TW201009004A - Photovoltaic modules comprising plasticized intermediate layer films having a low polyvinyl acetate content - Google Patents

Photovoltaic modules comprising plasticized intermediate layer films having a low polyvinyl acetate content Download PDF

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Publication number
TW201009004A
TW201009004A TW098114116A TW98114116A TW201009004A TW 201009004 A TW201009004 A TW 201009004A TW 098114116 A TW098114116 A TW 098114116A TW 98114116 A TW98114116 A TW 98114116A TW 201009004 A TW201009004 A TW 201009004A
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Taiwan
Prior art keywords
plasticizer
film
photovoltaic module
polyvinyl acetal
module according
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TW098114116A
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Chinese (zh)
Inventor
Martin Steuer
Uwe Keller
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Kuraray Europe Gmbh
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Publication of TW201009004A publication Critical patent/TW201009004A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10761Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing vinyl acetal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10688Adjustment of the adherence to the glass layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/048Encapsulation of modules
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/048Encapsulation of modules
    • H01L31/0481Encapsulation of modules characterised by the composition of the encapsulation material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B10/00Integration of renewable energy sources in buildings
    • Y02B10/10Photovoltaic [PV]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention relates to the use of plasticizer-containing films based on polyvinyl acetal, wherein the polyvinyl acetal has a polyvinyl acetate content of less than 1% by weight.

Description

201009004 六、發明說明: 【發明所屬之技術領域】 本發明係關於使用具有低聚乙稀基乙 乙烯縮醛為基礎的含塑化劑 -3量的以聚 光半導體層受到雜。膜來製奸伏模組以避免感 【先前技術】201009004 VI. Description of the Invention: [Technical Field] The present invention relates to the use of a plasticizer-containing amount based on an oligoethylene vinyl acetal-based amount to be contaminated with a concentrating semiconductor layer. Membrane to make a fuss module to avoid feeling [previous technology]

=模組係由具有透明覆膜作為防範外部 D 或支撐多晶矽。薄膜太陽能模组 :列^域發塗佈、化學氣相沈積、雜或濕式沈積 =至例如透明薄膜或撓性载膜等基板上的感光半導體 層所構成。 守篮 通$兩系統藉由透明點著劑而被疊合於玻璃面板與例 如玻璃或塑膠所構成的硬性後覆蓋面板之間。 透明黏著劑必須要完全地包圍感光半導體層與其電連 接件、必須要是在UV 了穩定與對水氣不敏感、且必須要 在疊合程序後完全不起泡。 通常會使用熱固性模造樹脂或以可交聯之伸乙烯基乙 烯基乙酸酯(EVA)為基礎的系統來作為透明黏著劑,例如在 DE 41 22 721 C1或DE 41 28 766 A1中所揭露者。在未固 化的狀態下,這些黏著劑系統可被調整至以不起泡的方式 包圍太1%能電池單元的低黏度。在添加了固化劑或交聯劑 後’可獲得具有機械強度的黏著層。這些黏著劑系統的缺 201009004 點為:在固化程序期間,通常會釋出可能會破壞感光半導-體層尤其是薄膜模組的侵略性物質例如酸類。又,某些模 造樹脂在數年後傾向於因uv照射而形成氣泡或脫層。 熱固性黏著系統外的另一選擇為:使用以聚乙烯縮酸 為基礎的含塑化劑薄膜例如自製造疊合玻璃已知的聚乙烯 丁縮醛(PVB)。太陽能電池單元係由一或多層pV]B膜所覆 蓋’且這些薄膜係利用期望的覆蓋材料在提高的壓力與溫 度下而連結至一疊層。 利用PVB薄膜製造太陽能模組的方法已知例如自de❿ 40 26 165 C2、DE 42 278 60 Al、DE 29 237 70 C2、DE 35 38 986 C2或US 4,321,418所得。在太陽能模組中使用pvb薄 膜作為疊合安全玻璃已被揭露於例如DE 20 302 045 U1、 EP 1617487 A1及DE 35 389 86 C2中。然而,這些公開文 獻並未包含所用之PVB薄膜之機械、化學與電特性相關的 任何資訊。 隨著感光半導體層的效率漸增及太陽能模組的全球銷 售漸增,薄膜的電特性尤其變得愈來愈重要。在模組的整〇 個使用期間’亦必須避免半導體層在極端的氣候條件如熱 帶溫度、高濕度或強uv照射下發生電荷損失或甚至於電 路短路。根據IEC 61215,光伏模組會受到許多測試(濕熱 測試、濕漏電流測試)以降低模組的漏電流。 般已知,PVB薄膜的體積電阻(v〇iume resjstance)會 隨著水氣含量的增加而驟然降低,此會大大地有利於光伏 模組中的漏電流生成。在光伏模組的邊緣區域中,作為封 201009004 裝材料的賴係暴露於環境及環境條件如高環境濕度。在 邊緣區域中之薄膜的水含量可能會因此而大幅地增加並呈 現出上至平,水氣含量值(約3重量%)。在薄膜的邊緣區域 中的增加水4含1會大帽地降低此區域中的電阻。水氣含 量的確會朝著薄膜的中央而降低,但是為了避免漏電流, 因此便無法將感光轉㈣—路設置至賴或模組的邊緣= The module is made of a transparent film to prevent external D or support polysilicon. Thin film solar modules: array coating, chemical vapor deposition, hybrid or wet deposition = to a photosensitive semiconductor layer on a substrate such as a transparent film or a flexible carrier film. The two-system is superimposed between a glass panel and a rigid rear cover panel made of, for example, glass or plastic. The transparent adhesive must completely surround the photosensitive semiconductor layer and its electrical connections, must be stable in UV and insensitive to moisture, and must be completely blister-free after the lamination process. Thermosetting moulding resins or systems based on cross-linkable vinyl vinyl acetate (EVA) are generally used as transparent adhesives, for example as disclosed in DE 41 22 721 C1 or DE 41 28 766 A1. . In the uncured state, these adhesive systems can be adjusted to surround the low viscosity of the 1% energy cell in a non-foaming manner. An adhesive layer having mechanical strength can be obtained