TWI781658B - Aperture and Laser Oscillators - Google Patents
Aperture and Laser Oscillators Download PDFInfo
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- TWI781658B TWI781658B TW110122541A TW110122541A TWI781658B TW I781658 B TWI781658 B TW I781658B TW 110122541 A TW110122541 A TW 110122541A TW 110122541 A TW110122541 A TW 110122541A TW I781658 B TWI781658 B TW I781658B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
- H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
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Abstract
[課題]提供一種能夠抑制光束剖面從正圓變形的光學共振器用的光圈。 [解決手段]在封閉到光學共振器的雷射光束的路徑配置光圈。該光圈劃分封閉到光學共振器的雷射光束所通過之通過區域及配置於通過區域的周圍之遮光區域。作為在與光學共振器的光軸正交之平面內彼此正交之二個方向的通過區域的尺寸之比的縱橫比是可變的。[Problem] To provide an aperture for an optical resonator capable of suppressing deformation of a beam profile from a perfect circle. [Solution] Arrange an aperture in the path of the laser beam closed to the optical resonator. The aperture divides a passage area through which the laser beam closed to the optical resonator passes, and a light-shielding area arranged around the passage area. The aspect ratio, which is the ratio of the sizes of the pass regions in two directions orthogonal to each other in a plane orthogonal to the optical axis of the optical resonator, is variable.
Description
本發明關於一種配置在光學共振器內的光圈及搭載有光圈之雷射振盪器。 本申請案係基於2020年7月10日申請的日本專利申請第2020-119131號主張優先權。該日本申請案的全部內容係藉由參閱而援用於本說明書中。The present invention relates to an aperture arranged in an optical resonator and a laser oscillator equipped with the aperture. This application claims priority based on Japanese Patent Application No. 2020-119131 filed on July 10, 2020. The entire content of this Japanese application is incorporated by reference in this specification.
雷射振盪器包括由前鏡片及後鏡片構成之光學共振器及放電電極等激勵機構。通常,在光學共振器的光軸上配置前光圈、後光圈或這兩者。藉由配置光圈,能夠將光束剖面整形成正圓,抑制束散角及抑制寄生振盪。為了輸出圓形的光束剖面的雷射光束,作為光圈,使用設置有正圓的開口的金屬板(例如,參閱下述的專利文獻1。)。
[先前技術文獻]The laser oscillator includes an optical resonator composed of a front lens and a rear lens, and an excitation mechanism such as a discharge electrode. Usually, a front aperture, a rear aperture, or both are arranged on the optical axis of the optical resonator. By configuring the aperture, the beam profile can be shaped into a perfect circle, and the beam divergence angle and parasitic oscillation can be suppressed. In order to output a laser beam with a circular beam profile, a metal plate provided with a perfect circular opening is used as an aperture (see, for example,
[專利文獻1]日本特開昭61-276387號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 61-276387
[發明所欲解決之問題][Problem to be solved by the invention]
即使使用具有正圓的開口的光圈對光束剖面進行整形,從雷射振盪器輸出的雷射光束的光束剖面的形狀亦有時從正圓崩塌,而成為橢圓狀。Even if the beam profile is shaped by using an aperture having a perfect circular opening, the shape of the beam profile of the laser beam output from the laser oscillator may collapse from a perfect circle to an elliptical shape.
