US20090151905A1 - Heat sink with vapor chamber - Google Patents
Heat sink with vapor chamber Download PDFInfo
- Publication number
- US20090151905A1 US20090151905A1 US11/957,349 US95734907A US2009151905A1 US 20090151905 A1 US20090151905 A1 US 20090151905A1 US 95734907 A US95734907 A US 95734907A US 2009151905 A1 US2009151905 A1 US 2009151905A1
- Authority
- US
- United States
- Prior art keywords
- heat sink
- plate
- tank
- heat
- wick layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
- F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
- F28D15/04—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- the present invention relates to a heat sink with vapor chamber, and more particularly to a heat sink with vapor chamber having wick structure.
- heat is generated during operations of electronic components, such as integrated circuit chips.
- cooling devices such as heat sinks are often employed to dissipate the generated heat away from these electronic components.
- a heat sink is more effective when there is a uniform heat flux applied over an entire base of the heat sink.
- a heat sink with a large base is attached to an integrated circuit chip with a much smaller contact area, there is significant resistance to the flow of heat to the other portions of the heat sink base which are not in direct contact with the chip.
- a mechanism for overcoming the resistance to heat flow in a heat sink base is to attach a heat spreader to the heat sink base or directly make the heat sink base as a heat spreader.
- the heat spreader includes a vacuum chamber defined therein, a wick structure provided in the chamber and lining an inside wall of the chamber, and a working fluid contained in chamber.
- the working fluid contained in the wick structure corresponding to a hot contacting location vaporizes.
- the vapor then spreads to fill the chamber, and wherever the vapor comes into contact with a cooler surface of the chamber, it releases its latent heat of vaporization and condenses.
- the condensate returns to the hot contacting location via a capillary force generated by the wick structure. Thereafter, the condensate frequently vaporizes and condenses to form a circulation to thereby remove the heat generated by the chip.
- the wick structure of the heat spreader is a meshed or sintered type.
- the messed wick structure has advantage of good osmosis, but drawbacks of bad heat transferring capacity and weak gravity resistance.
- the sintered wick structure has advantages of good heat transferring capacity and gravity resistance, but drawback of large hydro-resistance. Therefore, heat spreaders with single meshed wick structure or sintered wick structure does not achieve a perfect heat dissipation efficiency for the aforesaid chips.
- a heat sink in accordance with a preferred embodiment of the present invention comprises a tank and a plate covering on the tank and hermetically engaging with the tank.
- the tank comprises a base for absorbing heat from heat-generating members and a sintered wick layer formed at an inner face of base.
- the plate has a meshed wick layer formed at an inner face thereof. The sintered wick layer and the meshed wick layer are in porosity communication.
- a chamber is defined between the tank and the plate and contains working fluid therein.
- FIG. 1 is an isometric, exploded view of a heat sink in accordance with a preferred embodiment of the present invention
- FIG. 2 is an assembled view of FIG. 1 ;
- FIG. 3 is an inverted view of FIG. 2 ;
- FIG. 4 is a sectional view of FIG. 2 taking along a line IV-IV;
- FIG. 5 is an enlarged view of a part V shown in FIG. 4 .
- the heat sink comprises a heat spreader 10 and a plurality of fins 30 arranged on the heat spreader 10 .
- the heat spreader 10 comprises a tank 110 and a top plate 150 hermetically covering on the tank 110 , thereby defining a chamber 180 between the tank 110 and the plate 150 .
- the tank 110 comprises a cuboids body 111 and a flange 112 circumferentially extending outwardly from the body 111 .
- the body 111 comprises a heat absorbing base 113 and four interconnecting sidewalls 114 integrally extending upwardly from the base 113 .
- a sintered wick layer 116 is formed on an inner face of the body 111 by sintering metal power at the inner face.
- the sintered wick layer 116 covers allover the inner face, that is to say, the sintered wick layer 116 covers the base 113 and the sidewalls 114 of the tank 110 .
- a meshed wick layer 156 is formed on an inner face of the plate 150 by tightly engaging a mesh sheet to the inner face.
- the sintered wick layer 116 on the sidewalls 114 extends toward the plate 150 to engage with the meshed wick layer 156 .
- the sintered wick layer 116 and the meshed wick layer 156 are in porosity communication, therefore, liquid can flows between the sintered wick layer 116 and the meshed wick layer 156 .
- the plate 150 has edges thereof air-tightly and liquid-tightly engaging with the flange 112 of the tank 110 .
