US20120039345A1 - Passively mode-locked picosecond laser device - Google Patents
Passively mode-locked picosecond laser device Download PDFInfo
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- US20120039345A1 US20120039345A1 US12/669,951 US66995109A US2012039345A1 US 20120039345 A1 US20120039345 A1 US 20120039345A1 US 66995109 A US66995109 A US 66995109A US 2012039345 A1 US2012039345 A1 US 2012039345A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0619—Coatings, e.g. AR, HR, passivation layer
- H01S3/0621—Coatings on the end-faces, e.g. input/output surfaces of the laser light
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
- H01S3/08068—Holes; Stepped surface; Special cross-section
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0817—Configuration of resonator having 5 reflectors, e.g. W-shaped resonators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10061—Polarization control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
Definitions
- the present invention relates to an ultra-short pulse laser device, and particularly to a passive mode-locked picosecond laser device.
- the tendency of laser field is to realize the high-power, high beam quality, high efficiency, high stability and long life of a laser device which is in small size, compact structure, stable performance, and all solid state.
- the demand for ultra short pulse laser is increasingly higher, especially for the picosecond laser, which has more application prospect than a femtosecond laser (for example, the fields of the national defense, industrial, medical, biological, and other areas). Therefore, a current important research task is to develop a high-quality, high efficiency, high stability picosecond laser.
- a dye mode-locked is utilized, for example, a published Chinese patent application No. 03114621.X, entitled as “high light-output time stability passive mode-locked Nd:YAG picosecond laser device” which has complex and bulky electronic control system. Also, the dye, being of highly toxic, would be diluted after some time, so needs to be replaced, therefore the life time is short which is not facilitated for industrialization and human health.
- active mode-locked technology is utilized, such as, the Chinese patent application No. 03210775.7, entitled as “laser-diode-pump picosecond active mode-locked solid planar waveguide laser device”.
- mode-locked picosecond laser device Because the technology of wave-guide is developed prematurely and the yield is very low, it is difficult to produce mode-locked picosecond laser device in large scale, and such active mode-locked has low stability performance.
- mode-locked picosecond laser device technology a passive mode-locked technology used for realizing low-repetition-frequency, such as Chinese utility model application No. 200520000394.7, entitled as “cavity-dumped all-solid-state picosecond laser device”, wherein Pockels cell is used to realize cavity-dumped giant laser pulse oscillations, which significantly damages the SESAM, and such damage can not be restored once occurring.
- confocal structure is popularly used in the laser cavity of the existing laser device technology. Although such structure is stable, the cavity is relatively longer with the structure incompact.
- the existing technologies are lack of a low-repetition-frequency passive mode-locked picosecond laser with compact structure and stable performance.
- the present invention provides a stable performance, small size, low-repetition-frequency passive mode-locked picosecond laser device.
- the present invention adopts the following technical solution.
- a passive mode-locked picosecond laser device including a pump source, laser crystal, a laser cavity, and a mode-locked output structure.
- the pump source is placed at the side of the incidence end of the laser crystal, so as to pump the laser crystal.
- the laser cavity includes a plane reflective mirror and a first plano-concave mirror, wherein the plane reflective mirror is placed at the position of focal radius of the first plano-concave mirror and opposite to the first plano-concave mirror, with a small angle formed between the normal line of the plane mirror and the axis of the first plano-concave mirror.
- the laser generated by the laser crystal oscillates within the laser cavity, and is mode-locking output through the mode-locked output structure.
- the angle between the normal direction of the plane reflective mirror and the axis of the first plano-concave mirror is ⁇ , where 0° ⁇ 1°.
- the laser crystal is embedded in the first plano-concave mirror.
- the first plan-concave mirror includes a gap where the laser crystal is placed, and the exit end surface of the laser crystal is located inside the arc surface of the plano-concave mirror.
- the mode-locked output structure includes a plane output mirror, a second plano-concave mirror and a semiconductor saturable absorber wherein the plane output mirror is semi-transparent semi-reflective mirror which is used to receive the laser from the laser crystal and reflect a part of the laser to the second plano-concave mirror.
- the second plano-concave mirror reflects the laser coming from the plane output mirror to perpendicularly enter the semiconductor saturable absorber.
- the mode-locked output structure includes the second plano-concave mirror, the semiconductor saturable absorber, a polarizer, a 1 ⁇ 4 wave plate and a 45° reflective mirror.
