TWI838490B - Time of flight-based three-dimensional sensing system - Google Patents

Time of flight-based three-dimensional sensing system Download PDF

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TWI838490B
TWI838490B TW109109378A TW109109378A TWI838490B TW I838490 B TWI838490 B TW I838490B TW 109109378 A TW109109378 A TW 109109378A TW 109109378 A TW109109378 A TW 109109378A TW I838490 B TWI838490 B TW I838490B
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intensity
light
field
optical element
uniform
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TW202101027A (en
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史考特 羅蘭德斯
馬庫斯 比爾格
威廉 D 浩克
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美商菲爾薇解析公司
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Abstract

A light shaping optic may include a substrate. The light shaping optic may include a structure disposed on the substrate, wherein the structure is configured to receive one or more input beams of light with a uniform intensity field and less than a threshold total intensity, and wherein the structure is configured to shape the one or more input beams of light to form one or more output beams of light with a non-uniform intensity field and less than the threshold total intensity.

Description

基於飛行時間的三維感測系統Time-of-flight based 3D sensing system

本申請案關於一種基於飛行時間的三維感測系統。This application relates to a time-of-flight based three-dimensional sensing system.

量測系統可用於深度感測量測。舉例而言,光達系統可傳輸雷射光脈衝,且可量測反射脈衝以判定物件距離光達系統的距離。在此狀況下,光達系統可執行雷射脈衝的飛行時間量測,且可產生物件的三維表示。閃光光達系統使用照明裝置及光學光塑形元件,該光學光塑形元件以單個脈衝照亮場景(閃光光達系統的視場)。在此狀況下,閃光光達系統可使用對光束之單個脈衝之反射的飛行時間量測來產生場景的三維表示。掃描(或掃掠)光達系統可使用照明單元、光學塑形元件及一或多個活動鏡,以橫跨場景移動雷射光束的多個脈衝。舉例而言,光學光塑形元件可使雷射光束的每一脈衝散佈成線,且活動鏡可在雷射光束的多個脈衝上方使該線掃過場景。在此狀況下,掃描光達系統可使用來自雷射光束的多個脈衝的反射的多次量測來產生場景的三維表示。The measurement system may be used for depth sensing measurements. For example, a lidar system may transmit a pulse of laser light and may measure the reflected pulse to determine the distance of an object from the lidar system. In this case, the lidar system may perform a time-of-flight measurement of the laser pulse and may produce a three-dimensional representation of the object. A flash lidar system uses an illumination device and an optical light shaping element that illuminates a scene (the field of view of the flash lidar system) with a single pulse. In this case, the flash lidar system may use time-of-flight measurements of reflections of a single pulse of the light beam to produce a three-dimensional representation of the scene. A scanning (or sweeping) lidar system may use an illumination unit, an optical shaping element, and one or more active mirrors to move multiple pulses of a laser beam across a scene. For example, the optical light shaping element may spread each pulse of the laser beam into a line, and the active mirror may sweep the line across the scene over the multiple pulses of the laser beam. In this case, the scanning lidar system may use multiple measurements of reflections from the multiple pulses of the laser beam to produce a three-dimensional representation of the scene.

根據一些可能實施方案,一種光塑形光學元件可包括結構,其中該結構經建構以接收具有均勻強度場及小於臨限總強度的一或多個輸入光束,且其中該結構經建構以對該一或多個輸入光束進行塑形以形成具有不均勻強度場且小於該臨限總強度的一或多個輸出光束。According to some possible implementations, a light shaping optical element may include a structure, wherein the structure is constructed to receive one or more input light beams having a uniform intensity field and a total intensity less than a critical intensity, and wherein the structure is constructed to shape the one or more input light beams to form one or more output light beams having a non-uniform intensity field and a total intensity less than the critical intensity.

在光塑形光學元件中,不均勻強度場包含一組較高強度光區域和一組較低強度光區域。該不均勻強度場至少部分經照明。在該光塑形光學元件中,不均勻強度場的至少一部分未經照明。在光塑形光學元件中,不均勻強度場形成一圖案,且其中該圖案為以下中之至少一者:點圖案、柵格圖案、環形圖案、干涉圖案、階梯圖案、鋸齒圖案、連續圖案、基於正弦的圖案。在光塑形光學元件中,一或多個輸入光束為光達系統的均勻掃描線,且一或多個輸出光束形成光達系統的不均勻掃描線。In a light shaping optical element, a non-uniform intensity field comprises a set of higher intensity light regions and a set of lower intensity light regions. The non-uniform intensity field is at least partially illuminated. In the light shaping optical element, at least a portion of the non-uniform intensity field is not illuminated. In the light shaping optical element, the non-uniform intensity field forms a pattern, and wherein the pattern is at least one of: a dot pattern, a grid pattern, a ring pattern, an interference pattern, a step pattern, a sawtooth pattern, a continuous pattern, a sine-based pattern. In the light shaping optical element, one or more input light beams are uniform scan lines of a lidar system, and one or more output light beams form non-uniform scan lines of the lidar system.

根據一些可能實施方案,一種系統可包括光學傳輸器,用以提供經引導朝向物件的光束,其中該光束與橫跨視場的恆定強度相關聯。該系統可包括一光塑形光學元件,用以將該光束聚集至一或多個聚集區域,其中該視場的一或多個聚集區域較之該視場的一或多個其他區域與較高光聚集度相關聯。該系統可包括光學接收器,用以接收自物件反射的光束的反射並對該光束執行複數個飛行時間量測。在系統中,光塑形光學元件為工程漫射器。該系統經建構以使用該光束照明該物件,使得該物件由該一或多個聚集區域不均勻地照明。在該系統中,光學接收器經建構以針對該視場的一或多個聚集區域中之該視場的每一聚集區域執行飛行時間量測。該系統進一步包括處理器,該處理器經建構以使用複數個飛行時間量測來產生物件的深度點雲。在該系統中,視場的一或多個聚集區域形成複數個強度點;且該複數個強度點與一臨限密度相關聯。在該系統中,該系統經建構以判定該複數個飛行時間量測大於系統相對於該物件的臨限距離。在該系統中,光束的強度滿足眼睛安全性等級臨限值。該系統進一步包括:處理器,其用以基於複數個飛行時間量測及由光學傳輸器提供的另一光束的成像量測來產生物件的三維表示,其中另一束光與恆定強度相關聯且經引導朝向物件而無需經塑形為一或多個聚集區域。在該系統中,光學接收器為包括複數個感測器元件的感測器陣列;且該複數個感測器元件中之每一感測器元件經建構以產生複數個飛行時間量測的飛行時間量測。According to some possible implementations, a system may include an optical transmitter for providing a light beam directed toward an object, wherein the light beam is associated with a constant intensity across a field of view. The system may include a light shaping optical element for focusing the light beam into one or more focusing regions, wherein the one or more focusing regions of the field of view are associated with a higher light concentration than one or more other regions of the field of view. The system may include an optical receiver for receiving reflections of the light beam reflected from the object and performing a plurality of time-of-flight measurements on the light beam. In the system, the light shaping optical element is an engineered diffuser. The system is constructed to illuminate the object using the light beam such that the object is unevenly illuminated by the one or more focusing regions. In the system, an optical receiver is constructed to perform a time-of-flight measurement for each of one or more focus areas of the field of view. The system further includes a processor, the processor being constructed to generate a depth point cloud of an object using a plurality of time-of-flight measurements. In the system, the one or more focus areas of the field of view form a plurality of intensity points; and the plurality of intensity points are associated with a critical density. In the system, the system is constructed to determine that the plurality of time-of-flight measurements are greater than a critical distance of the system relative to the object. In the system, an intensity of the light beam meets an eye safety level threshold. The system further includes a processor for generating a three-dimensional representation of the object based on a plurality of time-of-flight measurements and an imaging measurement of another light beam provided by the optical transmitter, wherein the other light beam is associated with a constant intensity and is directed toward the object without being shaped into one or more focusing regions. In the system, the optical receiver is a sensor array including a plurality of sensor elements; and each sensor element of the plurality of sensor elements is constructed to generate a time-of-flight measurement of the plurality of time-of-flight measurements.

根據一些可能實施方案,光學裝置可包括基板。光學裝置可包括安置在該基板上之一或多個光學傳輸器。光學裝置可包括安置在一或多個光學傳輸器的光路中的光塑形光學元件,以向物件提供不均勻圖案化強度光束,以實現對物件的三維量測。光學元件為光達系統的組件。光學元件進一步包含安置在基板上之感測器元件陣列。在光學元件中,感測器元件陣列經建構以判定不均勻圖案化強度光束的複數個飛行時間量測,以判定與物件相關聯的複數個距離。According to some possible implementations, the optical device may include a substrate. The optical device may include one or more optical transmitters disposed on the substrate. The optical device may include a light shaping optical element disposed in the optical path of the one or more optical transmitters to provide an uneven patterned intensity light beam to an object to achieve three-dimensional measurement of the object. The optical element is a component of a lidar system. The optical element further includes an array of sensor elements disposed on the substrate. In the optical element, the array of sensor elements is constructed to determine a plurality of flight time measurements of the uneven patterned intensity light beam to determine a plurality of distances associated with the object.