- Working fluid is filled in the chamber 180 .
- Each fin 30 is made from metal sheet.
- the fin 30 is substantially L-shaped, and comprises a contacting portion (not labeled) thermally contacting the plate 150 of the heat spreader 10 and a heat dissipation portion (not labeled) extending remote from the plate 150 .
- the base 113 of the tank 110 of the heat spreader 10 thermally contacts and absorbs heat from a heat-generating chip.
- the working fluid in the chamber 180 of the tank 110 is heated and vapored upwardly to reach the plate 150 of the heat spreader 10 .
- the vapored working fluid exchanges heat with the plate 150 and then is condensed to liquid.
- the liquid refluences to the base 113 via the meshed wick layer 156 and the sintered wick layer 116 .
- the vapored and condensed cycle continues, the heat generated by the chip is transferred to the plate 150 , and the heat in the plate 150 is dissipated by the fins 30 on the plate 150 .
- the heat spreader 10 of the heat sink comprises two different wick layers located at different locations thereof: the sintered wick layer 116 at the base 113 which absorbs heat from the heat-generating chip, the meshed wick layer 156 at the plate 150 which releases heat to other members. Therefore, the heat generated by the chip can be absorbed quickly by the base 113 and the working fluid, then reaches the plate 150 to be dissipated. The working fluid refluences to the base 113 rapidly via the meshed wick layer 156 and the sintered wick layer 116 .
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Abstract
Description
- 1. Field of the Invention
- The present invention relates to a heat sink with vapor chamber, and more particularly to a heat sink with vapor chamber having wick structure.
- 2. Description of Related Art
- It is well known that heat is generated during operations of electronic components, such as integrated circuit chips. To ensure normal and safe operations, cooling devices such as heat sinks are often employed to dissipate the generated heat away from these electronic components.
- As progress continues to be made in the electronics art, more components on the same real estate generate more heat. The heat sinks used to cool these chips are accordingly made larger in order to possess a higher heat removal capacity, which causes the heat sinks to have a much larger footprint than the chips. Generally speaking, a heat sink is more effective when there is a uniform heat flux applied over an entire base of the heat sink. When a heat sink with a large base is attached to an integrated circuit chip with a much smaller contact area, there is significant resistance to the flow of heat to the other portions of the heat sink base which are not in direct contact with the chip.
- A mechanism for overcoming the resistance to heat flow in a heat sink base is to attach a heat spreader to the heat sink base or directly make the heat sink base as a heat spreader. Typically, the heat spreader includes a vacuum chamber defined therein, a wick structure provided in the chamber and lining an inside wall of the chamber, and a working fluid contained in chamber. As an integrated circuit chip is maintained in thermal contact with the heat spreader, the working fluid contained in the wick structure corresponding to a hot contacting location vaporizes. The vapor then spreads to fill the chamber, and wherever the vapor comes into contact with a cooler surface of the chamber, it releases its latent heat of vaporization and condenses. The condensate returns to the hot contacting location via a capillary force generated by the wick structure. Thereafter, the condensate frequently vaporizes and condenses to form a circulation to thereby remove the heat generated by the chip.
- Conventionally, the wick structure of the heat spreader is a meshed or sintered type. Generally, the messed wick structure has advantage of good osmosis, but drawbacks of bad heat transferring capacity and weak gravity resistance. While the sintered wick structure has advantages of good heat transferring capacity and gravity resistance, but drawback of large hydro-resistance. Therefore, heat spreaders with single meshed wick structure or sintered wick structure does not achieve a perfect heat dissipation efficiency for the aforesaid chips.
- What is needed therefore is to provide a heat sink with vapor chamber having wick structures which achieves good heat dissipation performance.
- A heat sink in accordance with a preferred embodiment of the present invention comprises a tank and a plate covering on the tank and hermetically engaging with the tank. The tank comprises a base for absorbing heat from heat-generating members and a sintered wick layer formed at an inner face of base. The plate has a meshed wick layer formed at an inner face thereof. The sintered wick layer and the meshed wick layer are in porosity communication. A chamber is defined between the tank and the plate and contains working fluid therein.
