a particle size larger than that of the nanoparticles for the purpose of controlling surface irregularities and optical properties in addition to or in place of the nanoparticles. Although the mode particle diameter of the coarse particles needs to consider the relationship with the thickness of the hard coat layer, it is preferably in the range of 0.5 μm to 3.0 μm, and preferably 1.0 μm to 2.5 μm. Is more preferably 1.5 μm to 2.0 μm.

In addition to the organic component, inorganic component and coarse particles, various additives can be added to the hard coat layer forming material. Examples of the additive include a polymerization initiator for curing an organic component to form a hard coat layer, a leveling agent, a pigment, a filler, a dispersant, a plasticizer, an ultraviolet absorber, a surfactant, and an antioxidant. , Thixotropic agents and the like can be used. The material for forming the hard coat layer can appropriately contain a solvent.

(2-3-3) Intermediate Layer 23: Crack Prevention Layer As the crack prevention layer, for example, those described as a cured resin layer in JP-A-2017-224269 can be used. Even when the thickness of the transparent base film is large, the crack preventing layer can prevent cracks in the transparent conductive layer and exhibit the desired electrical characteristics.

The thickness of the crack prevention layer is not particularly limited, but is 150 nm or less, preferably about 20 to 100 nm, from the viewpoints of heat and humidity resistance, the effect of preventing oligomer generation from the transparent resin film 1 and optical characteristics. More preferably, the thickness is 30 to 50 nm. When two or more crack prevention layers 2 are provided, the thickness of each layer is about 20 to 60 nm, preferably 25 to 55 nm.

As the crack preventing layer, for example, a crack preventing layer obtained by curing a resin composition containing an epoxy resin having a weight average molecular weight of 1500 or more can be used. The epoxy resin is preferably a rubber-modified epoxy resin. Thereby, toughness and impact resistance can be suitably imparted to the crack prevention layer. The rubber component for modifying the epoxy resin is not particularly limited. Butadiene rubber, acrylonitrile butadiene rubber, styrene butadiene rubber, butyl rubber, nitrile rubber, natural rubber, isoprene rubber, chloroprene rubber, ethylene-propylene rubber, urethane rubber, silicone Examples thereof include rubber, fluororubber, ethylene-vinyl acetate rubber, epichlorohydrin rubber and the like. Of these, butadiene rubber is preferable in terms of toughness and chemical resistance. The rubber-modified epoxy resin may be used alone or in combination of two or more.

The resin composition preferably contains a curing accelerator. Thereby, the hardening reaction of an epoxy resin can be advanced rapidly and fully, and a hardened | cured material film | membrane with high film | membrane intensity | strength can be formed. The curing accelerator is not particularly limited, and examples thereof include organic metal salts of organic acids such as octanoic acid, stearic acid, acetylacetonate, naphthenic acid and salicylic acid, such as zinc, copper, iron and antimony; metal chelates and the like. . Especially, it is preferable that a hardening accelerator contains antimony. The antimony-containing curing accelerator can rapidly and sufficiently advance the curing reaction of the resin composition and can efficiently form a stronger cured product film. In addition, a hardening accelerator can be used individually or in combination of 2 or more types.

The content of the curing accelerator is not particularly limited, but is preferably 0.005 to 5 parts by weight, more preferably 0 with respect to the total amount (100 parts by weight) of the epoxy group-containing compound contained in the resin composition. 0.01 to 4 parts by weight, more preferably 0.01 to 1 part by weight. If the content of the curing accelerator is below the lower limit, the curing acceleration effect may be insufficient.

In addition to the epoxy resin, an acrylic resin, a urethane resin, an amide resin, a silicone resin, or the like may be appropriately added to the resin composition. Furthermore, various additives can also be added to the resin composition. As the additive, for example, a leveling agent, a pigment, a filler, a dispersant, a plasticizer, an ultraviolet absorber, a surfactant, an antioxidant, a thixotropic agent, and the like can be used.

(2-3-4) Intermediate layer 23: Easy adhesive layer Examples of the base polymer that forms the easy adhesive layer include, for example, a polyester skeleton, a polyether skeleton, a polycarbonate skeleton, a polyurethane skeleton, a silicone-based, a polyamide skeleton, and a polyimide skeleton. Various resins having a polyvinyl alcohol skeleton or the like can be used. These polymer resins can be used alone or in combination of two or more.

In forming the easy-adhesion layer, an additive may be added to the base polymer. Specifically, a stabilizer such as a tackifier, an ultraviolet absorber, and a heat stabilizer may be used. The film thickness of the easy adhesion layer is preferably 0.01 to 20 μm.

(2-4) Anti-blocking layer 24
The anti-blocking layer is a cured product layer of a resin composition containing a binder resin (base polymer) and particles, and has a flat portion and a raised portion on the surface, thereby providing a high level of handling properties and low reflection characteristics. Can demonstrate. The thickness of the flat part of the anti-blocking layer is not particularly limited, but is preferably 200 nm or more and 30 μm or less, more preferably 500 nm or more and 10 μm or less, and further preferably 800 nm or more and 5 μm or less.

The mode particle diameter of the particles can be appropriately set in consideration of the relationship between the size of the protruding portion of the outermost surface layer and the thickness of the flat portion of the anti-blocking layer, and is not particularly limited. From the viewpoint of sufficiently imparting blocking resistance to the transparent conductive film and sufficiently suppressing light scattering and the like, the mode particle diameter of the particles is preferably 500 nm to 30 μm, and more preferably 800 nm to 20 μm. It is more preferable that it is 1 μm or more and 10 μm or less. In the present specification, the “mode particle diameter” means a particle diameter showing the maximum value of the particle distribution, using a flow type particle image analyzer (product name “FPIA-3000S” manufactured by Sysmex). , By measuring under predetermined conditions (Sheath solution: ethyl acetate, measurement mode: HPF measurement, measurement method: total count). The measurement sample is prepared by diluting the particles to 1.0% by weight with ethyl acetate and uniformly dispersing the particles using an ultrasonic cleaner.

The height of the raised part is set in consideration of the required slipping property. The height of the protruding portion, that is, the portion protruding upward from the flat portion of the anti-blocking layer can be controlled by the thickness of the flat portion of the anti-blocking layer, the mode particle diameter of the particles, and the like. The height of the raised portion is preferably 100 nm or more and 3 μm or less, more preferably 200 nm or more and 2 μm or less, and further preferably 300 nm or more and 1.5 μm or less. By setting the height of the raised portion within the above range, it is possible to satisfy the blocking resistance of the transparent conductive film and to sufficiently suppress light scattering and depolarization.

The particles may be either polydisperse particles or monodisperse particles, but monodisperse particles are preferred in view of ease of providing the raised portions and light scattering prevention. In the case of monodisperse particles, the particle size and mode particle size can be regarded as substantially the same.

The content of the particles in the anti-blocking layer is preferably 0.01 to 5 parts by weight, more preferably 0.02 to 1 part by weight with respect to 100 parts by weight of the solid content of the resin composition. More preferably, it is 0.05 to 0.5 parts by weight.

As the binder resin in the resin composition for forming the anti-blocking layer, it is possible to disperse particles, and it is possible to use a transparent material having sufficient strength and transparency as a film after the anti-blocking layer is formed. Examples of binder resins to be used include thermosetting resins, thermoplastic resins, ultraviolet curable resins, electron beam curable resins, and two-component mixed resins. Among these, curing treatment by ultraviolet irradiation is simple. An ultraviolet curable resin capable of efficiently forming a film by a simple processing operation is preferable.

Examples of the ultraviolet curable resin include polyesters, acrylics, urethanes, amides, silicones, epoxies, and the like, and ultraviolet curable monomers, oligomers, polymers, and the like are included. Examples of the ultraviolet curable resin preferably used include those having an ultraviolet polymerizable functional group, and among them, those containing an acrylic monomer or oligomer component having 2 or more, particularly 3 to 6 functional groups. Further, an ultraviolet polymerization initiator is blended in the ultraviolet curable resin.

In addition to the above materials, additives such as leveling agents, thixotropic agents, antistatic agents, plasticizers, surfactants, antioxidants, curing catalysts, and ultraviolet absorbers can be used for the resin composition. When a thixotropic agent is used, the content of these additives, which is advantageous for the formation of protruding particles on the surface with fine irregularities, is usually about 15 parts by weight or less, preferably about 0.1 parts by weight with respect to 100 parts by weight of the ultraviolet curable resin. It is preferable that the content be 01 to 15 parts by weight. The resin composition forming the anti-blocking layer can appropriately contain a solvent.

As the particles contained in the anti-blocking layer 2, those having transparency such as various metal oxides, glass, and plastic can be used without particular limitation. For example, inorganic particles such as silica, alumina, titania, zirconia, calcium oxide, cross-linked or unpolymerized polymers such as polymethyl methacrylate, polystyrene, polyurethane, acrylic resin, acrylic-styrene copolymer, benzoguanamine, melamine, and polycarbonate. Examples include crosslinked organic particles and silicone particles. The particles can be used by appropriately selecting one type or two or more types, but organic particles are preferable. The organic particles are preferably acrylic resins from the viewpoint of refractive index.

Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. In addition, all parts and% in each example are based on weight unless otherwise specified.