本發明的目的在於提供一種,能夠抑制光束剖面的、從正圓的崩塌之光圈。本發明的另一目的在於提供一種,能夠抑制光束剖面從正圓變形之雷射振盪器。 [解決問題之技術手段]An object of the present invention is to provide an aperture capable of suppressing the collapse of a beam profile from a perfect circle. Another object of the present invention is to provide a laser oscillator capable of suppressing the deformation of the beam profile from a perfect circle. [Technical means to solve the problem]
根據本發明的一觀點,提供一種光圈,是配置在封入於光學共振器的雷射光束的路徑上之光圈, 前述光圈劃分:封入於前述光學共振器之雷射光束所通過之通過區域;及配置在前述通過區域的周圍之遮光區域,且在與前述光學共振器的光軸正交之平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變。According to an aspect of the present invention, there is provided an aperture, which is arranged on the path of a laser beam enclosed in an optical resonator, The aforementioned aperture is divided into: the passing area through which the laser beam enclosed in the aforementioned optical resonator passes; and the light-shielding area arranged around the aforementioned passing area, and in a plane perpendicular to the optical axis of the aforementioned optical resonator, as each other The aspect ratio of the ratio of the dimensions of the aforementioned passing regions in the two orthogonal directions is variable.
根據本發明的另一觀點,提供一種雷射振盪器,係具有: 光學共振器,其係封入雷射光束;及 光圈,其係劃分:封入前述光學共振器之雷射光束所通過之通過區域;及配置於前述通過區域的周圍之遮光區域,且在與前述光學共振器的光軸正交之平面內,作為彼此正交的二個方向上之前述通過區域的尺寸之比的縱橫比為可變;及 腔室,其係容納前述光學共振器、前述光圈和雷射介質氣體;以及 縱橫比改變機構,其係從前述腔室外操作前述光圈的前述通過區域的縱橫比來進行改變。 [發明之效果]According to another aspect of the present invention, a laser oscillator is provided, which has: an optical resonator that encloses a laser beam; and The aperture, which is divided into: the passing area through which the laser beam enclosed in the aforementioned optical resonator passes; and the light-shielding area arranged around the aforementioned passing area, and in a plane perpendicular to the optical axis of the aforementioned optical resonator, as the aspect ratio of the ratio of the dimensions of the aforesaid passing areas in two directions orthogonal to each other is variable; and a chamber containing the aforementioned optical resonator, the aforementioned aperture, and the laser medium gas; and The aspect ratio changing mechanism changes the aspect ratio of the passing area of the aperture by operating from outside the chamber. [Effect of Invention]
藉由改變光圈的通過區域的縱橫比,能夠調節光束剖面的形狀,抑制從正圓的變形。By changing the aspect ratio of the passing area of the aperture, it is possible to adjust the shape of the beam profile and suppress distortion from a perfect circle.
