WO2008090640A1 - オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子 - Google Patents

オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子 Download PDF

Info

Publication number
WO2008090640A1
WO2008090640A1 PCT/JP2007/065103 JP2007065103W WO2008090640A1 WO 2008090640 A1 WO2008090640 A1 WO 2008090640A1 JP 2007065103 W JP2007065103 W JP 2007065103W WO 2008090640 A1 WO2008090640 A1 WO 2008090640A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
color filter
photosensitive composition
oxime compound
liquid crystal
Prior art date
Application number
PCT/JP2007/065103
Other languages
English (en)
French (fr)
Inventor
Akinori Fujita
Takashi Tamura
Kimi Ikeda
Daisuke Kashiwagi
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007013117A external-priority patent/JP5312743B2/ja
Priority claimed from JP2007088814A external-priority patent/JP2008249857A/ja
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Priority to US12/523,926 priority Critical patent/US20110123929A1/en
Priority to EP07791783A priority patent/EP2116527A4/en
Priority to KR1020097017452A priority patent/KR20090104877A/ko
Publication of WO2008090640A1 publication Critical patent/WO2008090640A1/ja

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/78Benzo [b] furans; Hydrogenated benzo [b] furans
    • C07D307/82Benzo [b] furans; Hydrogenated benzo [b] furans with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32Oximes
    • C07C251/62Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/92Naphthofurans; Hydrogenated naphthofurans
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D311/00Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78Ring systems having three or more relevant rings
    • C07D311/92Naphthopyrans; Hydrogenated naphthopyrans
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/52Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
    • C07D333/62Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
    • C07D333/66Nitrogen atoms not forming part of a nitro radical
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D335/00Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/06Benzothiopyrans; Hydrogenated benzothiopyrans
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/32Compounds containing nitrogen bound to oxygen
    • C08K5/33Oximes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/009Azomethine dyes, the C-atom of the group -C=N- being part of a ring (Image)
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00Systems containing two condensed rings
    • C07C2602/02Systems containing two condensed rings the rings having only two atoms in common
    • C07C2602/04One of the condensed rings being a six-membered aromatic ring
    • C07C2602/08One of the condensed rings being a six-membered aromatic ring the other ring being five-membered, e.g. indane
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00Systems containing two condensed rings
    • C07C2602/02Systems containing two condensed rings the rings having only two atoms in common
    • C07C2602/04One of the condensed rings being a six-membered aromatic ring
    • C07C2602/10One of the condensed rings being a six-membered aromatic ring the other ring being six-membered, e.g. tetraline
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/16Benz[e]indenes; Hydrogenated benz[e]indenes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/40Ortho- or ortho- and peri-condensed systems containing four condensed rings
    • C07C2603/42Ortho- or ortho- and peri-condensed systems containing four condensed rings containing only six-membered rings

Abstract

 下記一般式(1)で表されるオキシム化合物、該オキシム化合物を光重合開始剤として用いる感光性組成物並びに該感光性組成物を使用したカラーフィルタの製造方法、前記製造方法により製造されたカラーフィルタを提供する。  ただし、上記一般式(1)中、R1は、水素原子、置換基を有してもよいアシル基、アルコキシカルボニル基、及びアリールオキシカルボニル基のいずれかを表し、R2は、それぞれ独立に、ハロゲン原子、アルキル基、アリール基、アルキルオキシ基、アリールオキシ基、アルキルチオ基、アリールチオ基、及びアミノ基のいずれかを表す。mは、0~4の整数を表し、2以上の場合は、互いに連結し環を形成してもよい。Aは、4、5、6、及び7員環のいずれかを表す。
PCT/JP2007/065103 2007-01-23 2007-08-01 オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子 WO2008090640A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/523,926 US20110123929A1 (en) 2007-01-23 2007-08-01 Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element
EP07791783A EP2116527A4 (en) 2007-01-23 2007-08-01 OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR MANUFACTURING THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT
KR1020097017452A KR20090104877A (ko) 2007-01-23 2007-08-01 옥심 화합물, 감광성 조성물, 컬러 필터, 그 제조방법 및 액정표시소자

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-013117 2007-01-23
JP2007013117A JP5312743B2 (ja) 2006-02-01 2007-01-23 オキシム化合物及びそれを含む感光性組成物
JP2007-088814 2007-03-29
JP2007088814A JP2008249857A (ja) 2007-03-29 2007-03-29 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子

Publications (1)

Publication Number Publication Date
WO2008090640A1 true WO2008090640A1 (ja) 2008-07-31

Family

ID=39644218

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/065103 WO2008090640A1 (ja) 2007-01-23 2007-08-01 オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子

Country Status (4)

Country Link
US (1) US20110123929A1 (ja)
EP (1) EP2116527A4 (ja)
KR (1) KR20090104877A (ja)
WO (1) WO2008090640A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012530753A (ja) * 2009-06-25 2012-12-06 ワッカー ケミー アクチエンゲゼルシャフト ヒドロシリル化方法
US20130041062A1 (en) * 2010-09-22 2013-02-14 Adeka Corporation Dye and coloring photosensitive composition
JP2013098166A (ja) * 2011-10-27 2013-05-20 Far Eastern New Century Corp 導電性基板の製造方法及びその導電性基板
US20130158149A1 (en) * 2010-09-06 2013-06-20 Dic Corporation Active-energy-ray-curable hot-melt urethane resin composition, member for electronic device, the member including the resin composition, and packing
WO2013146372A1 (ja) * 2012-03-30 2013-10-03 富士フイルム株式会社 黒色樹脂膜、静電容量型入力装置及びそれらの製造方法並びにこれを備えた画像表示装置
US9411226B2 (en) 2014-08-19 2016-08-09 Shin-Etsu Chemical Co., Ltd. Chemically amplified resist composition and patterning process

