SG11201804129YA - Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma - Google Patents

Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Info

Publication number
SG11201804129YA
SG11201804129YA SG11201804129YA SG11201804129YA SG11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA
Authority
SG
Singapore
Prior art keywords
output wave
plasma
international
hollow cathode
producing
Prior art date
Application number
SG11201804129YA
Inventor
John Chambers
Peter Maschwitz
Original Assignee
Agc Flat Glass Na Inc
Asahi Glass Co Ltd
Agc Glass Europe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/942,673 external-priority patent/US9721764B2/en
Priority claimed from US14/942,737 external-priority patent/US9721765B2/en
Application filed by Agc Flat Glass Na Inc, Asahi Glass Co Ltd, Agc Glass Europe filed Critical Agc Flat Glass Na Inc
Publication of SG11201804129YA publication Critical patent/SG11201804129YA/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/44Plasma torches using an arc using more than one torch
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32568Relative arrangement or disposition of electrodes; moving means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32577Electrical connecting means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32596Hollow cathodes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/152Deposition methods from the vapour phase by cvd
    • C03C2218/153Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00Applications of plasma devices
    • H05H2245/40Surface treatments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property - Organization International Bureau ires.. 00) (43) International Publication Date ,„,i .... ... 26 May 2017(26.05.2017) WIPO I PCT (10) WO International 111111111111111111111111111111111111111111111111111111111111111111111111111111111111111 2017/087233 Publication Number Al (51) International Patent Classification: (74) Agent: ZOLTICK, Martin M.; 607 14th Street, N.W., C23C 16/455 (2006.01) BO5D 3/14 (2006.01) Suite 800, Washington, District of Columbia 20005 (US). BOM 19/08 (2006.01) B05D 7/00 (2006.01) BO5D 3/06 (2006.01) (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, (21) International Application Number: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, PCT/US2016/061134 BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (22) International Filing Date: HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, 9 November 2016 (09.11.2016) KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (25) Filing Language: English MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, (26) Publication Language: English SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, (30) Priority Data: TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, 14/942,673 16 November 2015 (16.11.2015) US ZW. 14/942,737 16 November 2015 (16.11.2015) US (84) Designated States (unless otherwise indicated, for every kind ARIPO (71) Applicants: AGC FLAT GLASS NORTH AMERICA, of regional protection available): (BW, GH, INC. [US/US]; 11175 Cicero Drive, Suite 400, Alpharetta, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, Georgia 30022 (US). ASAHI GLASS CO., LTD. [JP/JP]; TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, Shin-Maranouchi Building, 1-5-1 Maranouchi, Chiyo- TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, da-ku, Tokyo, 100-8405 (JP). AGC GLASS EUROPE DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, S.A. [BE/BE]; Technovation Centre, Rue Louis Bleriot, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, 12, 6041 Gosselies (BE). GW, KM, ML, MR, NE, SN, TD, TG). Inventors: CHAMBERS, John; AGC Glass Company (72) c/o Published: North America, Petaluma R&D, 1311 Clegg Street, Suite B, Petaluma, California 94954 (US). MASCHWITZ, — with international search report (Art 21(3)) Peter; 6601 Hutchins Avenue, Sebastopol, California 95472 (US). (54) Title: PLASMA DEVICE DRIVEN BY MULTIPLE-PHASE ALTERNATING OR PULSED ELECTRICAL CURRENT AND — METHOD OF PRODUCING A PLASMA 1402b 1404b 1430 1410 1410 / 1406b 1 WV 1420 .h. 1420 .g • - .... — 1420 1-1 .4t E-density [B/m3]-Max:8.89e+016 5e+013 998e+013 1996+014 3.9]=+014 792e4014 15564015 3.15e+015 629e+015 1 26e+016 254+016 5e4016 en en ei FIG. 14B it-- 00 (57) : A plasma source and method of producing a plasma are provided. The plasma source includes at least three hollow 0 --•-... cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a IN plasmaexit region. The plasma source includes a source of power capable of producing multiple output waves, including a first out - c:::, put wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, el the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of 0 phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connec - ,-t ted to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third is electric - P.- ally connected to the third output wave.
SG11201804129YA 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma SG11201804129YA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/942,673 US9721764B2 (en) 2015-11-16 2015-11-16 Method of producing plasma by multiple-phase alternating or pulsed electrical current
US14/942,737 US9721765B2 (en) 2015-11-16 2015-11-16 Plasma device driven by multiple-phase alternating or pulsed electrical current
PCT/US2016/061134 WO2017087233A1 (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Publications (1)

Publication Number Publication Date
SG11201804129YA true SG11201804129YA (en) 2018-06-28

Family

ID=58717680

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201804129YA SG11201804129YA (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Country Status (10)

Country Link
EP (1) EP3377673A4 (en)
JP (1) JP2018535532A (en)
KR (1) KR20180095530A (en)
CN (1) CN108463575A (en)
BR (1) BR112018009864A8 (en)
EA (1) EA201891175A1 (en)
MX (1) MX2018006095A (en)
PH (1) PH12018501049A1 (en)
SG (1) SG11201804129YA (en)
WO (1) WO2017087233A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2680318C1 (en) * 2018-08-31 2019-02-19 Общество С Ограниченной Ответственностью "Трипл-Сп" Ac high-voltage electric arc plasma torch cooling system and the ac high-voltage electric arc plasma torch with cooling system (embodiments)
CN115355504A (en) * 2022-08-15 2022-11-18 浙江大学台州研究院 Multiphase alternating current plasma torch and solid waste treatment device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07226395A (en) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd Vacuum plasma treatment apparatus
US7232975B2 (en) * 2003-12-02 2007-06-19 Battelle Energy Alliance, Llc Plasma generators, reactor systems and related methods
US7411353B1 (en) * 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
CN105206496B (en) * 2008-08-04 2019-07-05 北美Agc平板玻璃公司 Plasma source and with the chemical vapor deposition of plasma enhancing come the method for depositing thin film coatings
US20120164353A1 (en) * 2009-09-05 2012-06-28 John Madocks Plasma enhanced chemical vapor deposition apparatus
HUE049078T2 (en) * 2012-11-02 2020-09-28 Agc Inc Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source
WO2015022621A1 (en) * 2013-08-11 2015-02-19 Ariel - University Research And Development Company, Ltd. Ferroelectric emitter for electron beam emission and radiation generation

Also Published As

Publication number Publication date
BR112018009864A2 (en) 2018-11-13
MX2018006095A (en) 2018-11-12
JP2018535532A (en) 2018-11-29
EA201891175A1 (en) 2018-12-28
BR112018009864A8 (en) 2019-02-26
WO2017087233A1 (en) 2017-05-26
EP3377673A1 (en) 2018-09-26
KR20180095530A (en) 2018-08-27
CN108463575A (en) 2018-08-28
EP3377673A4 (en) 2019-07-31
PH12018501049A1 (en) 2019-01-28

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