TWI754854B - Optical resonator - Google Patents

Optical resonator Download PDF

Info

Publication number
TWI754854B
TWI754854B TW108140195A TW108140195A TWI754854B TW I754854 B TWI754854 B TW I754854B TW 108140195 A TW108140195 A TW 108140195A TW 108140195 A TW108140195 A TW 108140195A TW I754854 B TWI754854 B TW I754854B
Authority
TW
Taiwan
Prior art keywords
mirror
optical resonator
optical
front mirror
light
Prior art date
Application number
TW108140195A
Other languages
Chinese (zh)
Other versions
TW202025584A (en
Inventor
田中研太
河村譲一
萬雅史
岡田康弘
Original Assignee
日商住友重機械工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友重機械工業股份有限公司 filed Critical 日商住友重機械工業股份有限公司
Publication of TW202025584A publication Critical patent/TW202025584A/en
Application granted granted Critical
Publication of TWI754854B publication Critical patent/TWI754854B/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

本發明提供一種光共振器，其即使使前鏡的朝向外側之面傾斜，並將屋頂鏡用於後鏡，亦能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。光共振器具有前鏡及後鏡，並使光通過激勵雷射氣體之放電區域而往返。前鏡的朝向外側之面相對於與光共振器的光軸垂直之假想平面傾斜。後鏡具有處於彼此交叉之位置關係之平面狀的2個反射區域。分別包括後鏡的2個反射區域之2個假想平面的交線與前鏡的朝向外側之面的傾斜方向偏離正交的關係。The present invention provides an optical resonator capable of suppressing unnecessary oscillation caused by the outside facing surface of the front mirror even if the outside facing surface of the front mirror is inclined and a roof mirror is used for the rear mirror. The optical resonator has a front mirror and a rear mirror, and makes the light reciprocate through the discharge region of the excited laser gas. The outer-facing surface of the front mirror is inclined with respect to an imaginary plane perpendicular to the optical axis of the optical resonator. The rear mirror has two planar reflection areas in a positional relationship crossing each other. The intersection of the two imaginary planes including the two reflection areas of the rear mirror, respectively, and the inclination direction of the outer surface of the front mirror are deviated from the orthogonal relationship.

Description

光共振器Optical resonator

本發明係有關一種光共振器。 The present invention relates to an optical resonator.

已知有一種光共振器，其藉由使光共振器的前鏡的朝向外側之表面相對於光共振器的光軸傾斜，抑制由朝向外側之表面上的反射引起之不必要的諧振(例如，下述專利文獻1的[0054]段)。又，已知有一種光共振器，其為了抑制高階橫向模態的產生而提高模態穩定性，作為光共振器的後鏡，使用包括彼此正交之2個反射面之屋頂鏡。 There is known an optical resonator that suppresses unnecessary resonance caused by reflection on the outer-facing surface by inclining the outer-facing surface of the front mirror of the optical resonator with respect to the optical axis of the optical resonator (such as , paragraph [0054] of the following Patent Document 1). In addition, there is known an optical resonator in which, in order to suppress the generation of high-order transverse modes and improve modal stability, a roof mirror including two reflecting surfaces orthogonal to each other is used as a rear mirror of the optical resonator.

(先前技術文獻) (prior art literature) (專利文獻) (patent literature)

專利文獻1：國際公開第2014/046161號公報 Patent Document 1: International Publication No. 2014/046161

當後鏡為平面鏡時，若前鏡的朝向外側之面傾斜，則往返於前鏡的朝向外側之面與後鏡之間的光以較少的往返次數被配置於光共振器內之光圈遮蔽。因此，被封閉到前鏡的朝向外側之面與後鏡之間之光不會成長至雷射光。 When the rear mirror is a flat mirror, if the outer surface of the front mirror is inclined, the light traveling between the outer surface of the front mirror and the rear mirror will be blocked by the aperture arranged in the optical resonator with a small number of round trips. . Therefore, the light enclosed between the outer-facing surface of the front mirror and the rear mirror does not grow to the laser light.

然而，當將屋頂鏡用作後鏡時，與使用平面鏡時相比，有時往返於前鏡的朝向外側之面與後鏡之間的次數會增加。若往返次數增加，則除了本來待振盪之雷射光束之外，有時沿著相對於光共振器的光軸傾斜之方向傳播之光 成長至雷射光。沿著相對於光軸傾斜之方向傳播之雷射光束會影響本來待振盪之雷射光束的橫剖面上之強度分布(橫向模態)。 However, when a roof mirror is used as a rear mirror, the number of times of going back and forth between the outside facing surface of the front mirror and the rear mirror is sometimes increased compared to when a flat mirror is used. If the number of round trips increases, in addition to the laser beam to be oscillated originally, there may be cases where light propagating in a direction inclined with respect to the optical axis of the optical resonator Grow into laser light. A laser beam propagating in a direction inclined with respect to the optical axis affects the intensity distribution (transverse mode) in the cross-section of the laser beam that would otherwise be oscillated.

為了在光共振器的外部將沿著相對於光共振器的光軸傾斜之方向傳播之雷射光束從本來待振盪之雷射光束中分離，需要幾米左右的距離。因此，用於分離兩者之光學系統變長，從而光學裝置變得昂貴。 In order to separate the laser beam propagating in a direction inclined with respect to the optical axis of the optical resonator from the laser beam to be oscillated at the outside of the optical resonator, a distance of about several meters is required. Therefore, the optical system for separating the two becomes long, and the optical device becomes expensive.

本發明的目的為提供一種光共振器，其即使使前鏡的朝向外側之面傾斜，並將屋頂鏡用於後鏡，亦能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。 An object of the present invention is to provide an optical resonator capable of suppressing unnecessary oscillation caused by the outer surface of the front mirror even if the outer surface of the front mirror is inclined and a roof mirror is used for the rear mirror.

依本發明的一觀點，提供一種光共振器，其具有前鏡及後鏡，並使光通過激勵雷射氣體之放電區域而往返，前述後鏡為屋頂鏡，前述前鏡的朝向內側之面相對於前述光共振器的光軸正交，前述前鏡的朝向外側之面相對於與前述光共振器的光軸垂直之假想平面傾斜，前述後鏡具有處於彼此交叉之位置關係之平面狀的2個反射區域，分別包括前述後鏡的前述2個反射區域之2個假想平面的交線與前述前鏡的朝向外側之面的傾斜方向偏離正交的關係。According to an aspect of the present invention, an optical resonator is provided, which has a front mirror and a rear mirror, and enables light to travel back and forth through the discharge area of the excitation laser gas, the rear mirror is a roof mirror, and the inward facing surface of the front mirror is opposite. The optical axis of the optical resonator is orthogonal, the outer surface of the front mirror is inclined with respect to an imaginary plane perpendicular to the optical axis of the optical resonator, and the rear mirror has two planes in a positional relationship crossing each other. The reflection area includes a relationship in which the intersection line of the two imaginary planes of the two reflection areas of the rear mirror and the inclination direction of the outer surface of the front mirror are deviated from orthogonality.