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2223910B1 (en) * 2007-12-25 2012-11-07 Adeka Corporation Oxime esters and photopolymerization initiators containing the same
JP5457636B2 (ja) * 2008-01-22 2014-04-02 富士フイルム株式会社 光硬化性組成物、光硬化性インク組成物、光硬化物の製造方法、及び、インクジェット記録方法
JP5669386B2 (ja) * 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
US8324701B2 (en) * 2010-07-16 2012-12-04 Visera Technologies Company Limited Image sensors
KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101333701B1 (ko) * 2010-11-09 2013-11-27 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
DE102011109386B3 (de) * 2011-08-04 2013-01-17 Heraeus Noblelight Gmbh Vorrichtung zum Aushärten von Beschichtungen oder Kunststofflinern auf der Innenwandung langgestreckter Hohlräume
GB201116517D0 (en) * 2011-09-23 2011-11-09 Nanoco Technologies Ltd Semiconductor nanoparticle based light emitting materials
TWI578099B (zh) * 2012-02-09 2017-04-11 大阪曹達股份有限公司 含有金屬微粒子之光硬化性樹脂組成物及其利用
WO2014084147A1 (ja) * 2012-11-29 2014-06-05 富士フイルム株式会社 組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
CN103145583B (zh) * 2013-02-04 2014-08-06 上海交通大学 外消旋体紫草素萘茜母核羟基甲基化羰基肟衍生物及其制备和用途
EP3002276B1 (en) 2013-01-16 2017-12-13 Shanghai Jiao Tong University Shikonin, alkannin, and racemic parent nucleus carbonyl oxime derivatives and applications thereof
CN105247391B (zh) 2013-04-11 2018-06-12 富士胶片株式会社 近红外线吸收性组合物、近红外线截止滤波器及其制造方法、以及照相机模块及其制造方法
JP6274498B2 (ja) * 2013-11-08 2018-02-07 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
TWI606298B (zh) * 2015-06-30 2017-11-21 奇美實業股份有限公司 感光性樹脂組成物及其應用
WO2017038708A1 (ja) * 2015-08-31 2017-03-09 富士フイルム株式会社 着色感光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、および、硬化膜の製造方法
JP6602387B2 (ja) * 2015-09-14 2019-11-06 富士フイルム株式会社 近赤外線吸収組成物、膜、近赤外線カットフィルタおよび固体撮像素子
JP6799540B2 (ja) * 2015-09-25 2020-12-16 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
WO2019065476A1 (ja) * 2017-09-29 2019-04-04 富士フイルム株式会社 着色感光性組成物および光学フィルタの製造方法
JPWO2019159950A1 (ja) * 2018-02-16 2021-02-04 富士フイルム株式会社 感光性組成物
KR102125820B1 (ko) * 2018-12-24 2020-06-23 (주)경인양행 옥심 화합물을 포함하는 광중합 개시제 및 광경화형 잉크 조성물