參閱圖1~圖6,對基於一實施例的雷射振盪器進行說明。
圖1係搭載有基於本實施例的雷射振盪器之雷射加工裝置的概略圖。雷射加工裝置包括雷射振盪器12及加工裝置80。Referring to FIGS. 1 to 6 , a laser oscillator according to an embodiment will be described.
FIG. 1 is a schematic diagram of a laser processing apparatus equipped with a laser oscillator according to this embodiment. The laser processing device includes a
雷射振盪器12被支撐在架台11上,架台11被固定在共通底座100上。加工裝置80包括光束整形光學系統81及工作台82。加工對象物90保持在工作台82上。光束整形光學系統81及工作台82被固定在共通底座100上。能夠在雷射振盪器12與光束整形光學系統81之間的雷射光束的路徑配置光束分析儀50。雷射加工中,光束分析儀50從雷射光束的路徑退避。共通底座100例如為地板。The
雷射振盪器12輸出脈衝雷射光束。作為雷射振盪器12,例如使用二氧化碳雷射振盪器。另外,作為雷射振盪器12,亦可以使用其他的氣體雷射振盪器,例如準分子雷射振盪器。從雷射振盪器12輸出的脈衝雷射光束藉由光束整形光學系統81對光束輪廓進行整形,入射到加工對象物90。The
圖2係包括基於實施例的雷射振盪器12的光軸的剖視圖。雷射振盪器12包括收納雷射介質氣體及光學共振器20等之腔室15。腔室15的內部空間區分為位於相對上側的光學室16和位於相對下側的送風機室17。光學室16和送風機室17被上下分隔板18隔開。另外,在上下分隔板18上設置有使雷射介質氣體在光學室16與送風機室17之間流通的開口。光學室16的底板19從送風機室17的側壁,沿光學共振器20的光軸20A的方向伸出,光學室16的光軸方向的長度比送風機室17的光軸方向的長度長。FIG. 2 is a cross-sectional view including an optical axis of the
腔室15的底板19利用4個支撐部位45支撐於架台11(圖1)上。在俯視觀察時,4個支撐部位45配置於與長方形的4個頂點相對應的位置。The
在光學室16內配置有一對放電電極21及一對共振器鏡片25。一對放電電極21分別被固定在電極箱22上。一對電極箱22經由多個電極支撐構件23支撐於底板19。一對放電電極21在上下方向上隔著間隔配置,從而放電區域24被劃分在兩者之間。放電電極21在放電區域24產生放電,藉此激勵雷射介質氣體。一對共振器鏡片25構成具有通過放電區域24的光軸20A之光學共振器20。如在後面參閱圖3進行說明的那樣,雷射介質氣體沿與圖2的紙面垂直的方向流過放電區域24。A pair of
一對共振器鏡片25固定於配置於光學室16內之共通的共振器底座26上。共振器底座26為在光軸20A的方向上長的板狀的構件,經由多個光學共振器支撐構件27支撐於底板19。A pair of
在放電區域24產生的光在一對共振器鏡片25之間反覆反射,在一對共振器鏡片25之間的區域20B中產生與共振器鏡片25之間的光路長度相對應的波長的駐波。如此,雷射光束被封入一對共振器鏡片25之間的區域20B。被封入光學共振器20之雷射光束的一部分,透過其中一個共振器鏡片25(在圖2中,為左側的共振器鏡片25)輸出到外部。在被封入到光學共振器20的雷射光束的路徑上配置有2個光圈60、70。光圈60、70支撐於共振器底座26。2個光圈60、70配置於沿光軸20A的方向隔著放電區域24的位置。The light generated in the
在使光學共振器20的光軸20A沿一個方向(在圖1中,為左方向)延伸的延長線與光學室16的壁面的交叉部位,安裝有使雷射光束透過的透光窗28。在光學共振器20內被激勵的雷射光束透過透光窗28向外部放射。有時將配置於透光窗28側的光圈60稱為前光圈,將另一光圈70稱為後光圈。A
在送風機室17中配置有送風機29。送風機29使雷射介質氣體在光學室16與送風機室17之間循環。A
圖3係與基於實施例的雷射振盪器12的光軸20A(圖2)垂直的剖視圖。如參閱圖2進行說明的那樣,腔室15的內部空間藉由上下分隔板18被區分為上方的光學室16與下方的送風機室17。在光學室16內配置有一對放電電極21及共振器底座26。一對放電電極21分別被固定在電極箱22上。電極箱22藉由多個電極支撐構件23支撐於腔室15的底板19(圖2)。在一對放電電極21之間劃分放電區域24。共振器底座26藉由多個光學共振器支撐構件27支撐於腔室15的底板19(圖2)。由於電極支撐構件23及光學共振器支撐構件27配置於從圖3所示的剖面挪移的位置,因此在圖3中,以虛線表示電極支撐構件23及光學共振器支撐構件27。FIG. 3 is a cross-sectional view perpendicular to the
在光學室16內配置有分隔板40。分隔板40劃分從設置於上下分隔板18之開口18A至放電區域24為止的第1氣體流路41,與從放電區域24至設置於上下分隔板18之其他開口18B為止的第2氣體流路42。雷射介質氣體沿與光軸20A(圖2)正交的方向流過放電區域24。放電方向與雷射介質氣體流過的方向及光軸20A這兩者正交。藉由送風機室17、第1氣體流路41、放電區域24及第2氣體流路42形成雷射介質氣體循環的循環路徑。送風機29產生箭頭所示之雷射介質氣體的流動,以使雷射介質氣體在該循環路徑中循環。A
在送風機室17內的循環路徑收納有熱交換器43。在放電區域24被加熱的雷射介質氣體藉由通過熱交換器43而被冷卻,被冷卻的雷射介質氣體再次被供給到放電區域24。A