Below, the apparatus and measurement conditions used when measuring the physical property of the obtained compound are as follows.
(GC-MS) Gas chromatograph mass spectrometer GCMS-QP2010Plus (EI method) manufactured by Shimadzu Corporation
(LC / MS) Shimadzu Corporation high performance liquid chromatograph mass spectrometer LCMS-2010EV (ESI method)

<Production Example 1>
Synthesis of Compound IM3, Compound IM5, and Compound IM6 Compound IM3 was synthesized by the following method. The reaction formula is shown below.

(Synthesis of Compound IM2)
In the synthesis of 2-dimethylamino-4-hydroxy-6-methylpyrimidine described in Journal of American Chemical Society 1954, 76, 1879, a 1 L four-necked flask equipped with a condenser and a thermometer was used. Compound IM1 was obtained in the same manner except that guanidine sulfate was replaced with 1,1-dibutylguanidine hydrochloride obtained in the same manner as described in BE69386. Compound IM2 (18.4 g, yield 69%) was obtained by formylation by the Reimer-Tiemann reaction using Compound IM1 in the same manner as described in Journal of the Chemical Society 1957, 4845. It was.
GC-MS: m / z = 265 ([M] ⁺ )

(Synthesis of Compound IM3)
In a 100 mL four-necked flask equipped with a condenser and a thermometer, compound IM2 (15.8 g), ethyl iodide (14 g) (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium carbonate (14 g), dimethylformamide (DMF) (60 mL) was stirred at 70 ° C. for 3 hours, and then allowed to cool to room temperature. The reaction solution was discharged into water (300 mL) and extracted with toluene (300 mL). The organic layer was concentrated under reduced pressure to obtain Compound IM3 (17.3 g, yield 99%).
GC-MS: m / z = 293 ([M] ⁺ )

Compound IM5 and Compound IM6 were synthesized by the following method. The reaction formula is shown below. The compound in which p is 5 in the following formula is Compound IM5, and the compound in which p is 6 is Compound IM6.

(Synthesis of Compound IM5)
In a 50 mL four-necked flask equipped with a condenser and a thermometer, Compound IM2 (2.7 g), 1,5-dibromopentane (1.1 g) (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium carbonate (1.7 g) ) And DMF (20 mL) were added, and the mixture was stirred at 80 ° C. for 2.5 hours. The reaction solution was discharged into water, and the precipitated crystals were filtered out. The crystals were washed with methanol to obtain 2.1 g of Compound IM5 (yield 71%).

(Synthesis of Compound IM6)
Compound IM6 was obtained in the same procedure except that 1,5-dibromopentane in the synthesis of compound IM5 was replaced with 1,6-dibromohexane (manufactured by Tokyo Chemical Industry Co., Ltd.) (yield 82%).

<Production Example 2>
Compounds C1 to C5 were synthesized. Compound C1 is a compound represented by the following formula.

Compounds C2 to C4 are compounds represented by the following formula. In the compound C2, R in the following formula is a 2,6-di-t-butyl-4-methylcyclohexyl group. In the compound C3, R in the following formula is a 4-t-butylcyclohexyl group. In the compound C4, R in the following formula is a t-butyl group.

Compound C5 is a compound represented by the following formula.

The reaction formula for obtaining the compounds C1 to C4 is shown below. Table 1 shows p and the corresponding compounds in the formula. The structures of Compound IM12, Compound IM13, and Compound IM14 used for the synthesis are shown below.

(Synthesis of Compound C1)
In a 50 mL four-necked flask equipped with a condenser and a thermometer, compound IM6 (2.0 g), compound IM12 (2.0 g) synthesized in the same manner as described in JP 2000-310841 A, piperidine (0.06 g) and ethanol (13 mL) were mixed and stirred at 75 ° C. for 18 hours. The mixture was allowed to cool to room temperature, and the precipitated crystals were filtered out and washed with ethanol to obtain Compound C1 (3.5 g, yield 93%).
LC-MS: m / z = 1164 ([M + H] ⁺ )

(Synthesis of Compound C2)
Compound C2 was obtained in the same procedure except that Compound IM6 in the synthesis of Compound C1 was replaced with Compound IM5 (yield 81%).
LC-MS: m / z 1150 ([M + H] ⁺ )

(Synthesis of Compound C3)
Compound C3 was obtained in the same procedure except that Compound IM6 in the synthesis of Compound C1 was replaced with Compound IM5 and Compound IM12 was replaced with Compound IM13 obtained in the same manner as the synthesis of Compound IM12 (yield 61%) .
LC-MS: m / z = 1010 ([M + H] ⁺ )

(Synthesis of Compound C4)
Compound C4 was obtained in the same procedure except that Compound IM6 in the synthesis of Compound C1 was replaced with Compound IM5 and Compound IM12 was replaced with Compound IM14 (manufactured by Tokyo Chemical Industry Co., Ltd.) (yield 80%).
LC-MS: m / z = 846 ([M + H] ⁺ )

(Synthesis of Compound C5)
In a 25 mL four-necked flask equipped with a condenser and a thermometer, a mixture of compound IM3 (1.2 g), IM12 (1.5 g), piperidine (0.02 g), and ethanol (4 mL) was mixed at 75 ° C. with 1 Stir for hours. The mixture was allowed to cool to room temperature, and the precipitated crystals were filtered out. The obtained crystals were washed with ethanol to obtain 1.9 g of Compound C5 (yield 80%). The reaction formula is shown below.
LC-MS: m / z = 569 ([M + H] ⁺ )

(Synthesis of Comparative Compound Z1)
Comparative Example Compound Z1 was obtained in the same manner as described in JP2011-184414A.

(Synthesis of Comparative Compound Z2)
Comparative Example Compound Z2 was obtained in the same manner as described in JP-A-2014-194508.

(Synthesis of Comparative Compound Z3)

Comparative Example Compound Z3 was obtained in the same manner as described in JP-A-2009-069773.
(Synthesis of Comparative Compound Z4)
Comparative Example Z4 was obtained in the same manner as in the method described in US2986528.

The following evaluation was performed about the compound obtained by each manufacture example. The results are shown in Table 2.
<Spectral characteristic test>
The absorption spectrum of each compound in chloroform was measured, the absorption maximum wavelength (λmax) and the Gram extinction coefficient at 400 nm were measured and evaluated according to the following criteria.
Measuring instrument: UV-Vis spectrophotometer V-560 manufactured by JASCO Corporation
A: Gram extinction coefficient of 30 or more B: Gram extinction coefficient of 20 or more and less than 30 C: Gram extinction coefficient of 10 or more and less than 20 D: Gram extinction coefficient of less than 10

<Light resistance test>
A light resistance test was performed on some of the compounds obtained in Production Examples and Comparative Production Examples. 10 mg of each compound was melted in 5 mL of a polymethacrylate 8 wt% toluene solution, applied onto a glass substrate by a spin coat method, and dried to prepare a thin film having a thickness of 1.5 μm.
The prepared thin film was continuously irradiated with light from a xenon lamp (142 klux) for 96 hours, the transmittance of the thin film before and after irradiation (0 hour) was measured with a spectrophotometer, and the dye remaining according to the following formula (1) The rate was measured.
Dye residual ratio (%) = {(1-T ₁ ) / (1-T ₀ )} × 100 (1)
[However, _{T 0} is transmittance before xenon lamp irradiation, _{T 1} is the transmittance after xenon lamp irradiation, _{T 0} and _{T 1} is 0-1. ]
“Transmittance” represents the transmittance of each compound at the absorption maximum wavelength, and the higher the dye residual ratio, the less the compound is decomposed by light and the higher the light resistance.
Light resistance was evaluated according to the following criteria.
A: Dye remaining ratio is 65% or more B: Dye remaining ratio is 40% or more and less than 65% C: Dye remaining ratio is 10% or more and less than 40% D: Dye remaining ratio is less than 10%

<Heat resistance>
For some of the compounds obtained in the production examples and comparative production examples, the weight loss due to thermal decomposition was measured under the following measurement conditions using a thermogravimetry apparatus TGA-50 manufactured by Shimadzu Corporation. The temperature reduced by 1% was measured as the decomposition start temperature.
(Measurement condition)
The measurement was performed under the conditions of a sample amount of 5 mg, a heating rate of 10 ° C./min (maximum temperature reached 400 ° C.), and a flow rate of 10 mL / min in a nitrogen atmosphere.
The heat resistance was evaluated from the decomposition start temperature according to the following criteria.
A: 250 ° C. or higher B: 210 ° C. or higher and lower than 250 ° C. C: less than 210 ° C.

<Solubility test>
About the compound obtained by the manufacture example, and the one part compound obtained by the comparative manufacture example, the solubility (weight%) with respect to toluene, methyl ethyl ketone (MEK), and propylene glycol monomethyl ether acetate (PGMEA) in 20 degreeC, respectively was performed with the following method. It was measured.
Each compound was weighed into a glass test tube, mixed with a solvent, stirred and dissolved at 20 ° C., and the state of the solution was visually observed to evaluate the soluble weight concentration.
A: Dissolves 3% by weight or more B: Dissolves 1% by weight or more and less than 3% by weight C: Dissolves less than 1% by weight

From the above results, it was found that the compounds C1 to C5 produced in each production example had an absorption maximum wavelength near 400 nm and a high gram extinction coefficient at 400 nm. These compounds can effectively absorb light around 400 nm. Compounds C1 to C5 had good solubility in organic solvents. These compounds also had good durability. For example, the compounds C1 and C2 are excellent in light resistance, solubility, and heat resistance.

