SG11201804129YA - Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma - Google Patents
Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasmaInfo
- Publication number
- SG11201804129YA SG11201804129YA SG11201804129YA SG11201804129YA SG11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA SG 11201804129Y A SG11201804129Y A SG 11201804129YA
- Authority
- SG
- Singapore
- Prior art keywords
- output wave
- plasma
- international
- hollow cathode
- producing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Abstract
INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property - Organization International Bureau ires.. 00) (43) International Publication Date ,„,i .... ... 26 May 2017(26.05.2017) WIPO I PCT (10) WO International 111111111111111111111111111111111111111111111111111111111111111111111111111111111111111 2017/087233 Publication Number Al (51) International Patent Classification: (74) Agent: ZOLTICK, Martin M.; 607 14th Street, N.W., C23C 16/455 (2006.01) BO5D 3/14 (2006.01) Suite 800, Washington, District of Columbia 20005 (US). BOM 19/08 (2006.01) B05D 7/00 (2006.01) BO5D 3/06 (2006.01) (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, (21) International Application Number: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, PCT/US2016/061134 BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (22) International Filing Date: HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, 9 November 2016 (09.11.2016) KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (25) Filing Language: English MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, (26) Publication Language: English SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, (30) Priority Data: TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, 14/942,673 16 November 2015 (16.11.2015) US ZW. 14/942,737 16 November 2015 (16.11.2015) US (84) Designated States (unless otherwise indicated, for every kind ARIPO (71) Applicants: AGC FLAT GLASS NORTH AMERICA, of regional protection available): (BW, GH, INC. [US/US]; 11175 Cicero Drive, Suite 400, Alpharetta, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, Georgia 30022 (US). ASAHI GLASS CO., LTD. [JP/JP]; TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, Shin-Maranouchi Building, 1-5-1 Maranouchi, Chiyo- TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, da-ku, Tokyo, 100-8405 (JP). AGC GLASS EUROPE DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, S.A. [BE/BE]; Technovation Centre, Rue Louis Bleriot, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, 12, 6041 Gosselies (BE). GW, KM, ML, MR, NE, SN, TD, TG). Inventors: CHAMBERS, John; AGC Glass Company (72) c/o Published: North America, Petaluma R&D, 1311 Clegg Street, Suite B, Petaluma, California 94954 (US). MASCHWITZ, — with international search report (Art 21(3)) Peter; 6601 Hutchins Avenue, Sebastopol, California 95472 (US). (54) Title: PLASMA DEVICE DRIVEN BY MULTIPLE-PHASE ALTERNATING OR PULSED ELECTRICAL CURRENT AND — METHOD OF PRODUCING A PLASMA 1402b 1404b 1430 1410 1410 / 1406b 1 WV 1420 .h. 1420 .g • - .... — 1420 1-1 .4t E-density [B/m3]-Max:8.89e+016 5e+013 998e+013 1996+014 3.9]=+014 792e4014 15564015 3.15e+015 629e+015 1 26e+016 254+016 5e4016 en en ei FIG. 14B it-- 00 (57) : A plasma source and method of producing a plasma are provided. The plasma source includes at least three hollow 0 --•-... cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a IN plasmaexit region. The plasma source includes a source of power capable of producing multiple output waves, including a first out - c:::, put wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, el the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of 0 phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connec - ,-t ted to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third is electric - P.- ally connected to the third output wave.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/942,673 US9721764B2 (en) | 2015-11-16 | 2015-11-16 | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
US14/942,737 US9721765B2 (en) | 2015-11-16 | 2015-11-16 | Plasma device driven by multiple-phase alternating or pulsed electrical current |
PCT/US2016/061134 WO2017087233A1 (en) | 2015-11-16 | 2016-11-09 | Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201804129YA true SG11201804129YA (en) | 2018-06-28 |
Family
ID=58717680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201804129YA SG11201804129YA (en) | 2015-11-16 | 2016-11-09 | Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP3377673A4 (en) |
JP (1) | JP2018535532A (en) |
KR (1) | KR20180095530A (en) |
CN (1) | CN108463575A (en) |
BR (1) | BR112018009864A8 (en) |
EA (1) | EA201891175A1 (en) |
MX (1) | MX2018006095A (en) |
PH (1) | PH12018501049A1 (en) |
SG (1) | SG11201804129YA (en) |
WO (1) | WO2017087233A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2680318C1 (en) * | 2018-08-31 | 2019-02-19 | Общество С Ограниченной Ответственностью "Трипл-Сп" | Ac high-voltage electric arc plasma torch cooling system and the ac high-voltage electric arc plasma torch with cooling system (embodiments) |
CN115355504A (en) * | 2022-08-15 | 2022-11-18 | 浙江大学台州研究院 | Multiphase alternating current plasma torch and solid waste treatment device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07226395A (en) * | 1994-02-15 | 1995-08-22 | Matsushita Electric Ind Co Ltd | Vacuum plasma treatment apparatus |
US7232975B2 (en) * | 2003-12-02 | 2007-06-19 | Battelle Energy Alliance, Llc | Plasma generators, reactor systems and related methods |
US7411353B1 (en) * | 2007-05-11 | 2008-08-12 | Rutberg Alexander P | Alternating current multi-phase plasma gas generator with annular electrodes |
CN105206496B (en) * | 2008-08-04 | 2019-07-05 | 北美Agc平板玻璃公司 | Plasma source and with the chemical vapor deposition of plasma enhancing come the method for depositing thin film coatings |
US20120164353A1 (en) * | 2009-09-05 | 2012-06-28 | John Madocks | Plasma enhanced chemical vapor deposition apparatus |
HUE049078T2 (en) * | 2012-11-02 | 2020-09-28 | Agc Inc | Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source |
WO2015022621A1 (en) * | 2013-08-11 | 2015-02-19 | Ariel - University Research And Development Company, Ltd. | Ferroelectric emitter for electron beam emission and radiation generation |
-
2016
- 2016-11-09 CN CN201680078860.4A patent/CN108463575A/en active Pending
- 2016-11-09 MX MX2018006095A patent/MX2018006095A/en unknown
- 2016-11-09 EP EP16866871.3A patent/EP3377673A4/en not_active Withdrawn
- 2016-11-09 JP JP2018544766A patent/JP2018535532A/en active Pending
- 2016-11-09 EA EA201891175A patent/EA201891175A1/en unknown
- 2016-11-09 KR KR1020187017067A patent/KR20180095530A/en unknown
- 2016-11-09 WO PCT/US2016/061134 patent/WO2017087233A1/en active Application Filing
- 2016-11-09 BR BR112018009864A patent/BR112018009864A8/en not_active Application Discontinuation
- 2016-11-09 SG SG11201804129YA patent/SG11201804129YA/en unknown
-
2018
- 2018-05-16 PH PH12018501049A patent/PH12018501049A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
BR112018009864A2 (en) | 2018-11-13 |
MX2018006095A (en) | 2018-11-12 |
JP2018535532A (en) | 2018-11-29 |
EA201891175A1 (en) | 2018-12-28 |
BR112018009864A8 (en) | 2019-02-26 |
WO2017087233A1 (en) | 2017-05-26 |
EP3377673A1 (en) | 2018-09-26 |
KR20180095530A (en) | 2018-08-27 |
CN108463575A (en) | 2018-08-28 |
EP3377673A4 (en) | 2019-07-31 |
PH12018501049A1 (en) | 2019-01-28 |
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