Citations (156)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2681294A (en) 1951-08-23 1954-06-15 Eastman Kodak Co Method of coating strip material
US3287368A (en) * 1965-06-08 1966-11-22 Mcneilab Inc Dihydrobenzothiepin-5(2h)-one oximes
US3579339A (en) 1967-05-23 1971-05-18 Du Pont Photopolymerizable dispersions and elements containing nonmigratory photoreducible dyes
JPS4864183A (ja) 1971-12-09 1973-09-05
JPS4841708B1 (ja) 1970-01-13 1973-12-07
DE2308830A1 (de) 1973-02-22 1974-08-29 Siemens Ag Verfahren zur herstellung von reliefstrukturen
JPS4943191B1 (ja) 1969-07-11 1974-11-19
JPS506034B1 (ja) 1970-08-11 1975-03-10
JPS5034443B2 (ja) 1971-08-20 1975-11-08
JPS5034444B2 (ja) 1971-08-20 1975-11-08
JPS5137193A (ja) 1974-09-25 1976-03-29 Toyo Boseki
JPS5230490B2 (ja) 1972-03-21 1977-08-09
US4139391A (en) 1976-02-16 1979-02-13 Fuji Photo Film Co., Ltd. Light-sensitive resin composition and metal image-forming material using the same
JPS5425957A (en) 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline
JPS5434327A (en) 1977-08-12 1979-03-13 Ciba Geigy Ag Bispyridone dyes and use thereof in silver halide materials for photograph
EP0007086A1 (de) 1978-07-14 1980-01-23 BASF Aktiengesellschaft Lichthärtbare Form-, Tränk- und Überzugsmassen sowie daraus hergestellte Formkörper
EP0012339A1 (de) 1978-12-14 1980-06-25 BASF Aktiengesellschaft Strahlungshärtbare wässrige Bindemitteldispersionen, Verfahren zu deren Herstellung sowie deren Verwendung
EP0022788A1 (en) 1979-01-08 1981-01-28 OSBORNE, Harry Eugene Fluid pump and method for operating same
DE2936039A1 (de) 1979-09-06 1981-04-02 Bayer Ag, 5090 Leverkusen Wasserdispergierbare, durch strahlen vernetzbare bindemittel aus urethanacrylaten, ein verfahren zu ihrer herstellung sowie die verwendung dieser bindemittel in waessriger dispersion auf dem anstrich-, druckfarben- und textilsektor
EP0033896A1 (de) 1980-02-11 1981-08-19 BASF Aktiengesellschaft Strahlungshärtbare wässrige Bindemitteldispersionen, Verfahren zu ihrer Herstellung und ihre Verwendung
EP0041125A1 (de) 1980-05-08 1981-12-09 Bayer Ag Wässrige Dispersionen auf Basis von (Meth)Acrylsäurealkylester-Polymerisaten
US4371607A (en) 1980-06-09 1983-02-01 Hoechst Aktiengesellschaft 4-Halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives
US4371606A (en) 1980-06-09 1983-02-01 Hoechst Aktiengesellschaft 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives
JPS5812577B2 (ja) 1973-12-21 1983-03-09 ヘキスト アクチエンゲゼルシヤフト 光重合可能な複写材料
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
EP0126541A1 (en) 1983-04-26 1984-11-28 Nippon Oil And Fats Company, Limited Photopolymerization initiator and method of photopolymerization by use of said initiator
JPS6038989A (ja) 1983-08-12 1985-02-28 Nec Corp 固体撮像装置の製造方法
JPS60159743A (ja) 1984-01-30 1985-08-21 Fuji Photo Film Co Ltd 光重合性組成物
JPS60165623A (ja) 1984-02-08 1985-08-28 Nec Corp 透過型表示素子
JPS60166306A (ja) 1984-02-09 1985-08-29 Daicel Chem Ind Ltd 光重合開始剤
JPS60258539A (ja) 1984-06-05 1985-12-20 Fuji Photo Film Co Ltd 光重合性組成物
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPS6167003A (ja) 1984-09-10 1986-04-07 Canon Inc カラ−イメ−ジセンサ−
JPS61153602A (ja) 1984-12-27 1986-07-12 Matsushita Electronics Corp マイクロレンズの製造方法
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
US4622286A (en) 1985-09-16 1986-11-11 E. I. Du Pont De Nemours And Company Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
GB2180358A (en) 1985-07-16 1987-03-25 Mead Corp Photosensitive microcapsules and their use on imaging sheets
EP0245639A2 (de) 1986-04-12 1987-11-19 Bayer Ag Verfahren zur Herstellung von UV-gehärteten deckend pigmentierten Beschichtungen
JPS6490516A (en) 1987-09-30 1989-04-07 Sumitomo Metal Ind Semiconductor porcelain material
EP0320264A2 (en) 1987-12-09 1989-06-14 Matsushita Electric Industrial Co., Ltd. Colour filter
JPH01152449A (ja) 1987-12-09 1989-06-14 Matsushita Electric Ind Co Ltd カラーフィルタ
EP0339841A2 (en) 1988-04-13 1989-11-02 The Mead Corporation Photosensitive compositions and materials
WO1990001512A1 (en) 1988-08-12 1990-02-22 Desoto, Inc. Photo-curable vinyl ether compositions
JPH02199403A (ja) 1989-01-30 1990-08-07 Toppan Printing Co Ltd カラーフィルターおよびその製造方法
JPH02199404A (ja) 1989-01-30 1990-08-07 Toppan Printing Co Ltd カラーフィルターおよびその製造方法
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5013768A (en) 1989-12-19 1991-05-07 Dai Nippon Toryo Co., Ltd. Photopolymerizable coating composition and process for forming a coating having a stereoscopic pattern
JPH03164722A (ja) * 1989-11-24 1991-07-16 Fuji Photo Film Co Ltd 有機非線形光学材料およびそれを用いた光波長の変換方法
EP0438123A2 (en) 1990-01-16 1991-07-24 Showa Denko Kabushiki Kaisha Near infrared polymerization initiator
EP0441232A2 (de) 1990-02-09 1991-08-14 BASF Aktiengesellschaft Verfahren zur kationischen Photopolymerisation
EP0445624A2 (de) 1990-03-09 1991-09-11 Hoechst Aktiengesellschaft Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
DE4013358A1 (de) 1990-04-26 1991-10-31 Hoechst Ag Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials
EP0497531A2 (en) 1991-01-28 1992-08-05 Mitsubishi Chemical Corporation Process for producing ethylene polymers
US5153095A (en) 1988-09-21 1992-10-06 Fuji Photo Film Co., Ltd. Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain
EP0511403A1 (en) 1990-11-19 1992-11-04 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition and photosensitive element structure
WO1992019589A2 (en) * 1991-05-03 1992-11-12 Smithkline Beecham Corporation Lipoxygenase inhibitors
JPH0567405A (ja) 1991-09-09 1993-03-19 Toray Ind Inc 感光性導電ペースト
JPH0572724A (ja) 1991-01-29 1993-03-26 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
JPH05150175A (ja) 1991-10-14 1993-06-18 Asahi Optical Co Ltd 走査式描画装置
JPH05173320A (ja) 1991-06-25 1993-07-13 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
JPH05271576A (ja) 1992-01-24 1993-10-19 Toray Ind Inc 感光性導電ペースト
JPH0616684A (ja) 1992-07-03 1994-01-25 Shin Etsu Chem Co Ltd リン酸エステル基含有オルガノポリシロキサン及びその製造方法並びにアニオン性界面活性剤
DE4228514A1 (de) 1992-08-27 1994-03-03 Hoechst Ag Bindemittel für Pulverlacke
JPH0668309A (ja) 1992-08-14 1994-03-11 Matsushita Electric Ind Co Ltd パターン判別用ファジィ推論装置および判別ルール作成装置
JPH06230212A (ja) 1993-01-29 1994-08-19 Toyo Ink Mfg Co Ltd アルカリ現像型感光性着色組成物
EP0624826A1 (de) 1993-05-14 1994-11-17 OCG Microelectronic Materials Inc. Verfahren zur Herstellung von Reliefstrukturen durch i-Linien-Bestrahlung
US5368976A (en) 1992-03-27 1994-11-29 Japan Synthetic Rubber Co., Ltd. Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
EP0636669A2 (en) 1993-07-30 1995-02-01 Dsm N.V. Radiation curable binder composition for powder paint formulations
JPH0750473A (ja) 1991-09-21 1995-02-21 Taiyo Ink Mfg Ltd ソルダーレジストパターン形成方法
JPH0717737B2 (ja) 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
JPH0770033A (ja) * 1992-10-30 1995-03-14 Egyt Gyogyszervegyeszeti Gyar ベンゾ[e]インデン誘導体
EP0678534A1 (de) 1994-04-22 1995-10-25 BASF Aktiengesellschaft Gele mit thermotropen Eigenschaften
JPH07294726A (ja) 1993-09-28 1995-11-10 Cheil Synthetics Inc 液晶ディスプレーカラーフィルター用感光性樹脂組成物
EP0706091A1 (en) 1994-09-30 1996-04-10 Hercules Incorporated Liquid photoimageable resist
JPH08171863A (ja) 1994-10-17 1996-07-02 Taiyo Ink Mfg Ltd プラズマディスプレイパネルの隔壁形成用組成物及びそれを用いた隔壁形成方法
JPH08179120A (ja) 1994-12-20 1996-07-12 Nippon Kayaku Co Ltd カラーフィルタ用色素及びこれを含有するカラーレジスト、カラーフィルタ
WO1996036596A1 (en) * 1995-05-19 1996-11-21 Chiroscience Limited 3,4-disubstituted-phenylsulphonamides and their therapeutic use
JPH08305019A (ja) 1995-05-10 1996-11-22 Fuji Photo Film Co Ltd 光重合性組成物
WO1996041240A1 (en) 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
JPH0948770A (ja) * 1995-06-02 1997-02-18 Sankyo Co Ltd 芳香族オキシイミノ誘導体
US5626796A (en) 1994-03-18 1997-05-06 Fuji Photo Film Co., Ltd. Light sensitive composition for black matrix, substrate for color filter, and liquid crystal display
