TWI781658B - Aperture and Laser Oscillators - Google Patents

Aperture and Laser Oscillators Download PDF

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TWI781658B
TWI781658B TW110122541A TW110122541A TWI781658B TW I781658 B TWI781658 B TW I781658B TW 110122541 A TW110122541 A TW 110122541A TW 110122541 A TW110122541 A TW 110122541A TW I781658 B TWI781658 B TW I781658B
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aforementioned
aperture
optical resonator
opening
area
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TW202203529A (en
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河村譲一
田中研太
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日商住友重機械工業股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08018Mode suppression
    • H01S3/0804Transverse or lateral modes
    • H01S3/0805Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08059Constructional details of the reflector, e.g. shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Laser Surgery Devices (AREA)

Abstract

[課題]提供一種能夠抑制光束剖面從正圓變形的光學共振器用的光圈。 [解決手段]在封閉到光學共振器的雷射光束的路徑配置光圈。該光圈劃分封閉到光學共振器的雷射光束所通過之通過區域及配置於通過區域的周圍之遮光區域。作為在與光學共振器的光軸正交之平面內彼此正交之二個方向的通過區域的尺寸之比的縱橫比是可變的。[Problem] To provide an aperture for an optical resonator capable of suppressing deformation of a beam profile from a perfect circle. [Solution] Arrange an aperture in the path of the laser beam closed to the optical resonator. The aperture divides a passage area through which the laser beam closed to the optical resonator passes, and a light-shielding area arranged around the passage area. The aspect ratio, which is the ratio of the sizes of the pass regions in two directions orthogonal to each other in a plane orthogonal to the optical axis of the optical resonator, is variable.

Description

光圈及雷射振盪器Aperture and Laser Oscillator

本發明關於一種配置在光學共振器內的光圈及搭載有光圈之雷射振盪器。 本申請案係基於2020年7月10日申請的日本專利申請第2020-119131號主張優先權。該日本申請案的全部內容係藉由參閱而援用於本說明書中。The present invention relates to an aperture arranged in an optical resonator and a laser oscillator equipped with the aperture. This application claims priority based on Japanese Patent Application No. 2020-119131 filed on July 10, 2020. The entire content of this Japanese application is incorporated by reference in this specification.

雷射振盪器包括由前鏡片及後鏡片構成之光學共振器及放電電極等激勵機構。通常,在光學共振器的光軸上配置前光圈、後光圈或這兩者。藉由配置光圈,能夠將光束剖面整形成正圓,抑制束散角及抑制寄生振盪。為了輸出圓形的光束剖面的雷射光束,作為光圈,使用設置有正圓的開口的金屬板(例如,參閱下述的專利文獻1。)。 [先前技術文獻]The laser oscillator includes an optical resonator composed of a front lens and a rear lens, and an excitation mechanism such as a discharge electrode. Usually, a front aperture, a rear aperture, or both are arranged on the optical axis of the optical resonator. By configuring the aperture, the beam profile can be shaped into a perfect circle, and the beam divergence angle and parasitic oscillation can be suppressed. In order to output a laser beam with a circular beam profile, a metal plate provided with a perfect circular opening is used as an aperture (see, for example, Patent Document 1 below). [Prior Art Literature]

[專利文獻1]日本特開昭61-276387號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 61-276387

[發明所欲解決之問題][Problem to be solved by the invention]

即使使用具有正圓的開口的光圈對光束剖面進行整形,從雷射振盪器輸出的雷射光束的光束剖面的形狀亦有時從正圓崩塌,而成為橢圓狀。Even if the beam profile is shaped by using an aperture having a perfect circular opening, the shape of the beam profile of the laser beam output from the laser oscillator may collapse from a perfect circle to an elliptical shape.

本發明的目的在於提供一種,能夠抑制光束剖面的、從正圓的崩塌之光圈。本發明的另一目的在於提供一種,能夠抑制光束剖面從正圓變形之雷射振盪器。 [解決問題之技術手段]An object of the present invention is to provide an aperture capable of suppressing the collapse of a beam profile from a perfect circle. Another object of the present invention is to provide a laser oscillator capable of suppressing the deformation of the beam profile from a perfect circle. [Technical means to solve the problem]

根據本發明的一觀點,提供一種光圈,是配置在封入於光學共振器的雷射光束的路徑上之光圈, 前述光圈劃分:封入於前述光學共振器之雷射光束所通過之通過區域;及配置在前述通過區域的周圍之遮光區域,且在與前述光學共振器的光軸正交之平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變。According to an aspect of the present invention, there is provided an aperture, which is arranged on the path of a laser beam enclosed in an optical resonator, The aforementioned aperture is divided into: the passing area through which the laser beam enclosed in the aforementioned optical resonator passes; and the light-shielding area arranged around the aforementioned passing area, and in a plane perpendicular to the optical axis of the aforementioned optical resonator, as each other The aspect ratio of the ratio of the dimensions of the aforementioned passing regions in the two orthogonal directions is variable.

根據本發明的另一觀點,提供一種雷射振盪器,係具有: 光學共振器,其係封入雷射光束;及 光圈,其係劃分:封入前述光學共振器之雷射光束所通過之通過區域;及配置於前述通過區域的周圍之遮光區域,且在與前述光學共振器的光軸正交之平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變;及 腔室,其係容納前述光學共振器、前述光圈和雷射介質氣體;以及 縱橫比改變機構,其係從前述腔室外操作前述光圈的前述通過區域的縱橫比來進行改變。 [發明之效果]According to another aspect of the present invention, a laser oscillator is provided, which has: an optical resonator that encloses a laser beam; and The aperture, which is divided into: the passing area through which the laser beam enclosed in the aforementioned optical resonator passes; and the light-shielding area arranged around the aforementioned passing area, and in a plane perpendicular to the optical axis of the aforementioned optical resonator, as the aspect ratio of the ratio of the dimensions of the aforesaid passing areas in two directions orthogonal to each other is variable; and a chamber containing the aforementioned optical resonator, the aforementioned aperture, and the laser medium gas; and The aspect ratio changing mechanism changes the aspect ratio of the passing area of the aperture by operating from outside the chamber. [Effect of Invention]

藉由改變光圈的通過區域的縱橫比,能夠調節光束剖面的形狀,抑制從正圓的變形。By changing the aspect ratio of the passing area of the aperture, it is possible to adjust the shape of the beam profile and suppress distortion from a perfect circle.