after the addition of a curing agent or a crosslinking agent. The lack of these adhesive systems is 201009004. During the curing process, aggressive substances such as acids that may damage the photosensitive semiconductor layer, especially the thin film module, are usually released. Also, some molded resins tend to form bubbles or delamination due to uv irradiation after several years. An alternative to a thermosetting adhesive system is the use of a plasticizer-containing film based on polyvinyl acetal, such as polyvinyl butyral (PVB) known from the manufacture of laminated glass. The solar cell unit is covered by one or more layers of pV]B film and these films are bonded to a laminate using a desired cover material under elevated pressure and temperature. A method for producing a solar module using a PVB film is known, for example, from de ❿ 40 26 165 C2, DE 42 278 60 Al, DE 29 237 70 C2, DE 35 38 986 C2 or US 4,321,418. The use of a pvb film as a laminated safety glass in a solar module has been disclosed, for example, in DE 20 302 045 U1, EP 1617487 A1 and DE 35 389 86 C2. However, these publications do not contain any information on the mechanical, chemical and electrical properties of the PVB films used. As the efficiency of the photosensitive semiconductor layer increases and the global sales of solar modules increase, the electrical properties of the film become especially important. During the entire use of the module, it is also necessary to avoid loss of charge or even short circuit of the semiconductor layer under extreme climatic conditions such as hot zone temperature, high humidity or strong uv illumination. According to IEC 61215, PV modules are subjected to many tests (wet heat test, wet leakage current test) to reduce the leakage current of the module. It is generally known that the volume resistance (v〇iume resjstance) of a PVB film suddenly decreases as the moisture content increases, which greatly contributes to the generation of leakage current in the photovoltaic module. In the edge area of the photovoltaic module, the material used as the material for the 201009004 is exposed to environmental and environmental conditions such as high ambient humidity. The water content of the film in the edge region may thus be greatly increased and exhibit an up-to-flat, moisture content value (about 3% by weight). Increasing the water 4 in the edge region of the film will greatly reduce the electrical resistance in this region. The moisture content does decrease toward the center of the film, but in order to avoid leakage current, it is impossible to set the photosensitive (four)-way to the edge of the module or the module.

區域此降低了被覆蓋的表面區域,因低了模、 流效率。 电 太陽月匕電池尤其是被稱為「薄膜」模組的感光半導體 層例如CIS(銅/銦/亞碼酸鹽)或銅/銦/嫁/硫化物/亞砸酸睡 (CIGS)或被用作為導電材料的薄層例如了⑺(透明導電 化物)皆可被化學舰^因此封裝件應為化學惰性的且 包ΐ侵略性的添加物如交聯誠引發劑。X,應避免水或 微量酸的存在。 $ 【發明内容】 技術問題 他塑:ί::Τ為提供以聚乙烯縮搭為基礎之含其 技半二層“1=晴織財之❹ 為有低量聚乙烯基乙酸酯基團之聚乙烯縮酸 的^模組巾之感光半㈣層或導電材料 201009004 解為低了聚乙婦基乙酸醋基團藉由水氣催化裂 =聚乙_基團與乙酸所產生的乙酸含量,故在本發明 膜的較低腐财能是由於聚乙烯基乙酸醋基團 的較低含量,但不限於此解釋。 【實施方式】 進行本發明之最佳實例 下列之疊層的光伏模組:This reduces the area of the surface being covered due to low mold and flow efficiency. An electric solar cell battery, especially a photosensitive semiconductor layer called a "film" module such as CIS (copper/indium/photocatalyte) or copper/indium/marriage/sulfide/linolenic acid sleep (CIGS) or A thin layer used as a conductive material such as (7) (transparent conductive compound) can be used as a chemical ship so that the package should be chemically inert and contain aggressive additives such as cross-linking initiators. X, the presence of water or traces of acid should be avoided. $ 【发明发明】 Technical problem: He: :: Τ 提供 提供 Τ Τ 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 Τ 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯 聚乙烯Photosensitive half (four) layer of conductive film of polyethylene film or conductive material 201009004 solution is low acetic acid content of polyglycolic acid acetate group by water gas catalytic cracking = polyethylidene group and acetic acid Therefore, the lower rot of the film of the present invention is due to the lower content of the polyvinyl acetate acetate group, but is not limited thereto. [Embodiment] The preferred embodiment of the present invention is the following laminated photovoltaic module. group:

