TWI785527B - A material classification schduling method to prevent scheduling deadlock - Google Patents

A material classification schduling method to prevent scheduling deadlock Download PDF

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TWI785527B
TWI785527B TW110108676A TW110108676A TWI785527B TW I785527 B TWI785527 B TW I785527B TW 110108676 A TW110108676 A TW 110108676A TW 110108676 A TW110108676 A TW 110108676A TW I785527 B TWI785527 B TW I785527B
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TW202137383A (en
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柴加加
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大陸商北京北方華創微電子裝備有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

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Abstract

A material classification scheduling method for preventing scheduling deadlock, includes: determining the materials to be scheduled; there are process participation materials placed in bottleneck resource position in the materials to be scheduled, sending the information of the materials to be scheduled to the scheduling module for scheduling and outputting scheduling sequence; wherein, the scheduling module schedules the materials, and the outputting scheduling sequence includes: if there are process participation materials in the materials to be scheduled Based on the preset priority rule of the first wafer transport box, the wafer transport box for transmission creates a moving step for the highest priority wafer transport box. The invention solves the technical problem of scheduling calculation deadlock caused by competing for bottleneck resources when a semiconductor device with a storage device schedules multiple transport operations and process operations at the same time, and improves the performance of the machine software, the reliability and equipment capacity of the company, and enhance the customer experience.

Description

一種防止調度死鎖的物料分類調度方法 A Material Classification Scheduling Method to Prevent Scheduling Deadlock

本發明涉及半導體設備技術領域,特別是涉及一種防止調度死鎖的物料分類調度方法。 The invention relates to the technical field of semiconductor equipment, in particular to a material classification scheduling method for preventing scheduling deadlock.

半導體立式爐設備是半導體生產線前工序的重要製程設備之一,用於大規模集成電路、分立器件、電力電子、光電器件和光導纖維等行業的擴散、氧化、退火、合金及燒結等製程;隨著晶片尺寸的不斷增加,晶片製造商們可以利用單片晶片上製造出更多的晶片。從2000年以後,半導體工業的晶片標準被定為300毫米。為了簡化運輸和盡可能降低被污染的風險,晶片製造商利用前開式標準晶片盒也稱晶片傳送盒(Foup)來搬運晶片。每個無塵超淨的晶片傳送盒中可放置多塊晶片,常見為25片晶片,晶片傳送盒可以對接在大多數應用材料機器系統的前端,機器可以將晶片一片片的吸進去,自動進行加工。 Semiconductor vertical furnace equipment is one of the important process equipment in the pre-process of semiconductor production line. It is used for diffusion, oxidation, annealing, alloying and sintering processes in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices and optical fibers; As the size of wafers continues to increase, chipmakers are able to fabricate more wafers on a single wafer. Since 2000, the wafer standard in the semiconductor industry has been set at 300 mm. To simplify transportation and minimize the risk of contamination, wafer manufacturers utilize front-opening standard wafer cassettes, also known as Foups, to handle wafers. Multiple wafers can be placed in each dust-free and ultra-clean wafer transfer box, usually 25 wafers. The wafer transfer box can be docked at the front end of most Applied Materials machine systems. The machine can suck the wafers in one by one, automatically processing.

半導體立式爐設備包括外部裝載台(LoadPort)、儲料器(Stocker)、晶片傳送盒機械手(STR)、晶片裝卸載位(LoadLock)、晶片機械手(WTR)和製程模塊腔室(PM)。 Semiconductor vertical furnace equipment includes external loading table (LoadPort), stocker (Stocker), wafer transfer box robot (STR), wafer loading and unloading position (LoadLock), wafer robot (WTR) and process module chamber (PM ).

有儲料器的半導體立式爐有一個重要特點:除了晶片(Wafer)參與傳輸,晶片傳送盒(Foup)也參與傳輸,因此晶片傳送盒機械手(STR)和晶片裝卸載位(LoadLock)成為半導體立式爐的瓶頸資源, 晶片傳送盒(Foup)的移動操作和參與製程流程的移動操作同時進行會由於爭奪瓶頸資源而導致調度死鎖,如晶片傳送盒機械手(STR)上有需要往晶片裝卸載位(LoadLock)移動的晶片傳送盒(Foup),而晶片裝卸載位(LoadLock)有需要移出的晶片傳送盒(Foup),此時晶片傳送盒機械手(STR)上和晶片裝卸載位(LoadLock)上都有需要向對方移動的晶片傳送盒(Foup),即此時晶片傳送盒機械手(STR)和晶片裝卸載位(LoadLock)處於相互等待狀態即進入調度死鎖,並且上位機的線程在調度死鎖的情況下就會崩潰,如果機台發生異常狀態下,位於處理機台中的物料面臨報廢的危險,而且機台軟體必須重啟,嚴重影響了正常的製程流程,因此,需要解決設備調度死鎖的技術問題,從而保證物料安全,提高設備產能。 A semiconductor vertical furnace with a stocker has an important feature: In addition to the wafer (Wafer) participating in the transfer, the wafer transfer box (Foup) is also involved in the transfer, so the wafer transfer box robot (STR) and the wafer loading and unloading position (LoadLock) become Bottleneck resources for semiconductor vertical furnaces, Simultaneous movement of the wafer transfer box (Foup) and the movement of the process flow will result in a scheduling deadlock due to competition for bottleneck resources. For example, the wafer transfer box robot (STR) needs to move to the wafer loading and unloading position (LoadLock). The wafer transfer box (Foup), and the wafer loading and unloading position (LoadLock) has a wafer transfer box (Foup) that needs to be removed. The wafer transfer box (Foup) moving to the other side, that is, at this time, the wafer transfer box robot (STR) and the wafer loading and unloading position (LoadLock) are in a waiting state for each other, and enter the scheduling deadlock, and the thread of the host computer is in the scheduling deadlock. If the machine is in an abnormal state, the materials in the processing machine are in danger of being scrapped, and the software of the machine must be restarted, which seriously affects the normal process flow. Therefore, it is necessary to solve the deadlock technology of equipment scheduling problems, thereby ensuring material safety and improving equipment productivity.

本發明的目的在於克服現有技術的缺陷,提供一種防止調度死鎖的物料分類調度方法。 The purpose of the present invention is to overcome the defects of the prior art and provide a material classification scheduling method that prevents scheduling deadlock.

本發明的技術方案是:一種半導體設備中防止調度死鎖的物料調度方法,包括: The technical solution of the present invention is: a material scheduling method for preventing scheduling deadlock in semiconductor equipment, comprising:

步驟S1、確定待調度物料,其中,該待調度物料分為製程參與類物料和傳輸載體類物料,該製程參與類物料包括參與製程的晶片和參與製程的晶片傳送盒,該傳輸載體類物料包括不參與製程的晶片傳送盒;步驟S2、如果該待調度物料中存在放置在瓶頸資源位上的該製程參與類物料,則直接將該待調度物料的信息發送給調度模塊進行調度,輸出調度序列;其中,該調度模塊進行調度,輸出調度序列包括:步驟Z100、接收該待調度物料的信息,生成可移動晶片列表和可移動晶片傳送盒列表;步驟Z200、判斷該待調度物料中是否有晶片傳送盒正在進行裝料或卸料,如果是,則轉到步驟Z210,如果否,則轉到步驟Z220;步驟Z210,對正在進行裝料或卸料的晶片傳送盒,或者可移動的晶片,創建移動步驟, 然後轉到Z300;步驟Z220,判斷該待調度物料中是否有正在進行傳輸的晶片傳送盒,如果是,則基於預設的第一晶片傳送盒優先級規則,針對優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300;如果否,則根據晶片傳送盒是將要進行裝料還是將要進行卸料,基於預設的第二晶片傳送盒優先級規則,針對製程參與類物料中優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300;步驟Z300、更新該可移動晶片列表或該可移動晶片傳送盒列表,判斷是否所有該待調度物料都到達目的地,如果否,返回步驟Z200,如果是,則輸出所有移動步驟,形成該調度序列。 Step S1. Determine the materials to be dispatched. The materials to be dispatched are divided into process participation materials and transmission carrier materials. The process participation materials include wafers participating in the process and wafer transfer boxes participating in the process. The transmission carrier materials include Wafer transfer boxes that do not participate in the process; step S2, if there is a process-participating material placed on the bottleneck resource position in the material to be scheduled, directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence Wherein, the scheduling module performs scheduling, and the output scheduling sequence includes: step Z100, receiving information of the material to be scheduled, generating a list of removable wafers and a list of removable wafer delivery boxes; step Z200, judging whether there are wafers in the material to be scheduled The transport box is being loaded or unloaded, if yes, then go to step Z210, if not, then go to step Z220; step Z210, for the wafer transport box that is being loaded or unloaded, or the movable wafer, Create moving steps, Then turn to Z300; step Z220, judge whether there is an FOUP being transferred in the material to be scheduled, and if so, create an FOUP for the highest priority FOUP based on the preset first FOUP priority rule Move the step, and go to step Z300; if not, then according to whether the FOUP is about to be loaded or unloaded, based on the preset second FOUP priority rule, the process participation material has the highest priority The wafer transfer box creation movement step, and go to step Z300; Step Z300, update the movable wafer list or the movable wafer transfer box list, judge whether all the materials to be dispatched have reached the destination, if not, return to step Z200 , if yes, then output all moving steps to form the scheduling sequence.