參閱圖1~圖6,對基於一實施例的雷射振盪器進行說明。 圖1係搭載有基於本實施例的雷射振盪器之雷射加工裝置的概略圖。雷射加工裝置包括雷射振盪器12及加工裝置80。Referring to FIGS. 1 to 6 , a laser oscillator according to an embodiment will be described. FIG. 1 is a schematic diagram of a laser processing apparatus equipped with a laser oscillator according to this embodiment. The laser processing device includes a laser oscillator 12 and a processing device 80 .

雷射振盪器12被支撐在架台11上,架台11被固定在共通底座100上。加工裝置80包括光束整形光學系統81及工作台82。加工對象物90保持在工作台82上。光束整形光學系統81及工作台82被固定在共通底座100上。能夠在雷射振盪器12與光束整形光學系統81之間的雷射光束的路徑配置光束分析儀50。雷射加工中,光束分析儀50從雷射光束的路徑退避。共通底座100例如為地板。The laser oscillator 12 is supported on a stand 11 , and the stand 11 is fixed on a common base 100 . The processing device 80 includes a beam shaping optical system 81 and a workbench 82 . The object to be processed 90 is held on the table 82 . The beam shaping optical system 81 and the table 82 are fixed on the common base 100 . The beam profiler 50 can be arranged on the path of the laser beam between the laser oscillator 12 and the beam shaping optical system 81 . During laser processing, the beam profiler 50 is withdrawn from the path of the laser beam. The common base 100 is, for example, a floor.

雷射振盪器12輸出脈衝雷射光束。作為雷射振盪器12,例如使用二氧化碳雷射振盪器。另外,作為雷射振盪器12,亦可以使用其他的氣體雷射振盪器,例如準分子雷射振盪器。從雷射振盪器12輸出的脈衝雷射光束藉由光束整形光學系統81對光束輪廓進行整形,入射到加工對象物90。The laser oscillator 12 outputs a pulsed laser beam. As the laser oscillator 12, for example, a carbon dioxide laser oscillator is used. In addition, as the laser oscillator 12 , other gas laser oscillators, such as excimer laser oscillators, can also be used. The pulsed laser beam output from the laser oscillator 12 is incident on the object 90 after the beam profile is shaped by the beam shaping optical system 81 .

圖2係包括基於實施例的雷射振盪器12的光軸的剖視圖。雷射振盪器12包括收納雷射介質氣體及光學共振器20等之腔室15。腔室15的內部空間區分為位於相對上側的光學室16和位於相對下側的送風機室17。光學室16和送風機室17被上下分隔板18隔開。另外,在上下分隔板18上設置有使雷射介質氣體在光學室16與送風機室17之間流通的開口。光學室16的底板19從送風機室17的側壁,沿光學共振器20的光軸20A的方向伸出,光學室16的光軸方向的長度比送風機室17的光軸方向的長度長。FIG. 2 is a cross-sectional view including an optical axis of the laser oscillator 12 according to the embodiment. The laser oscillator 12 includes a chamber 15 containing a laser medium gas, an optical resonator 20 and the like. The inner space of the chamber 15 is divided into an optical chamber 16 located on the relatively upper side and a blower chamber 17 located on the relatively lower side. The optical chamber 16 and the blower chamber 17 are separated by an upper and lower partition plate 18 . In addition, an opening through which laser medium gas flows between the optical chamber 16 and the blower chamber 17 is provided in the upper and lower partition plates 18 . The bottom plate 19 of the optical chamber 16 protrudes from the side wall of the blower chamber 17 in the direction of the optical axis 20A of the optical resonator 20 , and the length of the optical chamber 16 in the direction of the optical axis is longer than the length of the blower chamber 17 in the direction of the optical axis.

腔室15的底板19利用4個支撐部位45支撐於架台11(圖1)上。在俯視觀察時,4個支撐部位45配置於與長方形的4個頂點相對應的位置。The bottom plate 19 of the chamber 15 is supported on the stand 11 ( FIG. 1 ) by means of four support points 45 . The four support portions 45 are arranged at positions corresponding to the four vertices of the rectangle in plan view.

在光學室16內配置有一對放電電極21及一對共振器鏡片25。一對放電電極21分別被固定在電極箱22上。一對電極箱22經由多個電極支撐構件23支撐於底板19。一對放電電極21在上下方向上隔著間隔配置,從而放電區域24被劃分在兩者之間。放電電極21在放電區域24產生放電,藉此激勵雷射介質氣體。一對共振器鏡片25構成具有通過放電區域24的光軸20A之光學共振器20。如在後面參閱圖3進行說明的那樣,雷射介質氣體沿與圖2的紙面垂直的方向流過放電區域24。A pair of discharge electrodes 21 and a pair of resonator mirrors 25 are arranged in the optical chamber 16 . The pair of discharge electrodes 21 are respectively fixed to the electrode case 22 . A pair of electrode boxes 22 are supported on the bottom plate 19 via a plurality of electrode support members 23 . A pair of discharge electrode 21 is arrange|positioned at intervals in the up-down direction, and the discharge region 24 is divided between them. The discharge electrode 21 generates a discharge in the discharge region 24, thereby exciting the laser medium gas. A pair of resonator mirror plates 25 constitutes an optical resonator 20 having an optical axis 20A passing through the discharge region 24 . As will be described later with reference to FIG. 3 , the laser medium gas flows through the discharge region 24 in a direction perpendicular to the paper surface of FIG. 2 .

一對共振器鏡片25固定於配置於光學室16內之共通的共振器底座26上。共振器底座26為在光軸20A的方向上長的板狀的構件,經由多個光學共振器支撐構件27支撐於底板19。A pair of resonator mirrors 25 are fixed on a common resonator base 26 arranged in the optical chamber 16 . The resonator base 26 is a plate-shaped member long in the direction of the optical axis 20A, and is supported by the base plate 19 via a plurality of optical resonator support members 27 .

在放電區域24產生的光在一對共振器鏡片25之間反覆反射,在一對共振器鏡片25之間的區域20B中產生與共振器鏡片25之間的光路長度相對應的波長的駐波。如此,雷射光束被封入一對共振器鏡片25之間的區域20B。被封入光學共振器20之雷射光束的一部分,透過其中一個共振器鏡片25(在圖2中,為左側的共振器鏡片25)輸出到外部。在被封入到光學共振器20的雷射光束的路徑上配置有2個光圈60、70。光圈60、70支撐於共振器底座26。2個光圈60、70配置於沿光軸20A的方向隔著放電區域24的位置。The light generated in the discharge region 24 is repeatedly reflected between the pair of resonator mirrors 25, and a standing wave having a wavelength corresponding to the optical path length between the pair of resonator mirrors 25 is generated in the region 20B between the pair of resonator mirrors 25. . In this way, the laser beam is enclosed in the region 20B between the pair of resonator mirrors 25 . Part of the laser beam enclosed in the optical resonator 20 passes through one of the resonator mirrors 25 (the left resonator mirror 25 in FIG. 2 ) and is output to the outside. Two apertures 60 and 70 are arranged on the path of the laser beam enclosed in the optical resonator 20 . The apertures 60 and 70 are supported by the resonator base 26. The two apertures 60 and 70 are arranged at positions sandwiching the discharge region 24 in the direction of the optical axis 20A.