因此本發明的標的為包含一 a) —透明前蓋板; b)—或多個感光半導體層; c)至少一個以聚乙烯縮醛為基礎之含 背蓋板,其中該以聚乙稀縮搭為基礎:膜含層塑化及劑 膜層c)具有小於1重量%之聚乙烯基乙酸酯。 根據本發明所使用之聚乙烯縮搭 量係低於1重量%,較佳地低於〇 75 0.5重量%,最佳地低於0.25重量%。 的聚乙晞基乙酸酯含 重量% ’更佳地低於 在薄膜材料製造期間避免微量的酸為另一個可能降低〇 根據本發明所用之薄膜對於感光半導體層舰的敏感性: 此類薄膜通常在提高溫度下的擠壓所製造,雙人 塑化劑可能會因此而熱分解。又,聚乙Therefore, the subject matter of the present invention comprises a) a transparent front cover; b) - or a plurality of photosensitive semiconductor layers; c) at least one back cover comprising polyethylene acetal, wherein the polyethylene is reduced Based on this: the film-containing layer plasticizing and the agent film layer c) has less than 1% by weight of polyvinyl acetate. The polyethylene shrinkage amount used in accordance with the present invention is less than 1% by weight, preferably less than 0.55% by weight of 〇75, and most preferably less than 0.25 % by weight. Polyethyl methacrylate containing % by weight 'better than avoiding traces of acid during manufacture of the film material is another possibility to reduce 敏感性 sensitivity of the film used in accordance with the invention to a photosensitive semiconductor layer ship: such film Usually made by extrusion at elevated temperatures, the double plasticizer may decompose thermally. Also, poly B

基團可能會因水擴散而裂解,藉此生成乙酸。在上述兩情 況下,微量的酸可能會腐蝕感光半導體骐層。 H 因此根據本發明所用之薄膜較佳地具有特定驗性,以 鹼滴定量(alkali titer)表示之應大於5至1〇,較佳地大於 201009004 15 ’以及最佳地大於2〇、30或40。但不應超過最大驗滴定 量 100。 如下所述,鹼滴定量係藉由薄膜的返滴定所測定且可 藉著添加驗性物質如具有1至15個碳原子的有機緩酸金屬 鹽尤其是特定鹼鹽或鹼土鹽如醋酸鎂或醋酸鉀來加以調 整。所用之鹼性化合物的濃度通常為的0.005至2重量%, 最佳地為〇.〇5至1重量%,基於總混合物。 Φ 根據本發明所用之薄膜較佳地在23 °C與85% RH環境 濕度下具有至少1E+11歐姆*公分或大於5E+11歐姆*公分 的電阻率,較佳地至少5E+12歐姆*公分或1E+13歐姆*分 公的電阻率’最佳地至少5E+13或至少1E+14歐姆*公分的 電阻率。 為了製造聚乙烯縮醛,將聚乙烯醇溶於水中,並添加 酸催化劑而與醛類如丁醛進行縮醛反應。將沈降的聚乙烯 縮醛分離、沖洗至中性、選擇性地懸浮於水性介質使其呈 _ 驗性、並再次沖洗至中性、和乾燥。 縮醛反應所用的酸在反應發生後必須再次加以中和。 若使用過量的驗(例如,NaOH、KOH或Mg(〇H)2),則驗滴 定量增加,以及可完全或部分放棄添加鹼性物質。 經由調整縮醛化反應中所用的醛類量可調整聚乙烯縮 醛的聚乙烯醇含量。 亦可利用具有2-10個碳原子的其他或數種酸類(例如 戊醛)來進行縮醛反應。 以含塑化劑的聚乙烯縮經為基礎之薄膜較佳地包含由 201009004 聚乙烯醇與丁醛之縮醛反應所獲得的未交聯聚乙烯丁縮醛 (PVB)。 亦可使用交聯的聚乙烯縮醛尤其是交聯的聚乙烯丁縮 醛(PVB)。例如,在 EP 1527107 B1 及 WO 2004/063231 A1 (熱 自交聯之含羧基的聚乙烯縮醛)、EP 1606325 A1(與聚搭交 聯之聚乙烤縮搭)及WO 03/020776 A1(與乙酸酸交聯之聚 乙烯縮醛)中敘述了適合的交聯聚乙烯縮醛。將此些專利申 請案的所有内容包含於此作為參考。 在本發明之範疇内亦可使用水解乙烯基乙酸酯/乙烯丑 聚物的三元絲物作為聚乙騎。這純· ς ,於98莫耳%且包含的乙埽系 ^The group may be cleaved by the diffusion of water, thereby producing acetic acid. In both cases, a trace amount of acid may corrode the photosensitive semiconductor layer. H The film used according to the invention is therefore preferably of a specific nature, and should be greater than 5 to 1 〇, preferably greater than 201009004 15 ' and preferably greater than 2 〇, 30 or more, expressed as an alkali titer. 40. However, the maximum titration of 100 should not be exceeded. As described below, the alkali titration is determined by back titration of the film and can be added by adding an organic substance such as an organic alkali metal salt having 1 to 15 carbon atoms, particularly a specific alkali salt or an alkaline earth salt such as magnesium acetate or Potassium acetate is used to adjust. The concentration of the basic compound used is usually from 0.005 to 2% by weight, most preferably from 5 to 1% by weight based on the total mixture. Φ The film used in accordance with the invention preferably has a resistivity of at least 1E + 11 ohms * cm or greater than 5E + 11 ohms * cm at 23 ° C and 85% RH ambient humidity, preferably at least 5E + 12 ohms * The resistivity of centimeters or 1E+13 ohms* is optimally at least 5E+13 or at least 1E+14 ohm*cm. In order to produce a polyvinyl acetal, polyvinyl alcohol is dissolved in water, and an acid catalyst is added to carry out an acetal reaction with an aldehyde such as butyraldehyde. The settled polyethylene acetal is separated, rinsed to neutral, selectively suspended in an aqueous medium to be tested, rinsed again to neutral, and dried. The acid used in the acetal reaction must be neutralized again after the reaction has taken place. If an excessive amount of test (for example, NaOH, KOH or Mg(〇H)2) is used, the test titration is increased quantitatively, and the addition of the alkaline substance can be completely or partially abandoned. The polyvinyl alcohol content of the polyethylene acetal can be adjusted by adjusting the amount of the aldehyde used in the acetalization reaction. The acetal reaction can also be carried out using other or several acids (e.g., valeraldehyde) having 2 to 10 carbon atoms. The film based on the plasticizer-containing polyethylene shrinkage preferably comprises uncrosslinked polyvinyl butyral (PVB) obtained by the reaction of 201009004 polyvinyl alcohol with butanal acetal. Crosslinked polyvinyl acetals, especially crosslinked polyvinyl butyral (PVB), can also be used. For example, in EP 1527107 B1 and WO 2004/063231 A1 (thermally self-crosslinking carboxyl-containing polyvinyl acetals), EP 1606325 A1 (poly-baked polybutadiene) and WO 03/020776 A1 ( Suitable crosslinked polyethylene acetals are described in the polyvinyl acetal crosslinked with acetic acid. All of these patent applications are incorporated herein by reference. It is also within the scope of the present invention to use a ternary filament of hydrolyzed vinyl acetate/ethylene oligopolymer as a polyethylation. This pure · ς, at 98% of the moles and contains the acetylene system ^