EP0780729A1 (en) 1995-12-20 1997-06-25 Tokyo Ohka Kogyo Co., Ltd. Chemical-sensitization photoresist composition
JPH09179299A (ja) 1995-12-21 1997-07-11 Fuji Photo Film Co Ltd 感放射線性組成物
DE19700064A1 (de) 1996-01-13 1997-07-17 Basf Ag Gele mit thermotropen Eigenschaften
US5650263A (en) 1993-08-16 1997-07-22 Fuji Photo Film Co., Ltd. Photopolymerizable composition, color filter, and production of color filter
US5650233A (en) 1995-01-05 1997-07-22 Daicel Chemical Industries, Ltd. Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition
JPH09244230A (ja) 1996-03-07 1997-09-19 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント及びこの感光性エレメントを用いた蛍光体パターンの製造方法
JPH09269410A (ja) 1996-02-02 1997-10-14 Tokyo Ohka Kogyo Co Ltd 緑色カラーフィルタ用感光性組成物及びこれを用いた緑色カラーフィルタの製造方法
JP2665696B2 (ja) 1991-07-16 1997-10-22 富士写真フイルム株式会社 顔料分散組成物、カラーフィルター用光重合性組成物溶液及びカラーフィルター
JPH09325209A (ja) 1996-06-06 1997-12-16 Fuji Photo Film Co Ltd Lcd表示装置用カラーフィルター
JPH1062980A (ja) 1996-08-23 1998-03-06 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれを用いた蛍光体パターンの製造法
JPH10171119A (ja) 1996-12-11 1998-06-26 Tokyo Ohka Kogyo Co Ltd 光重合性樹脂組成物、およびこれを用いた色フィルタの製造方法
EP0855731A1 (en) 1996-07-10 1998-07-29 Toray Industries, Inc. Plasma display and method of manufacturing the same
JPH10221843A (ja) 1997-02-06 1998-08-21 Tokyo Ohka Kogyo Co Ltd 色フィルタ用感光性組成物及びこれを用いた色フィルタの製造方法
US5800952A (en) 1995-12-22 1998-09-01 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid display device
EP0863534A2 (en) 1997-03-06 1998-09-09 E.I. Du Pont De Nemours And Company Plasma display panel device and method of fabricating the same
US5821016A (en) 1995-06-29 1998-10-13 Hitachi Chemical Company, Ltd. Colored image forming material and color filter obtained therefrom
US5840465A (en) 1995-07-17 1998-11-24 Taiyo Ink Manufacturing Co., Ltd. Compositions and method for formation of barrier ribs of plasma display panel
EP0881541A1 (en) 1997-05-28 1998-12-02 JSR Corporation Radiation sensitive composition and color filter
US5847015A (en) 1993-09-24 1998-12-08 Jsr Corporation Pigment-dispersed radiation-sensitive composition for color filters
US5853446A (en) 1996-04-16 1998-12-29 Corning Incorporated Method for forming glass rib structures
US5863678A (en) 1995-01-17 1999-01-26 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter
US5866298A (en) 1995-11-22 1999-02-02 Japan Synthetic Rubber Co., Ltd. Radiation sensitive composition for color filters
US5879855A (en) 1993-11-22 1999-03-09 Ciba Specialty Chemicals Corporation Compositions for making structured color images and application thereof
US5879866A (en) 1994-12-19 1999-03-09 International Business Machines Corporation Image recording process with improved image tolerances using embedded AR coatings
US5882843A (en) 1994-11-15 1999-03-16 Hoechst Japan Limited Photosensitive resin composition for color filter production
EP0902327A2 (en) 1997-09-09 1999-03-17 JSR Corporation Radiation sensitive composition
JPH11133600A (ja) 1997-10-30 1999-05-21 Jsr Corp 表示パネルスペーサー用感放射線性樹脂組成物
JPH11149008A (ja) 1997-11-17 1999-06-02 Fuji Photo Film Co Ltd 感光性転写材料およびカラーフィルターの製造方法
JPH11174464A (ja) 1997-12-12 1999-07-02 Hitachi Chem Co Ltd 樹脂スペーサー形成用感光性フィルム
JPH11174459A (ja) 1997-12-11 1999-07-02 Hitachi Chem Co Ltd カラー液晶表示装置用スペーサーフィルム
EP0932256A1 (en) 1997-07-03 1999-07-28 Seiko Epson Corporation Ladder type resistance circuit, and digital-analog converter and semiconductor device using the same
WO1999038035A1 (fr) 1996-07-22 1999-07-29 Maikurooputo Co., Ltd. Procede de fabrication d'une mini-lentille plate et mince; mini-lentille ainsi produite
US5969867A (en) 1994-10-18 1999-10-19 Mitsubishi Rayon Company Ltd. Active energy ray-curable composition and lens sheet
JP2000039503A (ja) 1998-07-22 2000-02-08 Matsushita Electric Ind Co Ltd レンズアレイ
JP2000039033A (ja) 1998-06-17 2000-02-08 Valeo 乾式摩擦クラッチのライニング及びその製造方法
JP2000080068A (ja) 1998-06-26 2000-03-21 Ciba Specialty Chem Holding Inc 新規o―アシルオキシム光開始剤
JP2000081701A (ja) 1998-09-03 2000-03-21 Jsr Corp カラーフィルター保護膜用感放射線性樹脂組成物
JP2000194132A (ja) 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
JP2001233842A (ja) 1999-12-15 2001-08-28 Ciba Specialty Chem Holding Inc オキシムエステルの光開始剤
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
JP2001255661A (ja) 2000-01-05 2001-09-21 Orbotech Ltd パルス光パターン書込み装置
JP2001310147A (ja) 2000-05-02 2001-11-06 Tokyo Ohka Kogyo Co Ltd スリットコータの予備吐出装置および予備吐出方法
JP2002079163A (ja) 2000-09-05 2002-03-19 Toppan Printing Co Ltd スリットコータ
JP2002523905A (ja) 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2002323762A (ja) * 2001-04-25 2002-11-08 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
WO2002102798A1 (fr) * 2001-06-13 2002-12-27 Idemitsu Kosan Co., Ltd. Derive d'uracile et composition herbicide
JP2003010767A (ja) 2001-07-03 2003-01-14 Toppan Printing Co Ltd スリットノズルの洗浄方法及び洗浄機構
JP2003050469A (ja) 2001-08-08 2003-02-21 Pentax Corp 多重露光描画装置および多重露光式描画方法
JP2003514809A (ja) * 1999-11-16 2003-04-22 バイエル アクチェンゲゼルシャフト ベンゾフラノンオキシムの製造方法
JP2003131379A (ja) 2001-10-22 2003-05-09 Fuji Photo Film Co Ltd 感光性樹脂組成物、転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法
JP2003156853A (ja) 2001-11-20 2003-05-30 Pentax Corp 露光装置および露光方法
JP2003164787A (ja) 2001-11-29 2003-06-10 Canon Inc 液体の吐出口
JP2003170098A (ja) 2001-12-06 2003-06-17 Shimadzu Corp スリットコータ
JP2003177522A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177520A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177523A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177521A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177519A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003207787A (ja) 2001-11-08 2003-07-25 Fuji Photo Film Co Ltd スペーサー用樹脂組成物及びスペーサー並びに液晶表示素子
JP2003302639A (ja) 2002-04-11 2003-10-24 Fuji Photo Film Co Ltd スペーサー用樹脂組成物及び液晶表示素子
JP2003337424A (ja) 2002-05-20 2003-11-28 Fuji Photo Film Co Ltd 画像形成材料
JP2004017043A (ja) 2002-06-14 2004-01-22 Samsung Electronics Co Ltd 感光物質コーティング方法及び装置
JP2004056080A (ja) 2002-05-30 2004-02-19 Dainippon Screen Mfg Co Ltd 画像記録装置
JP2004089851A (ja) 2002-08-30 2004-03-25 Shimadzu Corp スリットコータ
US6719008B1 (en) 1999-07-13 2004-04-13 Fmc Technologies, S.A. Offshore loading system by suspended piping
JP2004523101A (ja) 2000-11-08 2004-07-29 オルボテック リミテッド 複層プリント回路基板製造システム及び方法
JP2004347831A (ja) 2003-05-22 2004-12-09 Fuji Photo Film Co Ltd カラーフィルター
JP2005043576A (ja) 2003-07-25 2005-02-17 Pentax Corp パターン描画装置
US6882843B1 (en) 2000-09-14 2005-04-19 Cellemetry, Llc Multiple wireless data transport transceiver system
JP2005182004A (ja) 2003-11-27 2005-07-07 Taiyo Ink Mfg Ltd 硬化性樹脂組成物、その硬化物、およびプリント配線板
WO2005082838A1 (en) * 2004-02-19 2005-09-09 Ppg-Sipsy New process for the synthesis of substituted alpha -aminoindan derivatives
JP2005319758A (ja) * 2004-05-11 2005-11-17 Fuji Photo Film Co Ltd 平版印刷方法及びそれに用いる平版印刷版原版
JP2006036750A (ja) 2004-02-23 2006-02-09 Mitsubishi Chemicals Corp オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP2007041082A (ja) 2005-07-29 2007-02-15 Fujifilm Holdings Corp 液晶表示素子用感光性樹脂組成物、それを用いたカラーフィルタ並びにその製造方法、及び、lcd表示素子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU196288B (en) * 1985-06-04 1988-11-28 Egyt Gyogyszervegyeszeti Gyar Fungicides containing as active substance new derivatives of fenantren and process for production of the active substance
TW304945B (ja) * 1992-06-27 1997-05-11 Hoechst Ag
JPH06239812A (ja) * 1993-02-16 1994-08-30 Otsuka Pharmaceut Co Ltd 1−アミノ−2,3−ジヒドロ−7−ヒドロキシ−1h−インデン誘導体の製造法
CN101805282B (zh) * 2004-02-23 2012-07-04 三菱化学株式会社 肟酯化合物、光聚合性组合物和使用该组合物的滤色器
EP1797030A1 (en) * 2004-09-08 2007-06-20 Teva Pharmaceuticals USA, Inc. Improved process for the synthesis of indanylamine or aminotetralin derivatives and novel intermediates

Patent Citations (159)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2681294A (en) 1951-08-23 1954-06-15 Eastman Kodak Co Method of coating strip material
US3287368A (en) * 1965-06-08 1966-11-22 Mcneilab Inc Dihydrobenzothiepin-5(2h)-one oximes
US3579339A (en) 1967-05-23 1971-05-18 Du Pont Photopolymerizable dispersions and elements containing nonmigratory photoreducible dyes
JPS4943191B1 (ja) 1969-07-11 1974-11-19
JPS4841708B1 (ja) 1970-01-13 1973-12-07
JPS506034B1 (ja) 1970-08-11 1975-03-10
JPS5034443B2 (ja) 1971-08-20 1975-11-08
JPS5034444B2 (ja) 1971-08-20 1975-11-08
JPS4864183A (ja) 1971-12-09 1973-09-05
JPS5230490B2 (ja) 1972-03-21 1977-08-09
DE2308830A1 (de) 1973-02-22 1974-08-29 Siemens Ag Verfahren zur herstellung von reliefstrukturen
JPS5812577B2 (ja) 1973-12-21 1983-03-09 ヘキスト アクチエンゲゼルシヤフト 光重合可能な複写材料
JPS5137193A (ja) 1974-09-25 1976-03-29 Toyo Boseki
US4139391A (en) 1976-02-16 1979-02-13 Fuji Photo Film Co., Ltd. Light-sensitive resin composition and metal image-forming material using the same
JPS5944615B2 (ja) 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
JPS5425957A (en) 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline
JPS5434327A (en) 1977-08-12 1979-03-13 Ciba Geigy Ag Bispyridone dyes and use thereof in silver halide materials for photograph
EP0007086A1 (de) 1978-07-14 1980-01-23 BASF Aktiengesellschaft Lichthärtbare Form-, Tränk- und Überzugsmassen sowie daraus hergestellte Formkörper
EP0012339A1 (de) 1978-12-14 1980-06-25 BASF Aktiengesellschaft Strahlungshärtbare wässrige Bindemitteldispersionen, Verfahren zu deren Herstellung sowie deren Verwendung
EP0022788A1 (en) 1979-01-08 1981-01-28 OSBORNE, Harry Eugene Fluid pump and method for operating same
DE2936039A1 (de) 1979-09-06 1981-04-02 Bayer Ag, 5090 Leverkusen Wasserdispergierbare, durch strahlen vernetzbare bindemittel aus urethanacrylaten, ein verfahren zu ihrer herstellung sowie die verwendung dieser bindemittel in waessriger dispersion auf dem anstrich-, druckfarben- und textilsektor
EP0033896A1 (de) 1980-02-11 1981-08-19 BASF Aktiengesellschaft Strahlungshärtbare wässrige Bindemitteldispersionen, Verfahren zu ihrer Herstellung und ihre Verwendung
EP0041125A1 (de) 1980-05-08 1981-12-09 Bayer Ag Wässrige Dispersionen auf Basis von (Meth)Acrylsäurealkylester-Polymerisaten
US4371606A (en) 1980-06-09 1983-02-01 Hoechst Aktiengesellschaft 2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives
US4371607A (en) 1980-06-09 1983-02-01 Hoechst Aktiengesellschaft 4-Halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
EP0126541A1 (en) 1983-04-26 1984-11-28 Nippon Oil And Fats Company, Limited Photopolymerization initiator and method of photopolymerization by use of said initiator
JPS6038989A (ja) 1983-08-12 1985-02-28 Nec Corp 固体撮像装置の製造方法
JPS60159743A (ja) 1984-01-30 1985-08-21 Fuji Photo Film Co Ltd 光重合性組成物
JPS60165623A (ja) 1984-02-08 1985-08-28 Nec Corp 透過型表示素子
JPS60166306A (ja) 1984-02-09 1985-08-29 Daicel Chem Ind Ltd 光重合開始剤
JPS60258539A (ja) 1984-06-05 1985-12-20 Fuji Photo Film Co Ltd 光重合性組成物
US4575330B1 (ja) 1984-08-08 1989-12-19
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
JPS6167003A (ja) 1984-09-10 1986-04-07 Canon Inc カラ−イメ−ジセンサ−
JPS61153602A (ja) 1984-12-27 1986-07-12 Matsushita Electronics Corp マイクロレンズの製造方法
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
GB2180358A (en) 1985-07-16 1987-03-25 Mead Corp Photosensitive microcapsules and their use on imaging sheets
US4622286A (en) 1985-09-16 1986-11-11 E. I. Du Pont De Nemours And Company Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
EP0245639A2 (de) 1986-04-12 1987-11-19 Bayer Ag Verfahren zur Herstellung von UV-gehärteten deckend pigmentierten Beschichtungen
US4950581A (en) 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPS6490516A (en) 1987-09-30 1989-04-07 Sumitomo Metal Ind Semiconductor porcelain material
JPH0717737B2 (ja) 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
JPH01152449A (ja) 1987-12-09 1989-06-14 Matsushita Electric Ind Co Ltd カラーフィルタ
EP0320264A2 (en) 1987-12-09 1989-06-14 Matsushita Electric Industrial Co., Ltd. Colour filter
EP0339841A2 (en) 1988-04-13 1989-11-02 The Mead Corporation Photosensitive compositions and materials
WO1990001512A1 (en) 1988-08-12 1990-02-22 Desoto, Inc. Photo-curable vinyl ether compositions
US5153095A (en) 1988-09-21 1992-10-06 Fuji Photo Film Co., Ltd. Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain
JPH02199403A (ja) 1989-01-30 1990-08-07 Toppan Printing Co Ltd カラーフィルターおよびその製造方法
JPH02199404A (ja) 1989-01-30 1990-08-07 Toppan Printing Co Ltd カラーフィルターおよびその製造方法
JPH03164722A (ja) * 1989-11-24 1991-07-16 Fuji Photo Film Co Ltd 有機非線形光学材料およびそれを用いた光波長の変換方法
US5013768A (en) 1989-12-19 1991-05-07 Dai Nippon Toryo Co., Ltd. Photopolymerizable coating composition and process for forming a coating having a stereoscopic pattern
EP0438123A2 (en) 1990-01-16 1991-07-24 Showa Denko Kabushiki Kaisha Near infrared polymerization initiator
EP0441232A2 (de) 1990-02-09 1991-08-14 BASF Aktiengesellschaft Verfahren zur kationischen Photopolymerisation
EP0445624A2 (de) 1990-03-09 1991-09-11 Hoechst Aktiengesellschaft Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
DE4013358A1 (de) 1990-04-26 1991-10-31 Hoechst Ag Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials
EP0511403A1 (en) 1990-11-19 1992-11-04 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition and photosensitive element structure
EP0497531A2 (en) 1991-01-28 1992-08-05 Mitsubishi Chemical Corporation Process for producing ethylene polymers
JPH0572724A (ja) 1991-01-29 1993-03-26 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
WO1992019589A2 (en) * 1991-05-03 1992-11-12 Smithkline Beecham Corporation Lipoxygenase inhibitors
JPH05173320A (ja) 1991-06-25 1993-07-13 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
JP2665696B2 (ja) 1991-07-16 1997-10-22 富士写真フイルム株式会社 顔料分散組成物、カラーフィルター用光重合性組成物溶液及びカラーフィルター
JPH0567405A (ja) 1991-09-09 1993-03-19 Toray Ind Inc 感光性導電ペースト
JPH0750473A (ja) 1991-09-21 1995-02-21 Taiyo Ink Mfg Ltd ソルダーレジストパターン形成方法
JPH05150175A (ja) 1991-10-14 1993-06-18 Asahi Optical Co Ltd 走査式描画装置
JPH05271576A (ja) 1992-01-24 1993-10-19 Toray Ind Inc 感光性導電ペースト
US5368976A (en) 1992-03-27 1994-11-29 Japan Synthetic Rubber Co., Ltd. Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
JPH0616684A (ja) 1992-07-03 1994-01-25 Shin Etsu Chem Co Ltd リン酸エステル基含有オルガノポリシロキサン及びその製造方法並びにアニオン性界面活性剤
JPH0668309A (ja) 1992-08-14 1994-03-11 Matsushita Electric Ind Co Ltd パターン判別用ファジィ推論装置および判別ルール作成装置
DE4228514A1 (de) 1992-08-27 1994-03-03 Hoechst Ag Bindemittel für Pulverlacke
JPH0770033A (ja) * 1992-10-30 1995-03-14 Egyt Gyogyszervegyeszeti Gyar ベンゾ[e]インデン誘導体
JPH06230212A (ja) 1993-01-29 1994-08-19 Toyo Ink Mfg Co Ltd アルカリ現像型感光性着色組成物
EP0624826A1 (de) 1993-05-14 1994-11-17 OCG Microelectronic Materials Inc. Verfahren zur Herstellung von Reliefstrukturen durch i-Linien-Bestrahlung
EP0636669A2 (en) 1993-07-30 1995-02-01 Dsm N.V. Radiation curable binder composition for powder paint formulations
US5650263A (en) 1993-08-16 1997-07-22 Fuji Photo Film Co., Ltd. Photopolymerizable composition, color filter, and production of color filter
US5847015A (en) 1993-09-24 1998-12-08 Jsr Corporation Pigment-dispersed radiation-sensitive composition for color filters
JPH07294726A (ja) 1993-09-28 1995-11-10 Cheil Synthetics Inc 液晶ディスプレーカラーフィルター用感光性樹脂組成物
US5879855A (en) 1993-11-22 1999-03-09 Ciba Specialty Chemicals Corporation Compositions for making structured color images and application thereof
US5626796A (en) 1994-03-18 1997-05-06 Fuji Photo Film Co., Ltd. Light sensitive composition for black matrix, substrate for color filter, and liquid crystal display
EP0678534A1 (de) 1994-04-22 1995-10-25 BASF Aktiengesellschaft Gele mit thermotropen Eigenschaften
EP0706091A1 (en) 1994-09-30 1996-04-10 Hercules Incorporated Liquid photoimageable resist
JPH08171863A (ja) 1994-10-17 1996-07-02 Taiyo Ink Mfg Ltd プラズマディスプレイパネルの隔壁形成用組成物及びそれを用いた隔壁形成方法
US5969867A (en) 1994-10-18 1999-10-19 Mitsubishi Rayon Company Ltd. Active energy ray-curable composition and lens sheet
US5882843A (en) 1994-11-15 1999-03-16 Hoechst Japan Limited Photosensitive resin composition for color filter production
US5879866A (en) 1994-12-19 1999-03-09 International Business Machines Corporation Image recording process with improved image tolerances using embedded AR coatings
JPH08179120A (ja) 1994-12-20 1996-07-12 Nippon Kayaku Co Ltd カラーフィルタ用色素及びこれを含有するカラーレジスト、カラーフィルタ
US5650233A (en) 1995-01-05 1997-07-22 Daicel Chemical Industries, Ltd. Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition
US5677385A (en) 1995-01-05 1997-10-14 Daicel Chemical Industries, Ltd. Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition
US5863678A (en) 1995-01-17 1999-01-26 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter
JPH08305019A (ja) 1995-05-10 1996-11-22 Fuji Photo Film Co Ltd 光重合性組成物
WO1996036596A1 (en) * 1995-05-19 1996-11-21 Chiroscience Limited 3,4-disubstituted-phenylsulphonamides and their therapeutic use
JPH0948770A (ja) * 1995-06-02 1997-02-18 Sankyo Co Ltd 芳香族オキシイミノ誘導体
WO1996041240A1 (en) 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
US5821016A (en) 1995-06-29 1998-10-13 Hitachi Chemical Company, Ltd. Colored image forming material and color filter obtained therefrom
US5840465A (en) 1995-07-17 1998-11-24 Taiyo Ink Manufacturing Co., Ltd. Compositions and method for formation of barrier ribs of plasma display panel
US5866298A (en) 1995-11-22 1999-02-02 Japan Synthetic Rubber Co., Ltd. Radiation sensitive composition for color filters
EP0780729A1 (en) 1995-12-20 1997-06-25 Tokyo Ohka Kogyo Co., Ltd. Chemical-sensitization photoresist composition
JPH09179299A (ja) 1995-12-21 1997-07-11 Fuji Photo Film Co Ltd 感放射線性組成物
US5800952A (en) 1995-12-22 1998-09-01 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid display device
DE19700064A1 (de) 1996-01-13 1997-07-17 Basf Ag Gele mit thermotropen Eigenschaften
JPH09269410A (ja) 1996-02-02 1997-10-14 Tokyo Ohka Kogyo Co Ltd 緑色カラーフィルタ用感光性組成物及びこれを用いた緑色カラーフィルタの製造方法
JPH09244230A (ja) 1996-03-07 1997-09-19 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント及びこの感光性エレメントを用いた蛍光体パターンの製造方法
US5853446A (en) 1996-04-16 1998-12-29 Corning Incorporated Method for forming glass rib structures
JPH09325209A (ja) 1996-06-06 1997-12-16 Fuji Photo Film Co Ltd Lcd表示装置用カラーフィルター
EP0855731A1 (en) 1996-07-10 1998-07-29 Toray Industries, Inc. Plasma display and method of manufacturing the same
WO1999038035A1 (fr) 1996-07-22 1999-07-29 Maikurooputo Co., Ltd. Procede de fabrication d'une mini-lentille plate et mince; mini-lentille ainsi produite
JPH1062980A (ja) 1996-08-23 1998-03-06 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれを用いた蛍光体パターンの製造法
JPH10171119A (ja) 1996-12-11 1998-06-26 Tokyo Ohka Kogyo Co Ltd 光重合性樹脂組成物、およびこれを用いた色フィルタの製造方法
JPH10221843A (ja) 1997-02-06 1998-08-21 Tokyo Ohka Kogyo Co Ltd 色フィルタ用感光性組成物及びこれを用いた色フィルタの製造方法
EP0863534A2 (en) 1997-03-06 1998-09-09 E.I. Du Pont De Nemours And Company Plasma display panel device and method of fabricating the same
EP0881541A1 (en) 1997-05-28 1998-12-02 JSR Corporation Radiation sensitive composition and color filter
EP0932256A1 (en) 1997-07-03 1999-07-28 Seiko Epson Corporation Ladder type resistance circuit, and digital-analog converter and semiconductor device using the same
EP0902327A2 (en) 1997-09-09 1999-03-17 JSR Corporation Radiation sensitive composition
JPH11133600A (ja) 1997-10-30 1999-05-21 Jsr Corp 表示パネルスペーサー用感放射線性樹脂組成物
JPH11149008A (ja) 1997-11-17 1999-06-02 Fuji Photo Film Co Ltd 感光性転写材料およびカラーフィルターの製造方法
JPH11174459A (ja) 1997-12-11 1999-07-02 Hitachi Chem Co Ltd カラー液晶表示装置用スペーサーフィルム
JPH11174464A (ja) 1997-12-12 1999-07-02 Hitachi Chem Co Ltd 樹脂スペーサー形成用感光性フィルム
JP2000039033A (ja) 1998-06-17 2000-02-08 Valeo 乾式摩擦クラッチのライニング及びその製造方法
JP2000080068A (ja) 1998-06-26 2000-03-21 Ciba Specialty Chem Holding Inc 新規o―アシルオキシム光開始剤
JP2000039503A (ja) 1998-07-22 2000-02-08 Matsushita Electric Ind Co Ltd レンズアレイ
JP2002523905A (ja) 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2000081701A (ja) 1998-09-03 2000-03-21 Jsr Corp カラーフィルター保護膜用感放射線性樹脂組成物
JP2000194132A (ja) 1998-12-25 2000-07-14 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
US6719008B1 (en) 1999-07-13 2004-04-13 Fmc Technologies, S.A. Offshore loading system by suspended piping
JP2003514809A (ja) * 1999-11-16 2003-04-22 バイエル アクチェンゲゼルシャフト ベンゾフラノンオキシムの製造方法
JP2001233842A (ja) 1999-12-15 2001-08-28 Ciba Specialty Chem Holding Inc オキシムエステルの光開始剤
JP2001235858A (ja) * 1999-12-15 2001-08-31 Ciba Specialty Chem Holding Inc 感光性樹脂組成物
JP2001255661A (ja) 2000-01-05 2001-09-21 Orbotech Ltd パルス光パターン書込み装置
JP2001310147A (ja) 2000-05-02 2001-11-06 Tokyo Ohka Kogyo Co Ltd スリットコータの予備吐出装置および予備吐出方法
JP2002079163A (ja) 2000-09-05 2002-03-19 Toppan Printing Co Ltd スリットコータ
US6882843B1 (en) 2000-09-14 2005-04-19 Cellemetry, Llc Multiple wireless data transport transceiver system
JP2004523101A (ja) 2000-11-08 2004-07-29 オルボテック リミテッド 複層プリント回路基板製造システム及び方法
JP2002323762A (ja) * 2001-04-25 2002-11-08 Nippon Kayaku Co Ltd ネガ型着色感光性組成物
WO2002102798A1 (fr) * 2001-06-13 2002-12-27 Idemitsu Kosan Co., Ltd. Derive d'uracile et composition herbicide
JP2003010767A (ja) 2001-07-03 2003-01-14 Toppan Printing Co Ltd スリットノズルの洗浄方法及び洗浄機構
JP2003050469A (ja) 2001-08-08 2003-02-21 Pentax Corp 多重露光描画装置および多重露光式描画方法
JP2003131379A (ja) 2001-10-22 2003-05-09 Fuji Photo Film Co Ltd 感光性樹脂組成物、転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法
JP2003207787A (ja) 2001-11-08 2003-07-25 Fuji Photo Film Co Ltd スペーサー用樹脂組成物及びスペーサー並びに液晶表示素子
JP2003156853A (ja) 2001-11-20 2003-05-30 Pentax Corp 露光装置および露光方法
JP2003164787A (ja) 2001-11-29 2003-06-10 Canon Inc 液体の吐出口
JP2003170098A (ja) 2001-12-06 2003-06-17 Shimadzu Corp スリットコータ
JP2003177521A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177519A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177520A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177523A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003177522A (ja) 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 画像形成材料
JP2003302639A (ja) 2002-04-11 2003-10-24 Fuji Photo Film Co Ltd スペーサー用樹脂組成物及び液晶表示素子
JP2003337424A (ja) 2002-05-20 2003-11-28 Fuji Photo Film Co Ltd 画像形成材料
JP2004056080A (ja) 2002-05-30 2004-02-19 Dainippon Screen Mfg Co Ltd 画像記録装置
JP2004017043A (ja) 2002-06-14 2004-01-22 Samsung Electronics Co Ltd 感光物質コーティング方法及び装置
JP2004089851A (ja) 2002-08-30 2004-03-25 Shimadzu Corp スリットコータ
JP2004347831A (ja) 2003-05-22 2004-12-09 Fuji Photo Film Co Ltd カラーフィルター
JP2005043576A (ja) 2003-07-25 2005-02-17 Pentax Corp パターン描画装置
JP2005182004A (ja) 2003-11-27 2005-07-07 Taiyo Ink Mfg Ltd 硬化性樹脂組成物、その硬化物、およびプリント配線板
WO2005082838A1 (en) * 2004-02-19 2005-09-09 Ppg-Sipsy New process for the synthesis of substituted alpha -aminoindan derivatives
JP2006036750A (ja) 2004-02-23 2006-02-09 Mitsubishi Chemicals Corp オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP2005319758A (ja) * 2004-05-11 2005-11-17 Fuji Photo Film Co Ltd 平版印刷方法及びそれに用いる平版印刷版原版
JP2007041082A (ja) 2005-07-29 2007-02-15 Fujifilm Holdings Corp 液晶表示素子用感光性樹脂組成物、それを用いたカラーフィルタ並びにその製造方法、及び、lcd表示素子

