TWI503183B - Cleaning equipment and cleaning methods - Google Patents

Cleaning equipment and cleaning methods Download PDF

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TWI503183B
TWI503183B TW102133413A TW102133413A TWI503183B TW I503183 B TWI503183 B TW I503183B TW 102133413 A TW102133413 A TW 102133413A TW 102133413 A TW102133413 A TW 102133413A TW I503183 B TWI503183 B TW I503183B
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cleaning
cleaned
detecting
carrier
bristles
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TW102133413A
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TW201511851A (en
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All Ring Tech Co Ltd
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Description

清潔裝置及清潔方法Cleaning device and cleaning method

本發明係有關於一種清潔裝置及清潔方法,尤指一種對待清潔之多數元件進行清潔之清潔裝置及清潔方法。The present invention relates to a cleaning device and a cleaning method, and more particularly to a cleaning device and a cleaning method for cleaning a plurality of components to be cleaned.

按,在一般電子元件的製程,細小化及大量化為常見的製程特色,而由於這些電子元件常有電性連接的需求或導電性之考量,加上這些電子元件通常體積極為輕薄短小,由於精密性與觸控化的趨勢,有些電子元件在製程中組裝的無塵化要求非常高,因此對於每一電子元件與電性接觸之表面通常要求無塵化且百分之百去塵處理;而一般電子元件在製程中,為便於搬運及加工,通常會將多個電子元件排置於一載板治具中被定位,以便操作者可以一載板為單元作操作或收集,也便於自動化的組裝及搬運於各製程中,但有些作業,例如除塵的作業,往往僅在於保持加工作業在一負壓的無塵室中進行,但無塵室並無法完全保證無塵,而作業員對於各電子元件之無塵清潔方式,仍必須採用人工以棉花棒對每一載板上電子元件待清潔部位進行清潔。According to the process of general electronic components, miniaturization and massification are common process characteristics, and since these electronic components often have electrical connection requirements or conductivity considerations, these electronic components are usually extremely thin and short, due to The trend of precision and touch, some electronic components are very dust-free in the process of assembly, so the surface of each electronic component and electrical contact usually requires dust-free and 100% dust removal; In the process of manufacturing, in order to facilitate handling and processing, a plurality of electronic components are usually placed in a carrier fixture to be positioned so that the operator can operate or collect the carrier as a unit, and also facilitate automated assembly and assembly. Handling in various processes, but some operations, such as dust removal, are often only carried out in a vacuum-free clean room, but the clean room is not completely dust-free, and the operator is responsible for the electronic components. For the dust-free cleaning method, it is still necessary to manually clean the parts to be cleaned of the electronic components on each carrier board with a cotton swab.

習知的清潔方法可以理解的幾個問題是:電子元件的生產量隨著產品的流行,動輒千百萬或上億件以上之產量,以人工逐一清潔,其所耗用人力的效率與成本可想而知!再者人力無法達成清潔效果的穩定性與確實性,更無法檢查到肉眼難見之灰塵。Several problems that can be understood by the conventional cleaning method are: the production volume of electronic components, with the popularity of the products, the output of millions or more than 100 million pieces, the manual cleaning, the efficiency and cost of manpower consumption. Can be imagined! Furthermore, manpower cannot achieve the stability and reliability of the cleaning effect, and it is impossible to check the dust that is hard to see by the naked eye.

爰是,本發明之目的,在於提供一種可對一載板中待清潔元 件之待清潔面進行清潔的清潔裝置。Therefore, the object of the present invention is to provide a unit to be cleaned in a carrier. A cleaning device for cleaning the surface to be cleaned.

本發明另一目的,在於提供一種可對一載板中待清潔元件之待清潔面進行清潔的清潔方法。Another object of the present invention is to provide a cleaning method for cleaning a surface to be cleaned of a component to be cleaned in a carrier.

依據本發明目的之清潔裝置,可對一載板中待清潔元件之待清潔面進行清潔,包括:一作業軌道,其位於機台台面上,其形成可供該設有待清潔元件之載板移送的輸送流路;作業軌道上提供一檢測區及一第一清潔區;一檢測機構,設於相對該作業軌道之檢測區,包括可進行位移之一檢測裝置,可對位於該檢測區之載板進行檢測;一第一清潔機構,設於相對該作業軌道之第一清潔區,包括由多數個可作Z軸向昇降刷毛之清潔組件構成的第一清潔模組,可對該載板中待清潔元件之待清潔面進行清潔,並作Y軸向位移進入一第二清潔區,以使其上可作Z軸向昇降之刷毛受一第二清潔機構清潔。According to the cleaning device of the present invention, the surface to be cleaned of the component to be cleaned in a carrier plate can be cleaned, comprising: a working track on the surface of the machine table, which is formed to be transported by the carrier plate provided with the component to be cleaned a conveying flow path; a detecting area and a first cleaning area are provided on the working track; a detecting mechanism is disposed in the detecting area opposite to the working track, and includes a detecting device capable of performing displacement, which can be located in the detecting area The board is inspected; a first cleaning mechanism is disposed in the first cleaning area opposite to the working track, and includes a first cleaning module composed of a plurality of cleaning components capable of Z-axis lifting bristles, which can be in the carrier board The surface to be cleaned of the component to be cleaned is cleaned and displaced into the second cleaning zone by Y-axis displacement so that the bristles on which the Z-axis can be lifted and lowered are cleaned by a second cleaning mechanism.