Kuraray Europe GmbH 的”Exceval”類)。 又,在本發明之範缚内亦可使用由乙歸基乙酸 夕一種額外乙烯化之未飽合單體所製成的 I至 為聚乙烯醇。 解共聚物來作 在本發明之範疇内,可使用純的聚乙烯 聚合程度或水解程度的聚乙鱗混合物。 3、有不同 聚乙烯縮醛除了縮醛單元外更包含自乙烯 乙烯醇所獲得的單元。根據本發明所用土乙酸醋與 地具有聚乙埽醇含量低於22重量%,低於Λ烯_較佳 18重量%,低於16重量%或15重量%,且备重篁%,低於 重量% °聚乙歸醇含量不應低於12重量%。纟地低於14 縮醛化的程度可自聚乙烯醇含量與殘 計算獲得。 、竦留之乙酸酯含量 201009004 溥膜較佳地具有的最大塑化劑含量 量%,32重量%,30重量%, 為40重蕙%,35重 量%,戋22重量。/ .盔 里/〇,26重量%,24重 里/。次ϋ重置/〇,為了使薄膜加工 量不應低於15重量%(各基㈣ 的里由’塑化劑5 之薄膜或光伏模組可包二物)。根_ 根據本發明所用之薄膜的適合 的-或多種化合物: ㈣為選自下列族群 φ Φ : 如〇 —馼一已g曰、己二酸二辛 /酸庚酯盥P -龄工& 肀曰己一酸己基環己酯、己 與己一@夂壬酯之混合物、己二酸異壬 二酸 庚及己二酸與環脂族或含鱗鏈之_的^類;癸二 癌的酽錮.齟—w. 力一酉夂與裱脂族或含醚鏈之酯 酵的-曰類,鄰本二曱酸的酯類如鄰笨 二曱酸雙(2_ 丁氧基乙基)醋 HTfS曰或4本 -多價脂賴或芳香_或具有 :„族取代基之低聚-乙二醇的醋i:二 純類.二乙—醇與線性或分支脂肪族或環脂族羧酸 =貝,二乙二醇雙(2-乙基己酸扑三乙二醇雙(2_乙基己 =曰—二乙—醇雙(2乙基丁㈣)、四乙二醇雙-酉曰、二乙二醇雙_正-庚酸酯、三乙二 庚曼 :;r基/或二丙二醇苯甲酸;=群:中乙 -具有㈣族料香麵醇㈣㈣,勤 乙基己基)醋(聊、碟酸三乙醋、魏二苯基_2_乙基= 201009004 酯及/或麟酸三曱苯酯(tricresyl PhosPhate) -檸檬酸、琥珀酸及/或反丁烯二酸之酯類 自下列族群所選擇出之一或多種化合物尤其適合作為 根據本發明所用之薄膜的塑化劑:癸二酸二(2-乙基己基) 酯(DOS)、己二酸二(2-乙基己基)酯(D0A)、己二酸二己基 S旨(DHA)、癸二酸二丁酯(DBS)、三乙二醇雙-正-庚酸酯 (3G7)、四乙二醇雙-正庚酸酯(4G7)、三乙二醇雙(2-乙基己 酸酯)(3G0或3G8)、四乙二醇雙(正-2-乙基己酸酯)(4G0或 4G8)、己二酸二(2-丁氧基乙基)酯(DBEA)、己二酸二(2-丁 氧基乙氧基乙基)醋(DBEEA)、癸二酸二(2-丁氧基乙基)醋 (DBES)、鄰笨二曱酸二(2-乙基己基)g旨(DOP)、鄰苯二甲酸 二異壬酯(DINP)、三乙二醇雙異壬酸酯、三乙二醇雙(2-丙 基己酸酯)、磷酸参(2-乙基己)酯(T0F)、1,2-環己烷羧酸二 異壬酯(DINCH)及二丙二醇苯曱酸酯。 尤其適合用來作為根據本發明所用之薄膜之塑化劑為 具有下列特性的塑化劑:由公式100xO/(C+H)所表示之極 性係小於或等於9.4,其中0、C及Η代表各個分子中的氧、 碳及氫原子數目。下表顯示了根據本發明可應用之塑化劑 及其公式100xO/(C+H)值。 表1 名稱 極性值 癸二酸二(2-乙基己基)酯(DOS) 5.3 1,2-環己烷羧酸二異壬酯(DINCH) 5.4 己二酸二(2-乙基己基)酯(DOA) 6.3 201009004 甲酸二(2-乙基己基)醋(DOP) 6.5 —_三_乙二醇雙(2-丙基己酸酯) 8.6 ---三乙二醇雙異壬酸酯 8.6 一_曼三1赛二-2·丁氧基乙基酯(DBES) 9.4 -~醇雙Ο乙基己酸酯)(3G8) 9.4 此外’取決於薄膜之水含量的離子遷移率及因此的電 阻率可藉著添加Si02尤其是氣相二氧化矽來加以改變。以 ® 聚乙烯縮駿為基礎的含塑化劑薄膜包含0.001至15重量% 較佳為2至5重量%的Si02。 此外’根據本發明的薄膜更可包含慣常的添加劑像是 例如氧化穩定劑、uv穩定劑、染料、顏料、抗結塊劑。 理論上以聚乙烯縮醛為基礎之薄膜的製造與組成係敘 述於例如 EP 185 863 B卜 EP 1 118 258 Bl、WO 02/102591 Al、EP 1 118 258 B1 或 EP 387 148 B1 中。 藉著熔接薄膜製造光伏模組,而獲得無氣泡與無條紋 〇 的感光半導體層擋踏。 在根據本發明之光伏模組的一變化型中,感光半導體 層以例如蒸鍍、化學氣相沈積、濺鍍或濕式沈積而施加至 背蓋板d),並藉由至少一個薄膜c)而接合至透明前蓋板a)。 在另一變化型中,感光半導體層被施加至透明前蓋板 a)並藉由至少一個薄膜幻而接合至背蓋板d)。 在本發明之另一變化型中,將感光半導體層嵌入兩薄 臈C)間並以此方式接合至蓋板a)與d)而獲得光伏模組。 以聚乙烯縮醛為基礎之含塑化劑薄膜的厚度通常為 201009004 0.38、0.5卜 0.76、1·14、1.52 或 2.28 mm。 在疊合程序期間’根據本發明所用之薄膜會填充存在 於感光半導體層或其電連接處的空隙。 透明前蓋板a)通常由玻璃或PMMA所構成。根據本發 明之光伏模組的背蓋板d)可由玻璃、塑膠或金屬或其複合 物所構成;該支撐物中的至少一者可為透明。亦可將蓋板 中的一者或兩者設計為疊合玻璃(即由至少兩玻璃板及至 ’個PVB薄膜所製成的叠合層)或具有一個氣體間隙的 絕緣玻璃。自然地,亦可使用這些方法(measure)之組合。© 在模組中所用之感光半導體層不需要具有任何特殊的 特性。可使用單晶、多晶或非晶系統。 在薄膜太陽能模組的例子中,感光半導體層係直接被 施加至支撐物。此處無法封裝感光半導體層。在此例中, 將包含一支撐物(例如,背板(back sheet)),其具有沉積在 其上之感光半導體層、一以聚乙烯縮醛為基礎之含塑化劑 膜及一透明蓋板的複合物結合,接著在提高溫度下將其黏 合或疊合。在另一例中,感光半導體層可被沈積至透明蓋❹ 板a)上,接著利用以聚乙烯縮醛為基礎之含塑化劑薄膜的 協助點合或疊合至背板。 對於因此所獲得的複合物疊合層而言,可預先製造或 不預先製造預疊合層而使用本技術領域中具有通常知識者 所熟知的方法。 在約10至15 bar的提高壓力及130至145 °C的溫度 下進行所謂的壓力锅(autoclave)處理超過約2小時。例如, 12 201009004 根據EP 1 235 683 B1,真空袋或真空環方法係於約2〇〇 _ 及130至145 °C下操作。 較佳地使用真Μ合機來製造根據本發明之光伏模 組。其由可加熱並可抽真空的腔室所構成,其中被疊合的 玻璃可在30 60分鐘内被疊合。已證實的實際上經減少 的壓力為0.01至300 mbar且溫度為1〇〇至2〇〇〇c,最佳地 為 130 至 160 °C。 ❹ 或者,可將如上述之經組裝的複合物壓入6〇至15〇〇c 下之至少一對滾輪間的根據本發明的模組中。此類設備為 疊合玻璃的製造領域所知的且通常在具有兩壓迫裝^ (pressing apparatus)的設備中自第一壓迫裝置的上游或下游 處具有至少一個加熱管道。 產業應用性 本發明之進一步標的為具有聚乙烯基乙酸酯含量小於 1重置4之以聚乙稀縮搭為基礎之含塑化劑薄膜c)或被提 Q 及之較佳實施例在製造光伏模組時的用途。 根據本發明的光伏模組可用作為外觀元件、屋頂區、 冬季庭園遮覆、隔音牆、陽台或扶手元件或窗區元件。 量測程序 在薄膜在限定溫度與環境濕度(23 °c與85°/。RH)下至 少24小時後’在此些條件下根據mNIEC 6〇〇93來進行薄 膜的體積電阻量測。使用來自Fetronic GmbH之302 132型 板電極及來自Amprobe之電阻率量測儀IS0_Digi 5kv進行 量測。測試電壓為2.5 kV,在施加測試電壓後至獲取量倒 13 201009004 數據的等待時間為60秒。為了保證量測電極之平板與薄膜 間的充分接觸,在根據DIN EN ISO 4287量測時薄膜的表 面粗縫度Rz不應大於10微米,即有必要時PVB薄膜的原 始表面在進行電阻率量測前必須以熱再浮壓(reemboss)加 以平坦化。 聚乙烯縮醛之聚乙烯醇及聚乙烯基乙酸酯的含量係根 據ASTM D 1396-92所測定。金屬離子含量的分析係利用原 子吸收光譜(AAS)進行。 薄膜的水或水氣含量係以Karl Fischer方法所測定。此馨 方法可在未疊合薄膜及已疊合光伏模組兩者上進行,是到 薄膜邊緣之距離的函數。 驗滴定(Alkali titer) 利用磁擾拌器將3至4克的含塑化劑聚乙稀縮搭薄膜 /谷於100毫升的乙醇/THF(80:20)混合物中。將丨〇毫升的稀 釋氫氯酸㈣.G1莫耳/升)加人上述溶液中,接著利用滴定 儀以2-丙醇中的氫氧訂基料TBAH)溶液㈣川莫耳/升) 對樣本進行電位差滴定並_進行空白滴定。驗滴定量係❹ 以下列方式計算: ^疋里-每100克樣本之HC1毫升數气空白樣 本的消㈣_TBAH樣本χ刚除崎柄重量克數) 潮熱測試係根據IEC 61646進行。 實例 度,其中二1:一 = = ==處估計薄膜_ 201009004 據TCF 85 C及85%濕度下制約1000小時(類似根 、濕熱測試)。用目測方式以1至5的等級來 Γ紹塗賴餘絲,其中丨㈣最佳^表示最差^ 態0 右使用以具有低聚乙烯基乙酸醋基團含量的PVB為基 礎之薄膜(根據本發明),㈣麟乎未受到影響,例如,顯 不,原始的反射及穿透率。以具有低聚乙婦基乙酸醋基團 ❹ 纟量的PVB為基礎之_在具有高驗滴定量時,其腐餘度 尤其低。此類型的薄膜適合用於光伏模組的製造尤其是適 合用於對化學品敏感之薄膜模組的製造。 使用非根據本發明之薄膜會導致鋁塗膜的「盲化 (blinding)」及部分惡化。此類薄膜不適合用於光伏模組的 製造。 表2與3中的量說明係為重量%,基於pvB與塑化劑 結合重量。3G8代表三乙二醇雙乙基己酸酯)、RA代表 φ 殘餘的乙酸酯含量而AT代表鹼滴定量。AEROSIL 130及 TINUVIN 328 分別為 Evonik Degussa 及 CIBA 的市售產 品。