Production Example 3 (Preparation of acrylic pressure-sensitive adhesive composition (a))
Photopolymerization started on a monomer mixture composed of 76 parts by weight of 2-ethylhexyl acrylate (2EHA), 18 parts by weight of N-vinyl-2-pyrrolidone (NVP), and 16 parts by weight of 2-hydroxyethyl acrylate (HEA). As an agent, 0.035 parts by weight of 1-hydroxycyclohexyl phenyl ketone (trade name: Irgacure 184, having an absorption band at a wavelength of 200 to 370 nm, manufactured by BASF), 2,2-dimethoxy-1,2-diphenylethane-1 -ON (trade name: Irgacure 651, having an absorption band at a wavelength of 200 to 380 nm, manufactured by BASF) 0.035 parts by weight and then viscosity (measurement conditions: BH viscometer No. 5 rotor, 10 rpm, measurement temperature) (30 ° C) is irradiated with ultraviolet rays until it reaches about 20 Pa · s, and a part of the monomer component is polymerized. A repolymer composition (polymerization rate: 9%) was obtained. Next, 0.080 parts by weight of hexanediol diacrylate (HDDA) and 0.3 parts by weight of a silane coupling agent (trade name: KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.) are added to the prepolymer composition. And mixed to obtain an acrylic pressure-sensitive adhesive composition (a).

(Production of pressure-sensitive adhesive composition (A1))
With respect to the acrylic pressure-sensitive adhesive composition (a) obtained in Production Example 3 (the monomer component forming the acrylic polymer is 100 parts by weight), it was dissolved in butyl acrylate so as to have a solid content of 15%. 2,4-Bis-[{4- (4-ethylhexyloxy) -4-hydroxy} -phenyl] -6- (4-methoxyphenyl) -1,3,5-triazine (trade name: Tinosorb S, Table 3) “UV absorber (b1)”, absorption maximum wavelength of absorption spectrum: 346 nm, manufactured by BASF Japan Ltd.) 0.8 parts by weight (solid content weight) and bis (2,4,6-trimethylbenzoyl) -phenyl Phosphine oxide (trade name: Irgacure 819, having an absorption band at a wavelength of 200 to 450 nm, manufactured by BASF Japan Ltd.) 0.3 parts by weight was added and stirred to add viscosity. Agent to give the composition a (A1).

(Manufacture of adhesive layer (A1))
The pressure-sensitive adhesive composition (A1) is applied on the release film of the release film so that the thickness after forming the pressure-sensitive adhesive layer is 100 μm, and then on the surface of the pressure-sensitive adhesive composition layer. The release film was bonded together. Thereafter, the pressure-sensitive adhesive composition layer was photocured by irradiating with ultraviolet rays under the conditions of illuminance: 6.5 mW / cm ² , light amount: 2000 mJ / cm ² , and peak wavelength: 350 nm to form a pressure-sensitive adhesive layer (A1). . The addition amount of the ultraviolet absorber was 0.8% by weight with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (A1).

Production Example 4
(Production of pressure-sensitive adhesive composition (B1))
In a separable flask equipped with a thermometer, a stirrer, a reflux condenser and a nitrogen gas introduction tube, 95 parts by weight of butyl acrylate, 5 parts by weight of acrylic acid, 0.2 part by weight of azobisisobutyronitrile as a polymerization initiator, and After 233 parts by weight of ethyl acetate was added, nitrogen gas was passed, and nitrogen substitution was performed for about 1 hour while stirring. Thereafter, the flask was heated to 60 ° C. and reacted for 7 hours to obtain an acrylic polymer having a weight average molecular weight (Mw) of 1.1 million. To the acrylic polymer solution (with a solid content of 100 parts by weight), 0.8 parts by weight of trimethylolpropane tolylene diisocyanate (trade name: Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.) as an isocyanate crosslinking agent, A pressure-sensitive adhesive composition (solution) was prepared by adding 0.1 part by weight of a silane coupling agent (trade name: KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.).

(Manufacture of adhesive layer (B1))
The pressure-sensitive adhesive composition (B1: solution) was applied on a 38 μm-thick separator (polyethylene terephthalate film having a release treatment on the surface: release film) so that the thickness after drying was 15 μm, The solvent was removed by drying at 100 ° C. for 3 minutes to obtain an adhesive layer. Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B1)”. In addition, another release film was bonded to the exposed surface of the pressure-sensitive adhesive layer.

Production Example 5
(Manufacture of adhesive layer (B2))
In the production of the pressure-sensitive adhesive layer (B1) of Production Example 4, a pressure-sensitive adhesive layer was formed in the same manner as in Production Example 4 except that the thickness after drying was 20 μm. Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B2)”.

Example 1
(Production of pressure-sensitive adhesive composition (A1-1))
In the production of the pressure-sensitive adhesive composition (A1) of Production Example 3, the addition amount of bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide (trade name: Irgacure 819, manufactured by BASF Japan) was 0.6. In addition to the parts by weight, 0.48 parts by weight (solid content weight) of the dye compound (C5) “absorption maximum wavelength of absorption spectrum: 394 nm, full width at half maximum of 48.5 nm” obtained in Production Example 2 was directly added and stirred. Except for this, a pressure-sensitive adhesive composition (A1-1) was obtained in the same manner as in Production Example 3.

(Manufacture of adhesive layer (A1-1))
Adhesive in the same manner as in Production Example 1 except that the pressure-sensitive adhesive composition (A1-1) was coated on the release-treated film so that the thickness after forming the pressure-sensitive adhesive layer was 100 μm. An agent layer (A1-1) was formed. The addition amount of the UV absorber is 0.8% by weight and the addition amount of the dye compound (C5) is 0.48 with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (A1-1). % By weight.

Example 2
(Production of pressure-sensitive adhesive composition (A1-2))
In the production of the pressure-sensitive adhesive composition (A1) of Production Example 3, the ultraviolet absorber was 2- (2H-benzotriazol-2-yl) -6- (1-methyl-1-phenylethyl) -4- (1 , 1,3,3-tetramethylbutyl) phenol (trade name: Tinuvin 928, “UV absorber b2” in Table 3, absorption maximum wavelength of absorption spectrum: 349 nm, manufactured by BASF Japan Ltd.) 1.0 part by weight ( The amount of bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide (trade name: Irgacure 819, manufactured by BASF Japan) was changed to 0.6 parts by weight. A pressure-sensitive adhesive composition (A1-2) was obtained in the same manner as in Production Example 3, except that 0.5 part by weight (solid content weight) of the dye compound (C5) obtained in 2 was directly added and stirred.

(Manufacture of adhesive layer (A1-2))
Adhesive in the same manner as in Production Example 1 except that the pressure-sensitive adhesive composition (A1-2) was coated on the release-treated film so that the thickness after forming the pressure-sensitive adhesive layer was 175 μm. An agent layer (A1-2) was formed. The addition amount of the UV absorber is 1.0% by weight and the addition amount of the dye compound (C5) is 0.50 with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (A1-2). % By weight.

Example 3
(Production of pressure-sensitive adhesive composition (B1-1))
In the production of the pressure-sensitive adhesive composition (B1) of Production Example 4, the acrylic polymer solution (with a solid content of 100 parts by weight) was combined with an isocyanate crosslinking agent and a silane coupling agent, 2 ′, 4,4′-tetrahydroxybenzophenone (trade name: Seesorb 106, “UV absorber b3” in Table 3, absorption maximum wavelength of absorption spectrum: 348 nm, manufactured by Sipro Kasei Co., Ltd.) 3.0 parts by weight ( Except that the pigment compound (C1) “absorption maximum wavelength: 393 nm, full width at half maximum 49.5 nm)” 3.0 parts by weight (solid content weight) obtained in Production Example 2 was added. A pressure-sensitive adhesive composition (solution) was prepared in the same manner as in Production Example 4.

(Manufacture of adhesive layer (B1-1))
The pressure-sensitive adhesive composition (B1-1: solution) was applied on a 38 μm-thick separator (polyethylene terephthalate film whose surface was peeled) so that the thickness after drying was 15 μm, and 100 ° C. And dried for 3 minutes to remove the solvent to obtain a pressure-sensitive adhesive layer. Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B1-1)”. The added amount of the UV absorber is 3.0% by weight and the added amount of the dye compound (C1) is 3.0% with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (B1-1). % By weight.

Example 4
(Production of pressure-sensitive adhesive composition (B1-2))
In the production of the pressure-sensitive adhesive composition (B1-1) of Example 3, instead of the dye compound (C1) obtained in Production Example 2, the dye compound (C2) “absorption of absorption spectrum” obtained in Production Example 2 was used. A pressure-sensitive adhesive composition (solution) was prepared in the same manner as in Example 3 except that 3.0 parts by weight (solid content weight) of a maximum wavelength of 393 nm and a full width at half maximum of 49.5 nm were used.

(Manufacture of adhesive layer (B1-2))
Moreover, the adhesive layer was formed like Example 3 except the thickness after drying having been 20 micrometers using the said adhesive composition (solution). Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B1-2)”. The addition amount of the UV absorber is 3.0% by weight and the addition amount of the dye compound (C2) is 3.0% with respect to the acrylic polymer weight (100% by weight) in the adhesive layer (B1-2). % By weight.

Example 5
(Production of pressure-sensitive adhesive composition (B1-3))
A pressure-sensitive adhesive composition (solution) was prepared in the same manner as in Example 3 except that the ultraviolet absorber (b3) was not added in the production of the pressure-sensitive adhesive composition (B1-1) of Example 3.