- the polarizer receives the laser from the laser crystal, and reflects it to the second plano-concave mirror through the 1 ⁇ 4 wave plate.
- the second plano-concave mirror is used to receive the laser reflected by polarizer and reflect it to perpendicularly enter the semiconductor saturable absorber.
- the 45° reflective mirror receives the laser which is reflected back by the semiconductor saturable absorber, passes through the second plan-concave mirror and the 1 ⁇ 4 wave plate and is output from the polarizer, and the 45° reflective mirrorreflects the laser of as the output.
- the laser crystal is Nd:YVO4 or Nd:GdVO4, whose size is 5 mm ⁇ 5 mm ⁇ (3 mm ⁇ 5 mm).
- the radius of the first plano-concave mirror is between 150 mm ⁇ 800 mm.
- the incident end surface of the laser crystal is coated with the thickening film at the pump light wavelength and the high reflective film at the output light wavelength and the export end surface is coated with thickening film at the output light wavelength.
- the passive mode-locked picosecond laser device also includes a focusing mirror which is placed between the pump source and the laser crystal for converging the pump light from the pump source to the laser crystal.
- the present invention innovatively uses a equivalent confocal stable cavity, increasing the optical path, reducing the repetition frequency, and greatly decreasing the cavity length and volume.
- the laser crystal is placed in the gap of the laser cavity or embedded in the end of the laser cavity, resulting in the structure more compact.
- FIG. 1 shows a top view of the passive mode-locked picosecond laser device according to Embodiment 1 of the present invention.
- FIG. 2 shows a right view of the first plano-concave mirror of the passive mode-locked picosecond laser device according to Embodiment 1 of the present invention.
- FIG. 3 shows a top schematic view of the passive mode-locked picosecond laser device according to Embodiment 2 of the present invention.
- FIG. 4 shows a comparison chart between the beam transmitting in the confocal cavity and in the equivalent confocal cavity of the passive mode-locked picosecond laser device according to embodiment of the present invention.
- the LD pump source 1 is placed at the side of the incidence end of the laser crystal 3 for pumping the laser crystal.
- the focusing mirror 2 is placed between the pump source 1 and the laser crystal 3 for converging the pumping light coming from the pump source 1 into the laser crystal 3 , increasing the utilization rate of the pumping light.
- the plane reflective mirror 4 is placed opposite to the first plano-concave mirror 5 and located at the position of the focal radius of the first plano-concave mirror 5 , both of which constitute together a laser cavity (an equivalent confocal cavity).
- the normal direction of the plane reflective mirror 4 and the axis (along of the horizontal direction) of the first plano-concave mirror 5 form a small acute angle therebetween with the acute angle being of ⁇ (0° ⁇ 1°), such that the light incident upon the plane reflective mirror 4 will not be returned back along the original path, but reflected with an small angle of 2 ⁇ .
- the first plano-concave mirror 5 is polished thereon to form an arc with 3 mm-5 mm height, so as to have one gap.
- the laser crystal 3 is placed at the gap, abutting the first plano-concave mirror 5 .
- the export end surface of the laser crystal 3 and the first concave mirror 5 are placed in a substantially same arc surface, or it is possible to “embed” the laser crystal 3 in the end of the laser cavity (the first plano-concave mirror 5 ), in order to save space.
- FIG. 2 shows a schematic view of the polished gap, but the gap can be embodied in other forms as long as it can appropriately receive the laser crystal 3 .
- the size of the laser crystal is 5 mm ⁇ 5 mm ⁇ (3 mm ⁇ 5 mm).
- the incident end surface of the laser crystal is coated with the thickening film at pumping light wavelength (808 nm) and the high reflective film at the output light wavelength (1064 nm) and the export end surface is coated with the thickening film at the output light wavelength (1064 nm).
- the laser crystal 3 can use Nd:YVO4, Nd:GdVO4, and the angular cutting of the laser crystal is implemented by the method of vertical polarization light output cutting. In other cases, if the polarized light output not required, it can also be used the Nd:YAG crystal and so on.
- the laser crystal 3 after being wrapped at its side with indium platinum, is placed into a heat sink copper block (not shown), held in the gap by a support (not shown), and subjected to a temperature control by water-cooling or TEC (semiconductor cooling chip). Because the laser crystal 3 is “embedded” in the first plano-concave mirror, the laser crystal 3 forms a part of the laser cavity, thus the laser cavity structure is more compact.