鋁塗膜的腐蝕狀態係以上述之目測方式評估,而體積 電阻係根據DIN IEC 60093在薄膜經85%濕度及23 °C條件 制約後所測定並以歐姆*公分為單位。 表2 實例 比較例1 實例1 比較例2 實例2 欽述 高RA 低RA 高RA及低AT 極低RA PVB 78 78 76 78 15 201009004 PVOH-含量 PVB 18.0 18.0 18.0 18.0 RA PVB 3.2 0.8 3.2 0.1 3G8 22 22 24 22 AEROSIL 130 - - - - TINUVIN 328 0.15 0.15 0.15 0.15 MgAc2*4H20 - - 0.0125 - AT PVB 5 5 5 5 AT薄膜 3 3 20 3 腐蝕狀態 5 3 4 1 體積電阻率 2.9E+12 2.5E+12 3.2E+11 4.0E+12 表3 實例 實例3 實例4 敘述 低RA及高AT 低RA並添加Si02 PVB 76 76 PVOH-含量 PVB 18.0 18.0 RAPVB 0.8 0.8 3G8 24 24 AEROSIL 130 - 1.5 TINUVIN 328 0.15 0.15 MgAc2*4H20 0.0125 0.0500 AT PVB 5 5 AT薄膜 20 27 腐蝕狀態 2 1 體積電阻率 4.5E+11 6.5E+12 16 201009004 【圖式簡單說明】 無 【主要元件符號說明】 無Kuraray Europe GmbH's "Exceval" category). Further, it is also possible to use, in the scope of the present invention, a polyvinyl alcohol prepared from an unsaturated monomer which is additionally ethylated with ethyl ruthenium acetate. The copolymer is decomposed within the scope of the present invention, and a polyethylene scale mixture of pure polyethylene polymerization degree or degree of hydrolysis can be used. 3. Different polyethylene acetals contain units derived from ethylene vinyl alcohol in addition to acetal units. The acetic acid vinegar and the ground used in accordance with the invention have a polyethylene glycol content of less than 22% by weight, less than decene _ preferably 18% by weight, less than 16% by weight or 15% by weight, and less than 5% by weight. The weight % ° polyethyl alcohol content should not be less than 12% by weight. The degree of acetalization below 14 can be calculated from the polyvinyl alcohol content and the residual. The residual acetate content 201009004 The enamel film preferably has a maximum % plasticizer content, 32% by weight, 30% by weight, 40% by weight, 35% by weight, 戋22% by weight. / Helmet / 〇, 26% by weight, 24 weights /. The secondary ϋ reset/〇, in order to make the film processing amount should not be less than 15% by weight (the film of the plasticizer 5 or the photovoltaic module can be packaged in each of the bases (4)). Roots - Suitable compounds or compounds of the film used according to the invention: (iv) are selected from the group consisting of Φ Φ : 〇 馼 已 已 曰 曰 曰 曰 曰 曰 曰 曰 - - - - - - - - - - - - - - - - - - a mixture of hexylhexyl hexanoate, a mixture of hexanyl hexanoate, agglomerate and adipic acid of adipic acid and a cycloaliphatic or squamous chain;酽锢.龃—w. force- 酉夂 酉夂 裱 裱 裱 裱 裱 或 或 或 或 或 或 或 或 或 或 或 或 或 或 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力 力) vinegar HTfS 曰 or 4 - multivalent lipid lysate or aromatic _ or vinegar with: „ group substituent oligo-ethylene glycol i: di-pure. Diethyl-alcohol with linear or branched aliphatic or cycloaliphatic Group carboxylic acid=bei, diethylene glycol bis(2-ethylhexanoic acid triethylene glycol bis(2-ethylhexanide-diethyl-alcohol bis(2ethylbutyl(tetra))), tetraethylene glycol Bis-indole, diethylene glycol bis-n-heptanoate, triethylene diheptan:; r-based / or dipropylene glycol benzoic acid; = group: medium B - with (four) family fragrant surface alcohol (four) (four), Qin B Benzyl) vinegar (talk, dish acid triethyl vinegar, Wei diphenyl 2_ethyl = 201009004 ester and / or linonic acid Tricorsyl Phosphate - an ester of citric acid, succinic acid and/or fumaric acid selected from one or more of the following groups of compounds, particularly suitable as a plasticizer for films used in accordance with the invention: Di(2-ethylhexyl) diester (DOS), di(2-ethylhexyl) adipate (D0A), dihexyl adipate (DHA), dibutyl sebacate (DBS) , triethylene glycol bis-n-heptanoate (3G7), tetraethylene glycol bis-n-heptanoate (4G7), triethylene glycol bis(2-ethylhexanoate) (3G0 or 3G8) , tetraethylene glycol bis(n--2-ethylhexanoate) (4G0 or 4G8), di(2-butoxyethyl) adipate (DBEA), di(2-butoxy) adipate Ethyl ethoxyethyl) vinegar (DBEEA), di(2-butoxyethyl) phthalate (DBES), di(2-ethylhexyl) g (DOP), ortho Diisodecyl phthalate (DINP), triethylene glycol diisononate, triethylene glycol bis(2-propylhexanoate), bis(2-ethylhexyl) phosphate (T0F), Diisodecyl 1,2-cyclohexanecarboxylate (DINCH) and dipropylene glycol benzoate are especially suitable for use as thin in accordance with the present invention. The plasticizer of the film is a plasticizer having the following characteristics: the polarity represented by the formula 100xO/(C+H) is less than or equal to 9.4, wherein 0, C and Η represent oxygen, carbon and hydrogen atoms in each molecule. The following table shows the plasticizers and their formulas 100xO/(C+H) values applicable according to the invention. Table 1 Name Polarity Value Di(2-ethylhexyl) sebacate (DOS) 5.3 