以下對範例性實施方案的詳細描述參考隨附圖式。不同圖式中之相同元件符號可識別相同或相似元件。以下描述使用光達系統作為實例,然而,本文中所描述的校準原理、程序及方法可與任何感測器一起使用,包括但不限於其他光學感測器。The following detailed description of exemplary embodiments refers to the accompanying drawings. The same element symbols in different drawings can identify the same or similar elements. The following description uses a lidar system as an example, however, the calibration principles, procedures and methods described herein can be used with any sensor, including but not limited to other optical sensors.

諸如光達系統的三維成像系統可提供均勻強度場,以實現視場中之物件的成像。例如,閃光光達系統可傳輸視場的均勻強度場(即,閃光光達系統的視場),且可執行對均勻強度場的反射的量測以產生物件的三維表示。類似地,掃描光達系統可提供一組均勻強度場掃描線以掃過視場,且可執行對一組均勻強度場掃描線的反射的量測以產生物件的三維表示。A three-dimensional imaging system such as a lidar system may provide a uniform intensity field to enable imaging of objects in a field of view. For example, a flash lidar system may transmit a uniform intensity field of the field of view (i.e., the field of view of the flash lidar system), and measurements of reflections of the uniform intensity field may be performed to produce a three-dimensional representation of the object. Similarly, a scanning lidar system may provide a set of uniform intensity field scan lines to scan across the field of view, and measurements of reflections of the set of uniform intensity field scan lines may be performed to produce a three-dimensional representation of the object.

然而,由三維成像系統提供的光的強度可被限制為小於臨限強度。舉例而言,遵守眼睛安全性等級要求可能會阻止三維成像系統提供超過臨限值的光強度。眼睛安全性的臨限值可基於功率、發散角、脈衝持續時間、曝光方向、波長及/或其類似者。類似地,在日益小型化裝置(諸如行動電話)中之功率容量限制可能會限制三維成像系統能夠提供的光強度。因此,在大於距物件的臨限距離處時,反射回至三維成像系統以進行量測的光量可能不足以使得能夠執行準確量測。舉例而言,當光達系統欲判定至視野中一組物件的距離時,一些物件可能在臨限距離之內,且可能由光達系統準確地深度感測,且其他一些物件可能超出臨限距離且光達系統可能接收不到足夠的反射光以進行準確深度感測。However, the intensity of light provided by the three-dimensional imaging system may be limited to less than a critical intensity. For example, compliance with eye safety rating requirements may prevent the three-dimensional imaging system from providing light intensities exceeding a critical value. The eye safety threshold may be based on power, divergence angle, pulse duration, exposure direction, wavelength, and/or the like. Similarly, power capacity limitations in increasingly miniaturized devices (such as cell phones) may limit the light intensity that a three-dimensional imaging system can provide. Therefore, at distances greater than the critical distance from an object, the amount of light reflected back to the three-dimensional imaging system for measurement may be insufficient to enable accurate measurement to be performed. For example, when a lidar system attempts to determine the distance to a set of objects in its field of view, some objects may be within a critical distance and may be accurately depth-sensed by the lidar system, while other objects may be beyond the critical distance and the lidar system may not receive enough reflected light for accurate depth sensing.

本文中所描述的一些實施方案可使用不均勻強度場來執行三維成像。舉例而言,光學系統可包括:光學傳輸器,其提供均勻的強度場;以及光學光塑形元件或光塑形光學元件,其用以將均勻的強度場塑形為不均勻強度場。在此狀況下,藉由使用不均勻強度場,光學系統可使得大於臨限強度的光經引導朝向視場的一些部分,且小於臨限量的光經引導朝向視場的其他部分。舉例而言,光學系統可使得光聚集區域能夠包括大於臨限強度的光,此可使得能夠增加範圍以進行準確深度感測。以此方式,光學系統可在比使用均勻強度場大的距離處實現三維量測,而不會超過整個視場上的光強度臨限值。此外,如本文中所描述,藉由用多個聚集區域塑形不均勻強度場,光學系統可實現用於深度感測的增加大範圍,且可相對於例如傳輸單個聚集雷射脈衝以執行測距的雷射測距系統減少與聚集相關聯的解析度損失。Some embodiments described herein may use a non-uniform intensity field to perform three-dimensional imaging. For example, an optical system may include: an optical transmitter that provides a uniform intensity field; and an optical light shaping element or light shaping optical element that is used to shape the uniform intensity field into a non-uniform intensity field. In this case, by using a non-uniform intensity field, the optical system may enable light greater than a critical intensity to be directed toward some parts of the field of view, and less than a critical amount of light to be directed toward other parts of the field of view. For example, the optical system may enable a light collection area to include light greater than a critical intensity, which may enable an increased range for accurate depth sensing. In this way, optical systems can achieve three-dimensional measurements at greater distances than using a uniform intensity field without exceeding a critical light intensity across the field of view. Furthermore, by shaping a non-uniform intensity field with multiple focusing regions as described herein, optical systems can achieve an increased large range for depth sensing and can reduce the resolution loss associated with focusing relative to, for example, laser ranging systems that transmit a single focused laser pulse to perform ranging.

圖1A及圖1B為本文中所描述的範例性實施方案100的圖。如圖1A及圖1B中所示出,範例性實施方案100可包括用於對物件執行三維量測的感測器系統105。1A and 1B are diagrams of an exemplary embodiment 100 described herein. As shown in FIG. 1A and 1B , the exemplary embodiment 100 may include a sensor system 105 for performing three-dimensional measurement on an object.

如圖1A中所示出,感測器系統105可包括:傳輸器系統110,其可包括光學傳輸器115及光塑形光學元件120,以及接收器系統125,其可包括光學接收器130及一或多個其他光學元件,諸如濾光器135、透鏡140及/或其類似者。在一些實施方案中,感測器系統105可包括處理器,以處理由光學接收器130執行的一或多個量測。在一些實施方案中,感測器系統105可包括一或多個其他光學傳輸器115及/或一或多個其他光學接收器130,以便提供及量測具有不同特性(諸如不同類型的光場)的多個光束,如本文中更詳細描述。在一些實施方案中,感測器系統105可在行動裝置、行動電話、安全裝置、機器人裝置、光達裝置、自動駕駛汽車系統、手勢辨識系統、接近感測器系統、計數系統,及/或其類似者。As shown in FIG1A , the sensor system 105 may include a transmitter system 110, which may include an optical transmitter 115 and a light shaping optical element 120, and a receiver system 125, which may include an optical receiver 130 and one or more other optical elements, such as a filter 135, a lens 140, and/or the like. In some embodiments, the sensor system 105 may include a processor to process one or more measurements performed by the optical receiver 130. In some embodiments, the sensor system 105 may include one or more other optical transmitters 115 and/or one or more other optical receivers 130 to provide and measure multiple light beams having different characteristics, such as different types of light fields, as described in more detail herein. In some implementations, the sensor system 105 can be in a mobile device, a mobile phone, a security device, a robotic device, a lidar device, an autonomous vehicle system, a gesture recognition system, a proximity sensor system, a counting system, and/or the like.

在一些實施方案中,感測器系統105可為距離感測系統。舉例而言,感測器系統105可為光達系統(例如,閃光光達系統、掃描光達系統及/或其類似者)、深度感測器及/或其類似者。在一些實施方案中,感測器系統105可為三維成像系統。舉例而言,感測器系統105可經建構以判定物件的二維影像以及與該物件及/或該物件的一或多個部分相關聯的一或多個距離,以產生該物件的三維表示。在此狀況下,感測器系統105可經建構以將物件的二維影像與物件及/或其一或多個部分的距離組合以產生三維表示。In some embodiments, the sensor system 105 may be a distance sensing system. For example, the sensor system 105 may be a lidar system (e.g., a flash lidar system, a scanning lidar system, and/or the like), a depth sensor, and/or the like. In some embodiments, the sensor system 105 may be a three-dimensional imaging system. For example, the sensor system 105 may be configured to determine a two-dimensional image of an object and one or more distances associated with the object and/or one or more parts of the object to generate a three-dimensional representation of the object. In this case, the sensor system 105 may be configured to combine the two-dimensional image of the object with the distances of the object and/or one or more parts thereof to generate a three-dimensional representation.