圖4係表示從正面觀察放電電極21、電極箱22及光圈60時之位置關係之圖。在圖4中,在電極箱22上標註有陰影線。上下方向相對置的一對放電電極21被分別固定在電極箱22上。藉由安裝於電極箱22之分隔板40,劃分雷射介質氣體的第1氣體流路41及第2氣體流路42。另外,圖3示意性地表示分隔板40,圖4所示的分隔板40的形狀與圖3中示意性地表示的分隔板40的形狀不同。FIG. 4 is a diagram showing the positional relationship of the
雷射介質氣體從第1氣體流路41經由一對電極箱22之間的空間流向第2氣體流路42。在圖4中,用箭頭表示雷射介質氣體流。一對電極箱22之間的空間中包含放電區域24。在雷射介質氣體向一對電極箱22之間的空間的流入端配置有整流板44。The laser medium gas flows from the first
在與放電區域24重疊的位置配置有光圈60。從正面觀察時,光圈60包括雷射光束通過之通過區域60A及配置在其周圍之遮光區域60B。從正面觀察,通過區域60A包含在放電區域24。在與光學共振器20的光軸20A(圖2)正交之平面內彼此正交的二個方向的、通過區域60A的尺寸之比是可變的。另外,另一個光圈70(圖2)的通過區域為正圓,其大小不變。A
例如,將雷射介質氣體流過之方向(在圖4中,為橫向)定義為第1方向D1,將一對放電電極21所隔著之方向(在圖4中,為縱向)定義為第2方向D2。通過區域60A的第1方向D1的尺寸是可變的,第2方向D2的尺寸被固定。若通過區域60A的第1方向D1的尺寸發生改變,則通過區域60A的第1方向D1的尺寸與第2方向D2的尺寸之比(以下,稱為縱橫比。)發生改變。在圖4中,以虛線表示第1方向D1的尺寸相對於以實線表示之通過區域60A變小的通過區域60A。For example, the direction in which the laser medium gas flows (in FIG. 4, the horizontal direction) is defined as the first direction D1, and the direction in which the pair of
接著,參閱圖5A~圖5C,對光圈60的結構進行說明。
圖5A為光圈60的立體圖。光圈60包括第1構件61及第2構件62。第2構件62包括2個零件62A、62B。第1構件61為相對於光學共振器20(圖2)的光軸20A垂直配置之板材(例如金屬板),在該板材上,設置有與雷射光束的路徑重疊的開口63。開口63的大小是不變的。Next, the structure of the
關於第2構件62的2個零件62A、62B,從正面觀察時,配置於沿第1方向D1隔著光軸20A的位置。2個零件62A、62B的每一個為相對於光軸20A垂直配置的板材。2個零件62A、62B的彼此相對置的周緣朝向內側,以凹陷的方式彎曲。The two
第2構件62的2個零件62A、62B被支撐為能夠藉由滑動機構65沿第1方向D1移動。滑動機構65的引導面固定在共振器底座26(圖2)上。2個零件62A、62B能夠沿第1方向D1獨立地移動。若使2個零件62A、62B沿第1方向D1移動,則從正面觀察時,第1構件61的開口63與2個零件62A、62B的相對位置關係發生改變。若從2個零件62A、62B不與開口63重疊的狀態,使2個零件62A、62B朝向接近光軸20A的方向移動,則2個零件62A、62B與開口63的一部分重疊,從第1方向D1的兩側封閉開口63的一部分。例如,2個零件62A、62B封閉從開口63的周緣進入到內側的區域。開口63的被封閉的區域的面積藉由使第2構件62的2個零件62A、62B移動而發生改變。The two
圖5B及圖5C係第1構件61及第2構件62的正面圖。圖5B表示第2構件62的2個零件62A、62B沒有與第1構件61的開口63重疊的狀態。在該情況下,第1構件61的開口63與光圈60的通過區域60A一致。5B and 5C are front views of the
圖5C表示第2構件62的2個零件62A、62B與第1構件61的開口63的一部分重疊的狀態。開口63中的不與第2構件62重疊的區域與光圈60的通過區域60A一致。藉由第2構件62的2個零件62A、62B封閉開口63的一部分,通過區域60A的第1方向D1的尺寸變小。通過區域60A的第2方向D2的尺寸與開口63的第2方向D2的尺寸相同,是不變的。FIG. 5C shows a state where two
接著,對上述實施例的優異的效果進行說明。 當進行使從雷射振盪器輸出的脈衝雷射光束入射到加工對象物來形成多個孔的加工的情況下,在應形成孔的多個位置依次入射脈衝雷射光束。若從之前剛加工的孔到下一個應加工的孔為止的距離變長,則脈衝雷射光束的入射位置的移動距離變長,因而從之前剛發射(shot)到下一發射為止的時間可能變長。因此,受到應形成的孔之分布的影響,脈衝的反覆頻率發生變動。為了使形成的孔的形狀均勻,即使脈衝的反覆頻率發生變動,光束點的形狀以不變為佳。