Non-Patent Citations (23)

* Cited by examiner, † Cited by third party
Title
"Next-Generation Liquid Crystal Display Technology", 1994, KOGYO CHOSAKAI PUBLISHING INC.
"Organic Syntheses coll.", vol. VI, 1988, J. WILEY & SONS
"TFT Liquid Crystal Displays", 1996, KYORITSU SHUPPAN CO., LTD.
A. BERTSCH; J. Y JEZEQUEL; J. C. ANDRE, JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A: CHEMISTRY, vol. 107, 1997, pages 275 - 281
E. A; BARTMANN, SYNTHESIS, vol. 5, 1933, pages 490
G. BUHR; R. DAMMEL; C. LINDLEY, POLYM. MATER. SCI. ENG., vol. 61, 1989, pages 269
J, MARCH: "Advanced Organic Chemistry", 1992, WILEY INTERSCIENCE
JOURNAL OF THE ADHESION SOCIETY OF JAPAN, vol. 20, no. 7, pages 300 - 308
JOURNAL OF THE RESEARCH GROUP IN MICROOPTICS JAPANESE SOCIETY OF APPLIED PHYSICS, COLLOQUIUM IN OPTICS, vol. 5, no. 2, 1987, pages 118 - 123
K. KOBAYASHI, SOLID STATE TECHNOL., November 1992 (1992-11-01), pages S15 - S18
K. -P. MIECK; T. REUSSMANN, KUNSTSTOFFE, vol. 85, 1995, pages 366 - 370
K. -P. NICOLAY, OFFSET PRINTING, vol. 6, 1997, pages 34 - 37
KENTARO SHIMA: "Market of Liquid Crystal Display-related Materials and Chemicals", 1994, CMC PUBLISHING
M. WITTIG; TH. GOHMANN: "Radiation Curing of Powder Coating", CONFERENCE PROCEEDINGS, 1993
P, H. SELDEN: "Glaefaserveretaerkte Kunststoffe", 1967, SPRINGER VERLAG, pages: 610
POPOVIC ET AL., SPIE, vol. 898, 1988, pages 23 - 25
RYOKICHI OMOTE: "Current Status and Future Prospect of Liquid Crystal-related Market", vol. 2ND, 2003, FUJI CHIMERA RESEARCH INSTITUTE, INC.
S. R. SANDLER; W. KARO: "Organic functional group preparations", vol. 3, ACADEMIC PRESS
SCAPINI G.: "Substances with antiviral activity. III. Structures of monosubstituted derivatives of 1H-benzo[e]indene-1,3-dione", FARMACO, EDIZIONE SCIENTIFICA, vol. 30, no. 7, 1975, pages 568 - 580, XP003022954 *
See also references of EP2116527A4
T. KUDO ET AL., J. APPL. PHYS., vol. 37, 1998, pages 3594 - 3603
T. KUDO ET AL., J. PHOTOPOLYM. SCI, TECHNOL., vol. 9, 1996, pages 109
T. KUDO ET AL., JPN. J. APPL. PHYS., vol. 37, 1998, pages 3594