若使分別包括後鏡的2個反射區域之2個假想平面的交線與前鏡的朝向外側之面的傾斜方向偏離正交的關係，則在前鏡的朝向外側之面上反射之光能夠往返於光共振器內之次數減少。其結果，能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。If the intersection line of the two imaginary planes including the two reflective areas of the rear mirror and the inclination direction of the outside facing surface of the front mirror are deviated from the orthogonal relationship, the light reflected on the outside facing surface of the front mirror can be The number of round trips to and from the optical resonator is reduced. As a result, unnecessary oscillation caused by the outer surface of the front mirror can be suppressed.

參閱圖1～圖3C，對基於實施例之光共振器及搭載有該光共振器之氣體雷射裝置進行說明。 圖1係搭載有基於實施例之光共振器之氣體雷射裝置的包含光軸之剖面圖。將光共振器的光軸方向設為z軸方向且將鉛直上方設為x軸方向之xyz正交座標系進行定義。 雷射氣體收容於腔室10中。腔室10的內部空間被劃分為相對位於鉛直方向上側之光學室11及相對位於鉛直方向下側之送風機室12。光學室11與送風機室12被上下隔板13隔開。另外，在上下隔板13設置有開口，以使雷射氣體在光學室11與送風機室12之間流通。光學室11的底板14從送風機室12的側壁向z軸方向上的兩側突出，且光學室11的z軸方向上的長度比送風機室12的z軸方向上的長度長。腔室10在光學室11的底板14上藉由腔室支撐構件16支撐於光學基座。 在光學室11內配置有一對放電電極21。一對放電電極21分別間隔著放電電極支撐構件22、23被支撐在底板14。一對放電電極21在x軸方向上隔著間隔配置，從而在兩者之間劃定放電區域24。放電電極21藉由在放電區域24產生放電來激勵雷射氣體。如在後面參閱圖2進行之說明，雷射氣體沿著與圖1的紙面垂直之方向流過放電區域24。 在配置於光學室11內之共同支撐構件26支撐有光共振器25。光共振器25由前鏡25F及後鏡25R構成。光共振器25的光軸通過放電區域24內。共同支撐構件26間隔著光共振器支撐構件27被支撐在底板14。在使光共振器25的光軸向前鏡25F側(圖1中為左側)延伸之延長線與光學室11的壁面的交叉部位安裝有使雷射光束透過之透光窗28。在光共振器25內被激勵之雷射光束透過透光窗28向外部放射。 在送風機室12配置有送風機50。送風機50使雷射氣體在光學室11與送風機室12之間循環。 圖2係搭載有基於本實施例之光共振器25(圖1)之氣體雷射裝置的與z軸垂直之剖面圖。腔室10的內部空間藉由上下隔板13被劃分為上方光學室11及下方送風機室12。在光學室11內配置有支撐一對放電電極21、光共振器25(圖1)之共同支撐構件26。在放電電極21之間劃定放電區域24。 在光學室11內配置有隔板15。隔板15劃定從設置於上下隔板13之開口13A至放電區域24為止的第1氣體流路51、從放電區域24至設置於上下隔板13之另一開口13B為止的第2氣體流路52。雷射氣體沿著相對於光軸正交之方向(y軸方向)流過放電區域24。放電方向(x軸方向)與雷射氣體流過之方向(y軸方向)及光軸方向(z軸方向)的兩個方向正交。由送風機室12、第1氣體流路51、放電區域24及第2氣體流路52構成雷射氣體循環之循環流路。送風機50產生雷射氣體流，以使雷射氣體在該循環流路循環。 在送風機室12內的循環流路收容有熱交換器56。在放電區域24加熱之雷射氣體通過熱交換器56被冷卻，被冷卻之雷射氣體再供給至放電區域24。 在上下隔板13設置有使雷射氣體從送風機室12向光學室11流出之流出孔58。藉由送風機50流向第1氣體流路51之雷射氣體流中所包含之一部分雷射氣體通過流出孔58向光學室11流出。在流出孔58設置有去除微粒之過濾器59。例如，過濾器59堵住流出孔58，從送風機室12向光學室11流出之雷射氣體通過過濾器59而被過濾。 圖3A、圖3B及圖3C分別係基於本實施例之光共振器25的立體圖、與y軸垂直之剖面圖(垂直剖面圖)及與x軸垂直之剖面圖(水平剖面圖)。 後鏡25R由具有彼此交叉之2個反射面之屋頂鏡構成。2個反射面所成之角度大致為直角。具有大致正交之2個反射面之後鏡25R具有抑制橫向上的光束的變動並提高光束強度分布的穩定性之功能。在放電區域24與前鏡25F之間配置有前光圈29F，並在放電區域24與後鏡25R之間配置有後光圈29R。另外，在圖3A的立體圖中，省略前光圈29F及後光圈29R的記載。前光圈29F及後光圈29R具有對在光共振器25的遠離光軸之區域傳播之不必要的光進行遮蔽之功能。 後鏡25R以2個反射面的谷線251與x軸平行之姿勢固定。前鏡25F具有朝向光共振器25的內側之面255及朝向外側之面256。朝向內側之面255局部被反射塗佈，而朝向外側之面256無反射塗佈。朝向內側之面255與光共振器25的光軸(z軸)正交，朝向外側之面256相對於與光軸正交之假想平面(與xy面平行之面)傾斜。另外，可以將朝向內側之面255作為在光軸上具有焦點之凹面。有時將前鏡25F的朝向外側之面256相對於與光軸正交之假想平面(與xy面平行之面)傾斜之角度簡稱為“朝向外側之面的傾斜角”。 朝向外側之面256相對於與光軸垂直之假想平面(xy面)傾斜之方向為x軸的正方向或負方向。在此，“傾斜之方向”係指，包含於朝向外側之面256的直線中，相對於xy面之傾斜角成最大之直線的下降方向。換言之，前鏡25F的朝向外側之面256的傾斜方向與後鏡25R的谷線251成為平行的關係。作為光共振器25，亦可以採用包括折返鏡等之折返光共振器。此時，在配置有前鏡25F之位置上之與光軸垂直之假想平面，經由構成光共振器25之折返鏡等光學組件而對谷線251進行投影之線像與朝向外側之面256的傾斜方向平行。“平行的關係”包括對谷線251進行投影之線像與朝向外側之面256的傾斜方向平行之關係。 接著，參閱圖4A及圖4B，對本實施例的優異之效果進行說明。 圖4A係表示在基於本實施例之光共振器25的前鏡25F的朝向外側之面256上垂直反射之光在xz剖面上傳播之狀態之圖。後鏡25R的2個反射面與平行於xz面之平面的交線成為與x軸平行之直線。因此，能夠認為在xz剖面中後鏡25R為與光軸(z軸)垂直之平面鏡。在圖4A中，將後鏡25R表示為平面鏡。前鏡25F的朝向外側之面256傾斜之方向設為x軸的負方向。 待振盪之雷射光束閉鎖到前鏡25F的朝向內側之面255與後鏡25R之間。該雷射光束的傳播方向與光共振器25的光軸(z軸)平行。前鏡25F的朝向外側之面256無反射塗佈，但反射率並不完全為零，前鏡25F的朝向外側之面256具有1%以下的反射率。藉由在放電區域24內自然發光之光在朝向外側之面256垂直反射，產生相對於光共振器25的光軸在xz面內沿傾斜方向傳播之光40。光40的傳播方向上的x分量為正。 沿傾斜方向傳播之光40被後鏡25R向傾斜方向反射，並再入射到前鏡25F的朝向外側之面256。被後鏡25R向傾斜方向反射之光41的傳播方向上的x分量與入射之光40的傳播方向上的x分量同樣為正。因此，被反射之光41再入射之位置向比光40的起點更靠x軸之正側偏離。再入射之光41向相對於光共振器25的光軸之傾斜角更大的傾斜方向反射。如此，在前鏡25F的朝向外側之面256上垂直反射之光隨著在光共振器25內傳播而遠離光共振器25的光軸。因此，在前鏡25F的朝向外側之面256上反射之光以較少的往返次數被前光圈29F或後光圈29R遮蔽。因此，在前鏡25F的朝向外側之面256上垂直反射之光不易成長至雷射光。 圖4B係在基於比較例之光共振器25的前鏡25F的朝向外側之面256上反射之光在xz剖面上傳播之狀態之圖。在比較例中，後鏡25R的2個反射面的谷線251配置為與y軸平行。亦即，後鏡25R的谷線251與前鏡25F的朝向外側之面的傾斜方向處於正交的關係。在此，“正交的關係”不僅包括2條直線在三維空間直角相交之情況，還包括若將其中一條直線沿著光共振器25的光軸平行移動則與另一條直線直角相交之關係。當光共振器25的光軸被折返時，使直線沿著光軸平行移動，以使得沿折返前的光軸移動之直線與沿著折返後的光軸移動之直線成為物體與像的關係。在前鏡25F的朝向外側之面256上垂直反射而相對於光共振器25的光軸沿傾斜方向傳播之光43在後鏡25R的2個反射面進行兩次反射之後，朝向前鏡25F傳播。 入射到後鏡25R之光43的傳播方向與反射之光44的傳播方向具有反平行的關係。光43的傳播方向與朝向外側之面256垂直，因此從後鏡25R朝向前鏡25F之光44垂直入射到朝向外側之面256。垂直入射到朝向外側之面256之光44的一部分分量在朝向外側之面256反射，反射光沿著與光43、44的路徑相反的方向傳播，再入射到朝向外側之面256。其結果，有時相對於光軸朝向傾斜方向之光被封閉到光共振器25內而成長至雷射光。相對於光共振器25的光軸傾斜地傳播之雷射光束會影響本來待振盪之雷射光束的橫向上的強度分布，因此光束在橫剖面上之強度分布的穩定性下降。 在本實施例中，抑制了由在前鏡25F的朝向外側之面256上的反射引起之雷射振盪，因此能夠抑制待振盪之雷射光束在橫剖面上之強度分布的穩定性的下降。 接著，對上述實施例的變形例進行說明。 在上述實施例中，如圖3A～圖3C所示，使用前鏡25F與後鏡25R的2組鏡片，但亦可以在兩者之間配置折返鏡等而構成折返光共振器。 又，在上述實施例中，將後鏡25R的谷線251與前鏡25F的朝向外側之面256的傾斜方向設成平行的關係，但兩者無需一定是平行的關係。若兩者偏離正交的關係，則與具有正交的關係時相比，在前鏡25F的朝向外側之面256上反射之光能夠在光共振器25往返的次數減少。其結果，與圖4B所示之比較例相比，能夠抑制雷射光束的強度分布的穩定性的下降。 又，在上述實施例中，作為後鏡25R使用了屋頂鏡，除此之外，亦可以使用具有處於彼此交叉之位置關係之平面狀的2個反射區域之鏡片。此時，分別包括2個反射區域之2個假想平面的交線方向相當於屋頂鏡的谷線251的方向。 接著，參閱圖5，對前光圈29F與後光圈29R的間隔L、前光圈29F與後光圈29R的開口直徑D及前鏡25F的朝向外側之面256的傾斜角θ的較佳之關係進行說明。 圖5係前光圈29F、後光圈29R及在兩者之間相對於光共振器25的光軸沿傾斜方向傳播光之模示圖。前鏡25F的朝向外側之面256相對於與z軸垂直之假想平面在x軸方向上傾斜傾斜角θ。相對於前鏡25F的朝向外側之面256向垂直方向反射之光46沿著相對於z軸傾斜傾斜角θ的方向傳播。假設在後光圈29R的位置配置有平面的後鏡。由該後鏡反射之光47在前光圈29F的位置上，通過從最開始的光46的通過位置向x軸方向偏離之位置。該偏離量Δd由以下式表示。 Δd=2L×tanθ……(1) 若前光圈29F的開口直徑D為偏離量Δd以下，則在前鏡25F的朝向外側之面256上垂直反射之光在往返一次光共振器25內之期間，被前光圈29F遮蔽。若往返於光共振器25內之光在往返兩次之前被遮蔽，則可以認為該光不會成長至雷射光。為了使往返於光共振器25內之光在往返兩次之前被遮蔽，傾斜角θ、光圈的間隔L、光圈的開口直徑D滿足以下的關係為較佳。 θ≥tan-1 (D/4L)……(2) 實際上，後鏡25R配置於比後光圈29R更靠外側。因此，偏離量Δd大於由式(1)表示之值。進而，如參閱圖5進行之說明，光47在前鏡25F的朝向外側之面256上反射之光的傳播方向上的相對於光軸(z軸)之傾斜角大於傾斜角θ。因此，往返於光共振器25內之光在往返兩次之前被遮蔽之條件比上述條件式(2)寬鬆。若滿足上述條件式(2)，則在實際的氣體雷射裝置中，可以獲得抑制由前鏡25F的朝向外側之面256引起之不必要的雷射振盪的產生的效果。 接著，參閱圖6，對搭載有基於上述實施例之光共振器25之雷射加工裝置進行說明。 圖6係雷射加工裝置的概略圖。雷射振盪器70依據來自控制裝置73的指令輸出脈衝雷射光束。從雷射振盪器70輸出之脈衝雷射光束通過光束整形掃描光學系統71入射到加工對象物75。光束整形掃描光學系統71對雷射光束的光束截面形狀進行整形，並且沿二維方向掃描雷射光束。 加工對象物75例如為印刷基板，保持於工作台72。工作台72能夠藉由來自控制裝置73的指令，使加工對象物75沿著與其被加工面平行之兩個方向移動。該雷射加工裝置用於基於脈衝雷射光束之加工對象物75的鑽孔加工。 雷射振盪器70使用了基於上述實施例之光共振器25。因此，能夠提高從雷射振盪器70輸出之脈衝雷射光束的強度分布的穩定性。其結果，脈衝雷射光束的光束剖面的正圓度提高，能夠提高鑽孔加工的加工品質。 上述各個實施例僅是示例，本發明並不限定於上述實施例。例如，本發明可以進行各種變更、改良及組合等，這對本案發明所屬技術領域中具有通常知識者來講是顯而易見的。Referring to FIGS. 1 to 3C , the optical resonator according to the embodiment and the gas laser device equipped with the optical resonator will be described. FIG. 1 is a cross-sectional view including an optical axis of a gas laser device equipped with an optical resonator according to an embodiment. An xyz orthogonal coordinate system in which the optical axis direction of the optical resonator is the z-axis direction and the vertical upper direction is the x-axis direction is defined. The laser gas is contained in the chamber 10 . The inner space of the chamber 10 is divided into an optical chamber 11 located relatively on the upper side in the vertical direction and a blower chamber 12 relatively located on the lower side in the vertical direction. The optical chamber 11 and the blower chamber 12 are partitioned by upper and lower partitions 13 . In addition, openings are provided in the upper and lower partitions 13 so that the laser gas flows between the optical chamber 11 and the blower chamber 12 . The bottom plate 14 of the optical chamber 11 protrudes from the side wall of the blower chamber 12 to both sides in the z-axis direction, and the length of the optical chamber 11 in the z-axis direction is longer than the length of the blower chamber 12 in the z-axis direction. The chamber 10 is supported on the optical base by the chamber support member 16 on the bottom plate 14 of the optical chamber 11 . A pair of discharge electrodes 21 are arranged in the optical chamber 11 . The pair of discharge electrodes 21 are supported by the bottom plate 14 with the discharge electrode support members 22 and 23 interposed therebetween, respectively. The pair of discharge electrodes 21 are arranged at intervals in the x-axis direction, and define the discharge region 24 therebetween. The discharge electrode 21 excites the laser gas by generating a discharge in the discharge region 24 . As described later with reference to FIG. 2 , the laser gas flows through the discharge region 24 in a direction perpendicular to the page of FIG. 1 . The optical resonator 25 is supported on a common support member 26 disposed in the optical chamber 11 . The optical resonator 25 is composed of a front mirror 25F and a rear mirror 25R. The optical axis of the optical resonator 25 passes through the discharge region 24 . The common support member 26 is supported on the bottom plate 14 with the optical resonator support member 27 interposed therebetween. A light-transmitting window 28 for transmitting the laser beam is attached to the intersection of the extension line extending the optical axis of the optical resonator 25 toward the front mirror 25F (left side in FIG. 1 ) and the wall surface of the optical chamber 11 . The laser beam excited in the optical resonator 25 is emitted to the outside through the light-transmitting window 28 . A blower 50 is arranged in the blower chamber 12 . The blower 50 circulates the laser gas between the optical chamber 11 and the blower chamber 12 . FIG. 2 is a cross-sectional view perpendicular to the z-axis of the gas laser device equipped with the optical resonator 25 ( FIG. 1 ) according to the present embodiment. The inner space of the chamber 10 is divided into the upper optical chamber 11 and the lower blower chamber 12 by the upper and lower partitions 13 . Inside the optical chamber 11, a common support member 26 that supports a pair of discharge electrodes 21 and an optical resonator 25 (FIG. 1) is arranged. Discharge regions 24 are defined between discharge electrodes 21 . A partition 15 is arranged in the optical chamber 11 . The separator 15 defines the first gas flow path 51 from the opening 13A provided in the upper and lower separator 13 to the discharge region 24 and the second gas flow from the discharge region 24 to the other opening 13B provided in the upper and lower separator 13 Road 52. The laser gas flows through the discharge region 24 in a direction orthogonal to the optical axis (y-axis direction). The discharge direction (x-axis direction) is orthogonal to both the direction in which the laser gas flows (y-axis direction) and the optical axis direction (z-axis direction). The blower chamber 12 , the first gas flow path 51 , the discharge region 24 , and the second gas flow path 52 constitute a circulation flow path for circulating the laser gas. The blower 50 generates a laser gas flow to circulate the laser gas in the circulation flow path. The heat exchanger 56 is accommodated in the circulation flow path in the blower chamber 12 . The laser gas heated in the discharge area 24 is cooled by the heat exchanger 56 , and the cooled laser gas is supplied to the discharge area 24 again. The upper and lower partitions 13 are provided with outflow holes 58 for allowing the laser gas to flow out from the blower chamber 12 to the optical chamber 11 . A part of the laser gas included in the laser gas flow flowing to the first gas flow path 51 by the blower 50 flows out to the optical chamber 11 through the outflow hole 58 . The outflow hole 58 is provided with a filter 59 for removing particulates. For example, the filter 59 blocks the outflow hole 58, and the laser gas flowing out from the blower chamber 12 to the optical chamber 11 passes through the filter 59 and is filtered. 3A, 3B and 3C are respectively a perspective view, a cross-sectional view perpendicular to the y-axis (vertical cross-sectional view) and a cross-sectional view perpendicular to the x-axis (horizontal cross-sectional view) of the optical resonator 25 according to the present embodiment. The rear mirror 25R is constituted by a roof mirror having two reflecting surfaces intersecting with each other. The angle formed by the two reflecting surfaces is approximately a right angle. The mirror 25R having two substantially orthogonal reflecting surfaces has the function of suppressing the variation of the beam in the lateral direction and improving the stability of the beam intensity distribution. A front diaphragm 29F is arranged between the discharge area 24 and the front mirror 25F, and a rear diaphragm 29R is arranged between the discharge area 24 and the rear mirror 25R. In addition, in the perspective view of FIG. 3A , the description of the front diaphragm 29F and the rear diaphragm 29R is omitted. The front diaphragm 29F and the rear diaphragm 29R have a function of shielding unnecessary light propagating in a region of the optical resonator 25 away from the optical axis. The rear mirror 25R is fixed so that the valley lines 251 of the two reflecting surfaces are parallel to the x-axis. The front mirror 25F has a surface 255 facing the inner side of the optical resonator 25 and a surface 256 facing the outer side. The inner side 255 is partially reflectively coated, while the outer side 256 is not reflectively coated. The inner surface 255 is orthogonal to the optical axis (z-axis) of the optical resonator 25, and the outer surface 256 is inclined with respect to an imaginary plane (plane parallel to the xy plane) orthogonal to the optical axis. In addition, the inner surface 255 can be regarded as a concave surface having a focal point on the optical axis. The angle of inclination of the outer surface 256 of the front mirror 25F with respect to an imaginary plane orthogonal to the optical axis (a surface parallel to the xy plane) may be simply referred to as "the inclination angle of the outer surface". The direction in which the surface 256 facing the outside is inclined with respect to an imaginary plane (xy plane) perpendicular to the optical axis is the positive direction or the negative direction of the x-axis. Here, the "direction of inclination" refers to the descending direction of the straight line having the largest inclination angle with respect to the xy plane among the straight lines of the surface 256 facing the outside. In other words, the inclination direction of the outer surface 256 of the front mirror 25F and the valley line 251 of the rear mirror 25R are in a parallel relationship. As the optical resonator 25, a folding optical resonator including a folding mirror or the like can also be used. At this time, on an imaginary plane perpendicular to the optical axis at the position where the front mirror 25F is arranged, the line image of the valley line 251 projected through the optical elements such as the return mirror constituting the optical resonator 25 and the line image of the outer surface 256 are projected. The tilt directions are parallel. The "parallel relationship" includes a relationship in which the line image projected on the valley line 251 is parallel to the inclination direction of the outer surface 256 . Next, referring to FIGS. 4A and 4B , the excellent effects of this embodiment will be described. 4A is a diagram showing a state in which light vertically reflected on the outer surface 256 of the front mirror 25F of the optical resonator 25 according to the present embodiment propagates on the xz cross-section. The intersection of the two reflection surfaces of the rear mirror 25R and a plane parallel to the xz plane is a straight line parallel to the x-axis. Therefore, it can be considered that the rear mirror 25R is a plane mirror perpendicular to the optical axis (z axis) in the xz cross section. In FIG. 4A, the rear mirror 25R is represented as a flat mirror. The direction in which the outer surface 256 of the front mirror 25F is inclined is set as the negative direction of the x-axis. The laser beam to be oscillated is locked between the inner surface 255 of the front mirror 25F and the rear mirror 25R. The propagation direction of the laser beam is parallel to the optical axis (z-axis) of the optical resonator 25 . The outer surface 256 of the front mirror 25F has no reflective coating, but the reflectivity is not completely zero. The outer surface 256 of the front mirror 25F has a reflectivity of less than 1%. The light 40 propagating in an oblique direction in the xz plane with respect to the optical axis of the optical resonator 25 is generated by the vertical reflection of the light naturally emitted in the discharge region 24 on the surface 256 facing the outside. The x-component in the propagation direction of light 40 is positive. The light 40 propagating in the oblique direction is reflected in the oblique direction by the rear mirror 25R, and then incident on the outer surface 256 of the front mirror 25F. The x component in the propagation direction of the light 41 reflected in the oblique direction by the rear mirror 25R is positive in the same way as the x component in the propagation direction of the incident light 40 . Therefore, the position where the reflected light 41 is re-incident is shifted to the positive side of the x-axis from the origin of the light 40 . The re-incident light 41 is reflected in an oblique direction with a larger inclination angle with respect to the optical axis of the optical resonator 25 . In this way, the light vertically reflected on the outer-facing surface 256 of the front mirror 25F moves away from the optical axis of the optical resonator 25 as it propagates in the optical resonator 25 . Therefore, the light reflected on the outer-facing surface 256 of the front mirror 25F is blocked by the front aperture 29F or the rear aperture 29R with a small number of round trips. Therefore, the light vertically reflected on the outer surface 256 of the front mirror 25F cannot easily grow into the laser light. 