1, Diisodecyl 2-cyclohexanecarboxylate (DINCH) 5.4 Di(2-ethylhexyl) adipate (DOA) 6.3 201009004 Di(2-ethylhexyl) vinegar (DOP) 6.5 —_Three_ Ethylene glycol bis(2-propylhexanoate) 8.6--triethylene glycol bis-isodecanoate 8.6 A _Mansan 1 Sa 2-2 Butoxyethyl ester (DBES) 9.4 -~ alcohol Bis-ethylhexanoate) (3G8) 9.4 Furthermore, the ion mobility and hence the resistivity depending on the water content of the film can be changed by the addition of SiO 2 , especially gas phase ruthenium dioxide. The plasticizer-containing film based on the polyethylene shrinkage comprises 0.001 to 15% by weight, preferably 2 to 5% by weight, of SiO 2 . Further, the film according to the present invention may further contain conventional additives such as, for example, an oxidation stabilizer, a uv stabilizer, a dye, a pigment, and an anti-caking agent. The manufacture and composition of a film based on a polyethylene acetal is theoretically described, for example, in EP 185 863 B, EP 1 118 258 Bl, WO 02/102591 Al, EP 1 118 258 B1 or EP 387 148 B1. The photovoltaic module is fabricated by welding a film to obtain a photosensitive semiconductor layer with no bubbles and no streaks. In a variant of the photovoltaic module according to the invention, the photosensitive semiconductor layer is applied to the back cover d) by, for example, evaporation, chemical vapor deposition, sputtering or wet deposition, and by at least one film c) And joined to the transparent front cover a). In another variant, the photosensitive semiconductor layer is applied to the transparent front cover a) and is joined to the back cover d) by at least one film. In a further variant of the invention, a photovoltaic module is obtained by embedding a photosensitive semiconductor layer between two thin layers C) and bonding to the cover sheets a) and d) in this manner. The thickness of the plasticizer-containing film based on polyvinyl acetal is usually 201009004 0.38, 0.5 bu 0.76, 1.14, 1.52 or 2.28 mm. The film used in accordance with the present invention during the lamination process will fill voids present in the photosensitive semiconductor layer or its electrical connections. The transparent front cover a) is usually made of glass or PMMA. The back cover d) of the photovoltaic module according to the present invention may be constructed of glass, plastic or metal or a composite thereof; at least one of the supports may be transparent. One or both of the cover sheets may also be designed as a laminated glass (i.e., a laminated layer made of at least two glass sheets and to a PVB film) or an insulating glass having a gas gap. Naturally, a combination of these measures can also be used. © The photosensitive semiconductor layer used in the module does not need to have any special characteristics. Single crystal, polycrystalline or amorphous systems can be used. In the case of a thin film solar module, the photosensitive semiconductor layer is directly applied to the support. The photosensitive semiconductor layer cannot be packaged here. In this case, a support (for example, a back sheet) having a photosensitive semiconductor layer deposited thereon, a polyvinyl acetal-based plasticizer-containing film, and a transparent cover will be included. The composite of the panels is bonded and then bonded or laminated at elevated temperatures. In another example, the photosensitive semiconductor layer can be deposited onto the transparent cover sheet a) and then assisted by the plasticizer film based on the polyvinyl acetal to be spotted or laminated to the back sheet. For the thus obtained composite laminate layer, a pre-laminated layer may be pre-manufactured or not fabricated using a method well known to those skilled in the art. The so-called autoclave treatment is carried out at an elevated pressure of about 10 to 15 bar and a temperature of 130 to 145 ° C for more than about 2 hours. For example, 12 201009004 According to EP 1 235 683 B1, the vacuum bag or vacuum ring process is operated at about 2 〇〇 _ and 130 to 145 ° C. A true splicer is preferably used to fabricate a photovoltaic module in accordance with the present invention. It consists of a heatable and vacuumable chamber in which the laminated glass can be laminated in 30 to 60 minutes. It has been confirmed that the actually reduced pressure is from 0.01 to 300 mbar and the temperature is from 1 Torr to 2 〇〇〇c, most preferably from 130 to 160 °C. ❹ Alternatively, the assembled composite as described above may be pressed into a module according to the invention between at least one pair of rollers between 6 〇 and 15 〇〇c. Such devices are