Next, the excellent effect of the above-mentioned embodiment will be described. When performing processing in which a pulsed laser beam output from a laser oscillator is incident on an object to form a plurality of holes, the pulsed laser beam is sequentially incident on a plurality of positions where holes are to be formed. If the distance from the previously processed hole to the next hole to be processed becomes longer, the moving distance of the incident position of the pulsed laser beam becomes longer, so the time from the previous shot to the next shot may be longer. lengthen. Therefore, the frequency of repetition of the pulses varies under the influence of the distribution of holes to be formed. In order to make the shape of the formed hole uniform, it is better to keep the shape of the beam spot unchanged even if the repetition frequency of the pulse changes.
本發明的發明人等進行了如下評價實驗,改變雷射振盪器12的脈衝的反覆頻率,在從雷射振盪器12的透光窗28(圖2)前進了一定的光路長度的位置,觀測雷射光束的光束點的形狀。在評價實驗中,將光圈60的通過區域60A設為正圓。The inventors of the present invention conducted the following evaluation experiments, changing the repetition frequency of the pulse of the
圖6係表示評價實驗的結果的圖表。橫軸以單位“kHz”表示脈衝的反覆頻率,縱軸以相對值表示第1方向D1及第2方向D2的光束點的尺寸。圖表中的圓形標記及三角形標記分別表示第1方向D1的尺寸及第2方向D2尺寸。當脈衝的反覆頻率是任意值的情況下,光束剖面的第1方向D1的尺寸大於第2方向D2的尺寸。藉此,即使使用通過區域為正圓的光圈60、70,光束剖面亦不會變正圓,而會變橫長。這是因為受到雷射介質氣體流和放電的空間的不均勻性的影響,在第1方向D1和第2方向D2上振盪的狀況不同。Fig. 6 is a graph showing the results of evaluation experiments. The horizontal axis represents the repetition frequency of pulses in the unit "kHz", and the vertical axis represents the beam spot sizes in the first direction D1 and the second direction D2 in relative values. The circular mark and the triangular mark in the graph represent the dimension in the first direction D1 and the dimension in the second direction D2, respectively. When the pulse repetition frequency is an arbitrary value, the size of the beam cross section in the first direction D1 is larger than the size in the second direction D2. Thereby, even if the
若使脈衝的反覆頻率下降,則光束剖面的尺寸變大。但是,第1方向D1的尺寸的增加量大於第2方向D2的尺寸的增加量。這是因為,雷射介質氣體流的方向(第1方向D1)上的放電狀態的不均勻性與第2方向D2上放電狀態的不均勻性相比,更大地受到脈衝的反覆頻率的改變的影響。若使脈衝的反覆頻率降低,則光束剖面的形狀從正圓的變形變大。When the repetition frequency of the pulse is decreased, the size of the beam profile becomes larger. However, the increase in size in the first direction D1 is larger than the increase in size in the second direction D2. This is because the non-uniformity of the discharge state in the direction of the gas flow of the laser medium (the first direction D1) is more affected by the change in the repetition frequency of the pulse than the non-uniformity of the discharge state in the second direction D2. influences. When the repetition frequency of the pulse is lowered, the shape of the beam cross-section becomes more deformed from a perfect circle.
在本實施例中,藉由改變光圈60的通過區域60A的第1方向D1的尺寸,能夠使光束剖面的形狀接近正圓。例如,當使脈衝的反覆頻率下降而光束剖面沿第1方向D1變長時,減小通過區域60A的第1方向D1的尺寸即可。In this embodiment, by changing the size of the passing
藉由根據脈衝的反覆頻率調節通過區域60A的縱橫比,即使改變脈衝的反覆頻率,亦能夠維持光束剖面大致正圓的狀態。By adjusting the aspect ratio of the passing
而且,在本實施例中,由於從第1方向D1的兩側封閉第1構件61的開口63(圖5A)的一部分,因此即使改變通過區域60A的第1方向D1的尺寸,通過區域60A的幾何學的中心位置亦不移動。因此,即使改變通過區域60A的第1方向D1的尺寸,亦不會產生雷射光束的中心軸的挪移。Moreover, in this embodiment, since part of the opening 63 (FIG. 5A) of the
接著,對上述實施例的變形例進行說明。
在上述實施例中,將前側的光圈60(圖2)的通過區域60A(圖4)的縱橫比設為可變,但亦可以將後側的光圈70的通過區域的縱橫比設為可變。而且,亦可以將2個光圈60、70的通過區域的縱橫比設為可變。Next, modifications of the above-described embodiment will be described.
In the above-mentioned embodiment, the aspect ratio of the
在上述實施例中,將光圈60的通過區域60A的第2方向D2的尺寸設為固定,將第1方向D1的尺寸設為可變,但亦可以將第1方向D1的尺寸設為固定,將第2方向D2的尺寸設為可變。在該情況下,將設置在第1構件61的開口63(圖5A)設為沿第2方向D2的長橢圓形,第2構件62由沿第2方向被分割的2個構件構成即可。由於使脈衝的反覆頻率下降,因此增加通過區域60A的第2方向D2的尺寸即可。藉此,能夠減少從光束剖面的正圓的變形。In the above-mentioned embodiment, the size of the second direction D2 of the
並且,亦可以將通過區域60A的第1方向D1的尺寸和第2方向D2的尺寸這兩者設為可變。藉此,能夠提高光束剖面的形狀的調節自由度。In addition, both the size of the first direction D1 and the size of the second direction D2 passing through the
在上述實施例中,由一對共振器鏡片25構成具有1根直線狀的光軸20A(圖2)之光學共振器20,但還可以配置其他各種鏡片來構成折返光學共振器。在該情況下,光學共振器例如具有折線狀的光軸,沿著兩端的一對共振器鏡片之間的折線狀的光軸,雷射光束被封閉。光圈配置在光學共振器中被封閉的折線狀的雷射光束的路徑的任一位置即可。In the above-mentioned embodiment, the
接著,參閱圖7,對基於其他實施例的雷射振盪器進行說明。以下,省略對基於圖1~圖6所示的實施例的雷射振盪器和共通的結構的說明。Next, a laser oscillator based on another embodiment will be described with reference to FIG. 7 . Hereinafter, a description of the laser oscillator and the common configuration based on the embodiments shown in FIGS. 1 to 6 will be omitted.