4B is a diagram showing a state in which light reflected on the outer-facing surface 256 of the front mirror 25F of the optical resonator 25 according to the comparative example propagates on the xz cross-section. In the comparative example, the valley lines 251 of the two reflecting surfaces of the rear mirror 25R are arranged parallel to the y-axis. That is, the valley line 251 of the rear mirror 25R and the inclination direction of the outer surface of the front mirror 25F are in an orthogonal relationship. Here, the "orthogonal relationship" includes not only a case where two straight lines intersect at right angles in three-dimensional space, but also a relationship where one of the straight lines intersects the other straight line at right angles when moved in parallel along the optical axis of the optical resonator 25 . When the optical axis of the optical resonator 25 is folded back, the straight line is moved in parallel along the optical axis so that the straight line moving along the optical axis before turning back and the straight line moving along the optical axis after turning back are in the relationship between the object and the image. The light 43 that is vertically reflected on the outer surface 256 of the front mirror 25F and propagates in an oblique direction with respect to the optical axis of the optical resonator 25 is reflected twice on the two reflecting surfaces of the rear mirror 25R, and then propagates toward the front mirror 25F. . The propagation direction of the light 43 incident on the rear mirror 25R and the propagation direction of the reflected light 44 have an antiparallel relationship. The propagation direction of the light 43 is perpendicular to the outward facing surface 256 , so that the light 44 from the rear mirror 25R toward the front mirror 25F is perpendicularly incident on the outward facing surface 256 . A part of the component of the light 44 that is perpendicularly incident on the outward facing surface 256 is reflected on the outward facing surface 256 , the reflected light propagates in the opposite direction to the paths of the lights 43 and 44 , and is incident on the outward facing surface 256 . As a result, the light oriented in an oblique direction with respect to the optical axis may be trapped in the optical resonator 25 and grow into laser light. The laser beam propagating obliquely with respect to the optical axis of the optical resonator 25 affects the intensity distribution in the transverse direction of the laser beam to be oscillated originally, and thus the stability of the intensity distribution of the beam in the cross section decreases. In this embodiment, laser oscillation caused by reflection on the outer surface 256 of the front mirror 25F is suppressed, so that the stability of the intensity distribution in the cross section of the laser beam to be oscillated can be suppressed from decreasing. Next, a modification of the above-described embodiment will be described. In the above-described embodiment, as shown in FIGS. 3A to 3C , two sets of lenses of the front mirror 25F and the rear mirror 25R are used, but a folded optical resonator may be formed by arranging a folded mirror or the like between the two. In the above-described embodiment, the valley line 251 of the rear mirror 25R and the inclination direction of the outer surface 256 of the front mirror 25F are set in a parallel relationship, but the two need not necessarily be in a parallel relationship. If the two are deviated from the orthogonal relationship, the number of times that the light reflected on the outer surface 256 of the front mirror 25F can travel back and forth to the optical resonator 25 is reduced compared with the case of the orthogonal relationship. As a result, as compared with the comparative example shown in FIG. 4B , it is possible to suppress a decrease in the stability of the intensity distribution of the laser beam. In addition, in the above-mentioned embodiment, the roof mirror is used as the rear mirror 25R, but in addition to this, a mirror plate having two planar reflection areas in a positional relationship crossing each other may be used. At this time, the direction of intersection of the two imaginary planes including the two reflection regions corresponds to the direction of the valley line 251 of the roof mirror. Next, referring to FIG. 5 , the preferred relationship between the distance L between the front aperture 29F and the rear aperture 29R, the opening diameter D of the front aperture 29F and the rear aperture 29R, and the inclination angle θ of the outer surface 256 of the front mirror 25F will be described. 5 is a schematic diagram of the front aperture 29F, the rear aperture 29R, and light propagating in an oblique direction with respect to the optical axis of the optical resonator 25 therebetween. The outer-facing surface 256 of the front mirror 25F is inclined by an inclination angle θ in the x-axis direction with respect to an imaginary plane perpendicular to the z-axis. The light 46 reflected in the vertical direction with respect to the outer surface 256 of the front mirror 25F propagates in a direction inclined by an inclination angle θ with respect to the z-axis. It is assumed that a flat rear mirror is arranged at the position of the rear aperture 29R. The light 47 reflected by the rear mirror passes through a position deviated in the x-axis direction from the first passing position of the light 46 at the position of the front diaphragm 29F. The deviation amount Δd is represented by the following equation. Δd=2L×tanθ...(1) If the opening diameter D of the front aperture 29F is equal to or smaller than the deviation Δd, the light vertically reflected on the outer surface 256 of the front mirror 25F travels back and forth into the primary optical resonator 25 , obscured by the front aperture 29F. If the light going to and from the optical resonator 25 is blocked before going back and forth twice, it can be considered that the light will not grow to the laser light. In order to block the light going back and forth in the optical resonator 25 before going back and forth twice, it is preferable that the inclination angle θ, the interval L of the aperture, and the aperture diameter D of the aperture satisfy the following relationship. θ≧tan −1 (D/4L) (2) Actually, the rear mirror 25R is arranged outside the rear aperture 29R. Therefore, the deviation amount Δd is larger than the value represented by the formula (1). Further, as explained with reference to FIG. 5 , the inclination angle with respect to the optical axis (z-axis) in the propagation direction of the light reflected by the light 47 on the outer facing surface 256 of the front mirror 25F is larger than the inclination angle θ. Therefore, the condition that the light going back and forth in the optical resonator 25 is blocked before going back and forth twice is looser than the above-mentioned conditional expression (2). If the above-mentioned conditional expression (2) is satisfied, in an actual gas laser device, the effect of suppressing unnecessary laser oscillation caused by the outer surface 256 of the front mirror 25F can be obtained. Next, referring to FIG. 6 , a laser processing apparatus equipped with the optical resonator 25 according to the above-described embodiment will be described. FIG. 6 is a schematic diagram of a laser processing apparatus. The laser oscillator 70 outputs a pulsed laser beam according to an instruction from the control device 73 . The pulsed laser beam output from the laser oscillator 70 is incident on the object to be processed 75 through the beam shaping scanning optical system 71 . The beam shaping scanning optical system 71 shapes the beam cross-sectional shape of the laser beam, and scans the laser beam in two-dimensional directions. The object to be processed 75 is, for example, a printed circuit board, and is held on the table 72 . The table 72 can move the object to be processed 75 in two directions parallel to the surface to be processed by a command from the control device 73 . This laser processing apparatus is used for drilling processing of an object 75 to be processed by a pulsed laser beam. The laser oscillator 70 uses the optical resonator 25 based on the above-mentioned embodiment. Therefore, the stability of the intensity distribution of the pulsed laser beam output from the laser oscillator 70 can be improved. As a result, the circularity of the beam cross section of the pulsed laser beam can be improved, and the processing quality of the drilling process can be improved. The above-described respective embodiments are merely examples, and the present invention is not limited to the above-described embodiments. For example, it will be apparent to those skilled in the art to which the present invention pertains that various modifications, improvements, and combinations can be made in the present invention.

