US8124193B2 - Gloss control of UV curable formulations through micro-patterning - Google Patents
Gloss control of UV curable formulations through micro-patterning Download PDFInfo
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- US8124193B2 US8124193B2 US12/400,238 US40023809A US8124193B2 US 8124193 B2 US8124193 B2 US 8124193B2 US 40023809 A US40023809 A US 40023809A US 8124193 B2 US8124193 B2 US 8124193B2
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0081—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0045—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or film forming compositions cured by mechanical wave energy, e.g. ultrasonics, cured by electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams, or cured by magnetic or electric fields, e.g. electric discharge, plasma
Abstract
Description
wherein:
R1 is:
(i) an alkylene group (wherein an alkylene group is a divalent aliphatic group or alkyl group, including linear and branched, saturated and unsaturated, cyclic and acyclic, and substituted and unsubstituted alkylene groups, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in the alkylene group) having from about 1 carbon atom to about 12 carbon atoms, such as from about 1 carbon atom to about 8 carbon atoms or from about 1 carbon atom to about 5 carbon atoms, although the number of carbon atoms can be outside of these ranges,
(ii) an arylene group (wherein an arylene group is a divalent aromatic group or aryl group, including substituted and unsubstituted arylene groups, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in the arylene group) having from about 1 carbon atom to about 15 carbon atoms, such as from about 3 carbon atoms to about 10 carbon atoms or from about 5 carbon atoms to about 8 carbon atoms, although the number of carbon atoms can be outside of these ranges,
(iii) an arylalkylene group (wherein an arylalkylene group is a divalent arylalkyl group, including substituted and unsubstituted arylalkylene groups, wherein the alkyl portion of the arylalkylene group can be linear or branched, saturated or unsaturated, and cyclic or acyclic, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in either the aryl or the alkyl portion of the arylalkylene group) having from about 6 carbon atoms to about 32 carbon atoms, such as from about 6 carbon atoms to about 22 carbon atoms or from about 6 carbon atoms to about 12 carbon atoms, although the number of carbon atoms can be outside of these ranges, or
(iv) an alkylarylene group (wherein an alkylarylene group is a divalent alkylaryl group, including substituted and unsubstituted alkylarylene groups, wherein the alkyl portion of the alkylarylene group can be linear or branched, saturated or unsaturated, and cyclic or acyclic, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in either the aryl or the alkyl portion of the alkylarylene group) having from about 5 carbon atoms to about 32 carbon atoms, such as from about 6 carbon atoms to about 22 carbon atoms or from about 7 carbon atoms to about 15 carbon atoms, although the number of carbon atoms can be outside of these ranges, wherein the substituents on the substituted alkylene, arylene, arylalkylene, and alkylarylene groups can be (but are not limited to) halogen atoms, cyano groups, pyridine groups, pyridinium groups, ether groups, aldehyde groups, ketone groups, ester groups, amide groups, carbonyl groups, thiocarbonyl groups, sulfide groups, nitro groups, nitroso groups, acyl groups, azo groups, urethane groups, urea groups, mixtures thereof, and the like, wherein two or more substituents can be joined together to form a ring;
(ii) arylene groups having from about 5 carbon atoms to about 15 carbon atoms, such as from about 5 carbon atoms to about 13 carbon atoms or from about 5 carbon atoms to about 10 carbon atoms, although the number of carbon atoms can be outside of these ranges,
(iii) arylalkylene groups having from about 6 carbon atoms to about 32 carbon atoms, such as from about 7 carbon atoms to about 33 carbon atoms or from about 8 carbon atoms to about 15 carbon atoms, although the number of carbon atoms can be outside of these ranges, or
(iv) alkylarylene groups having from about 6 carbon atoms to about 32 carbon atoms, such as from about 6 carbon atoms to about 22 carbon atoms or from about 7 carbon atoms to about 15 carbon atoms, although the number of carbon atoms can be outside of these ranges,
or the like, or:
(b) a group which is:
(i) an alkyl group (including linear and branched, saturated and unsaturated, cyclic and acyclic, and substituted and unsubstituted alkyl groups, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in the alkyl group) having from about 2 carbon atoms to about 100 carbon atoms, such as from about 3 carbon atoms to about 60 carbon atoms or from about 4 carbon atoms to about 30 carbon atoms,
(ii) an aryl group (including substituted and unsubstituted aryl groups, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in the aryl group) having from about 5 carbon atoms to about 100 carbon atoms, such as from about 5 carbon atoms to about 60 carbon atoms or from about 6 carbon atoms to about 30 carbon atoms, such as phenyl or the like,
(iii) an arylalkyl group (including substituted and unsubstituted arylalkyl groups, wherein the alkyl portion of the arylalkyl group can be linear or branched, saturated or unsaturated, and cyclic or acyclic, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in either the aryl or the alkyl portion of the arylalkyl group) having from about 5 carbon atoms to about 100 carbon atoms, such as from about 5 carbon atoms to about 60 carbon atoms or from about 6 carbon atoms to about 30 carbon atoms, such as benzyl or the like, or
(iv) an alkylaryl group (including substituted and unsubstituted alkylaryl groups, wherein the alkyl portion of the alkylaryl group can be linear or branched, saturated or unsaturated, and cyclic or acyclic, and wherein heteroatoms, such as oxygen, nitrogen, sulfur, silicon, phosphorus, boron, and the like either may or may not be present in either the aryl or the alkyl portion of the alkylaryl group) having from about 5 carbon atoms to about 100 carbon atoms, such as from about 5 carbon atoms to about 60 carbon atoms or from about 6 carbon atoms to about 30 carbon atoms, such as tolyl or the like,
wherein —C34H56+a— represents a branched alkylene group which may include unsaturations and cyclic groups, wherein a is an integer of 0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12.
wherein R1 is an alkyl group having at least seventeen carbons, R2 includes a polyalkyleneoxide, R3 includes a C-6 carbocyclic group, and n is an integer of at least 1.
as well as other branched isomers that may include unsaturations and cyclic groups, available from Uniqema, New Castle, Del.; further information on C36 dimer diols of this type is disclosed in, for example, “Dimer Acids,” Kirk-Othmer Encyclopedia of Chemical Technology, Vol. 8, 4th Ed. (1992), pp. 223 to 237, the disclosure of which is totally incorporated herein by reference, may also be used. These alcohols can be reacted with carboxylic acids equipped with UV curable moieties to form reactive esters. Examples of these acids include acrylic and methacrylic acids, available from Sigma-Aldrich Co.
as well as other branched isomers that may include unsaturations and cyclic groups, available from Uniqema, New Castle, Del.; further information on C36 dimer acids of this type is disclosed in, for example, “Dimer Acids,” Kirk-Othmer Encyclopedia of Chemical Technology, Vol. 8, 4th Ed. (1992), pp. 223 to 237, the disclosure of which is totally incorporated herein by reference, can also be used. These carboxylic acids can be reacted with alcohols equipped with UV curable moieties to form reactive esters. Examples of these alcohols include, but are not limited to, 2-allyloxyethanol from Sigma-Aldrich Co.;
TABLE 1 | |||
COMPONENT | wt. % | ||
Curable amide gellant | 7.5 | ||
Unilin 350-acrylate | 5.0 | ||
SR399LV pentafunctional acrylate monomer | 5.0 | ||
SR9003 difunctional acrylate monomer | 52.8 | ||
Irgacure 379 | 3 | ||
Irgacure 819 | 1 | ||
Irgacure 127 | 3.5 | ||
Darocur ITX | 2 | ||
Irgastab UV stabilizer | 0.2 | ||
Cyan pigment dispersion, 15 wt. % | 20 | ||
The curable amide gellant is a mixture comprising:
wherein —C34H56+a— represents a branched alkylene group which may include unsaturations and cyclic groups, wherein a is variously an integer of 0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12, as described above.
TABLE 2 | ||
Mesh Opening | Gloss Measurement (ggu) |
(μm) | 60° | 20° |
No mesh | 69.4 | 30.0 |
80 | 56.5 | 16.2 |
150 | 40.0 | 17.3 |
250 | 71.4 | 29.0 |
As indicated by the results of Table 2, the amount of gloss reduction depends upon the degree and extent of micro-roughness provided to the surface of the ink composition, which is a function of the size of the mesh openings. The meshes having openings of about 80 μm in diameter and about 150 μm in diameter, respectively, reduced the gloss of the image as compared to the gloss of an image obtained when no mesh was used. The mesh having openings of about 150 μm in diameter reduced the gloss at the 60° geometry to a greater extent than did the mesh having an opening of about 80 μm in diameter. However, no significant effect on gloss level was observed with the mesh having openings of about 250 μm in diameter as compared to the gloss of an image obtained when no mesh was used.
Claims (13)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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US12/400,238 US8124193B2 (en) | 2009-03-09 | 2009-03-09 | Gloss control of UV curable formulations through micro-patterning |
CA2695133A CA2695133C (en) | 2009-03-09 | 2010-03-02 | Gloss control of uv curable formulations through micro-patterning |
JP2010049722A JP2010208327A (en) | 2009-03-09 | 2010-03-05 | Gloss control of uv curable compound through micro-patterning |
AT10156000T ATE525220T1 (en) | 2009-03-09 | 2010-03-09 | GLOSS CONTROL OF UV-CURED FORMULATIONS USING MICROSTRUCTURE |
EP10156000A EP2228230B1 (en) | 2009-03-09 | 2010-03-09 | Gloss control of UV curable formulations through micro-patterning |
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US12/400,238 US8124193B2 (en) | 2009-03-09 | 2009-03-09 | Gloss control of UV curable formulations through micro-patterning |
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US8124193B2 true US8124193B2 (en) | 2012-02-28 |
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US (1) | US8124193B2 (en) |
EP (1) | EP2228230B1 (en) |
JP (1) | JP2010208327A (en) |
AT (1) | ATE525220T1 (en) |
CA (1) | CA2695133C (en) |
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US10877377B2 (en) | 2015-10-13 | 2020-12-29 | Microtau Ip Pty Ltd | Microstructure patterns |
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US8833922B2 (en) | 2011-11-22 | 2014-09-16 | Electronics For Imaging, Inc. | Printing system for application of a patterned clear layer for reducing gloss banding |
EP2789470B1 (en) * | 2011-12-08 | 2018-01-24 | Konica Minolta, Inc. | Photocuring inkjet ink and image forming method using same |
EP2682273B1 (en) | 2012-07-06 | 2015-09-09 | Agfa Graphics Nv | Methods for inkjet varnishing |
CN105163869A (en) * | 2013-04-03 | 2015-12-16 | 太阳化学公司 | Uv-curable inkjet and overprint varnish combination |
WO2019116079A1 (en) * | 2017-12-13 | 2019-06-20 | Assa Abloy Ab | Differential gloss level security marks |
US20210394542A1 (en) * | 2020-06-23 | 2021-12-23 | Robert Krzykawski | Method for printing a headstone |
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Publication number | Publication date |
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ATE525220T1 (en) | 2011-10-15 |
JP2010208327A (en) | 2010-09-24 |
CA2695133A1 (en) | 2010-09-09 |
EP2228230A1 (en) | 2010-09-15 |
US20100227075A1 (en) | 2010-09-09 |
EP2228230B1 (en) | 2011-09-21 |
CA2695133C (en) | 2014-02-18 |
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