- Many aspects of the present heat sink with vapor chamber can be better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present portable projector using a related heat dissipation system. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
-
FIG. 1 is an isometric, exploded view of a heat sink in accordance with a preferred embodiment of the present invention; -
FIG. 2 is an assembled view ofFIG. 1 ; -
FIG. 3 is an inverted view ofFIG. 2 ; -
FIG. 4 is a sectional view ofFIG. 2 taking along a line IV-IV; and -
FIG. 5 is an enlarged view of a part V shown inFIG. 4 . - Referring to
FIGS. 1 and 2 , the heat sink comprises aheat spreader 10 and a plurality offins 30 arranged on theheat spreader 10. - Referring also to
FIGS. 3-5 , theheat spreader 10 comprises atank 110 and atop plate 150 hermetically covering on thetank 110, thereby defining achamber 180 between thetank 110 and theplate 150. Thetank 110 comprises acuboids body 111 and aflange 112 circumferentially extending outwardly from thebody 111. Thebody 111 comprises aheat absorbing base 113 and fourinterconnecting sidewalls 114 integrally extending upwardly from thebase 113. A sinteredwick layer 116 is formed on an inner face of thebody 111 by sintering metal power at the inner face. The sinteredwick layer 116 covers allover the inner face, that is to say, thesintered wick layer 116 covers thebase 113 and thesidewalls 114 of thetank 110. Ameshed wick layer 156 is formed on an inner face of theplate 150 by tightly engaging a mesh sheet to the inner face. Thesintered wick layer 116 on thesidewalls 114 extends toward theplate 150 to engage with themeshed wick layer 156. The sinteredwick layer 116 and themeshed wick layer 156 are in porosity communication, therefore, liquid can flows between thesintered wick layer 116 and themeshed wick layer 156. Theplate 150 has edges thereof air-tightly and liquid-tightly engaging with theflange 112 of thetank 110. Working fluid is filled in thechamber 180. - Each
fin 30 is made from metal sheet. Thefin 30 is substantially L-shaped, and comprises a contacting portion (not labeled) thermally contacting theplate 150 of theheat spreader 10 and a heat dissipation portion (not labeled) extending remote from theplate 150. - In use, the
base 113 of thetank 110 of the heat spreader 10 thermally contacts and absorbs heat from a heat-generating chip. The working fluid in thechamber 180 of thetank 110 is heated and vapored upwardly to reach theplate 150 of theheat spreader 10. At theplate 150, the vapored working fluid exchanges heat with theplate 150 and then is condensed to liquid. The liquid refluences to thebase 113 via themeshed wick layer 156 and thesintered wick layer 116. The vapored and condensed cycle continues, the heat generated by the chip is transferred to theplate 150, and the heat in theplate 150 is dissipated by thefins 30 on theplate 150. - According to the embodiment of the present invention, the heat spreader 10 of the heat sink comprises two different wick layers located at different locations thereof: the
sintered wick layer 116 at thebase 113 which absorbs heat from the heat-generating chip, themeshed wick layer 156 at theplate 150 which releases heat to other members. Therefore, the heat generated by the chip can be absorbed quickly by thebase 113 and the working fluid, then reaches theplate 150 to be dissipated. The working fluid refluences to thebase 113 rapidly via themeshed wick layer 156 and thesintered wick layer 116. - It is believed that the present invention and its advantages will be understood from the foregoing description, and it will be apparent that various changes may be made thereto without departing from the spirit and scope of the invention or sacrificing all of its material advantages, the examples hereinbefore described merely being preferred or exemplary embodiments of the invention.