圖7係與基於本實施例的雷射振盪器的光軸20A垂直的剖視圖。光圈60的第1構件61被固定在共振器底座26上。第2構件62的2個零件62A、62B經由滑動機構65支撐於共振器底座26上。在第2構件62的2個零件62A、62B上分別連接有桿66A、66B。桿66A、66B分別從2個零件62A、62B沿第1方向D1延伸,通過腔室15的側壁而被引出到腔室15的外側。各個桿66A,66B通過腔室15的側壁之部位藉由包含O型環之密封結構67A、67B確保氣密性。FIG. 7 is a cross-sectional view perpendicular to the
若從腔室15外操作桿66A、66B並使其沿第1方向D1移動,則第2構件62的2個零件62A、62B沿第1方向D1移動。藉此,通過區域60A的縱橫比發生改變。桿66A、66B具有作為改變通過區域60A的縱橫比之縱橫比改變機構的功能。When the
接著,對本實施例的優異效果進行說明。
在本實施例中,能夠從腔室15的外側經由桿66A、66B,使第2構件62的2個零件62A、62B沿第1方向D1移動。因此,能夠在使雷射振盪器12振盪的狀態下,一邊利用光束分析儀50(圖1)觀察光束剖面的形狀,一邊調節光圈60的通過區域60A的縱橫比。藉此,能夠容易地進行使光束剖面接近正圓的調節。Next, the excellent effect of this embodiment will be described.
In this embodiment, the two
接著,參閱圖8,進一步對基於其他實施例的雷射振盪器進行說明。以下,省略對基於圖1~圖6所示的實施例的雷射振盪器和共通的結構的說明。Next, referring to FIG. 8 , the laser oscillator based on other embodiments will be further described. Hereinafter, a description of the laser oscillator and the common configuration based on the embodiments shown in FIGS. 1 to 6 will be omitted.
圖8係基於本實施例的雷射振盪器中所使用的光圈60的立體圖。在圖1~圖6所示的實施例中,第2構件62(圖5A)沿第1方向D1被分割成兩部分。相對於此,在本實施例中,第1構件61及第2構件62均不分割。第2構件62與第1構件61同樣地,由設置有開口64之板材構成。第1構件61及第2構件62被支撐為能夠藉由滑動機構65沿第1方向D1獨立地移動。FIG. 8 is a perspective view of the
從正面觀察光圈60時,第1構件61的開口63與第2構件62的開口64重疊之區域與光圈60的通過區域60A一致。若改變第1構件61與第2構件62的第1方向D1的相對位置關係,則通過區域60A的第1方向D1的尺寸會發生改變。另外,通過區域60A的第2方向D2的尺寸亦會發生改變,但由於其改變量很小,因此通過區域60A的縱橫比發生改變。並且,若使第1構件61和第2構件62沿彼此相反方向移動相等距離,則在通過區域60A的中心位置被固定的狀態下,通過區域60A的第1方向的尺寸發生改變。When the
接著,對本實施例的優異效果進行說明。
在本實施例中,藉由改變光圈60的通過區域60A的縱橫比,與圖1~圖6所示的實施例同樣地,即使改變脈衝的反覆頻率,光束剖面亦能夠維持大致正圓的狀態。Next, the excellent effect of this embodiment will be described.
In this embodiment, by changing the aspect ratio of the passing
上述各實施例為例示,能夠進行以不同的實施例來示出的結構的局部性地置換或組合是不言而喻的。關於基於多個實施例的相同結構的相同的作用效果,並不按照每個實施例依次提及。而且,本發明並不限於上述實施例。例如,能夠進行各種變更、改良、組合等對於本領域的技術人員來說是顯而易見的。The above-described embodiments are examples, and it goes without saying that partial replacement or combination of structures shown in different embodiments is possible. Regarding the same function and effect based on the same structure of multiple embodiments, it is not mentioned in sequence for each embodiment. Also, the present invention is not limited to the above-described embodiments. For example, it is obvious to those skilled in the art that various changes, improvements, combinations, etc. can be made.