在一些實施方案中,光學傳輸器115可為雷射、發光二極體(LED)及/或其類似者。舉例而言,光學傳輸器115可為雷射,其經建構以提供具有均勻強度場的光束用於飛行時間距離判定。另外或替代地,光學傳輸器115可包括垂直腔表面發射雷射(VCSEL)。在一些實施方案中,光學傳輸器115可提供多個光束。舉例而言,光學傳輸器115及光塑形光學元件120可經整合。在此狀況下,單個基板可包括一或多個光學傳輸器115及一或多個光塑形光學元件120。In some embodiments, the optical transmitter 115 may be a laser, a light emitting diode (LED), and/or the like. For example, the optical transmitter 115 may be a laser that is constructed to provide a light beam with a uniform intensity field for time-of-flight distance determination. Additionally or alternatively, the optical transmitter 115 may include a vertical cavity surface emitting laser (VCSEL). In some embodiments, the optical transmitter 115 may provide multiple light beams. For example, the optical transmitter 115 and the light shaping optical element 120 may be integrated. In this case, a single substrate may include one or more optical transmitters 115 and one or more light shaping optical elements 120.

在一些實施方案中,光學傳輸器115可為光譜識別系統、物件識別系統、成像系統、運動追蹤系統、生物測定系統、安全系統及/或其類似者的傳輸器。在一些實施方案中,光學傳輸器115可傳輸與特定光譜範圍相關聯的光束。舉例而言,光學傳輸器115可傳輸可見光範圍、近紅外線範圍、中紅外線範圍、光達範圍及/或其類似者的光。儘管根據一組特定光譜範圍描述一些實施方案,但其他光譜範圍亦可為可能的。In some embodiments, the optical transmitter 115 may be a transmitter of a spectral recognition system, an object recognition system, an imaging system, a motion tracking system, a biometric system, a security system, and/or the like. In some embodiments, the optical transmitter 115 may transmit a light beam associated with a specific spectral range. For example, the optical transmitter 115 may transmit light in the visible range, the near infrared range, the mid-infrared range, the LiDAR range, and/or the like. Although some embodiments are described according to a set of specific spectral ranges, other spectral ranges may also be possible.

在一些實施方案中,光學接收器130可為包括多個感測器元件的感測器陣列,以對反射光束或其部分進行多次量測。舉例而言,光學接收器130可包括安置在基板上的多個感測器元件,以接收多個光束或單個光束的多個部分。In some implementations, the optical receiver 130 may be a sensor array including multiple sensor elements to perform multiple measurements of the reflected light beam or its portion. For example, the optical receiver 130 may include multiple sensor elements disposed on a substrate to receive multiple light beams or multiple portions of a single light beam.

在一些實施方案中,光塑形光學元件120可經建構從而以特定圖案將均勻強度場擴散或塑形為不均勻強度場,如本文中更詳細地描述。以此方式,藉由將光束的光子聚集在場景的特定區域處,增加在場景的特定區域處返回至光學接收器130的光子的數量,從而較之使用均勻強度場,能夠以較大準確度、在較遠距離處及/或在更密集環境光條件下實現飛行時間量測。在一些實施方案中,光塑形光學元件120以不均勻密度分佈點的圖案以產生不均勻強度場。In some embodiments, the light shaping optical element 120 can be constructed to diffuse or shape a uniform intensity field into a non-uniform intensity field in a particular pattern, as described in more detail herein. In this way, by focusing the photons of the light beam at a particular area of the scene, the number of photons returned to the optical receiver 130 at the particular area of the scene is increased, thereby enabling time-of-flight measurements with greater accuracy, at greater distances, and/or in denser ambient light conditions than using a uniform intensity field. In some embodiments, the light shaping optical element 120 distributes the pattern of dots in a non-uniform density to produce the non-uniform intensity field.

在一些實施方案中,光塑形光學元件120可為具有特定結構的特定類型光學元件。舉例而言,光塑形光學元件120可為及/或包括光學漫射器、濾光器、準直儀、透鏡、反射鏡、漫射器(例如,工程漫射器、全像漫射器等)、另一光學元件及/或其類似者。在一些實施方案中,光塑形光學元件120可為繞射光學元件(DOE),以繞射由光學傳輸器115提供的光以形成不均勻強度場。在一些實施方案中,光塑形光學元件120可為折射光學元件(DOE),以折射由光學傳輸器115提供的光以形成不均勻強度場。在一些實施方案中,光塑形光學元件120可為一組微透鏡,以塑形由光學傳輸器115提供的光以形成不均勻強度場。在一些實施方案中,光塑形光學元件120可變更光束的發散以形成不均勻強度場。In some embodiments, the light shaping optical element 120 may be a specific type of optical element with a specific structure. For example, the light shaping optical element 120 may be and/or include an optical diffuser, a filter, a collimator, a lens, a reflector, a diffuser (e.g., an engineered diffuser, a holographic diffuser, etc.), another optical element, and/or the like. In some embodiments, the light shaping optical element 120 may be a diffractive optical element (DOE) to diffract the light provided by the optical transmitter 115 to form a non-uniform intensity field. In some embodiments, the light shaping optical element 120 may be a refractive optical element (DOE) to refract the light provided by the optical transmitter 115 to form a non-uniform intensity field. In some implementations, the light shaping optical element 120 may be a set of micro lenses to shape the light provided by the optical transmitter 115 to form a non-uniform intensity field. In some implementations, the light shaping optical element 120 may change the divergence of the light beam to form a non-uniform intensity field.

在一些實施方案中,光塑形光學元件120可為工程漫射器,其可提供介於為用DOE可實現的特徵大小的大約100倍與1000倍之間的特徵大小(例如,大約20微米(μm)且其中深度小於80μm),減少的製造誤差及/或其類似者。另外或替代地,使用工程漫射器可提供介於大約0.25度與150度之間的發散角靈活性。在一些實施方案中,光塑形光學元件120可為矩形分佈工程漫射器、圓形分佈工程漫射器及/或任何其他形狀的分佈型工程漫射器。在此狀況下,可在例如厚度為大約0.3毫米(mm),在0.1 mm與0.01 mm之間及/或其類似者的玻璃基板上圖案化及/或形成光塑形光學元件120。另外或替代地,可將光塑形光學元件120壓印至附接至基板的基板上,及/或其類似者。另外或替代地,光塑形光學元件120可獨立於基板且可由光學構件的一或多個組件所形成。在一些實施方案中,光塑形光學元件120可具有非平面形狀。In some embodiments, the light shaping optical element 120 may be an engineered diffuser that can provide feature sizes between about 100 and 1000 times greater than those achievable with a DOE (e.g., about 20 micrometers (μm) with a depth of less than 80 μm), reduced manufacturing errors, and/or the like. Additionally or alternatively, the use of an engineered diffuser can provide divergence angle flexibility between about 0.25 degrees and 150 degrees. In some embodiments, the light shaping optical element 120 may be a rectangular distributed engineered diffuser, a circular distributed engineered diffuser, and/or any other shape of distributed engineered diffuser. In this case, the light shaping optical element 120 may be patterned and/or formed on, for example, a glass substrate having a thickness of about 0.3 millimeters (mm), between 0.1 mm and 0.01 mm, and/or the like. Additionally or alternatively, the light shaping optical element 120 may be embossed onto a substrate attached to a substrate, and/or the like. Additionally or alternatively, the light shaping optical element 120 may be independent of the substrate and may be formed from one or more components of an optical component. In some embodiments, the light shaping optical element 120 may have a non-planar shape.

在一些實施方案中,光塑形光學元件120可經光學耦合至多個光學傳輸器115以使得能夠產生不均勻強度場。另外或替代地,多個光塑形光學元件120可引導多個波束或單個光束的多個部分朝向共同區域的以產生不均勻強度場。在一些實施方案中,光塑形光學元件120可包括多個光塑形光學元件(例如,多個不同光塑形光學元件)以形成不均勻強度場光的單個圖案、不均勻強度場光的多個不同圖案、均勻強度場光(例如,與不均勻強度場光組合使用)及/或其類似者。在一些實施方案中,多個光塑形光學元件120可光學耦合至多個光學傳輸器115,以形成單個圖案、多個圖案及/或其類似者。另外或替代地,單個光塑形光學元件120可光學耦合至單個光學傳輸器115,單個光塑形光學元件120可光學耦合至多個光學傳輸器115,多個光塑形光學元件120可光學耦合至單個光學傳輸器115,及/或其類似者。In some embodiments, the light shaping optical element 120 may be optically coupled to a plurality of optical transmitters 115 to enable generation of a non-uniform intensity field. Additionally or alternatively, the plurality of light shaping optical elements 120 may direct a plurality of beams or a plurality of portions of a single light beam toward a common area to generate a non-uniform intensity field. In some embodiments, the light shaping optical element 120 may include a plurality of light shaping optical elements (e.g., a plurality of different light shaping optical elements) to form a single pattern of non-uniform intensity field light, a plurality of different patterns of non-uniform intensity field light, a uniform intensity field light (e.g., used in combination with a non-uniform intensity field light), and/or the like. In some embodiments, the plurality of light shaping optical elements 120 may be optically coupled to a plurality of optical transmitters 115 to form a single pattern, a plurality of patterns, and/or the like. Additionally or alternatively, a single light shaping optical element 120 may be optically coupled to a single optical transmitter 115, a single light shaping optical element 120 may be optically coupled to multiple optical transmitters 115, multiple light shaping optical elements 120 may be optically coupled to a single optical transmitter 115, and/or the like.