(Manufacture of adhesive layer (B1-3))
Moreover, the adhesive layer was formed like Example 3 except the thickness after drying having been 20 micrometers using the said adhesive composition (solution). Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B2-2)”. The amount of the dye compound (C2) added was 3.0% by weight relative to the weight of the acrylic polymer (100% by weight) in the pressure-sensitive adhesive layer (B1-3).

Comparative Example 2
(Production of pressure-sensitive adhesive composition (A1-3))
In the production of the pressure-sensitive adhesive composition (A1-1) of Example 1, the amount of the ultraviolet absorber b1 used was changed to 1.0 part by weight, and instead of the pigment compound (C5) obtained in Production Example 2, a pigment was used. Compound (C6) (“BONASORB UA3911”, absorption maximum wavelength of absorption spectrum in chloroform solvent: 395 nm, full width at half maximum of 48 nm, manufactured by Orient Kogyo Co., Ltd.) 0.45 parts by weight of N-vinyl-2-pyrrolidone (NVP) A pressure-sensitive adhesive composition was prepared in the same manner as in Example 1 except that it was dissolved and added so as to be 6% by weight.

(Manufacture of adhesive layer (A1-3))
Further, using the pressure-sensitive adhesive composition, a pressure-sensitive adhesive layer (A1-3) was formed in the same manner as in Example 1.
The addition amount of the UV absorber is 1.0% by weight and the addition amount of the dye compound (C6) is 0.45% with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (A1-3). % By weight.

Comparative Example 3
(Production of pressure-sensitive adhesive composition (B1-4))
In the production of the pressure-sensitive adhesive composition (B1-1) of Example 3, the amount of the ultraviolet absorber b3 was changed to 2.0 parts by weight, and instead of the dye compound (C1) obtained in Production Example 2, Dye compound (C6) ("BONASORB UA3911", absorption maximum wavelength of absorption spectrum in chloroform solvent: 395 nm, full width at half maximum 48 nm, manufactured by Orient Kogyo Co., Ltd.) 2.5 parts by weight in N, N-dimethylformamide A pressure-sensitive adhesive composition was prepared in the same manner as in Example 3 except that the composition was dissolved and added so that the drying temperature was 100 ° C. for 3 minutes and 155 ° C. for 5 minutes.

(Manufacture of adhesive layer (B1-4))
Moreover, the adhesive layer was formed like Example 3 except the thickness after drying having been 20 micrometers using the said adhesive composition (solution). Then, the crosslinking process was performed by heating at 50 degreeC for 48 hours. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B1-4)”. The addition amount of the UV absorber is 2.0% by weight and the addition amount of the dye compound (C6) is 2.5% with respect to the acrylic polymer weight (100% by weight) in the pressure-sensitive adhesive layer (B1-4). % By weight.

(Evaluation)
The pressure-sensitive adhesive layers obtained in Examples 1 to 5 and Comparative Examples 2 to 3 were evaluated as follows. The results are shown in Tables 3 and 4. In Comparative Example 1, evaluation was performed using the pressure-sensitive adhesive layer (A1) obtained in Production Example 3.

<Measurement of transmittance and hue: initial values>
The release film of the pressure-sensitive adhesive layer obtained in the examples and comparative examples was peeled off, and a slide glass (trade name: white polishing No. 1, thickness: 0.8 to 1.0 mm, total light transmittance: 92 %, Haze: 0.2%, Matsunami Glass Industrial Co., Ltd.). Further, the other release film was peeled off, the same slide glass was bonded, and after autoclave treatment (50 ° C., 0.5 MPa, 15 minutes), a test piece having a layer configuration of slide glass / adhesive layer / slide glass Was made. The prepared test piece was measured with a spectrophotometer (product name: U4100, manufactured by Hitachi High-Technologies Corporation). The transmittance in the wavelength range of 350 nm to 780 nm (measured values of 380 nm, 400 nm, 420 nm, and 440 nm are shown in Table 3), and the transmission Y value and transmission hue (L ^* , a ^* , b ^* ) are D65. Hue was measured with a light source and a field of view of 2 degrees.

<Reliability evaluation>
The test piece subjected to the initial measurement by the above-described method was put in an oven at 85 ° C. and 85% RH for 500 hours to perform a heat resistance test. Similarly, a test piece was placed in an ultraviolet fade tester (device name; ultraviolet fademeter tester U48, manufactured by Suga Test Instruments Co., Ltd.), and a light resistance test was performed by continuously irradiating for 100 hours. The test piece after the test was measured for the transmission Y value and the transmission hue (L ^* , a ^* , b ^* ) in the same manner as the initial measurement. The Y value change ΔY and the hue change ΔE ^* before and after the test were calculated, and the case of ΔY ≦ 0.3 and ΔE ^* ≦ 1.0 was accepted (OK), and the others were rejected (NG).

<Adhesiveness>
A sheet piece having a length of 100 mm and a width of 20 mm was cut out from the pressure-sensitive adhesive layer obtained in Examples and Comparative Examples. Next, one release film of the pressure-sensitive adhesive layer was peeled off, and a PET film (trade name: Lumirror S-10, thickness: 25 μm, manufactured by Toray Industries, Inc.) was attached (backed). Next, the other release film is peeled off, and a glass plate (trade name: soda lime glass # 0050, manufactured by Matsunami Glass Industry Co., Ltd.) is used as a test plate, and is crimped with a 2 kg roller and one reciprocating pressure condition. A sample composed of a test plate / adhesive layer / PET film was prepared. The obtained sample was autoclaved (50 ° C., 0.5 MPa, 15 minutes), and then 23 ° C., 50% R.D. H. And allowed to cool for 30 minutes. After allowing to cool, a tensile tester (device name: Autograph AG-IS, manufactured by Shimadzu Corporation) was used, and the temperature was 23 ° C. and 50% R.D. according to JIS Z0237. H. Under the above conditions, the pressure-sensitive adhesive sheet (pressure-sensitive adhesive layer / PET film) was peeled off from the test plate under the conditions of a tensile speed of 300 mm / min and a peeling angle of 180 °, and the 180 ° peel-off adhesive strength (N / 20 mm) was measured.

<Total light transmittance, haze>
One release film was peeled off from the pressure-sensitive adhesive layers obtained in Examples and Comparative Examples, and a slide glass (trade name: white polishing No. 1, thickness: 0.8 to 1.0 mm, total light transmission) Rate: 92%, haze: 0.2%, manufactured by Matsunami Glass Industrial Co., Ltd.). Further, the other release film was peeled off to prepare a test piece having a layer structure of pressure-sensitive adhesive layer (A) / slide glass. The total light transmittance and haze value in the visible light region of the test piece were measured using a haze meter (device name: HM-150, manufactured by Murakami Color Research Laboratory).

Hereinafter, a polarizing film with an adhesive layer was produced and evaluated.

(Cycloolefin polymer film (G))
A cycloolefin polymer film (trade name: ZEONOR FILM, manufactured by Nippon Zeon Co., Ltd.) having a thickness of 25 μm was used.

(Manufacture of polarizer (P1))
A polarizer made of a stretched polyvinyl alcohol film having a thickness of 5 μm impregnated with iodine was used. The single transmittance Y value of the polarizer (or the polarizing film with the protective film bonded) was 42.4%, and the degree of polarization was 99.995.

(Acrylic resin film (E))
Resin pellets consisting of 100 parts by weight of imidized MS resin described in Production Example 1 of JP 2010-284840 A are dried at 100.5 kPa at 100 ° C. for 12 hours, and a die temperature of 270 ° C. in a single screw extruder. And extruded from a T-die to form a film (thickness 80 μm). Further, the film is stretched in an atmosphere of 150 ° C. in the transport direction (thickness 40 μm), and then stretched in an atmosphere of 150 ° C. in a direction orthogonal to the film transport direction, and an acrylic resin film having a thickness of 20 μm. Got.

(Phase difference film (H))
A polycarbonate film having a thickness of 56 μm (“NRF” manufactured by Nitto Denko Corporation, in-plane retardation Re (550): 135 nm) was used.

Comparative Example 4
Adhesive layer (A1) / cycloolefin polymer film (G) / polarizer (P1) / acrylic resin film (E) / adhesive layer (B1: interlayer adhesive layer) / retardation film (H) / adhesive The polarizing film with an adhesive layer which has a structure of a layer (B2) was produced.
The pressure-sensitive adhesive layer (A1) used was manufactured in Production Example 3.
The pressure-sensitive adhesive layer (B1) used was manufactured in Production Example 4.
The pressure-sensitive adhesive layer (B2) used was manufactured in Production Example 5.
In producing the polarizing film with the pressure-sensitive adhesive layer, the films were bonded together via the pressure-sensitive adhesive layers. The cycloolefin polymer film (G) and the acrylic resin film (E) on both sides of the polarizer (P1) were bonded using a polyvinyl alcohol adhesive.
The obtained polarizing film with an adhesive layer can be used as an optical laminate used for an organic EL display device, and the adhesive layer (A1) corresponds to the viewing side, and the adhesive layer (B2) corresponds to the organic EL panel side. To do.

Example 6
In Comparative Example 4, the pressure-sensitive adhesive layer (A1-1) was obtained in the same manner as in Comparative Example 4 except that the pressure-sensitive adhesive layer (A1-1) produced in Example 1 was used instead of the pressure-sensitive adhesive layer (A1). ) / Cycloolefin polymer film (G) / polarizer / acrylic resin film (E) / adhesive layer (B1) / retardation film (H) / adhesive layer (B2) polarized light with an adhesive layer A film was prepared.