進一步地,步驟Z210包括:步驟Z211、判斷是否可以針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,如果是,則針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,並轉到步驟Z212,如果否,則直接轉到步驟Z212;步驟Z212、判斷是否已有移動步驟生成,如果是,則轉到步驟Z300,如果否,則轉到驟Z213;步驟Z213、基於預設的晶片優先級規則,針對可移動晶片中優先級最高的晶片創建移動步驟,並轉到步驟Z300。 Further, step Z210 includes: step Z211, judging whether a moving step can be created for the FOUP being loaded or unloaded, if yes, creating a moving step for the FOUP being loaded or unloaded, and Go to step Z212, if no, go to step Z212 directly; step Z212, judge whether there is a movement step generated, if yes, go to step Z300, if not, go to step Z213; step Z213, based on preset A wafer priority rule of , create a move step for the wafer with the highest priority among the movable wafers, and go to step Z300.

進一步地,該瓶頸資源位包括晶片裝卸載位、晶片傳送盒機械手。 Further, the bottleneck resource location includes a wafer loading and unloading location, and a FOUP robot.

進一步地,該第一晶片傳送盒優先級規則包括:根據各晶片傳送盒所處的移動步驟及是否佔用了該瓶頸資源位為各晶片傳送盒設定移動優先級,其中,佔用了該瓶頸資源位的晶片傳送盒的優先級最高。 Further, the first FOUP priority rule includes: setting a movement priority for each FOUP according to the moving step of each FOUP and whether the bottleneck resource bit is occupied, wherein the bottleneck resource bit is occupied The FOUP has the highest priority.

進一步地,該第一晶片傳送盒優先級規則包括:晶片機械手掃描完成且等待進行製程的晶片傳送盒或參與製程的晶片傳送盒的優先級為一級。 Further, the first FOUP priority rule includes: the FOUPs that have been scanned by the wafer robot and are waiting to be processed or the FOUPs that participate in the process have a priority of level one.

進一步地,該第一晶片傳送盒優先級規則還包括:在參與製程的晶片傳送盒佔用了瓶頸資源位時,則晶片機械手掃描完成且等待進行製程的晶片傳送盒優先級為二級;在晶片機械手掃描完成且等待進行製程 的晶片傳送盒佔用了瓶頸資源位時,則參與製程的晶片傳送盒優先級為二級。 Further, the first FOUP priority rule also includes: when the FOUP participating in the process occupies the bottleneck resource position, the priority of the FOUP that has been scanned by the wafer manipulator and is waiting for the process is the second level; Wafer robot scanning completed and waiting for processing When the FOUPs occupy the bottleneck resource bit, the priority of the FOUPs participating in the manufacturing process is the second level.

進一步地,等待晶片機械手掃描的晶片傳送盒優先級為三級;等待移入到儲料器的晶片傳送盒優先級為四級;放在儲料器上等待移入到晶片裝卸載位進行晶片機械手掃描的晶片傳送盒優先級為五級;放在儲料器上的等待移出到裝載端口的晶片傳送盒優先級為六級。 Further, the priority of the wafer transfer box waiting to be scanned by the wafer manipulator is level three; the priority of the wafer transport box waiting to be moved into the stocker is level 4; it is placed on the stocker and waits to be moved into the wafer loading and unloading position for wafer mechanical Hand-scanned FOUPs have a priority of five; FOUPs placed on a stocker waiting to be removed to a load port have a priority of six.

進一步地,在步驟S2中,如果該待調度物料中不存在放置在瓶頸資源位上的製程參與類物料,則轉到步驟S3;步驟S3、如果該待調度物料中存在放置在瓶頸資源位上的傳輸載體類物料,則轉到步驟S4;步驟S4、判斷該待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S5,如果是,則轉到步驟S6;步驟S5、直接將該待調度物料的信息發送給調度模塊進行調度,輸出調度序列;步驟S6、將該待調度物料中放置在瓶頸資源位上的傳輸載體類物料添加到第一批調度處理物料,將第一批調度處理物料的信息發送給調度模塊進行調度,並輸出第一調度子序列;步驟S7、提取該待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出第二調度序子列;步驟S8、提取該待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出第三調度子序列;步驟S9;輸出調度序列,該調度序列包括第一調度子序列、第二調度子序列和第三調度子序列。 Further, in step S2, if there is no process participation material placed on the bottleneck resource position in the material to be scheduled, go to step S3; step S3, if there is a process participation material placed on the bottleneck resource position in the material to be scheduled transfer carrier material, then go to step S4; step S4, judge whether there is a process participation material that is not placed on the bottleneck resource position in the material to be scheduled, if not, go to step S5, if yes, go to step S5 Go to step S6; step S5, directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; step S6, add the transmission carrier material placed on the bottleneck resource position among the materials to be scheduled to the first Batch scheduling processing materials, sending the information of the first batch of scheduling processing materials to the scheduling module for scheduling, and outputting the first scheduling sub-sequence; step S7, extracting the process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled , added to the second batch of scheduling processing materials, sending the information of the second batch of scheduling processing materials to the scheduling module for scheduling, and outputting the second scheduling sequence sub-column; step S8, extracting the materials to be scheduled that are not placed in the bottleneck resource position The transmission carrier material on the above is added to the third batch of scheduling processing materials, and the information of the third batch of scheduling processing materials is sent to the scheduling module for scheduling, and the third scheduling subsequence is output; step S9; output scheduling sequence, the scheduling sequence It includes a first scheduling subsequence, a second scheduling subsequence and a third scheduling subsequence.

進一步地,步驟S3中,如果該待調度物料中不存在放置在瓶頸資源位上的傳輸載體類物料,則轉到步驟S10;步驟S10、判斷該待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S11,如果是,則轉到步驟S12;步驟S11、直接將該待調度物料的信息發送給調度模塊進行調度,輸出調度序列; 步驟S12、提取該待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出第二調度序子列;步驟S13、提取該待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出第三調度子序列;步驟S14;輸出調度序列,該調度序列包括第二調度子序列和第三調度子序列。 Further, in step S3, if there is no transmission carrier material placed on the bottleneck resource position in the material to be dispatched, go to step S10; step S10, judge whether there is a material not placed in the bottleneck resource position in the material to be dispatched If no, then go to step S11; if yes, go to step S12; step S11, directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; Step S12. Extract the process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the second batch of scheduling processing materials, send the information of the second batch of scheduling processing materials to the scheduling module for scheduling, and output the first Second scheduling sequence sub-column; step S13, extract the transmission carrier materials that are not placed on the bottleneck resource position in the material to be scheduled, add them to the third batch of scheduling processing materials, and send the information of the third batch of scheduling processing materials to the scheduling module Perform scheduling, and output a third scheduling subsequence; Step S14: output a scheduling sequence, the scheduling sequence including the second scheduling subsequence and the third scheduling subsequence.

本發明具有以下有益效果:通過為進行傳送操作的晶片傳送盒設置操作優先級規則,並將待調度物料分類分批調度,從而解決了帶儲料器的半導體設備在多個傳送操作和製程操作同時調度時會由於爭奪瓶頸資源而導致調度計算死鎖的技術問題,提高了機台軟體運行的可靠性和設備產能,進一步提升了客戶的體驗度。 The invention has the following beneficial effects: by setting the operation priority rules for the wafer transfer box for the transfer operation, and classifying and batch-scheduling the materials to be scheduled, it solves the problem of multiple transfer operations and process operations of semiconductor equipment with stockers At the same time, due to competition for bottleneck resources during scheduling, there will be technical problems in scheduling calculation deadlocks, which improves the reliability of machine software operation and equipment productivity, and further improves customer experience.