在使光學共振器20的光軸20A沿一個方向(在圖1中,為左方向)延伸的延長線與光學室16的壁面的交叉部位,安裝有使雷射光束透過的透光窗28。在光學共振器20內被激勵的雷射光束透過透光窗28向外部放射。有時將配置於透光窗28側的光圈60稱為前光圈,將另一光圈70稱為後光圈。A translucent window 28 through which the laser beam passes is mounted at the intersection of an extension line extending in one direction (left direction in FIG. 1 ) from the optical axis 20A of the optical resonator 20 and the wall surface of the optical chamber 16 . The laser beam excited in the optical resonator 20 is emitted to the outside through the light transmission window 28 . Sometimes the aperture 60 arranged on the side of the light transmission window 28 is called a front aperture, and the other aperture 70 is called a rear aperture.

在送風機室17中配置有送風機29。送風機29使雷射介質氣體在光學室16與送風機室17之間循環。A blower 29 is arranged in the blower chamber 17 . The blower 29 circulates the laser medium gas between the optical chamber 16 and the blower chamber 17 .

圖3係與基於實施例的雷射振盪器12的光軸20A(圖2)垂直的剖視圖。如參閱圖2進行說明的那樣,腔室15的內部空間藉由上下分隔板18被區分為上方的光學室16與下方的送風機室17。在光學室16內配置有一對放電電極21及共振器底座26。一對放電電極21分別被固定在電極箱22上。電極箱22藉由多個電極支撐構件23支撐於腔室15的底板19(圖2)。在一對放電電極21之間劃分放電區域24。共振器底座26藉由多個光學共振器支撐構件27支撐於腔室15的底板19(圖2)。由於電極支撐構件23及光學共振器支撐構件27配置於從圖3所示的剖面挪移的位置,因此在圖3中,以虛線表示電極支撐構件23及光學共振器支撐構件27。FIG. 3 is a cross-sectional view perpendicular to the optical axis 20A ( FIG. 2 ) of the laser oscillator 12 according to the embodiment. As described with reference to FIG. 2 , the inner space of the chamber 15 is divided into an upper optical chamber 16 and a lower blower chamber 17 by the upper and lower partition plates 18 . A pair of discharge electrodes 21 and a resonator base 26 are arranged in the optical chamber 16 . The pair of discharge electrodes 21 are respectively fixed to the electrode case 22 . The electrode box 22 is supported on the bottom plate 19 of the chamber 15 by a plurality of electrode support members 23 ( FIG. 2 ). A discharge region 24 is defined between a pair of discharge electrodes 21 . The resonator base 26 is supported on the bottom plate 19 of the chamber 15 by a plurality of optical resonator support members 27 ( FIG. 2 ). Since the electrode supporting member 23 and the optical resonator supporting member 27 are disposed at positions shifted from the cross section shown in FIG. 3 , the electrode supporting member 23 and the optical resonator supporting member 27 are indicated by dotted lines in FIG. 3 .

在光學室16內配置有分隔板40。分隔板40劃分從設置於上下分隔板18之開口18A至放電區域24為止的第1氣體流路41,與從放電區域24至設置於上下分隔板18之其他開口18B為止的第2氣體流路42。雷射介質氣體沿與光軸20A(圖2)正交的方向流過放電區域24。放電方向與雷射介質氣體流過的方向及光軸20A這兩者正交。藉由送風機室17、第1氣體流路41、放電區域24及第2氣體流路42形成雷射介質氣體循環的循環路徑。送風機29產生箭頭所示之雷射介質氣體的流動,以使雷射介質氣體在該循環路徑中循環。A partition plate 40 is arranged in the optical chamber 16 . The partition plate 40 divides the first gas flow path 41 from the opening 18A provided in the upper and lower partition plate 18 to the discharge area 24, and the second gas flow path 41 from the discharge area 24 to the other opening 18B provided in the upper and lower partition plate 18. Gas flow path 42 . Laser medium gas flows through discharge region 24 in a direction perpendicular to optical axis 20A (FIG. 2). The discharge direction is perpendicular to both the direction in which the laser medium gas flows and the optical axis 20A. A circulation path for circulating the laser medium gas is formed by the blower chamber 17 , the first gas flow path 41 , the discharge region 24 , and the second gas flow path 42 . The blower 29 generates the flow of the laser medium gas indicated by the arrow, so that the laser medium gas circulates in the circulation path.

在送風機室17內的循環路徑收納有熱交換器43。在放電區域24被加熱的雷射介質氣體藉由通過熱交換器43而被冷卻,被冷卻的雷射介質氣體再次被供給到放電區域24。A heat exchanger 43 is accommodated in the circulation path in the blower chamber 17 . The laser medium gas heated in the discharge region 24 is cooled by passing through the heat exchanger 43 , and the cooled laser medium gas is supplied to the discharge region 24 again.

圖4係表示從正面觀察放電電極21、電極箱22及光圈60時之位置關係之圖。在圖4中,在電極箱22上標註有陰影線。上下方向相對置的一對放電電極21被分別固定在電極箱22上。藉由安裝於電極箱22之分隔板40,劃分雷射介質氣體的第1氣體流路41及第2氣體流路42。另外,圖3示意性地表示分隔板40,圖4所示的分隔板40的形狀與圖3中示意性地表示的分隔板40的形狀不同。FIG. 4 is a diagram showing the positional relationship of the discharge electrode 21, the electrode case 22, and the diaphragm 60 when viewed from the front. In FIG. 4 , the electrode box 22 is hatched. A pair of discharge electrodes 21 facing up and down are fixed to electrode boxes 22, respectively. The first gas flow path 41 and the second gas flow path 42 of the laser medium gas are divided by the partition plate 40 attached to the electrode box 22 . In addition, FIG. 3 schematically shows the partition plate 40 , and the shape of the partition plate 40 shown in FIG. 4 is different from the shape of the partition plate 40 schematically shown in FIG. 3 .

雷射介質氣體從第1氣體流路41經由一對電極箱22之間的空間流向第2氣體流路42。在圖4中,用箭頭表示雷射介質氣體流。一對電極箱22之間的空間中包含放電區域24。在雷射介質氣體向一對電極箱22之間的空間的流入端配置有整流板44。The laser medium gas flows from the first gas flow path 41 to the second gas flow path 42 through the space between the pair of electrode cases 22 . In FIG. 4, the laser medium gas flow is indicated by arrows. A discharge region 24 is contained in the space between the pair of electrode boxes 22 . A rectifying plate 44 is arranged at the end where the laser medium gas flows into the space between the pair of electrode boxes 22 .

在與放電區域24重疊的位置配置有光圈60。從正面觀察時,光圈60包括雷射光束通過之通過區域60A及配置在其周圍之遮光區域60B。從正面觀察,通過區域60A包含在放電區域24。在與光學共振器20的光軸20A(圖2)正交之平面內彼此正交的二個方向的、通過區域60A的尺寸之比是可變的。另外,另一個光圈70(圖2)的通過區域為正圓,其大小不變。A diaphragm 60 is arranged at a position overlapping the discharge region 24 . When viewed from the front, the aperture 60 includes a passage area 60A through which the laser beam passes and a light shielding area 60B arranged around it. Passing region 60A is included in discharge region 24 when viewed from the front. The ratio of the dimensions of the passing region 60A in two directions perpendicular to each other in a plane perpendicular to the optical axis 20A ( FIG. 2 ) of the optical resonator 20 is variable. In addition, the passing area of the other aperture 70 ( FIG. 2 ) is a perfect circle, and its size does not change.

例如,將雷射介質氣體流過之方向(在圖4中,為橫向)定義為第1方向D1,將一對放電電極21所隔著之方向(在圖4中,為縱向)定義為第2方向D2。通過區域60A的第1方向D1的尺寸是可變的,第2方向D2的尺寸被固定。若通過區域60A的第1方向D1的尺寸發生改變,則通過區域60A的第1方向D1的尺寸與第2方向D2的尺寸之比(以下,稱為縱橫比。)發生改變。在圖4中,以虛線表示第1方向D1的尺寸相對於以實線表示之通過區域60A變小的通過區域60A。For example, the direction in which the laser medium gas flows (in FIG. 4, the horizontal direction) is defined as the first direction D1, and the direction in which the pair of discharge electrodes 21 are separated (in FIG. 4, the vertical direction) is defined as the first direction D1. 2 Direction D2. The size of the first direction D1 passing through the region 60A is variable, and the size of the second direction D2 is fixed. When the size of the passing region 60A in the first direction D1 changes, the ratio (hereinafter, referred to as aspect ratio) of the passing region 60A in the first direction D1 to the size of the second direction D2 changes. In FIG. 4 , the passing region 60A whose size in the first direction D1 is smaller than the passing region 60A shown by the solid line is indicated by a dotted line.

接著,參閱圖5A~圖5C,對光圈60的結構進行說明。 圖5A為光圈60的立體圖。光圈60包括第1構件61及第2構件62。第2構件62包括2個零件62A、62B。第1構件61為相對於光學共振器20(圖2)的光軸20A垂直配置之板材(例如金屬板),在該板材上,設置有與雷射光束的路徑重疊的開口63。開口63的大小是不變的。Next, the structure of the diaphragm 60 will be described with reference to FIGS. 5A to 5C . FIG. 5A is a perspective view of the aperture 60 . The aperture 60 includes a first member 61 and a second member 62 . The second member 62 includes two components 62A, 62B. The first member 61 is a plate (for example, a metal plate) arranged perpendicular to the optical axis 20A of the optical resonator 20 ( FIG. 2 ), and an opening 63 overlapping the path of the laser beam is provided on the plate. The size of the opening 63 is constant.

關於第2構件62的2個零件62A、62B,從正面觀察時,配置於沿第1方向D1隔著光軸20A的位置。2個零件62A、62B的每一個為相對於光軸20A垂直配置的板材。2個零件62A、62B的彼此相對置的周緣朝向內側,以凹陷的方式彎曲。The two components 62A and 62B of the second member 62 are arranged at positions across the optical axis 20A along the first direction D1 when viewed from the front. Each of the two parts 62A, 62B is a plate material arranged vertically with respect to the optical axis 20A. The opposing peripheries of the two components 62A and 62B are curved inwardly and concavely.

第2構件62的2個零件62A、62B被支撐為能夠藉由滑動機構65沿第1方向D1移動。滑動機構65的引導面固定在共振器底座26(圖2)上。2個零件62A、62B能夠沿第1方向D1獨立地移動。若使2個零件62A、62B沿第1方向D1移動,則從正面觀察時,第1構件61的開口63與2個零件62A、62B的相對位置關係發生改變。若從2個零件62A、62B不與開口63重疊的狀態,使2個零件62A、62B朝向接近光軸20A的方向移動,則2個零件62A、62B與開口63的一部分重疊,從第1方向D1的兩側封閉開口63的一部分。例如,2個零件62A、62B封閉從開口63的周緣進入到內側的區域。開口63的被封閉的區域的面積藉由使第2構件62的2個零件62A、62B移動而發生改變。The two parts 62A and 62B of the second member 62 are supported so as to be movable in the first direction D1 by the slide mechanism 65 . The guide surface of the sliding mechanism 65 is fastened to the resonator base 26 ( FIG. 2 ). The two components 62A, 62B are independently movable in the first direction D1. When the two components 62A, 62B are moved in the first direction D1, the relative positional relationship between the opening 63 of the first member 61 and the two components 62A, 62B changes when viewed from the front. If the two parts 62A, 62B are moved in a direction close to the optical axis 20A from the state where the two parts 62A, 62B do not overlap with the opening 63, then the two parts 62A, 62B overlap with a part of the opening 63, and the opening 63 is viewed from the first direction. Both sides of D1 close part of the opening 63 . For example, the two components 62A and 62B close the region extending from the periphery of the opening 63 to the inside. The area of the closed region of the opening 63 is changed by moving the two components 62A, 62B of the second member 62 .

圖5B及圖5C係第1構件61及第2構件62的正面圖。圖5B表示第2構件62的2個零件62A、62B沒有與第1構件61的開口63重疊的狀態。在該情況下,第1構件61的開口63與光圈60的通過區域60A一致。5B and 5C are front views of the first member 61 and the second member 62 . FIG. 5B shows a state where the two parts 62A, 62B of the second member 62 do not overlap the opening 63 of the first member 61 . In this case, the opening 63 of the first member 61 coincides with the passage area 60A of the diaphragm 60 .

圖5C表示第2構件62的2個零件62A、62B與第1構件61的開口63的一部分重疊的狀態。開口63中的不與第2構件62重疊的區域與光圈60的通過區域60A一致。藉由第2構件62的2個零件62A、62B封閉開口63的一部分,通過區域60A的第1方向D1的尺寸變小。通過區域60A的第2方向D2的尺寸與開口63的第2方向D2的尺寸相同,是不變的。FIG. 5C shows a state where two parts 62A, 62B of the second member 62 overlap with a part of the opening 63 of the first member 61 . A region of the opening 63 that does not overlap the second member 62 coincides with the passing region 60A of the diaphragm 60 . When the two parts 62A and 62B of the second member 62 close a part of the opening 63 , the size of the first direction D1 passing through the region 60A becomes smaller. The dimension in the second direction D2 of the passing region 60A is the same as the dimension in the second direction D2 of the opening 63 and does not change.

接著,對上述實施例的優異的效果進行說明。 當進行使從雷射振盪器輸出的脈衝雷射光束入射到加工對象物來形成多個孔的加工的情況下,在應形成孔的多個位置依次入射脈衝雷射光束。若從之前剛加工的孔到下一個應加工的孔為止的距離變長,則脈衝雷射光束的入射位置的移動距離變長,因而從之前剛發射(shot)到下一發射為止的時間可能變長。因此,受到應形成的孔之分布的影響,脈衝的反覆頻率發生變動。為了使形成的孔的形狀均勻,即使脈衝的反覆頻率發生變動,光束點的形狀以不變為佳。Next, the excellent effect of the above-mentioned embodiment will be described. When performing processing in which a pulsed laser beam output from a laser oscillator is incident on an object to form a plurality of holes, the pulsed laser beam is sequentially incident on a plurality of positions where holes are to be formed. If the distance from the previously processed hole to the next hole to be processed becomes longer, the moving distance of the incident position of the pulsed laser beam becomes longer, so the time from the previous shot to the next shot may be longer. lengthen. Therefore, the frequency of repetition of the pulses varies under the influence of the distribution of holes to be formed. In order to make the shape of the formed hole uniform, it is better to keep the shape of the beam spot unchanged even if the repetition frequency of the pulse changes.

本發明的發明人等進行了如下評價實驗,改變雷射振盪器12的脈衝的反覆頻率,在從雷射振盪器12的透光窗28(圖2)前進了一定的光路長度的位置,觀測雷射光束的光束點的形狀。在評價實驗中,將光圈60的通過區域60A設為正圓。The inventors of the present invention conducted the following evaluation experiments, changing the repetition frequency of the pulse of the laser oscillator 12, and observing The shape of the beam spot of the laser beam. In the evaluation experiment, the passage area 60A of the diaphragm 60 was set as a perfect circle.

圖6係表示評價實驗的結果的圖表。橫軸以單位“kHz”表示脈衝的反覆頻率,縱軸以相對值表示第1方向D1及第2方向D2的光束點的尺寸。圖表中的圓形標記及三角形標記分別表示第1方向D1的尺寸及第2方向D2尺寸。當脈衝的反覆頻率是任意值的情況下,光束剖面的第1方向D1的尺寸大於第2方向D2的尺寸。藉此,即使使用通過區域為正圓的光圈60、70,光束剖面亦不會變正圓,而會變橫長。這是因為受到雷射介質氣體流和放電的空間的不均勻性的影響,在第1方向D1和第2方向D2上振盪的狀況不同。Fig. 6 is a graph showing the results of evaluation experiments. The horizontal axis represents the repetition frequency of pulses in the unit "kHz", and the vertical axis represents the beam spot sizes in the first direction D1 and the second direction D2 in relative values. The circular mark and the triangular mark in the graph represent the dimension in the first direction D1 and the dimension in the second direction D2, respectively. When the pulse repetition frequency is an arbitrary value, the size of the beam cross section in the first direction D1 is larger than the size in the second direction D2. Thereby, even if the apertures 60 and 70 whose passing areas are perfect circles are used, the beam profile will not become a perfect circle, but will become horizontally long. This is because the state of oscillation in the first direction D1 and the second direction D2 is different due to the influence of the laser dielectric gas flow and the spatial inhomogeneity of the discharge.

若使脈衝的反覆頻率下降,則光束剖面的尺寸變大。但是,第1方向D1的尺寸的增加量大於第2方向D2的尺寸的增加量。這是因為,雷射介質氣體流的方向(第1方向D1)上的放電狀態的不均勻性與第2方向D2上放電狀態的不均勻性相比,更大地受到脈衝的反覆頻率的改變的影響。若使脈衝的反覆頻率降低,則光束剖面的形狀從正圓的變形變大。When the repetition frequency of the pulse is decreased, the size of the beam profile becomes larger. However, the increase in size in the first direction D1 is larger than the increase in size in the second direction D2. This is because the non-uniformity of the discharge state in the direction of the gas flow of the laser medium (the first direction D1) is more affected by the change in the repetition frequency of the pulse than the non-uniformity of the discharge state in the second direction D2. influences. When the repetition frequency of the pulse is lowered, the shape of the beam cross-section becomes more deformed from a perfect circle.

在本實施例中,藉由改變光圈60的通過區域60A的第1方向D1的尺寸,能夠使光束剖面的形狀接近正圓。例如,當使脈衝的反覆頻率下降而光束剖面沿第1方向D1變長時,減小通過區域60A的第1方向D1的尺寸即可。In this embodiment, by changing the size of the passing region 60A of the aperture 60 in the first direction D1, the shape of the beam cross section can be made close to a perfect circle. For example, in order to reduce the pulse repetition frequency and increase the beam profile along the first direction D1, it is only necessary to reduce the size of the passing region 60A in the first direction D1.

藉由根據脈衝的反覆頻率調節通過區域60A的縱橫比,即使改變脈衝的反覆頻率,亦能夠維持光束剖面大致正圓的狀態。By adjusting the aspect ratio of the passing region 60A according to the repetition frequency of the pulse, even if the repetition frequency of the pulse is changed, it is possible to maintain the state where the beam profile is substantially circular.

而且,在本實施例中,由於從第1方向D1的兩側封閉第1構件61的開口63(圖5A)的一部分,因此即使改變通過區域60A的第1方向D1的尺寸,通過區域60A的幾何學的中心位置亦不移動。因此,即使改變通過區域60A的第1方向D1的尺寸,亦不會產生雷射光束的中心軸的挪移。Moreover, in this embodiment, since part of the opening 63 (FIG. 5A) of the first member 61 is closed from both sides of the first direction D1, even if the size of the first direction D1 passing through the region 60A is changed, the passage through the region 60A The position of the center of geometry does not move either. Therefore, even if the size of the first direction D1 passing through the region 60A is changed, the central axis of the laser beam does not shift.

接著,對上述實施例的變形例進行說明。 在上述實施例中,將前側的光圈60(圖2)的通過區域60A(圖4)的縱橫比設為可變,但亦可以將後側的光圈70的通過區域的縱橫比設為可變。而且,亦可以將2個光圈60、70的通過區域的縱橫比設為可變。Next, modifications of the above-described embodiment will be described. In the above-mentioned embodiment, the aspect ratio of the passage region 60A ( FIG. 4 ) of the front aperture 60 ( FIG. 2 ) is made variable, but the aspect ratio of the passage region of the rear aperture 70 may also be made variable. . Furthermore, the aspect ratios of the passing regions of the two apertures 60 and 70 may be made variable.

在上述實施例中,將光圈60的通過區域60A的第2方向D2的尺寸設為固定,將第1方向D1的尺寸設為可變,但亦可以將第1方向D1的尺寸設為固定,將第2方向D2的尺寸設為可變。在該情況下,將設置在第1構件61的開口63(圖5A)設為沿第2方向D2的長橢圓形,第2構件62由沿第2方向被分割的2個構件構成即可。由於使脈衝的反覆頻率下降,因此增加通過區域60A的第2方向D2的尺寸即可。藉此,能夠減少從光束剖面的正圓的變形。In the above-mentioned embodiment, the size of the second direction D2 of the passage area 60A of the aperture 60 is fixed, and the size of the first direction D1 is made variable, but the size of the first direction D1 can also be set as fixed, The dimension of the second direction D2 is made variable. In this case, the opening 63 ( FIG. 5A ) provided in the first member 61 may have an oblong shape along the second direction D2, and the second member 62 may be composed of two divided members along the second direction. In order to reduce the repetition frequency of pulses, it is only necessary to increase the size of the second direction D2 passing through the region 60A. Thereby, distortion from the perfect circle of the beam cross section can be reduced.

並且,亦可以將通過區域60A的第1方向D1的尺寸和第2方向D2的尺寸這兩者設為可變。藉此,能夠提高光束剖面的形狀的調節自由度。In addition, both the size of the first direction D1 and the size of the second direction D2 passing through the region 60A may be made variable. Thereby, the degree of freedom of adjustment of the shape of the beam cross section can be improved.

在上述實施例中,由一對共振器鏡片25構成具有1根直線狀的光軸20A(圖2)之光學共振器20,但還可以配置其他各種鏡片來構成折返光學共振器。在該情況下,光學共振器例如具有折線狀的光軸,沿著兩端的一對共振器鏡片之間的折線狀的光軸,雷射光束被封閉。光圈配置在光學共振器中被封閉的折線狀的雷射光束的路徑的任一位置即可。In the above-mentioned embodiment, the optical resonator 20 having a single linear optical axis 20A (FIG. 2) is constituted by a pair of resonator mirrors 25, but it is also possible to arrange other various mirrors to constitute a folded optical resonator. In this case, the optical resonator has, for example, a zigzag optical axis, and along the zigzagging optical axis between a pair of resonator mirror plates at both ends, the laser beam is confined. The aperture may be arranged at any position on the path of the zigzag-shaped laser beam closed in the optical resonator.

接著,參閱圖7,對基於其他實施例的雷射振盪器進行說明。以下,省略對基於圖1~圖6所示的實施例的雷射振盪器和共通的結構的說明。Next, a laser oscillator based on another embodiment will be described with reference to FIG. 7 . Hereinafter, a description of the laser oscillator and the common configuration based on the embodiments shown in FIGS. 1 to 6 will be omitted.

圖7係與基於本實施例的雷射振盪器的光軸20A垂直的剖視圖。光圈60的第1構件61被固定在共振器底座26上。第2構件62的2個零件62A、62B經由滑動機構65支撐於共振器底座26上。在第2構件62的2個零件62A、62B上分別連接有桿66A、66B。桿66A、66B分別從2個零件62A、62B沿第1方向D1延伸,通過腔室15的側壁而被引出到腔室15的外側。各個桿66A,66B通過腔室15的側壁之部位藉由包含O型環之密封結構67A、67B確保氣密性。FIG. 7 is a cross-sectional view perpendicular to the optical axis 20A of the laser oscillator according to this embodiment. The first member 61 of the aperture 60 is fixed to the resonator base 26 . The two parts 62A and 62B of the second member 62 are supported on the resonator base 26 via the slide mechanism 65 . Rods 66A, 66B are respectively connected to the two parts 62A, 62B of the second member 62 . The rods 66A, 66B extend from the two parts 62A, 62B in the first direction D1, respectively, and are drawn out of the chamber 15 through the side wall of the chamber 15 . The portion where each rod 66A, 66B passes through the side wall of the chamber 15 is ensured to be airtight by a sealing structure 67A, 67B comprising an O-ring.

若從腔室15外操作桿66A、66B並使其沿第1方向D1移動,則第2構件62的2個零件62A、62B沿第1方向D1移動。藉此,通過區域60A的縱橫比發生改變。桿66A、66B具有作為改變通過區域60A的縱橫比之縱橫比改變機構的功能。When the levers 66A, 66B are operated from outside the chamber 15 to move in the first direction D1, the two components 62A, 62B of the second member 62 move in the first direction D1. Thereby, the aspect ratio of the passing region 60A changes. The rods 66A, 66B function as an aspect ratio changing mechanism that changes the aspect ratio passing through the region 60A.

接著,對本實施例的優異效果進行說明。 在本實施例中,能夠從腔室15的外側經由桿66A、66B,使第2構件62的2個零件62A、62B沿第1方向D1移動。因此,能夠在使雷射振盪器12振盪的狀態下,一邊利用光束分析儀50(圖1)觀察光束剖面的形狀,一邊調節光圈60的通過區域60A的縱橫比。藉此,能夠容易地進行使光束剖面接近正圓的調節。Next, the excellent effect of this embodiment will be described. In this embodiment, the two components 62A, 62B of the second member 62 can be moved in the first direction D1 from the outside of the chamber 15 through the rods 66A, 66B. Therefore, the aspect ratio of the passage area 60A of the diaphragm 60 can be adjusted while observing the shape of the beam cross section with the beam profiler 50 ( FIG. 1 ) while the laser oscillator 12 is oscillating. This makes it possible to easily adjust the beam profile to approach a perfect circle.

接著,參閱圖8,進一步對基於其他實施例的雷射振盪器進行說明。以下,省略對基於圖1~圖6所示的實施例的雷射振盪器和共通的結構的說明。Next, referring to FIG. 8 , the laser oscillator based on other embodiments will be further described. Hereinafter, a description of the laser oscillator and the common configuration based on the embodiments shown in FIGS. 1 to 6 will be omitted.