10:腔室 11:光學室 12:送風機室 13:上下隔板 13A,13B:開口 14:底板 15:隔板 16:腔室支撐構件 21:放電電極 22,23:放電電極支撐構件 24:放電區域 25:光共振器 25F:前鏡 25R:後鏡 26:共同支撐構件 27:光共振器支撐構件 28:透光窗 29F:前光圈 29R:後光圈 40,41,43,44,46,47:在光共振器內傳播之光 50:送風機 51:第1氣體流路 52:第2氣體流路 56:熱交換器 58:流出孔 59:過濾器 70:雷射振盪器 71:光束整形掃描光學系統 72:工作台 73:控制裝置 75:加工對象物 251:後鏡的谷線 255:前鏡的朝向內側之面 256:前鏡的朝向外側之面10: Chamber 11: Optical Room 12: Blower room 13: Upper and lower partitions 13A, 13B: Opening 14: Bottom plate 15: Clapboard 16: Chamber support member 21: Discharge electrode 22, 23: Discharge electrode support member 24: Discharge area 25: Optical Resonator 25F: Front mirror 25R: rear mirror 26: Common support members 27: Optical resonator support member 28: Translucent window 29F: Front Aperture 29R: rear aperture 40, 41, 43, 44, 46, 47: Light propagating within an optical resonator 50: blower 51: 1st gas flow path 52: Second gas flow path 56: Heat Exchanger 58: Outflow hole 59: Filter 70: Laser oscillator 71: Beam Shaping Scanning Optical System 72: Workbench 73: Controls 75: Processing object 251: Valley line of rear mirror 255: Inward facing side of the front mirror 256: The outer face of the front mirror