11:架台
12:雷射振盪器
15:腔室
16:光學室
17:送風機室
18:上下分隔板
18A,18B:開口
19:底板
20:光學共振器
20A:光軸
20B:一對共振器鏡片之間的光被封閉的區域
21:放電電極
22:電極箱
23:電極支持構件
24:放電區域
25:共振器鏡片
26:共振器底座
27:光學共振器支援構件
28:透光窗
29:送風機
40:分隔板
41:第1氣體流路
42:第2氣體流路
43:熱交換器
44:整流板
45:支撐部位
50:光束分析儀
60:光圈
60A:通過區域
60B:遮光區域
61:第1構件
62:第2構件
62A,62B:第2構件的零件
63:第1構件的開口
64:第2構件的開口
65:滑動機構
66A,66B:桿
67A,67B:密封構造
70:光圈
80:加工裝置
81:光束整形光學系統
82:工作台
90:加工對象物
100:共通底座11: Stand
12:Laser oscillator
15: chamber
16: Optical room
17: Blower room
18: Upper and
[圖1]係搭載有基於本實施例的雷射振盪器之雷射加工裝置的概略圖。 [圖2]係包括基於實施例的雷射振盪器的光軸之剖視圖。 [圖3]係與基於實施例的雷射振盪器的光軸垂直之剖視圖。 [圖4]係表示從正面觀察放電電極、電極箱及光圈時的位置關係之圖。 [圖5A]係光圈的立體圖,[圖5B及圖5C]係光圈的第1構件及第2構件的正面圖。 [圖6]係表示改變脈衝的反覆頻率,在從雷射振盪器的透光窗前進一定的光路長度的位置測量雷射光束的光束點(beam spot)的光束直徑的評價實驗的結果之圖表。 [圖7]係與基於另一實施例的雷射振盪器的光軸垂直之剖視圖。 [圖8]係基於又一實施例的雷射振盪器中所使用的光圈的立體圖。[ Fig. 1 ] is a schematic diagram of a laser processing apparatus equipped with a laser oscillator according to this embodiment. [ Fig. 2 ] is a cross-sectional view including an optical axis of a laser oscillator based on an embodiment. [ Fig. 3 ] is a cross-sectional view perpendicular to the optical axis of the laser oscillator according to the embodiment. [FIG. 4] It is a figure which shows the positional relationship of the discharge electrode, an electrode case, and an aperture seen from the front. [FIG. 5A] is a perspective view of the aperture, and [FIG. 5B and FIG. 5C] are front views of the first member and the second member of the aperture. [Fig. 6] is a graph showing the results of an evaluation experiment in which the beam diameter of the beam spot (beam spot) of the laser beam was measured at a position advancing a certain optical path length from the light transmission window of the laser oscillator while changing the repetition frequency of the pulse. . [ Fig. 7 ] is a cross-sectional view perpendicular to the optical axis of a laser oscillator according to another embodiment. [ Fig. 8 ] A perspective view of an aperture used in a laser oscillator according to yet another embodiment.
20A:光軸20A: optical axis
60:光圈60: Aperture
60A:通過區域60A: through the area
61:第1構件61: 1st component
62:第2構件62: 2nd member
62A:第2構件的零件62A: Parts of the second member
62B:第2構件的零件62B: Parts of the second member
63:第1構件的開口63: Opening of the first member
65:滑動機構65: sliding mechanism
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JPS61276387A (en) * | 1985-05-31 | 1986-12-06 | Komatsu Ltd | Gas laser apparatus |
US5069527A (en) * | 1990-04-26 | 1991-12-03 | Coherent, Inc. | Apparatus for measuring the mode quality of a laser beam |
US20110043899A1 (en) * | 2009-08-20 | 2011-02-24 | Lawrence Livermore National Security, Llc | Spatial filters for high average power lasers |
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CN113922197A (en) | 2022-01-11 |
TW202203529A (en) | 2022-01-16 |
KR20220007512A (en) | 2022-01-18 |
JP2022015941A (en) | 2022-01-21 |
CN113922197B (en) | 2024-05-28 |
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