TW350988B - Manufacturing method of forming metal layout by means of hard mask - Google Patents

Manufacturing method of forming metal layout by means of hard mask

Info

Publication number
TW350988B
TW350988B TW086113980A TW86113980A TW350988B TW 350988 B TW350988 B TW 350988B TW 086113980 A TW086113980 A TW 086113980A TW 86113980 A TW86113980 A TW 86113980A TW 350988 B TW350988 B TW 350988B
Authority
TW
Taiwan
Prior art keywords
hard mask
manufacturing
forming metal
metal layout
layout
Prior art date
Application number
TW086113980A
Other languages
Chinese (zh)
Inventor
Yu-Hua Li
Jia-Shiung Tsai
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW086113980A priority Critical patent/TW350988B/en
Application granted granted Critical
Publication of TW350988B publication Critical patent/TW350988B/en

Links

Abstract

Manufacturing method of forming metal layout by means of hard mask, including the following steps: (a) forming on the semiconductor substrate surface a metal layer and a anti-reflective layer; (b) forming a hard mask on said anti-reflective layer; (c) defining the layout the hard mask; and (d) etching the anti-reflective layer and the metal layer for defining the metal layout, with the reacted gas of the etching with SF6.
TW086113980A 1997-09-25 1997-09-25 Manufacturing method of forming metal layout by means of hard mask TW350988B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086113980A TW350988B (en) 1997-09-25 1997-09-25 Manufacturing method of forming metal layout by means of hard mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086113980A TW350988B (en) 1997-09-25 1997-09-25 Manufacturing method of forming metal layout by means of hard mask

Publications (1)

Publication Number Publication Date
TW350988B true TW350988B (en) 1999-01-21

Family

ID=57939961

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086113980A TW350988B (en) 1997-09-25 1997-09-25 Manufacturing method of forming metal layout by means of hard mask

Country Status (1)

Country Link
TW (1) TW350988B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415221B (en) * 2009-09-30 2013-11-11 Macronix Int Co Ltd Method for preventing al-cu bottom damage using tin liner
TWI669994B (en) * 2017-12-04 2019-08-21 希華晶體科技股份有限公司 Method for manufacturing miniaturized circuit and its products

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415221B (en) * 2009-09-30 2013-11-11 Macronix Int Co Ltd Method for preventing al-cu bottom damage using tin liner
TWI669994B (en) * 2017-12-04 2019-08-21 希華晶體科技股份有限公司 Method for manufacturing miniaturized circuit and its products

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