[圖1]係搭載有基於實施例之光共振器之氣體雷射裝置的包含光軸之剖面圖。 [圖2]係搭載有基於實施例之光共振器之氣體雷射裝置的與光軸垂直之剖面圖。 [圖3A]、[圖3B]及[圖3C]分別係基於實施例之光共振器的立體圖、與y軸垂直之剖面圖及與x軸垂直之剖面圖。 [圖4A]及[圖4B]分別係表示在基於實施例及比較例之光共振器的前鏡的朝向外側之面上垂直反射之光在xz剖面上傳播之狀態之圖。 [圖5]係前光圈、後光圈及光在兩者之間相對於光共振器的光軸沿傾斜方向傳播之模示圖。 [圖6]係使用了搭載有基於實施例之光共振器之雷射振盪器之雷射加工裝置的概略圖。1 is a cross-sectional view including an optical axis of a gas laser device equipped with an optical resonator according to an embodiment. FIG. 2 is a cross-sectional view perpendicular to the optical axis of the gas laser device equipped with the optical resonator according to the embodiment. [FIG. 3A], [FIG. 3B], and [FIG. 3C] are a perspective view, a cross-sectional view perpendicular to the y-axis, and a cross-sectional view perpendicular to the x-axis of the optical resonator according to the embodiment, respectively. 4A ] and [ FIG. 4B ] are diagrams showing a state in which light vertically reflected on the outer surface of the front mirror of the optical resonator according to the example and the comparative example propagates on the xz cross-section, respectively. [ Fig. 5 ] It is a schematic diagram of the front aperture, the rear aperture, and light propagating in an oblique direction with respect to the optical axis of the optical resonator between them. FIG. 6 is a schematic diagram of a laser processing apparatus using a laser oscillator mounted with the optical resonator according to the embodiment.

