SU1834530A1 - Method of forming microimages - Google Patents
Method of forming microimagesInfo
- Publication number
- SU1834530A1 SU1834530A1 SU4943843/21A SU4943843A SU1834530A1 SU 1834530 A1 SU1834530 A1 SU 1834530A1 SU 4943843/21 A SU4943843/21 A SU 4943843/21A SU 4943843 A SU4943843 A SU 4943843A SU 1834530 A1 SU1834530 A1 SU 1834530A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- dies
- microimages
- forming
- electron
- tbl
- Prior art date
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
FIELD: microelectronics. SUBSTANCE: electron resist is illuminated in sequence and under program control by electron beam in form of square-shaped dies. Sizes of dies are determined by maximal density of beam cross-section at focusing plane. After that latent image is developed. Current density and width of the die are chosen from the relation given in the description of the invention. EFFECT: improved efficiency of process; optimized thermal conditions of illumination. 4 dwg, 4 tbl
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU4943843/21A SU1834530A1 (en) | 1991-05-23 | 1991-05-23 | Method of forming microimages |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU4943843/21A SU1834530A1 (en) | 1991-05-23 | 1991-05-23 | Method of forming microimages |
Publications (1)
Publication Number | Publication Date |
---|---|
SU1834530A1 true SU1834530A1 (en) | 1995-05-20 |
Family
ID=60541657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SU4943843/21A SU1834530A1 (en) | 1991-05-23 | 1991-05-23 | Method of forming microimages |
Country Status (1)
Country | Link |
---|---|
SU (1) | SU1834530A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2470336C2 (en) * | 2010-12-02 | 2012-12-20 | Открытое акционерное общество "Научно-исследовательский институт "Элпа" с опытным производством" (ОАО "НИИ "Элпа") | Method of producing contact photomask with submicron and nanometric design rules |
-
1991
- 1991-05-23 SU SU4943843/21A patent/SU1834530A1/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2470336C2 (en) * | 2010-12-02 | 2012-12-20 | Открытое акционерное общество "Научно-исследовательский институт "Элпа" с опытным производством" (ОАО "НИИ "Элпа") | Method of producing contact photomask with submicron and nanometric design rules |
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