LoadPortA、LoadPortB:外部裝載台口 LoadPortA, LoadPortB: external loading port

STR:晶片傳送盒機械手 STR: wafer transfer box robot

Shelf:架子 Shelf: shelf

Stocker:儲料器 Stocker: Stocker

LoadLockC、LoadLockD:晶片裝卸載位口 LoadLockC, LoadLockD: chip loading and unloading port

MTR:晶片機械手 MTR: Wafer Robot

Boat:舟 Boat: boat

PM:製程模塊腔室 PM: process module chamber

當結合附圖閱讀時,從以下詳細描述最佳理解本揭露之態樣。應注意,根據產業中之標準實踐,各種構件未按比例繪製。事實上,為了論述的清楚起見可任意增大或減小各種構件之尺寸。 Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying drawings. It should be noted that, in accordance with the standard practice in the industry, various components are not drawn to scale. In fact, the dimensions of the various components may be arbitrarily increased or decreased for clarity of discussion.

圖1是本發明實施例中半導體立式爐設備結構示意圖。 Fig. 1 is a schematic diagram of the structure of semiconductor vertical furnace equipment in an embodiment of the present invention.

圖2是本發明實施例中待調度物料中存在放置在瓶頸資源位上的製程參與類物料的調度方法流程圖。 Fig. 2 is a flow chart of a scheduling method for process-participating materials placed on bottleneck resource positions among materials to be scheduled in an embodiment of the present invention.

圖3是本發明實施例中調度模塊中調度算法的流程圖。 Fig. 3 is a flow chart of the scheduling algorithm in the scheduling module in the embodiment of the present invention.

圖4是本發明實施例中待調度物料分類調度的流程圖。 Fig. 4 is a flow chart of classified scheduling of materials to be scheduled in the embodiment of the present invention.

以下揭露提供用於實施本揭露之不同構件之許多不同實施例或實例。下文描述組件及配置之特定實例以簡化本揭露。當然,此等僅為實例且非意欲限制。舉例而言,在以下描述中之一第一構件形成於一第 二構件上方或上可包含其中該第一構件及該第二構件經形成為直接接觸之實施例,且亦可包含其中額外構件可形成在該第一構件與該第二構件之間,使得該第一構件及該第二構件可不直接接觸之實施例。另外,本揭露可在各個實例中重複參考數字及/或字母。此重複出於簡化及清楚之目的且本身不指示所論述之各個實施例及/或組態之間的關係。 The following disclosure provides many different embodiments, or examples, of different means for implementing the disclosure. Specific examples of components and configurations are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, in the following description a first member is formed on a first Over or over two members may include embodiments in which the first member and the second member are formed in direct contact, and may also include embodiments in which additional members may be formed between the first member and the second member such that the An embodiment in which the first member and the second member may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and/or letters in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and/or configurations discussed.

此外,為便於描述,諸如「下面」、「下方」、「下」、「上方」、「上」及類似者之空間相對術語可在本文中用於描述一個元件或構件與另一(些)元件或構件之關係,如圖中圖解說明。空間相對術語意欲涵蓋除在圖中描繪之定向以外之使用或操作中之裝置之不同定向。設備可以其他方式定向(旋轉90度或按其他定向)且因此可同樣解釋本文中使用之空間相對描述詞。 In addition, for ease of description, spatially relative terms such as "below", "below", "under", "above", "upper" and the like may be used herein to describe the relationship between one element or member and another(s) The relationship between elements or components, as illustrated in the figure. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and thus the spatially relative descriptors used herein should be interpreted similarly.

儘管陳述本揭露之寬泛範疇之數值範圍及參數係近似值,然儘可能精確地報告特定實例中陳述之數值。然而,任何數值固有地含有必然由於見於各自測試量測中之標準偏差所致之某些

Figure 110108676-A0305-02-0008-1
差。再者,如本文中使用,術語「大約」通常意謂在一給定值或範圍之10%、5%、1%或0.5%內。替代地,術語「大約」意謂在由此項技術之一般技術者考量時處於平均值之一可接受標準
Figure 110108676-A0305-02-0008-2
差內。除在操作/工作實例中以外,或除非以其他方式明確指定,否則諸如針對本文中揭露之材料之數量、時間之持續時間、溫度、操作條件、數量之比率及其類似者之全部數值範圍、數量、值及百分比應被理解為在全部例項中由術語「大約」修飾。相應地,除非相反地指示,否則本揭露及隨附發明申請專利範圍中陳述之數值參數係可根據需要變化之近似值。至少,應至少鑑於所報告有效數位之數目且藉由應用普通捨入技術解釋各數值參數。範圍可在本文中表達為從一個端點至另一端點或在兩個端點之間。本文中揭露之全部範圍包含端點,除非 另有指定。 Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the disclosure are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain deviations necessarily resulting from the standard deviations found in their respective testing measurements.
Figure 110108676-A0305-02-0008-1
Difference. Furthermore, as used herein, the term "about" generally means within 10%, 5%, 1%, or 0.5% of a given value or range. Alternatively, the term "about" means an acceptable standard of being within an average value when considered by one of ordinary skill in the art
Figure 110108676-A0305-02-0008-2
within the range. Except in operating/working examples, or unless otherwise expressly specified, all numerical ranges, such as for amounts, durations of time, temperatures, operating conditions, ratios of amounts, and the like, of materials disclosed herein, Amounts, values and percentages should be understood as being modified by the term "about" in all instances. Accordingly, unless indicated to the contrary, the numerical parameters set forth in this disclosure and the accompanying claims are approximations that may vary as desired. At a minimum, each numerical parameter should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques. Ranges can be expressed herein as from one endpoint to the other or as between two endpoints. All ranges disclosed herein are inclusive of endpoints unless otherwise specified.

如圖1所示,半導體立式爐包括外部裝載台(LoadPort)、儲料器(Stocker)、晶片傳送盒機械手(STR)、晶片裝卸載位(LoadLock)、晶片機械手(WTR)和製程模塊腔室(PM)。 As shown in Figure 1, the semiconductor vertical furnace includes an external loading platform (LoadPort), a stocker (Stocker), a wafer transfer box robot (STR), a wafer loading and unloading position (LoadLock), a wafer robot (WTR) and a process Module chamber (PM).

外部裝載台(LoadPort):是外部和設備間的橋樑,外部裝載台(LoadPort)上可放置晶片傳送盒(Foup),外部裝載台(LoadPort)上具有開門機構,可以打開晶片傳送盒(Foup)的門。外部裝載台(LoadPort)一般有兩個口,LoadPortA與LoadPortB。 External loading platform (LoadPort): It is a bridge between the external and equipment. The external loading platform (LoadPort) can place the wafer transfer box (Foup). The external loading platform (LoadPort) has a door opening mechanism to open the wafer transfer box (Foup). the door. The external loading platform (LoadPort) generally has two ports, LoadPortA and LoadPortB.

晶片傳送盒機械手(STR):負責傳送晶片傳送盒(Foup),同時包含掃描(Map)的功能。在掃描(Map)過程中,晶片傳送盒(Foup)的門必須打開並且保持不動,晶片傳送盒機械手(STR)的機械臂上安裝有紅外探頭,通過械臂的上下移動,來獲知晶片傳送盒(Foup)中晶片(Wafer)的存放信息。晶片傳送盒機械手(STR)用於在外部裝載台(LoadPort)、晶片裝卸載位(LoadLock)和儲料器(Stocker)的架子(Shelf)之間進行傳送晶片傳送盒(Foup)。 Wafer transfer box robot (STR): responsible for transferring the wafer transfer box (Foup), and also includes the function of scanning (Map). During the scanning (Map) process, the door of the wafer transport box (Foup) must be opened and kept still. The infrared sensor is installed on the mechanical arm of the wafer transport box manipulator (STR). The storage information of the wafer (Wafer) in the box (Foup). The Wafer Transfer Box Robot (STR) is used to transfer the wafer transfer box (Foup) between the external loading platform (LoadPort), the wafer loading and unloading position (LoadLock) and the shelf (Shelf) of the stocker (Stocker).

儲料器(Stocker):用於放置晶片傳送盒(Foup),一個儲料器(Stocker)上可以放置多個晶片傳送盒(Foup),儲料器(Stocker)上放置晶片傳送盒(Foup)的部件稱為架子(Shelf)。 Stocker (Stocker): used to place Foups, multiple Foups can be placed on one Stocker, and Foups can be placed on the Stocker The parts are called shelves (Shelf).