24:放電區域 24: Discharge area

25F:前鏡 25F: Front mirror

25R:後鏡 25R: rear mirror

29F:前光圈 29F: Front Aperture

29R:後光圈 29R: rear aperture

251:後鏡的谷線 251: Valley line of rear mirror

255:前鏡的朝向內側之面 255: Inward facing side of the front mirror

256:前鏡的朝向外側之面 256: The outer face of the front mirror

x:x軸 x:x axis

y:y軸 y: y axis

z:z軸 z: z axis

Claims (3)

一種光共振器，其具有前鏡及後鏡，並使光通過激勵雷射氣體之放電區域而往返，前述後鏡為屋頂鏡，前述前鏡的朝向內側之面相對於前述光共振器的光軸正交，前述前鏡的朝向外側之面相對於與前述光共振器的光軸垂直之假想平面傾斜，前述後鏡具有處於彼此交叉之位置關係之平面狀的2個反射區域，分別包括前述後鏡的前述2個反射區域之2個假想平面的交線與前述前鏡的朝向外側之面的傾斜方向偏離正交的關係。 A kind of optical resonator, it has a front mirror and a rear mirror, and makes the light pass through the discharge area of the excitation laser gas to go back and forth, the aforementioned rear mirror is a roof mirror, and the surface facing the inside of the aforementioned front mirror is relative to the optical axis of the aforementioned optical resonator. Orthogonal, the surface facing the outside of the front mirror is inclined with respect to an imaginary plane perpendicular to the optical axis of the optical resonator, and the rear mirror has two plane reflection areas in a positional relationship crossing each other, including the rear mirror respectively. The relationship between the intersection of the two imaginary planes of the two reflective regions and the inclination direction of the outer surface of the front mirror is deviated from the orthogonal relationship. 如請求項1記載之光共振器，其中，分別包括前述後鏡的前述2個反射區域之2個假想平面的交線與前述前鏡的朝向外側之面的傾斜方向具有平行的關係。 The optical resonator according to claim 1, wherein the intersection line of the two imaginary planes of the two reflection regions including the rear mirror respectively has a parallel relationship with the inclination direction of the outer surface of the front mirror. 如請求項1或2記載之光共振器，其中，進而在前述光共振器的光軸方向上，在前述放電區域的兩側分別配置有具有開口之光圈，當用L表示一對前述光圈的間隔，用D表示前述光圈的開口直徑時，前述前鏡的朝向外側之面相對於與前述光共振器的光軸正交之假想平面傾斜之角度為tan-1(D/4L)以上。The optical resonator according to claim 1 or 2, wherein, in the optical axis direction of the optical resonator, apertures having openings are arranged on both sides of the discharge region, respectively, and L is used to denote a pair of apertures of the apertures. When D represents the aperture diameter of the diaphragm, the angle of inclination of the outer surface of the front mirror with respect to an imaginary plane orthogonal to the optical axis of the optical resonator is tan -1 (D/4L) or more.
TW108140195A 2018-12-17 2019-11-06 Optical resonator TWI754854B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018235278A JP7262217B2 (en) 2018-12-17 2018-12-17 optical resonator
JP2018-235278 2018-12-17

Publications (2)

Publication Number Publication Date
TW202025584A TW202025584A (en) 2020-07-01
TWI754854B true TWI754854B (en) 2022-02-11

Family

ID=71106184

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108140195A TWI754854B (en) 2018-12-17 2019-11-06 Optical resonator

Country Status (4)

Country Link
JP (1) JP7262217B2 (en)
KR (1) KR20200074852A (en)
CN (1) CN111326945B (en)
TW (1) TWI754854B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022015941A (en) * 2020-07-10 2022-01-21 住友重機械工業株式会社 Iris and laser oscillator