- TEC semiconductor cooling chip
- the plane output mirror 6 , the second plano-concave mirror 7 , and the SESAM 8 constitute the mode-locked output structure whose placement position can be calibrated by laser with the calibration process as follows: a laser beam, parallel to the normal of the first plano-concave mirror 5 , is incident upon the plane reflective mirror 4 from the center of the laser crystal 3 ; a plane output mirror 6 is placed on the export optical path of the light beam which has been continuously reflected by the equivalent confocal cavity; and a second plano-concave mirror 7 is used to receive the laser reflected by the plane output mirror 6 and reflected it to perpendicularly enter the SESAM 8 .
- Such calibration is merely an exemplary method for determining the position of the plane output mirror 6 , the second plano-concave mirror 7 and the SESAM 8 .
- the mode-locking output structure can be provided in a modified manner, as long as the laser mode-locked output can be achieved.
- the LD-pump source 1 emits 808 nm pumping laser which is perpendicularly incident on the focusing mirror 2 focuses the laser, after which the focused laser perpendicularly enters the incident end surface of the laser crystal 3 so as to pump the laser crystal.
- the pumping light excites the crystal working materials, reversing its particle number, such that a large number of particles are accumulated, inducing an excited radiation.
- the light generated by the stimulated emission travels back and forth for 8 times in the equivalent confocal cavity constituted by the plane reflective mirrors 4 and the ⁇ 20 mm plano-concave mirror, that is, the beam is transmitted in the order of A-B-C-D-E-F-G-D-A, and then reflected through the incident end surface of the laser crystal 3 to the plane output mirror; and then reflected through the plane output mirror 6 to the second plano-concave mirror 7 , and then is focused onto the SESAM 8 , realizing the picosecond laser mode-locked.
- the plane output mirror 6 used in this system is a semi-transparent semi-reflective mirror, which can partly perform the reflection and partly the transmission, such that the system realizes dual-output, and the transmittance rate of the plane output mirror 6 is 5%-15% with the angle provided for ensuring that the incident angle of the laser received from the laser crystal 3 is smaller than 30°, which is used to achieve a small angle reflection and small loss.
- the laser realizes the resonance mode-locked, during the process of oscillation, a part of the laser directed from the laser crystal 3 is transmitted out as the output 1 , a part of the laser directed from the second plano-concave mirror 7 is transmitted out as the output 2 , as a result the dual path mode-locked picosecond output is realized.
- This dual-output laser can be used to achieve the signal light amplification, obtaining frequency doubling laser output.
- the passive mode-locked picosecond laser device comprises a LD pump source 1 , a focusing lens 2 , a laser crystal 3 , a plane mirror 4 , a first plano-concave mirror 5 , a second plano-concave mirror 7 , a SESAM 8 , a polarizer 9 , a 1 ⁇ 4 wave plate 10 , and a 45° reflector 11 .
- the LD pump source 1 , the focusing mirror 2 , the laser crystal 3 , the plane mirror 4 and the first plano-concave mirror 5 are arranged as same as Embodiment 1.
- the second plano-concave mirror 7 , the SESAM 8 , the polarizer 9 , the 1 ⁇ 4 wave plate 10 and the 45° reflector 11 constitute the mode-locked output structure which is placed on a position capable of being calibrated through laser.
- the calibration process is as follows: a laser beam is directed parallel to the normal of the first plano-concave mirror 5 from the center of the laser crystal 3 toward the plane reflective mirror 4 .
- the polarizer 9 is placed on the outgoing path of the laser after being continuously reflected by the equivalent confocal cavity, this beam is reflected to the second plano-concave mirror 7 through the 1 ⁇ 4 wave plate 10 , the second plano-concave mirror 7 is used to receive the laser reflected by the polarizer 9 and reflects the laser which is perpendicularly incident on the SESAM 8 , and the 45° reflective mirror 11 receives the laser which is reflected back from the SESAM 8 and exited from the polarizer 9 through the second plano-concave mirror 7 and the 1 ⁇ 4 wave plate 10 , and reflects the laser as the output.
- Such calibration is merely a method used for determining the location of the second plano-concave mirror 7 , the SESAM 8 , the polarizer 9 , the 1 ⁇ 4 wave plate 10 and the 45° reflective mirror 11 .