晶片裝卸載位(LoadLock):晶片裝卸載位(LoadLock)上可以放置晶片傳送盒(Foup),具有開門機構,可以打開晶片傳送盒(Foup)的門,用於從晶片傳送盒(Foup)中取出晶片(Wafer)放到舟(Boat)上或者從舟(Boat)上取出晶片(Wafer)放入晶片傳送盒(Foup)中, 即裝料(Charge)或卸料(DisCharge),晶片裝卸載位(LoadLock)是晶片(Wafer)進入製程模塊腔室(PM)的橋樑。晶片裝卸載位(LoadLock)一般有兩個口,LoadLockC和LoadLockD。 Wafer loading and unloading position (LoadLock): the wafer transfer box (Foup) can be placed on the wafer loading and unloading position (LoadLock), with a door opening mechanism, which can open the door of the wafer transfer box (Foup) Take out the wafer (Wafer) and put it on the boat (Boat) or take out the wafer (Wafer) from the boat (Boat) and put it into the wafer transfer box (Foup), That is, charging (Charge) or unloading (DisCharge), the wafer loading and unloading position (LoadLock) is a bridge for wafers (Wafer) to enter the process module chamber (PM). The chip loading and unloading position (LoadLock) generally has two ports, LoadLockC and LoadLockD.

晶片機械手(WTR):負責晶片(Wafer)的傳送,同時包含掃描(Map)的功能,可以對晶片裝卸載位(LoadLock)上的晶片傳送盒(Foup)以及製程模塊腔室(PM)中的舟(Boat)進行掃描(Map),掃描(Map)過程中晶片裝卸載位(LoadLock)上的晶片傳送盒(Foup)處於開門靜止的狀態舟(Boat)處於出發點位置(Home位),晶片機械手(WTR)的單指(Arm)上有紅外探頭,通過單指(Arm)的上下移動來獲取晶片傳送盒(Foup)中晶片(Wafer)的存放信息以及舟(Boat)上晶片(Wafer)的信息。晶片機械手(WTR)可以將晶片(Wafer)從晶片裝卸載位(LoadLock)的晶片傳送盒(Foup)上和製程模塊腔室(PM)中的舟(Boat)上進行傳輸。晶片機械手(WTR)分為1指和5指,每次可以取放1片晶片(Wafer)或者5片晶片(Wafer)。 Wafer robot (WTR): responsible for the transfer of wafers (Wafer), and also includes the function of scanning (Map), which can be used for wafer transfer boxes (Foup) on the wafer loading and unloading position (LoadLock) and in the process module chamber (PM) The boat (Boat) scans (Map). During the scan (Map), the wafer transfer box (Foup) on the wafer loading and unloading position (LoadLock) is in the state of opening and resting. The boat (Boat) is at the starting position (Home position), and the wafer There is an infrared sensor on the single finger (Arm) of the manipulator (WTR), and the storage information of the wafer (Wafer) in the wafer transfer box (Foup) and the storage information of the wafer (Wafer) on the boat (Boat) are obtained by moving the single finger (Arm) up and down. )Information. The wafer robot (WTR) can transfer the wafer (Wafer) from the wafer transfer box (Foup) of the wafer loading and unloading position (LoadLock) and the boat (Boat) in the process module chamber (PM). The wafer robot (WTR) is divided into 1 finger and 5 fingers, which can pick and place 1 wafer (Wafer) or 5 wafers (Wafer) at a time.

製程模塊腔室(PM):用於進行相應的製程操作,製程模塊腔室(PM)中有一個舟(Boat),用於放置晶片(Wafer)。製程模塊腔室(PM)中參加製程的晶片(Wafer)數量由的舟(Boat)的卡槽(Slot)數量決定。 Process module chamber (PM): used to perform corresponding process operations. There is a boat (Boat) in the process module chamber (PM) for placing wafers (Wafer). The number of wafers (Wafer) participating in the process in the process module chamber (PM) is determined by the number of slots (Slots) of the boat (Boat).

製程開始前,晶片傳送盒機械手(STR)首先將裝載著晶片(Wafer)的晶片傳送盒(Foup)傳送至晶片裝卸載位(LoadLock),由晶片機械手(WTR)進行掃描(Map),掃描(Map)完成之後再由晶片傳送盒 機械手(STR)將晶片傳送盒(Foup)傳送至儲料器(Stocker)對應的架子(Shelf)上。 Before the process starts, the wafer transfer box robot (STR) first transfers the wafer transfer box (Foup) loaded with wafers (Wafer) to the wafer loading and unloading position (LoadLock), and the wafer transfer box robot (WTR) scans (Map), After the scanning (Map) is completed, the wafer transfer box The robot arm (STR) transfers the wafer transfer box (Foup) to the corresponding shelf (Shelf) of the stocker (Stocker).

製程開始後,具體流程如下: After the process starts, the specific process is as follows:

1)晶片傳送盒機械手(STR)將晶片傳送盒(Foup)從儲料器(Stocker)的架子(Shelf)上傳送至晶片裝卸載位(LoadLock); 1) The wafer transfer box robot (STR) transfers the wafer transfer box (Foup) from the shelf (Shelf) of the stocker (Stocker) to the wafer loading and unloading position (LoadLock);

2)晶片機械手(WTR)將晶片裝卸載位(LoadLock)中的晶片傳送盒(Foup)中的晶片(Wafer)傳送至製程模塊腔室(PM)的舟(Boat)中; 2) The wafer robot (WTR) transfers the wafer (Wafer) in the wafer transfer box (Foup) in the wafer loading and unloading position (LoadLock) to the boat (Boat) in the process module chamber (PM);

3)晶片機械手(WTR)對製程模塊腔室(PM)的舟(Boat)中的所有晶片(Wafer)進行掃描(Map); 3) The wafer manipulator (WTR) scans (Map) all the wafers (Wafer) in the boat (Boat) of the process module chamber (PM);

4)晶片傳送盒機械手(STR)將晶片裝卸載位(LoadLock)中的晶片傳送盒(Foup)放回儲料器(Stocker)的架子(Shelf)上; 4) The wafer transport box robot (STR) puts the wafer transport box (Foup) in the wafer loading and unloading position (LoadLock) back on the shelf (Shelf) of the stocker (Stocker);

5)所有晶片(Wafer)在製程模塊腔室(PM)的舟(Boat)中完成製程操作; 5) All wafers (Wafer) complete the process operation in the boat (Boat) of the process module chamber (PM);

6)製程結束後,晶片機械手(WTR)首先先去製程模塊腔室(PM)的舟(Boat)中對所有的晶片(Wafer)進行卸料(DisCharge)前的掃描(Map); 6) After the process is over, the wafer robot (WTR) first goes to the boat (Boat) of the process module chamber (PM) to scan (Map) all wafers (Wafer) before unloading (DisCharge);

7)晶片傳送盒機械手(STR)從儲料器(Stocker)對應的架子(Shelf)上取參加製程的晶片傳送盒(Foup)並放到晶片裝卸載位(LoadLock)上; 7) The wafer transfer box robot (STR) takes the wafer transfer box (Foup) participating in the process from the shelf (Shelf) corresponding to the stocker (Stocker) and puts it on the wafer loading and unloading position (LoadLock);

8)晶片機械手(WTR)從製程模塊腔室(PM)的舟(Boat)中取出完成製程的晶片(Wafer)並放到晶片裝卸載位(LoadLock)上對應的晶片傳送盒(Foup)的卡槽(slot)內。 8) The wafer robot (WTR) takes out the wafer (Wafer) that has completed the process from the boat (Boat) of the process module chamber (PM) and puts it into the corresponding wafer transfer box (Foup) on the wafer loading and unloading position (LoadLock). In the card slot (slot).

9)晶片傳送盒機械手(STR)將晶片裝卸載位(LoadLock)上的晶片傳送盒(Foup)放回儲料器(Stocker)對應的架子(Shelf)上。 9) The wafer transport box robot (STR) puts the wafer transport box (Foup) on the wafer loading and unloading position (LoadLock) back to the corresponding shelf (Shelf) of the stocker (Stocker).

如圖2所示,一種半導體設備中防止調度死鎖的物料調度方法,包括: As shown in Figure 2, a material scheduling method for preventing scheduling deadlock in semiconductor equipment, including:

步驟S1、確定待調度物料,其中,待調度物料分為製程參與類物料和傳輸載體類物料,製程參與類物料包括參與製程的晶片(Wafer)和參與製程的晶片傳送盒(Foup),傳輸載體類物料包括不參與製程的晶片傳送盒(Foup);晶片傳送盒(Foup)內有25個卡槽(Slot),用於存放晶片(Wafer),如果晶片傳送盒(Foup)中的晶片(Wafer)需要在製程模塊腔室(PM)中進行相應的製程操作,則晶片(Wafer)和晶片傳送盒(Foup)為製程參與類物料,如果晶片傳送盒(Foup)中的晶片(Wafer)不需要在製程模塊腔室(PM)中進行相應的製程操作,則晶片傳送盒(Foup)為傳輸載體類物料。 Step S1. Determine the materials to be dispatched. The materials to be dispatched are divided into process-participating materials and transport carrier materials. Process-participating materials include wafers (Wafer) participating in the process, wafer transfer boxes (Foup) participating in the process, and transport carriers. Such materials include Foups that do not participate in the process; there are 25 slots in the Foup for storing wafers. If the wafers in the Foup ) need to carry out corresponding process operations in the process module chamber (PM), then the wafer (Wafer) and wafer transfer box (Foup) are process participation materials, if the wafer (Wafer) in the wafer transfer box (Foup) does not need The corresponding process operation is carried out in the process module chamber (PM), and the wafer transfer box (Foup) is a transport carrier material.

步驟S2、判斷待調度物料中是否存在放置在瓶頸資源位上的製程參與類物料,如果是,則直接將待調度物料的信息發送給調度模塊,調度模塊進行調度,輸出調度序列;有儲料器的半導體立式爐有一個重要特點:除了晶片(Wafer),晶片傳送盒(Foup)也參與傳輸,因此晶片傳送盒機械手 (STR)和晶片裝卸載位(LoadLock)成為半導體立式爐的瓶頸資源,當待調度物料中存在放置在瓶頸資源位即晶片傳送盒機械手(STR)和/或晶片裝卸載位(LoadLock)上的製程參與類物料,此時直接將待調度物料的信息發送給調度模塊進行調度,輸出調度序列;如圖3所示,其中,調度模塊進行調度,輸出調度序列包括:步驟Z100、接收待調度物料的信息,生成可移動晶片列表和可移動晶片傳送盒列表;步驟Z200、判斷待調度物料中是否有晶片傳送盒正在進行裝料或卸料,如果是,則轉到步驟Z210,如果否,則轉到步驟Z220;步驟Z210,對正在進行裝料或卸料的晶片傳送盒,或者可移動的晶片,創建移動步驟,然後轉到Z300;步驟Z210進一步包括:步驟Z211、判斷是否可以針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,如果是,則針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,並轉到步驟Z212,如果否,則直接轉到步驟Z212;步驟Z212、判斷是否已有移動步驟生成,如果是,則轉到步驟Z300,如果否,則轉到驟Z213;步驟Z213、基於預設的晶片優先級規則,針對可移動晶片中優先級最高的晶片創建移動步驟,並轉到步驟Z300。 Step S2. Determine whether there is a process participation material placed on the bottleneck resource position among the materials to be scheduled, and if so, directly send the information of the material to be scheduled to the scheduling module, and the scheduling module will perform scheduling and output a scheduling sequence; there are materials in storage The semiconductor vertical furnace of the device has an important feature: in addition to the wafer (Wafer), the wafer transfer box (Foup) is also involved in the transmission, so the wafer transfer box robot (STR) and wafer loading and unloading position (LoadLock) become the bottleneck resources of the semiconductor vertical furnace. Process participation materials on the above, at this time, directly send the information of the materials to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; as shown in Figure 3, where the scheduling module performs scheduling, and the output scheduling sequence includes: Step Z100, receiving the Scheduling material information, generating a list of movable wafers and a list of removable wafer transfer boxes; Step Z200, judging whether there are wafer transfer boxes in the materials to be scheduled that are being loaded or unloaded, if yes, go to step Z210, if not , then turn to step Z220; step Z210, create a movement step for the wafer FOUP that is being loaded or unloaded, or a movable wafer, and then turn to Z300; step Z210 further includes: step Z211, judging whether it can target Create a move step for the FOUP that is being loaded or unloaded, if yes, create a move step for the FOUP that is being loaded or unloaded, and go to step Z212, if no, go directly to step Z212 ; Step Z212, judging whether a moving step has been generated, if yes, then go to step Z300, if not, then go to step Z213; step Z213, based on the preset chip priority rules, for the highest priority among the movable Wafer creation move step, and go to step Z300.

一盒晶片傳送盒(Foup)中最多可以有25片晶片(Wafer),在參與製程(job)時,Wafer從晶片傳送盒(Foup)中取出晶片(Wafer)和在舟(Boat)上放置晶片(Wafer)的順序是有先後的, 這些先後順序即為晶片優先級規則,優先級是根據用戶設置晶片(Wafer)在舟(Boat)上位置的選取模式(Mode),通過不同模式(Mode)對應的算法計算中來的,晶片優先級的計算方式屬現有技術。 There can be up to 25 wafers (Wafer) in a box of wafer transfer box (Foup). When participating in the process (job), Wafer takes out the wafer (Wafer) from the wafer transfer box (Foup) and places the wafer on the boat (Boat). (Wafer) order is sequential, These sequences are wafer priority rules. The priority is calculated according to the selection mode (Mode) of the position of the wafer (Wafer) on the boat (Boat) set by the user through the algorithm corresponding to different modes (Mode). Wafer priority The calculation method of the level belongs to the prior art.

步驟Z220,判斷待調度物料中是否有正在進行傳送的晶片傳送盒,如果是,則基於預設的第一晶片傳送盒優先級規則,針對優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300;如果否,則根據晶片傳送盒是將要進行裝料還是將要進行卸料,基於預設的第二晶片傳送盒優先級規則,針對製程參與類物料中優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300;步驟Z300、更新可移動晶片列表或可移動晶片傳送盒列表,判斷是否所有待調度物料都到達目的地,如果否,返回步驟Z200,如果是,則輸出所有移動步驟,形成調度序列。 Step Z220, judging whether there is an FOUP that is being transferred in the material to be scheduled, if yes, based on the preset first FOUP priority rule, create a movement step for the FOUP with the highest priority, and go to Step Z300; if no, according to whether the FOUP is about to be loaded or unloaded, based on the preset second FOUP priority rule, create a movement for the FOUP with the highest priority among the process participation materials step, and turn to step Z300; step Z300, update the list of movable wafers or the list of movable wafer transfer boxes, and judge whether all materials to be dispatched have reached the destination, if not, return to step Z200, if yes, then output all moving steps , forming a scheduling sequence.

第一晶片傳送盒優先級規則是為了參與傳送(Carrier)操作的晶片傳送盒(Foup)設定優先級規則。 The first FOUP priority rule is for setting priority rules for FOUPs participating in the carrier operation.

第一晶片傳送盒優先級規則包括:根據各晶片傳送盒所處的移動步驟及是否佔用了瓶頸資源位為各晶片傳送盒設定移動優先級,其中,佔用了瓶頸資源位的晶片傳送盒的優先級最高。 The first FOUP priority rule includes: setting the movement priority for each FOUP according to the moving step of each FOUP and whether the bottleneck resource bit is occupied, wherein the priority of the FOUP that occupies the bottleneck resource bit is highest level.

晶片機械手掃描完成且等待進行製程的晶片傳送盒或參與製程的晶片傳送盒的優先級為一級。 The priority of the wafer robot that has finished scanning and waits for the wafer transfer box to be processed or the wafer transfer box that participates in the manufacturing process is the first level.

如果參與製程的晶片傳送盒(Foup)佔用了瓶頸資源晶片裝卸載位(LoadLock)時,則參與製程的晶片傳送盒(Foup)優先級為一 級,儲料器(Stocker)內晶片機械手掃描完成且等待進行製程的晶片傳送盒(Foup)優先級為二級;如果晶片機械手掃描完成且等待進行製程的晶片傳送盒(Foup)佔用了瓶頸資源晶片裝卸載位(LoadLock)時,則儲料器(Stocker)內晶片機械手掃描完成且等待進行製程的晶片傳送盒(Foup)優先級為一級,參與製程的晶片傳送盒(Foup)優先級為二級。 If the wafer transfer box (Foup) participating in the process occupies the bottleneck resource wafer loading and unloading position (LoadLock), the priority of the wafer transfer box (Foup) participating in the manufacturing process is one level, the wafer robot in the stocker (Stocker) has completed the scanning of the wafer robot and the priority of the wafer transfer box (Foup) waiting for the process is the second level; When the bottleneck resource wafer loading and unloading position (LoadLock), the wafer robot in the stocker (Stocker) has completed scanning and the priority of the wafer transfer box (Foup) waiting for the process is the first level, and the wafer transfer box (Foup) participating in the process is given priority The grade is second grade.

等待晶片機械手(WTR)掃描的晶片傳送盒(Foup)優先級為三級;放在外部裝載台(LoadPort)等待移入到儲料器(Stocker)的晶片傳送盒(Foup)優先級為四級;放在儲料器(Stocker)上等待移入到晶片裝卸載位(LoadLock)進行晶片機械手掃描的晶片傳送盒(Foup)優先級為五級;放在儲料器(Stocker)上的等待移出到外部裝載台(LoadPort)的晶片傳送盒(Foup)優先級為六級。 The priority of the Foup waiting to be scanned by the Wafer Robot (WTR) is Level 3; the priority of the Foup placed on the External Loading Station (LoadPort) waiting to be moved into the Stocker (Stocker) is Level 4 ;The priority of the wafer transfer box (Foup) placed on the stocker (Stocker) waiting to be moved into the wafer loading and unloading position (LoadLock) for scanning by the wafer manipulator is five; The priority of the wafer transfer box (Foup) to the external loading station (LoadPort) is six.

以上為機台所有參與傳送(Carrier)操作的晶片傳送盒(Foup)設定了操作優先級,優先級的數字越小,則在調度循環中優先選為可移動物料,優先級數字越大,則在調度循環中後選為可移動物料。 The above sets the operation priority for all the wafer transfer boxes (Foup) involved in the transfer (Carrier) operation of the machine. The smaller the priority number is, the priority will be selected as the movable material in the scheduling cycle. The larger the priority number is, then Postselected as a movable item in a dispatch cycle.

第二晶片傳送盒優先級規則是針對製程參與類物料中的晶片傳送盒設定操作優先級,參與製程(job)的晶片傳送盒(Foup)的類型有4種,分別為P(Product)、M(Monitor)、ED(Extra Dummy)、SD(Side Dummy)四種類型。這四種類型的優先級在製程(job)創建時用戶是可以自己設定優先級順序,即第二晶片傳送盒優先級規則,隨後 在製程(job)執行過程中參與製程(job)的晶片傳送盒(Foup)的按照設定的第二晶片傳送盒優先級規則進行操作。 The second WFOP priority rule is to set the operation priority for the WFOP in the process participation materials. There are four types of WFOPs (Foup) participating in the process (job), namely P (Product), M (Monitor), ED (Extra Dummy), SD (Side Dummy) four types. For these four types of priority, the user can set the priority order when the process (job) is created, that is, the second FOUP priority rule, and then During the execution of the process (job), the Foups participating in the process (job) operate according to the set second Foup priority rule.

如圖4所示,如果待調度物料中不存在放置在瓶頸資源位上的製程參與類物料時,此時需要對待調度物料進行分類,將各個類型待調度物料分批發送到調度模塊進行調度,並輸出不同的調度序列。 As shown in Figure 4, if there is no process participation material placed on the bottleneck resource position among the materials to be scheduled, it is necessary to classify the materials to be scheduled at this time, and send each type of materials to be scheduled to the scheduling module in batches for scheduling. and output a different dispatch sequence.

在上述步驟S2中,如果判斷待調度物料中不存在放置在瓶頸資源位上的製程參與類物料,則轉到步驟S3;步驟S3、判斷待調度物料中是否存在放置在瓶頸資源位上的傳輸載體類物料,如果是,則轉到步驟S4;步驟S4、判斷待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S5,如果是,則轉到步驟S6;步驟S5、直接將待調度物料的信息發送給調度模塊進行調度,輸出調度序列;步驟S6、將待調度物料中放置在瓶頸資源位上的傳輸載體類物料添加到第一批調度處理物料,將第一批調度處理物料的信息發送給調度模塊進行調度,並輸出第一調度子序列;步驟S7、提取待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出第二調度序子列;步驟S8、提取待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出第三調度子序列; 步驟S9;輸出調度序列,該調度序列包括第一調度子序列、第二調度子序列和第三調度子序列。 In the above step S2, if it is determined that there is no process participation material placed on the bottleneck resource position among the materials to be scheduled, go to step S3; Step S3, determine whether there is a transmission placed on the bottleneck resource position among the materials to be scheduled Carrier materials, if yes, go to step S4; step S4, judge whether there are process participation materials that are not placed on bottleneck resource positions in the materials to be scheduled, if not, go to step S5, if yes, go to Go to step S6; step S5, directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; step S6, add the transmission carrier material placed on the bottleneck resource position among the materials to be scheduled to the first batch of scheduling Processing materials, sending the information of the first batch of scheduling processing materials to the scheduling module for scheduling, and outputting the first scheduling sub-sequence; step S7, extracting the process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled, and adding them to The second batch of scheduling processing materials, the information of the second batch of scheduling processing materials is sent to the scheduling module for scheduling, and the second scheduling sequence sub-sequence is output; step S8, extracting the transmission carrier that is not placed on the bottleneck resource position among the materials to be scheduled Class materials, added to the third batch of scheduling processing materials, sending the information of the third batch of scheduling processing materials to the scheduling module for scheduling, and outputting the third scheduling subsequence; Step S9: Outputting a scheduling sequence, the scheduling sequence includes a first scheduling subsequence, a second scheduling subsequence and a third scheduling subsequence.

按照上述方法可以看出,將待調度物料分成了先後三批,第一批為放置在瓶頸資源位上的傳輸載體類物料;第二批為不放置在瓶頸資源位上的製程參與類物料;第三批為不放置在瓶頸資源位上的傳輸載體類物料。 According to the above method, it can be seen that the materials to be scheduled are divided into three batches, the first batch is the transmission carrier materials placed on the bottleneck resource position; the second batch is the process participation materials not placed on the bottleneck resource position; The third batch is the transmission carrier materials that are not placed on the bottleneck resource positions.

在步驟S3中,如果判斷待調度物料中不存在放置在瓶頸資源位上的傳輸載體類物料,則轉到步驟S10;步驟S10、判斷待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S11,如果是,則轉到步驟S12;步驟S11、直接將待調度物料的信息發送給調度模塊進行調度,輸出調度序列;步驟S12、提取待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出第二調度子序列;步驟S13、提取待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出第三調度子序列;步驟S14;輸出調度序列,調度序列包括第二調度子序列和第三調度子序列。 In step S3, if it is determined that there is no transmission carrier material placed on the bottleneck resource position among the materials to be dispatched, go to step S10; Step S10, determine whether there is a process that is not placed on the bottleneck resource position among the materials to be dispatched Participating materials, if no, go to step S11, if yes, go to step S12; step S11, directly send the information of the materials to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; step S12, extract the materials to be scheduled The process participation materials that are not placed on the bottleneck resource positions are added to the second batch of scheduling processing materials, and the information of the second batch of scheduling processing materials is sent to the scheduling module for scheduling, and the second scheduling subsequence is output; step S13, Extract the transmission carrier materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the third batch of scheduling processing materials, send the information of the third batch of scheduling processing materials to the scheduling module for scheduling, and output the third scheduling subsequence ; Step S14 ; Outputting a scheduling sequence, the scheduling sequence includes a second scheduling subsequence and a third scheduling subsequence.

此步驟中,由於不存在放置在瓶頸資源位上的傳輸載體類物料,因此待調度物料分成了先後二批,第一批為不放置在瓶頸資源位上的製程參與類物料;第二批為不放置在瓶頸資源位上的傳輸載體類物料。 In this step, since there is no transmission carrier material placed on the bottleneck resource position, the materials to be scheduled are divided into two batches. The first batch is process participation materials that are not placed on the bottleneck resource position; the second batch is Transmission carrier materials that are not placed on bottleneck resource positions.

應用本發明的調度方法,假設有2個不放置在瓶頸資源位上的傳輸載體類物料和1個不放置在瓶頸資源位上的製程參與類物料同時進入現有調度計算,由於此時瓶頸資源中沒有參與調度的物料,因此先提取參與不放置在瓶頸資源位上的製程參與類物料輸入到調度模塊進行調度計算,並輸出第二調度子序列,接著在提取不放置在瓶頸資源位上的傳輸載體類物料的2個物料輸入到調度模塊進行調度計算,並輸出第三調度子序列,最終輸出的調度序列為:第二調度子序列+第三調度子序列,當製程參與類物料的晶片傳送盒(Foup)移動到瓶頸資源晶片裝卸載位(LoadLock)後先開始裝料,即將晶片(Wafer)從晶片傳送盒(Foup)中取出,放置在舟(Boat)上,做完裝料晶片傳送盒(Foup)回到儲料器(Stocker)之後,2個傳輸載體類物料的晶片傳送盒(Foup)再去瓶頸資源晶片裝卸載位(LoadLock)做掃描(Map),有效的避免了瓶頸資源的相互等待狀態,規避了調度死鎖。 Applying the scheduling method of the present invention, it is assumed that two transmission carrier materials that are not placed on the bottleneck resource position and one process participation material that is not placed on the bottleneck resource position enter the existing scheduling calculation at the same time. There are no materials participating in the scheduling, so the process participation materials that are not placed on the bottleneck resource positions are first extracted and input to the scheduling module for scheduling calculation, and the second scheduling subsequence is output, and then the transmission is extracted and not placed on the bottleneck resource positions The two materials of the carrier material are input to the scheduling module for scheduling calculation, and output the third scheduling subsequence. The final output scheduling sequence is: the second scheduling subsequence + the third scheduling subsequence. After the box (Foup) moves to the bottleneck resource wafer loading and unloading position (LoadLock), the loading starts first, that is, the wafer (Wafer) is taken out of the wafer transfer box (Foup), placed on the boat (Boat), and the loading wafer transfer is completed After the box (Foup) returns to the stocker (Stocker), the two wafer transfer boxes (Foup) that transport carrier materials go to the bottleneck resource wafer loading and unloading position (LoadLock) to scan (Map), effectively avoiding bottleneck resources The mutual waiting state avoids scheduling deadlock.

本發明通過為進行傳送操作的晶片傳送盒設置操作優先級規則,並將待調度物料分類分批調度,從而解決了帶儲料器的半導體設備在多個傳送操作和製程操作同時調度時會由於爭奪瓶頸資源而導致調度計算死鎖的技術問題,提高了機台軟體運行的可靠性和設備產能,進一步提升了客戶的體驗度。 The present invention sets the operation priority rules for the wafer transfer box for the transfer operation, and classifies and batches the materials to be scheduled, thereby solving the problem of semiconductor equipment with a stocker when multiple transfer operations and process operations are scheduled at the same time. The technical problem of scheduling and computing deadlock caused by competition for bottleneck resources has improved the reliability of machine software operation and equipment production capacity, and further improved customer experience.

前述內容概括數項實施例之特徵,使得熟習此項技術者可更佳地理解本揭露之態樣。熟習此項技術者應瞭解,其等可容易地使用本揭露作為用於設計或修改用於實行本文中介紹之實施例之相同目的及/或達成相同優點之其他製程及結構之一基礎。熟習此項技術者亦應瞭解,此等等效構造不背離本揭露之精神及範疇,且其等可在不背離本揭露之精神及範疇之情況下在本文中作出各種改變、置換及更改。 The foregoing content summarizes the features of several embodiments, so that those skilled in the art can better understand aspects of the present disclosure. Those skilled in the art should appreciate that they can readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments described herein. Those skilled in the art should also understand that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions and alterations herein without departing from the spirit and scope of the present disclosure.

LoadPortA、LoadPortB:外部裝載台口 LoadPortA, LoadPortB: external loading port

STR:晶片傳送盒機械手 STR: wafer transfer box robot

Shelf:架子 Shelf: shelf

Stocker:儲料器 Stocker: Stocker

LoadLockC、LoadLockD:晶片裝卸載位口 LoadLockC, LoadLockD: chip loading and unloading port

WTR:晶片機械手 WTR: Wafer Robot

Boat:舟 Boat: boat

PM:製程模塊腔室 PM: process module chamber

Claims (9)

一種半導體設備中防止調度死鎖的物料調度方法,包括: 步驟S1:確定待調度物料,其中,該待調度物料分為一製程參與類物料和一傳輸載體類物料,該製程參與類物料包括參與製程的晶片和參與製程的晶片傳送盒,該傳輸載體類物料包括不參與製程的晶片傳送盒; 步驟S2:如果該待調度物料中存在放置在一瓶頸資源位上的該製程參與類物料,則直接將該待調度物料的信息發送給調度模塊,該調度模塊進行調度,輸出一調度序列; 其中,該調度模塊進行調度,輸出該調度序列包括: 步驟Z100:接收該待調度物料的信息,生成一可移動晶片列表和一可移動晶片傳送盒列表; 步驟Z200:判斷該待調度物料中是否有晶片傳送盒正在進行裝料或卸料,如果是,則轉到步驟Z210,如果否,則轉到步驟Z220; 步驟Z210:對正在進行裝料或卸料的晶片傳送盒,或者可移動的晶片,創建移動步驟,然後轉到Z300; 步驟Z220:判斷該待調度物料中是否有正在進行傳輸的晶片傳送盒,如果是,則基於預設的一第一晶片傳送盒優先級規則,針對優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300;如果否,則根據晶片傳送盒是將要進行裝料還是將要進行卸料,基於預設的一第二晶片傳送盒優先級規則,針對製程參與類物料中優先級最高的晶片傳送盒創建移動步驟,並轉到步驟Z300; 步驟Z300:更新該可移動晶片列表或該可移動晶片傳送盒列表,判斷是否所有該待調度物料都到達目的地,如果否,返回步驟Z200,如果是,則輸出所有移動步驟,形成該調度序列。A material scheduling method for preventing scheduling deadlock in semiconductor equipment, comprising: Step S1: Determine the materials to be dispatched, wherein the materials to be dispatched are divided into a process-participating material and a transport carrier-type material, the process-participating material includes wafers participating in the process and wafer transfer boxes participating in the process, and the transport carrier class Materials include FOUPs that do not participate in the process; Step S2: If there is a process-participating material placed on a bottleneck resource position among the materials to be scheduled, directly send the information of the material to be scheduled to the scheduling module, and the scheduling module performs scheduling and outputs a scheduling sequence; Wherein, the scheduling module performs scheduling, and outputs the scheduling sequence including: Step Z100: Receive the information of the material to be dispatched, and generate a list of movable wafers and a list of movable wafer delivery boxes; Step Z200: Judging whether there is a FOUP being loaded or unloaded in the material to be dispatched, if yes, go to step Z210, if not, go to step Z220; Step Z210: Create a movement step for the wafer FOUP that is being loaded or unloaded, or a movable wafer, and then turn to Z300; Step Z220: Determine whether there is an FOUP being transferred in the material to be scheduled, and if so, create a movement step for the FOUP with the highest priority based on a preset priority rule for the first FOUP, and Go to step Z300; if not, according to whether the FOUP is about to be loaded or unloaded, based on a preset second FOUP priority rule, transfer the wafer with the highest priority among the process participation materials box to create a move step, and go to step Z300; Step Z300: Update the movable wafer list or the movable wafer transfer box list, and judge whether all the materials to be scheduled have reached the destination, if not, return to step Z200, if yes, output all moving steps to form the scheduling sequence . 如請求項1所述的方法,其中步驟Z210包括: 步驟Z211:判斷是否可以針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,如果是,則針對正在進行裝料或卸料的晶片傳送盒創建移動步驟,並轉到步驟Z212,如果否,則直接轉到步驟Z212; 步驟Z212:判斷是否已有移動步驟生成,如果是,則轉到步驟Z300,如果否,則轉到驟Z213; 步驟Z213:基於預設的晶片優先級規則,針對可移動晶片中優先級最高的晶片創建移動步驟,並轉到步驟Z300。The method as claimed in item 1, wherein step Z210 comprises: Step Z211: Determine whether a moving step can be created for the FOUP being loaded or unloaded, if yes, create a moving step for the FOUP being loaded or unloaded, and go to step Z212, if not , go directly to step Z212; Step Z212: Judging whether a moving step has been generated, if yes, go to step Z300, if not, go to step Z213; Step Z213: Based on the preset wafer priority rules, create a moving step for the wafer with the highest priority among the movable wafers, and go to step Z300. 如請求項1所述的方法,其中該瓶頸資源位包括一晶片裝卸載位、一晶片傳送盒機械手。The method according to claim 1, wherein the bottleneck resource location includes a wafer loading and unloading location, and a FOUP robot. 如請求項1所述的方法,其中該第一晶片傳送盒優先級規則包括:根據各晶片傳送盒所處的移動步驟及是否佔用了該瓶頸資源位為各晶片傳送盒設定移動優先級,其中,佔用了該瓶頸資源位的晶片傳送盒的優先級最高。The method as described in claim 1, wherein the first FOUP priority rule includes: setting a movement priority for each FOUP according to the moving step of each FOUP and whether the bottleneck resource bit is occupied, wherein , the FOUP that occupies the bottleneck resource bit has the highest priority. 如請求項4所述的方法,其中該第一晶片傳送盒優先級規則包括:晶片機械手掃描完成且等待進行製程的晶片傳送盒或參與製程的晶片傳送盒的優先級為一級。The method as claimed in claim 4, wherein the first FOUP priority rule includes: the priority of FOUPs waiting to be processed by the wafer robot after scanning or participating in the process is one level. 如請求項5所述的方法,其中該第一晶片傳送盒優先級規則還包括:在參與製程的晶片傳送盒佔用了瓶頸資源位時,則晶片機械手掃描完成且等待進行製程的晶片傳送盒優先級為二級;在晶片機械手掃描完成且等待進行製程的晶片傳送盒佔用了瓶頸資源位時,則參與製程的晶片傳送盒優先級為二級。The method as described in claim 5, wherein the first FOUP priority rule further includes: when the FOUPs participating in the process occupy the bottleneck resource position, the wafer manipulator scans the FOUPs that are waiting to be processed The priority is level 2; when the scanning of the wafer manipulator is completed and the FOUP waiting for the process occupies the bottleneck resource position, the priority of the FOUP participating in the process is level 2. 如請求項6所述的方法,其中等待晶片機械手掃描的晶片傳送盒優先級為三級;等待移入到儲料器的晶片傳送盒優先級為四級;放在儲料器上等待移入到晶片裝卸載位進行晶片機械手掃描的晶片傳送盒優先級為五級;放在儲料器上的等待移出到裝載端口的晶片傳送盒優先級為六級。The method as described in claim item 6, wherein the priority of the wafer transfer box waiting for the wafer manipulator to scan is three; the priority of the wafer transfer box waiting to be moved into the stocker is four; it is placed on the stocker and waits to be moved into the stocker The priority of the wafer transfer boxes scanned by the wafer manipulator at the wafer loading and unloading position is level five; the priority level of the wafer transport boxes placed on the stocker waiting to be moved out to the loading port is level six. 如請求項1-7任一項所述的方法,其中步驟S2中,如果該待調度物料中不存在放置在瓶頸資源位上的製程參與類物料,則轉到步驟S3; 步驟S3:如果該待調度物料中存在放置在瓶頸資源位上的傳輸載體類物料,則轉到步驟S4; 步驟S4:判斷該待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S5,如果是,則轉到步驟S6; 步驟S5:直接將該待調度物料的信息發送給調度模塊進行調度,輸出該調度序列; 步驟S6:將該待調度物料中放置在瓶頸資源位上的傳輸載體類物料添加到第一批調度處理物料,將第一批調度處理物料的信息發送給調度模塊進行調度,並輸出一第一調度子序列; 步驟S7:提取該待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出一第二調度序子列; 步驟S8:提取該待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出一第三調度子序列; 步驟S9:輸出該調度序列,該調度序列包括該第一調度子序列、該第二調度子序列和該第三調度子序列。The method as described in any one of claim items 1-7, wherein in step S2, if there is no process participation material placed on the bottleneck resource position among the materials to be scheduled, go to step S3; Step S3: If there is a transmission carrier material placed on the bottleneck resource position among the materials to be scheduled, go to step S4; Step S4: Determine whether there is a process participation material that is not placed on the bottleneck resource position among the materials to be scheduled, if not, go to step S5, if yes, go to step S6; Step S5: directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; Step S6: Add the transmission carrier material placed on the bottleneck resource position among the materials to be scheduled to the first batch of scheduling processing materials, send the information of the first batch of scheduling processing materials to the scheduling module for scheduling, and output a first dispatch subsequence; Step S7: Extract the process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the second batch of scheduling processing materials, send the information of the second batch of scheduling processing materials to the scheduling module for scheduling, and output a The second dispatch sequence sub-sequence; Step S8: Extract the transmission carrier materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the third batch of scheduling processing materials, send the information of the third batch of scheduling processing materials to the scheduling module for scheduling, and output a a third scheduling subsequence; Step S9: Outputting the scheduling sequence, the scheduling sequence includes the first scheduling subsequence, the second scheduling subsequence and the third scheduling subsequence. 如請求項8所述的方法,其中在步驟S3中,如果該待調度物料中不存在放置在瓶頸資源位上的傳輸載體類物料,則轉到步驟S10; 步驟S10:判斷該待調度物料中是否存在不放置在瓶頸資源位上的製程參與類物料,如果否,則轉到步驟S11,如果是,則轉到步驟S12; 步驟S11:直接將該待調度物料的信息發送給調度模塊進行調度,輸出該調度序列; 步驟S12:提取該待調度物料中不放置在瓶頸資源位上的製程參與類物料,添加到第二批調度處理物料,將第二批調度處理物料的信息發送給調度模塊進行調度,並輸出一第二調度序子列; 步驟S13:提取該待調度物料中不放置在瓶頸資源位上的傳輸載體類物料,添加到第三批調度處理物料,將第三批調度處理物料的信息發送給調度模塊進行調度,並輸出一第三調度子序列; 步驟S14:輸出該調度序列,該調度序列包括該第二調度子序列和該第三調度子序列。The method as described in claim 8, wherein in step S3, if there is no transmission carrier material placed on the bottleneck resource position among the materials to be scheduled, go to step S10; Step S10: Judging whether there are process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled, if not, go to step S11, if yes, go to step S12; Step S11: directly send the information of the material to be scheduled to the scheduling module for scheduling, and output the scheduling sequence; Step S12: Extract the process participation materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the second batch of scheduling processing materials, send the information of the second batch of scheduling processing materials to the scheduling module for scheduling, and output a The second dispatch sequence sub-sequence; Step S13: Extract the transmission carrier materials that are not placed on the bottleneck resource position among the materials to be scheduled, add them to the third batch of scheduling processing materials, send the information of the third batch of scheduling processing materials to the scheduling module for scheduling, and output a a third scheduling subsequence; Step S14: Outputting the scheduling sequence, which includes the second scheduling subsequence and the third scheduling subsequence.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020147960A1 (en) * 2001-01-26 2002-10-10 Applied Materials, Inc. Method and apparatus for determining scheduling for wafer processing in cluster tools with integrated metrology and defect control
CN105844389A (en) * 2016-03-17 2016-08-10 安徽理工大学 FMS deadlock free scheduling control new method containing related resource constraints
CN105990200A (en) * 2015-03-16 2016-10-05 台湾积体电路制造股份有限公司 Stocker and method for dispatching wafer carrier in stocker
US20200026564A1 (en) * 2017-05-04 2020-01-23 Salesforce.Com, Inc. Systems, methods, and apparatuses for implementing a scheduler and workload manager with dynamic workload termination based on cost-benefit analysis
TW202008226A (en) * 2018-07-19 2020-02-16 大陸商北京北方華創微電子裝備有限公司 A method and apparatus for optimal scheduling of materials

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7089076B2 (en) * 2003-05-16 2006-08-08 Fsi International, Inc. Scheduling multi-robot processing systems
JP6002532B2 (en) * 2012-10-10 2016-10-05 株式会社日立ハイテクノロジーズ Vacuum processing apparatus and vacuum processing method
CN106898572B (en) * 2015-12-17 2019-07-05 北京北方华创微电子装备有限公司 Material dispatch method and system based on equipment real-time status

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020147960A1 (en) * 2001-01-26 2002-10-10 Applied Materials, Inc. Method and apparatus for determining scheduling for wafer processing in cluster tools with integrated metrology and defect control
CN105990200A (en) * 2015-03-16 2016-10-05 台湾积体电路制造股份有限公司 Stocker and method for dispatching wafer carrier in stocker
CN105844389A (en) * 2016-03-17 2016-08-10 安徽理工大学 FMS deadlock free scheduling control new method containing related resource constraints
US20200026564A1 (en) * 2017-05-04 2020-01-23 Salesforce.Com, Inc. Systems, methods, and apparatuses for implementing a scheduler and workload manager with dynamic workload termination based on cost-benefit analysis
TW202008226A (en) * 2018-07-19 2020-02-16 大陸商北京北方華創微電子裝備有限公司 A method and apparatus for optimal scheduling of materials

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