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012530753A (ja) * 2009-06-25 2012-12-06 ワッカー ケミー アクチエンゲゼルシャフト ヒドロシリル化方法
US20130158149A1 (en) * 2010-09-06 2013-06-20 Dic Corporation Active-energy-ray-curable hot-melt urethane resin composition, member for electronic device, the member including the resin composition, and packing
US9404017B2 (en) * 2010-09-06 2016-08-02 Dic Corporation Active-energy-ray-curable hot-melt urethane resin composition, member for electronic device, the member including the resin composition, and packing
US20130041062A1 (en) * 2010-09-22 2013-02-14 Adeka Corporation Dye and coloring photosensitive composition
US8664289B2 (en) * 2010-09-22 2014-03-04 Adeka Corporation Dye and coloring photosensitive composition
JP2013098166A (ja) * 2011-10-27 2013-05-20 Far Eastern New Century Corp 導電性基板の製造方法及びその導電性基板
WO2013146372A1 (ja) * 2012-03-30 2013-10-03 富士フイルム株式会社 黒色樹脂膜、静電容量型入力装置及びそれらの製造方法並びにこれを備えた画像表示装置
JP2013228695A (ja) * 2012-03-30 2013-11-07 Fujifilm Corp 黒色樹脂膜、静電容量型入力装置及びそれらの製造方法並びにこれを備えた画像表示装置
US9760219B2 (en) 2012-03-30 2017-09-12 Fujifilm Corporation Black resin film, capacitance type input device, method for producing them, and image display apparatus using the same
US9411226B2 (en) 2014-08-19 2016-08-09 Shin-Etsu Chemical Co., Ltd. Chemically amplified resist composition and patterning process