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW385581B (en) * 1998-01-22 2000-03-21 Mitsubishi Electric Corp CO2 gas laser oscillator and gas laser processing machine
US6363090B1 (en) * 1998-02-25 2002-03-26 Dentek-Lasersystems Produktions Ges.M.B.H Laser system for producing ultra-short light pulses
US20040071179A1 (en) * 2000-12-14 2004-04-15 Eckhard Zanger Optical resonant frequency converter
US20060114962A1 (en) * 2004-11-30 2006-06-01 Nat. Inst Of Inf And Comm Tech., Inc Admin. Agency Laser oscillator incorporating transverse mode rotation in the laser resonator
CN1808798A (en) * 2005-01-17 2006-07-26 发那科株式会社 Laser oscillator
US20070008995A1 (en) * 2005-07-11 2007-01-11 Mitutoyo Corporation Frequency-stabilized laser and frequency stabilizing method
US7387954B2 (en) * 2004-10-04 2008-06-17 Semiconductor Energy Laboratory Co., Ltd. Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
JP2010021236A (en) * 2008-07-09 2010-01-28 Mitsubishi Electric Corp Gas laser oscillator
US20100079851A1 (en) * 2006-12-19 2010-04-01 Selex Sensors & Airborne Systems Limited Optical parametric oscillator
TWI324423B (en) * 2005-11-01 2010-05-01 Cymer Inc Laser system
TW201130195A (en) * 2009-09-30 2011-09-01 Mitsubishi Electric Corp Laser oscillator and laser amplifier
US20140247842A1 (en) * 2011-06-30 2014-09-04 Coherent, Inc. Mode-locked optically pumped semiconductor laser
TW201505301A (en) * 2013-07-18 2015-02-01 Mitsubishi Electric Corp Gas laser device
US20170033526A1 (en) * 2015-07-31 2017-02-02 Fanuc Corporation Laser oscillator having folding mirror
TW201801132A (en) * 2016-03-28 2018-01-01 克萊譚克公司 High brightness laser-sustained plasma broadband source
US20180342848A1 (en) * 2017-05-23 2018-11-29 Coherent, Inc. Intra-cavity frequency-converted optically-pumped semiconductor laser

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4882793A (en) * 1972-02-04 1973-11-05
JP2662963B2 (en) * 1987-12-26 1997-10-15 株式会社小松製作所 Narrow band laser device
JP2651264B2 (en) * 1990-06-11 1997-09-10 ファナック株式会社 Linear polarized laser oscillator
JPH04307979A (en) * 1991-04-05 1992-10-30 Mitsubishi Electric Corp Laser resonator
JP3458668B2 (en) * 1996-08-28 2003-10-20 松下電器産業株式会社 Laser processing equipment
TWI227582B (en) 2003-11-28 2005-02-01 Walsin Lihwa Corp External cavity tunable laser system formed from MEMS corner mirror array element
JP5337848B2 (en) * 2004-07-06 2013-11-06 株式会社小松製作所 High power gas laser equipment
JP2009094161A (en) 2007-10-04 2009-04-30 Fanuc Ltd Laser oscillator equipped with apertures
WO2014046161A1 (en) 2012-09-21 2014-03-27 国立大学法人 千葉大学 External resonator laser

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW385581B (en) * 1998-01-22 2000-03-21 Mitsubishi Electric Corp CO2 gas laser oscillator and gas laser processing machine
US6363090B1 (en) * 1998-02-25 2002-03-26 Dentek-Lasersystems Produktions Ges.M.B.H Laser system for producing ultra-short light pulses
US20040071179A1 (en) * 2000-12-14 2004-04-15 Eckhard Zanger Optical resonant frequency converter
US7387954B2 (en) * 2004-10-04 2008-06-17 Semiconductor Energy Laboratory Co., Ltd. Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device
US20060114962A1 (en) * 2004-11-30 2006-06-01 Nat. Inst Of Inf And Comm Tech., Inc Admin. Agency Laser oscillator incorporating transverse mode rotation in the laser resonator
CN1808798A (en) * 2005-01-17 2006-07-26 发那科株式会社 Laser oscillator
US20070008995A1 (en) * 2005-07-11 2007-01-11 Mitutoyo Corporation Frequency-stabilized laser and frequency stabilizing method
TWI324423B (en) * 2005-11-01 2010-05-01 Cymer Inc Laser system
US20100079851A1 (en) * 2006-12-19 2010-04-01 Selex Sensors & Airborne Systems Limited Optical parametric oscillator
JP2010021236A (en) * 2008-07-09 2010-01-28 Mitsubishi Electric Corp Gas laser oscillator
TW201130195A (en) * 2009-09-30 2011-09-01 Mitsubishi Electric Corp Laser oscillator and laser amplifier
US20140247842A1 (en) * 2011-06-30 2014-09-04 Coherent, Inc. Mode-locked optically pumped semiconductor laser
TW201505301A (en) * 2013-07-18 2015-02-01 Mitsubishi Electric Corp Gas laser device
US20170033526A1 (en) * 2015-07-31 2017-02-02 Fanuc Corporation Laser oscillator having folding mirror
TW201801132A (en) * 2016-03-28 2018-01-01 克萊譚克公司 High brightness laser-sustained plasma broadband source
US20180342848A1 (en) * 2017-05-23 2018-11-29 Coherent, Inc. Intra-cavity frequency-converted optically-pumped semiconductor laser

Also Published As

Publication number Publication date
KR20200074852A (en) 2020-06-25
JP2020098814A (en) 2020-06-25
JP7262217B2 (en) 2023-04-21
CN111326945B (en) 2023-05-05
TW202025584A (en) 2020-07-01
CN111326945A (en) 2020-06-23

Similar Documents

Publication Publication Date Title
TWI754854B (en) Optical resonator
JPH07211972A (en) Laser oscillator
KR102603393B1 (en) Laser processing apparatus
JP7023573B2 (en) Laser oscillator
KR101709046B1 (en) Gas-laser device
TWI729554B (en) Reentrant optical resonator
TWI781657B (en) Beam shaping optical device and roundness adjustment method
CN113922197B (en) Diaphragm and laser oscillator
JPH10125982A (en) Laser oscillator
CN113904204B (en) Laser device
JPH06140692A (en) Laser oscillator
JP2008235524A (en) Gas laser oscillator
JP5430373B2 (en) Solid-state laser amplification device and solid-state laser device
JP2022069129A (en) Laser device
JP5188222B2 (en) Laser oscillator and laser processing apparatus
JPS6364073B2 (en)
JP2964202B2 (en) Excimer laser oscillator
JP2003287692A (en) Light beam scanner
JP2019128230A (en) Light detection and ranging (lidar) device
JP2019109431A (en) Light source device, exposure equipment, and assembly method of light source device
JPH06338644A (en) Laser oscillator