Example 7
In Comparative Example 4, in the same manner as in Comparative Example 4 except that the adhesive layer (B1-2) produced in Example 4 was used instead of the adhesive layer (B2), the adhesive layer (A1) / Polarized light with pressure-sensitive adhesive layer having the structure of cycloolefin polymer film (G) / polarizer / acrylic resin film (E) / pressure-sensitive adhesive layer (B1) / retardation film (H) / pressure-sensitive adhesive layer (B1-2) A film was prepared.

Example 8
In Comparative Example 4, the pressure-sensitive adhesive layer (A1-1) produced in Example 1 was used instead of the pressure-sensitive adhesive layer (A1), and the protection with a surface treatment layer was used instead of the cycloolefin polymer film (G). Adhesive layer (A1-1) / Protective film with surface treatment layer (D-1) / Polarizer (P1) / Acrylic resin as in Comparative Example 4 except that the film (D-1) was used A polarizing film with a pressure-sensitive adhesive layer having a configuration of film (E) / pressure-sensitive adhesive layer (B1) / retardation film (H) / pressure-sensitive adhesive layer (B2) was produced.

The protective film with a surface treatment layer (D-1) is shown below. The protective film with surface treatment layer (D-1) was bonded using a polyvinyl alcohol-based adhesive so that the following base film A side was in contact with the polarizer (P1).

(Preparation of base film A)
100 parts by weight of imidized MS resin described in Production Example 1 of JP 2010-284840 A and 6,6 ′, 6 ″-(1,3,5-triazine-2,4,6-triyl) tris (3-Hexyloxy-2-methylphenol) (trade name: LA-F70, “UV absorber (b4)” in Table 1, maximum absorption wavelength of absorption spectrum: 357 nm, manufactured by ADEKA Corporation) 0.65 Weight parts were mixed at 220 ° C. with a twin-screw kneader to produce resin pellets. The obtained resin pellets were dried at 100.5 kPa and 100 ° C. for 12 hours, extruded from a T-die at a die temperature of 270 ° C. with a single screw extruder, and formed into a film (thickness: 160 μm). Further, the film is stretched in an atmosphere of 150 ° C. in the transport direction (thickness 80 μm), and then stretched in an atmosphere of 150 ° C. in a direction orthogonal to the film transport direction to form a base film A (( (Meth) acrylic resin film). The base film A thus obtained has a light transmittance of 380 nm at a wavelength of 7%, a light transmittance at a wavelength of 400 nm of 68%, a light transmittance of 420 nm of 90%, and a light transmittance of 440 nm of 91%. there were.

(Preparation of protective film with surface treatment layer (D-1))
UV curable resin containing 13 parts isocyanuric acid triacrylate, 16 parts pentaerythritol triacrylate, 62 parts dipentaerythritol hexaacrylate, and 9 parts isophorone diisocyanate polyurethane (trade name: Unidic 17-806, solid content: 80%, Solvent: butyl acetate, manufactured by DIC Corporation), 100 parts by weight of the dye compound (C2) obtained in Production Example 2, and a leveling agent (trade name: GRANDIC PC-4100, manufactured by DIC Corporation) ) 5 parts, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide (trade name: Irgacure 819, having an absorption band at a wavelength of 200 to 450 nm, manufactured by BASF Japan) as a photopolymerization initiator, 5 weight The parts so that the solids concentration is 50%. Diluted with ethyl ketone, to prepare a hard coat layer forming composition. On the obtained base film A, the said composition for hard-coat layer formation was apply | coated, the application layer was formed, and the said application layer was heated at 120 degreeC for 1 minute. The heated coating layer was irradiated with ultraviolet rays having an integrated light quantity of 2000 mJ / cm ² with a high-pressure mercury lamp in a nitrogen atmosphere to cure the coating layer to form an 8 μm hard coat layer. The obtained protective film with a surface treatment layer (D-1) has a light transmittance of 0.2%, a light transmittance of 400%, a light transmittance of 3.0%, and a light transmittance of 420 nm of 65%. %, The transmittance of light at 440 nm is 89%, and the addition amount of the dye compound (C2) is 0.5% with respect to the total weight (100% by weight) of the protective film with surface treatment layer (D-1). %Met.

Example 9
In Comparative Example 4, the acrylic resin film (E-1) shown below was used instead of the acrylic resin film (E), and the adhesive produced in Example 3 was used instead of the adhesive layer (B1). Adhesive layer (A1) / cycloolefin polymer film (G) / polarizer (P1) / acrylic resin film (E-1) in the same manner as Comparative Example 4 except that the adhesive layer (B1-1) was used. ) / Pressure-sensitive adhesive layer (B1-1) / Phase difference film (H) / Pressure-sensitive adhesive layer (B2) A polarizing film with a pressure-sensitive adhesive layer was produced.

The acrylic resin film (E-1) is shown below.

(Preparation of acrylic resin film (E-1))
100 parts by weight of imidized MS resin described in Production Example 1 of JP 2010-284840 A was dissolved in methylene chloride to prepare a 12 wt% dope solution. An acrylic resin solution was prepared by adding 1.2 parts by weight of the dye compound (C1) obtained in Production Example 2. Thereafter, the acrylic resin solution is applied onto a glass plate that has been subjected to a mold release treatment so that the thickness after drying is 40 μm, and dried at 60 ° C. for 2 minutes, and further at 100 ° C. for 3 minutes. Then, an acrylic resin film (E-1) having a thickness of 40 μm was obtained. The acrylic resin film (E-1) thus obtained has a light transmittance of 380 nm at a wavelength of 0.2%, a light transmittance at a wavelength of 400 nm of 1.2%, a light transmittance of 420 nm of 59%, The transmittance of light at 440 nm was 89%. The amount of the dye compound (C1) added was 1.2% by weight based on the weight of the base polymer (100% by weight) in the acrylic resin film (E-1).

Example 10
In Comparative Example 4, the triacetyl cellulose film (F-1) shown below was used instead of the acrylic resin film (E), and the adhesive produced in Example 4 instead of the adhesive layer (B2). Adhesive layer (A1) / cycloolefin polymer film (G) / polarizer (P1) / triacetylcellulose film (F-1) as in Comparative Example 4 except that the layer (B1-2) was used A polarizing film with a pressure-sensitive adhesive layer having a structure of: / pressure-sensitive adhesive layer (B1) / retardation film (H) / pressure-sensitive adhesive layer (B1-2) was produced.

The triacetylcellulose film (F-1) is shown below.

(Preparation of triacetyl cellulose film (F-1))
A mixed solvent prepared by adjusting 100 parts by weight of a 40 μm-thick triacetyl cellulose film (trade name: KC4UY, manufactured by Konica Minolta Co., Ltd.) having a UV absorbing ability at a weight ratio of dichloromethane: ethanol: n-butanol = 80: 15: 5. The solution was stirred and dissolved, and the solution was adjusted so that the solid content was 20% by weight. Further, 1.0 part by weight of the dye compound (C5) obtained in Production Example 2 was added to prepare a triacetylcellulose solution. . The solution is applied on a release-treated glass plate so that the thickness after drying is 20 μm, and the solvent is removed by drying at 80 ° C. for 3 minutes and then at 120 ° C. for 3 minutes to remove glass. A triacetyl cellulose film (F1) having a thickness of 20 μm was obtained by peeling from the plate. The obtained triacetylcellulose film (F-1) has a light transmittance of 0.2%, a light transmittance of 8.8 nm, a light transmittance of 8.8%, a light transmittance of 420 nm, a light transmittance of 64%, and a wavelength of 440 nm. The light transmittance was 90%. The amount of the dye compound (C5) added was 1.0% by weight relative to the weight of the base polymer (100% by weight) in the triacetylcellulose film (F-1).

Example 11
In Comparative Example 4, the pressure-sensitive adhesive layer (A1-1) produced in Example 1 was used instead of the pressure-sensitive adhesive layer (A1), and it was prepared in Example 8 instead of the cycloolefin polymer film (G). The surface-treated protective film (D-1) was used, the following cycloolefin polymer film (G-1) was used in place of the acrylic resin film (E), and the pressure-sensitive adhesive layer (B1 In the same manner as in Comparative Example 4 except that the pressure-sensitive adhesive layer (B3-1) shown below was used instead of the pressure-sensitive adhesive layer (A1-1) / protective film with surface treatment layer (D-1) A polarizing film with a pressure-sensitive adhesive layer comprising: / polarizer (P1) / cycloolefin polymer film (G-1) / pressure-sensitive adhesive layer (B3-1) / retardation film (H) / pressure-sensitive adhesive layer (B2) Produced.

The cycloolefin polymer film (G-1) and the pressure-sensitive adhesive layer (B3-1) are shown below. The protective film with surface treatment layer (D1) was bonded using a polyvinyl alcohol-based adhesive so that the base film A side was in contact with the polarizer (P1).

(Production of cycloolefin polymer film (G-1))
As a material resin, a pellet of a cycloolefin polymer (a hydrogenated product of a ring-opening polymer of a norbornene-based monomer, trade name “ZEONOR1420R”, manufactured by Nippon Zeon Co., Ltd., glass transition temperature (Tg) of 136 ° C.) is prepared. It was dried at 5 kPa and 100 ° C. for 12 hours. 1.5 parts by weight of the dye compound (C2) obtained in Production Example 2 is added to the resin weight (100 parts by weight), and a T-die type film melt extrusion is performed at a die temperature of 260 ° C. with a single screw extruder. A cycloolefin polymer resin film (G1) having a thickness of 20 μm was obtained using a molding machine. The resulting cycloolefin polymer resin film (G1) has a light transmittance of 380 nm, a light transmittance of 2.5%, a light transmittance of a wavelength of 400 nm of 18%, a light transmittance of 420 nm of 75%, and a light of 440 nm. The transmittance of was 91%. The amount of the dye compound (C2) added was 1.5% by weight based on the weight of the base polymer (100% by weight) in the cycloolefin polymer film (G-1).

(Production of pressure-sensitive adhesive composition (B3-1))
100 parts by weight of a styrene-ethylene-propylene-styrene block copolymer (SEPS, trade name: SEPTON 2063, styrene content: 13%, manufactured by Kuraray Co., Ltd.) as a rubber polymer, and hydrogenated terpene phenol as a tackifier (Product name: YS Polystar TH130, softening point: 130 ° C., hydroxyl value: 60, manufactured by Yasuhara Chemical Co., Ltd.) 40.4 parts by weight, petroleum-based tackifier (trade name: Picolastic A5, vinyltoluene-based tackifier , Softening point: 5 ° C., 61.7 parts by Eastman Kodak Co., Ltd., polybutene (trade name: HV-300, weight average molecular weight: 3000, manufactured by JX Nippon Oil & Energy Corporation) as a softening agent 21.3 parts Toluene solution (adhesive solution) formulated with a solid content of 30% by weight, and the color obtained in Production Example 2 A pressure-sensitive adhesive composition (B3-1: solution) was prepared by adding 2.0 parts by weight of elemental compound (C1).

(Manufacture of adhesive layer (B3-1))
The pressure-sensitive adhesive composition (B2-1: solution) was applied onto a 38 μm-thick separator (polyethylene terephthalate-based film whose surface was peeled) so that the thickness after drying was 15 μm, and 120 ° C. And dried for 3 minutes to remove the solvent to obtain a pressure-sensitive adhesive layer. Hereinafter, this pressure-sensitive adhesive layer is referred to as “pressure-sensitive adhesive layer (B3-1)”. The amount of the dye compound (C1) added was 2.0% by weight based on the weight of the rubber-based polymer (100% by weight) in the pressure-sensitive adhesive layer (B3-1).

Example 12
In Comparative Example 4, the retardation film (H-1) shown below was used instead of the retardation film (H), and the adhesive layer produced in Example 4 was used instead of the adhesive layer (B2). Adhesive layer (A1) / cycloolefin polymer film (G) / polarizer (P1) / acrylic resin film (E) / adhesive as in Comparative Example 4 except that (B1-2) was used A polarizing film with an adhesive layer having the structure of layer (B1) / retardation film (H-1) / adhesive layer (B1-2) was produced.

The retardation film (H-1) is shown below.

(Production of retardation film (H-1))
Isosorbide (ISB) 26.2 considerations, 9,9- [4- (2-hydroxyethoxy) phenyl] fluorene (BHEPF) 100.5 parts by weight, 1,4-cyclohexanedimethanol (1,4-CHDM) 10.7 parts by weight, 105.1 parts by weight of diphenyl carbonate (DPC), and 0.591 parts by weight of cesium carbonate (0.2% by weight aqueous solution) as a catalyst were put in a reaction vessel, respectively, under a nitrogen atmosphere, As the first step of the reaction, the temperature of the heating medium in the reaction vessel was set to 150 ° C., and the raw materials were dissolved for about 15 minutes while stirring as necessary. Next, the pressure in the reaction vessel was changed from normal pressure to 13.3 kPa, and the generated phenol was extracted out of the reaction vessel while the temperature of the heat medium in the reaction vessel was increased to 190 ° C. over 1 hour.
After holding the reaction vessel temperature at 190 ° C. for 15 minutes, as a second step, the pressure in the reaction vessel is set to 6.67 kPa, and the heat medium temperature of the reaction vessel is increased to 230 ° C. in 15 minutes. The generated phenol was extracted out of the reaction vessel. Since the stirring torque of the stirrer increased, the temperature was raised to 250 ° C. in 8 minutes, and the pressure in the reaction vessel was reduced to 0.200 kPa or less in order to remove the generated phenol. After reaching a predetermined stirring torque, the reaction was terminated, and the reaction product formed was extruded into water, and then pelletized to obtain BHEPF / ISB / 1,4-CHDM = 47.4 mol% / 37.1 mol%. /15.5 mol% polycarbonate resin was obtained.
The obtained polycarbonate resin had a glass transition temperature of 136.6 ° C. and a reduced viscosity of 0.395 dL / g. The obtained polycarbonate resin was vacuum-dried at 80 ° C. for 5 hours, and then 1.0 part by weight of the dye compound (C2) was added to the weight of the resin (100 parts by weight). Using a T-die type film melt extrusion molding machine at 220 ° C., a polycarbonate resin film having a thickness of 120 μm was produced. The obtained polycarbonate resin film was horizontally stretched using a tenter stretching machine to obtain a retardation film (H-1) having a thickness of 50 μm. At that time, the draw ratio was 250%, and the draw temperature was 137 to 139 ° C.
Re (550) of the obtained retardation film (H1) was 137 to 147 nm, and Δnxy was 0.0027 to 0.0029. The amount of the dye compound (C2) added was 1.0% by weight relative to the weight of the base polymer (100% by weight) in the retardation film (H-1).

(Evaluation)
The following evaluations were performed on the polarizing films with pressure-sensitive adhesive layers obtained in Examples 6 to 12 and Comparative Example 4. The evaluation was performed by the following method. The results are shown in Tables 5 and 6.

<Measurement of transmittance and hue of polarizing film with pressure-sensitive adhesive layer: initial value>
The release film of the polarizing film with the pressure-sensitive adhesive layer obtained in Examples and Comparative Examples was peeled off, and a slide glass (trade name: white polishing No. 1, thickness: 0.8 to 1.0 mm, total light transmission) Rate: 92%, haze: 0.2%, manufactured by Matsunami Glass Industrial Co., Ltd.). Furthermore, the other release film is peeled off, the same slide glass is laminated, and after autoclave treatment (50 ° C., 0.5 MPa, 15 minutes), the layer configuration of slide glass / polarizing film with adhesive layer / slide glass is obtained. A test piece was prepared. A test piece is attached to a measurement jig so that measurement light enters from the pressure-sensitive adhesive layer side (B1 side) on the organic EL display panel side, and an automatic polarizing film measuring device (product name: V7100, manufactured by JASCO Corporation) Measured with The transmittance in the wavelength range of 380 nm to 780 nm (Table 5 shows measured values of 380 nm, 400 nm, 420 nm, and 440 nm), simple substance Y value, simple substance hue (L ^* , a ^* , b ^* ).

<Reliability evaluation>
The test piece that had been initially measured by the above-described method was put into an oven at 85 ° C. for 500 hours to conduct a heat resistance test. Similarly, a test piece was put into an ultraviolet fade tester (device name: UV fade meter tester U48, manufactured by Suga Test Instruments Co., Ltd.) so that ultraviolet rays were irradiated from the visible adhesive layer side (A1 side), The light resistance test was carried out by continuous irradiation for 100 hours. The test piece after the test was measured for the simple substance Y value and the simple substance hue (L ^* , a ^* , b ^* ) in the same manner as the initial measurement. Single Y value change ΔY and single hue change ΔE ^* before and after the test were obtained by calculation. When ΔY ≦ 0.5 and ΔE ^* ≦ 1.0, the result was accepted (OK), and the others were rejected (NG). .

In the following, a transparent conductive film was produced and evaluated.

Comparative Example 5
(Cycloolefin polymer film (Z1))
As a long transparent substrate, a cycloolefin polymer film (Z1) (COP film, manufactured by Nippon Zeon Co., Ltd., “Zeonor ZF16”) having a thickness of 40 μm was prepared.

(Formation of anti-blocking layer)
UV curable hard coat resin (trade name “UNIDIC (registered trademark) RS29-120” manufactured by DIC Corporation) with a solid content of 100 parts by weight, a plurality of particles having a diameter of 3 μm (trade name “SSX105” manufactured by Sekisui Resin Co., Ltd.) Was added with 0.07 part by weight and diluted with ethyl acetate so that the solid content concentration was 30% by weight to prepare an anti-blocking layer forming composition. The composition is applied to one side of the cycloolefin polymer film (Z1), dried at 80 ° C. for 1 minute, and then irradiated with ultraviolet rays (high pressure mercury lamp) with an integrated light amount of 300 mJ / cm ² to obtain a COP film. An anti-blocking layer (AB layer) having a thickness of 1.5 μm was formed on one side of the film.

(Formation of hard coat layer (Y))
An ultraviolet curable acrylic resin (DIC, “ELS888”) 100 parts by weight, a photopolymerization initiator (BASF, “Irgacure 184”) 2 parts by weight and ethyl acetate 160 parts by weight were mixed to prepare a composition solution (Y ) Was prepared. Next, the composition solution (Y) is applied to the surface opposite to the surface on which the anti-blocking layer is formed in the cycloolefin polymer film (Z1), dried at 80 ° C. for 1 minute, and integrated. Irradiation with ultraviolet rays (high pressure mercury lamp) having a light amount of 300 mJ / cm ² was performed. Thereby, a hard coat layer having a thickness of 1.0 μm was formed on the upper surface of the cycloolefin polymer film (Z1).