在一些實施方案中,光塑形光學元件120可與提供一或多個其他功能的一或多層相關聯及/或包括該一或多層。舉例而言,光塑形光學元件120可包括及/或耦合至帶通濾光層,長通濾光層、短通濾光層、抗反射塗層、聚焦層、光學傳輸導電層及/或其類似者。In some implementations, the light shaping optical element 120 may be associated with and/or include one or more layers that provide one or more other functions. For example, the light shaping optical element 120 may include and/or be coupled to a bandpass filter layer, a long pass filter layer, a short pass filter layer, an anti-reflection coating, a focusing layer, an optical transmission conductive layer, and/or the like.

如在圖1A中且由元件符號145進一步示出,光學傳輸器115可朝向光塑形光學元件120傳輸輸入光束。舉例而言,光學傳輸器115可傳輸具有均勻強度場的輸入光束。在此狀況下,輸入光束可與小於臨限強度相關聯,諸如小於眼睛安全性等級臨限值(例如,小於與眼睛安全性等級相關聯的臨限功率的功率,諸如小於在給定發散角、脈衝持續時間、曝光方向、波長及/或其類似者下,小於臨限值的功率)、小於與功率容量相關的臨限值,及/或其類似者。在一些狀況下,臨限值功率可與光學傳輸器的特定類別有關,例如,用於類別1雷射、類別2雷射、類別3雷射及/或其類似者等的功率臨限值。在一些實施方案中,臨限強度可與均勻強度場的總強度有關。另外或替代地,臨限強度可與均勻強度場的淨強度、平均強度、最大強度及/或其類似者有關。在一些實施方案中,輸入光束可與大於臨限強度(例如,關於眼睛安全性)相關聯。在此狀況下,光塑形光學元件120及/或一或多個其他光學元件可減小輸出光束的強度,如本文中所描述,以使其在輸出光束的整個照明場上具有小於臨限值的強度。在一些實施方案中,輸入光束可具有恆定強度。在一些實施方案中,輸入光束可具有在均勻強度場的臨限值部分內恆定的強度(例如,強度在均勻強度場的中心95%內恆定且在邊緣處逐漸減小)。As further shown in FIG. 1A and by reference numeral 145, the optical transmitter 115 can transmit an input light beam toward the light shaping optical element 120. For example, the optical transmitter 115 can transmit an input light beam having a uniform intensity field. In this case, the input light beam can be associated with less than a critical intensity, such as less than an eye safety rating threshold (e.g., less than a critical power associated with an eye safety rating, such as less than a power less than a critical value at a given divergence angle, pulse duration, exposure direction, wavelength, and/or the like), less than a threshold value associated with power capacity, and/or the like. In some cases, the threshold power may be related to a particular class of optical transmitters, such as a power threshold for a class 1 laser, a class 2 laser, a class 3 laser, and/or the like. In some implementations, the threshold intensity may be related to the total intensity of a uniform intensity field. Additionally or alternatively, the threshold intensity may be related to the net intensity, average intensity, maximum intensity, and/or the like of a uniform intensity field. In some implementations, the input beam may be associated with an intensity greater than a threshold (e.g., regarding eye safety). In this case, the light shaping optical element 120 and/or one or more other optical elements may reduce the intensity of the output beam, as described herein, so that it has an intensity less than the threshold over the entire illumination field of the output beam. In some embodiments, the input beam may have a constant intensity. In some embodiments, the input beam may have an intensity that is constant within a critical portion of a uniform intensity field (e.g., the intensity is constant within the central 95% of the uniform intensity field and gradually decreases at the edges).

如在圖1A中進一步示出,光塑形光學元件120可對輸入光束進行塑形,以形成具有經引導朝向物件150的特定圖案的輸出光束。舉例而言,光塑形光學元件120可聚集輸入光束、擴散輸入光束,在輸入光束中引起干涉圖案及/或其類似者。以此方式,光塑形光學元件120可以不均勻強度場來引導輸出光束。舉例而言,光塑形光學元件120可將一組離散照明點引導朝向物件150,該等離散照明點可各自為單獨輸出光束(輸出光束的光束部分)。另外或替代地,光塑形光學元件120可形成輸出光束,該輸出光束具有在該輸出光束的視場中之一組聚集區域及在該輸出光束的視場中之另一組區域,在該聚集區域中該輸出光束與相對較高光強度相關聯,且在該另一組區域中該輸出光束與相對較低光強度相關聯,如在本文中更詳細地描述。在此狀況下,輸出光束可為以下形式:具有變化強度的單個輸出光束,具有變化強度的多個輸出光束,具有不同強度的多個輸出光束及/或其類似者。另外或替代地,光塑形光學元件120可形成其他類型及配置的聚集區域,諸如柵格配置、干涉圖案配置及/或其類似者,如本文中更詳細地描述。As further shown in FIG. 1A , the light shaping optical element 120 can shape an input light beam to form an output light beam having a specific pattern that is directed toward the object 150. For example, the light shaping optical element 120 can focus the input light beam, diffuse the input light beam, induce an interference pattern in the input light beam, and/or the like. In this way, the light shaping optical element 120 can direct the output light beam with a non-uniform intensity field. For example, the light shaping optical element 120 can direct a set of discrete illumination points toward the object 150, which can each be a separate output light beam (beam portion of the output light beam). Additionally or alternatively, the light shaping optical element 120 may form an output beam having a set of focusing regions in the field of view of the output beam and another set of regions in the field of view of the output beam in which the output beam is associated with a relatively higher light intensity and in which the output beam is associated with a relatively lower light intensity, as described in more detail herein. In this case, the output beam may be in the form of a single output beam with varying intensity, multiple output beams with varying intensity, multiple output beams with different intensities, and/or the like. Additionally or alternatively, the light shaping optical element 120 may form other types and configurations of focusing regions, such as a grid configuration, an interference pattern configuration, and/or the like, as described in more detail herein.

如在圖1B中併用元件符號155示出,基於一或多個輸出光束經引導朝向物件150,輸出光束的反射可經引導朝向接收器系統125。舉例而言,輸出光束的反射可由透鏡140及濾光器135聚集、濾光、塑形及/或其類似者,且可由光學接收器130接收。在此狀況下,光學接收器130可使用感測器元件陣列接收自物件150反射的輸出光束的一部分集合。在此狀況下,輸出光束的每一部分可對應於光的聚集區域,且光學接收器130可使用感測器元件來執行與每一聚集區域相關聯的飛行時間量測。另外或替代地,光學接收器130可接收多個反射光束。舉例而言,當光塑形光學元件120致使將多個離散輸出光束引導朝向物件150時,光學接收器130可接收多個離散輸出光束的反射。在一些實施方案中,光學接收器130可安置在透鏡140後面,且多個輸出光束的多次反射可在由光學感測器接收之前穿過透鏡140及濾光器135。另外或替代地,透鏡140及濾光器135可不安置在物件150與光學接收器130之間的光學路徑中。儘管本文中所描述的一些實施方案係根據自由空間光學組態來描述,但其他實施方案亦可為可能的,諸如將傳輸器系統110、接收器系統125及/或其類似者整合至單個共同基板中。As shown in FIG. 1B with reference numeral 155, based on one or more output light beams being directed toward object 150, reflections of the output light beams may be directed toward receiver system 125. For example, reflections of the output light beams may be collected, filtered, shaped, and/or the like by lens 140 and filter 135, and may be received by optical receiver 130. In this case, optical receiver 130 may receive a portion of the set of output light beams reflected from object 150 using an array of sensor elements. In this case, each portion of the output light beams may correspond to a concentrated area of light, and optical receiver 130 may use the sensor elements to perform a time-of-flight measurement associated with each concentrated area. Additionally or alternatively, optical receiver 130 may receive multiple reflected light beams. For example, when the light shaping optical element 120 causes the plurality of discrete output light beams to be directed toward the object 150, the optical receiver 130 may receive reflections of the plurality of discrete output light beams. In some implementations, the optical receiver 130 may be disposed behind the lens 140, and multiple reflections of the plurality of output light beams may pass through the lens 140 and the filter 135 before being received by the optical sensor. Additionally or alternatively, the lens 140 and the filter 135 may not be disposed in the optical path between the object 150 and the optical receiver 130. Although some implementations described herein are described in terms of free space optics configurations, other implementations may also be possible, such as integrating the transmitter system 110, the receiver system 125, and/or the like into a single common substrate.