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/957,349 US20090151905A1 (en) | 2007-12-14 | 2007-12-14 | Heat sink with vapor chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/957,349 US20090151905A1 (en) | 2007-12-14 | 2007-12-14 | Heat sink with vapor chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
US20090151905A1 true US20090151905A1 (en) | 2009-06-18 |
Family
ID=40751683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/957,349 Abandoned US20090151905A1 (en) | 2007-12-14 | 2007-12-14 | Heat sink with vapor chamber |
Country Status (1)
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US (1) | US20090151905A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103874387A (en) * | 2012-12-07 | 2014-06-18 | 奇鋐科技股份有限公司 | Uniform temperature plate structure and manufacturing method thereof |
US20140182820A1 (en) * | 2013-01-01 | 2014-07-03 | Asia Vital Components Co., Ltd. | Vapor chamber structure |
US20140182132A1 (en) * | 2013-01-01 | 2014-07-03 | Asia Vital Components Co., Ltd. | Method of manufacturing a vapor chamber structure |
US20140352926A1 (en) * | 2013-05-31 | 2014-12-04 | Cooler Master Co., Ltd. | Shell structure for handheld device |
US20150346784A1 (en) * | 2014-06-02 | 2015-12-03 | Microsoft Corporation | Integrated vapor chamber for thermal management of computing devices |
TWI596312B (en) * | 2016-11-10 | 2017-08-21 | 展緻企業有限公司 | Vapor chamber device with integrated heat sink and method for manufacturing the same |
CN110678036A (en) * | 2018-07-02 | 2020-01-10 | 德尔福技术有限责任公司 | Circuit assembly with heat sink |
US11121058B2 (en) | 2019-07-24 | 2021-09-14 | Aptiv Technologies Limited | Liquid cooled module with device heat spreader |
US11382205B2 (en) | 2020-09-16 | 2022-07-05 | Aptiv Technologies Limited | Heatsink shield with thermal-contact dimples for thermal-energy distribution in a radar assembly |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7137442B2 (en) * | 2003-12-22 | 2006-11-21 | Fujikura Ltd. | Vapor chamber |
US20070261242A1 (en) * | 2006-05-15 | 2007-11-15 | Foxconn Technology Co., Ltd. | Method for manufacturing phase change type heat sink |
US20070295486A1 (en) * | 2006-04-21 | 2007-12-27 | Taiwan Microloops Corp. | Heat spreader with composite micro-structure |
-
2007
- 2007-12-14 US US11/957,349 patent/US20090151905A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7137442B2 (en) * | 2003-12-22 | 2006-11-21 | Fujikura Ltd. | Vapor chamber |
US20070295486A1 (en) * | 2006-04-21 | 2007-12-27 | Taiwan Microloops Corp. | Heat spreader with composite micro-structure |
US20070261242A1 (en) * | 2006-05-15 | 2007-11-15 | Foxconn Technology Co., Ltd. | Method for manufacturing phase change type heat sink |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103874387A (en) * | 2012-12-07 | 2014-06-18 | 奇鋐科技股份有限公司 | Uniform temperature plate structure and manufacturing method thereof |
US20140182820A1 (en) * | 2013-01-01 | 2014-07-03 | Asia Vital Components Co., Ltd. | Vapor chamber structure |
US20140182132A1 (en) * | 2013-01-01 | 2014-07-03 | Asia Vital Components Co., Ltd. | Method of manufacturing a vapor chamber structure |
US20140352926A1 (en) * | 2013-05-31 | 2014-12-04 | Cooler Master Co., Ltd. | Shell structure for handheld device |
US10698458B2 (en) * | 2014-06-02 | 2020-06-30 | Microsoft Technology Licensing, Llc | Integrated vapor chamber for thermal management of computing devices |
US20150346784A1 (en) * | 2014-06-02 | 2015-12-03 | Microsoft Corporation | Integrated vapor chamber for thermal management of computing devices |
TWI596312B (en) * | 2016-11-10 | 2017-08-21 | 展緻企業有限公司 | Vapor chamber device with integrated heat sink and method for manufacturing the same |
CN110678036A (en) * | 2018-07-02 | 2020-01-10 | 德尔福技术有限责任公司 | Circuit assembly with heat sink |
US10849217B2 (en) * | 2018-07-02 | 2020-11-24 | Aptiv Technologies Limited | Electrical-circuit assembly with heat-sink |
US11121058B2 (en) | 2019-07-24 | 2021-09-14 | Aptiv Technologies Limited | Liquid cooled module with device heat spreader |
US11626345B2 (en) | 2019-07-24 | 2023-04-11 | Aptiv Technologies Limited | Liquid cooled module with device heat spreader |
US11382205B2 (en) | 2020-09-16 | 2022-07-05 | Aptiv Technologies Limited | Heatsink shield with thermal-contact dimples for thermal-energy distribution in a radar assembly |
US11737203B2 (en) | 2020-09-16 | 2023-08-22 | Aptiv Technologies Limited | Heatsink shield with thermal-contact dimples for thermal-energy distribution in a radar assembly |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: FOXCONN TECHNOLOGY CO., LTD., TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LAI, CHENG-TIEN;ZHOU, ZHI-YONG;DING, QIAO-LI;REEL/FRAME:020410/0136 Effective date: 20071211 Owner name: FU ZHUN PRECISION INDUSTRY (SHEN ZHEN) CO., LTD., Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LAI, CHENG-TIEN;ZHOU, ZHI-YONG;DING, QIAO-LI;REEL/FRAME:020410/0136 Effective date: 20071211 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |