TWI240392B - Process for packaging and stacking multiple chips with the same size - Google Patents

Process for packaging and stacking multiple chips with the same size Download PDF

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Publication number
TWI240392B
TWI240392B TW093125404A TW93125404A TWI240392B TW I240392 B TWI240392 B TW I240392B TW 093125404 A TW093125404 A TW 093125404A TW 93125404 A TW93125404 A TW 93125404A TW I240392 B TWI240392 B TW I240392B
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Taiwan
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wafer
chip
cured resin
semi
item
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TW093125404A
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Chinese (zh)
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TW200532873A (en
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Tsung-Yueh Tsai
Chin-Ti Chou
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Advanced Semiconductor Eng
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/27Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/2612Auxiliary members for layer connectors, e.g. spacers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48471Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area being a ball bond, i.e. wedge-to-ball, reverse stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48475Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball
    • H01L2224/48476Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area
    • H01L2224/48477Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding)
    • H01L2224/48478Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball
    • H01L2224/48479Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83191Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

A process for packaging and stacking multiple chips with the same size is disclosed. A partially-cured resin is coated on a wafer, and then the wafer is cut to form a plurality of chips. The partially-cured resin under one of the chips is bonded to a substrate or an active surface of another lower chip. A plurality of bonding wires electrically connect the chip with the substrate. Each bonding wire has a ball end bonded on the substrate and a wiring end bonded on the active surface of the chip. During chip-to-chip stacking, the partially-cured resin between the two chips is melted under heat to seal the wiring ends, so that the wiring ends breaking will not easily occur during molding. Moreover, more chips with the same size can be stacked in a limited package thickness.

Description

1240392 五、發明說明(1) 【發明所屬之技術領域 本發明係有關於一種包含有晶圓切割之多晶片堆疊封 咸製程,特別係有關於一種夕晶片同尺寸堆疊之封裝製 程。 【先前技術】 習知多晶片堆疊封裝係將複數個相同尺寸之半導體晶 片逐一往上堆疊在一基板上,並且該些半導體晶片之主^ 面係朝上,以利打線,而以打線形成之銲線係電性連接該 些晶片至該基板,如美國專利第5, 3 23, 〇6〇號所揭示之技" f ’為了防止該些銲線被上方堆疊之晶片壓迫,在晶片與 曰曰片之間應提供有一間隔材料(spacer),該間隔材料之高 f係需高於同一層銲線之弧高,此一間隔材料習知地可以 =聚亞醯胺膠帶(PI tape)、虛晶片(dummy chip) '金屬 貼:口 2曰151^1^)等等,在打線之前該間隔材料係預先黏 於ΪΠ: 主動面,但此一間隔材料之尺寸係必須小 之主動面,以顯露於下方晶片之銲,,方可使 ===,㈣此係造成該間隔材料對 在其周邊之打線支撐力不 乃 化,因此該多曰±4晶^足 方曰曰片的厚度亦無法薄 料係為必要的技術手段 =曰曰片與間隔材 之晶片數量為諸。 u予貝疋封敦厚度内可供堆疊 請參閱第1圖,目前當 曰 造!在-預定封襄厚度::用包:;:片第同=堆叠封裝構 日日片20及一基板3〇 a ΰ ^ 弟一 4第一日日片10之一背面12係黏貼在該 12403921240392 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a multi-chip stacking and sealing process including wafer dicing, and particularly relates to a packaging process of stacking wafers with the same size. [Prior art] The conventional multi-chip stacked package is a method of stacking a plurality of semiconductor wafers of the same size on a substrate one by one, and the main surface of the semiconductor wafers is facing up to facilitate wiring, and soldering formed by wiring The wire system electrically connects the wafers to the substrate, such as the technique disclosed in U.S. Patent No. 5, 3,23,006. &Quot; f 'In order to prevent the bonding wires from being pressed by the stacked wafers above, A spacer should be provided between the sheets. The height f of the spacer material should be higher than the arc height of the same layer of welding wire. This spacer material can be conventionally known as polyimide tape (PI tape), Virtual chip (dummy chip): Metal sticker: 151 ^ 1 ^ 2, etc., the spacer material is pre-adhered to the ΪΠ: active surface before wiring, but the size of this spacer material must be the small active surface. The solder exposed on the wafer below can only make the ===, which causes the spacer material to support the wire bonding around it. Therefore, the thickness of the ± 4 crystals is sufficient. It is also not possible to use thin materials as a necessary technical means. The number of spacer wafers varies. u You can stack within the thickness of the seal. Please refer to Figure 1, currently made! In-predetermined thickness of the seal :: use package :; 〇a ΰ ^ One of the first day of the first day of the 4th day of the 10th film 12 series stick to the 1240392

五、發明說明(2) 基板30之一上表面31,該第-晶片1〇之-主動面n周邊传 形成有複數個銲墊1 3,一如_曰u 動㈤η η逯係 該第一曰曰曰片1〇之主動面"而片/間隔材料50係貼設於 如丄^ 助面11而不覆盍該些銲墊13,再以藉勃 3。連接該第-晶片10之銲墊23至該基板 二隔材料50係高於該些銲線4◦之打線弧 球:4人ί 片20,此外,每i線4〇係具有-結 y , . ^ , 而 l知该些結球端41係形成於第一晶 塾13上’該些線尾端42係形成於該基板3〇: 談二該間隔材料50係具有相當之厚度,以使其高於 f曰;二:㈣之f兩」該第二晶片20之一背面22係黏貼於該 : ,習知該第二晶片20之複數個銲墊23係與第一 6 0 1 地形成在该主動面2丨之周邊,並以複數個銲線 = 塾23至該基板3〇之上表面31,由於該第二晶 ^二銲墊23之形成區域未能得到該間隔材料50之充 二^ ^ ^因此,該第二晶片2〇係具有相當之厚度,以避免 J ^形成該些銲線6〇時造成該第二晶片20斷折,以防止 ;、接失敗之問題,該第一晶片1 〇與該第二晶片20在堆 噠二電性連接之後習知地其係以一封膠體30密封,故在一 預定封裝厚度内可供堆疊之晶片數量為有限。 我國專利公告第563 9〇〇號「通用晶片規格之晶片堆疊 一 ς亡,露有另一種習知之多晶片堆疊封裝構造,其係以 ^八费Γ片堆疊在一基板上與並以銲線連接,一間隔層係 兀王蓋於該第一晶片之主動面固定該銲線之一端(結球V. Description of the invention (2) The upper surface 31 of one of the substrates 30, and a plurality of bonding pads 13 are formed around the -active surface n of the -wafer 10, as in the case of _ u u ㈤η η 逯 is the first The active surface of the sheet 10 is "the sheet / spacer material 50 is attached to the auxiliary surface 11 without covering the solder pads 13 and then 3". The bonding pad 23 connecting the first wafer 10 to the substrate two spacer material 50 is a wire arc that is higher than the bonding wires 4: 4 people 20 pieces. In addition, each i line 40 has a -knot y, ^, And it is known that the nodular ends 41 are formed on the first crystal chip 13 'these wire tail ends 42 are formed on the substrate 30: Tan 2 the spacer material 50 has a considerable thickness to make it It is higher than f; two: ㈣of f two "One of the back surface 22 of the second wafer 20 is adhered to the :, it is known that a plurality of pads 23 of the second wafer 20 are formed on the first 6 0 1 The periphery of the active surface 2 丨 and a plurality of bonding wires = 塾 23 to the upper surface 31 of the substrate 30. Due to the formation area of the second crystal bonding pad 23, it is not possible to obtain two of the spacer material 50. ^ ^ ^ Therefore, the second wafer 20 has a considerable thickness to avoid J ^ causing the second wafer 20 to break when forming the bonding wires 60 to prevent the problem of connection failure, the first After the wafer 10 and the second wafer 20 are electrically connected to each other, they are conventionally sealed with a gel 30, so the number of wafers that can be stacked within a predetermined package thickness is limited. China's Patent Bulletin No. 563 900 "The chip stack of the universal chip specification is dead, revealing another conventional multi-chip stacked package structure, which is stacked on a substrate with ^ eight charges and bonded with a wire. Connected, a spacer layer covers the active surface of the first chip to fix one end of the bonding wire (knot ball)

1240392 五、發明說明(3) 端)以減少發生沖線,習知銲線之結球端具有較強之結合 強度,以該間隔層包覆該些銲線之結球端仍有可能由該些 銲線之線尾端發生沖線,此外,由於在每一次黏晶與打線 之後均需要以印刷或塗佈方式重覆形成該間隔層,其係增 加了疊晶步驟,且該間隔層之平坦度與厚度無法均勻控1240392 V. Description of the invention (3) end) In order to reduce the occurrence of punching lines, it is known that the ball end of the welding wire has a strong bonding strength. It is still possible that the ball end of the welding wire covered with the spacer layer is covered by the welding Punching occurs at the end of the line. In addition, since the spacer layer needs to be repeatedly formed by printing or coating after each sticking and wire bonding, it increases the lamination step and the flatness of the spacer layer. And thickness cannot be controlled uniformly

制,並且在固化後該間隔層不具有黏性,必須在該間隔層 之上表面額外黏貼一膠帶以供一第二晶片疊設;當堆疊越 多晶片時,打線連接之銲墊位置與水平度越不容易被控 制’此外’在已打線完成之晶片之主動面上以印刷或塗佈 方式形成a亥間隔層,其形成該間隔層之治具(如網板)要避 開該些銲線,並且要形成該適當面積之間隔層於該晶片之 主動面,有實施上之困難與不可被利用性。 【發明内容】 本發明之主要目的係 之封裝製程,一半固化樹 晶片之背面,在 形成有該半固化 之一主動面,並 之銲墊,以降低 而包覆該些銲線 面,以取代習知 料,故在預定封 片,並且增進該 依本發明之 一晶圓切 樹脂之第 且複數個 之銲線弧 之線尾端 需要多道 裝厚度内 些銲線之 多晶片同 脂係形成於複數個在晶 割成複數個晶片之後, 一晶片黏接一基板或一 銲線之線尾端係連接於 高,且該半固化樹脂係 ,而形成於該第一晶片 製程方能形成之大厚度 可簡化步驟地堆疊更多 線尾端固定力。 尺寸堆疊之封裝製程, 尺寸堆疊 圓等級之 以其中一 第二晶片 該些晶片 受熱溶融 之主動 間隔材 數量之晶 主要包含 1240392 五、發明說明(4) 有:提供一半 面,該主動面 形成一半固化 以形成同尺寸 一晶片之背面 脂;接著,以 背面至一基板 接該第一晶片 端及一線尾端 線尾端係設於 晶片之半固化 主動面,其中 線之線尾端; 戶與該基板, 端,該些結球 於該第二晶片 加熱熔融該半 與該第二晶片 其係具有多晶 之功效。 【實施方式】 參閱所附 依據本發 第2A圖,首先 導體晶圓, 之晶片區域 樹脂於該晶 之至少一第 與該第二晶 該第'一晶片 之上表面; 與該基板, ,該些結球 該第一晶片 樹脂黏接該 吞亥半固化樹 接著,以複 其中每一第 端係設於該 之該些焊塾 固化樹脂之 ,以構成一 片堆疊、固 該晶圓 内係形 圓之背 一晶片 片之背 之半固 接著, 其中每 端係設 之該些 第二晶 脂係受 數個第 —鳄*線 基板之上,在後,以 多晶片 定銲線 係具有一主動面及 成有複數個銲塾; 面;接著 與至少一 面分別形 化樹脂黏 ,切割該 第—晶片 成有該半 接該第一 以複數個第一銲線 一第一銲線係具有 之上表面 於該基板 銲墊上; 片之背面 熱溶融而 二銲線電 係具有一 上表面, 重覆地打 一封膠體 同尺寸堆 之線尾端 接著,以 至該第一 包覆該些 性連接該 結球端及 該些線尾 線、堆疊 密封該第 疊之封裝 與減少疊 背 接著, 晶圓, ,該第 固化樹 晶片之 電性連 一結球 ,該些 該第二 晶片之 第一銲 第二 一線尾 端係設 晶片與 •曰 U 曰曰片 構造, 晶步驟 圖式,本發明將列 明之多晶片同尺寸 ,提供一半導體晶 舉以下之實施例說明。 堆疊之封裝製程,請參閱 圓110 ’該晶圓11〇係具有And the spacer layer does not have adhesiveness after curing, an additional tape must be pasted on the upper surface of the spacer layer for a second wafer to be stacked; when more wafers are stacked, the position and level of the bonding pads for wire bonding The more difficult it is to be controlled, in addition, to form a spacer layer by printing or coating on the active surface of the finished wafer. The jigs (such as stencils) that form the spacer layer must avoid the soldering. Line, and it is difficult and unavailable to form a spacer layer of the appropriate area on the active surface of the wafer. [Summary of the invention] The main purpose of the present invention is the packaging process. On the back of the semi-cured tree wafer, an active surface of the semi-cured surface is formed, and a bonding pad is used to lower and cover the bonding wire surfaces to replace Known materials, so in order to seal the sheet, and to promote the end of the first and the plurality of bonding wire arcs of a wafer cutting resin according to the present invention, multiple wafers of the same thickness with some bonding wires in the thickness are required. It is formed in a plurality of wafers. After the wafer is cut into a plurality of wafers, a wafer is bonded to a substrate or a wire end of the wire is connected to the high, and the semi-cured resin is formed on the first wafer process before it can be formed. The large thickness simplifies the steps of stacking more wire end fixing forces. Packaging process for size stacking. The size of the round stack size is one of the second wafers. The number of active spacers that are melted by the wafer mainly includes 1240392. 5. Description of the invention (4) Yes: Provide half of the surface, and the active surface forms half. Solidify to form the back grease of a wafer of the same size; then, connect the first wafer end and a wire tail end from the back to a substrate; the wire tail end is set on the semi-cured active surface of the wafer, wherein the wire tail end; The substrate, the ends, the balls are heated on the second wafer to melt the half and the second wafer, which has a polycrystalline effect. [Embodiment] Referring to the attached FIG. 2A of the present document, first, a wafer region of a conductor wafer has resin on at least one of the first and second crystals and the top surface of the first wafer; and the substrate, the The balls are bonded to the first wafer resin and bonded to the semi-cured tree. Then, each of the first ends is fixed to the solder-cured resins to form a stack, which fixes the inner circle of the wafer. The back of a wafer chip is semi-fixed, wherein each of the second crystalline lipids is supported on several first-crocodile wire substrates, and later, a multi-wafer fixed wire system has an active A surface and a plurality of bonding pads; a surface; and then forming a resin bond with at least one side respectively, cutting the first wafer to form the half-connected first with a plurality of first bonding wires and a first bonding wire having above The surface is on the substrate pad; the backside of the sheet is hot-melted and the two-bond wire electrical system has an upper surface, and the end of the wire with a colloid of the same size is repeatedly applied, and then the first cover is connected to the Knot ends and the line ends The first package and the second package are stacked and sealed. Then, the wafer, and the first cured tree wafer are electrically connected with a ball, and the first soldering of the second wafer and the second line end of the second wafer are provided with the wafer and • The U-chip structure, the crystal step pattern, the present invention will list a number of wafers with the same size, and provide a semiconductor crystal to illustrate the following examples. Stacked packaging process, please refer to Round 110 ’This wafer 11〇 has

1240392 五、發明說明(5) :主動面111及一背面丨丨2,該主動面i U之晶片區域内係 形成有複數個積體電路元件(圖未繪出)以及複數個銲墊 113 其中5玄晶圓110之主動面111係朝下放置於一晶圓載 〇210 ,叫參閱第2B圖,以一晶背研磨工具220研磨該晶圓 1 1 〇之背面1 1 2,可以使該晶圓丨丨〇之厚度例如到達6〜i 5 mi 1 (密耳,1丨ni 1約等於25· 4微米)之間。 接著,請參閱第2C與2D圖,形成一半固化樹脂丨22於 邊晶圓110之背面1 12,首先以旋塗(spin c〇ating)或印刷 方式藉由一塗膠工具2 3 0將一液態或膠稠態之未固化樹脂 121 ’如B-St age樹脂,塗施在該晶圓110之背面112,請再泰 參閱第2D圖,在一烘烤裝置240或照射裝置之作用下,將 该未固化樹脂1 2 1部分聚合反應為一半固化樹脂丨2 2,該半 固化樹脂1 22在不同溫度下將呈現半固態膠片與黏稠糊 狀’該半固化樹脂1 2 2之厚度係以介於3〜8 m i 1為較佳。 接著,請參閱第2 E圖,在該晶圓11 〇之背面11 2以一切 割膠帶2 5 0黏貼該半固化樹脂1 2 2,再進行切割該晶圓 110 ’請參閱第2F圖,以一切割刀具260切割該晶圓11〇, 以形成同尺寸之至少一第一晶片1 j 4與至少一第二晶片 1 1 5 ’在本實施例中,該晶圓1 1 〇係以切割成一第一晶片 114、一第二晶片1 1 5、一第三晶片1 1 6及一第四晶片11 7例钃丨 舉之,而每一晶片之背面(包含該第一晶片i i 4之背面j i 2a 與該第二晶片11 5之背面11 2 b )分別形成有該半固化樹脂 122a與12 2b,而每一晶片之主動面(包含該第一晶片114之 主動面111a與該第二晶片115之主動面lllb)分別形成有複1240392 V. Description of the invention (5): active surface 111 and a back surface 丨 2; a plurality of integrated circuit elements (not shown) and a plurality of solder pads 113 are formed in the chip area of the active surface i U The active side 111 of the 5 xuan wafer 110 is placed on a wafer carrier 210, facing down, as shown in FIG. 2B. A wafer back grinding tool 220 is used to polish the back surface 1 1 2 of the wafer 1 1 2 to make the crystal The thickness of the circle 丨 丨 〇 reaches, for example, 6 to 5 m 1 (mil, 1 to ni 1 is approximately equal to 25.4 micrometers). Next, refer to the 2C and 2D drawings to form a semi-cured resin. 22 is formed on the back surface of the edge wafer 110. 12 First, spin coating or printing is used to apply a glue tool 2 3 0. Uncured resin 121 ′, such as B-St age resin, is applied to the back surface 112 of the wafer 110 in a liquid or gel state. Please refer to FIG. 2D again, under the action of a baking device 240 or an irradiation device. The uncured resin 1 2 1 is partially polymerized into a semi-cured resin 丨 2 2. The semi-cured resin 1 22 will exhibit a semi-solid film and a thick paste at different temperatures. The thickness of the semi-cured resin 1 2 2 is based on Between 3 ~ 8 mi 1 is better. Next, please refer to FIG. 2E. On the back surface 11 2 of the wafer 11 〇, a dicing tape 2 50 is used to stick the semi-cured resin 1 2 2, and then the wafer 110 is cut. A cutting tool 260 cuts the wafer 110 to form at least one first wafer 1 j 4 and at least one second wafer 1 1 5 ′ in the same size. In this embodiment, the wafer 1 10 is cut into one wafer. Examples of the first wafer 114, a second wafer 1 15, a third wafer 1 16 and a fourth wafer 117, and the back of each wafer (including the back of the first wafer ii 4 ji) 2a and the back surface 11 2 b of the second wafer 11 5 are respectively formed with the semi-cured resins 122 a and 12 2b, and the active surface of each wafer (including the active surface 111 a of the first wafer 114 and the second wafer 115 The active surfaces (lllb) are respectively formed with complex

第11頁 1240392 五、發明說明(6) 數個銲墊1 1 3 a與1 1 3 b。當然在不同實施例中,一第一晶片 1 1 4及一第二晶片1 1 5亦可被分割自兩種不同之晶圓,而每 一晶圓之背面係形成有該半固化樹脂。其中,第—晶片 1 1 4與第二晶片1 1 5之尺寸大致相等,或第一晶片j j 4略大 (小)於第二晶片1 1 5。 接著,請參閱第2G圖,以在該第一晶片丨丨4下方之半 固化樹脂1 2 2 a將該第一晶片11 4之背面11 2 a黏接至一基板 130之上表面1 31,該基板130係可為陶瓷、玻璃纖維強化 樹脂、聚亞醯胺材質之電路板,在本實施例中,該基板 130係為一種球格陣列封裝基板,在該基板13〇之上表面 131與下表面分別形成有連接墊132與接球墊(圖未繪出), 此外,亦可以習知之黏膠或膠帶將該第一晶片i丨4黏著設 置於該基板130。 接著,進行第一晶片Π4與該基板丨3()之打線連接,η 本實施例中,在打線形成複數個第一銲線14〇之前,請參 =第2H圖,在該第—曰曰曰片114之該些銲塾113&上係形成有 複數個結線凸塊143(stud bump),以利接合該些第一銲矣 140之線尾端142 ;接著,請參閱第21圖,以該些第一銲矣 140電性連接該第一晶片114與該基板13〇,其中該些第一Page 11 1240392 V. Description of the invention (6) Several pads 1 1 3 a and 1 1 3 b. Of course, in different embodiments, a first wafer 1 4 and a second wafer 1 15 can also be divided from two different wafers, and the semi-cured resin is formed on the back surface of each wafer. Among them, the size of the first wafer 1 1 4 and the second wafer 1 15 are approximately the same, or the first wafer j j 4 is slightly larger (smaller) than the second wafer 1 1 5. Next, referring to FIG. 2G, the semi-cured resin 1 2 2 a below the first wafer 丨 4 is bonded to the back surface 11 2 a of the first wafer 11 4 to the upper surface 1 31 of a substrate 130, The substrate 130 may be a circuit board made of ceramic, glass fiber reinforced resin, or polyurethane. In this embodiment, the substrate 130 is a ball grid array package substrate. On the substrate 130, the surface 131 and A connection pad 132 and a ball-receiving pad (not shown) are formed on the lower surface, respectively. In addition, conventional adhesive or tape may be used to adhere the first chip i 丨 4 to the substrate 130. Next, make a wire connection between the first chip Π4 and the substrate 3 (). In this embodiment, before the wire is formed to form a plurality of first bonding wires 14, please refer to FIG. 2H. A plurality of stud bumps 143 (stud bumps) are formed on the welding pads 113 & of the film 114 to facilitate the bonding of the wire ends 142 of the first welding pads 140; then, refer to FIG. 21 to The first solder pads 140 are electrically connected to the first chip 114 and the substrate 13.

=,140係具有一打線開始時形成之結球端i4i以及:打矣 ^時形成之線尾端142,該些結球端141係設於該基板 曰之上表面1 31,戎些線尾端14 2係設於該第一晶片11 4 j 鲜,1」3a上’忒些第-銲線140係為逆打形成而具有較低 之狐兩。=, 140 has a knot end i4i formed at the beginning of a hit line and a tail end 142 formed at the start of the hit ^. These knot ends 141 are provided on the upper surface of the base plate 1 31, and the end ends of these strands 14 2 is provided on the first wafer 11 4 j, and some of the first-bonding wires 140 are formed on the first wafer 3 3a, and have lower foxes.

第12頁 1240392 五、發明說明(7)Page 12 1240392 V. Description of the invention (7)

接著,請參閱第2 J圖,以在該第二晶片11 5下方之半 固化樹脂1 22b黏接該第二晶片11 5之背面11 2b至該第一晶 片114之主動面1 1 ia,其中該半固化樹脂丨22b係受熱炫融 而包覆該些第一銲線1 4〇之線尾端1 4 2,在本實施例中,該 半固化樹脂122b受熱熔融之溫度係介於11〇〜150 °c,故在 單一疊晶步驟中,僅需要適當加熱,該半固化樹脂1 2 2 b將 黏著该第一晶片114之主動面111a並包覆該些第一銲線140 之線尾端1 4 2,省卻習知在晶片堆疊與打線後之間隔材料 形成步驟,此外,該半固化樹脂1 22b係覆蓋該第一晶片 114之該些銲墊H3a,且可全面覆蓋該第一晶片114之主動 面111a,以對該第二晶片115提供良好之打線支撐,故第 一晶片11 5可具有較薄的厚度(例如可以薄到6〜1 5 m丨1 )。 較佳地,該半固化樹脂1 22b亦可以相當的薄,在本實施例 中,至少一違些第一銲線1 4 〇係可接觸至該第二晶片11 5之 背面112b。接著,請參閱第2K圖,以複數個第-鋥蝮ho 電性連接該第二晶片"5與該基板130,在= 之銲墊11 3b亦可同樣地形成複數個結球凸塊丨53,以利該 些第二銲線150之線尾端152接合,而該些第二銲線15〇之 結球端151亦形成於該基板130之上表面131上;請參閱第3 圖,在重覆地打線、堆疊晶片與加熱熔融該半固化樹脂 122a與122b之後,以本實施例之封裝厚度,可以快速地再 堆疊上第三晶片116,以第三銲線16〇連接該第三晶片116 與該基板130,並可再堆疊上第四晶片117,以第四銲線 170連接該第四晶片117與該基板13〇,最後,以一封膠體Next, referring to FIG. 2J, the semi-cured resin 1 22b below the second wafer 115 is used to adhere the back surface 11 2b of the second wafer 115 to the active surface 1 1 ia of the first wafer 114, where The semi-cured resin 22b is heated and melted to cover the wire ends 1 42 of the first bonding wires 1 40. In this embodiment, the temperature of the semi-cured resin 122b is about 11 °. ~ 150 ° c, so in a single stacking step, only the appropriate heating is needed. The semi-cured resin 1 2 2 b will adhere to the active surface 111 a of the first wafer 114 and cover the end of the first bonding wires 140. The end 1 4 2 omits the conventional spacer material forming step after wafer stacking and wire bonding. In addition, the semi-cured resin 1 22b covers the pads H3a of the first wafer 114 and can completely cover the first wafer. The active surface 111a of 114 provides good wire support for the second chip 115, so the first chip 115 can have a thinner thickness (for example, it can be as thin as 6 to 15 m1). Preferably, the semi-cured resin 1 22b may also be relatively thin. In this embodiment, at least some of the first bonding wires 1 40 may contact the back surface 112b of the second wafer 115. Next, referring to FIG. 2K, the second chip " 5 and the substrate 130 are electrically connected by a plurality of-鋥 蝮 ho, and a plurality of nodular bumps can also be formed in the pad 11 3b of the same. In order to facilitate the bonding of the wire ends 152 of the second bonding wires 150, and the ball end 151 of the second bonding wires 150 are also formed on the upper surface 131 of the substrate 130; please refer to FIG. After grounding, stacking the wafers and heating and melting the semi-cured resins 122a and 122b, the third wafer 116 can be quickly stacked again with the package thickness of this embodiment, and the third wafer 116 can be connected with the third bonding wire 160. And the substrate 130, and a fourth wafer 117 can be stacked on the substrate 130, the fourth wafer 117 and the substrate 130 are connected by a fourth bonding wire 170, and finally, a piece of gel

第13頁 1240392 五、發明說明(8) I 8 0密封該第一晶片11 4、該第二晶片1 1 5、該第三晶片 II 6、該第四晶片1 1 7與該些第一銲線1 4 0、該些第二銲線 1 5 0、該些第三銲線1 6 0與該些第四鮮線1 7 0,並使該些半 固化樹脂1 2 2 a、1 2 2 b同時固化成為個別之完全固化樹脂 1 2 3,以構成一多晶片同尺寸堆疊之封裝構造,達到堆疊 多數量之晶片、固定銲線之線尾端與減少疊晶步驟之功 效0 此外,本發明用以連接第一晶片丨丨4與該基板丨3 〇之第 一銲線1 40,其可採用前述之逆打線法,亦可採用Page 13 1240392 V. Description of the invention (8) I 8 0 seals the first wafer 11 4, the second wafer 1 1 5, the third wafer II 6, the fourth wafer 1 1 7 and the first solder Wire 1 4 0, the second bonding wires 1 50, the third bonding wires 1 6 0 and the fourth fresh wires 1 7 0, and the semi-cured resins 1 2 2 a, 1 2 2 b Simultaneous curing into individual fully cured resins 1 2 3 to form a multi-chip stacked package structure of the same size, to achieve the effect of stacking a large number of wafers, fixing the end of the wire and reducing the step of stacking. 0 In addition, this Invention of the first bonding wire 1 40 for connecting the first chip 丨 4 and the substrate 丨 3 〇, which can use the aforementioned reverse wire method, can also use

Kulicke&Soffa 之前折式打線製程(F〇rwar(j Folded Loop Bonding Process ;F2 bonding process)。該種打線方式 ,銲線:-接合點位於晶片銲墊上,^第二接合點位於基 2於:t式打線製程具有低弧高(1〇W 1〇〇Ρ)之優點,以 適用於本發明之多晶片堆疊之封裝製程。 為準本後圍所界定者 圍内所作之任何變化與修改,均屬於本發明Kulicke & Soffa's previous folding wire bonding process (Forwar (j Folded Loop Bonding Process; F2 bonding process). In this wire bonding method, the bonding wire is:-the bonding point is located on the wafer pad, and the second bonding point is located on the base 2 at: The t-type wire bonding process has the advantage of low arc height (10W 100), and is applicable to the multi-chip stacking packaging process of the present invention. In order to make any changes and modifications made within the scope defined by the back wall, Belong to the present invention

第14頁 1240392___ 圖式簡單說明 【圖式簡單說明】 第 1 圖:習知多晶片同尺寸堆疊之封裝構造之截面示 意圖; 第2A至2K圖:依據本發明之多晶片同尺寸堆疊之封裝製 程,一晶圓或其切割後晶片在製程中之截面示意圖;及 第 3 圖:依據本發明之多晶片同尺寸堆疊之封裝製 程,所製造之多晶片同尺寸堆疊之封裝構造之截面示意 圖。 元件符號簡單說明: 1 多 晶 片 同 尺 寸 堆疊封裝構造 10 第 一 晶 片 11 主動面 12 背 面 13 銲 墊 20 第 •—- 晶 片 21 主動面 22 背 面 23 銲 墊 30 基板 31 上 表 面 40 銲 線 41 結球端 42 線 尾 端 50 間 隔 材 料 51 黏著層 60 銲 線 70 封 膠 體 110 晶 圓 111 主動面 111a 第 一 晶 片 之 主 動面 111b 第 ^— 晶 片 之 主 動面 112 背 面 112a 第一晶片 之主動面 112b 第 二 晶 片 之 背 面 113 銲 墊 113a 第一晶片 之銲墊1240392 on page 14 Brief description of the drawings [Simplified illustration of the drawings] Figure 1: A cross-sectional view of a conventional multi-chip stacking structure with the same size; Figures 2A to 2K: A multi-chip stacking process with the same size according to the present invention. A schematic cross-sectional view of a wafer or a diced wafer during the manufacturing process; and FIG. 3 is a schematic cross-sectional view of the packaging structure of a multi-chip stacked stack of the same size according to the multi-chip stacked stack packaging process of the present invention. Brief description of component symbols: 1 Multi-chip stacked package structure of the same size 10 First chip 11 Active surface 12 Back surface 13 Welding pads 20 First --- wafer 21 Active surface 22 Back surface 23 Welding pads 30 Substrate 31 Upper surface 40 Welding wire 41 Ball end 42 Line tail 50 Spacer material 51 Adhesive layer 60 Welding wire 70 Sealant 110 Wafer 111 Active face 111a Active face of first wafer 111b Active face of wafer 112 Back side 112a Active face of first wafer 112b Second wafer Back surface 113 pad 113a pad of the first wafer

第15頁 1240392_ 圖式簡單說明 113b 第二晶片之銲墊Page 15 1240392_ Brief description of the diagram 113b Pad for the second wafer

第16頁 114 第一晶片 115 第二晶片 116 第二晶片 117 第四晶片 121 未固化樹脂 122 半固化樹脂 122a 第一晶片下之半固 化樹脂 122b 第二晶片下之半固 化樹脂 123 全固化樹脂 130 基板 131 上表面 132 連接墊 140 第一鮮線 141 結球端 142 線尾端 143 結球凸塊 150 第二銲線 151 結球端 152 線尾端 153 結球凸塊 160 第三銲線 170 第四銲線 180 封膠體 210 晶圓載台 220 研磨工具 230 塗膠工具 240 烘烤裝置 250 切割膠帶 260 切割刀具Page 16 114 First wafer 115 Second wafer 116 Second wafer 117 Fourth wafer 121 Uncured resin 122 Semi-cured resin 122a Semi-cured resin under the first wafer 122b Semi-cured resin under the second wafer 123 Fully cured resin 130 Base plate 131 Upper surface 132 Connection pad 140 First fresh line 141 Ball end 142 Line end 143 Ball end bump 150 Second wire 151 Ball end 152 Line end 153 Ball end bump 160 Third wire 170 Fourth wire 180 Sealant 210 Wafer stage 220 Grinding tool 230 Gluing tool 240 Baking device 250 Cutting tape 260 Cutting tool

Claims (1)

12403921240392 【申請專利範圍】 1、二種多晶片同尺寸堆疊之封裝製程,其包含: 提供一半導體晶圓,該晶圓係具有一主動面及一背 面,忒主動面之晶片區域内係形成有複數個銲墊; 形成一半固化樹脂於該晶圓之背面; ^割該晶圓,以形成至少一第一晶片與至少一第二晶 片 苐曰曰片之旁面與該第二晶片之背面分別形成有該 半固化樹脂; 黏设該第一晶片至一基板之上表面; 斤以複數個第一銲線電性連接該第一晶片與該基板,其 中ΐ ,一鲜線係具有一結球端及一線尾端,該些結球端 係δ又於遺基板之上表面,該些線尾端係設於該第一晶片之 銲墊上; 以該第二晶片之半固化樹脂黏接該第二晶片之背面至· 該第一晶片之主動面,其中該半固化樹脂係受熱熔融而包 覆該些第一銲線之線尾端;及 - 電性連接該第二晶片與該基板。 2、』如申請專利範圍第1項所述之多晶片同尺寸堆疊之封 裝製私’其中該第一晶片係以其背面之半固化樹脂黏接該 基板。 3、如申請專利範圍第2項所述之多晶片同尺寸堆疊之封 裝製程’其另包含有:同時固化該第一晶片背面下之半固 化樹脂與該第二晶片背面下之半固化樹脂。 4 '如申請專利範圍第1項所述之多晶片同尺寸堆疊之封[Scope of patent application] 1. Two kinds of multi-chip stacked packaging process including: providing a semiconductor wafer, the wafer has an active surface and a back surface, and a plurality of wafers are formed in the area of the active surface Forming a half-cured resin on the back surface of the wafer; cutting the wafer to form at least one first wafer and at least one second wafer; a side surface of the wafer and a back surface of the second wafer are formed respectively Having the semi-cured resin; adhering the first wafer to an upper surface of a substrate; and electrically connecting the first wafer and the substrate with a plurality of first bonding wires, wherein , and a fresh wire have a knot end and A wire tail end, the nodule ends δ are on the upper surface of the substrate, and the wire tail ends are provided on the pads of the first wafer; the semi-cured resin of the second wafer is used to bond the second wafer The back surface to the active surface of the first chip, wherein the semi-cured resin is heat-melted to cover the wire ends of the first bonding wires; and-electrically connecting the second chip and the substrate. 2. "Packaging and packaging of multiple wafers of the same size as described in item 1 of the scope of patent application" wherein the first wafer is adhered to the substrate with a semi-cured resin on its back. 3. The packaging process of multi-wafer stacking of the same size as described in item 2 of the scope of the patent application, further comprising: simultaneously curing the semi-cured resin under the back surface of the first wafer and the semi-cured resin under the back surface of the second wafer. 4 'Seal with multiple wafers stacked in the same size as described in item 1 of the patent application scope 第17頁 1240392Page 12 1240392 六、申請專利範圍 複 凄I個穿-二t在電性連接該第二晶片與該基板之步 第一鲜線係連接該基板至第二晶片之銲墊。 以申;=:=1第項所r多晶片同尺寸堆叠之封 兮第一 θ'忒二第一銲線之電性連接步驟之前,在 bump) 乂利接合該些第一銲線之線尾端。 二:d;圍第1或5項所述之多晶片同尺寸堆疊 背面裝1其至少一第一銲線係接觸至該第二晶片之 』製::申ίί:範圍第1項所述之多晶片同尺寸堆疊之封 ^ #壬,八另匕含有:研磨該半導體晶圓之背面,以減少 该第一晶片與第二晶片之厚度。 飒^ 陡8制如申請專利範圍第1項所述之多晶片同尺寸堆疊之封 蒇製程,其中該半固化樹脂之厚度係為3〜8 mil。 如申請專利範圍第丨項所述之多晶片同尺寸堆疊之封 裝製程,其中該半固化樹脂受熱熔融之溫度係介 150 °c。 义 τ ,、… 10、 如申請專利範圍第i項所述之多晶片同尺寸堆疊之封 Ο 裝製程,其另包含有:形成一封膠體,以密封該第一晶片 與該第二晶片。 11、 一種多晶片堆疊之封裝製程,其包含: 提供一第一半導體晶圓及一第二半導體晶圓,該等晶 圓係分別具有一主動面及一背面,該主動面之晶片區域内 係形成有複數個鮮墊; r6. Scope of the application for patent Application: One step of electrically connecting the second chip and the substrate is to connect the second chip to the substrate. The first fresh wire is a bonding pad that connects the substrate to the second chip. Yishen; =: = 1 The multi-chip stacking of the same size as the first item is sealed. Before the electrical connection step of the first θ ′, the first bonding wire, bump) to bond the wires of the first bonding wire. Tail end. Two: d; the multi-chips described in item 1 or 5 are stacked on the back of the same size, and at least one of the first bonding wires is in contact with the second chip. The multi-chip stacking seals of the same size include: grinding the back surface of the semiconductor wafer to reduce the thickness of the first wafer and the second wafer.飒 ^ The manufacturing process of the multi-chip stack with the same size as described in item 1 of the patent application range, wherein the thickness of the semi-cured resin is 3 to 8 mils. According to the multi-chip and same-size packaging process described in item 丨 of the patent application scope, the temperature at which the semi-cured resin is melted by heating is 150 ° c. Meaning τ, ... 10. The packaging process of multi-chip stacking with the same size as described in item i of the patent application, which further includes: forming a colloid to seal the first wafer and the second wafer. 11. A multi-chip stacked packaging process, comprising: providing a first semiconductor wafer and a second semiconductor wafer, the wafers respectively having an active surface and a back surface, and the wafer area of the active surface is Forming a plurality of fresh pads; r 第18頁 1240392 六 、申請專利範圍 形成一半固化樹脂於該等晶圓之背面; 一半導體晶圓,以形成複數個第一晶片,並 導體晶圓’以形成极數個第二晶片,該等晶 形成有該半固化樹脂; 基板之上表面; 性連接該第一晶片與該基板,其 結球端及一線尾端,該些結球端 该些線尾端係設於該第一晶片之 切割該第 切割該第二半 片之背面分別 黏設該第 以複數個 一晶片至 第一銲線電 中每一第一銲線係具有一 係設於該基板 銲墊上; 以該第二 主動面,其中 線之線尾端; 電性連接 如申請專 其中該第 12 程 板 13 程 如申請專 其另包含 脂與該第二晶 14、 如申請專 程,其中在電 第一鲜線係連 15、 如申請專 程,其中在以 之上表面, 晶片背面之 該半固化樹 及 該第二晶片 利範圍第1 1 一晶片係以 利範圍第1 2 有·同時固 片背面下之 利範圍第1 1 性連接該第 接該基板至 利範圍第1 1 該些第一銲Page 18 1240392 6. The scope of the patent application forms half of the cured resin on the back of these wafers; a semiconductor wafer to form a plurality of first wafers, and a conductor wafer 'to form a pole number of second wafers, etc. The semi-cured resin is formed on the crystal; the upper surface of the substrate; the ball end and a wire tail end of the first wafer and the substrate are sexually connected, and the ball end and the wire tail end are arranged on the first wafer; The back side of the first cut second half piece is respectively adhered with the first plurality of wafers to the first bonding wire. Each of the first bonding wires is provided on the substrate pad; the second active surface, wherein The electrical end of the line; electrical connection, such as the application of the 12th process board, 13 procedures, such as the application, which also contains grease and the second crystal 14, such as application for the special process, in which the first fresh wire is connected to 15, such as Apply for a special trip, in which the semi-cured tree on the top surface, the back of the wafer, and the second wafer are in the profit range 1 1 The first wafer is in the profit range 1 2 Yes, the profit range under the back of the solid wafer is at the same time 1 1 Connect this The substrate is connected to a first range of interest of the plurality of first solder 11 半固化樹脂黏接至該第一晶片之 脂係受熱熔融而包覆該些第一銲 與該基板。 項所述之多晶片堆疊之封裝製 其背面之半固化樹脂黏接該基 項所述之多晶片堆疊之封裝製 化該第一晶片背面下之半固化樹 半固化樹脂。 項所述之多晶片堆疊之封裝製 t晶片與該基板之步驟,複數個 弟二晶片之銲墊。 項所述之多晶片堆疊之封裝 線之電性連接步驟之前,在該第 第19頁 1240392 六、申請專利範圍 、 一晶片之該些銲墊上係形成有複數個結線凸塊(stud bump),以利接合該些第一銲線之線尾端。 1 6、如申請專利範圍第丨丨所述之多晶片堆疊之封裝製程, 其中至少一第一銲線係接觸至該第二晶片之背面。 1 7、如申請專利範圍第丨丨項所述之多晶片堆疊之封裴製 私’其另包含有:研磨該等半導體晶圓之背面,以減少該 第一晶片與第二晶片之厚度。 1 8、如申請專利範圍第丨丨項所述之多晶片堆疊之封裝製 程’其中該半固化樹脂之厚度係為3〜8 m丨i。 1 9、如申請專利範圍第丨丨項所述之多晶片堆疊之封裝製 私’其中该半固化樹脂受熱溶融之溫度係介於1 1 〇〜 150 〇C。 20、如申請專利範圍第丨丨項所述之多晶片堆疊之封裝製 私,其另包含有:形成一封膠體,以密封該第一晶片與該 21、一種多晶片堆疊之封裝製程,其包含: - j,一第_晶片及一第二晶片,該等晶片具有一主動 面及者面5亥等晶片之主動面設有複數個銲塾,該等晶 片之背面設有一半固化樹脂; 以在該第一晶片背面之半固化樹脂黏設該第一晶片至4 一基板之上表面; 以前折 ^ 打線製程(Forward Folded Loop Bonding Process)將複數條第一銲線電連接該第一晶片之該等銲墊 與該基板之上表面;The grease of the semi-cured resin adhered to the first wafer is melted by heat to cover the first solder and the substrate. The package of the multi-chip stack described in the item The back-cured resin of the multi-chip stack described in the item is bonded to the semi-cured resin of the first wafer under the package of the multi-chip stack described in the item. The step of packaging the t-chip and the substrate as described in the multi-chip stack of the item, a plurality of second-chip bonding pads. Before the step of electrically connecting the packaging lines of the multi-chip stack described in item 1, on page 19, 1240392 VI. Patent application scope, a plurality of stud bumps are formed on the pads of a chip, In order to facilitate joining the tail ends of the first bonding wires. 16. The packaging process of multi-chip stacking as described in the scope of the patent application, wherein at least one first bonding wire is in contact with the back surface of the second chip. 17. According to the multi-wafer stacking method described in item 丨 丨 of the patent application scope, it further includes: grinding the back surfaces of the semiconductor wafers to reduce the thickness of the first wafer and the second wafer. 18. The packaging process of multi-chip stacking as described in item 丨 丨 of the scope of patent application, wherein the thickness of the semi-cured resin is 3 to 8 m. 19. The multi-chip stacking package as described in item 丨 丨 of the scope of patent application, wherein the temperature of the semi-cured resin being melted by heat is between 1 10 and 150 ° C. 20. The multi-chip stack packaging system described in item 丨 丨 of the patent application scope, further comprising: forming a colloid to seal the first chip and the 21, a multi-chip stack packaging process, Contains:-j, a first wafer and a second wafer, the wafers have an active surface and the active surface of the wafer is provided with a plurality of welding pads, and the back of these wafers is provided with half of the cured resin; A semi-cured resin on the back surface of the first wafer is used to adhere the first wafer to the upper surface of a substrate; the forward folding wire bonding process (Forward Folded Loop Bonding Process) electrically connects the plurality of first bonding wires to the first wafer. The pads and the upper surface of the substrate; 1240392 六、申請專利範圍 以該第二 主動面,其中 之一部分;及 22 電性連接 如申請專 程,更包含: 提供一第 圓係分別具有 係形成有複數 形成上述 切割該第 切割該第二半 片之背面分別 2 3、如申請專 程,更包含: 提供一半 面’該主動面 形成一半 切割該晶 上述之第二晶 分別形成有該 24、如申請專 程’其另包含 脂與該第二晶 兮1 =面之半固化樹脂點接至該第一晶片之 〇亥半固化樹月旨成為卜―4 又熱熔一而包覆該等第一銲線 5玄第二晶片與該基板。 利範圍第^項所述之多晶片堆叠之封裝製 二半導體晶圓及一第二半導體晶圓,該等晶 厂主動面及一背面,該主動面之晶片區 個銲墊; 之半固化樹脂於該等晶圓之背面;及 一半導體晶圓,以形成上述之第一晶片,並 導體晶圓,以形成上述之第二晶片,該等晶 形成有該半固化樹脂。 利範圍第2 1項所述之多晶片堆疊之封裝製 導體晶圓,該晶圓係具有一主動面及一背 之晶片區域内係形成有複數個銲墊; 固化樹脂於該半導體晶圓之背面;及 圓,以形成至少一上述之第一晶片與至少一 片,該第一晶片之背面與該第二晶片之背面 半固化樹脂。 利範圍第2 1項所述之多晶片堆疊之封裝製 有:同時固化該第一晶片背面下之半固化樹 片背面下之半固化樹脂。1240392 6. The scope of the patent application is based on the second active surface, one of which; and 22 if the electrical connection is for a special trip, it also includes: providing a first circle system having a plurality of lines forming the above-mentioned cut, the second cut, and the second half The back side is respectively 2 3. If applying for a special trip, it also includes: providing a half plane 'the active side forms a half cut the crystal. The second crystal mentioned above is formed with the 24, if applying for a special trip', it further contains a fat and the second crystal. 1 = The semi-cured resin on the surface is connected to the semi-cured tree of the first wafer. The purpose of the semi-cured tree is to make the hot-melt and cover the first bonding wires, the second wafer, and the substrate. The two-semiconductor wafer and one second semiconductor wafer of the multi-chip stack package described in Item ^, the active side and a back side of the wafer factory, a pad on the active area of the wafer area; semi-cured resin On the back of the wafers; and a semiconductor wafer to form the first wafer described above, and a conductor wafer to form the second wafer described above, the crystals are formed with the semi-cured resin. The multi-chip-stacked packaged conductor wafer described in Item 21, the wafer is a wafer area having an active side and a back side, and a plurality of bonding pads are formed in the wafer area; the cured resin is formed on the semiconductor wafer. A back surface; and a circle to form at least one of the above-mentioned first wafer and at least one sheet, and the back surface of the first wafer and the back surface of the second wafer are semi-cured resin. The multi-chip stack packaging system described in the benefit range item 21 includes: simultaneously curing the semi-cured resin under the back of the first wafer and the semi-cured resin under the back of the wafer. 第21頁 1240392Page 12 1240392 25、=請專利範圍第21項所述之多晶片堆叠 程,其中在電性連接該第二晶 凌I 個第二銲線係連接該基板至第二晶;;:銲墊:驟係以複數 專利W21所述之多晶片堆叠之封裝製程, 、^第一銲線係接觸至該第二晶片之背面。 二ίΠίΐ範圍第211 員所述之多晶片堆疊之封製製 片與第二晶片之厚; …面,以減少該第-晶 8々申α月專利範圍第2 1項所述之多晶片堆叠之封裝製 私’其中該半固化樹脂之厚度係為3〜8 m丨i。 、如申請專利範圍第2 1項所述之多晶片堆疊之封裝製 私’其中該半固化樹脂受熱熔融之溫度係介於丨丨〇〜 150 〇c 〇 、如申請專利範圍第2 1項所述之多晶片堆疊之封裝製 程,其另包含有:形成一封膠體,以密封該第一晶片與該 第二晶片。25. = Please refer to the multi-chip stacking process described in item 21 of the patent scope, wherein the second crystal wire and the second bonding wire are electrically connected to the substrate to the second crystal;; In the multi-chip stack packaging process described in the multiple patents W21, the first bonding wire is in contact with the back surface of the second chip. Second, the thickness of the sealed wafer and the second wafer of the multi-wafer stack described in the 211th member of the scope; to reduce the multi-wafer stack described in the 21st item of the 21st patent scope In the package system, the thickness of the semi-cured resin is 3 to 8 m. 2. The multi-chip stacked packaging system described in item 21 of the patent application scope, wherein the temperature of the semi-cured resin is heated and melted between 丨 丨 ~ 150 〇c. The described multi-chip stack packaging process further includes: forming a gel to seal the first chip and the second chip.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8134240B2 (en) 2006-07-27 2012-03-13 Fujitsu Semiconductor Limited Semiconductor device and manufacturing method for the same
CN108766974A (en) * 2018-08-08 2018-11-06 苏州晶方半导体科技股份有限公司 A kind of chip-packaging structure and chip packaging method

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US20090001599A1 (en) * 2007-06-28 2009-01-01 Spansion Llc Die attachment, die stacking, and wire embedding using film
TWI566356B (en) 2015-10-15 2017-01-11 力成科技股份有限公司 Package structure and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8134240B2 (en) 2006-07-27 2012-03-13 Fujitsu Semiconductor Limited Semiconductor device and manufacturing method for the same
CN108766974A (en) * 2018-08-08 2018-11-06 苏州晶方半导体科技股份有限公司 A kind of chip-packaging structure and chip packaging method

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