如在圖1B中且由元件符號160進一步示出,感測器系統105可判定物件150的一或多個三維量測。舉例而言,光學接收器130及/或與其相關聯的處理器可對光的輸出光束的反射執行一或多個飛行時間量測且可判定物件150及/或其一或多個部分距感測器系統105的距離。在此狀況下,光學接收器130及/或與其相關聯的處理器可基於一或多個飛行時間量測來判定物件150及/或其部分距感測器系統105的距離,且可基於物件150及/或其部分距感測器系統105的距離產生物件150的三維量測。在一些實施方案中,感測器系統105可執行直接飛行時間量測(例如,藉由量測時間)、閘控飛行時間量測(例如,藉由使用快門結構,諸如電動快門來打開及關閉閘)、間接飛行時間量測(例如,藉由量測相位)及/或其類似者。1B and as further shown by reference numeral 160, the sensor system 105 may determine one or more three-dimensional measurements of the object 150. For example, the optical receiver 130 and/or a processor associated therewith may perform one or more time-of-flight measurements on the reflection of the output beam of light and may determine the distance of the object 150 and/or one or more portions thereof from the sensor system 105. In this case, the optical receiver 130 and/or a processor associated therewith may determine the distance of the object 150 and/or portions thereof from the sensor system 105 based on the one or more time-of-flight measurements and may generate a three-dimensional measurement of the object 150 based on the distance of the object 150 and/or portions thereof from the sensor system 105. In some implementations, the sensor system 105 may perform direct time-of-flight measurement (e.g., by measuring time), gated time-of-flight measurement (e.g., by using a shutter structure, such as an electric shutter, to open and close a gate), indirect time-of-flight measurement (e.g., by measuring phase), and/or the like.

在一些實施方案中,感測器系統105可產生物件150的深度點雲。舉例而言,當感測器系統105以點圖案提供具有多個強度點的不均勻強度場時,如本文中更詳細地描述,感測器系統105可產生表示由點圖案中之多個強度點照明的物件150的多個部分的多個距離量測的深度點雲。在此狀況下,藉由在視場中提供臨限密度的強度點,感測器系統105實現物件150的所產生三維表示的臨限級解析度。In some implementations, the sensor system 105 can generate a depth point cloud of the biological object 150. For example, when the sensor system 105 provides a non-uniform intensity field having a plurality of intensity points in a dot pattern, as described in more detail herein, the sensor system 105 can generate a depth point cloud representing a plurality of distance measurements of a plurality of portions of the object 150 illuminated by the plurality of intensity points in the dot pattern. In this case, by providing a critical density of intensity points in the field of view, the sensor system 105 achieves a critical level of resolution of the generated three-dimensional representation of the object 150.

在一些實施方案中,感測器系統105可組合多組量測以產生物件150的三維量測或三維表示。舉例而言,感測器系統105可向物件150提供具有均勻強度的另一光束,以執行物件150的二維成像,且可將二維成像與物件150的一或多個基於飛行時間的距離量測組合,以產生物件150的三維表示。以此方式,感測器系統105可使用單獨光束來實現三維成像。另外或替代地,感測器系統105可使用與飛行時間量測相同的光束來執行二維成像。舉例而言,感測器系統105可判定關於輸出光束的反射的飛行時間量測及成像量測兩者以實現物件150的三維成像。以此方式,感測器系統105可執行三維成像,而無需將單獨光束引導朝向物件150,此可減小與感測器系統105相關聯的大小及/或成本。In some implementations, the sensor system 105 may combine multiple sets of measurements to produce a three-dimensional measurement or three-dimensional representation of the object 150. For example, the sensor system 105 may provide another light beam with uniform intensity to the object 150 to perform two-dimensional imaging of the object 150, and may combine the two-dimensional imaging with one or more time-of-flight-based distance measurements of the object 150 to produce a three-dimensional representation of the object 150. In this way, the sensor system 105 may use a single light beam to achieve three-dimensional imaging. Additionally or alternatively, the sensor system 105 may use the same light beam as the time-of-flight measurement to perform two-dimensional imaging. For example, the sensor system 105 may determine both time-of-flight measurements and imaging measurements about the reflection of the output light beam to achieve three-dimensional imaging of the object 150. In this way, the sensor system 105 can perform three-dimensional imaging without directing separate light beams toward the object 150, which can reduce the size and/or cost associated with the sensor system 105.

如上文所指示,圖1A及圖1B僅提供作為一或多個實例。其他實例可與關於圖1A及圖1B所描述的實例不同。As indicated above, Figures 1A and 1B are provided only as one or more examples. Other examples may be different from the examples described with respect to Figures 1A and 1B.

圖2A至圖2G為可由光塑形光學元件120塑形的不均勻強度光場的範例性實施方案200-250的圖。Figures 2A to 2G are diagrams of exemplary implementation schemes 200-250 of non-uniform intensity light fields that can be shaped by the light shaping optical element 120.

如圖2A中所示出,範例性實施方案200示出不均勻強度場的實例。如由圖表202所示出,不均勻強度場可包括呈階梯圖案的較高強度光的離散區域204及較低強度光(例如,零強度光)的離散區域206。換言之,視場的一些區域由輸出光束照明,而視場的其他區域為由輸出光束照明。在此狀況下,離散區域204可為經照明的視野的聚集區域,而離散區域206可為視場的未經照明區域。在某些情況下,圖2A中所示出的每一點實際上可表示聚集至特定區域中之多個點。例如,光塑形光學元件可將多個點聚集至視場之每一區域中,以將光聚集在視場的每一區域中,而非橫跨視場中提供光點的均勻分佈。As shown in FIG2A , exemplary implementation 200 illustrates an example of a non-uniform intensity field. As shown by graph 202, the non-uniform intensity field may include discrete regions 204 of higher intensity light and discrete regions 206 of lower intensity light (e.g., zero intensity light) in a stepped pattern. In other words, some areas of the field of view are illuminated by the output beam, while other areas of the field of view are illuminated by the output beam. In this case, discrete regions 204 may be concentrated areas of the illuminated field of view, while discrete regions 206 may be unilluminated areas of the field of view. In some cases, each point shown in FIG2A may actually represent multiple points concentrated into a particular area. For example, light shaping optics may focus multiple points into each area of the field of view to focus light in each area of the field of view rather than providing a uniform distribution of light points across the field of view.

以此方式,不均勻強度場可形成點圖案(即,其中每一點表示光束或其一部分),以聚集光束且用光束不均勻地照明物件,從而增加感測器系統105可相對於藉由使光穿過漫射器而產生的均勻強度場執行深度感測量測。在一些實施方案中,較高強度光的離散區域204可與超過臨限值的強度相關聯,而較低強度光的離散區域206可與不超過臨限值的強度相關聯,使得形成不均勻強度場的光束的總強度小於臨限值。以此方式,感測器系統105可在光的總強度不超過臨限值的情況下增加深度感測的範圍。在另一實例中,感測器系統105可為不均勻強度場提供柵格圖案、條紋圖案及/或其類似者,而非點圖案。In this way, the non-uniform intensity field can form a pattern of dots (i.e., where each dot represents a light beam or a portion thereof) to focus the light beam and illuminate an object unevenly with the light beam, thereby increasing the range of depth sensing measurements that the sensor system 105 can perform relative to a uniform intensity field produced by passing the light through a diffuser. In some embodiments, discrete regions 204 of higher intensity light can be associated with intensities that exceed a threshold value, while discrete regions 206 of lower intensity light can be associated with intensities that do not exceed the threshold value, such that the total intensity of the light beams forming the non-uniform intensity field is less than the threshold value. In this way, the sensor system 105 can increase the range of depth sensing without the total intensity of the light exceeding the threshold value. In another example, the sensor system 105 may provide a grid pattern, a stripe pattern, and/or the like for the non-uniform intensity field instead of a dot pattern.

如圖2B中所示出,範例性實施方案210示出不均勻強度場的另一實例。如由圖表212所示出,不均勻強度場可包括呈階梯圖案的較高強度光的離散區域214及較低強度光(例如,零強度光)的離散區域216。在另一實例中,不均勻強度場可為鋸齒圖案而非階梯圖案。在此狀況下,如由圖表212所示出,每一離散區域214可與多個不同光強度相關聯。以此方式,不均勻強度場增加點圖案的點的大小,從而相對於例如更小的點大小,增加物件的三維量測的解析度。在一些實施方案中,根據輻射量測的餘弦定律,光塑形光學元件可產生點、線或圖案,其中點、線或圖案的中心在投影強度上不相等。在一些實施方案中,根據輻射量測的餘弦定律,視場邊緣處的光可具有比中心中之圖案高的強度,以在反射光的點的中心處產生均勻強度。舉例而言,邊緣處的點可具有比視場的中心處的點高的中心強度,以使得邊緣處的點反射與中心處的點反射平衡。替代地,在另一任意選定位置(例如,邊緣、中心、邊緣與中心之間的點等)處的強度可與比另一任意選定位置高的圖案的中心處的強度相關聯。As shown in FIG2B , exemplary embodiment 210 illustrates another example of a non-uniform intensity field. As shown by graph 212, the non-uniform intensity field may include discrete regions 214 of higher intensity light and discrete regions 216 of lower intensity light (e.g., zero intensity light) in a step pattern. In another example, the non-uniform intensity field may be a sawtooth pattern rather than a step pattern. In this case, each discrete region 214 may be associated with a plurality of different light intensities, as shown by graph 212. In this manner, the non-uniform intensity field increases the size of the dots of the dot pattern, thereby increasing the resolution of three-dimensional measurements of an object relative to, for example, a smaller dot size. In some embodiments, the light shaping optical element can produce points, lines, or patterns in accordance with the cosine law of radiation measurement, where the centers of the points, lines, or patterns are not equal in projected intensity. In some embodiments, light at the edge of the field of view can have a higher intensity than the pattern in the center to produce a uniform intensity at the center of the points that reflect light in accordance with the cosine law of radiation measurement. For example, points at the edge can have a higher center intensity than points at the center of the field of view so that the reflection of points at the edge is balanced with the reflection of points at the center. Alternatively, the intensity at another arbitrarily selected location (e.g., the edge, the center, a point between the edge and the center, etc.) can be associated with an intensity at the center of the pattern that is higher than another arbitrarily selected location.

如在圖2C中所示出,範例性實施方案220示出不均勻強度場的另一實例。如由圖表222所示出,不均勻強度場可包括呈階梯圖案的較高強度光的離散區域224及較低強度光(例如,非零強度光)的離散區域226。換言之,視場的所有區域至少部分經照明,但一些區域經照明小於其他區域。在此狀況下,離散區域224可為經照明的聚集區域,且離散區域226可為亦經照明但比離散區域224用更少光的區域。舉例而言,相對於離散區域224,離散區域226可與小於10%的照明強度相關聯,從而與使用均勻強度場的情況相比,使得離散區域226能夠在臨限距離處將較大數量的光子返回至感測器系統105。另外或替代地,相對於離散區域204,離散區域226可與小於90%照明強度,小於80%照明強度,介於80%與10%之間的照明強度及/或其類似物相關聯。在一些實施方案中,感測器系統105可能能夠在離散區域226處執行感測。舉例而言,當在離散區域226處提供非零強度且物件在臨限值內時,感測器系統105可判定物件及/或其部分橫跨視野的範圍。以此方式,感測器系統105可實現使用對離散區域224執行的飛行時間量測進行的深度感測及使用對離散區域226執行的量測進行的成像兩者。此外,基於橫跨整個視場提供至少一些光,相對於例如視場的部分不包括用於執行量測的光的不均勻強度場,感測器系統105實現物件的三維量測的解析度的改良。As shown in FIG2C , exemplary embodiment 220 illustrates another example of a non-uniform intensity field. As shown by graph 222, the non-uniform intensity field may include discrete regions 224 of higher intensity light and discrete regions 226 of lower intensity light (e.g., non-zero intensity light) in a stepped pattern. In other words, all areas of the field of view are at least partially illuminated, but some areas are illuminated less than other areas. In this case, discrete regions 224 may be concentrated areas that are illuminated, and discrete regions 226 may be areas that are also illuminated but with less light than discrete regions 224. For example, discrete region 226 may be associated with less than 10% of the illumination intensity relative to discrete region 224, thereby enabling discrete region 226 to return a greater number of photons to sensor system 105 at a critical distance compared to the case where a uniform intensity field is used. Additionally or alternatively, discrete region 226 may be associated with less than 90% illumination intensity, less than 80% illumination intensity, between 80% and 10% illumination intensity, and/or the like relative to discrete region 204. In some embodiments, sensor system 105 may be able to perform sensing at discrete region 226. For example, when a non-zero intensity is provided at discrete region 226 and the object is within a threshold, sensor system 105 can determine the extent of the object and/or portion thereof across the field of view. In this manner, sensor system 105 can achieve both depth sensing using time-of-flight measurements performed on discrete region 224 and imaging using measurements performed on discrete region 226. Furthermore, sensor system 105 achieves improved resolution of three-dimensional measurements of the object based on providing at least some light across the entire field of view, relative to, for example, a non-uniform intensity field where portions of the field of view do not include light for performing measurements.

如在圖2D中所示出,範例性實施方案230示出用於掃描類型的感測器系統105(例如,掃描光達系統)的非統一強度場的另一實例。如由圖表232所示出,不均勻強度場可包括呈階梯圖案的較高強度光的離散線234及較低強度光(例如,零強度光)的間隙236。例如,光學傳輸器115可提供均勻掃描線,且光塑形光學元件120可將均勻掃描線塑形為包括離散線234(即,形成線的線段或強度點)及間隙236的不均勻掃描線。在另一實例中,間隙236可用比離散線234小的強度來部分地照明,而非間隙236具有零強度光。在此狀況下,感測器系統105可藉由提供離散線234來掃描視場而橫跨視場進行水平掃掠。另外或替代地,感測器或系統105可提供水平離散線234及間隙236,且可垂直地掃描以掃描視場以執行深度感測量測。以此方式,相對於使用較低強度連續線來掃描視場,感測器系統105增加用於掃描深度感測的範圍。As shown in FIG2D , exemplary embodiment 230 illustrates another example of a non-uniform intensity field for a scanning type sensor system 105 (e.g., a scanning lidar system). As shown by graph 232, the non-uniform intensity field may include discrete lines 234 of higher intensity light and gaps 236 of lower intensity light (e.g., zero intensity light) in a step pattern. For example, the optical transmitter 115 may provide a uniform scan line, and the light shaping optical element 120 may shape the uniform scan line into a non-uniform scan line including discrete lines 234 (i.e., line segments or intensity points forming a line) and gaps 236. In another example, the gaps 236 may be partially illuminated with a lesser intensity than the discrete lines 234, while non-gaps 236 have zero intensity light. In this case, the sensor system 105 may scan horizontally across the field of view by providing discrete lines 234 to scan the field of view. Additionally or alternatively, the sensor or system 105 may provide horizontal discrete lines 234 and gaps 236 and may scan vertically to scan the field of view to perform depth sensing measurements. In this way, the sensor system 105 increases the range used for scanning depth sensing relative to using lower intensity continuous lines to scan the field of view.

如在圖2E中所示出,範例性實施方案240示出不均勻強度場的另一實例。如由圖表242所示出,不均勻強度場可包括由光的環形圖案(例如,其形成光的干涉圖案)形成的光強度的連續圖案(例如,基於正弦的圖案)。在此狀況下,連續圖案可包括較高強度的光的聚集區域244及較低強度的非聚集區域246。As shown in FIG2E , exemplary embodiment 240 illustrates another example of a non-uniform intensity field. As shown by graph 242, the non-uniform intensity field may include a continuous pattern (e.g., a sinusoidal-based pattern) of light intensity formed by a ring-shaped pattern of light (e.g., which forms an interference pattern of light). In this case, the continuous pattern may include concentrated areas 244 of higher intensity light and non-concentrated areas 246 of lower intensity.

如在圖2F中所示出,範例性實施方案250示出不均勻強度場及均勻強度場的實例。如由圖表251所示出,不均勻強度場可包括呈階梯圖案的較高強度光的離散區域及較低強度光(例如,零強度光)的離散區域,且其可與小於臨限值的總強度相關聯(但其可包括超過臨限值的高強度光的離散區域)。與此對比,如由圖表255所示出,均勻強度場可為恆定強度(例如,非零強度)場,其可與小於臨限值的強度相關聯。在此狀況下,感測器系統105可使用不均勻強度場傳輸第一光束以執行深度感測,且使用均勻強度場傳輸第二光束以執行影像感測。另外或替代地,感測器系統105可傳輸單個光束,且可包括光塑形光學元件(例如,光塑形光學元件120的光塑形光學元件),以將單個光束分裂成用於塑形為不均勻強度場的第一光束及用於擴散至均勻強度場的第二光束。在一些實施方案中,感測器系統105可包括多個VCSEL陣列以提供多個光束,且多個VCSEL陣列可同時、依序及/或其類似者進行脈衝,以使用光學接收器130的單個影像感測器捕獲深度點雲及二維影像兩者。以此方式,感測器系統105可實現使用對不均勻強度場執行的飛行時間量測進行的深度感測及使用對均勻強度場執行的量測進行的成像兩者。儘管本文中根據一組特定圖案描述一些實施方案,但其他圖案亦可為可能的,且可與本文中所描述的不同。舉例而言,其他圖案可包括聚集區域的其他重複圖案、聚集區域的其他非重複圖案、聚集區域的規則圖案、聚集區域的不規則圖案及/或其類似者。在一些實施方案中,感測器系統105可投影多個不同圖案(例如,用於單獨成像,用於組合以產生單個影像等)。As shown in FIG2F , exemplary embodiment 250 illustrates examples of non-uniform intensity fields and uniform intensity fields. As shown by graph 251 , a non-uniform intensity field may include discrete regions of higher intensity light and discrete regions of lower intensity light (e.g., zero intensity light) in a stepped pattern, and may be associated with a total intensity less than a threshold value (although it may include discrete regions of high intensity light exceeding the threshold value). In contrast, as shown by graph 255 , a uniform intensity field may be a constant intensity (e.g., non-zero intensity) field that may be associated with an intensity less than a threshold value. In this case, the sensor system 105 may transmit a first light beam using a non-uniform intensity field to perform depth sensing and a second light beam using a uniform intensity field to perform image sensing. Additionally or alternatively, the sensor system 105 may transmit a single light beam and may include a light shaping optical element (e.g., a light shaping optical element of the light shaping optical element 120) to split the single light beam into a first light beam for shaping into a non-uniform intensity field and a second light beam for diffusing into a uniform intensity field. In some embodiments, the sensor system 105 may include multiple VCSEL arrays to provide multiple light beams, and the multiple VCSEL arrays may be pulsed simultaneously, sequentially, and/or the like to capture both a depth point cloud and a two-dimensional image using a single image sensor of the optical receiver 130. In this way, the sensor system 105 can achieve both depth sensing using time-of-flight measurements performed on a non-uniform intensity field and imaging using measurements performed on a uniform intensity field. Although some embodiments are described herein in terms of a set of specific patterns, other patterns may be possible and may be different from those described herein. For example, other patterns may include other repeating patterns of clustered areas, other non-repeating patterns of clustered areas, regular patterns of clustered areas, irregular patterns of clustered areas, and/or the like. In some embodiments, the sensor system 105 may project multiple different patterns (e.g., for separate imaging, for combination to produce a single image, etc.).

如圖2G中所示出,範例性實施方案260示出不均勻強度場的實例。如由圖表262所示出,基於相對於區域266由光塑形光學元件將較高密度的強度點引導至離散區域264,不均勻強度場可包括具有較高強度光的離散區域264。2G, exemplary embodiment 260 illustrates an example of a non-uniform intensity field. As shown by graph 262, the non-uniform intensity field may include discrete regions 264 having higher intensity light based on directing a higher density of intensity points to discrete regions 264 relative to regions 266 by light shaping optical elements.

如上文所指示,圖2A至圖2G僅提供作為一或多個實例。其他實例可能與關於圖2A至圖2G所描述的實例不同。As indicated above, Figures 2A to 2G are provided only as one or more examples. Other examples may be different from the examples described with respect to Figures 2A to 2G.

圖3A至圖3C為可由光塑形光學元件120塑形的不均勻強度光場的範例性實施方案300至320的圖。Figures 3A to 3C are diagrams of exemplary implementations 300 to 320 of non-uniform intensity light fields that can be shaped by the light shaping optical element 120.

如在圖3A中且由範例性實施方案300所示出,一些圖案可具有自第一組區域中之聚集光強度至第二組區域中之較低光強度變化的強度(例如,其大於臨限光強度),其中強度隨函數(例如正弦函數)而變化。在此狀況下,臨限光強度可介於最高濃度點處的強度的10%至90%之間。相比而言,如由圖3B且由範例性實施方案310所示出,可使用在點之間具有均勻強度場的均勻強度點。相比而言,如由圖3C所示出,可在三維中提供不均勻強度場。在另一實例中,可以變化強度產生線圖案、重複圖案、非重複圖案、多個不同圖案,或其組合及/或其類似者。As shown in FIG. 3A and by exemplary embodiment 300, some patterns may have intensities that vary from a concentrated light intensity in a first set of regions to a lower light intensity in a second set of regions (e.g., greater than a critical light intensity), where the intensity varies with a function (e.g., a sine function). In this case, the critical light intensity may be between 10% and 90% of the intensity at the highest concentration point. In contrast, as shown by FIG. 3B and by exemplary embodiment 310, uniform intensity points with a uniform intensity field between points may be used. In contrast, as shown by FIG. 3C, a non-uniform intensity field may be provided in three dimensions. In another example, the intensity may be varied to produce a line pattern, a repeating pattern, a non-repeating pattern, a plurality of different patterns, or combinations thereof and/or the like.

如上文所指示,圖3A至圖3C僅提供作為一或多個實例。其他實例可能與關於圖3A至圖3C所描述的實例不同。As indicated above, Figures 3A to 3C are provided only as one or more examples. Other examples may be different from the examples described with respect to Figures 3A to 3C.

以此方式,藉由產生不均勻強度場,感測器系統105可確保在量測期間可接收臨限數量個光子而不增加總強度,從而相對於使用均勻強度,能夠在增大的範圍處進行準確深度感測。In this way, by creating a non-uniform intensity field, the sensor system 105 can ensure that a threshold number of photons can be received during a measurement without increasing the overall intensity, thereby enabling accurate depth sensing at an increased range relative to using uniform intensity.

前述揭示內容提供了說明和描述,但並不企圖要將實施方案全面地或限制為所揭示的精確形式。可鑒於以上揭示內容進行修改和變化,或可自實施方案的實踐中獲得修改和變化。The foregoing disclosure provides illustration and description, but is not intended to be exhaustive or to limit the implementation scheme to the precise form disclosed. Modifications and variations may be made in light of the above disclosure, or may be obtained from the practice of the implementation scheme.

如本文中所使用,取決於上下文,滿足臨限值係指值大於臨限值、多於臨限值、高於臨限值、大於或等於臨限值、小於臨限值、少於臨限值、低於臨限值、小於或等於臨限值、等於臨限值等。As used herein, meeting a threshold value means that a value is greater than a threshold value, more than a threshold value, higher than a threshold value, greater than or equal to a threshold value, less than a threshold value, less than a threshold value, lower than a threshold value, less than or equal to a threshold value, equal to a threshold value, etc., depending on the context.

即使特定特徵組合在申請專利範圍中敍述及/或在說明書中揭示,但此等組合並非旨在限制各種實施方案的揭示內容。實際上,此等特徵中之諸多者可以申請專利範圍中未具體敍述及/或說明書中未揭示的方式組合。儘管下面列出的每一從屬請求項可能僅直接取決於僅一個請求項,但各種實施方案的揭示內容包括與請求項集中之每一其他請求項相組合的每一從屬請求項。Even though particular combinations of features are recited in the claims and/or disclosed in the specification, such combinations are not intended to limit the disclosure of the various embodiments. In fact, many of these features may be combined in ways not specifically recited in the claims and/or disclosed in the specification. Although each dependent claim listed below may depend directly on only one claim, the disclosure of the various embodiments includes each dependent claim in combination with every other claim in the claim set.

除非明確如此說明,否則本文中使用的任何元素、動作或指令皆不得解釋為關鍵或必要的。此外,如本文中所使用,冠詞「一(a)」和「一(an)」旨在包括一或多個項目,且可與「一或多個」互換使用。此外,如本文中所使用的,術語「組」旨在包括一或多個項目(例如,相關項目、不相關項目、相關和不相關項目的組合等),且可與「一或多個」互換使用。在僅意指一個項目的情況下,使用短語「僅一個」或類似語言。另外,如本文中所使用的,術語「具有(has)」、「具有(have)」、「具有(having)」等旨在為開放式術語。此外,短語「基於」旨在意指「至少部分地基於」,除非另有明確說明。Unless explicitly stated as such, any element, action or instruction used herein shall not be interpreted as critical or essential. In addition, as used herein, the articles "a" and "an" are intended to include one or more items and can be used interchangeably with "one or more". In addition, as used herein, the term "group" is intended to include one or more items (e.g., related items, unrelated items, combinations of related and unrelated items, etc.), and can be used interchangeably with "one or more". In the case of only one item, the phrase "only one" or similar language is used. In addition, as used herein, the terms "has", "have", "having", etc. are intended to be open terms. In addition, the phrase "based on" is intended to mean "based at least in part on", unless otherwise explicitly stated.

100:實施方案 105:感測器系統 110:傳輸器系統 115:光學傳輸器 120:光塑形光學元件 125:接收器系統 130:光學接收器 135:濾光器 140:透鏡 145:元件符號 150:物件 155:元件符號 160:元件符號 200:實施方案 202:圖表 204:離散區域 206:離散區域 210:實施方案 212:圖表 214:離散區域 216:離散區域 220:實施方案 222:圖表 224:離散區域 226:離散區域 230:實施方案 232:圖表 234:離散線 236:間隙 240:實施方案 242:圖表 244:聚集區域 246:非聚集區域 250:實施方案 251:圖表 255:圖表 260:實施方案 262:圖表 264:離散區域 266:區域 300:實施方案 310:實施方案 320:實施方案100: Implementation plan 105: Sensor system 110: Transmitter system 115: Optical transmitter 120: Light shaping optical element 125: Receiver system 130: Optical receiver 135: Filter 140: Lens 145: Component symbol 150: Object 155: Component symbol 160: Component symbol 200: Implementation plan 202: Diagram 204: Discrete region 206: Discrete region 210: Implementation plan 212: Diagram 214: Discrete region 216: Discrete Scattered area 220: Implementation plan 222: Diagram 224: Scattered area 226: Scattered area 230: Implementation plan 232: Diagram 234: Scattered line 236: Gap 240: Implementation plan 242: Diagram 244: Clustered area 246: Non-clustered area 250: Implementation plan 251: Diagram 255: Diagram 260: Implementation plan 262: Diagram 264: Scattered area 266: Area 300: Implementation plan 310: Implementation plan 320: Implementation plan

[圖1A]及[圖1B]為本文中所描述的範例性實施方案的圖。[FIG. 1A] and [FIG. 1B] are diagrams of exemplary embodiments described herein.