known in the art of laminating glass and typically have at least one heating conduit upstream or downstream of the first compression device in a device having two pressing apparatus. INDUSTRIAL APPLICABILITY The present invention is further characterized by a plasticizer-containing film c) having a polyvinyl acetate content of less than 1 and a polyethylene-based shrinkage-based composition, or a preferred embodiment. Use in the manufacture of photovoltaic modules. The photovoltaic module according to the invention can be used as an exterior element, a roof area, a winter garden covering, a soundproof wall, a balcony or a handrail element or a window element. Measurement procedure The volumetric resistance measurement of the film was carried out according to mNIEC 6〇〇93 under the conditions of at least 24 hours after the film was at a defined temperature and ambient humidity (23 ° C and 85 ° / RH). Measurements were carried out using a Model 302 132 plate electrode from Fetronic GmbH and a resistivity meter IS0_Digi 5kv from Amprobe. The test voltage is 2.5 kV, and the waiting time after the application of the test voltage to the acquisition amount is 60 seconds. In order to ensure sufficient contact between the plate and the film of the measuring electrode, the surface roughness Rz of the film should not be greater than 10 μm when measured according to DIN EN ISO 4287, ie the original surface of the PVB film is subjected to a resistivity amount if necessary It must be flattened with heat and reemboss before measurement. The polyvinyl alcohol and polyvinyl acetate content of the polyvinyl acetal is determined in accordance with ASTM D 1396-92. The analysis of the metal ion content was carried out using an atomic absorption spectrum (AAS). The water or moisture content of the film is determined by the Karl Fischer method. This singular method can be performed on both the unlaminated film and the laminated photovoltaic module as a function of the distance from the edge of the film. Alkali titer A 3 to 4 gram plasticizer-containing polycondensation film/valley was used in a 100 ml ethanol/THF (80:20) mixture using a magnetic stirrer. Add 丨〇ml of diluted hydrochloric acid (4). G1 mol/L) to the above solution, and then use a titrator to prepare the TBAH solution in the 2-propanol (4) Molybdenum/L) The sample was subjected to potentiometric titration and _ blank titration was performed. The titration system is calculated in the following manner: ^疋里-HC1 ml of gas sample per 100 g sample (4) _TBAH sample χ just removed the weight of the stalk handle) The hot flash test is carried out according to IEC 61646. Example degree, where two 1:1 = = == estimated film _ 201009004 According to TCF 85 C and 85% humidity for 1000 hours (similar to root, damp heat test). Visually apply the grade of 1 to 5 to apply the lingering silk, where 丨(4) is the best ^ means the worst state 0. Right use PVB based film with low polyvinyl acetate vinegar content (according to The present invention), (iv) has not been affected, for example, significant, original reflection and penetration. Based on PVB with oligoethylacetate acetate ❹ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ This type of film is suitable for the manufacture of photovoltaic modules, especially for the manufacture of chemically sensitive film modules. The use of a film other than the present invention causes "blinding" and partial deterioration of the aluminum coating film. Such films are not suitable for the manufacture of photovoltaic modules. The amounts in Tables 2 and 3 are shown in % by weight based on the combined weight of pvB and plasticizer. 3G8 represents triethylene glycol diethylhexanoate), RA represents the residual acetate content of φ and AT represents the alkali titer. AEROSIL 130 and TINUVIN 328 are commercially available from Evonik Degussa and CIBA, respectively. The corrosion state of the aluminum coating film was evaluated by the above-described visual inspection method, and the volume resistance was measured in accordance with DIN IEC 60093 after the film was subjected to conditions of 85% humidity and 23 ° C and was measured in ohm* centimeters. Table 2 Example Comparative Example 1 Example 1 Comparative Example 2 Example 2 Declared High RA Low RA High RA and Low AT Very Low RA PVB 78 78 76 78 15 201009004 PVOH-Content PVB 18.0 18.0 18.0 18.0 RA PVB 3.2 0.8 3.2 0.1 3G8 22 22 24 22 AEROSIL 130 - - - - TINUVIN 328 0.15 0.15 0.15 0.15 MgAc2*4H20 - - 0.0125 - AT PVB 5 5 5 5 AT film 3 3 20 3 Corrosion 5 3 4 1 Volume resistivity 2.9E+12 2.5E+ 12 3.2E+11 4.0E+12 Table 3 Example Example 3 Example 4 Describes low RA and high AT Low RA and adds SiO 2 PVB 76 76 PVOH-content PVB 18.0 18.0 RAPVB 0.8 0.8 3G8 24 24 AEROSIL 130 - 1.5 TINUVIN 328 0.15 0.15 MgAc2*4H20 0.0125 0.0500 AT PVB 5 5 AT film 20 27 Corrosion state 2 1 Volume resistivity 4.5E+11 6.5E+12 16 201009004 [Simplified description] No [Main component symbol description] None