- the arrangement of the mode-locked output structure could be appropriately changed, as long as the mode-locked output of laser can be achieved.
- the laser crystal 3 may be embodied as Nd:YVO4, Nd:GdVO4, and the crystal angular cutting may be performed in the method of perpendicular polarization light output cutting. Therefore, the laser crystal 3 outputs perpendicular polarized light which travels back and forth 8 times in the equivalent confocal cavity composed of the plane reflective mirror 4 and the first plano-concave mirror 5 , and is reflected by the incident end surface of the laser crystal to the polarizer 9 ; the laser is reflected by the polarizer 9 (the normal direction and the incident light beam are arranged with a Brewster angle (roughly equal to 57°) therebetween), perpendicularly goes through the 1 ⁇ 4 wave plate 10 after which and the laser becomes a circularly polarized beam which is then focused by the second plano-concave mirror 7 onto the SESAM, so as to achieve the picosecond laser mode-locked (wherein, the focal length of the second plano-concave mirror 7 is 10 mm and surface size of
- the beam is reflected by the SESAM 8 and returned along the original path, and then is reflected by the second plano-concave mirror 7 and perpendicularly passes through the 1 ⁇ 4 wave plate 10 , so that the circularly polarized light is changed to horizontal polarized light which is transmitted and output through the polarizer 9 and then is reflected by the 45° reflective mirror 11 , resulting in horizontally exiting along the system path, so as to achieve the picosecond mode-locked horizontal polarized light output, reducing the system size and facilitating the mechanical structure design.
- the total optical path length of the picosecond laser resonance cavity having the equivalent confocal cavity is 1 m ⁇ 6 m, and the repetition frequency of the picosecond pulse is 25 MHz ⁇ 150 MHz.
- the optical path length of the equivalent confocal cavity is substantial equal to that of the confocal cavity, realizing the low-repetition-frequency, and furthermore such equivalent confocal cavity has properties of a stable cavity and stable performance.
- the present invention innovatively uses the stable resonator cavity design of the equivalent confocal cavity, increasing the optical path, decreasing the repetition frequency and significantly reducing the length and volume of the cavity. Furthermore, in the present invention, the laser crystal, as a part of the laser cavity, is “embedded” in the end of the laser cavity, significantly saving the space and making the structure of the laser device more compact.
- modules or steps of the present invention can be carried out by a general computing device and can be integrated on a single computing device or distributed on a network composed of multiple computing devices.
- they can be implemented by an program code executable by computing devices.
- they can be stored in a storage device and performed by a computing device, or they can be embodied by making them into individual IC module or producing some modules or steps of them into a single IC module. In this way, the present invention is not limited to any specific combination of hardware and software.
Abstract
Description
- The present invention relates to an ultra-short pulse laser device, and particularly to a passive mode-locked picosecond laser device.
- With the rapid development of laser technology and the increasing application demand thereof, the tendency of laser field is to realize the high-power, high beam quality, high efficiency, high stability and long life of a laser device which is in small size, compact structure, stable performance, and all solid state. In a variety of technical fields and industries, the demand for ultra short pulse laser is increasingly higher, especially for the picosecond laser, which has more application prospect than a femtosecond laser (for example, the fields of the national defense, industrial, medical, biological, and other areas). Therefore, a current important research task is to develop a high-quality, high efficiency, high stability picosecond laser.
- According to one existing picosecond laser technology, a dye mode-locked, is utilized, for example, a published Chinese patent application No. 03114621.X, entitled as “high light-output time stability passive mode-locked Nd:YAG picosecond laser device” which has complex and bulky electronic control system. Also, the dye, being of highly toxic, would be diluted after some time, so needs to be replaced, therefore the life time is short which is not facilitated for industrialization and human health. According to another existing mode-locked picosecond laser device technology, active mode-locked technology is utilized, such as, the Chinese patent application No. 03210775.7, entitled as “laser-diode-pump picosecond active mode-locked solid planar waveguide laser device”. Because the technology of wave-guide is developed prematurely and the yield is very low, it is difficult to produce mode-locked picosecond laser device in large scale, and such active mode-locked has low stability performance. There is another existing mode-locked picosecond laser device technology, a passive mode-locked technology used for realizing low-repetition-frequency, such as Chinese utility model application No. 200520000394.7, entitled as “cavity-dumped all-solid-state picosecond laser device”, wherein Pockels cell is used to realize cavity-dumped giant laser pulse oscillations, which significantly damages the SESAM, and such damage can not be restored once occurring.
- In addition, confocal structure is popularly used in the laser cavity of the existing laser device technology. Although such structure is stable, the cavity is relatively longer with the structure incompact.
- To sum up, the existing technologies are lack of a low-repetition-frequency passive mode-locked picosecond laser with compact structure and stable performance.
- Aiming to the defects of the existing technologies, the present invention provides a stable performance, small size, low-repetition-frequency passive mode-locked picosecond laser device. In order to achieve above objects, the present invention adopts the following technical solution.
- In the embodiment of the present invention, it is provided a passive mode-locked picosecond laser device including a pump source, laser crystal, a laser cavity, and a mode-locked output structure.
- The pump source is placed at the side of the incidence end of the laser crystal, so as to pump the laser crystal.
- The laser cavity includes a plane reflective mirror and a first plano-concave mirror, wherein the plane reflective mirror is placed at the position of focal radius of the first plano-concave mirror and opposite to the first plano-concave mirror, with a small angle formed between the normal line of the plane mirror and the axis of the first plano-concave mirror.
- The laser generated by the laser crystal oscillates within the laser cavity, and is mode-locking output through the mode-locked output structure.
- According to the passive mode-locked picosecond laser device mentioned above, the angle between the normal direction of the plane reflective mirror and the axis of the first plano-concave mirror is θ, where 0°<θ<1°.
- According to the passive mode-locked picosecond laser device, the laser crystal is embedded in the first plano-concave mirror.
- According to the passive mode-locked picosecond laser device mentioned above, the first plan-concave mirror includes a gap where the laser crystal is placed, and the exit end surface of the laser crystal is located inside the arc surface of the plano-concave mirror.
- According to the passive mode-locked picosecond laser device above-mentioned, the mode-locked output structure includes a plane output mirror, a second plano-concave mirror and a semiconductor saturable absorber wherein the plane output mirror is semi-transparent semi-reflective mirror which is used to receive the laser from the laser crystal and reflect a part of the laser to the second plano-concave mirror. The second plano-concave mirror reflects the laser coming from the plane output mirror to perpendicularly enter the semiconductor saturable absorber.
- According to the passive mode-locked picosecond laser device, the mode-locked output structure includes the second plano-concave mirror, the semiconductor saturable absorber, a polarizer, a ¼ wave plate and a 45° reflective mirror. The polarizer receives the laser from the laser crystal, and reflects it to the second plano-concave mirror through the ¼ wave plate. The second plano-concave mirror is used to receive the laser reflected by polarizer and reflect it to perpendicularly enter the semiconductor saturable absorber. The 45° reflective mirror receives the laser which is reflected back by the semiconductor saturable absorber, passes through the second plan-concave mirror and the ¼ wave plate and is output from the polarizer, and the 45° reflective mirrorreflects the laser of as the output.
- According to the passive mode-locked picosecond laser device, the laser crystal is Nd:YVO4 or Nd:GdVO4, whose size is 5 mm×5 mm×(3 mm˜5 mm).
- According to the passive mode-locked picosecond lasers, the radius of the first plano-concave mirror is between 150 mm˜800 mm.
- According to the passive mode-locked picosecond laser device, the incident end surface of the laser crystal is coated with the thickening film at the pump light wavelength and the high reflective film at the output light wavelength and the export end surface is coated with thickening film at the output light wavelength.
- According to the passive mode-locked picosecond laser device, it also includes a focusing mirror which is placed between the pump source and the laser crystal for converging the pump light from the pump source to the laser crystal.
- Compared with the existing technologies, the present invention innovatively uses a equivalent confocal stable cavity, increasing the optical path, reducing the repetition frequency, and greatly decreasing the cavity length and volume.
- Also, the laser crystal is placed in the gap of the laser cavity or embedded in the end of the laser cavity, resulting in the structure more compact.
- The drawings herein are used to provide a better understanding of the present invention, and constitute a part of this application. The embodiment of the present invention and the description thereof are used for explaining the present invention, and do not improperly limit this invention, in which:
-
FIG. 1 shows a top view of the passive mode-locked picosecond laser device according toEmbodiment 1 of the present invention. -
FIG. 2 shows a right view of the first plano-concave mirror of the passive mode-locked picosecond laser device according toEmbodiment 1 of the present invention. -
FIG. 3 shows a top schematic view of the passive mode-locked picosecond laser device according toEmbodiment 2 of the present invention. -
FIG. 4 shows a comparison chart between the beam transmitting in the confocal cavity and in the equivalent confocal cavity of the passive mode-locked picosecond laser device according to embodiment of the present invention. - The present invention will be described in detail, referring to the drawings and in conjunction with the embodiment.
- As shown in
FIG. 1 , the passive mode-locked picosecond laser device according toEmbodiment 1 of the present invention comprises: aLD pump source 1, a focusinglens 2, alaser crystal 3, a planereflective mirror 4, a first plano-concave mirror 5 (Φ=20 mm), aplane output mirror 6, a second plano-concave mirror 7 (Φ=10 mm) and a SESAM (semiconductor saturable absorber) 8. TheLD pump source 1 is placed at the side of the incidence end of thelaser crystal 3 for pumping the laser crystal. The focusingmirror 2 is placed between thepump source 1 and thelaser crystal 3 for converging the pumping light coming from thepump source 1 into thelaser crystal 3, increasing the utilization rate of the pumping light. The planereflective mirror 4 is placed opposite to the first plano-concave mirror 5 and located at the position of the focal radius of the first plano-concave mirror 5, both of which constitute together a laser cavity (an equivalent confocal cavity). The normal direction of the planereflective mirror 4 and the axis (along of the horizontal direction) of the first plano-concave mirror 5 form a small acute angle therebetween with the acute angle being of θ (0°<θ<1°), such that the light incident upon the planereflective mirror 4 will not be returned back along the original path, but reflected with an small angle of 2θ. - As shown in
FIG. 2 , the first plano-concave mirror 5 is polished thereon to form an arc with 3 mm-5 mm height, so as to have one gap. Thelaser crystal 3 is placed at the gap, abutting the first plano-concave mirror 5. The export end surface of thelaser crystal 3 and the firstconcave mirror 5 are placed in a substantially same arc surface, or it is possible to “embed” thelaser crystal 3 in the end of the laser cavity (the first plano-concave mirror 5), in order to save space. AlthoughFIG. 2 shows a schematic view of the polished gap, but the gap can be embodied in other forms as long as it can appropriately receive thelaser crystal 3. The size of the laser crystal is 5 mm×5 mm×(3 mm˜5 mm). The incident end surface of the laser crystal is coated with the thickening film at pumping light wavelength (808 nm) and the high reflective film at the output light wavelength (1064 nm) and the export end surface is coated with the thickening film at the output light wavelength (1064 nm). In the present embodiment, thelaser crystal 3 can use Nd:YVO4, Nd:GdVO4, and the angular cutting of the laser crystal is implemented by the method of vertical polarization light output cutting. In other cases, if the polarized light output not required, it can also be used the Nd:YAG crystal and so on. Thelaser crystal 3, after being wrapped at its side with indium platinum, is placed into a heat sink copper block (not shown), held in the gap by a support (not shown), and subjected to a temperature control by water-cooling or TEC (semiconductor cooling chip). Because thelaser crystal 3 is “embedded” in the first plano-concave mirror, thelaser crystal 3 forms a part of the laser cavity, thus the laser cavity structure is more compact. - In addition, in the present embodiment, the
plane output mirror 6, the second plano-concave mirror 7, and the SESAM 8 constitute the mode-locked output structure whose placement position can be calibrated by laser with the calibration process as follows: a laser beam, parallel to the normal of the first plano-concave mirror 5, is incident upon the planereflective mirror 4 from the center of thelaser crystal 3; aplane output mirror 6 is placed on the export optical path of the light beam which has been continuously reflected by the equivalent confocal cavity; and a second plano-concave mirror 7 is used to receive the laser reflected by theplane output mirror 6 and reflected it to perpendicularly enter the SESAM 8. Such calibration is merely an exemplary method for determining the position of theplane output mirror 6, the second plano-concave mirror 7 and the SESAM 8. Those skilled in that art should understand that the mode-locking output structure can be provided in a modified manner, as long as the laser mode-locked output can be achieved. - The passive mode-locked picosecond laser device of the present embodiment is operated as follows:
- The LD-
pump source 1 emits 808 nm pumping laser which is perpendicularly incident on the focusingmirror 2 focuses the laser, after which the focused laser perpendicularly enters the incident end surface of thelaser crystal 3 so as to pump the laser crystal. The pumping light excites the crystal working materials, reversing its particle number, such that a large number of particles are accumulated, inducing an excited radiation. When the light generated by the stimulated emission is reflected multiple times in the laser cavity and then reflected by the incident surface of thelaser crystal 3 to theplane output mirror 6—and further is reflected to the second plano-concave mirror 7, and the laser after being reflected by theSESAM 8 is incident on theplane output mirror 6 through the secondconcave mirror 7, and is output from theplane output mirror 6. In the present embodiment, the light generated by the stimulated emission travels back and forth for 8 times in the equivalent confocal cavity constituted by the planereflective mirrors 4 and the Φ20 mm plano-concave mirror, that is, the beam is transmitted in the order of A-B-C-D-E-F-G-D-A, and then reflected through the incident end surface of thelaser crystal 3 to the plane output mirror; and then reflected through theplane output mirror 6 to the second plano-concave mirror 7, and then is focused onto theSESAM 8, realizing the picosecond laser mode-locked. - In addition, the
plane output mirror 6 used in this system is a semi-transparent semi-reflective mirror, which can partly perform the reflection and partly the transmission, such that the system realizes dual-output, and the transmittance rate of theplane output mirror 6 is 5%-15% with the angle provided for ensuring that the incident angle of the laser received from thelaser crystal 3 is smaller than 30°, which is used to achieve a small angle reflection and small loss. After the laser realizes the resonance mode-locked, during the process of oscillation, a part of the laser directed from thelaser crystal 3 is transmitted out as theoutput 1, a part of the laser directed from the second plano-concave mirror 7 is transmitted out as theoutput 2, as a result the dual path mode-locked picosecond output is realized. This dual-output laser can be used to achieve the signal light amplification, obtaining frequency doubling laser output. - As shown in
FIG. 3 , the passive mode-locked picosecond laser device according toEmbodiment 2 of the present invention comprises aLD pump source 1, a focusinglens 2, alaser crystal 3, aplane mirror 4, a first plano-concave mirror 5, a second plano-concave mirror 7, aSESAM 8, a polarizer 9, a ¼wave plate 10, and a 45°reflector 11. In this embodiment, theLD pump source 1, the focusingmirror 2, thelaser crystal 3, theplane mirror 4 and the first plano-concave mirror 5 are arranged as same asEmbodiment 1. - The second plano-
concave mirror 7, theSESAM 8, the polarizer 9, the ¼wave plate 10 and the 45°reflector 11 constitute the mode-locked output structure which is placed on a position capable of being calibrated through laser. The calibration process is as follows: a laser beam is directed parallel to the normal of the first plano-concave mirror 5 from the center of thelaser crystal 3 toward the planereflective mirror 4. The polarizer 9 is placed on the outgoing path of the laser after being continuously reflected by the equivalent confocal cavity, this beam is reflected to the second plano-concave mirror 7 through the ¼wave plate 10, the second plano-concave mirror 7 is used to receive the laser reflected by the polarizer 9 and reflects the laser which is perpendicularly incident on theSESAM 8, and the 45°reflective mirror 11 receives the laser which is reflected back from theSESAM 8 and exited from the polarizer 9 through the second plano-concave mirror 7 and the ¼wave plate 10, and reflects the laser as the output. Such calibration is merely a method used for determining the location of the second plano-concave mirror 7, theSESAM 8, the polarizer 9, the ¼wave plate 10 and the 45°reflective mirror 11. Those skilled in the art should understand that the arrangement of the mode-locked output structure could be appropriately changed, as long as the mode-locked output of laser can be achieved. - In the present embodiment, the