[圖2A]至[圖2G]為不均勻強度場的圖。[Figure 2A] to [Figure 2G] are diagrams of uneven intensity fields.

[圖3A]至[圖3C]為不均勻強度場的圖。[Figure 3A] to [Figure 3C] are diagrams of uneven intensity fields.

100:實施方案 100: Implementation plan

105:感測器系統 105:Sensor system

110:傳輸器系統 110: Transmitter system

115:光學傳輸器 115:Optical transmitter

120:光塑形光學元件 120: Light shaping optical elements

125:接收器系統 125:Receiver system

130:光學接收器 130: Optical receiver

135:濾光器 135:Filter

140:透鏡 140: Lens

145:元件符號 145: Component symbol

150:物件 150: Objects

Claims (19)

一種光塑形光學元件,其包含:結構,其中該結構經建構以接收具有均勻強度場且小於臨限總強度的一或多個輸入光束;且其中該結構經建構以對該一或多個輸入光束進行塑形以形成具有不均勻強度場且小於該臨限總強度的一或多個輸出光束;其中,該臨限總強度為特定發散角、特定脈衝持續時間及特定曝光方向的至少一或多者的臨限值。 A light shaping optical element, comprising: a structure, wherein the structure is constructed to receive one or more input light beams having a uniform intensity field and less than a critical total intensity; and wherein the structure is constructed to shape the one or more input light beams to form one or more output light beams having a non-uniform intensity field and less than the critical total intensity; wherein the critical total intensity is a critical value of at least one or more of a specific divergence angle, a specific pulse duration, and a specific exposure direction. 如請求項1之光塑形光學元件,其中該不均勻強度場包含一組較高強度光區域及一組較低強度光區域。 A light shaping optical element as claimed in claim 1, wherein the non-uniform intensity field includes a set of higher intensity light regions and a set of lower intensity light regions. 如請求項1之光塑形光學元件,其中該不均勻強度場至少部分被照明。 A light shaping optical element as claimed in claim 1, wherein the non-uniform intensity field is at least partially illuminated. 如請求項1之光塑形光學元件,其中該不均勻強度場的至少一部分未被照明。 A light shaping optical element as claimed in claim 1, wherein at least a portion of the non-uniform intensity field is not illuminated. 如請求項1之光塑形光學元件,其中該不均勻強度場形成一圖案,且其中該圖案為以下中之至少一者:點圖案,柵格圖案,環形圖案,干擾圖案,階梯圖案,鋸齒圖案, 連續圖案,基於正弦的圖案。 A light shaping optical element as claimed in claim 1, wherein the non-uniform intensity field forms a pattern, and wherein the pattern is at least one of the following: a dot pattern, a grid pattern, a ring pattern, an interference pattern, a step pattern, a sawtooth pattern, a continuous pattern, a sine-based pattern. 如請求項1之光塑形光學元件,其中該一或多個輸入光束為光達系統的均勻掃描線,且該一或多個輸出光束形成該光達系統的不均勻掃描線。 The light shaping optical element of claim 1, wherein the one or more input light beams are uniform scanning lines of the lidar system, and the one or more output light beams form non-uniform scanning lines of the lidar system. 一種飛行時間量測系統,其包含:光學傳輸器,其用以提供引導朝向物件的光束,其中該光束與橫跨視場的恆定強度相關聯;光塑形光學元件,其用以將該光束聚集至一或多個聚集區域,其中該視場的該一或多個聚集區域相較於該視場的一或多個其他區域與較高光聚集度相關聯,且其中該一或多個聚集區域的總強度滿足特定發散角、特定脈衝持續時間及特定曝光方向的至少一或多者的臨限值;及光學接收器,其用以接收自該物件反射的該光束的反射並對該光束執行複數個飛行時間量測。 A time-of-flight measurement system comprising: an optical transmitter for providing a light beam directed toward an object, wherein the light beam is associated with a constant intensity across a field of view; a light shaping optical element for focusing the light beam into one or more focusing regions, wherein the one or more focusing regions of the field of view are associated with a higher light concentration than one or more other regions of the field of view, and wherein the total intensity of the one or more focusing regions meets a threshold of at least one or more of a specific divergence angle, a specific pulse duration, and a specific exposure direction; and an optical receiver for receiving a reflection of the light beam reflected from the object and performing a plurality of time-of-flight measurements on the light beam. 如請求項7之飛行時間量測系統,其中該光塑形光學元件為工程漫射器。 A flight time measurement system as claimed in claim 7, wherein the light shaping optical element is an engineered diffuser. 如請求項7之飛行時間量測系統,其中該系統經建構以使用該光束照明該物件,使得該物件由該一或多個聚集區域不均勻地照明。 A flight time measurement system as claimed in claim 7, wherein the system is constructed to illuminate the object using the light beam so that the object is illuminated unevenly by the one or more concentrated areas. 如請求項7之飛行時間量測系統,其中該光學接收器經建構以針對該視場的該一或多個聚集區域中之該視場的每一聚集區域執行飛行時間量測。 A flight time measurement system as claimed in claim 7, wherein the optical receiver is constructed to perform flight time measurement for each of the one or more concentrated areas of the field of view. 如請求項7之飛行時間量測系統,其進一步包含:處理器,其經建構以使用該複數個飛行時間量測來產生該物件的深度點雲。 The flight time measurement system of claim 7, further comprising: a processor configured to generate a depth point cloud of the object using the plurality of flight time measurements. 如請求項7之飛行時間量測系統,其中該視場的該一或多個聚集區域形成複數個強度點,且 其中該複數個強度點與臨限密度相關聯。 A flight time measurement system as claimed in claim 7, wherein the one or more concentrated areas of the field of view form a plurality of intensity points, and wherein the plurality of intensity points are associated with a critical density. 如請求項7之飛行時間量測系統,其中該系統經建構以判定該複數個飛行時間量測大於該系統相對於該物件的臨限距離。 A flight time measurement system as claimed in claim 7, wherein the system is configured to determine that the plurality of flight time measurements are greater than a threshold distance of the system relative to the object. 如請求項7之飛行時間量測系統,其進一步包含:處理器,其用以基於該複數個飛行時間量測及由該光學傳輸器提供的另一光束的成像量測來產生該物件的三維表示,其中該另一光束與恆定強度相關聯,且經引導朝向該物件而無需經塑形為一或多個聚集區域。 The time-of-flight measurement system of claim 7, further comprising: a processor for generating a three-dimensional representation of the object based on the plurality of time-of-flight measurements and imaging measurements of another light beam provided by the optical transmitter, wherein the other light beam is associated with a constant intensity and is directed toward the object without being shaped into one or more focusing regions. 如請求項7之飛行時間量測系統,其中該光學接收器為包括複數個感測器元件的感測器陣列,且其中該複數個感測器元件中之每一感測器元件經建構以產生該複數個飛行時間量測中之飛行時間量測。 A flight time measurement system as claimed in claim 7, wherein the optical receiver is a sensor array comprising a plurality of sensor elements, and wherein each sensor element of the plurality of sensor elements is constructed to produce a flight time measurement of the plurality of flight time measurements. 一種光學元件,其包含:基板;及光塑形光學元件,其用以提供一不均勻經圖案化強度光束,其中該不均勻經圖案化強度光束包括具有第一強度的一組第一區域及具有第二強度的一組第二區域,其中該第二強度介於該第一強度的10%與90%之間,且其中,該不均勻經圖案化強度光束之總強度小於特定發散角、特定脈衝持續時間及特定曝光方向的至少一或多者的臨限值。 An optical element, comprising: a substrate; and a light shaping optical element, for providing a non-uniform patterned intensity light beam, wherein the non-uniform patterned intensity light beam comprises a set of first regions having a first intensity and a set of second regions having a second intensity, wherein the second intensity is between 10% and 90% of the first intensity, and wherein the total intensity of the non-uniform patterned intensity light beam is less than a threshold value of at least one or more of a specific divergence angle, a specific pulse duration, and a specific exposure direction. 如請求項16之光學元件,其中該光學元件為光達系統的組件。 As claimed in claim 16, the optical element is a component of a lidar system. 如請求項16之光學元件,其進一步包含:感測器元件陣列,其安置在該基板上。 The optical element of claim 16 further comprises: an array of sensor elements disposed on the substrate. 如請求項18之光學元件,其中該感測器元件陣列經建構以判定該不均勻經圖案化強度光束的複數個飛行時間量測,以判定與物件相關聯的複 數個距離。 An optical element as claimed in claim 18, wherein the array of sensor elements is constructed to determine a plurality of time-of-flight measurements of the non-uniform patterned intensity beam to determine a plurality of distances associated with the object.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170353004A1 (en) 2016-06-03 2017-12-07 Princeton Optronics, Inc. VCSEL Illuminator Package

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