(Formation of refractive index adjustment layer (X))
A composition solution (X) was prepared by mixing 700 parts by weight of propylene glycol monomethyl ether with 100 parts by weight of an inorganic particle-containing resin solution (manufactured by JSR, “KZ7414”). Next, the composition solution (X) is applied to the upper surface of the hard coat layer (Y1) and dried at 60 ° C. for 1 minute, and ultraviolet rays (high pressure mercury lamp) with an integrated light quantity of 300 mJ / cm ² are applied. Irradiated. Thereby, a refractive index adjusting layer (X) having a thickness of 100 nm was formed on the upper surface of the hard coat layer.

(Formation of ITO layer)
Next, the laminate having the structure of the refractive index adjustment layer (X) / hard coat layer (Y) / cycloolefin polymer film (Z1) / anti-blocking layer obtained above is put into a take-up type sputtering apparatus. Then, an ITO layer (amorphous) having a thickness of 30 nm was formed on the upper surface of the refractive index adjustment layer (X1). Specifically, an ITO target made of a sintered body of 97% by mass indium oxide and 3% by mass tin oxide was used in a vacuum atmosphere at a pressure of 0.4 Pa into which argon gas 98% and oxygen gas 2% were introduced. Then, sputtering was performed on the refractive index adjustment layer (X1).
As described above, a transparent conductive film having a constitution of ITO layer / refractive index adjusting layer (X) / hard coat layer (Y) / cycloolefin polymer film (Z1) / anti-blocking layer was produced.

Example 13
In Comparative Example 5, ITO layer / refractive index adjusting layer (X1) / hard coat was obtained in the same manner as Comparative Example 5 except that a hard coat layer (Y-1) was formed instead of the hard coat layer (Y). A transparent conductive film having a structure of layer (Y-1) / cycloolefin polymer film (Z1) / anti-blocking layer was produced.

The formation of the hard coat layer (Y-1) is further carried out with respect to 100 parts by weight of the ultraviolet curable acrylic resin (“ELS888” manufactured by DIC) in the formation of the hard coat layer (Y). The same operation as in the formation of the hard coat layer (Y) was carried out except that the composition solution (Y-1) prepared by adding 2 parts by weight of the dye compound (C2) obtained in 1 above was used. The amount of the dye compound (C2) added was 2.0% by weight relative to the base polymer (100% by weight) in the hard coat layer (Y-1).

Example 14
In Comparative Example 5, an ITO layer / refractive index adjusting layer (X-1) was prepared in the same manner as Comparative Example 5 except that a refractive index adjusting layer (X-1) was formed instead of the refractive index adjusting layer (X). ) / Hard coat layer (Y) / cycloolefin polymer film (Z1) / anti-blocking layer.

The refractive index adjusting layer (X-1) is formed by replacing the composition solution (X) in the formation of the refractive index adjusting layer (X) with an inorganic particle-containing resin solution (“KZ7412” manufactured by JSR). To 100 parts by weight, 700 parts by weight of propylene glycol monomethyl ether is mixed, and further, the dye compound (C2) obtained in Production Example 2 is 5 parts by weight with respect to the resin solid component in the resin solution. The same operation as in the formation of the refractive index adjusting layer (X) was performed except that the composition solution (X-1) prepared by mixing with the above was used. The amount of the dye compound (C2) added was 5.0% by weight based on the weight of the base polymer (100% by weight) in the refractive index adjusting layer (X-1).

Example 15
In Comparative Example 5, an ITO layer / refractive index adjusting layer (X-2) was prepared in the same manner as Comparative Example 5 except that a refractive index adjusting layer (X-2) was formed instead of the refractive index adjusting layer (X). ) / Hard coat layer (Y) / cycloolefin polymer film (Z1) / anti-blocking layer.

The refractive index adjusting layer (X-2) is formed by using an inorganic particle-containing resin solution (“TYZ68-”, manufactured by Toyo Ink Co., Ltd.) instead of the composition solution (X) in forming the refractive index adjusting layer (X). A12 ") is mixed with 100 parts by weight of propylene glycol monomethyl ether (700 parts by weight), and 2 parts by weight of the dye compound (C2) obtained in Production Example 2 is added to the resin solid component in the resin solution. The same operation as in the formation of the refractive index adjusting layer (X1) was performed except that the composition solution (X-2) prepared by mixing so as to be 5 parts by weight was used. The amount of the dye compound (C2) added was 5.0% by weight based on the weight of the base polymer (100% by weight) in the refractive index adjusting layer (X-2).

Comparative Example 6
(Preparation of polyester film (Z2))
Polymerization was performed from dimethyl terephthalate and ethylene glycol by a conventional method using antimony trioxide as a catalyst to obtain melt-polymerized polyethylene terephthalate. The obtained polyethylene terephthalate was vacuum-dried at 160 ° C. for 2 hours, then charged into a film melt extruder, melted at 290 ° C., extruded onto a casting drum, and stretched to obtain a polyester film (Z2 having a thickness of 50 μm). )

(Formation of anti-blocking layer)
An anti-blocking layer (AB layer) having a thickness of 1.5 μm was formed on one side of the polyester film (Z2) in the same manner as in Comparative Example 5.

(Formation of crack prevention layer (Q))
10 parts by weight of Adekafilterra BUR-12A (made by ADEKA) mainly composed of rubber-modified epoxy resin (weight average molecular weight of epoxy resin skeleton part: 2000), Adekafilterra BUR-12B which is an antimony-based curing accelerator 0.001 part of (made by ADEKA) was mixed, 90 weight part of methyl isobutyl ketone was added to this mixture, and the composition solution (Q) was prepared so that the whole might be 100 weight part. The gel time when the composition solution (Q) was heated at 170 ° C. was 10 seconds. Next, the thickness of the polyester film (Z2) is 30 nm by applying the composition solution (Q) on the surface opposite to the surface on which the anti-blocking layer is formed and drying it at 195 ° C. for 1 minute. The anti-cracking layer (Q) was formed on the upper surface of the polyester film (Z2).

(Formation of ITO layer)
Next, the laminate having the structure of crack prevention layer (Q) / polyester film (Z2) / anti-blocking layer obtained above was put into a take-up type sputtering apparatus, and the top surface of the crack prevention layer (Y2). In addition, an ITO layer (amorphous) having a thickness of 30 nm was formed. Specifically, an ITO target made of a sintered body of 97% by mass indium oxide and 3% by mass tin oxide was used in a vacuum atmosphere at a pressure of 0.4 Pa into which argon gas 98% and oxygen gas 2% were introduced. Then, sputtering was performed on the crack prevention layer (Q).
As described above, a transparent conductive film having a configuration of ITO layer / crack prevention layer (Q) / polyester film (Z2) / anti-blocking layer was produced.

Example 16
In Comparative Example 6, an ITO layer / crack prevention layer (Q) / polyester film (Z2-) was used in the same manner as Comparative Example 6 except that the polyester film (Z2-1) was used instead of the polyester film (Z2). A transparent conductive film having the structure 1) / anti-blocking layer was produced.

In the preparation of the polyester film (Z2), the polyester film (Z2-1) further comprises 1 part by weight of the dye compound (C2) obtained in Production Example 2 with respect to 100 parts by weight of the obtained polyethylene terephthalate. Except having formed into a film using the added composition, what was obtained by performing operation similar to preparation of a polyester film (Z2) was used. The amount of the dye compound (C2) added was 1% by weight relative to the weight of the base polymer (100% by weight) in the polyester film (Z2-1).

Example 17
In Comparative Example 6, an ITO layer / crack preventing layer (Q) / easy-adhesive layer (R-1) / polyester film (with the exception of further providing an easy-adhesion layer (R-1)) A transparent conductive film having a configuration of Z2) / anti-blocking layer was produced.

The easy adhesion layer (R-1) was provided by the following method. The easily adhesive layer forming composition (R-1) is a resin 100 weight formed from phthalic acid ester (phthalic acid / reaction product of ethylene glycol / propylene glycol), methacrylic acid, oxazoline, ethylene glycol, propylene glycol, and melamine. It was prepared by adding 5 parts by weight of the dye compound (C2) obtained in Production Example 2 to parts. Next, by applying the easy-adhesive composition (R-1) on the surface opposite to the surface on which the anti-blocking layer is formed in the polyester film (Z2), and drying it at 195 ° C. for 1 minute. Then, an easy-adhesion layer (R-1) having a thickness of 0.1 μm was formed. Next, a crack prevention layer (Y2) was provided on the easy adhesion layer (R-1). The amount of the dye compound (C2) added was 5% by weight based on the weight of the base polymer (100% by weight) in the easy-adhesion layer (R-1).

Example 18
In Comparative Example 6, an ITO layer / crack preventing layer (Q-1) / polyester was prepared in the same manner as Comparative Example 6 except that a crack preventing layer (Q-1) was formed instead of the crack preventing layer (Y2). A transparent conductive film having a structure of film (Z2) / anti-blocking layer was produced.

The formation of the crack prevention layer (Q-1) was further carried out with respect to 100 parts by weight of the rubber-modified epoxy resin instead of the composition solution (Q-1) in the formation of the crack prevention layer (Q). Formation of a crack prevention layer (Q) except that the composition solution (Q-1) prepared by adding 5 parts by weight of the dye compound (C2) obtained in Example 2 was used and that the thickness was 70 nm. The same operation was performed.