依據本發明另一目的之清潔方法,包括:一入料步驟,將已載有待清潔元件之載板置於一作業軌道上一檢測區;一檢測步驟,使一檢測機構中之檢測裝置對該載板中待清潔元件之待清潔面進行檢測;一清潔步驟,移動載板在作業軌道上另一第一清潔區受一第一清潔機構依檢測機構檢測結果,對待清潔元件之待清潔面進行清潔;該清潔步驟中,更包括一將第一清潔模組作Y軸向位移進入一第二清潔區,以使其上可作Z軸向昇降之刷毛受一第二清潔機構清潔的步驟。A cleaning method according to another object of the present invention comprises: a feeding step of placing a carrier plate carrying an element to be cleaned on a working track; a detecting step of causing a detecting device in a detecting mechanism The surface to be cleaned of the component to be cleaned in the carrier is tested; in a cleaning step, the other first cleaning zone of the moving carrier on the working track is subjected to a detection by the first cleaning mechanism according to the detection mechanism, and the surface to be cleaned of the component to be cleaned is performed. The cleaning step further comprises the step of displaceing the first cleaning module into the second cleaning zone by Y axially, so that the bristles on which the Z-axis can be lifted and lowered are cleaned by a second cleaning mechanism.

本發明實施例之清潔裝置及清潔方法,由於待清潔元件的待清潔面藉由檢測機構作細微的污塵檢查,避免人力檢查的難以勝任,同時也由第一清潔機構在受控制下逐一自動地對待清潔元件尚有污塵的待清潔面進行清潔,不僅迅速、確實,同時將人力有效的精省,也免除人力可能的不穩定性使類如量大、細小的部件清潔更有效率及確實。In the cleaning device and the cleaning method of the embodiment of the present invention, since the surface to be cleaned of the component to be cleaned is inspected by the detecting mechanism for fine dust, the manual inspection is difficult to perform, and the first cleaning mechanism is automatically controlled by the first cleaning mechanism. Clean the surface to be cleaned with cleaned parts, not only quickly and surely, but also saves manpower effectively, and also eliminates the possibility of human instability, making the parts such as large and small parts clean and more efficient. indeed.

1‧‧‧清潔裝置1‧‧‧ cleaning device

11‧‧‧作業軌道11‧‧‧Work track

111‧‧‧滑軌111‧‧‧Slide rails

112‧‧‧檢測區112‧‧‧Detection area

113‧‧‧第一清潔區113‧‧‧First cleaning area

114‧‧‧第一限位元件114‧‧‧First limit element

115‧‧‧第二限位元件115‧‧‧Second limit element

116‧‧‧第一定位元件116‧‧‧First positioning element

117‧‧‧第二定位元件117‧‧‧Second positioning element

12‧‧‧機台台面12‧‧‧ machine counter

13‧‧‧載板13‧‧‧ Carrier Board

14‧‧‧第二清潔區14‧‧‧Second cleaning area

141‧‧‧第二清潔機構141‧‧‧Second cleaning agency

15‧‧‧檢測機構15‧‧‧Test institutions

151‧‧‧X軸向滑軌151‧‧‧X axial slide

152‧‧‧Y軸向滑軌152‧‧‧Y axial slide

153‧‧‧檢測裝置153‧‧‧Detection device

154‧‧‧紅外線光源154‧‧‧Infrared light source

155‧‧‧CCD鏡頭155‧‧‧CCD lens

16‧‧‧第一清潔機構16‧‧‧First cleaning agency

161‧‧‧Y軸向滑軌161‧‧‧Y axial slide

2‧‧‧待清潔元件2‧‧‧ components to be cleaned

21‧‧‧待清潔面21‧‧‧cleaning surface

A‧‧‧第一清潔模組A‧‧‧First cleaning module

A1‧‧‧清潔組件A1‧‧‧ cleaning components

A11‧‧‧刷桿A11‧‧‧ brush bar

A111‧‧‧氣道A111‧‧‧ airway

A12‧‧‧刷毛A12‧‧‧ bristles

A13‧‧‧刷頭A13‧‧‧ brush head

A131‧‧‧氣孔A131‧‧‧ stomata

A14‧‧‧固定件A14‧‧‧Fixed parts

A15‧‧‧樞桿A15‧‧‧ pivot

A151‧‧‧下固定座A151‧‧‧ lower seat

A152‧‧‧上固定座A152‧‧‧上固定座

A16‧‧‧軸套A16‧‧‧ bushing

A17‧‧‧驅動件A17‧‧‧ drive parts

A171‧‧‧缸桿A171‧‧‧Cylinder rod

A172‧‧‧頂抵件A172‧‧‧Parts

A18‧‧‧樞輪A18‧‧‧ pivot

A181‧‧‧上輪座A181‧‧‧上轮座

A182‧‧‧下輪座A182‧‧‧ lower wheel seat

A2‧‧‧框架A2‧‧‧ framework

A21‧‧‧上框架A21‧‧‧上上

A22‧‧‧下框架A22‧‧‧ lower frame

A3‧‧‧旋轉驅動機構A3‧‧‧Rotary drive mechanism

A31‧‧‧馬達A31‧‧‧Motor

A32‧‧‧皮帶A32‧‧‧Land

B‧‧‧負壓氣體B‧‧‧Negative pressure gas

第一圖係本發明實施例之清潔裝置立體示意圖。The first figure is a schematic perspective view of a cleaning device according to an embodiment of the present invention.

第二圖係本發明實施例之清潔裝置中檢測機構及第一清潔機構立體示意圖。The second figure is a perspective view of the detecting mechanism and the first cleaning mechanism in the cleaning device of the embodiment of the present invention.

第三圖係本發明實施例之清潔裝置中第一清潔機構之第一清潔模組立體示意圖。The third figure is a perspective view of the first cleaning module of the first cleaning mechanism in the cleaning device of the embodiment of the present invention.

第四圖係本發明實施例之清潔裝置中第一清潔機構之第一清潔模組的清潔組件立體示意圖。The fourth figure is a perspective view of the cleaning assembly of the first cleaning module of the first cleaning mechanism in the cleaning device of the embodiment of the present invention.

第五圖係本發明實施例中各清潔組件上刷毛被驅動上、下位移之示意圖。The fifth figure is a schematic diagram of the upper and lower displacements of the bristles on the cleaning components in the embodiment of the present invention.

第六圖係本發明實施例中植設有多數刷毛之刷頭立體示意圖。The sixth figure is a perspective view of a brush head in which a plurality of bristles are implanted in the embodiment of the present invention.

第七圖係本發明實施例中刷毛對待清潔元件清潔及以氣體噴吹之示意圖。The seventh figure is a schematic view of the cleaning of the bristles to be cleaned and sprayed with gas in the embodiment of the present invention.

第八圖係本發明實施例中第二清潔機構之滾刷對第一清潔機構中刷毛進行清潔及負壓吸取污塵之示意圖。The eighth figure is a schematic view of the brush of the second cleaning mechanism in the embodiment of the present invention for cleaning the bristles in the first cleaning mechanism and sucking the dust under the negative pressure.

請參閱第一、二圖所示,本發明實施例之清潔方法可使用如圖所示之清潔裝置1執行,包括:一作業軌道11,其位於機台台面12上方,由二滑軌111相隔間距以X軸向平行設置,其形成可供載板13在X軸向左右移送之輸送流路;作業軌道11上提供一檢測區112及一第一清潔區113;作業軌道11在一側滑軌111上,設有分別各位在檢測區112及第一清潔區113處,可受驅動旋轉置入載板13輸送流路中,以擋抵定位載板13在X軸向位置之第一限位元件114、第二限位元件115;作業軌道11上第一清潔區113處的二滑軌111側,各設有可受驅動壓夾定位載板13以避免晃動之第一定位元件116、第二定位元件117; 一第二清潔區14,設於機台台面12上方的該作業軌道11外,其相對位於該作業軌道11之第一清潔區113的Y軸向位置,並為相對於操作人員所站位置之後側,該第二清潔區14中設有一可受驅動進行旋轉之滾刷所構成的第二清潔機構141,第二清潔機構141之滾刷軸向與該作業軌道11平行;一檢測機構15,設於機台台面12下方相對該作業軌道11之檢測區112的Z軸向位置,包括可藉一X軸向滑軌151及一Y軸向滑軌152進行位移之一檢測裝置153,其可為配置有紅外線光源154之CCD鏡頭155,可對位於該檢測區112之載板13進行紅外線光源投射及檢測;一第一清潔機構16,設於機台台面12下方相對該作業軌道11之第一清潔區113的Z軸向位置,包括可藉一Y軸向滑軌161進行位移至相對該第二清潔區14之第二清潔機構141之滾刷下方的Z軸向位置之一第一清潔模組A。Referring to the first and second figures, the cleaning method of the embodiment of the present invention can be performed by using the cleaning device 1 as shown, comprising: a working track 11 located above the machine table 12, separated by two sliding rails 111. The spacing is arranged in parallel with the X-axis, which forms a conveying flow path for the carrier plate 13 to be transported left and right in the X-axis direction; the detecting track 11 and a first cleaning zone 113 are provided on the working track 11; the working track 11 is slid on one side The rails 111 are respectively provided at the detecting area 112 and the first cleaning area 113, and can be driven to be inserted into the conveying path of the carrier 13 to block the first position of the positioning carrier 13 in the X-axis position. The positional element 114, the second limiting element 115, and the two sliding rails 111 on the first cleaning zone 113 of the working rail 11 are respectively provided with a first positioning component 116 that can be driven by the clamping clamp to position the carrier 13 to avoid shaking. a second positioning element 117; a second cleaning zone 14 is disposed outside the working rail 11 above the machine table 12, and is located opposite to the Y-axis position of the first cleaning zone 113 of the working rail 11 and is opposite to the position of the operator. a second cleaning mechanism 141 formed by a roller that can be driven to rotate, and a roller axial direction of the second cleaning mechanism 141 is parallel to the working rail 11; a detecting mechanism 15, The Z-axis position disposed below the machine table 12 relative to the detection area 112 of the work track 11 includes a displacement detecting device 153 that can be displaced by an X-axis slide rail 151 and a Y-axis slide rail 152. For the CCD lens 155 having the infrared light source 154, the infrared light source can be projected and detected on the carrier 13 located in the detection area 112; a first cleaning mechanism 16 is disposed under the machine table 12 opposite to the working track 11 The Z-axis position of a cleaning zone 113 includes one of the Z-axis positions that can be displaced by a Y-axis slide rail 161 to the underside of the roller brush of the second cleaning mechanism 141 of the second cleaning zone 14 Module A.

請參閱第三、四圖,該第一清潔模組A係由多數個清潔組件A1所構成,本實施例中採八個清潔組件A1共同組架於一框架A2中,並共同被馬達A31及皮帶A32所構成的旋轉驅動機構A3所驅動,使各清潔組件A1上之刷桿A11被同步旋轉驅動,以帶動刷桿A11上方之一植設有多數刷毛A12之刷頭A13旋轉;各清潔組件A1各包括:供所述刷桿A11樞設並上、下伸移且與框架A2之上框架A21固設的固定件A14,以及供四支樞桿A15樞設而各設於框架A2之下框架A22的四個軸套A16;各樞桿A15伸於下框架A22的下方並於底端共同設於一下固定座A151,各樞桿A15同時伸於下框架A22的上方與上框架A21之間,並於上端共同設於一上固定座A152;所述下固定座A151下方設有一氣壓缸構成的驅動件A17,其缸桿A171伸於下固定座A151上方,並於其上端部嵌設一頂抵件A172可伸抵框架A2之下框架A22,而所述上固定座A152則供所述刷桿A11樞設但與刷桿A11定位並連動;在固定件A14與上 固定座A152間的刷桿A11上設有一樞輪A18,樞輪A18的旋轉可連動其所固設之刷桿A11在固定件A14與上固定座A152上相對樞轉。Referring to the third and fourth figures, the first cleaning module A is composed of a plurality of cleaning components A1. In this embodiment, eight cleaning components A1 are collectively assembled in a frame A2, and are jointly driven by the motor A31 and The rotary drive mechanism A3 of the belt A32 is driven to synchronously rotate the brush rod A11 on each cleaning assembly A1 to drive the brush head A13 of the brush holder A11 to be provided with a plurality of bristles A12 to rotate; each cleaning assembly Each of the A1 includes: a fixing member A14 for pivoting the brush bar A11 and extending upward and downward and fixed to the frame A21 above the frame A2, and for pivoting the four pivot rods A15 and each of them is disposed under the frame A2. The four sleeves A16 of the frame A22; each of the pivot rods A15 extends below the lower frame A22 and is disposed at the bottom end of the lower frame A151. The pivot rods A15 extend between the upper frame A22 and the upper frame A21. The upper end of the lower fixing base A151 is provided with a driving member A17 formed by a pneumatic cylinder. The cylinder rod A171 extends above the lower fixing base A151 and is embedded at the upper end portion thereof. The abutting member A172 can reach the frame A22 below the frame A2, and the upper fixing seat A152 The brush is pivoted lever A11 A11 but stems positioned and interlocked; and on the fixed member A14 A pivot wheel A18 is disposed on the brush rod A11 between the fixing bases A152. The rotation of the pivot wheel A18 can interlock the relative movement of the brush rod A11 on the fixing member A14 and the upper fixing base A152.

請參閱第三、五圖,各清潔組件A1的樞輪A18各包括上輪座A181與下輪座A182,相鄰之兩清潔組件A1共同以一皮帶A32套設於上輪座A181或下輪座A182,以彼此連動,而最靠近馬達A31的清潔組件A1,其樞輪A18則直接以皮帶A32受馬達A31驅動旋轉;各清潔組件A1的驅動件A17可受控制各自驅動以缸桿A171凸伸,而以端部之頂抵件A172伸抵框架A2之下框架A22,使相對地令各樞桿A15連動上固定座A152、刷桿A11、植設有多數刷毛A12之刷頭A13等一併下移;反之,各清潔組件A1的驅動件A17受控制各自驅動以缸桿A171內縮時,上固定座A152、刷桿A11、植設有多數刷毛A12之刷頭A13等一併上頂;在本實施例中,可控制各清潔組件A1的刷桿A11、植設有多數刷毛A12之刷頭A13等的上頂、下移,採八個同時、僅偶數、僅奇數、僅單一之多種操作模式。Referring to the third and fifth figures, the pivot A18 of each cleaning assembly A1 includes an upper wheel base A181 and a lower wheel base A182, and the adjacent two cleaning assemblies A1 are collectively sleeved on the upper wheel base A181 or the lower wheel by a belt A32. The seat A182 is interlocked with each other, and the cleaning assembly A1 closest to the motor A31 has its pivot A18 directly driven by the motor A31 by the belt A32; the driving member A17 of each cleaning assembly A1 can be controlled to be driven by the cylinder rod A171. Stretching, and the top abutting member A172 extends to the frame A22 below the frame A2, so that the pivots A15 are relatively interlocked with the upper mount A152, the brush bar A11, the brush head A13 implanted with a plurality of bristles A12, and the like. And when the driving member A17 of each cleaning component A1 is controlled to drive the cylinder rod A171 to be retracted, the upper fixing seat A152, the brush rod A11, the brush head A13 implanted with the majority of the bristles A12, etc. In this embodiment, the upper and lower movements of the brush bar A11 of each cleaning component A1, the brush head A13 of the majority of the bristles A12, and the like can be controlled, and eight simultaneous, only even, only odd, only single Multiple operating modes.

本發明實施例在實施上,包括以下步驟:一入料步驟,操作者可將已載有待清潔元件2之載板13以各待清潔面21朝下的方式置於清潔裝置1之作業軌道11上第二限位元件115所限位的檢測區112處;一檢測步驟,該檢測機構15中配置有紅外線光源154之CCD鏡頭155將在X軸向滑軌151及Y軸向滑軌152進行位移,以對該載板13上待清潔元件2之待清潔面21進行紅外線光源投射及檢測;一清潔步驟,然後載板13將在作業軌道11上被移位至第一清潔區113的第一限位元件114處被限位,並受第一、二定位元件116、117壓夾定位載板13以避免晃動;此時,第一清潔機構16之第一清潔模組A將依檢測機構15紅外線光源154之CCD鏡頭155檢測結果,針對待清潔面21有灰塵之待清 潔元件2所對應之清潔組件A1,該清潔組件A1的驅動件A17將驅動使刷桿A11上移以刷頭A13上刷毛A12對該對應之待清潔元件2的待清潔面21進行旋轉撥刷,同時配合Y軸向滑軌161進行位移以逐列對應有灰塵之待清潔元件2進行清潔之撥刷作業,直到整個載板13上被檢測有灰塵的各待清潔元件2之待清潔面21皆完成清潔;完成清潔後的載板13將在作業軌道11上再度被移回第二限位元件115所限位的檢測區112,以被檢測機構15中配置有紅外線光源154之CCD鏡頭155進行再一次的檢測,以確認是否已完全符合預設的無塵要求;而載板13被移回檢測區112處時,第一清潔機構16之第一清潔模組A將經Y軸向滑軌161位移至相對該第二清潔區14之第二清潔機構141之滾刷下方,各清潔組件A1的驅動件A17將同時驅動,使各刷桿A11上移以刷頭A13上刷毛A12上昇被該第二清潔機構141之滾刷進行滾掃,以去除刷毛A12上的污塵,然後再由Y軸向滑軌161回復原位進行下一循環之清潔作業。The embodiment of the present invention includes the following steps: a feeding step, the operator can place the carrier 13 carrying the component 2 to be cleaned on the working track 11 of the cleaning device 1 with each surface 21 to be cleaned facing downward. The detecting portion 112 of the upper limiting member 115 is limited; in the detecting step, the CCD lens 155 of the detecting mechanism 15 configured with the infrared light source 154 is to be performed on the X-axis slide rail 151 and the Y-axis slide rail 152. Displacement to perform infrared light source projection and detection on the surface 21 to be cleaned of the component 2 to be cleaned on the carrier 13; a cleaning step, then the carrier 13 will be displaced on the work track 11 to the first cleaning zone 113 A limiting component 114 is constrained, and the first and second positioning components 116, 117 are clamped to position the carrier 13 to avoid shaking; at this time, the first cleaning module A of the first cleaning mechanism 16 will be in accordance with the detecting mechanism. 15 infrared light source 154 CCD lens 155 detection results, for the surface 21 to be cleaned, there is dust to be cleared The cleaning component A1 corresponding to the cleaning component 2, the driving component A17 of the cleaning component A1 will drive the brush bar A11 up to the brush A11 on the brush head A13 to rotate the brush 21 to be cleaned on the corresponding component 2 to be cleaned 2 At the same time, the Y-axis slide rail 161 is displaced to correspond to the dust-cleaning component 2 to be cleaned, and the cleaning surface 21 of each component to be cleaned 2 on which the dust is detected on the entire carrier 13 The cleaning is completed; the cleaned carrier 13 is again moved back to the detection area 112 where the second limiting element 115 is located on the working track 11, so that the CCD lens 155 of the detecting mechanism 15 is provided with the infrared light source 154. Perform another test to confirm whether the preset dust-free requirement has been fully met; and when the carrier 13 is moved back to the detection zone 112, the first cleaning module A of the first cleaning mechanism 16 will slide through the Y-axis. The rail 161 is displaced to the lower side of the roller brush of the second cleaning mechanism 141 of the second cleaning zone 14, and the driving members A17 of the cleaning assemblies A1 are simultaneously driven, so that the brush bars A11 are moved up to raise the bristles A12 on the brush head A13. The roller of the second cleaning mechanism 141 is swept to go In addition to the dust on the bristles A12, the Y-axis slide rails 161 are then returned to the original position for the next cycle of cleaning operations.

請參閱第六、七圖,各刷頭A13上可設有氣孔A131,同時刷桿A11中亦設有氣道A111,藉由在氣道A111中通入氣體使其由刷頭A13上氣孔A131噴出,以在刷毛A12進行待清潔元件2的待清潔面21旋轉撥刷時,可同時以氣體噴沖待清潔面21上被撥刷下的污塵,使待清潔元件2的待清潔面21更乾淨;同樣的方法,亦可如第八圖所示,在該第二清潔機構141之滾刷進行滾掃各清潔組件A1各刷桿A11上刷毛A12時,以負壓氣體B將被揚起的污塵予以吸除,使各刷毛A12可以保持清潔。Please refer to the sixth and seventh figures. Each brush head A13 can be provided with a vent A131, and the brush rod A11 is also provided with an air passage A111. The gas is blown into the air passage A111 to be ejected from the air hole A131 of the brush head A13. When the bristles A12 are rotated on the surface 21 to be cleaned of the component 2 to be cleaned, the dust on the surface to be cleaned 21 can be simultaneously blown with gas to make the surface 21 to be cleaned 2 clean. In the same way, as shown in the eighth figure, when the roller brush of the second cleaning mechanism 141 performs the pulsing of the bristles A12 on the brush rods A11 of the cleaning components A1, the negative pressure gas B will be lifted. The dust is sucked off so that each bristles A12 can be kept clean.

本發明實施例之清潔裝置及清潔方法,由於待清潔元件2的待清潔面21藉由檢測機構15作細微的污塵檢查,避免人力檢查的難以勝任,同時也由第一清潔機構16在受控制下逐一自動地對待清潔元件2尚有污塵 的待清潔面21進行清潔,不僅迅速、確實,同時將人力有效的精省,也免除人力可能的不穩定性使類如量大、細小的部件清潔更有效率及確實。In the cleaning device and the cleaning method of the embodiment of the present invention, since the surface 21 to be cleaned of the component to be cleaned 2 is subjected to fine dust inspection by the detecting mechanism 15, it is difficult to perform manual inspection, and the first cleaning mechanism 16 is also subjected to Automatically treat the cleaning element 2 one by one under control, there is still dust The cleaning surface 21 to be cleaned is not only quick and reliable, but also saves the manpower effectively, and also eliminates the possibility of human instability, which makes the cleaning of the large and small parts more efficient and reliable.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

1‧‧‧清潔裝置1‧‧‧ cleaning device

11‧‧‧作業軌道11‧‧‧Work track

111‧‧‧滑軌111‧‧‧Slide rails

112‧‧‧檢測區112‧‧‧Detection area

113‧‧‧第一清潔區113‧‧‧First cleaning area

114‧‧‧第一限位元件114‧‧‧First limit element

115‧‧‧第二限位元件115‧‧‧Second limit element

116‧‧‧第一定位元件116‧‧‧First positioning element

117‧‧‧第二定位元件117‧‧‧Second positioning element

12‧‧‧機台台面12‧‧‧ machine counter

13‧‧‧載板13‧‧‧ Carrier Board

14‧‧‧第二清潔區14‧‧‧Second cleaning area

141‧‧‧第二清潔機構141‧‧‧Second cleaning agency

15‧‧‧檢測機構15‧‧‧Test institutions

151‧‧‧X軸向滑軌151‧‧‧X axial slide

152‧‧‧Y軸向滑軌152‧‧‧Y axial slide

153‧‧‧檢測裝置153‧‧‧Detection device

154‧‧‧紅外線光源154‧‧‧Infrared light source

155‧‧‧CCD鏡頭155‧‧‧CCD lens

16‧‧‧第一清潔機構16‧‧‧First cleaning agency

161‧‧‧Y軸向滑軌161‧‧‧Y axial slide

A‧‧‧第一清潔模組A‧‧‧First cleaning module

Claims (14)

一種清潔裝置,可對一載板中待清潔元件之待清潔面進行清潔,包括:一作業軌道,其位於機台台面上,其形成可供該設有待清潔元件之載板移送的輸送流路;作業軌道上提供一檢測區及一第一清潔區;一檢測機構,設於相對該作業軌道之檢測區,包括可進行位移之一檢測裝置,可對位於該檢測區之載板進行檢測;一第一清潔機構,設於相對該作業軌道之第一清潔區,包括由多數個可作Z軸向昇降刷毛之清潔組件構成的第一清潔模組,可對該載板中待清潔元件之待清潔面進行清潔,並作Y軸向位移進入一第二清潔區,以使其上可作Z軸向昇降之刷毛受一第二清潔機構清潔。 A cleaning device for cleaning a surface to be cleaned of a component to be cleaned in a carrier, comprising: a working track on the surface of the machine table, which forms a conveying flow path for the carrier plate to be cleaned Providing a detection area and a first cleaning area on the working track; a detecting mechanism disposed on the detecting area opposite to the working track, comprising one of detecting a displacement device, capable of detecting the carrier plate located in the detecting area; a first cleaning mechanism is disposed in the first cleaning area opposite to the working track, and includes a first cleaning module composed of a plurality of cleaning components capable of lifting the bristles in the Z-axis, and the components to be cleaned in the carrier The surface to be cleaned is cleaned and displaced into the second cleaning zone by Y-axis displacement so that the bristles on which the Z-axis can be lifted and lowered are cleaned by a second cleaning mechanism. 如申請專利範圍第1項所述清潔裝置,其中,該第二清潔區設於作業軌道外,該第二清潔機構設於第二清潔區中。 The cleaning device of claim 1, wherein the second cleaning zone is disposed outside the work track, and the second cleaning mechanism is disposed in the second cleaning zone. 如申請專利範圍第1項所述清潔裝置,其中,該清潔組件,其可被一旋轉驅動機構所驅動而使其上一刷桿被旋轉驅動,以帶動刷桿之一刷頭上刷毛旋轉。 The cleaning device of claim 1, wherein the cleaning assembly is drivable by a rotary drive mechanism such that the upper brush bar is rotationally driven to drive the bristles on the brush head to rotate. 如申請專利範圍第1項所述清潔裝置,其中,多數個該清潔組件共同組架於一框架中及被一旋轉驅動機構所驅動,各清潔組件上設有刷桿被同步旋轉驅動,以帶動刷桿之一刷頭上刷毛旋轉。 The cleaning device of claim 1, wherein a plurality of the cleaning components are collectively mounted in a frame and driven by a rotary driving mechanism, and the cleaning components are respectively provided with the brush bars being synchronously rotated to drive One of the brush rods rotates on the brush head. 如申請專利範圍第4項所述清潔裝置,其中,該清潔組件包括:供所述刷桿樞設且與框架之一上框架固設的固定件,以及供複數支樞桿樞設而各設於框架之下框架的複數個軸套。 The cleaning device of claim 4, wherein the cleaning assembly comprises: a fixing member for pivoting the brush bar and fixed to a frame on one of the frames, and each of the plurality of pivots is pivoted A plurality of bushings of the frame below the frame. 如申請專利範圍第5項所述清潔裝置,其中,該各樞桿伸於下框架的下方並於底端共同設於一下固定座,各樞桿同時伸於下框架的上方與上框架之間,並於上端共同設於一上固定座。 The cleaning device of claim 5, wherein the pivots extend below the lower frame and are disposed at a lower end of the lower base, and the pivots extend between the upper frame and the upper frame at the same time. And at the upper end jointly set on a fixed seat. 如申請專利範圍第6項所述清潔裝置,其中,該所述下固定座下方設有一氣壓缸構成的驅動件,其缸桿伸於下固定座上方,並於其上端部嵌設一頂抵件可伸抵框架之下框架,而所述上固定座則供所述刷桿樞設但與刷桿定位並連動。 The cleaning device of claim 6, wherein a driving member formed by a pneumatic cylinder is disposed under the lower fixing seat, and the cylinder rod extends above the lower fixing seat, and a top portion is embedded in the upper end portion thereof. The piece can extend to the frame below the frame, and the upper mount is for the brush bar to be pivoted but positioned and interlocked with the brush bar. 如申請專利範圍第6項所述清潔裝置,其中,該固定件與上固定座間的刷桿上設有一樞輪,樞輪的旋轉可連動其所固設之刷桿在固定件與上固定座上相對樞轉。 The cleaning device of claim 6, wherein the brush bar between the fixing member and the upper fixing seat is provided with a pivot wheel, and the rotation of the pivot wheel can interlock the fixing brush rod on the fixing member and the upper fixing seat. Relatively pivoted on. 一種清潔方法,包括:一入料步驟,將已載有待清潔元件之載板置於一作業軌道上一檢測區;一檢測步驟,使一檢測機構中之檢測裝置對該載板中待清潔元件之待清潔面進行檢測;一清潔步驟,移動載板在作業軌道上另一第一清潔區受一第一清潔機構依檢測機構檢測結果,對待清潔元件之待清潔面進行清潔;該清潔步驟中,更包括一將第一清潔模組作Y軸向位移進入一第二清潔區,以使其上可作Z軸向昇降之刷毛受一第二清潔機構清潔的步驟。 A cleaning method comprising: a feeding step of placing a carrier plate carrying an element to be cleaned on a working track; a detecting step of causing a detecting device in a detecting mechanism to clean the component in the carrier The cleaning surface is inspected; in a cleaning step, the moving carrier is cleaned on the working track by the first cleaning mechanism according to the detection result of the detecting mechanism, and the surface to be cleaned of the cleaning component is cleaned; The method further includes the step of disposing the first cleaning module Y-axis into a second cleaning zone, so that the bristles on which the Z-axis can be lifted and lowered are cleaned by a second cleaning mechanism. 如申請專利範圍第9項所述清潔方法,其中,該作業軌道呈X軸向位移載板,該清潔步驟中,第一清潔機構以一可作Y軸向位移之第一清潔模組進行清潔,清潔時以具有可作Z軸向昇降刷毛之清潔組件進行。 The cleaning method of claim 9, wherein the working track is an X-axis displacement carrier, and in the cleaning step, the first cleaning mechanism is cleaned by a first cleaning module that can be displaced in the Y-axis direction. When cleaning, it is carried out with a cleaning assembly that can be used as a Z-axis lifting bristles. 如申請專利範圍第10項所述清潔方法,其中,該清潔組件之刷毛更進行一被驅動旋轉的清潔操作。 The cleaning method of claim 10, wherein the bristles of the cleaning assembly are further subjected to a cleaning operation of being driven to rotate. 如申請專利範圍第10項所述清潔方法,其中,該清潔步驟中,更包括一完成清潔後的載板將在作業軌道上再度被移回檢測區,以被檢測機構進行再一次檢測的步驟。 The cleaning method according to claim 10, wherein the cleaning step further comprises the step of removing the carrier after the cleaning is to be moved back to the detection area on the working track to perform the detection again by the detecting mechanism. . 如申請專利範圍第9項所述清潔方法,其中,該清潔步驟中,更包括一以氣體噴沖待清潔元件之待清潔面的步驟。 The cleaning method of claim 9, wherein the cleaning step further comprises the step of jetting a gas to the surface to be cleaned of the component to be cleaned. 如申請專利範圍第9項所述清潔方法,其中,該第二清潔機構清潔的步驟,更包括一在該第二清潔機構進行清潔刷毛時,以負壓氣體將被揚起的污塵予以吸除之步驟。 The cleaning method of claim 9, wherein the cleaning step of the second cleaning mechanism further comprises: when the second cleaning mechanism performs cleaning bristles, suctioning the raised dust with a negative pressure gas In addition to the steps.
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