Also Published As

Publication number Publication date
KR20090104877A (ko) 2009-10-06
EP2116527A1 (en) 2009-11-11
EP2116527A4 (en) 2011-09-14
US20110123929A1 (en) 2011-05-26

Similar Documents

Publication Publication Date Title
WO2008090640A1 (ja) オキシム化合物、感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示素子
WO2009044707A1 (ja) ニトロトリアゾール誘導体、およびそれを用いる化合物の製造方法
MX2009008781A (es) Derivados de ciclohexano espirociclicos.
WO2009072581A1 (ja) ラクタム化合物又はその塩及びppar活性化剤
EP1736467A4 (en) NEW SULFONIC ACID AMID DERIVATIVE
WO2006027705A3 (en) Synthesis of triethylenetetramines
WO2008033494A3 (en) Purification of bis(thiohydrazide amides)
WO2006113509A3 (en) Quinobenzoxazine analogs and methods of using thereof
WO2004109400A3 (en) Novel photosensitive resin compositions
WO2008033229A3 (en) A method of making porous crystalline materials
KR20090008811A (ko) 신규한 옥심 카바메이트 화합물, 이를 함유하는 광중합개시제 및 광중합성 조성물
WO2008126943A3 (en) Method for manufacturing neuraminic acid derivatives
WO2012087930A3 (en) Electroactive materials
WO2008136512A1 (ja) 光学異性体用分離剤
WO2009154754A3 (en) Synthesis of deuterated morpholine derivatives
NZ596653A (en) Total synthesis of salinosporamide a and analogs thereof
WO2008105138A1 (ja) ポリチオウレタン系光学材料用重合触媒、それを含む重合性組成物、それより得られる光学材料、およびその製造方法
TW200712133A (en) Azo compound, colored curable composition, color filter and manufacturing method therefor
MY143665A (en) Method of producing aminophenol compounds.
EA201000464A1 (ru) Способ получения очищенного синтез-газа из синтез-газа, содержащего следовые количества примеси сернистых соединений, с помощью металлорганической структуры
TW200624513A (en) Cyanine compound, optical filter, and optical recording material
EP1808464A4 (en) FILTER FOR AN ELECTRONIC DISPLAY
WO2005058812A3 (en) Prostaglandin synthesis
TW200707094A (en) Colored photosensitive resin composition
EP1637526A4 (en) CURABLE, POLYCYCLIC COMPOUNDS AND METHOD FOR THE PRODUCTION THEREOF

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200780052289.X

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07791783

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 1020097017452

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2007791783

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 12523926

Country of ref document: US