(Evaluation)
The transparent conductive films obtained in Examples 13 to 18 and Comparative Examples 5 and 6 were evaluated as follows. The evaluation was performed by the following method. The results are shown in Tables 4 and 5.

<Measurement of transmittance and hue of transparent conductive film: initial value>
The transparent conductive films obtained in Examples and Comparative Examples were cut out to produce test pieces. The test piece was attached to a measurement jig so that measurement light was incident from the transparent conductive layer (ITO layer) side, and measured with a reflection type spectrophotometer (product name: U4100, manufactured by Hitachi High-Technologies Corporation). The transmittance in the wavelength range of 380 nm to 780 nm (measured values at 380 nm, 400 nm, and 420 nm are shown in Table 5), simple substance Y value, simple substance hue (L ^* , a ^* , b ^* ) were measured.

<Surface resistance value of ITO layer of transparent conductive film>
After forming the ITO layer, a heat treatment at 140 ° C. for 90 minutes was performed to crystallize the ITO layer, thereby producing a crystalline transparent conductive film. The surface resistance value (Ω / □) of the crystalline transparent conductive layer was measured by the four-terminal method according to JIS K7194 (1994).

DESCRIPTION OF SYMBOLS 1 Optical laminated body 2 Adhesive layer 3 Transparent protective film 4 Polarizer 5 Phase difference film 6 Adhesive layer 7 Cover member 8 Organic EL panel 10 Organic EL display device 20 Transparent electroconductive film 21 Transparent base film 22 Transparent electroconductivity 23 intermediate layers 24 anti-blocking layers

Claims

A composition for optical members, comprising a base polymer and a compound represented by the following general formula (1).

(In the general formula (1), m represents an integer of 1 to 6,
Q 1 represents a hydrogen atom when m is 1, and a divalent to hexavalent linking group when m is 2 to 6,
D 1 represents a group in which one hydrogen atom is removed from the compound represented by the following general formula (2). When m is 2 to 6, a plurality of D 1 may be the same or different. It may be.

(In General Formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 2 represents a hydrogen atom or a cyano group. , A nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R 7 or —SO 2 —R 8. R 7 represents a hydroxy group or —OR 71 , and R 8 represents a halogen atom. Represents an atom, a hydroxy group, —OR 81 , —NR 82 R 83 or —R 84 , wherein R 71 and R 81 to R 84 are the same or different and each represents a hydrogen atom or an alkyl group which may have a substituent; Or the aryl group which may have a substituent is represented.
R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
R 402 and R 403 are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, —NR 406 R 407 , —OR 408 , a cyano group, —C (O) R 409 , —O—C (O) R 410 or —C (O) OR 411 ,
R 404 to R 411 are the same or different and each represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 404 , R 405, and the nitrogen atom to which R 404 and R 405 are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))
M in the said General formula (1) is 1 or 2, The composition for optical members in Claim 1 characterized by the above-mentioned.
The composition for optical members according to claim 1 or 2, wherein the compound represented by the general formula (1) is a compound represented by the following general formula (3).

(In General Formula (3), R 1a is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. R 2a represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R 7a or —SO 2 —R 8a , where R 7a represents a hydroxy group Or -OR 71a , R 8a represents a halogen atom, a hydroxy group, -OR 81a , -NR 82a R 83a, or -R 84a, and R 71a and R 81a to R 84a are the same or different, Represents an alkyl group having 1 to 20 carbon atoms which may have a substituent or an aryl group having 6 to 20 carbon atoms which may have a substituent.
R 3a represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R 402a represents a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, —NR 406a R 407a , —OR 408a , a cyano group, —C (O) R 409a , —O—C (O) R 410a or —C (O) OR 411a , and R 404a to R 411a are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 404a , R 405a, and the nitrogen atom to which R 404a and R 405a are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
R 413 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or the following general formula The group represented by Formula (4) is represented.

(In the general formula (4), Q 2 represents an optionally substituted divalent hydrocarbon group having 1 to 20 carbon atoms, and * represents a bonding site with the general formula (3).
R 1b represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms, and R 2b represents a hydrogen atom. An atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R 7b or —SO 2 —R 8b is represented. R 7b represents a hydroxy group or —OR 71b , and R 8b represents a halogen atom, a hydroxy group, —OR 81b , —NR 82b R 83b or —R 84b . R 71b and R 81b to R 84b are the same or different and are a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 6 to 20 carbon atoms which may have a substituent. Represents an aryl group.
R 3b represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R 402b is a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, —NR 406b R 407b , —OR 408b , a cyano group, —C (O) R 409b , —O—C (O) R 410b or —C (O) OR 411b , and R 404b to R 411b are the same or different and represent hydrogen It represents an atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 404b , R 405b, and the nitrogen atom to which R 404b and R 405b are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))
4. The optical member composition according to claim 3, wherein R 413 is a group represented by the general formula (4).
3. The composition for an optical member according to claim 1, wherein the compound represented by the general formula (1) is a compound represented by the following general formula (5).

(In the general formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R 7c or —SO 2 —R 8c ). 7c represents a hydroxy group or —OR 71c , and R 8c represents a halogen atom, a hydroxy group, —OR 81c , —NR 82c R 83c or —R 84c, and R 71c and R 81c to R 84c are the same or Differently, it represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.
R 3c represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R 402c and R 403c are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon atom having 6 to 20 carbon atoms. Represents an aryl group, —NR 406c R 407c , —OR 408c , a cyano group, —C (O) R 409c , —O—C (O) R 410c or —C (O) OR 411c , and R 404c to R 411c Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 404c , R 405c, and the nitrogen atom to which R 404c and R 405c are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent.
R 501 is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or the following general formula (6 ) Represents a group represented by

(In the general formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a binding site with the general formula (5).
R 2d represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group, —C (O) —R 7d or —SO 2 —R 8d . R 7d represents a hydroxy group or —OR 71d , and R 8d represents a halogen atom, a hydroxy group, —OR 81d , —NR 82d R 83d or —R 84d . R 71d and R 81d to R 84d are the same or different and are a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon group having 6 to 20 carbon atoms. Represents an aryl group.
R 3d represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. .
R 402d and R 403d are the same or different and are a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted carbon atom having 6 to 20 carbon atoms. An aryl group of —NR 406d R 407d , —OR 408d , a cyano group, —C (O) R 409d , —O—C (O) R 410d or —C (O) OR 411d , and R 404d to R 411d Are the same or different and each represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 404d , R 405d, and the nitrogen atom to which R 404d and R 405d are bonded may form a 4- to 8-membered nitrogen-containing heterocyclic ring which may have a substituent. ))
The composition for an optical member according to claim 5, wherein R 501 is a group represented by the general formula (6).
The optical compound according to any one of claims 1 to 6, wherein the compound represented by the general formula (1) is a dye compound having an absorption maximum wavelength of an absorption spectrum in a wavelength region of 380 to 430 nm. Composition for members.
The composition for optical members according to any one of claims 1 to 7, further comprising an ultraviolet absorber.
The composition for an optical member according to claim 8, wherein the absorption maximum wavelength of the absorption spectrum of the ultraviolet absorber is in a wavelength region of 300 to 400 nm.
An optical member formed from the composition for an optical member according to any one of claims 1 to 9.
The optical member according to any one of claims 1 to 10, wherein the optical member is used as an optical film.
11. The optical member according to claim 1, wherein the optical member is used as an adhesive layer or an adhesive layer for an optical film.
The optical member according to claim 12, wherein the base polymer contained in the composition forming the pressure-sensitive adhesive layer for an optical film is a (meth) acrylic polymer.
The optical member according to any one of claims 1 to 10, wherein the optical member is used as a surface treatment layer provided on an optical film.
The optical member according to any one of claims 11 to 14, wherein the optical film is a polarizing film, a polarizer, a transparent protective film for a polarizer, or a retardation film.
An optical laminate including a polarizer and a retardation film,
An optical laminate, wherein the optical laminate is an optical laminate (1) containing the optical member according to any one of claims 10 to 15.
An image display device comprising an image display unit and the optical member according to any one of claims 10 to 15, or the optical laminate (1) according to claim 16.
18. The image display device according to claim 17, wherein the optical member or the optical laminate (1) is provided on the viewing side with respect to the image display unit.
The image display device
From the viewing side, at least an optical laminate including a polarizer and a retardation film in this order, and an organic EL display device including an organic EL panel as the image display unit,
The image display device according to claim 17 or 18, wherein the optical laminate comprises the optical member according to any one of claims 10 to 15 or the optical laminate (1) according to claim 16.
The transparent conductive film having a transparent base film and a transparent conductive layer is used as the transparent base film or an intermediate layer provided between the transparent base film and the transparent conductive layer. The optical member according to any one of 1 to 10.
21. The optical member according to claim 20, wherein the intermediate layer is at least one selected from a refractive index adjustment layer, an easy-adhesive layer, a hard coat layer, and a crack prevention layer.
The transparent conductive film having a transparent substrate film and a transparent conductive layer, wherein the optical member according to claim 20 or 21 is used as an intermediate layer provided between the transparent substrate film or the transparent substrate film. A transparent conductive film characterized by containing.
An image display device comprising an image display unit and the transparent conductive film according to claim 22.
24. The image display device according to claim 23, wherein the transparent conductive film is provided on the viewing side with respect to the image display unit.
The image display device according to claim 23 or 24, wherein the image display device is an organic EL display device including an organic EL panel as the image display unit.