laser crystal 3 may be embodied as Nd:YVO4, Nd:GdVO4, and the crystal angular cutting may be performed in the method of perpendicular polarization light output cutting. Therefore, thelaser crystal 3 outputs perpendicular polarized light which travels back and forth 8 times in the equivalent confocal cavity composed of the planereflective mirror 4 and the first plano-concave mirror 5, and is reflected by the incident end surface of the laser crystal to the polarizer 9; the laser is reflected by the polarizer 9 (the normal direction and the incident light beam are arranged with a Brewster angle (roughly equal to 57°) therebetween), perpendicularly goes through the ¼wave plate 10 after which and the laser becomes a circularly polarized beam which is then focused by the second plano-concave mirror 7 onto the SESAM, so as to achieve the picosecond laser mode-locked (wherein, the focal length of the second plano-concave mirror 7 is 10 mm and surface size of the SESAM is 3 mm×3 mm). The beam is reflected by theSESAM 8 and returned along the original path, and then is reflected by the second plano-concave mirror 7 and perpendicularly passes through the ¼wave plate 10, so that the circularly polarized light is changed to horizontal polarized light which is transmitted and output through the polarizer 9 and then is reflected by the 45°reflective mirror 11, resulting in horizontally exiting along the system path, so as to achieve the picosecond mode-locked horizontal polarized light output, reducing the system size and facilitating the mechanical structure design. -
FIG. 4 is a view showing the comparison between the beam transmitted in the confocal cavity used in the existing technology and in the equivalent confocal cavity of the passive mode-locked picosecond laser device according to the embodiment of the present invention. From the figure it can be seen that the beam travels back and forth 8 times in the equivalent confocal cavity constituted by the plane reflective mirror and the first plano-concave mirror (Φ=20 mm) wherein the curvature radius of the first plano-concave mirror 5 can be between 150 mm and 800 mm and the diameter is 20 mm. Therefore, the total optical path length of the picosecond laser resonance cavity having the equivalent confocal cavity is 1 m˜6 m, and the repetition frequency of the picosecond pulse is 25 MHz˜150 MHz. In the case that the volume of this equivalent confocal cavity is half of the confocal cavity, the optical path length of the equivalent confocal cavity is substantial equal to that of the confocal cavity, realizing the low-repetition-frequency, and furthermore such equivalent confocal cavity has properties of a stable cavity and stable performance. - The present invention innovatively uses the stable resonator cavity design of the equivalent confocal cavity, increasing the optical path, decreasing the repetition frequency and significantly reducing the length and volume of the cavity. Furthermore, in the present invention, the laser crystal, as a part of the laser cavity, is “embedded” in the end of the laser cavity, significantly saving the space and making the structure of the laser device more compact.
- Clearly, those skilled in the art should be aware of that the above-mentioned various modules or steps of the present invention can be carried out by a general computing device and can be integrated on a single computing device or distributed on a network composed of multiple computing devices. Optionally, they can be implemented by an program code executable by computing devices. Thus, they can be stored in a storage device and performed by a computing device, or they can be embodied by making them into individual IC module or producing some modules or steps of them into a single IC module. In this way, the present invention is not limited to any specific combination of hardware and software.
- While the invention has been disclosed in connection with the preferred embodiments shown and described in detail, various modifications and improvements made to the present invention will become readily apparent to those skilled in the art. Within the spirit and principle of the present invention, any changes, equivalent replacements, improvements etc. should be included in the scope of protection the present invention protects.
Claims (10)
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CN2009100834318A CN101562310B (en) | 2009-05-04 | 2009-05-04 | Passive mode-locking picosecond laser |
CN200910083431.8 | 2009-05-04 | ||
CN200910083431 | 2009-05-04 | ||
PCT/CN2009/073378 WO2010127521A1 (en) | 2009-05-04 | 2009-08-20 | Passively mode-locking picosecond laser |
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US20120039345A1 true US20120039345A1 (en) | 2012-02-16 |
US8340143B2 US8340143B2 (en) | 2012-12-25 |
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US12/669,951 Expired - Fee Related US8340143B2 (en) | 2009-05-04 | 2009-08-20 | Passively mode-locked picosecond laser device |
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US (1) | US8340143B2 (en) |
JP (1) | JP4984104B2 (en) |
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WO (1) | WO2010127521A1 (en) |
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Also Published As
Publication number | Publication date |
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WO2010127521A1 (en) | 2010-11-11 |
JP2011518445A (en) | 2011-06-23 |
DE112009000018A5 (en) | 2012-08-02 |
JP4984104B2 (en) | 2012-07-25 |
US8340143B2 (en) | 2012-12-25 |
DE112009000018B4 (en) | 2015-03-19 |
DE112009000018T5 (en) | 2011-05-05 |
CN101562310A (en) | 2009-10-21 |
CN101562310B (en) | 2010-09-01 |
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