Claims (1)

201009004 七 •申請專利範圍: L種光伏模組,其包含一下列之疊層: a) —透明前蓋板; b) 一或多個感光半導體層; c) 至少—個以聚乙烯縮醛為基礎之含塑化劑薄膜;及 d) 一背蓋板, 其特徵在於該含塑化劑薄膜c)中所用之該聚乙烯縮醛具 有小於1重量%之聚乙烯基乙酸酯。 2·如申請專利範圍第1項之光伏模組,其特徵在於該以聚 乙烯縮醛為基礎之含塑化劑薄膜c)具有最大4〇重量%的 塑化劑含量。 3'如申凊專利範圍第1至2項中任一項之光伏模組,其特 徵在於該以聚乙烯縮醛為基礎之含塑化劑薄膜c)在85〇/〇 RH/23 °C的環境氛圍下具有大於1E+11歐姆*公分的體 積電阻。 4.,如申請專利範圍帛1至3項中任一項之光伏模組其特 徵在於該以聚乙烯縮醛為基礎之含塑化劑薄膜c)乓大 於5之鹼滴定量。 “ 5. 如申請專利範圍第丨至4項中任一項之光伏模叙其 徵在於該聚乙烯縮醛具有小於22重量%的聚乙烯醇含、 审 〇 6. 如申請專利範圍第1至5項中任一項之光伏模挺,其特 IS 18 201009004 徵在於該以聚乙烯縮醛為基礎之含塑化劑薄膜C)包含一 具有1至15個碳原子的羧酸金屬鹽作為鹼性化合物。 7.如申請專利範圍第1至6項中任-項之光伏模組,其特 徵在於該以聚乙烯縮醛為基礎之含塑化劑薄膜包含 0.001至5重量%的Si〇2。 8·如申請專利範圍第1至7項中任-項之光伏模組,其特 ❺ 徵在於該感光半導體層係施加至蓋板d)並藉由至少一個 。玄以聚乙烯縮醛為基礎之含塑化劑薄膜c)而接合至該透 明前蓋板a)。 9. 如申請專職圍第i至7項巾任一項之光伏模組,其特 徵在於該感光半導體層係施加至該透明前蓋板a)並藉由 至少一個該以聚乙烯縮醛為基礎之含塑化劑薄膜c)而接 合至該背蓋板d)。 10. 如申請專利範圍第丨至7項中任一項之光伏模組其 ❹ 特徵在於該感光半導體層b),該感光半導體層係嵌入兩 薄臈c)之間並以此方式接合至蓋板幻與d)。 種以聚乙烯縮醛為基礎之含塑化劑薄膜於製造光伏 模組之用途,其中聚乙烯縮醛具有小於丨重量%之聚乙 烯基乙酸酯含量。 12‘一種如申請專利範圍第丨至忉項中任一項之光伏模組 的用途,作為外觀元件、屋頂區、冬季庭園遮覆、隔音 牆、陽台或扶手元件或窗區元件。 19 201009004 四、指定代表圖: (一) 本案指定代表圖為:第(無)圖。 (二) 本代表圖之元件符號簡單說明: 無 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: 無201009004 VII • Patent application scope: L kinds of photovoltaic modules, including one of the following laminates: a) - transparent front cover; b) one or more photosensitive semiconductor layers; c) at least one with polyvinyl acetal a base plasticizer-containing film; and d) a back cover, characterized in that the polyvinyl acetal used in the plasticizer-containing film c) has less than 1% by weight of polyvinyl acetate. 2. A photovoltaic module according to claim 1 of the invention, characterized in that the plasticizer-containing film c) based on polyethylene acetal has a plasticizer content of at most 4% by weight. The photovoltaic module according to any one of claims 1 to 2, characterized in that the plasticizer-containing film c) based on polyvinyl acetal is at 85 〇/〇RH/23 °C. The volumetric resistance is greater than 1E+11 ohm*cm in the ambient atmosphere. 4. A photovoltaic module according to any one of claims 1 to 3, characterized in that the plasticizer-containing film c) based on a polyvinyl acetal is more than a base titer of 5. " 5. The photovoltaic module according to any one of claims 4 to 4 is characterized in that the polyvinyl acetal has a polyvinyl alcohol content of less than 22% by weight, as reviewed. The photovoltaic module of any one of the five items, the special IS 18 201009004 is characterized in that the plasticizer-containing film C) based on polyvinyl acetal comprises a metal carboxylate having 1 to 15 carbon atoms as a base. The photovoltaic module according to any one of claims 1 to 6, wherein the plasticizer-containing film based on the polyvinyl acetal comprises 0.001 to 5% by weight of Si〇2. 8. The photovoltaic module according to any one of claims 1 to 7, wherein the photosensitive semiconductor layer is applied to the cover d) by at least one. The base plasticizer film c) is bonded to the transparent front cover a). 9. The photovoltaic module according to any one of the items i to 7 of the present invention, characterized in that the photosensitive semiconductor layer is applied to The transparent front cover a) and comprising at least one plasticizer based on polyvinyl acetal The film module c) is bonded to the back cover d). The photovoltaic module according to any one of claims 7 to 7 is characterized in that the photosensitive semiconductor layer b) is embedded in two Between the crusts c) and in this way joined to the cover plate and d). The use of a plasticizer film based on polyvinyl acetal for the manufacture of photovoltaic modules, wherein the polyvinyl acetal has a weight less than 丨% polyvinyl acetate content. 12' Use of a photovoltaic module according to any one of the claims 2-3 to as an exterior element, roof area, winter garden cover, soundproof wall, balcony or Handrail element or window area component 19 201009004 IV. Designation of representative figure: (1) The representative figure of the case is: (No) picture. (2) The symbol of the symbol of this representative figure is simple: No. 5. If there is a chemical formula in this case , please reveal the chemical formula that best shows the characteristics of the invention:
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