圖8係基於本實施例的雷射振盪器中所使用的光圈60的立體圖。在圖1~圖6所示的實施例中,第2構件62(圖5A)沿第1方向D1被分割成兩部分。相對於此,在本實施例中,第1構件61及第2構件62均不分割。第2構件62與第1構件61同樣地,由設置有開口64之板材構成。第1構件61及第2構件62被支撐為能夠藉由滑動機構65沿第1方向D1獨立地移動。FIG. 8 is a perspective view of the aperture 60 used in the laser oscillator according to this embodiment. In the embodiment shown in FIGS. 1 to 6 , the second member 62 ( FIG. 5A ) is divided into two parts along the first direction D1. In contrast, in this embodiment, neither the first member 61 nor the second member 62 is divided. Like the first member 61, the second member 62 is formed of a plate material provided with an opening 64. As shown in FIG. The first member 61 and the second member 62 are supported so as to be independently movable in the first direction D1 by the slide mechanism 65 .

從正面觀察光圈60時,第1構件61的開口63與第2構件62的開口64重疊之區域與光圈60的通過區域60A一致。若改變第1構件61與第2構件62的第1方向D1的相對位置關係,則通過區域60A的第1方向D1的尺寸會發生改變。另外,通過區域60A的第2方向D2的尺寸亦會發生改變,但由於其改變量很小,因此通過區域60A的縱橫比發生改變。並且,若使第1構件61和第2構件62沿彼此相反方向移動相等距離,則在通過區域60A的中心位置被固定的狀態下,通過區域60A的第1方向的尺寸發生改變。When the aperture 60 is viewed from the front, the area where the opening 63 of the first member 61 and the opening 64 of the second member 62 overlap coincides with the passing area 60A of the aperture 60 . If the relative positional relationship between the first member 61 and the second member 62 in the first direction D1 is changed, the size of the passing region 60A in the first direction D1 will change. In addition, the size of the passing region 60A in the second direction D2 also changes, but since the amount of change is small, the aspect ratio of the passing region 60A changes. Furthermore, when the first member 61 and the second member 62 are moved in opposite directions by an equal distance, the size of the passing region 60A in the first direction changes while the central position of the passing region 60A is fixed.

接著,對本實施例的優異效果進行說明。 在本實施例中,藉由改變光圈60的通過區域60A的縱橫比,與圖1~圖6所示的實施例同樣地,即使改變脈衝的反覆頻率,光束剖面亦能夠維持大致正圓的狀態。Next, the excellent effect of this embodiment will be described. In this embodiment, by changing the aspect ratio of the passing region 60A of the aperture 60, similar to the embodiments shown in FIGS. 1 to 6, even if the repetition frequency of the pulse is changed, the beam profile can maintain a substantially circular state. .

上述各實施例為例示,能夠進行以不同的實施例來示出的結構的局部性地置換或組合是不言而喻的。關於基於多個實施例的相同結構的相同的作用效果,並不按照每個實施例依次提及。而且,本發明並不限於上述實施例。例如,能夠進行各種變更、改良、組合等對於本領域的技術人員來說是顯而易見的。The above-described embodiments are examples, and it goes without saying that partial replacement or combination of structures shown in different embodiments is possible. Regarding the same function and effect based on the same structure of multiple embodiments, it is not mentioned in sequence for each embodiment. Also, the present invention is not limited to the above-described embodiments. For example, it is obvious to those skilled in the art that various changes, improvements, combinations, etc. can be made.

11:架台 12:雷射振盪器 15:腔室 16:光學室 17:送風機室 18:上下分隔板 18A,18B:開口 19:底板 20:光學共振器 20A:光軸 20B:一對共振器鏡片之間的光被封閉的區域 21:放電電極 22:電極箱 23:電極支持構件 24:放電區域 25:共振器鏡片 26:共振器底座 27:光學共振器支援構件 28:透光窗 29:送風機 40:分隔板 41:第1氣體流路 42:第2氣體流路 43:熱交換器 44:整流板 45:支撐部位 50:光束分析儀 60:光圈 60A:通過區域 60B:遮光區域 61:第1構件 62:第2構件 62A,62B:第2構件的零件 63:第1構件的開口 64:第2構件的開口 65:滑動機構 66A,66B:桿 67A,67B:密封構造 70:光圈 80:加工裝置 81:光束整形光學系統 82:工作台 90:加工對象物 100:共通底座11: Stand 12:Laser oscillator 15: chamber 16: Optical room 17: Blower room 18: Upper and lower partitions 18A, 18B: opening 19: Bottom plate 20: Optical resonator 20A: optical axis 20B: Region where light is enclosed between a pair of resonator mirrors 21: Discharge electrode 22: Electrode box 23: electrode support member 24:Discharge area 25: Resonator lens 26: Resonator base 27: Optical resonator support member 28: Light-transmitting window 29: Blower 40: Partition board 41: 1st gas flow path 42: Second gas flow path 43: Heat exchanger 44: Rectifier board 45: Support part 50: Beam Analyzer 60: Aperture 60A: through the area 60B: shading area 61: 1st component 62: 2nd member 62A, 62B: Parts of the second member 63: Opening of the first member 64: Opening of the second member 65: sliding mechanism 66A, 66B: Rod 67A, 67B: sealed structure 70: Aperture 80: Processing device 81: Beam shaping optical system 82:Workbench 90: Object to be processed 100: common base

[圖1]係搭載有基於本實施例的雷射振盪器之雷射加工裝置的概略圖。 [圖2]係包括基於實施例的雷射振盪器的光軸之剖視圖。 [圖3]係與基於實施例的雷射振盪器的光軸垂直之剖視圖。 [圖4]係表示從正面觀察放電電極、電極箱及光圈時的位置關係之圖。 [圖5A]係光圈的立體圖,[圖5B及圖5C]係光圈的第1構件及第2構件的正面圖。 [圖6]係表示改變脈衝的反覆頻率,在從雷射振盪器的透光窗前進一定的光路長度的位置測量雷射光束的光束點(beam spot)的光束直徑的評價實驗的結果之圖表。 [圖7]係與基於另一實施例的雷射振盪器的光軸垂直之剖視圖。 [圖8]係基於又一實施例的雷射振盪器中所使用的光圈的立體圖。[ Fig. 1 ] is a schematic diagram of a laser processing apparatus equipped with a laser oscillator according to this embodiment. [ Fig. 2 ] is a cross-sectional view including an optical axis of a laser oscillator based on an embodiment. [ Fig. 3 ] is a cross-sectional view perpendicular to the optical axis of the laser oscillator according to the embodiment. [FIG. 4] It is a figure which shows the positional relationship of the discharge electrode, an electrode case, and an aperture seen from the front. [FIG. 5A] is a perspective view of the aperture, and [FIG. 5B and FIG. 5C] are front views of the first member and the second member of the aperture. [Fig. 6] is a graph showing the results of an evaluation experiment in which the beam diameter of the beam spot (beam spot) of the laser beam was measured at a position advancing a certain optical path length from the light transmission window of the laser oscillator while changing the repetition frequency of the pulse. . [ Fig. 7 ] is a cross-sectional view perpendicular to the optical axis of a laser oscillator according to another embodiment. [ Fig. 8 ] A perspective view of an aperture used in a laser oscillator according to yet another embodiment.

20A:光軸20A: optical axis

60:光圈60: Aperture

60A:通過區域60A: through the area

61:第1構件61: 1st component

62:第2構件62: 2nd member

62A:第2構件的零件62A: Parts of the second member

62B:第2構件的零件62B: Parts of the second member

63:第1構件的開口63: Opening of the first member

65:滑動機構65: sliding mechanism

Claims (8)

一種光圈,是配置在封入於光學共振器的雷射光束的路徑上的光圈,其特徵在於其劃分:封入於前述光學共振器的雷射光束所通過的通過區域;及配置在前述通過區域的周圍的遮光區域,且在與前述光學共振器的光軸正交的平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變,前述光圈其內側為曲線形狀。 A kind of aperture, is the aperture that is arranged on the path of the laser beam that is sealed in the optical resonator, is characterized in that it divides: the passage area that the laser beam that is enclosed in the aforementioned optical resonator passes through; And arranges in the aforementioned passing area The surrounding light-shielding area, and in the plane perpendicular to the optical axis of the aforementioned optical resonator, the aspect ratio as the ratio of the size of the aforementioned passing area in two directions orthogonal to each other is variable, and the inner side of the aforementioned aperture is curved shape. 如請求項1所述之光圈,其中,在與前述光學共振器的光軸正交的平面內,彼此正交的二個方向中的第1方向上之前述通過區域的尺寸為可變,與前述第1方向正交的第2方向上之前述通過區域的尺寸為固定。 The aperture according to claim 1, wherein, in a plane perpendicular to the optical axis of the optical resonator, the size of the passing region in the first direction of the two directions perpendicular to each other is variable, and The size of the passing area in the second direction perpendicular to the first direction is constant. 如請求項2所述之光圈,其中,包含:第1構件,其係設置有大小不變的開口;及第2構件,其構成係支撐為能夠相對於前述第1構件沿前述第1方向移動,並藉由沿前述第1方向移動而能夠將從前述第1構件的開口周緣進入到內側的一部分區域予以封閉,前述第1構件的開口中,未被前述第2構件封閉的區域成為前述通過區域。 The aperture according to Claim 2, which includes: a first member provided with an opening with a constant size; and a second member configured to be supported so as to be movable in the first direction relative to the first member , and by moving along the first direction, a part of the area entering from the opening periphery of the first member to the inner side can be closed. In the opening of the first member, the area that is not closed by the second member becomes the passage area. 如請求項3所述之光圈,其中,前述第2構件,是包含沿前述第1方向被分割的2個零 件;前述第2構件的2個零件,其構成是從前述第1方向的兩側,能夠將前述第1構件的開口的一部分予以封閉。 The aperture according to claim 3, wherein the second member includes two zeros divided along the first direction Components; the two parts of the aforementioned second member are configured to close part of the opening of the aforementioned first member from both sides in the aforementioned first direction. 一種雷射振盪器,係具有:光學共振器,其係封入雷射光束;及光圈,其係劃分:封入前述光學共振器之雷射光束所通過之通過區域;及配置於前述通過區域的周圍的遮光區域,且在與前述光學共振器的光軸正交之平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變;及腔室,其係容納前述光學共振器、前述光圈和雷射介質氣體;以及縱橫比改變機構,其係從前述腔室外操作前述光圈的前述通過區域的縱橫比來進行改變,前述光圈其內側為曲線形狀。 A laser oscillator has: an optical resonator, which seals a laser beam; and an aperture, which divides: a passing area through which the laser beam sealed in the aforementioned optical resonator passes; and is arranged around the aforementioned passing area and in a plane orthogonal to the optical axis of the aforementioned optical resonator, the aspect ratio, which is the ratio of the dimensions of the aforementioned passing area in two directions orthogonal to each other, is variable; and the cavity, which is The aforementioned optical resonator, the aforementioned aperture, and the laser medium gas are accommodated; and an aspect ratio changing mechanism is operated from outside the chamber to change the aspect ratio of the aforementioned passing area of the aforementioned aperture, and the inner side of the aforementioned aperture is in a curved shape. 如請求項5所述之雷射振盪器,其中,在與前述光學共振器的光軸正交的平面內彼此正交的二個方向中的第1方向上之前述通過區域的尺寸為可變,與前述第1方向正交的第2方向上之前述通過區域的尺寸為固定。 The laser oscillator according to claim 5, wherein the size of the passing region in the first direction among the two directions orthogonal to each other in the plane perpendicular to the optical axis of the optical resonator is variable , the size of the aforementioned passage area in the second direction perpendicular to the aforementioned first direction is constant. 如請求項6所述之雷射振盪器,其中,前述光圈,是包含:第1構件,其係設置有大小不變的開口;及第2構件,其構成係支撐為能夠相對於前述第1構件沿前述第1方向移動,並藉由沿前述第1方向移動而能夠將從 前述第1構件的開口周緣進入到內側的一部分區域予以封閉,前述縱橫比改變機構,是能夠使前述第2構件相對於前述第1構件沿前述第1方向移動。 The laser oscillator as described in Claim 6, wherein the aforementioned aperture includes: a first member, which is provided with an opening with a constant size; and a second member, which is configured to be supported relative to the first The member moves along the aforementioned first direction, and by moving along the aforementioned first direction, the A portion of the opening peripheral edge of the first member enters the inside and is closed, and the aspect ratio changing mechanism is capable of moving the second member relative to the first member in the first direction. 如請求項7所述之雷射振盪器,其中,前述第2構件,是包含沿前述第1方向被分割的2個零件;前述第2構件的2個零件,其構成是從前述第1方向的兩側,能夠將前述第1構件的開口予以封閉,前述縱橫比改變機構,其構成是使前述第2構件的2個零件能夠分別沿前述第1方向移動。 The laser oscillator according to claim 7, wherein the second member includes two parts divided along the first direction; the two parts of the second member are formed from the first direction Both sides of the aforementioned first member can close the opening of the aforementioned first member, and the aforementioned aspect ratio changing mechanism is configured so that the two parts of the aforementioned second member can respectively move along the aforementioned first direction.
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